Abstract: This invention aims at preventing a space including the guide surface of a reticle stage from interfering with an exposure light beam. In order to achieve this object, in a movable stage apparatus having a reticle stage on which a reflecting reticle is to be mounted, when the space is divided by a plane including the reflection surface of the reticle, the guide surface for moving the reticle is arranged in a space opposite to a space where an exposure light beam reflected by the reticle passes.

Abstract: A projection optics for microlithography, which images an object field in an object plane into an image field in an image plane, where the projection optics include at least one curved mirror and including at least one refractive subunit, as well as related systems, components, methods and products prepared by such methods, are disclosed.

Abstract: To provide a DFB solid-state dye laser including a grating having Moire interference fringes. A DFB solid-state dye laser element includes: a laser medium containing an organic dye; and a distribution feedback type resonance unit having a third grating including a Moire fringe corresponding to an overlap between a first grating and a second grating formed in different directions. The third grating including a Moire fringe is formed by irradiating a photoresist with a laser for two-beam interference exposure, and then rotating a substrate by a predetermined angle and re-irradiating the substrate with the laser.

Abstract: An imaging optical system that has liquid interposed in an optical path to the image plane to achieve a large effective image-side numerical aperture larger than, for example, 1.4, while a relatively large effective imaging region can be achieved. The imaging optical system that projects an image of a first surface onto a second surface. The optical path between the projection optical system and the second surface can be filled with liquid with a refractive index larger than 1.5, where a refractive index of gas in an optical path within the imaging optical system is 1. The imaging optical system comprises a boundary lens that can be contacted with the gas on the side of the first surface and that can be contacted with the liquid on the side of the second surface, and the boundary lens has a positive refracting power and is made of an optical material having a refractive index larger than 1.8.

Abstract: Obtained are an imaging optical system having a simple structure in which imaging position deviation due to deformation caused by a weight of an off-axial optical element is reduced and an image reading apparatus using the same. According to an imaging optical system for image reading, image information on an original surface is imaged on a sensor, and is read by the sensor. The imaging optical system includes reflection-type off-axial optical elements, each of which has an outer shape whose lengths in directions orthogonal to each other are different from each other and whose thickness is smaller than a length of the outer shape in a short-direction thereof and is made of a resin material. The plurality of off-axial optical elements are disposed such that mirror surfaces thereof are opposed to each other and constructed to satisfy a conditional expression.

Abstract: An assembly includes a first element having a predetermined functionality that is to be positioned with respect to a second element. The elements are arranged in a spaced relationship on a support frame. The support frame is provided with an interface surface formed on or in the support frame for receiving the first element. The interface surface determines the position of the first element with respect to the second element, and is configured in accordance with the predetermined functionality so that the first element is positionable with respect to the second element with at least three degrees of freedom.

Abstract: An embodiment relates generally to an apparatus for reducing defects.

Abstract: For an image-capturing unit having a light source and mirrors directing light reflected from a scanned document into a lens condensing the light onto a photoelectrically converting image sensor, a synthetic resin housing. The housing is composed of an open-ended upper frame having a top plate from which sidewalls extend, encompassing an internal space. A mounting surface for anchoring the light-source is formed on the upper side of the upper-frame top plate, and formed on the lower side of the upper-frame top plate is a pedestal on which the lens is supported. Mirror-support projections are formed on the lower side of the upper-frame top plate, or on the upper-frame sidewalls, to support the mirrors from below the lens. With this housing, the influence of heat from the light source on the optics is minimized, improving the mirrors' positional accuracy.

Abstract: A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.

Abstract: There is provided an illumination system for microlithography. The illumination system includes an optical element having a plurality of field raster elements, a plane in which a field is illuminated, and a grazing incidence mirror situated in a light path from the optical element to the plane, after the optical element. The illumination system has no other grazing incidence mirror in the light path, after the optical element and before the plane.

Abstract: A photolithography apparatus includes an optical illumination system. The optical illumination system includes a light source, an illumination system, a photomask, and a projection system. The light source generates light. The illumination system transmits the light generated by the light source. The photomask receives the light transmitted by the illumination system and forms an optical pattern image. The projection system transmits the optical pattern image formed by the photomask to a substrate surface. Either one of the illumination system and the projection system includes at least one mirror for correcting aberrations.

Abstract: A projection exposure apparatus includes a projection optical system, which is arranged in an optical path between a first surface and a second surface, projects a pattern on a negative plate arranged on the first surface onto a workpiece arranged on the second surface and exposes the pattern thereon. The projection optical system includes a first imaging optical subsystem having a dioptric imaging optical system; a second imaging optical subsystem having a concave reflecting system; a third imaging optical subsystem having a dioptric imaging optical system; a first folding mirror arranged in an optical path between the first imaging optical subsystem and the second imaging optical subsystem; and a second folding mirror arranged in an optical path between the second imaging optical subsystem and the third imaging optical subsystem. The first imaging optical subsystem forms a first intermediate image and the second imaging optical subsystem forms a second intermediate image.

Abstract: Disclosed is a projection optical system for projecting a pattern of a mask placed on an object plane, onto a substrate placed on an image plane. The projection optical system is arranged so that an intermediate image of the pattern formed on the mask, is formed between a third reflection surface and a fourth reflection surface. In accordance with a particular shape of the third reflection surface or with particular disposition, high-precision projection is ensured without enlargement in size of the whole system.

Abstract: This invention relates to a mirror holding method, wherein a symmetry axis of an illuminating area corresponds with that of a mirror holder, and a center of the illuminating area in a mirror differs from a centroid of the mirror.

Abstract: An apparatus is provided for curing a curable coating on a three-dimensional object having at least a top surface and a side surface, with the object being advanced along a generally horizontal path. The apparatus includes an elongated light source of radiating curing energy for curing the coating on the surfaces of the object. An open-sided, elongated concave reflector is positioned behind the elongated light source to provide a focus for the radiated curing energy onto the object. The reflector has a generally elliptical cross-section for radiating the curing energy along an energy concentration line generally coincident with the object. The elongated light source is generally at the source focal point of the elongated reflector. The reflector is angled such that a line that runs between the source focal point of the reflector and the energy concentration line extends on the order of 55°-77° from vertical.

Abstract: Obtained are an imaging optical system having a simple structure in which imaging position deviation due to deformation caused by a weight of an off-axial optical element is reduced and an image reading apparatus using the same. According to an imaging optical system for image reading, image information on an original surface is imaged on a sensor, and is read by the sensor. The imaging optical system includes reflection-type off-axial optical elements, each of which has an outer shape whose lengths in directions orthogonal to each other are different from each other and whose thickness is smaller than a length of the outer shape in a short-direction thereof and is made of a resin material. The plurality of off-axial optical elements are disposed such that mirror surfaces thereof are opposed to each other and constructed to satisfy a conditional expression.

Abstract: The present invention is a catadioptric system having a reticle optical group, a beam splitter, an aspheric mirror, a baffle plate, a folding mirror and a semiconductor wafer optical group. The reticle optical group, the beam splitter and the semiconductor wafer optical group are placed on the same beam axis, different from aspheric mirror and folding mirror axis. The light passes through an image pattern on the reticle and is reflected by the beam splitter onto the aspheric mirror. The aspheric mirror reflects the light back through the beam splitter onto the folding mirror. The folding mirror reflects the light back to the beam splitter. The beam splitter reflects the light onto the semiconductor wafer optical group. A plurality of quarter wave plates can be placed in optical paths between optical elements of the present invention to change polarization of an incoming light.

Abstract: Provided is a wafer exposure apparatus used in a semiconductor device manufacturing process, the exposure apparatus including: a reflective mirror for reflecting light provided from a light source; an optical path changer for changing a path of the light provided from the reflective mirror; first mirrors installed at both sides of the optical path changer to change the path of the light; second mirrors installed at both sides of a material to change the path of the light; and third mirrors installed at both sides of a mask to enter the light reflected by the first mirrors to the mask and to enter the light passed through the mask into the second mirrors, whereby it is possible to continuously expose one surface, both surfaces or a specific surface of a wafer in a state that the wafer is once aligned.

Abstract: A lithographic apparatus includes a device having a plurality blades, each blade selectively insertable into the beam. The device is in a first plane intermediate a second plane conjugate to a plane of the substrate and a third plane conjugate to a pupil plane of the projection system. The blades include a plurality of partially opaque and solid blades or have a predetermined transmissibility pattern. The transmissibility may vary in a second direction perpendicular to the first direction in which the substrate and the patterning device are movable. In an illumination system including a field faceted mirror and a pupil faceted mirror, a plurality of reflecting blades are selectively insertable into the beam to reflect a portion of the beam to a beam dump that may be cooled to reduce a heat load. The reflecting elements may have a coating that scatters the portion of radiation or changes the phase.

Abstract: The present invention provides a self-propelled image read module, which comprises a sensor, a guide rod, a motor, a gear set, and a belt. The guide rod is fixed on a base of a scanner. The sensor is slidably matched on the guide rod. The motor is disposed at one side of the sensor. The gear set is connected to the motor. The belt is fixed on the base. The belt passes through between and contacts a transmission wheel and an idle wheel of the gear set. Thereby, a scanner's image read module of simple assembly, low cost, and small size is formed.

Abstract: An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage adapted to support a reticle. A substrate stage is adapted to support a substrate. A reflective optical system is adapted adapted to image the reticle onto the substrate. The reflective optical system includes a primary mirror including a first mirror and a second mirror, and a secondary mirror. The reflective optical system has sufficient degrees of freedom for both alignment and correction of third order aberrations when projecting an image of the reticle onto the substrate by reflections off the first mirror, the secondary mirror, and the second mirror.

Abstract: A lithographic apparatus according to one embodiment of the invention includes an image sensing device configured and arranged to measure a pattern in a patterned beam of radiation. The image sensing device comprises a slab on which at least two sensors are formed. The sensors are sensitive to radiation of the beam and are arranged on a first side of the slab. A film that is non-transparent to radiation of the beam is provided at the first side over the sensors. The film includes a patterned segment above each sensor.

Abstract: Two transparent plates constitute with each other an angle variable from about 60 to 120 degrees along their common edge. A book to photograph is opened at the chosen pages and placed sitting on said common edge. A photographic camera is attached near the free edge of one of the plates through a supporting element in such a way that the optical axis of the camera stays perpendicular to the one plate. A first planar mirror, which has one edge in common with the common edges of the transparent plates, is maintained exactly in the middle of the angle formed by the transparent plates but can be folded against the one plate. A second mirror which has one edge in common with the one plate near its free edge, is maintained perpendicular to the reference position of the first mirror.

Abstract: The projection aligner transfers a mask pattern formed on a mask to a substrate. A collimated light beam is emitted from a light source toward the mask. The light beam passed through the mask is deflected by a first mirror formed on a deflector toward a lens unit having a positive power. A reflector is provided at the other side of the lens unit to reflect back the light beam passed through the lens unit. The light beam reflected by the reflector passed through the lend unit again and then deflected by a second mirror formed on the deflector toward the substrate to form an image of the mask pattern. The size of the image formed on the substrate is adjusted by moving the reflector along the optical axis of the lens unit, and the deflector along the optical path of the light beam passed through the mask.

Abstract: A projection optical system, which forms a reduced image of a first surface onto a second surface, has excellent optical performance without substantially being affected by birefringence despite the use of optical material having intrinsic birefringence. This is done by suitably arranging certain crystal axes of radiation transmissive members that make up the projection optical system relative to the optical axis of the projection optical system, and by suitably arranging the certain crystal axes of the radiation transmissive members relative to the crystal axes of other radiation transmissive members in the projection optical system.

Abstract: An exposure method includes the light incidence step of letting at least a part of light emitted from a light source for exposure use be incident on a mask supported by a supporting device, and the imaging step of forming an image of a mask pattern on a photosensitive material by guiding the reflecting light from the mask such that the photosensitive material supported by the supporting device receives the reflecting light coming from an incidence direction which is different from the incidence direction of the light incident on the mask.

Abstract: A pattern writing apparatus for writing a pattern on a photosensitive material comprises a head provided with a DMD having a micromirror group which modulates reflected light, a stage holding a substrate, and mechanisms for moving the head and the stage relative to each other. In the pattern writing apparatus, for pattern writing, an irradiation region group on a substrate, which corresponds to the micromirror group of the DMD, is scanned in a main scanning direction that is angled relative to the direction of arrangement of the irradiation region group. The irradiation region group is also intermittently moved in the sub-scanning direction by a distance shorter than the width of the irradiation region group in the sub-scanning direction, for pattern writing of the entire substrate. Thus, even with slight changes in an intermittent travel distance (A) of the irradiation region group, light is suitably applied to a region between strips (71, 72), whereby high-precision high-speed pattern writing is achieved.

Abstract: An image forming apparatus for suppressing deviations in the application position of light emitted from an optical box, thus preventing an image from being deteriorated, has an image bearing body, a light source, a deflecting device for deflecting a light emitted from the light source, a lens for imaging a light deflected in this manner onto the image bearing body, and an optical box for containing at least the light source, the deflecting device, and the lens, wherein the optical box is provided plurally and the plurality of optical boxes are stacked to be integrated.

Abstract: A projection type display optical system is provided to resolve problems of keystone distortion, and to improve illumination efficiency and contrast uniformity of an image.

Abstract: A level sensor for a lithographic projection apparatus according to one embodiment of the invention includes a light source, a first reflector, a second reflector and a detector. The first reflector is positioned to direct light from the light source towards a wafer surface, and the second reflector is positioned to direct light reflected from the wafer surface to the detector. The first and second reflectors are selected to incur a minimal process dependent apparent surface depression.

Abstract: Single-stage projection systems typically have a twice-folded optical path, with mask leg, crossover, 1:1 projection lens system, and substrate leg. They offer seamless patterning of large microlithographic substrates by overlapping complementary small-field scanning. A reverser maintains mask/substrate pattern congruence despite optical reversal, but presents the requirement of large working distance to permit access to the scanning stage. The required working distance demands large-diameter lens elements which are expensive in materials, grinding and assembly. A high-resolution 1:1 projection lens, for high-fluence laser light, adds extreme expense. Dividing the projection lens into two distributed-part-lenses, in mask and substrate legs, maintains satisfactory working distance, minimizes lens diameter requirements, and thus cuts cost. The aperture stop is positioned at the midpoint of the optical path, preferably at the time of manufacture, by an auxiliary stage.

Abstract: In an illumination system using mirrors, the facets of a field facet mirror focus plural source images on respective facets of a pupil facet mirror to perform the function of an integrator. A facet mask is constructed and arranged to selectively block facets of the filed or pupil facet mirrors. The facet mask has a grid selectively interposable in the projection beam to provide intermediate illumination settings. The grid has a spacing smaller than the source images but larger than the wavelength of the projection beam so that there is no diffraction.

Abstract: A projection optical system having a large numerical aperture in a soft X-ray wavelength range of 200 nm or less, specifically 100 nm or less and a resolution drastically lower than 50 nm, and a projection exposure apparatus provided with the projection optical system.

Abstract: The present invention is a catadiopiric system having a reticle optical group, a beam splitter, an aspheric mirror, a baffle plate, a folding mirror and a semiconductor wafer optical group. The reticle optical group, the beam splitter and the semiconductor wafer optical group are placed on the same beam axis, different from aspheric mirror and folding mirror axis. The light passes through an image pattern on the reticle and is reflected by the beam splitter onto the aspheric mirror. The aspheric mirror reflects the light back through the beam splitter onto the folding mirror. The folding mirror reflects the light back to the beam splitter. The beam splitter reflects the light onto the semiconductor wafer optical group. A plurality of quarter wave plates can be placed in optical paths between optical elements of the present invention to change polarization of an incoming light.

Abstract: The present invention provides a scanning device. The scanning device comprises a document plate for placing a document, at least a sliding guide placed at one side of the document plate, a scanning module which is in front of the document plate for scanning the document along the direction of the sliding guide, a first light source assembled in the scanning module for providing light to scan documents, and a driving module electrically connected to the scanning module for driving the scanning module to perform scanning procedure to the document.

Abstract: A mirror for use in an exposure system of this invention includes a reflection layer for reflecting EUV formed on a mirror substrate and an absorption layer formed on the reflection layer and made from a compound for absorbing infrared light.

Abstract: The present invention relates to an optical system, especially to an optical system which is used in a chassis of a scan device to decrease a thickness of the chassis and further to decrease a volume of the scan device. Five reflecting mirrors are assembled in the chassis and a location and an angle of each reflecting mirror is adjusted to arrange a better optical path. One of the five reflecting mirrors passes through two times reflecting processes to make light transmit from a light source to a light-receiving element successfully.

Abstract: Within an edge bead processing apparatus and an edge bead processing method, there is employed at least one of: (1) a nozzle suitable for directing a volume of fluid onto an annular edge ring of a substrate when received upon a platen, wherein the nozzle is geometrically configured to direct the volume of fluid simultaneously to all portions of the annular edge ring absent motion of the substrate with respect to the nozzle; and (2) a reflective optical apparatus suitable for directing a dose of radiation to the annular edge ring of the substrate when received upon the platen, wherein the reflective optical apparatus is geometrically configured to direct the dose of radiation to all portions of the annular edge ring absent movement of the substrate with respect to the reflective optical apparatus.

Abstract: A continuously moving object is imaged by a video projector producing a rapid sequence of stationary images. A galvanometer actuated mirror tracks the motion of the moving object and synchronizes it to the sequence of stationary images in order to avoid motion caused blurring of the images. The moving object is flat or is wrapped around a cylinder.

Abstract: In an illumination system using mirrors, the facets of a field facet mirror focus plural source images on respective facets of a pupil facet mirror to perform the function of an integrator. A facet mask is constructed and arranged to selectively block facets of the filed or pupil facet mirrors. The facet mask has a grid selectively interposable in the projection beam to provide intermediate illumination settings. The grid has a spacing smaller than the source images but larger than the wavelength of the projection beam so that there is no diffraction.

Abstract: A liquid transfer article is provided including a support assembly and an imaged surface formed directly on the surface of the support assembly by digital photopolymerization. The support assembly is in the form of a polymeric base, and the liquid transfer article is formed by providing a liquid photopolymer on the surface of the base and then irradiating the polymer with a light source to form the image. The liquid transfer article is reimagable and may be used in gravure printing processes, as well as other printing applications.

Abstract: To provide an optical-proximity-correction (OPC) mask and a laser repair system using the same, which realize the correction working having a resolution equal to or higher than the resolution of a working optical system.

Abstract: An illuminance measurement apparatus of the present invention is comprised of a chassis (20) having a detection surface (22) formed with a light receiving aperture (21) and a light receiving element having a light receiving surface arranged at a position corresponding to the light receiving aperture (21) in the chassis (20), wherein the chassis (20) is provided with a reflection surface (23) for detection light for detecting at least one of the position and posture of the detection surface (22).

Abstract: A lithographic projection apparatus has a discharge plasma radiation source that is contained in a vacuum chamber. The radiation source is to generate a beam of EUV radiation. A chamber wall of the vacuum chamber incorporates a channel structure comprising adjacent narrow channels separated by walls that are substantially parallel to a propagation direction of the radiation generated so as to pass the radiation from the vacuum chamber through the structure to another subsequent vacuum chamber. In the subsequent vacuum chamber, a much higher vacuum level (lower pressure) can be maintained than is present in the vacuum chamber of the radiation source.

Abstract: The invention concerns an illumination system for wavelengths<193 nm, especially for EUV-lithography with a plurality of light sources a mirror device for creating secondary light sources comprising several mirrors, said mirrors are comprising raster elements. The invention is characterized in that the plurality of light sources are coupled together in order to illuminate the exit pupil of the illumination system up to a predetermined degree of filling.

Abstract: An exposure/imaging apparatus and method effects projection exposure while moving a first object and a second object in a predetermined moving direction, effecting projection exposure of an image of the first object onto the second object. An adjusting member is used to adjust imaging characteristics of a projection optical system that is used to perform the projection exposure.

Abstract: In this exposure apparatus, position information such as the position, inclination, or shape of a first mirror, a second mirror, a third mirror, and a fourth mirror constituting a projection optical system PO is measured with a mirror monitor mechanism. Based on the obtained position information, the position or inclination or shape or the like of the first mirror, the second mirror, the third mirror, and the fourth mirror is corrected by actuators serving as a correction mechanism. As a result, in the case where changes occur in the projection optical system, these can be corrected in order to maintain the exposure conditions.

Abstract: An illuminance measurement apparatus of the present invention is comprised of a chassis (20) having a detection surface (22) formed with a light receiving aperture (21) and a light receiving element having a light receiving surface arranged at a position corresponding to the light receiving aperture (21) in the chassis (20), wherein the chassis (20) is provided with a reflection surface (23) for detection light for detecting at least one of the position and posture of the detection surface (22).

Abstract: A method and apparatus for forming a single-exposure synthesized image on film is provided where an instantaneous image is combined with an image from a prepared picture on film. The preparation picture is reflected by a reflective mirror, and then is refracted by the objective lens of the camera to form a prepared image. The reflective mirror has a central hole that is located in front of the objective lens. The prepared picture also has a central hole, or a central transparent portion, and is located in a space between the objective lens and the reflective mirror, so that the reflecting surface of the reflective mirror faces the picture and the objective lens. Light rays from the prepared picture are reflected by the reflective mirror, pass through the central hole or the central transparent portion of the picture and through the objective lens to image the prepared picture image on the circumferential portion of the film.

Abstract: The exposure apparatus has an illumination optical system equipped with an illuminance-uniformity unit (3A) composed of a diffusion plate (31), a conical prism (32), a reflecting member (34) in a columnar form, a reflecting member (33) in a cylindrical form, a fly-eye lens (35) and a stop (36). The exposure apparatus is for use in a lithography process for manufacturing semiconductors and so on. The illumination light from an optical system of a previous stage has an illuminance distributed in a uniform manner to some extent by multiple reflection between the reflecting plane of the reflecting member (34) and the reflecting plane of the reflecting member (33) via the diffusion plate (31) and the conical prism (32), and the illumination light is then led to a reticle at a high degree of illuminance through the fly-eye lens (35) and the stop (36).