Electron Or Ion Beam Deflecting Type Patents (Class 335/210)
  • Patent number: 9305741
    Abstract: A wide range tunable magnetic lens for the desktop electron microscope is provided. The wired range tunable magnetic lens comprises a coil support, an inner pole piece, a permanent-magnet, a first outer pole piece and a second outer pole piece. The inner pole piece covers the coil support and forms a first magnetic-circuit gap. The permanent-magnet forms a ring structure according to the central axis and is disposed at the outer side of the inner pole piece away from the central axis. The first outer pole piece is adjacently disposed at the upper-side of the permanent-magnet and extends to the central hole of the coil support. The second outer pole piece is adjacently disposed at the under-side of the permanent-magnet and extends to the central hole of the coil support, wherein the first outer pole piece and the second outer pole piece forms a second magnetic-circuit gap.
    Type: Grant
    Filed: November 3, 2014
    Date of Patent: April 5, 2016
    Assignee: NATIONAL TSING HUA UNIVERSITY
    Inventors: Wei-Yu Chang, Fu-Rong Chen, Te-Hui Lee, Tsu-Wei Huang
  • Patent number: 9275781
    Abstract: An undulator with a compact construction is provided that reduces weight, complexity and cost. The compact undulator system and methods provides mechanical integrity without compromising magnetic field quality.
    Type: Grant
    Filed: August 9, 2012
    Date of Patent: March 1, 2016
    Assignee: Cornell University
    Inventor: Alexander Temnykh
  • Patent number: 9247630
    Abstract: Various embodiments of undulators, methods of fabricating undulators, and systems incorporating undulators are described. Certain embodiments provide a compact, electromagnetic undulator. The undulator may comprise a substrate and one or more electromagnets, which may be formed on the substrate. Certain embodiments have a period not greater than about 5 mm. The undulator may be operatively coupled with a particle accelerator to provide a free electron laser system.
    Type: Grant
    Filed: November 9, 2012
    Date of Patent: January 26, 2016
    Assignee: The Regents of the University of California
    Inventors: Jere Harrison, Abhijeet Joshi
  • Patent number: 9123522
    Abstract: A broadband ion beam analyzer, used for isolating required ions from a broadband ion beam, comprises an upper magnetic pole (1), a lower magnetic pole (2), an upper excitation coil (3), a lower excitation coil (4), an analysis grating (7), and a magnetic yoke (5 and 6). The upper magnetic pole (1) and the lower magnetic pole (2) are both provided with a camber-shaped incident-end boundary (101) and a camber-shaped emergence side boundary (102). The camber radii (Rb) of the incident-end boundary (101) and of the emergence-end boundary (102) are equal to the deflection radius (R) of the required ions in the magnetic field. The required ions in the broadband ion beam are allowed to focus ideally at the mid-section of the magnetic field, to acquire an ideal focal spot having a size that equals to zero.
    Type: Grant
    Filed: November 2, 2012
    Date of Patent: September 1, 2015
    Assignee: BEIJING ZHONGKEXIN ELECTRONICS EQUIPMENT CO., LTD.
    Inventors: Libo Peng, Huiyue Long, Junyu Xie
  • Patent number: 8698094
    Abstract: A permanent magnetic lens array for charged-particle focusing includes a first sheet of soft magnetic material, wherein the first sheet of soft magnetic material includes a plurality of snorkel cone protrusions arranged in an array pattern, wherein each snorkel cone is axially symmetric and includes an opening passing from a first surface of the first sheet of soft magnetic material to a second surface of soft magnetic material, and a plurality of permanent magnetic elements, wherein each permanent magnetic element is axially symmetric and arranged concentrically with a snorkel cone of the first sheet of soft magnetic material, wherein the snorkel cones of the first sheet of soft magnetic material and the plurality of permanent magnetic elements are configured to form a plurality of magnetic lenses, wherein each magnetic lens has a magnetic field with an axial component oriented perpendicular to the first surface of the soft magnetic material.
    Type: Grant
    Filed: July 20, 2011
    Date of Patent: April 15, 2014
    Assignee: KLA-Tencor Corporation
    Inventors: Christopher Sears, Mehran Nasser-Ghodsi, Khashayar Shadman
  • Patent number: 8378312
    Abstract: A variety of systems, apparatus and methods for deflecting a particle beam are described. An apparatus comprises at least six electromagnetic portions disposed on a plane. Each of the at least six electromagnetic portions is aligned with a radius emanating from an axis normal to the plane and is distanced from the axis to form a volume about the axis. At least six coils are configured for affecting a dipole magnetic field in the volume in response to electrical currents applied to physically opposing coils where a particle beam entering the volume is deflected. Each of the at least six coils is disposed about a one of the at least six electromagnetic portions. A yoke structure is configured for returning a generated magnetic flux.
    Type: Grant
    Filed: August 19, 2011
    Date of Patent: February 19, 2013
    Assignee: Pyramid Technical Consultants, Inc.
    Inventors: John Gordon, Raymond Paul Boisseau, Andrew Dart
  • Patent number: 8314411
    Abstract: There is obtained a particle beam therapy system in which the beam size is reduced. There are provided an accelerator 14 that accelerates a charged particle beam; an irradiation apparatus that has a beam scanning apparatus 5a, 5b for performing scanning with the charged particle beam and irradiates the charged particle beam onto an irradiation subject; and a beam transport apparatus 15 that has a duct for ensuring a vacuum region or gas region that continues from the accelerator 14 to a beam outlet window 7 disposed at a more downstream position than the beam scanning apparatus 5a, 5b, and that transports the charged particle beam exiting from the accelerator 14 to the irradiation apparatus.
    Type: Grant
    Filed: April 24, 2009
    Date of Patent: November 20, 2012
    Assignee: Mitsubishi Electric Corporation
    Inventors: Hisashi Harada, Takaaki Iwata, Taizo Honda, Yuehu Pu, Yuichi Yamamoto, Toshihiro Otani, Hidenobu Sakamoto
  • Patent number: 8158954
    Abstract: The invention provides a lens system for a plurality of charged particle beams. The lens system comprises an excitation coil providing a magnetic flux to a pole piece unit having a first pole piece, a second pole piece and at least two openings for charged particle beams, wherein the two openings are arranged in one row, thereby forming a lens row, and wherein the pole piece unit has an elongated shape.
    Type: Grant
    Filed: June 26, 2009
    Date of Patent: April 17, 2012
    Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
    Inventor: Stefan Lanio
  • Patent number: 8153991
    Abstract: A direct write lithography system. The system includes a converter having an array of light controllable electron sources, each field emitter being arranged for converting light into an electron beam, the field emitters having an element distance between each two adjacent field emitters, each filed emitter having an activation area. A plurality of individually controllable light sources, each light source arranged for activating one field emitter. A controller controls each light source individually. Each electron beam is focused from the field emitters with a diameter smaller than the diameter of a light source on an object plane.
    Type: Grant
    Filed: June 10, 2005
    Date of Patent: April 10, 2012
    Assignee: Mapper Lithography IP B.V.
    Inventor: Pieter Kruit
  • Patent number: 8106370
    Abstract: A cyclotron that includes a magnet assembly to produce a magnetic field to direct charged particles along a desired path. The cyclotron also includes a magnet yoke that has a yoke body that surrounds an acceleration chamber. The magnet assembly is located in the yoke body. The yoke body forms a pump acceptance (PA) cavity that is fluidicly coupled to the acceleration chamber. The cyclotron also includes a vacuum pump that is configured to introduce a vacuum into the acceleration chamber. The vacuum pump is positioned in the PA cavity.
    Type: Grant
    Filed: May 5, 2009
    Date of Patent: January 31, 2012
    Assignee: General Electric Company
    Inventors: Jonas Norling, Tomas Eriksson
  • Patent number: 8063364
    Abstract: A particle optical apparatus has a particle source for generating at least one beam of charged particles, and a magnet arrangement having two pole plates, which are arranged spaced apart from one another, such that the at least one beam of charged particles in operation passes through the pole plates, wherein trenches are provided in the pole plates, in which trenches coil wires are arranged. The trenches, when viewed in a cross section transverse to an extension direction of the trenches, have a smaller width in a region of a surface of the pole plates, than in a region arranged at a distance from the surface.
    Type: Grant
    Filed: December 22, 2009
    Date of Patent: November 22, 2011
    Assignee: Carl Zeiss NTS GmbH
    Inventors: Dirk Preikszas, Michael Steigerwald, Daniel Tobias, Andreas Eisele, Momme Mommsen, Dietmar Doenitz, Christian Hendrich
  • Patent number: 8049182
    Abstract: A charged particle filter comprises a magnetic deflector and an outer shield. The magnetic deflector has a bore along an axis thereof passing through the deflector from a specimen end to a detector end of the deflector and through which charged particles pass when in use. The deflector is formed from one or more magnets positioned around the bore in a Halbach configuration thereby generating a relatively high magnetic field strength within the bore and a relatively low magnetic field strength outside of the deflector. The deflector has a geometry defining an outer surface and an inner surface, wherein each of the outer and inner surfaces of the deflector taper towards the axis as a respective function of distance in the specimen direction along the axis.
    Type: Grant
    Filed: January 12, 2010
    Date of Patent: November 1, 2011
    Assignee: Oxford Instruments Nanotechnology Tools Limited
    Inventor: Angus Bewick
  • Patent number: 7994739
    Abstract: A betatron magnet having at least one electron injector positioned approximate an inside of a radius of a betatron orbit, the betatron magnet further includes a first guide magnet having a first pole face and a second guide magnet having a second pole face. Both the first and the second guide magnet have a centrally disposed aperture and the first pole face is separated from the second pole face by a guide magnet gap. A core is disposed within the centrally disposed apertures in an abutting relationship with both guide magnets. The core has at least one core gap. A drive coil is wound around both guide magnet pole faces. An orbit control coil has a core portion wound around the core gap and a field portion wound around the guide magnet pole faces. The core portion and the field portion are connected but in opposite polarity.
    Type: Grant
    Filed: December 14, 2008
    Date of Patent: August 9, 2011
    Assignee: Schlumberger Technology Corporation
    Inventor: Felix K. Chen
  • Patent number: 7977895
    Abstract: A perturbation device for a charged particle circulation system, capable of readily generating a distribution profile of a perturbation magnetic field, is provided. By partially superposing a perturbation magnetic field on a main magnetic field for circulating charged particles, perturbation is produced in trajectories of the charged particles. Then, the charged particles that have been injected into the charged particle circulation system are captured into a stable circular closed orbit. Using a leakage magnetic field formed of a magnetic field generated by magnetic field generation devices, each including a high-frequency coil, the perturbation magnetic field is generated.
    Type: Grant
    Filed: March 27, 2007
    Date of Patent: July 12, 2011
    Assignees: Photon Production Laboratory Ltd.
    Inventor: Hironari Yamada
  • Publication number: 20110148297
    Abstract: A multi-column electron beam exposure apparatus includes: multiple column cells; an electron beam converging unit in which two annular permanent magnets and electromagnetic coils are surrounded by a ferromagnetic frame, each of the two annular permanent magnets being magnetized in an optical axis direction and being symmetrical about the optical axis, the electromagnetic coils disposed near the annular permanent magnets and used to adjust magnetic fields of the annular permanent magnets; and a substrate provided with circular apertures through which electron beams used in the column cells pass, respectively, the substrate having the electron beam converging unit disposed in a side portion of each of the circular apertures. The two annular permanent magnets may be disposed one above the other in the optical axis direction with same polarities facing each other, and the electromagnetic coils may be provided inside or outside the annular permanent magnets in their radial direction.
    Type: Application
    Filed: December 22, 2010
    Publication date: June 23, 2011
    Inventors: Hiroshi Yasuda, Yoshihisa Ooae, Takeshi Haraguchi
  • Patent number: 7868301
    Abstract: A device for deflecting a beam of electrically charged particles onto a curved particle path is provided. The device includes at least one beam guidance magnet having a coil system which has at least one coil that is curved along the particle path for the purpose of deflecting the beam onto a curved particle path, and at least one scanner magnet for variably deflecting the beam in a y,z plane at right angles to the particle path, characterized in that the device has at least one correction system which is embodied to influence the particle path in a regulated or controlled manner with the aid of electric and/or magnetic fields as a function of the position of the beam in the y,z plane. The invention also relates to a corresponding method for deflecting a beam of electrically charged particles onto a curved particle path.
    Type: Grant
    Filed: October 10, 2008
    Date of Patent: January 11, 2011
    Assignee: Siemens Aktiengesellschaft
    Inventor: Dirk Diehl
  • Publication number: 20100328000
    Abstract: A magnetohydrodynamic simulator that includes a plasma container. The magnetohydrodynamic simulator also includes an first ionizable gas substantially contained within the plasma container. In addition, the magnetohydrodynamic simulator also includes a first loop positioned adjacent to the plasma container, wherein the first loop includes a gap, a first electrical connection on a first side of the gap, a second electrical connection of a second side of the gap, and a first material having at least one of low magnetic susceptibility and high conductivity. The first loop can be made up from an assembly of one or a plethora or wire loop coils. In such cases, electrical connection is made through the ends of the coil wires. The magnetohydrodynamic simulator further includes an electrically conductive first coil wound about the plasma container and through the first loop.
    Type: Application
    Filed: July 15, 2010
    Publication date: December 30, 2010
    Inventor: Nassim Haramein
  • Patent number: 7812319
    Abstract: A beam guiding magnet includes a first and second coil system, which are designed such that the dipole moments of the first and second coil systems point in opposite directions. Since the dipole moments of the first and second coil systems point in opposite directions, the two dipole moments at least partially compensate for one another. The resultant dipole moment of the beam guiding magnet may be reduced. The beam guiding magnet may take into account that the remote field of a beam guiding magnet can be lowered by a reduction in the dipole moment of the beam guiding magnet. The dipole moment decreases with the cube of the distance from the beam guiding magnet. A quadruple moment, which on attenuation of the dipole moment represents the next strongest field component, decreases with the fifth power of that distance.
    Type: Grant
    Filed: April 30, 2008
    Date of Patent: October 12, 2010
    Assignee: Siemens Aktiengessellschaft
    Inventors: Dirk Diehl, Rene Gumbrecht, Eva Schneider
  • Publication number: 20100231335
    Abstract: A perturbation device for a charged particle circulation system, capable of readily generating a distribution profile of a perturbation magnetic field, is provided. By partially superposing a perturbation magnetic field on a main magnetic field for circulating charged particles, perturbation is produced in trajectories of the charged particles. Then, the charged particles that have been injected into the charged particle circulation system are captured into a stable circular closed orbit. Using a leakage magnetic field formed of a magnetic field generated by magnetic field generation devices 113A and 113B each including a high-frequency coil, the perturbation magnetic field is generated.
    Type: Application
    Filed: March 27, 2007
    Publication date: September 16, 2010
    Applicants: Hironari, Photon Production Laboratory, Ltd.
    Inventor: Hironari Yamada
  • Patent number: 7755060
    Abstract: There is disclosed a multipole lens that can be machined with improved accuracy. A method of fabricating this lens is also disclosed. The multipole lens has a blank material from which polar elements will be fabricated. The blank material is sandwiched vertically between two layers of film-like insulator. The blank material and the two layers of film-like insulator are sandwiched vertically between an upper ring and a lower ring. These members are provided with injection holes for injecting a curing agent. The injection holes of these members are aligned. The curing agent is injected into the holes and cured. Then, the blank material is machined by electric discharge machining to form the polar elements.
    Type: Grant
    Filed: April 9, 2007
    Date of Patent: July 13, 2010
    Assignee: JEOL Ltd.
    Inventor: Eiji Kawai
  • Publication number: 20100148086
    Abstract: The present invention relates, in general, to a deflector for microcolumns for generating electron beams, and, more particularly, to a deflector capable of scanning or shifting electron beams or functioning as a stigmator using a magnetic field. The deflector (100) according to the present invention includes one or more deflector electrodes. Each of the deflector electrodes includes a core (12) made of a conductor or a semiconductor, and a coil (11) wound around the core (12).
    Type: Application
    Filed: May 15, 2008
    Publication date: June 17, 2010
    Inventors: Ho Seob Kim, Young Chul Kim
  • Publication number: 20100150312
    Abstract: A betatron magnet having at least one electron injector positioned approximate an inside of a radius of a betatron orbit, the betatron magnet further includes a first guide magnet having a first pole face and a second guide magnet having a second pole face. Both the first and the second guide magnet have a centrally disposed aperture and the first pole face is separated from the second pole face by a guide magnet gap. A core is disposed within the centrally disposed apertures in an abutting relationship with both guide magnets. The core has at least one core gap. A drive coil is wound around both guide magnet pole faces. An orbit control coil has a core portion wound around the core gap and a field portion wound around the guide magnet pole faces. The core portion and the field portion are connected but in opposite polarity.
    Type: Application
    Filed: December 14, 2008
    Publication date: June 17, 2010
    Applicant: Schlumberger Technology Corporation
    Inventor: Felix K. Chen
  • Patent number: 7663327
    Abstract: A permanent magnet focusing system includes an electron gun that provides an electron ribbon beam having an elliptical shape. A plurality of permanent magnets provide transport for the electron ribbon beam. The permanent magnets produce a non-axisymmetric periodic permanent magnet (PPM) focusing field to allow the electron ribbon beam to be transported in the permanent magnet focusing system.
    Type: Grant
    Filed: May 15, 2006
    Date of Patent: February 16, 2010
    Assignee: Massachusetts Institute of Technology
    Inventors: Ronak J. Bhatt, Chiping Chen, Jing Zhou, Alexey Radovinsky
  • Patent number: 7612348
    Abstract: A voltage-isolating passageway for providing high voltage isolation between a component maintained at high DC voltage and a component maintained at a substantially lower voltage is described. The voltage-isolating passageway incorporates a transverse magnetic field across its passageway, which reduces the potential energy of charged particles (e.g., electrons) passing through the passageway. The voltage-isolating passageway includes a passageway and at least two magnets. The passageway has two openings and the two magnets are positioned along opposite and exterior surfaces of the passageway wherein the first and second magnets impose a magnetic field in a transverse direction with respect to a lengthwise axis of the passageway. In one embodiment, each of the passageways have small diameters and transfer gases at small flow rates.
    Type: Grant
    Filed: May 22, 2008
    Date of Patent: November 3, 2009
    Assignee: KLA-Technologies Corporation
    Inventors: Alexander Jozef Gubbens, Niles Kenneth MacDonald, Mehran Nasser-Ghodsi, Rudy Flores Garcia, Doug Keith Masnaghetti
  • Patent number: 7579602
    Abstract: This disclosure describes an ion implanter having a collimator magnet that is configured to shape an ion beam. A first deceleration stage is configured to manipulate energy of the ion beam shaped by the collimator magnet. A neutral filter magnet is configured to filter neutral atoms from the ion beam passing through the first deceleration stage.
    Type: Grant
    Filed: December 22, 2006
    Date of Patent: August 25, 2009
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Victor M. Benveniste, Christopher W. Campbell, Frank Sinclair
  • Publication number: 20090153279
    Abstract: A betatron includes a betatron magnet with a first guide magnet having a first pole face and a second guide magnet having a second pole face. Both the first and the second guide magnet have a centrally disposed aperture and the first pole face is separated from the second pole face by a guide magnet gap. A core is disposed within the centrally disposed apertures in an abutting relationship with both guide magnets. The core has at least one core gap. A drive coil is wound around both guide magnet pole faces. An orbit control coil has a contraction coil portion wound around the core gap and a bias control portion wound around the guide magnet pole faces. The contraction coil portion and the bias control portion are connected but in opposite polarity. Magnet fluxes in the core and guide magnets return through peripheral portions of the betatron magnet.
    Type: Application
    Filed: December 14, 2007
    Publication date: June 18, 2009
    Applicant: SCHLUMBERGER TECHNOLOGY CORPORATION
    Inventor: Felix Chen
  • Patent number: 7429740
    Abstract: An electric-magnetic field-generating element and a multipole element comprising a plurality of these field-generating elements providing for a stable charged particle beam are described. For some embodiments, the electric-magnetic field-generating element includes a pole piece, a yoke to which the pole piece is attached, at least one coil, a vacuum-tight container accommodating the coil(s), and a holder adapted to hold the vacuum-tight container such that the vacuum-tight container is spaced from the pole piece and the yoke.
    Type: Grant
    Filed: July 10, 2006
    Date of Patent: September 30, 2008
    Assignee: ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
    Inventors: Carlo Salvesen, Ralf Degenhardt
  • Patent number: 7411342
    Abstract: Electromagnetic deflection unit for colour cathode-ray tubes, including a pair of frame deflection coils and a pair of line deflection coils, at least one of these two pairs of coils having the shape of a saddle, each saddle-shaped deflection coil having a rear bundle placed on the side facing the electron gun and a front bundle placed on the side facing the screen, two lateral harnesses of conductors connecting the front bundle to the rear bundle, each lateral harness being characterized in that the external edge of the said lateral harness lies in a radial angular position close to 0° at the rear of the coil and in a radial angular position greater than 5° at the front of the coil, so as to minimize the trapezoid differential error between the red and blue beams.
    Type: Grant
    Filed: March 23, 2000
    Date of Patent: August 12, 2008
    Assignee: Thomson Licensing
    Inventors: Nacerdine Azzi, Olivier Masson, Sebastien Volatier
  • Patent number: 7402816
    Abstract: One or more electron sources are utilized to inject electrons into an ion beam being transported between the polepieces of a magnet. In some embodiments, the electron sources are located in cavities in one or both polepieces of the magnet. In other embodiments, a radio frequency or microwave plasma flood gun is located in a cavity in at least one of the polepieces or between the polepieces.
    Type: Grant
    Filed: November 17, 2005
    Date of Patent: July 22, 2008
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Anthony Renau, Donna L. Smatlak, James Buff, Eric Hermanson
  • Patent number: 7326941
    Abstract: This invention discloses an ion implantation apparatus with multiple operating modes. It has an ion source and an ion extraction means for extracting a ribbon-shaped ion beam therefrom. The ion implantation apparatus includes a magnetic analyzer for selecting ions with specific mass-to-charge ratio to pass through a mass slit to project onto a substrate. Multipole lenses are provided to control beam uniformity and collimation. The invention further discloses a two-path beamline in which a second path incorporates a deceleration system incorporating energy filtering. The invention discloses methods of ion implantation in which the mode of implantation may be switched from one-dimensional scanning of the target to two-dimensional scanning, and from a simple path to an s-shaped path with deceleration.
    Type: Grant
    Filed: August 22, 2005
    Date of Patent: February 5, 2008
    Assignee: Advanced Ion Beam Technology, Inc.
    Inventors: Jiong Chen, Nicholas R. White
  • Patent number: 7183703
    Abstract: A cathode ray tube comprises a panel having a fluorescent screen on an inner surface; a funnel connected to the panel, an electron gun housed in the funnel; emitting electron beams; and a shadow mask for selecting colors of the electron beams emitted from the electron gun, wherein the deflection yoke comprises a deflection coil for deflecting the electron beams in horizontal and vertical directions, a holder for insulating the deflection coil, and a ferrite core for reducing a magnetic field generated by the deflection coil, and an opening is formed on a flange portion of an opening section on a screen side of the deflection coil.
    Type: Grant
    Filed: November 10, 2003
    Date of Patent: February 27, 2007
    Assignee: LG.Philips Displays Korea Co., Ltd.
    Inventor: Se Cheon Lim
  • Patent number: 7157998
    Abstract: A ferrite core constituting a deflection yoke has a plurality of ridge-shaped convex portions on an inner circumferential surface. In a cross-section orthogonal to a center axis, the cross-sectional shape of an outer circumferential surface of the ferrite core is substantially circular, and the cross-sectional shape of an inner circumferential surface of the ferrite core excluding the convex portions is substantially circular in the vicinity of an end on a large diameter side of the ferrite core and is substantially rectangular in a portion between the vicinity of an end on a small diameter side and the vicinity of the end on the large diameter side. This can provide a low-cost color picture tube apparatus with a reduced deflection power and satisfactory productivity.
    Type: Grant
    Filed: April 4, 2005
    Date of Patent: January 2, 2007
    Assignee: Matsushita Toshiba Picture Display Co., Ltd.
    Inventors: Etsuji Tagami, Akitsugu Ishii
  • Patent number: 7112789
    Abstract: The present invention provides a windowframe magnet having an aligned array of paired bedstead coils in mirror symmetry can bend a high aspect ratio ribbon ion beam through angle of not less than about 45 degrees and not more than about 110 degrees, and can focus it through a resolving slot for mass analysis. The long transverse axis of the beam, which can exceed 50% of the bend radius, is aligned with the generated magnetic field. The array of paired bedstead coils provide tight control of the fringing fields, present intrinsically good field uniformity, and enable a manufacture of much lighter construction than other magnet styles conventionally in use in the ion implantation industry. Within the system of the present invention, the ribbon beam is refocused with low aberration to achieve high resolving power, which is of significant value in the ion implantation industry. System size is further reduced by using a small ion source and a quadrupole lens to collimate the beam after expansion and analysis.
    Type: Grant
    Filed: May 6, 2005
    Date of Patent: September 26, 2006
    Inventors: Nicholas R. White, Jiong Chen
  • Patent number: 7078853
    Abstract: A deflection apparatus for a cathode ray tube includes a horizontal deflection coil, a vertical deflection coil positioned external to the horizontal deflection coil, an insulating member interposed between the horizontal and the vertical deflection coils, and a core placed on the insulating member while being connected to the vertical deflection coil. The horizontal deflection coil, the vertical deflection coil, the insulating member and the core have at least one sectional structure proceeding perpendicular to the tube axis of the cathode ray tube. With any one of the horizontal and the vertical deflection coils, the sectional structure is formed with a combination of arcs corresponding to a horizontal axis X, a vertical axis Y and a diagonal axis between the horizontal and the vertical axes X and Y. The arc corresponding to the horizontal axis X or the vertical axis Y is formed with an arc centering around a point on the axis other than the horizontal axis X or the vertical axis Y.
    Type: Grant
    Filed: February 10, 2003
    Date of Patent: July 18, 2006
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Sung-Gu Hwang, Yasunobu Kuwahara
  • Patent number: 7019308
    Abstract: A device for influencing an electron beam, for example a beam deflecting device in an electron beam lithography machine, comprises a beam influencing coil (13) operable to influence an electron beam (EB) in the vicinity of the device by way of a magnetic field and a heat dissipation compensating coil (14) operable to provide a heat output so compensating for any change in heat dissipation of the device due to operation of the beam influencing coil (13)—particularly variable operation to vary the field intensity or to create and remove a field—as to reduce the amount of change, preferably to maintain the net heat dissipation at a constant value. The compensating coil (13) can be controlled, for example, by measurement (19) of the heat dissipation of the device and calculating (18) current supply (16) to the coil (13) in dependence on the measured dissipation.
    Type: Grant
    Filed: September 1, 2004
    Date of Patent: March 28, 2006
    Assignee: Leica Microsystems Lithography Ltd.
    Inventor: Andrew Dean
  • Patent number: 7005788
    Abstract: Deflection yoke for cathode-ray tubes with a north/south geometry correction comprising a pair of horizontal deflection coils and a pair of vertical deflection coils, the two pairs being isolated one from the other by a separator, a ferrite ring at least partly covering the deflection coils and having a flared front part, the deflection yoke comprising in its front region at least one pair of magnetic means to modify locally the magnetic field in the said front region and to correct the geometry of the image created on the screen of the tube, the magnetic means being placed in the space in such a way that, for a plane containing the longitudinal axis of the deflection yoke and the axis of symmetry of a magnetic means, and for the point M of the plain corresponding to the point of minimum coordinates of the said means, the intersection of the ring with is at least partly in its front part, located outside the region delimited by the half line passing through M and perpendicular to Z, and the half line passing
    Type: Grant
    Filed: March 26, 2003
    Date of Patent: February 28, 2006
    Assignee: Thomson Licensing
    Inventors: Nacerdine Azzi, Céline Cossu, Sébastien Volatier
  • Patent number: 6949875
    Abstract: A deflection yoke for a cathode ray tube includes a ferrite core that has a body that is funnel-shaped and with an inner surface and an outer surface, the inner surface of the ferrite core including a first section formed as a circle with a predetermined, unvarying radius; a second section formed as a circle with a varying radius, the second section being connected to the first section; and a third section having a non-circular cross section and connected to the second section.
    Type: Grant
    Filed: July 9, 2003
    Date of Patent: September 27, 2005
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Sung-Gu Hwang, Yasunobu Kuwahara
  • Patent number: 6943490
    Abstract: A deflection yoke mounted on a rear portion of a cathode ray tube (CRT) to deflect an electron beam emitted from an electron gun of the CRT includes a coil separator mounted on the CRT, a horizontal deflection coil mounted on an inside of the coil separator, having a first section generating a horizontal deflection magnetic field deflecting the electron in a horizontal direction and having a first radius, having a second section generating a magnetic field to weaken the horizontal deflection magnetic field and having a second radius different from the first radius, a vertical deflection coil mounted on an outside of the coil separator and generating a vertical deflection magnetic field deflecting the electron beam in a vertical direction, and a ferrite core covering a portion of the vertical deflection coil to strengthen the horizontal deflection magnetic field and the vertical deflection magnetic field.
    Type: Grant
    Filed: December 13, 2002
    Date of Patent: September 13, 2005
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Chang Ju Lim, Jae Jung Kim, Hwan Seok Choe
  • Patent number: 6924590
    Abstract: A color picture tube device has a funnel glass, a pair of horizontal deflection coils, an insulating frame, and a pair of vertical deflection coils. The pair of horizontal deflection coils are opposed to each other in a vertical direction around the outer surface of the funnel glass, and each have a window at the center. The insulating frame covers the horizontal deflection coils, resembles in shape a part of the funnel glass where the horizontal deflection coils are provided, and has openings in areas corresponding to windows of the horizontal deflection coils. The pair of vertical deflection coils are opposed to each other in a horizontal direction around the outer surface of the insulating frame, without overlapping the openings. A pair of correction coils are provided so as to be each at least partially inserted in a different one of the openings.
    Type: Grant
    Filed: February 14, 2003
    Date of Patent: August 2, 2005
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Etsuji Tagami, Hiroshi Sakurai
  • Patent number: 6914248
    Abstract: A particle-optical apparatus is proposed as well as a method for operating the same. The particle-optical apparatus provides a magnetic field for deflecting charged particles of a beam of charged particles and comprises a body of a material with a permeability number around which a current conductor at least partially engages and a temperature-adjusting unit for adjusting a temperature of the magnetic-flux-carrying body substantially to a nominal temperature. A relative variation of the permeability number relative to a width of a temperature range is to be smaller than a limit value a, wherein a is preferably smaller than 3·10?3K?1. In particular, the nominal temperature is at an extremum of a temperature dependence of the permeability number. Preferably, such a particle-optical apparatus can be employed in a microscopy or a lithography apparatus.
    Type: Grant
    Filed: August 1, 2003
    Date of Patent: July 5, 2005
    Assignee: Carl Zeiss NTS GmbH
    Inventor: Wilfried Clauss
  • Patent number: 6914505
    Abstract: The invention provides a deflection yoke comprising: a tube-shaped core made of a magnetic material that has on its inner wall, ridges each of which extends along the CRT axis direction, the ridges being arranged circumferentially at intervals and thereby forming slots; a vertical deflection coil wound so that part of its length is disposed in the slots; and a horizontal deflection coil wound so that part of its length is disposed in the slots, wherein the slots include (a) first slots in which one of the horizontal deflection coil and the vertical deflection coil is disposed and (b) second slots in which both of the deflection coils are disposed, and the bottom of each first slot is, for part or all of the length of the slot, closer to the external surface of the evacuated envelope than the bottom of each second slot is.
    Type: Grant
    Filed: May 30, 2003
    Date of Patent: July 5, 2005
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventor: Kenichiro Taniwa
  • Patent number: 6911885
    Abstract: Disclosed is a deflection yoke to improve screen quality, including a coiling density adjustment groove formed along a vertical direction of a coil by way of increasing the coiling density at an arbitrary portion of the electric field at the internal side of the deflection coil. To this end, a winding frame is provided for winding coil around the deflection yoke, having a curvature of a designated shape at the center, in which the winding frame includes a wire position guide that projects as much as a designated width to a vertical direction of a coil to be wound around an arbitrary portion of the internal electric field for increasing a coiling density.
    Type: Grant
    Filed: February 27, 2002
    Date of Patent: June 28, 2005
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Gyoung Su Kim, Young Gil Namgong, Cheong Moon Lee, Seok Hwan Hwang
  • Patent number: 6906333
    Abstract: A magnetic sector for charged particle beam transport that includes a magnetic field profile that achieves a linear dispersion from a collimated beam of charged particles proportional to their mass-energy-to-charge ratio. In one embodiment, the field profile necessary for the linear dispersion is obtained by the use of shaped, highly permeable poles powered by permanent magnets or electromagnetic coils.
    Type: Grant
    Filed: January 22, 2004
    Date of Patent: June 14, 2005
    Assignees: University of Washington, STI Optronics Inc.
    Inventors: Adi A. Scheidemann, Kem Robinson, Patrick L. Jones, Stephen C. Gottschalk
  • Patent number: 6888325
    Abstract: Disclosed is a method for correcting inner pin distortion generated in the CRT product and deflection yoke thereof. According to the disclosed method and deflection yoke thereof, the additional circuit for suppressing inner pin distortion phenomenon on the screen is not required as the related art, reduction in manufacturing costs is possibly achieved. Also, as the circuit for suppressing pincushion is not used, power dissipation could be reduced, and instability in dispersion and characteristics of a pin in the middle portion due to increase of dispersion generation by a wiring of a coil could be resolved.
    Type: Grant
    Filed: June 23, 2003
    Date of Patent: May 3, 2005
    Assignee: Samsung Electro-Mechanics Co., Ltd
    Inventors: Yun Ki Hong, Hwan Seok Choe, Gong Hee Park
  • Patent number: 6885143
    Abstract: A cathode ray tube is provided, and more particularly, a cost-effective cathode ray tube effective for minimizing deterioration of color purity and obtaining a sufficient margin for a beam strike neck (BSN) phenomenon by moving a ½ center (deflection center) closer to a panel without changing the curvature of a funnel or the thickness of a glass inside the funnel.
    Type: Grant
    Filed: March 20, 2003
    Date of Patent: April 26, 2005
    Assignee: LG. Philips Displays Korea Co., Ltd.
    Inventor: Hyuk Dong Kim
  • Patent number: 6882097
    Abstract: A deflection yoke apparatus include a saddle-type coil bobbin, first guide grooves, second guide groove, third guide groove, and a multi-wire conductor. The saddle-type coil bobbin has a front end portion and a rear end portion. The first guide grooves is formed in the inner surface of the coil bobbin and extends across the front end portion and the rear end portion. The second guide groove is formed in the front end portion of the coil bobbin. The third guide groove is formed in the rear end portion of the coil bobbin. The multi-wire conductor is wound around the coil bobbin, the conductor being routed through the first guide groove, the second guide groove, and the third guide groove. The second guide groove and third guide groove have a width in a range of 1.0 to 1.5 times the diameter of the conductor.
    Type: Grant
    Filed: November 27, 2001
    Date of Patent: April 19, 2005
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Fumio Abe, Takashi Sugahara
  • Patent number: 6879095
    Abstract: A deflection yoke on a yoke mounting portion with a truncated pyramid shape has a pair of saddle-type horizontal deflecting coils that is located symmetrically with a central axis and has a truncated pyramid shape. A core with a truncated cone shape is coaxially located on the outer periphery of the horizontal deflecting coils. A pair of vertical deflecting coils are toroidally wound around the core. If the positions of a horizontal axis and a vertical axis are given by 0° and 90°, respectively, in the circumference direction around the central axis, the winding of one vertical deflecting coil has a starting point on the horizontal-axis side within the range of 5°-30° and is distributed from the starting point to 90° and wound symmetrically with the vertical axis. The windings of the vertical deflecting coils are wound symmetrically with the horizontal axis.
    Type: Grant
    Filed: October 28, 2003
    Date of Patent: April 12, 2005
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yoshiaki Ito, Tadahiro Kojima, Takashi Murai, Masatsugu Inoue
  • Patent number: 6833662
    Abstract: The invention relates to a cathode ray tube comprising means (5) for generating an electron beam (6,7,8), means (51) for deflecting the electron beam, and a coil (14′) for influencing a deflection of the electron beam (6,7,8). The coil (14′) comprises an electrically conductive coil holder (46) and coil windings (47,48) having an electrically conductive outer layer (44). The electrically conductive layer (44) of the coil wires (41) and the coil holder (46) cooperate with each other so as to form a conductive path A between successive coil windings (47,48). Due to the outer layer (44) of the wires and the conductive coil holder (46) an electrical path A between successive windings (47,48) is created that provides damping and by which ringing is suppressed.
    Type: Grant
    Filed: September 4, 2002
    Date of Patent: December 21, 2004
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Dirk Willem Harberts, Ralph Wilhelmus Lambertus Johannus Dams
  • Patent number: 6833661
    Abstract: The invention relates to a deflection unit for cathode ray tubes in which the energy for deflection is reduced. This is done by providing a magnetic material between frame coils and line coils of the deflection unit. In an advantageous embodiment of the invention, first void spaces as well as second void spaces between the frame coils and a yoke ring and/or third void spaces between wire strands of the frame coils are filled. A deflection energy reduction of up to 30% can be obtained.
    Type: Grant
    Filed: December 26, 2001
    Date of Patent: December 21, 2004
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Pim Theo Tuyls, Michel Cornelis Josephus Marie Vissenberg, Johannes Maria Maassen, Nicolaas Gerrit Vink, Albertus Aemilius Seyno Sluyterman, Wilhelmus Henrica Cornelis Theuws, Tjerk Gerrit Spanjer
  • Publication number: 20040246081
    Abstract: A deflecting yoke apparatus comprising first and second frame coils configured to correct a vertical horizontal misconvergence first and second main coils and first and second sub-coils which are wound around a core and configured to deflect in a vertical direction electron beams which have passed through a magnetic field generated by the first and second frame coils, a first deflecting current supply portion configured to pass a serriform deflecting current to the first and second main coils, and a second deflecting current supply portion configured to supply to the first and second sub-coils through a first and second diodes connected in parallel so as to have opposed directions a deflecting current which is supplied to the first and second main coils by the first deflecting current supply portion.
    Type: Application
    Filed: April 12, 2004
    Publication date: December 9, 2004
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Yusaku Shiro, Takayoshi Tomioka