Abstract: An analytical balance that includes a balance scale, a wind guard encircling the balance scale, and an apparatus for generating an ionized stream of air for dissipating electrostatic charges of goods to be weighed. The apparatus for generating an ionized stream of air includes a blower that draws in air from the weighing space into at least one boundary surface of the weighing space. The blower also recycles the air back into the weighing space via at least one exhaust opening at another point. In this manner, highly effective dissipation of electrostatic charges is possible, and the stream of air can be conducted so that it exerts scarcely any vertical forces on the goods to be weighed. The analytical balance is very user-friendly in operation. Additionally, the apparatus for generating an ionized stream of air is preferably structured to be an easily installed optional component of the analytical balance.

Abstract: An electrostatic fluid accelerator having a multiplicity of closely spaced corona electrodes. The close spacing of such corona electrodes is obtainable because such corona electrodes are isolated from one another with exciting electrodes. Either the exciting electrode must be placed asymmetrically between adjacent corona electrodes or an accelerating electrode must be employed. The accelerating electrode can be either an attracting or a repelling electrode. Preferably, the voltage between the corona electrodes and the exciting electrodes is maintained between the corona onset voltage and the breakdown voltage with a flexible top high-voltage power supply. Optionally, however, the voltage between the corona electrodes and the exciting electrodes can be varied, even outside the range between the corona onset voltage and the breakdown voltage, in to vary the flow of fluid.

Abstract: A method to limit ozone production in wind ion devices while simultaneously realizing incidents of high acceleration in such devices varies the high voltage potential across the array of emitter(s) (10) and collectors (20) over time in such a manner as to generate a wave effect of airflow. The variance may be achieved by switching, ramping, or gating the high voltage potential delivered to the array.

Abstract: The present invention provides an inductively coupled RF plasma source that can improve the nonuniformity in substrate treatment by canceling out the radial electric fields generated between a plasma and an antenna coil. The inductively coupled RF plasma source comprises a plurality of one-turn antenna coils, each having one end connected to a RF supply along a circumferential side wall of a plasma generating chamber and the other end connected to a grounding potential, arranged at intervals in the longitudinal axial direction of the plasma generating chamber. One end of each one-turn antenna coil displaced at equal angles from each other in a circumferential direction.

Abstract: In one embodiment of a compact closed-drift ion source, an ionizable gas is introduced into a annular discharge region. An anode is at one end of this region and an electron-emitting cathode is near the opposite and open end. A magnetic circuit extends from an inner pole piece to an outer pole piece, with both pole pieces near the open end. The electron current in the discharge region interacts with the magnetic field therein to generate and accelerate ions out of the open end. A permeable enclosure surrounds the anode end of the discharge region. Adjacent elements of the permeable enclosure, the inner pole piece, and any intermediate permeable elements are in close proximity, one to the next. A magnetizing means is located only between the outer pole piece and the permeable enclosure.

Abstract: A treater system includes a conductive roller electrode that supports a moving web that is to be treated. One or more active electrode assemblies mounted to support headers have a pair of active electrodes that are positioned to treat one surface of the web as the web passes over the roller electrode. Air or a gas/gas mixture can be selectively piped to a chamber adjacent the active electrodes and diffused along the length of the discharge surfaces to allow the treater to operate in three distinct modes: corona, chemical corona and atmospheric plasma. The active electrodes are cooled by passing air into and through tubular bodies of the active electrodes.

Abstract: A source of photons includes a discharge chamber, a plurality of ion beam sources in the discharge chamber and a neutralizing mechanism. Each of the ion beam sources electrostatically accelerates a beam of ions of a working gas toward a plasma discharge region. The neutralizing mechanism at least partially neutralizes the ion beams before they enter the plasma discharge region. The neutralized beams enter the plasma discharge region and form a hot plasma that radiates photons. The photons may be in the soft X-ray or extreme ultraviolet wavelength range and, in one embodiment, have wavelengths in a range of about 10-15 nanometers.

Abstract: A vacuum processing apparatus performs processing such-as a pattern depiction with a charged beam within a process chamber evacuated to a high vacuum by an ion pump. The vacuum processing apparatus, which makes it possible to prevent the accuracy of the charged beam pattern depiction from being deteriorated by ions and electrons leaking from the ion pump, has a conductor and a voltage applying unit. The conductor is arranged in the vicinity of the suction port of the process chamber communicating with the ion pump such that the conductor is electrically insulated from the process chamber. The voltage applying unit imparts a potential differing from that of the process chamber to the conductor. Because of the potential difference between the conductor and the process chamber, the ions and electrons leaking from the ion pump are reflected or adsorbed by the conductor so as to suppress leakage of the ions and electrons into the process chamber.

Abstract: An ionizing rod comprising a core having an outer surface with a plurality of ionizing points disposed along the outer surface of the core. The plurality of ionizing points are sufficiently dense upon the core surface such that air between the plurality of ionizing points and an object is sufficiently ionized to remove static charge from the object. The core material can be electrically conductive, insulative, or static dissipative. The methods to attach the ionizing points to the core include a pullover sleeve, made of fibers including ionizing points, and glue to adhere either fibers in electrical communication or not in electrical communication depending on whether conductive or non-conductive adhesive are employed. Alternative embodiments include a means for the ionizing charged particles to travel to ground or electrically charged and a grip.

Abstract: A method of generating light comprising the step of applying an electric field to an excimer-forming gas such as a gas mixture containing noble gases and hydrogen or halogen, and providing free electrons in the gas. The electric field is configured to accelerate electrons to at least the energy required to form excimers, but in at least one region of the electric field, the field does not substantially ionize the gas, so that the field does not induce arcing through the gas. For example, electrons can be injected from one or more field emission electrodes (18) such as one or more a metal needle tip conductors, whereas the electric field can be a field between the field emission electrodes and a counterelectrode (13).

Abstract: An ion-implantation apparatus includes a chamber and a pressure controller for maintaining an internal pressure of the chamber at not less than 1E-4 Torr during an ion-implantation process.

Abstract: An ion pump anode eliminates the intercellular spaces while maintaining an efficient cell shape in which the plasma sheath follows the contour of the cell wall. The cell are preferably quasi-cylindrical and can be manufactured by folding one or more metal strip into a corrugation and welding the strip to create separate cells. By eliminating the intercellular region, which support a high plasma density, the formation of dendrites under such a region is prevented and instabilities caused by those dendrites are eliminated.

Abstract: A controller for controlling an electrical potential of an object with respect to its environment is described. The controller includes a micro-fabricated charge-emitting device connected to a space object situated in a space plasma environment. The charge-emitting device has a gate and an emitter. A voltage source applies a voltage across the gate and the emitter of the charge-emitting device to induce the emitter to emit into the environment electrical charge drawn from the object. In general, the magnitude of the applied voltage can be less than 100 volts. A control system varies the voltage applied between the gate and the emitter of the charge-emitting device. Varying the voltage adjusts the amount of electrical charge that is emitted by the emitter. Thus, by controlling the voltage, the control system can control the electrical potential of the space object with respect to the space plasma environment.

Abstract: A plasma processing apparatus for processing a substrate with a plasma is disclosed. The apparatus includes a first RF power source having a first RF frequency, and a process chamber. Further, the apparatus includes a substantially circular antenna operatively coupled to the first RF power source and disposed above a plane defined by the substrate when the substrate is disposed within the process chamber for processing. The substantially circular antenna being configured to induce an electric field inside the process chamber with a first RF energy generated by the first RF power source. The substantially circular antenna including at least a first pair of concentric loops in a first plane and a second pair of concentric loops in a second plane. The first pair of concentric loops and the second pair of concentric loops being substantially identical and symmetrically aligned with one another. The substantially circular antenna forming an azimuthally symmetric plasma inside the process chamber.

Abstract: Various embodiments of an ion implantation apparatus are provided. In one aspect, an apparatus for implanting a workpiece with ions is provided that includes a housing enclosing a first chamber. A source of accelerated ions is provided for directing a beam of ions through the first chamber toward the workpiece. A second chamber is provided for holding the workpiece along with a plurality of longitudinally spaced chambers that are defined by the housing and a plurality of longitudinally spaced bulkheads. Each of the bulkheads has an aperture enabling fluid communication between the plurality of longitudinally spaced chambers and the passage of the beam of ions. A source of gas is coupled to the second chamber. A pumping system is provided for evacuating the first chamber, the second chamber and the plurality of longitudinally spaced chambers. The pumping system and the plurality of longitudinally spaced chambers provide an increase in pressure between the first chamber and the second chamber.

Abstract: A short-arc discharge lamp (1) in accordance with the invention is provided with a light-transmitting, gastight lamp vessel (10), which is provided with an ionizable filling. A first electrode and a second electrode (11a, 11b), respectively, are arranged in the lamp vessel (10) and are each connected to a current conductor of their own (12a, 12b), respectively, which issues from the lamp vessel to the exterior. An ignition antenna (2) is arranged near the lamp vessel, which ignition antenna is connected to a further current conductor (24). The ignition antenna comprises an antenna vessel (20) and a further outer electrode (22), which antenna vessel (20) is closed in a gastight manner and provided with an ionizable filling, the further outer electrode (22) being connected to the further current conductor (24). According to the invention, the antenna encloses an electroconductive element. In this way, very small ignition delays are guaranteed, even if the lamp has been in a dark environment for some time.

Abstract: Large area atmospheric-pressure plasma jet. A plasma discharge that can be operated at atmospheric pressure and near room temperature using 13.56 MHz rf power is described. Unlike plasma torches, the discharge produces a gas-phase effluent no hotter than 250° C. at an applied power of about 300 W, and shows distinct non-thermal characteristics. In the simplest design, two planar, parallel electrodes are employed to generate a plasma in the volume therebetween. A “jet” of long-lived metastable and reactive species that are capable of rapidly cleaning or etching metals and other materials is generated which extends up to 8 in. beyond the open end of the electrodes. Films and coatings may also be removed by these species. Arcing is prevented in the apparatus by using gas mixtures containing He, which limits ionization, by using high flow velocities, and by properly spacing the rf-powered electrode.

Abstract: The present invention pertains to steady-state Ion-Beam Sources with an Anode Layer provided by a quadrupole magnetic system formed by a pair of long conductive magnets having U-shape cross-sections and positioned symmetrically above and along a plane and the long anode of nonmagnetic material. The conductive magnets of the quadrupole magnetic system serve as cathodes having an invariable discharge gap with the anode surface faced to the poles of the magnetic system having an invariable magnetic gap defining the width of the generated Ion Beam. The operating configuration of the Ion-Beam Source also comprises a gas-distributing system providing a uniform gas distribution into the gas-discharge gap, an anode water-cooling system (the anode bar has special holes), and a cathode water-cooling system. The Ion-Beam Source may be designed in a long linear style with a quasi-closed and closed electron drift, and in a round style with a closed electron drift.

Abstract: A cold-cathode type ion-beam source with a closed-loop ion-emitting slit and electrons drifting in crosses electric and magnetic fields is characterized by the absence of a metal anode which is replaced by a pair of positively charged bodies, such as concentric rings of a conductive material which are located inside a hollow housing of the ion source and are connected to a source of a positive potential. The ion-emitting slit is located between these rings in an upstream position in the direction of propagation of the ion beam. Replacement of a metallic anode with an anodic plasma, i.e., with a “virtual anode”, which is formed by a Penning-type discharge, descreases contamination of the ion beam by products of erosion of a metallic anode and increases the ion beam current, which results in more effective ionization of the workout gas.

Abstract: A control system and process for operating a charged-particle source which achieves gating of the charged-particle beam without a mechanical shutter and with very short transition between the beam “on” and beam “off” states is presented. The process and control system provide very precise control of the duration of the charged-particle extraction.

Abstract: A specially designed magnetic shunt is provided encircling the anode region and/or annular gas distribution area of an ion accelerator with closed electron drift. The magnetic shunt is constructed to concentrate the magnetic field at the ion exit end, such that the location of maximum magnetic field strength is located downstream from the inner and outer magnetic poles of the accelerator. The specially designed shunt also results in desired curvatures of magnetic field lines upstream of the line of maximum magnetic field strength, to achieve a focusing effect for increasing the life and efficiency of accelerator.