Vacuum Patents (Class 34/92)
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Publication number: 20030014879Abstract: Freeze-dried products of high quality produced from materials to be freeze-dried in a freeze-drying apparatus comprising a sealed vessel enclosing a processing chamber provided therein with a rotary cage receiving a gas-permeable container containing frozen pieces of the said material, prepared by freezing the said material with a refrigerant, and a heating device for heating the frozen material by radiant heat rays, wherein the freeze-dried product is produced by a process which can attain, even when dry ice is used as the refrigerant, efficient sublimating removal of large amount of carbon dioxide gas evolved from dry ice and of moisture included in the material, while preventing adhesion of the frozen pieces of the said material to each other and while permitting reduction of the sublimation duration, wherein the frozen material retained in the gas-permeable container placed in the rotary cage is heated uniformly by the heating device under vacuum condition while it is being maintained under rotational movType: ApplicationFiled: September 20, 2002Publication date: January 23, 2003Inventor: Akira Horigane
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Publication number: 20030009904Abstract: When atmosphere inside a wafer carrier is replaced by introducing a gas into the wafer carrier from a gas inlet provided to the wafer carrier that can accommodate wafers. At the same time, the atmosphere inside the wafer carrier is sucked to make an inside pressure negative relative to an outside pressure.Type: ApplicationFiled: July 10, 2002Publication date: January 16, 2003Applicant: SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC.Inventor: Kenji Tokunaga
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Patent number: 6505415Abstract: A vacuum processing apparatus which includes a cassette mount table for holding at least one cassette, a conveying structure which includes a robot for conveying a wafer held on the cassette mount table, a vacuum loader which includes an additional robot, an additional conveying structure and a plurality of lock chambers.Type: GrantFiled: February 13, 2001Date of Patent: January 14, 2003Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Publication number: 20030005597Abstract: Wood is disposed in a container having at least one flexible wall, and vacuum is applied to the container. The flexible wall presses against a surface of the wood. The container and wood are them immersed in a heated bath (e.g. comprising water, air, or other fluids). The wood is heated by conduction through the flexible wall, and maintained at accurate temperature by the bath. The wood is thereby rapidly dried by heat and vacuum. The present invention is energy efficient, and provides rapid, uniform drying of the wood without checking.Type: ApplicationFiled: June 28, 2002Publication date: January 9, 2003Inventors: Zhangjing Chen, Fred M. Lamb
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Patent number: 6499229Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage maeans after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: GrantFiled: February 13, 2001Date of Patent: December 31, 2002Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Publication number: 20020189126Abstract: This invention is concerned with a distributive ejection apparatus for liquid material in a freeze-drying apparatus for foodstuffs, medicaments, etc., wherein the liquid material adjusted from the starting material for foodstuffs, medicaments, etc. is caused to freeze onto the inner wall surface of the upright cylindrical tube, and the distributive ejection of the liquid material onto the tube at the time of its freeze-drying by sublimation of the moisture content in the material under the vacuum condition may be done in the state of supplying the liquid material over the entire surface of the inner wall surface of the tube with a substantially uniform thickness.Type: ApplicationFiled: January 4, 2002Publication date: December 19, 2002Applicant: KYOWA VACUUM ENGINEERING CO. LTD.Inventors: Hiromichi Akimoto, Ryoji Sunama
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Publication number: 20020189127Abstract: By directly distributing liquid material into upright cylindrical tubes, such liquid material for foodstuffs, medicaments, etc. is kept in its state of being isolated from external atmosphere so as to be perfectly sterilized. That is to say, while simply and adequately securing the controlled cooling of the tube, by means of the heat medium which circulates within the jacket, the liquid material supplied into the tube is caused to freeze with uniform thickness onto the inner wall surface of the tube, with further possibility of uniform heating of the freeze-dried layer.Type: ApplicationFiled: January 4, 2002Publication date: December 19, 2002Applicant: KYOWA VACUUM ENGINEERING CO., LTD.Inventors: Hiromichi Akimoto, Ryoji Sunama
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Publication number: 20020184785Abstract: A pneumatic hair-conditioner system has a vacuum pump (1, 4, 6, 30) attached predeterminedly to a hair processor (2, 25, 28, 29, 31) which employs airflow to the vacuum pump for predetermined hair processing by the hair processor. The vacuum pump and the hair processor can be either a dedicated-process conditioner with permanently integral attachment and pneumatic communication of a single select processor for predeterminedly limited hair-processing use or a multi-process conditioner with detachable attachment and integral communication of a plurality of select processors for predeterminedly multiple hair-processing uses. Optionally, the vacuum pump can be reversible for blowing instead of sucking air in pneumatic communication with the hair processor. For blowing, application of heat also is optional.Type: ApplicationFiled: June 26, 2002Publication date: December 12, 2002Inventor: Elizabeth A. Miller
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Patent number: 6490810Abstract: This invention relates to a vacuum processing system for use in a vacuum processing apparatus. The system has a cassette mount unit for holding a cassette of, e.g., wafers; a vacuum loader having a conveyor and at least one vacuum processing chamber; a conveyor structure for conveying a wafer from the cassette; and at least one lock chamber between the conveyor structure and the conveyor of the vacuum holder. The conveyor structure, which is between the cassette mount unit and the lock chamber, includes a track and a robot (having a robot arm) traveling on the track. The robot can transfer a wafer from the cassette mount unit to the lock chamber.Type: GrantFiled: February 14, 2001Date of Patent: December 10, 2002Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Publication number: 20020178605Abstract: A process of preparing solid form of an extract of a raw material such as coffee as the active ingredient, obtained by subjecting the raw material to extraction utilizing a heating, extracting and condensing system, and mixing the resulting liquid extract with a concentrate formed by brewing or boiling said raw material, and freeze-drying the mixture.Type: ApplicationFiled: May 21, 2001Publication date: December 5, 2002Inventor: Henry Aoki
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Patent number: 6487793Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: GrantFiled: January 23, 2001Date of Patent: December 3, 2002Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6487791Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: GrantFiled: February 14, 2001Date of Patent: December 3, 2002Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6484415Abstract: A wafer conveyor system for used in a vacuum processing apparatus wherein the conveyor structure is provided with a transfer structure and a robot apparatus is arranged on the transfer structure. The robot provides for rotation of the wafer horizontally from a position in a cassette to an opposite postion of the cassette.Type: GrantFiled: February 14, 2001Date of Patent: November 26, 2002Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6484414Abstract: A wafer conveyor system for use in a vacuum processing apparatus wherein the conveyor structure is provided with a robot disposed in the conveyor chamber of the vacuum loader. The robot includes an arm which is extendible into the lock chambers which are connected to the conveyor structure.Type: GrantFiled: February 13, 2001Date of Patent: November 26, 2002Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6477787Abstract: A method and apparatus for heating and cooling a substrate are provided. A chamber is provided that comprises a heating mechanism adapted to heat a substrate positioned proximate the heating mechanism, a cooling mechanism spaced from the heating mechanism and adapted to cool a substrate positioned proximate the cooling mechanism, and a transfer mechanism adapted to transfer a substrate between the position proximate the heating mechanism and the position proximate the cooling mechanism.Type: GrantFiled: February 11, 2002Date of Patent: November 12, 2002Assignee: Applied Materials, Inc.Inventors: Ratson Morad, Ho Seon Shin, Robin Cheung, Igor Kogan
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Patent number: 6473995Abstract: A vacuum drying apparatus and a vacuum drying method are provided wherein it is possible to reduce the drying time of an object to be dried and the surface condition of the object to be dried after drying is extremely satisfactory. A vacuum pump is connected to an exhaust port of a vacuum chamber through a suction pipe, and a frequency converter is provided on the input side of an alternating current motor for driving the vacuum pump to form a vacuum drying apparatus. A substrate coated with coating liquid is placed in the vacuum chamber of the vacuum drying apparatus.Type: GrantFiled: February 23, 2001Date of Patent: November 5, 2002Assignee: Dai Nippon Printing Co., Ltd.Inventors: Shunji Miyakawa, Yasuhide Nakajima, Soichi Matsuo
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Patent number: 6473989Abstract: A vacuum processing apparatus which includes a cassette mount table for holding at least one cassette, a conveying structure that includes a robot, a cassette table for holding the cassette, an additional conveying structure for transferring a wafer held on the cassette table. Further, the apparatus is provided with a vacuum loader which is connected to the additional conveying device by a lock chamber. a controller system controls the second conveyor structure and manages the replacement of the cassette on the cassette table; and further, instructs the replacement of the cassette.Type: GrantFiled: February 13, 2001Date of Patent: November 5, 2002Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6470596Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: GrantFiled: January 24, 2001Date of Patent: October 29, 2002Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6470592Abstract: A process is provided for freeze-drying medicaments and foodstuffs comprising dissolving the foodstuffs or medicaments in a solvent, introducing the solution formed into a shell comprising a desiccating chamber of a shell-tube freeze-drying device to cause the solution to freeze in a tubular layer, and crushing and comminuting the freeze-dried liquid with a comminuting device to obtain a powder product.Type: GrantFiled: March 5, 2001Date of Patent: October 29, 2002Assignee: Kyowa Vacuum Engineering, Ltd.Inventors: Hiromiti Akimoto, Ryouji Sunama
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Patent number: 6470593Abstract: The present invention relates to an ejector device for vacuum drying having at least first and second passages for connecting a first chamber with a second chamber, wherein the chambers are arranged substantially at right angles with respect to each other, and the ejector is adapted to vacuum dry the inside of the second chamber by means of high speed air flow toward the first chamber. The flow toward the first chamber preferably travels through the second passage from the first passage, on the side opposite the first chamber, to induce a negative pressure in the first passage. This way, the change in kinetic energy draws the stagnant air and steam existing in the second chamber into the inside of the first chamber.Type: GrantFiled: November 1, 2001Date of Patent: October 29, 2002Assignee: Delta Medical Co., Ltd.Inventor: Kyu Young Seo
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Patent number: 6467187Abstract: A vacuum processing system, including a vacuum processing chamber for processing wafers, provides a controller for controlling a wafer processing mode and a cleaning mode for the processing chamber. The vacuum processing system further provides for a wafer moving mechanism which is controlled by the controller and allows for the transferring of a dummy wafer into the processing chamber when the cleaning mode is started and then returning the dummy wafer when the cleaning mode is finished.Type: GrantFiled: February 14, 2001Date of Patent: October 22, 2002Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6467186Abstract: A transferring device for a semiconductor wafer which transfers a wafer storing structure to a table and/or other positions within the vicinity of a vacuum processing apparatus and removes wafers from the wafer storing structure. The transfer devices maintain a horizontally transferring state of both the wafer storing structure and of the wafers in the wafer storing structure.Type: GrantFiled: January 23, 2001Date of Patent: October 22, 2002Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6463676Abstract: A method and apparatus for transferring a substrate that includes a cassette table capable of holding a plurality of cassettes, wherein the cassettes are capable of receiving a plurality of substrates. An atmospheric loader is arranged between the plurality of cassettes and two lock chambers, and an atmospheric transferring device is provided for transferring one of the plurality of substrates to or from a substrate process.Type: GrantFiled: February 12, 2001Date of Patent: October 15, 2002Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6460270Abstract: A vacuum processing apparatus which includes a means for transferring wafer cassettes from a transferring chamber to a lock chamber. The wafer cassettes are mounted within a cassette table in a vertical direction and a first transferring means carries a wafer to and from the cassette tables. The vacuum processing apparatus further includes lock chambers into which the wafers are carried my the first transferring means. A second transferring means carries the wafers to either of the lock chambers.Type: GrantFiled: February 12, 2001Date of Patent: October 8, 2002Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6457259Abstract: A transportable skid for drying and testing generator stator windings includes a platform supporting a compressor adapted to supply compressed air to the stator winding; a dryer arranged to receive and dry compressed air from the compressor; a buffer tank arranged to receive a relatively small portion of compressed air from the compressor after passing through the dryer; and a receiving tank arranged to receive compressed air from the buffer tank and the compressor after passing through the dryer.Type: GrantFiled: October 22, 2001Date of Patent: October 1, 2002Assignee: General Electric CompanyInventors: Marc Bilofsky, Steve Czvizler, Tom McGonagle
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Patent number: 6457253Abstract: A wafer conveyor system for use in a vacuum processing apparatus wherein the conveyor structure is provided with a transfer structure and a robot apparatus is arranged on the transfer structure. The robot provides for rotation of the wafer horizontally from a position in a cassette to an opposite position of the cassette.Type: GrantFiled: February 13, 2001Date of Patent: October 1, 2002Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6447813Abstract: The present invention relates to the in situ manufacture of plant extracts from living plants. Since the plant remains intact, a flower or other component of the plant can be extracted one or more times. Following the extraction process, the plant is typically able to continue with its lifecycle. Such extracts have a variety of uses including use for, but not limited to: herbal and homeopathic medicines, hair and skin treatments, and cosmetics. The present invention also relates to apparatus useful for manufacturing plant extracts from living plants.Type: GrantFiled: June 8, 2001Date of Patent: September 10, 2002Inventor: Brent W. Davis
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Patent number: 6446353Abstract: A vacuum processing apparatus which includes a cassette mount table for holding a cassette, a conveying structure for transferring a wafer from the held on the cassette mount table, a robot, and a vacuum loader. The vacuum loader is provided with a vacuum conveyor chamber and a conveying structure which further include an additional robot.Type: GrantFiled: February 13, 2001Date of Patent: September 10, 2002Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6434855Abstract: A pneumatic hair-conditioner system has a vacuum pump (1, 4, 6, 30) attached predeterminedly to a hair processor (2, 25, 28, 29, 31) which employs airflow to the vacuum pump for predetermined hair processing by the hair processor. The vacuum pump and the hair processor can be either a dedicated-process conditioner with permanently integral attachment and pneumatic communication of a single select processor for predeterminedly limited hair-processing use or a multi-process conditioner with detachable attachment and integral communication of a plurality of select processors for predeterminedly multiple hair-processing uses. Optionally, the vacuum pump can be reversible for blowing instead of sucking air in pneumatic communication with the hair processor. For blowing, application of heat also is optional.Type: GrantFiled: December 22, 2000Date of Patent: August 20, 2002Inventor: Elizabeth A. Miller
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Patent number: 6401359Abstract: A semiconductor wafer (W) is mounted on top of a mounting stand (3) within a vacuum vessel of a vacuum processing apparatus such as a vacuum film-formation apparatus or an etching apparatus for semiconductor wafers. A heat-transfer gas such as helium is supplied to a gap between the wafer and the mounting stand, and film-formation or etching is performed while the wafer is held at a predetermined temperature. To ensure a simple and reliable detection of any leakage of the helium from between the wafer and the mounting stand during this process because of an abnormal state, the surface of a dielectric material such as aluminum nitride that configures the mounting stand (3) is given a mirror finish and the wafer (W) is attracted to the surface of the mounting stand (3) by an attractive force of at least 1 kg/cm2, whereby the helium from the gas supply path (5) is sealed in on the rear surface side of the wafer (W).Type: GrantFiled: September 5, 2000Date of Patent: June 11, 2002Assignee: Tokyo Electron LimitedInventor: Hideaki Amano
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Patent number: 6397488Abstract: An apparatus and method for drying printing composition on a print medium are disclosed. A method embodiment for use in a printing device includes depositing printing composition onto a print medium and enclosing the print medium in a sealed environment. The method additionally includes reducing a pressure in the sealed environment below an ambient pressure and heating the print medium in the sealed environment to dry the printing composition on the print medium. An apparatus embodiment for use in a printing device having a print engine for depositing printing composition onto a print medium includes an enclosure configured to provide a sealed environment around the print medium. The apparatus additionally includes a vacuum source fluidly coupled to the enclosure and configured to reduce a pressure in the sealed environment below an ambient pressure and a heater configured to apply heat energy to the print medium in the sealed environment to dry the printing composition on the print medium.Type: GrantFiled: June 15, 2000Date of Patent: June 4, 2002Assignee: Hewlett-Packard CompanyInventor: Richard Brinkly
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Patent number: 6381867Abstract: A stabilised high vacuum drying installation for industrial hides and similar products includes a plurality of drying beds (2, 2′, 2″) with heating platforms (3, 3′, 3″) and hermetic covers (4, 4′, 4″), vacuum means (7) connected to the drying beds to extract vapours coming from the hides and to reduce the pressure to minimum working values (Pi), a circuit with valve means (10, 10′, 10″; 11, 11′, 11″) to selectively connect the drying beds to the vacuum means. The valve means include, downstream of every drying bed, at least one cutoff valve (10, 10′, 10″) for selectively connecting such bed, initially at atmospheric pressure, to the vacuum means (7), and at least one check valve (11, 11′, 11″) for isolating automatically the remaining beds already at working pressure so as to avoid pressure oscillations in their interior.Type: GrantFiled: November 3, 2000Date of Patent: May 7, 2002Inventor: Antonio Polato
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Publication number: 20020050072Abstract: There is provided a method for obtaining powder product by freeze-drying of liquid material, through various process steps, which comprises: adjusting starting materials into a liquid form; distributively feeding the thus adjusted liquid material for its freeze-drying; desiccating the liquid material by means of a freeze-drying device; pulverizing the thus desiccated liquid material into fine powder product by a pulverizing and comminuting device. In this freeze-drying means, the connection or joining point between the adjacent process steps, where the maintenance of the sterilized condition and the prevention of risk of contamination are complicated and troublesome, is isolated from the external atmosphere, while maintaining the whole system in the state of the continuous operations being made possible between the adjacent process steps, thereby enabling the maintenance of the sterilized conditions and the prevention of risk of contamination to be effectively realized.Type: ApplicationFiled: March 5, 2001Publication date: May 2, 2002Inventors: Hiromiti Akimoto, Ryouji Sunama
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Patent number: 6380517Abstract: A rotating vacuum kiln for heat treating solid particulate material under vacuum conditions uses a rotating refractory metal cylindrical vessel with a cool inlet zone, hot intermediate zone, and cool exit zone, with a first series of inner radiation shields provided at the hot intermediate zone adjacent to the cool inlet zone and a second series of inner radiation shields provided at the hot intermediate zone adjacent the cool exit zone to protect those two zones from the high temperatures in the hot intermediate zone. Heat for the hot intermediate zone of the cylindrical vessel is provided indirectly by electrical resistance heaters that surround the vessel and outer radiation shields are provided about the heaters to direct heat to the cylindrical vessel.Type: GrantFiled: December 22, 2000Date of Patent: April 30, 2002Assignee: Cabot CorporationInventor: Allan C. Morgan
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Publication number: 20020046473Abstract: A crop dehydrator is disclosed that includes a large hollow cylinder, openable at one or both ends, that is air-tight and connected to an air-pump or vacuum pump capable of maintaining a moderate vacuum in the cylinder. As the air is pumped out of the cylinder, the water in a crop in the chamber vaporizes and is pumped out of the cylinder.Type: ApplicationFiled: October 2, 2001Publication date: April 25, 2002Inventors: Philip A. Rutter, Brandon L. Rutter, Mark L. Shepard
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Patent number: 6357143Abstract: A method and apparatus for heating and cooling a substrate. A chamber is provided that comprises a heating mechanism adapted to heat a substrate positioned proximate the heating mechanism, a cooling mechanism spaced from the heating mechanism and adapted to cool a substrate positioned proximate the cooling mechanism, and a transfer mechanism adapted to transfer a substrate between the position proximate the heating mechanism and the position proximate the cooling mechanism.Type: GrantFiled: July 20, 2001Date of Patent: March 19, 2002Assignee: Applied Materials, Inc.Inventors: Ratson Morad, Ho Seon Shin, Robin Cheung, Igor Kogan
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Patent number: 6339887Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: GrantFiled: January 24, 2001Date of Patent: January 22, 2002Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6332280Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: GrantFiled: January 24, 2001Date of Patent: December 25, 2001Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6317997Abstract: A vacuum drying system wherein the drying chamber is provided with at least two vacuum draw headers positioned one above and one below a median plane through a load being dried to draw gases substantially symmetrically from opposite sides of the load as it is being dried. Preferably the drying system is a dielectric drying system and headers are positioned on opposite sides of the load.Type: GrantFiled: October 19, 2000Date of Patent: November 20, 2001Assignee: HeatWave Drying Systems LtdInventors: Gary Kenneth Kooznetsoff, Robert Lewis Zwick
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Patent number: 6318263Abstract: The combination of a cooling and conditioning unit for a material web to which ink is applied on at least one side thereof, having a multiplicity of chill rolls arranged in a housing at least approximately vertically above one another, utilizing the height of the housing, the material web being guidable around the chill rolls along a web path extending at least approximately vertically, and a dryer disposed upline from the cooling and conditioning unit for drying the material web, includes a material web outlet formed in the dryer, and a material web inlet formed in the cooling and conditioning unit, the cooling and conditioning unit being disposed immediately downline of the dryer in a manner that the material web leaving the dryer outlet immediately enters the inlet formed in the cooling and conditioning unit.Type: GrantFiled: April 24, 2000Date of Patent: November 20, 2001Assignee: Heidelberger Druckmaschinen AGInventor: Clemens Johannes Maria De Vroome
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Patent number: 6314658Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: GrantFiled: November 29, 2000Date of Patent: November 13, 2001Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Publication number: 20010037585Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: ApplicationFiled: January 24, 2001Publication date: November 8, 2001Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6311409Abstract: The present invention provides methods and apparatus for freeze drying in which a solution, which can be a radioactive salt dissolved within an acid, is frozen into a solid on vertical plates provided within a freeze drying chamber. The solid is sublimated into vapor and condensed in a cold condenser positioned above the freeze drying chamber and connected thereto by a conduit. The vertical positioning of the cold condenser relative to the freeze dryer helps to help prevent substances such as radioactive materials separated from the solution from contaminating the cold condenser. Additionally, the system can be charged with an inert gas to produce a down rush of gas into the freeze drying chamber to also help prevent such substances from contaminating the cold condenser.Type: GrantFiled: February 22, 1999Date of Patent: November 6, 2001Assignee: The BOC Group, Inc.Inventors: Nicholas V. Coppa, Paul Stewart, Ernesto Renzi
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Patent number: 6301801Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: GrantFiled: April 19, 2000Date of Patent: October 16, 2001Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6301802Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: GrantFiled: January 22, 2001Date of Patent: October 16, 2001Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6298578Abstract: A method and apparatus for drying a tennis court or other surface removes water from the tennis court and heats the surface of the tennis court to facilitate evaporation of water from the court.Type: GrantFiled: October 12, 2000Date of Patent: October 9, 2001Inventor: Mark H. Frampton
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Patent number: 6289604Abstract: An environmental protection compliant, higher productivity footwear vacuum dryer and conveyance apparatus having a conveyor belt on which is disposed a plurality of footwear placement rod support and footwear placement tray units that convey the footwear sole and upper covering. The conveyor belt moves past one or more heating boxes and vacuum activation boxes and is accessible at intervals between the adjoining heating box and vacuum activation box. Inside the vacuum activation boxes, moisture content is evacuated and footwear of different materials are warmed by radiated heat, preventing damage to the footwear, while also activating the adhesive applied on the footwear to facilitate adhesion between the sole and upper covering of the footwear.Type: GrantFiled: August 30, 1999Date of Patent: September 18, 2001Inventor: Liang-Tsuen Chang
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Patent number: 6285102Abstract: A drive mechanism provides a friction free movement of a movable member operated under a negative pressure environment. A gas bearing arrangement movably supports the movable element relative to a stationary element. The gas bearing arrangement is configured to be operated under the negative pressure environment inside the chamber. A drive arrangement drives the movable element from outside the chamber.Type: GrantFiled: April 3, 2000Date of Patent: September 4, 2001Assignee: Tokyo Electron LimitedInventors: Takaaki Matsuoka, Teruo Asakawa
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Patent number: 6279250Abstract: Apparatus and method for desolventizing particulate material having a solvent carried thereby wherein an upper indirect heating zone and a lower direct heating zone is provided. Each of the zones has a plurality of spaced apart horizontal trays for receiving particulate material. The trays define a vertical series of compartments through which the particulate material passes. Steam is provided to the particulate material indirectly in said indirect heating zone and directly in said direct heating zone are also included. An integral air tight flash chamber below the compartments enhances solvent recovery via vaporization of residual solvent from the condensed steam adhered to the particulate material traveling through the direct heating zone prior to discharge of the particulate material. The recovered residual solvent is delivered under pressure to a predetermined compartment in the direct heating zone provide heat for desolventizing the solvent-laden particulate material.Type: GrantFiled: September 7, 1999Date of Patent: August 28, 2001Assignee: Crown Iron Works CompanyInventor: George E. Anderson
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Publication number: 20010015019Abstract: A vacuum drying apparatus and a vacuum drying method are provided wherein it is possible to reduce the drying time of an object to be dried and the surface condition of the object to be dried after drying is extremely satisfactory. A vacuum pump is connected to an exhaust port of a vacuum chamber through a suction pipe, and a frequency converter is provided on the input side of an alternating current motor for driving the vacuum pump to form a vacuum drying apparatus. A substrate coated with coating liquid is placed in the vacuum chamber of the vacuum drying apparatus.Type: ApplicationFiled: February 23, 2001Publication date: August 23, 2001Inventors: Shunji Miyakawa, Yasuhide Nakajima, Soichi Matsuo