Vacuum Patents (Class 34/92)
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Patent number: 6272770Abstract: A cleaning apparatus having a sealable pressure vessel and an agitator for agitating an article, such as clothing, in a liquid within the vessel to remove contaminants from the article. A fluid system supplies fresh liquid to the vessel and drains used liquid from the vessel to separate excess contaminated from the article, a portion of the contaminated liquid being retained by the article after this separation. One or more heating elements are activatable to vaporize the retained liquid, and a vacuum system is activatable to reduce the pressure in the sealed vessel while the heating elements are activated, such that the boiling point of the retained liquid is substantially reduced from that at atmospheric pressure. The liquid may be plain, ozonated or carbonated water, or a mixture thereof, and may be cooled by a heat exchanger before being introduced into the sealed vessel. Agitation during washing and drying is minimized for use of the apparatus as an alternative to dry cleaning.Type: GrantFiled: December 15, 1999Date of Patent: August 14, 2001Assignee: American Dryer CorporationInventors: Dennis Slutsky, Ricky D. Lerette
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Publication number: 20010011424Abstract: Wafer rack consisting of a carrier frame provided with accommodations for at least two wafers. To provide uniform distribution of gas over said wafers a gas distribution device is fitted at least above each wafer, which gas distribution device is connected to the gas supply for the reactor in which the wafer rack is placed. Connection to such a gas supply can be via coupling of the wafer rack to a part of said reactor.Type: ApplicationFiled: April 3, 2001Publication date: August 9, 2001Inventor: Sjaak Jacobus Johannes Beulens
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Publication number: 20010011422Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: ApplicationFiled: February 13, 2001Publication date: August 9, 2001Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Publication number: 20010011423Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: ApplicationFiled: February 14, 2001Publication date: August 9, 2001Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Publication number: 20010007174Abstract: In a vacuum processing apparatus comprising a reactor and a vacuum pump connected to the reactor to draw up a gas held in the reactor, the vacuum pump comprising a diffusion pump and an auxiliary pump, the diffusion pump and the auxiliary pump are connected through an exhaust line and a cooling unit is provided in the exhaust line, where the gas is cooled by the cooling unit to liquefy or condense an oil smoke comprised of a diffusion pump oil contained in the gas, to cause the resultant oil to deposit in the exhaust line.Type: ApplicationFiled: January 30, 2001Publication date: July 12, 2001Inventors: Junichiro Hashizume, Shigenori Ueda, Ryuji Okamura
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Publication number: 20010005944Abstract: A method of transporting a reticle is disclosed. The reticle is placed in a reticle carrier that has an ionizer. Moreover, the reticle may be attached with a pellicle. The pellicle consists of a pellicle frame and a pellicle film stretched over the pellicle frame. The pellicle frame has included within an absorbent material.Type: ApplicationFiled: December 13, 2000Publication date: July 5, 2001Inventors: Giang T. Dao, Ronald J. Kuse
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Patent number: 6253462Abstract: A device and method for cleaning and drying workpieces in a treatment vessel in which a reduced pressure can be provided. During the cleaning process, a liquid bath is formed in the treatment vessel (1), said liquid bath at least partially surrounding the work pieces, and cleaning fluid and optionally a gaseous medium are introduced into the treatment vessel under excess pressure via a spray unit. The workpiece support moves up and down or rotates so that the work pieces are subjected alternately to different cleaning processes in the liquid bath and a gas space located above said liquid bath.Type: GrantFiled: January 10, 2000Date of Patent: July 3, 2001Assignee: Mafac Ernst Schwarz GmbH & Co. KGInventor: Joachim Schwarz
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Publication number: 20010004807Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: ApplicationFiled: February 12, 2001Publication date: June 28, 2001Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Publication number: 20010000048Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: ApplicationFiled: November 29, 2000Publication date: March 22, 2001Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6199297Abstract: Disclosed are bulk lyophilization containers including aseptic closure portions or heat flux equalization portions that promote improved bulk lyophilization. Also disclosed are methods of using the bulk lyophilization containers and improved lyophilization stoppers.Type: GrantFiled: February 1, 1999Date of Patent: March 13, 2001Assignee: Integrated Biosystems, Inc.Inventor: Richard Wisniewski
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Patent number: 6192603Abstract: A vacuum processing chamber preventing corrosion of a magnetic seal means and removing the heavy metals, organic matter, etc. produced by the corrosion, including a vacuum processing chamber, a rotated member (for example, a susceptor and a wafer holder), a rotary shaft penetrating one side of the vacuum chamber and rotating the rotated member, and a cavity being defined between an inner wall of the magnetic seal means and the rotary shaft, said magnetic seal means maintaining the air-tightness in the vacuum processing chamber by using a magnetic fluid in the cavity; a gas inlet introducing a barrier gas (for example, an inert gas like N2, Ar, or He or an inert gas having a slight amount of O2 added) to the cavity; and a gas outlet extracting a gas inside the cavity.Type: GrantFiled: August 25, 1999Date of Patent: February 27, 2001Assignee: Sony CorporationInventor: Hisaharu Seita
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Patent number: 6192601Abstract: The present invention provides method and apparatus for reducing particulate contamination during the processing of a substrate. In one embodiment, the step of preheating a substrate in a preheater to a desired temperature. The preheated substrate is transferred from the preheater to a buffer region having a pressure therein that is between about two (2) Torr and about seven hundred and sixty (760) Torr. The preheated substrate is transferred from the buffer region to a reaction chamber. Thermophoretic forces help repel particles away from the substrate surface during substrate transfer.Type: GrantFiled: May 30, 2000Date of Patent: February 27, 2001Assignee: Applied Materials, Inc.Inventors: Steve G. Ghanayem, Madhavi Chandrachood
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Patent number: 6182376Abstract: An apparatus and method is provided for capturing, heating and degassing a wafer without using moving parts and without exposing the wafer to external stress. A degassing chamber is backfilled with a dry gas that improves wafer heating ramp rates and wafer heating uniformity. The backfilled gas efficiently conducts heat at relatively low pressures. Thus the degassing chamber may be evacuated via a cryo-pump without the need for an intermediate rough pumping step. Further, because the wafer is heated primarily by conduction, wafer temperatures are easily and precisely controlled independent of layers previously deposited on the wafer. Frontside heating elements such as heat generators and/or heat reflectors are provided that further improve wafer heating ramp rates and wafer heating uniformity by directing heat toward the front surface of the wafer. Preferably as heat radiates from the wafer it is reflected back to the wafer by a frontside reflector.Type: GrantFiled: July 10, 1997Date of Patent: February 6, 2001Assignee: Applied Materials, Inc.Inventors: Ho Seon Shin, Dan Marohl
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Patent number: 6178659Abstract: A vacuum apparatus for industrial hide driers with multiple beds (2) includes a circuit with an open end (17) having arranged in a series: a vapor manifold (7) for each bed; a first condenser (8) inserted in each manifold; a first condensate separator (10) at the output of the various condensers (8); a main vacuum pump (16) to gradually reduce the absolute pressure in the circuit to a first upper value (Ps). A particular feature of the system consists of the fact that it has a secondary aspiration device (19) which is arranged upstream of the main vacuum pump (16) to operate in series to this pump when the first value of the absolute pressure (Ps) is reached, so as to further reduce the pressure of the circuit to a second lower value (Pi). The upper value (Ps) of the absolute pressure is 40 to 100 mbar; the second lower value (P1) of the absolute pressure is 15 to 1 mbar. The device (19) is a high-capacity, low-head blower.Type: GrantFiled: August 20, 1997Date of Patent: January 30, 2001Assignee: Officine di Cartigliano S.p.A.Inventor: Antonio Corner
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Patent number: 6178660Abstract: A pass-through, wafer-processing tool for treating a moving semiconductor wafer with a process gas. The tool comprises an open-ended, non-isolated processing module having a wafer path through the module, vacuum manifolds mounted adjacent the wafer entry to and wafer exit from the module, and a gas manifold between the vacuum manifolds adapted to direct process gas onto the moving wafer. The gas manifold may deliver plasma ions generated by a remote plasma unit outside the module. Instead, a plasma may be generated inside the pass-through, wafer processing tool and, if so, the tool further comprises a top electrode mounted above the wafer passage. A wafer handler, which may be a robotic handler, carries the wafer through the wafer passage and serves as a bottom electrode.Type: GrantFiled: August 3, 1999Date of Patent: January 30, 2001Assignee: International Business Machines CorporationInventors: Peter A. Emmi, Byeongju Park
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Patent number: 6176023Abstract: The present invention relates to a device and process for transporting flat objects confined in a specific atmosphere. The device comprises at least one assembly provided with several thin, flat cells (31) that open onto a lateral face (33) of said assembly with the cells arranged in parallel and linked by the same ventilation system. Each cell is constructed to receive a flat object (10) and is closed by an independent door (33). The cells are arranged in tandem and the device includes assembly means for interlocking an upper cell to an adjacent lower cell in each successive pair and in a complementary arrangement.Type: GrantFiled: January 4, 1999Date of Patent: January 23, 2001Assignee: Commissariat a l'Energie AtomiqueInventor: Claude Doche
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Patent number: 6170171Abstract: A method and apparatus for drying semiconductor fragment material, has at least one vacuum-tight chamber with at least one receiving means for semiconductor fragment material, and there is a means for maintaining a vacuum in the apparatus.Type: GrantFiled: December 8, 1998Date of Patent: January 9, 2001Assignee: Wacker-Chemie GmbHInventors: Wilhelm Schmidbauer, Hanns Wochner, Werner Ott
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Patent number: 6163976Abstract: A vacuum-type automatic dehumidifying and drying apparatus for powdered or granular material such as a pelletized or powdered resin or the like, provided with a drying hopper connected to an evacuating means having at its bottom a material discharge valve, and provided with a material collector communicating with the drying hopper via a material feeding valve above the drying hopper for collecting the powdered material therein. The apparatus comprises a double constructed drying hopper having a cylindrical main body made of a high heat conductivity material provided on its inner peripheral surface with plural fins, which define compartment walls, projecting inwardly and provided on its outer peripheral surface with a heating means surrounding the cylindrical main body.Type: GrantFiled: October 26, 1999Date of Patent: December 26, 2000Assignee: Kabushikikaisha Matsui SeisakushoInventors: Hiroshi Tada, Osamu Matsui
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Patent number: 6163979Abstract: In a method for controlling a freeze drying process, a frozen product is arranged on temperature controlled surfaces (12) in an air-evacuated chamber (1) and undergoes a main drying and after-drying phase. During the main drying phase, the temperature of the ice surrounding said product is continuously measured. The pressure in the chamber and/or the temperature of the surfaces are modified during transition from the main drying phase to the after-drying phase. In order to avoid longer idle periods between the chamber (1) and the evacuation device (3, 4, 14) and to determine transition from the main drying phase to the after-drying phase, the pressure and/or the temperature of the surfaces during said transition are modified according to changes int he temperature of the ice.Type: GrantFiled: March 20, 2000Date of Patent: December 26, 2000Assignee: Steris GmbHInventors: Georg-Wilhelm Oetjen, Peter Haseley, Hubert Klutsch, Marion Leineweber
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Patent number: 6154980Abstract: A low pressure dryer for granular or powdery material includes a plurality of hoppers rotatable about a common vertical axis serially among material filling and heating, vacuum drying and material discharge positions; pneumatic piston-cylinder means for rotating the hoppers about said axis among said filling and heating, vacuum drying and discharge positions; means for heating contents of a hopper at said filling and heating positions; means for sealing a hopper at said vacuum and drying positions; means for drawing vacuum within a hopper at said vacuum drying position and means for selectably permitting downward flow of dried granular or powdery material out of a hopper at said discharge position where said hoppers move collectively and unitarily one with another.Type: GrantFiled: September 18, 1998Date of Patent: December 5, 2000Inventor: Stephen B. Maguire
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Patent number: 6151796Abstract: A substrate drying device includes a reduced pressure enclosure including an airproof door, and an exhaustion device. Inside of the enclosure is caused to be a sealed state when the airproof door is closed. After a substrate to which an application material is applied is received into the reduced pressure enclosure, the airproof door is closed to make inside of the reduced pressure enclosure be an airproof state. Subsequently, inside of the reduced pressure enclosure is exhausted by the exhaustion device to perform for eliminating air bubbles in the application material and drying the application material on the substrates. The exhaustion device may include a reserve tank that has a volume capable of rapidly reducing a pressure of the internal volume of the reduced pressure enclosure to maintain a predetermined negative pressure. A rapid exhaustion of the inside of the reduced pressure enclosure is performed by connecting the reserve tank to the reduced pressure enclosure.Type: GrantFiled: December 21, 1998Date of Patent: November 28, 2000Assignee: KEM-TEC Japan Co., Ltd.Inventors: Hamataro Karamatsu, Masanao Hori, Seiji Katayama
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Patent number: 6151795Abstract: A material drying apparatus having a sealable chamber for receipt of wet material, such as clothing. Material placed into the chamber is dried upon the evacuation of air from the chamber wherein moisture drawn from the material is condensed on a condensate coil placed in the chamber. Heating coils placed around the chamber or beneath a drawer elevate the temperature to enhance condensate operation providing an energy efficient material dryer requiring no make-up air. Drum or thermal blanket enhances temperature elevation. Condensed water is purged after the drying process although provisions provide for an interim purge should excess liquid be drawn from the material.Type: GrantFiled: September 15, 1998Date of Patent: November 28, 2000Assignee: MMATS IncorporatedInventors: Karl H. Hoffman, Michael W Pastore, Walter Glowacki, David Gunn
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Patent number: 6148536Abstract: A two-fluid nozzle for atomizing a liquid by mixing the liquid and a gas at high speed, wherein desired particle size is obtained at a low pressure, and a device employing the same nozzle for freezing and drying a liquid containing a biological substance are disclosed. The two-fluid nozzle which is provided with a first injection hole for injecting the liquid and a second injection hole for injecting the gas, wherein the second injection hole is provided around the outer periphery of the first injection hole; a revolving means (108 or 118) is provided to at least the front portion of the first injection hole for rending the liquid into revolving flow; and a revolving means (117) is provided to at least the front portion of the second injection holes for rending the gas into revolving flow, is suitable for atomization of a liquid containing a biological substance because the atomization at a low pressure is possible through operation of the revolving means for rending the gas and liquid into revolving flows.Type: GrantFiled: December 8, 1998Date of Patent: November 21, 2000Assignee: Nippon Telegraph and Telephone CorporationInventor: Tetsuo Iijima
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Patent number: 6143219Abstract: The present invention discloses a generic method for producing void and gas occlusion free materials, as well as apparatuses for batch and continuous production of same. This generic method can be utilized in the production of a wide variety of polymeric compounds and composites and specifically encompasses the two ends of the polymeric composite spectrum, that is, polymer concretes on the one hand, and fiber-reinforced polymer composites on the other. The composite materials of the present invention are characterized by visual count as being void and gas occlusion free to the level of 1 micron at 1250.times. magnification. Concomitantly, the invention produces useful polymer concrete materials which exhibit substantially improved integrity for easy machining at high speeds, and high dielectric and mechanical strength, as compared with composite materials produced by conventional methods.Type: GrantFiled: November 20, 1998Date of Patent: November 7, 2000Assignee: Mardela International Inc. S.A.Inventors: Victor H. Vidaurre, Wilfredo G. Bendek, Jorge L. Dufeu
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Patent number: 6134802Abstract: An apparatus for drying cable, in accordance with the present invention includes a trench formed longitudinally on a plate for receiving a cable whereby a plurality of openings formed in the trench permit fluid communication therethrough such that water present on the cable is removed through the openings by evacuation. A water separator is coupled to the bottom portion for receiving the evacuated water and separating out the water by gravity.Type: GrantFiled: October 14, 1999Date of Patent: October 24, 2000Assignee: Lucent Technologies Inc.Inventors: Craig A. Alberhasky, Scott L. Karstens
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Patent number: 6125554Abstract: There are disclosed a method and an apparatus for drying a flat object. At least one flat object, whose surface is covered entirely with adhering water, is placed substantially vertically in at least one groove portion formed in a rack. The rack has a cavity portion formed therein, and the cavity portion communicates with the groove portion through at least one opening. The cavity portion of the rack is depressurized in order to suck water adhering to the surface of the flat object through the opening, thereby drying the flat object. It becomes possible to dry the flat object without causing problems which have been occurred in conventional drying methods.Type: GrantFiled: July 28, 1997Date of Patent: October 3, 2000Assignee: Shin-Etsu Handotai Co., Ltd.Inventor: Hideki Munakata
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Patent number: 6125754Abstract: The present invention is a channeled roller, used in association with flexible webs, which is provided with a pressurized gas flow, and which may be used to remove web wrinkles, clean webs and rollers, brake rollers, and heat, cool, moisturize, and dry webs. In operation, gas flow travels through the roller channels and applies non-contact forces to the web, thereby removing wrinkles and providing other types of beneficial web treatment.Type: GrantFiled: October 30, 1998Date of Patent: October 3, 2000Inventor: J. C. Harris
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Patent number: 6122836Abstract: Freeze drying apparatus and associated lyophilization procedures are provided employing vapor flow detection and/or vacuum control for monitoring and control of the lyophilization process. The vapor flow detector, such as a windmill sensor, is disposed to monitor vapor flow from product undergoing lyophilization. In a batch process, vapor flow is collectively monitored with the vapor flow detector between the process chamber and condenser chamber, while in a manifold configuration separate vapor flow detectors are employed at each flask attachment port. A windmill sensor provides visual feedback to an operator and/or electronic feedback to a system controller. A vacuum control system is also provided for use with or independent of vapor flow detection. This vacuum control disconnects the vacuum source from the process chamber when pressure within the process chamber falls below a first predefined set point.Type: GrantFiled: May 7, 1998Date of Patent: September 26, 2000Assignee: S.P. Industries, Inc., The Virtis DivisionInventors: Kenneth J. Tenedini, Siegfried G. Bart, Jr.
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Patent number: 6108927Abstract: Equipment provides more rapid drying of heating parts comprising hygroscopic, electric insulation made of cellulose and/or plastics. At least two condensers are present, one being used when heating the parts and the other in the distillation stage. As a result removal by distillation is possible any time during heating and during the time intervals when heating is interrupted and the pressure-dropping procedure is carried out in the vacuum vessel. Due to the second condenser (with a second, associated vacuum pump), the heating medium can be cleansed or distilled during the pressure-dropping procedure and simultaneously the suction or drying procedure can be carried out in the vacuum vessel. This feature leads to drying the electrical parts more rapidly than heretofore because the steps of drying the electrical parts and regenerating the heating medium no longer require being consecutive, but instead regeneration can be implemented simultaneously with the evacuation of the vicinity around the electrical parts.Type: GrantFiled: October 19, 1998Date of Patent: August 29, 2000Assignee: Wilhelm Hendrich Vakuumanlagen GmbH & Co.Inventor: Helmut Strzala
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Patent number: 6108929Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: GrantFiled: December 16, 1999Date of Patent: August 29, 2000Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6105272Abstract: A rotating vacuum kiln for heat treating solid particulate material under vacuum conditions uses a rotating refractory metal cylindrical vessel with a cool inlet zone, hot intermediate zone, and cool exit zone, with a first series of inner radiation shields provided at the hot intermediate zone adjacent to the cool inlet zone and a second series of inner radiation shields provided at the hot intermediate zone adjacent the cool exit zone to protect those two zones from the high temperatures in the hot intermediate zone. Heat for the hot intermediate zone of the cylindrical vessel is provided indirectly by electrical resistance heaters that surround the vessel and outer radiation shields are provided about the heaters to direct heat to the cylindrical vessel.Type: GrantFiled: June 22, 1998Date of Patent: August 22, 2000Assignee: Cabot CorporationInventor: Allan C. Morgan
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Patent number: 6098679Abstract: The present invention is concerned with a method for obtaining a wood panel, preferably an OSB panel, with significantly reduced thickness swelling properties when exposed to or contacted with moisture or water. The novel dimensionally stable panels are obtained by an alternate vacuum--steam injection method. The method is an after-fabrication, or post-treatment method, and involves one or more cycles of applying a vacuum followed by injection of hot steam in a sealed treatment chamber.Type: GrantFiled: March 17, 1998Date of Patent: August 8, 2000Assignee: Noranda Forest Inc.Inventors: Andrew Go, Wallace S. Pettersen, Alain Laplante
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Patent number: 6092299Abstract: A present vacuum treating apparatus comprises a process chamber for subjecting an object to a predetermined process in a predetermined vacuum state, a stage located in the process chamber and on which the object is placed, a lamp unit provided at the lower side of the processing chamber and having a plurality of lamps as a light source and adapted to heat the object on the stage by a heat energy of light directed from these lamps to the stage for illumination, a rotation shaft connected to the lamp unit to rotate the lamp unit, a support body rotatably supporting the rotation shaft, and a thermo-module provided at a contacting area of the support body selective to the rotation shaft and, by absorbing heat on its rotation shaft side and dissipating heat on its support body side, transferring the heat on the lamp unit to the support body through the rotation shaft.Type: GrantFiled: September 3, 1998Date of Patent: July 25, 2000Assignee: Tokyo Electron LimitedInventors: Koichi Yamazaki, Shigeru Kasai
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Patent number: 6082020Abstract: A supporting device for data-storage optical discs which includes a rest plate with which at least one supporting element is arranged to receive an optical disc. The supporting device further includes a vacuum assembly and vacuum connecting through-holes for providing vacuum communication between the supporting element and the vacuum assembly. The supporting element includes a base and a side wall arranged to support the optical disc and defining, with the optical disc itself, a vacuum chamber. The vacuum chamber ensures locking retention of the optical disc on the supporting element, while enabling movement of the rest plate, and further achieves cooling of the disc by an air stream passing through the chamber and spreading over the optical disc surface.Type: GrantFiled: December 23, 1997Date of Patent: July 4, 2000Assignee: Tapematic U.S.A., Inc.Inventor: Luciano Perego
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Patent number: 6076273Abstract: The invention relates to a stabilized vacuum apparatus for industrial hide driers with multiple evaporation beds. The apparatus includes a main vacuum source that can be connected to a series of evaporation beds to produce a negative pressure having a preset value in the beds, in steady-state operating conditions. There is a secondary vacuum source which is suitable to produce, in one bed at a time, a negative pressure which is close to the steady-state value, and there is a valve means to selectively connect each bed, which is initially at ambient pressure, first to the secondary vacuum source and then to the main vacuum source, so as to eliminate substantial pressure variations in the remaining beds when each bed is connected to the main vacuum source.Type: GrantFiled: August 26, 1997Date of Patent: June 20, 2000Assignee: Officine Di Cartigliano, S.p.A.Inventor: Antonio Corner, deceased
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Patent number: 6076274Abstract: A vacuum drying cabinet has nozzles on a pipe body which can be removable from but attached to a pipe fitting mounted in the roof of the cabinet and which, when in place, can be coupled to the shaft of a motor for driving the cleaning unit and to the cleaning liquid supply. When the vacuum drying cabinet is used for vacuum drying, the cleaning unit is removed and replaced by a cap which is hermetically sealed to the pipe section.Type: GrantFiled: February 27, 1999Date of Patent: June 20, 2000Inventor: Bernd Dreisbach
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Patent number: 6055740Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.Type: GrantFiled: January 15, 1999Date of Patent: May 2, 2000Assignee: Hitachi, Ltd.Inventors: Shigekazu Kato, Kouji Nishihata, Tsunehiko Tsubone, Atsushi Itou
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Patent number: 6038785Abstract: A vacuum dryer panel for a leather drying machine wherein a dryer panel comprising a porous screen is mounted over a perforated plate on the underside of a vacuum chamber positioned above a heated drying table on which leather skins are dried. The dryer panel comprises a layer of fine mesh screen preferably formed of a synthetic resin material mounted on a porous backing preferably formed of a synthetic resin material. The backing material is adapted to be mounted adjacent an outer side of the perforated plate and provides porosity between the screen and adjacent openings of the perforated plate. The backing material is sufficiently rigid to prevent the screen material from being pulled into openings in the perforated plate by a negative pressure on the upper side of the plate, so as to prevent marks in the dried leather. The edges of the dryer panel are folded over and incorporate reinforcing strips. Threaded fasteners fit through spaced openings in the edges for mounting the dryer panel to a vacuum chamber.Type: GrantFiled: January 16, 1998Date of Patent: March 21, 2000Inventors: Richard R. Lawson, Roger C. Droukas
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Patent number: 6029371Abstract: A drying treatment apparatus for drying cleaned semiconductor wafers comprises drying gas producing means (41) connected to a drying treating unit (30) through a drying gas supplying pipe line (32). A flowrate controlling diaphragm pump (50) is provided in an isopropyl alcohol (IPA) supplying pipe line (32) that connects an IPA tank (48) and the drying gas producing means (41). An N.sub.2 gas supply source (52) is provided for supplying nitrogen gas into the drying gas producing means (41), and a heater (44) is disposed within the drying gas producing means to produce a drying gas. As a result of this, the amount of the IPA supplied to the drying gas producing means (41) by the diaphragm pump (50) is controllable, thus enabling the concentration of the IPA contained in the drying gas to be maintained at a value within a range of from 3% to 80%, inclusive, and enabling the temperature of the drying gas to be maintained at a value within a range of from 80.degree. to 150.degree.Type: GrantFiled: September 16, 1998Date of Patent: February 29, 2000Assignee: Tokyo Electron LimitedInventors: Yuji Kamikawa, Teruomi Minami, Shigenori Kitahara
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Patent number: 6023853Abstract: A method for cleaning molding compound tablets while the molding compound tablets are transferred from a tablet container to a molding equipment for encapsulating a microelectronic device. The method includes the steps of loading the molding compound tablets from the tablet container to a tablet parts feeder; transferring the molding compound tablets from the tablet parts feeder to the molding equipment along the transfer line; blowing hot air downwardly on the molded compound tablets as they move along the transfer line; commencing melting of the molded compound tablet, and any contaminants on the molded compound, with the hot air, such that the contaminants are incorporated into a resulting soft tablet dough; and injecting the soft tablet dough into the molding equipment.Type: GrantFiled: April 6, 1998Date of Patent: February 15, 2000Assignee: Samsung Electronics Co., Ltd.Inventor: Chang-Ho Lee
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Patent number: 6016611Abstract: A substrate processing system can include an evacuable chamber adjacent a process chamber and back-to-back process chambers, or other combinations of evacuable chambers and process chambers. The processing system includes various isolation valves disposed between adjacent chambers, as well as gas flow valves and vacuum valves. A controller controls the respective positions of the various gas flow valves and vacuum valves depending, in part, on whether the various isolation valves are in their open or sealed positions. By controlling the positions of the valves, the flow of gas to and from the different chambers can be controlled, for example, to help maximize throughput, increase efficiency, and reduce the likelihood of cross-contamination between chambers.Type: GrantFiled: July 13, 1998Date of Patent: January 25, 2000Assignee: Applied Komatsu Technology, Inc.Inventors: John M. White, Wendell T. Blonigan, Michael W. Richter
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Patent number: 6009635Abstract: The present invention discloses a generic method for producing void and gas occlusion free materials, as well as apparatuses for batch and continuous production of same. This generic method can be utilized in the production of a wide variety of polymeric compounds and composites and specifically encompasses the two ends of the polymeric composite spectrum, that is, polymer concretes on the one hand, and fiber-reinforced polymer composites on the other. The composite materials of the present invention are characterized by visual count as being void and gas occlusion free to the level of 1 micron at 1250.times. magnification. Concomitantly, the invention produces useful polymer concrete materials which exhibit substantially improved integrity for easy machining at high speeds, and high dielectric and mechanical strength, as compared with composite materials produced by conventional methods.Type: GrantFiled: September 5, 1997Date of Patent: January 4, 2000Assignee: Tecminomet S.A.Inventors: Victor H. Vidaurre, Jorge L. Dufeu, Wilfredo G. Bendek
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Patent number: 6003243Abstract: An apparatus and method for cleaning and drying a wafer in a single cleaning tank using a cleaning solution including means for producing a hydrogen activation seed from hydrogen-containing gas and means for introducing active gas containing the hydrogen activation seed into the cleaning tank wherein dangling bonds on the wafer are terminated with hydrogen by spraying the active gas containing the hydrogen activation seed on the wafer.Type: GrantFiled: March 26, 1996Date of Patent: December 21, 1999Inventor: Tadahiro Ohmi
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Patent number: 5987770Abstract: A steam re-compression vacuum dryer includes a vacuum tank for accommodating waste; a first steam duct for removing steam from the vacuum tank; a steam compressor for compressing steam removed from the vacuum tank via the first steam duct and for producing a vacuum pressure in the vacuum tank; a steam condenser disposed in and/or thermally coupled to the vacuum tank; a non-condensing gas exhausting device for automatically exhausting non-condensing gas from the steam condenser; and a condensation water exhausting device for automatically exhausting condensation water from the steam condenser. If desired, a gas heater can be provided on the first steam duct to heat gas withdrawn from the tank through this duct. This gas heater may use steam discharged from the steam compressor as a heat source. The steam condensing device can be disposed in the vacuum tank, or it can be integral with an outer surface of the vacuum tank (e.g., the tank wall may have a double wall construction).Type: GrantFiled: July 21, 1997Date of Patent: November 23, 1999Assignee: Kajima CorporationInventor: Toshiyuki Hino
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Patent number: 5979075Abstract: Specifically configured dual rotor, multi-lobed, rotary gas compressors in a piping system will provide clean gas heating and re-circulation that will quickly and efficiently heat a connected process chamber or process piping section. Substantial heat is quickly generated through mechanical agitation of the gas molecules that pass through the inlet and outlet of a dual rotor, multi-lobed, rotary gas compressor. The invention application of a dual rotor, multi-lobed, rotary gas compressor as a means of imparting heat to a gas stream provides an economical source of convective heat for closed and open loop piping applications.Type: GrantFiled: February 8, 1999Date of Patent: November 9, 1999Inventors: Charles Grenci, R. Dallas Clayton
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Patent number: 5978630Abstract: A system for removing residual contaminants from an image conditioning apparatus that removes excess liquid from a developed image made up of toner particles immersed in a liquid carrier medium on an image bearing member. The system includes a vacuum blotting device that contacts the liquid developed image and absorbs a portion of the liquid carrier and residual contaminants remain thereon. A contact member adapted to be shifted from a non-operative position spaced from the vacuum blotting device, to an operative position in contact with the vacuum blotting device operates to transfer the contaminants therefrom. A scraper removes the transferred contaminants from the contact member. The contact member is pivotally mounted about the pivot point to effect shifting of the contact member between the non-operative and the operative position.Type: GrantFiled: January 8, 1998Date of Patent: November 2, 1999Assignee: Xerox CorporationInventors: Shu Chang, John F. Knapp, Lawrence Floyd, Jr., Stephen T. Chai, Robert E. Trott
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Patent number: 5964043Abstract: A process and apparatus for freeze drying of liquid material in a vessel in which the vessels are moved automatically through various stages including loading vessels onto racks, washing vessels in an inverted position, sterilizing vessels and racks, filling vessels with a liquid material, rotating the vessels and the liquid material contained within each vessel at a speed that allows the liquid to form a shell against the inner surface of the vessel, subjecting the vessels and the liquid material contained therein to freezing conditions sufficient to freeze the material into the form of a shell and then moving the rack and the vessels containing the frozen material through a vacuum drying chamber in which the frozen liquid material is dried.Type: GrantFiled: November 17, 1997Date of Patent: October 12, 1999Assignee: Glaxo Wellcome Inc.Inventors: Dominic M. A. Oughton, Philip R. J. Smith, Donald B. A. MacMichael
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Patent number: 5956860Abstract: A method and apparatus are provided for deacidifying cellulose based materials, especially books, magazines, and other bound or folded cellulose materials having a spine. The method includes contacting the materials with a treating medium and producing relative movement at a predetermined velocity between the materials and the treating medium in a direction generally parallel to the spine of the materials and, preferably simultaneously, directing the treating medium by means of a spray toward the materials in a direction generally perpendicular to the spine of the material for a period of time effective for the treating medium to contact substantially all of the material. Following treatment, any excess treating medium is removed from the material and directing any such removed treating medium to a holding tank for reuse later. The movement in a parallel direction is achieved by reciprocating the materials through a tank filled with treating medium.Type: GrantFiled: February 10, 1998Date of Patent: September 28, 1999Assignee: Preservation Technologies, L.P.Inventors: Lee H. Leiner, James E. Burd
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Patent number: 5953827Abstract: A vacuum processing system has a process chamber with a rotating member, such as a magnetron in a physical vapor deposition (PVD) chamber, disposed near a surface, such as a target in a PVD chamber. The rotating member and the surface are cooled by a cooling fluid. The rotational motion of the rotating member induces the cooling fluid to circulate around the rotating member and between the surface and the rotating member, thus efficiently cooling the rotating member and the surface with a quickly flowing fluid.The rotating member has a fluid conduit extending from the rotational center of the rotating member to the outer edge of the rotating member. The cooling fluid inside the fluid conduit is subject to a centrifugal force under the action of the rotational motion, so that the cooling fluid is induced to flow from the rotational center to the outer edge, thus forcing the cooling fluid to circulate.Type: GrantFiled: November 5, 1997Date of Patent: September 21, 1999Assignee: Applied Materials, Inc.Inventors: David T. Or, David Huo, J. Darrel Stickler
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Patent number: RE36796Abstract: In order to provide a vacuum degreasing-drying method by which extremely small, precision metal products can be degreased and dried quickly and completely without using organic solvents, according to the present invention, an object 112 to be rinsed is put in a vacuum drier 110 after being rinsed with a hydrocarbon cleaning agent and then the air in the vacuum drier 110 is evacuated so as to degrease and dry the object thus rinsed.Type: GrantFiled: August 16, 1996Date of Patent: August 1, 2000Assignee: NSK Ltd.Inventors: Chuichi Sato, Akira Kikuchi, Hiroshi Saito, Shinichi Takaira