Abstract: A mirror arrangement, in particular for a microlithographic projection exposure apparatus, includes at least one mirror element bearing a mirror surface provided for reflecting electromagnetic radiation, at least one carrier element including a head section, which is provided for receiving at least one mirror element, and also a seat section. The arrangement further includes a mount arrangement, for receiving the at least one carrier element. At least one insertion opening is in the mount arrangement. The seat section of the carrier element plunges into the insertion opening. In addition, the arrangement includes a channel device for guiding a heat transfer medium is formed in the mount arrangement in the region surrounding the seat section. A method for dissipating heat is provided.

Abstract: An apparatus configured to expose a substrate to light includes an illumination optical system configured to illuminate a mask, a projection optical system configured to project a pattern of the mask onto the substrate, and a decentering mechanism configured to decenter at least one optical element of the illumination optical system with respect to an optical axis of the projection optical system, or to decenter at least one optical element of the projection optical system with respect to an optical axis of the illumination optical system, and rotational asymmetry distortion that occurs at a position defocused from a focus position of the projection optical system is changed by decentering the optical element by the decentering mechanism.

Abstract: A display apparatus includes a light-emitting component, a controller, a digital micro-mirror device, a first projection assembly and a second projection assembly. The controller is configured to alternately output a first image signal and a second image signal to the digital micro-mirror device. The digital micro-mirror device is configured such that in response to receiving the first image signal, at least one micro-lens is rotated to a respective first preset position, and that in response to receiving the second image signal, at least one micro-lens is rotated to a respective second preset position. The first projection assembly is configured to receive light reflected by the at least one micro-lens located at the respective first preset position and output a first image. The second projection assembly is configured to receive light reflected by the at least one micro-lens located at the respective second preset position and output a second image.

Abstract: A system and method for controlling an exposure dose of a light source are disclosed. The system includes an LED light source, a light homogenizer, an energy detection unit and an exposure dose control unit coupled to both the LED light source and the energy detection unit. The energy detection unit includes an energy detector corresponding to the LED light source or the light homogenizer and an energy spot sensor corresponding to a wafer. By using the LED light source capable of producing UV light in lieu of an existing mercury lamp, the system is less hazardous and safer by eliminating the risk of discharging hazardous mercury vapor into the environment when the mercury lamp is broken. Moreover, exposure illuminance of the LED light source can be adjusted and the LED light source can be turned on/off under the control of exposure dose control unit to expose the wafer with high dose control accuracy, without needing to use a variable attenuator or an exposure shutter.

Abstract: Embodiments described herein relate to a dynamically controlled lens used in lithography tools. Multiple regions of the dynamic lens can be used to transmit a radiation beam for lithography process. By allowing multiple regions to transmit the radiation beam, the dynamically controlled lens can have an extended life cycle compared to conventional fixed lens. The dynamically controlled lens can be replaced or exchanged at a lower frequency, thus, improving efficiency of the lithography tools and reducing production cost.

Abstract: A light distribution element for a light emitting device, including a plurality of first light deflecting portions and a plurality of second light deflecting portions, wherein a pattern formed by the plurality of first light deflecting portions is superposed with a pattern formed by the plurality of second light deflecting portions to form a final display pattern. The present invention also provides a light emitting device including the light distribution element. According to the light distribution element and the light emitting device provided by the present invention, it is possible to generate a personalized, three-dimensional, dynamic lighting effect.

Abstract: A laser hazard at the time of non-connection can be prevented with a simple structure. A cylindrical connector exterior, and a block that is incorporated in one end side of the connector exterior and in which a light emitting portion or a light incident portion is mounted toward another end side are included. The light emitting portion or the light incident portion is mounted on the block such that an optical axis direction of the light emitting portion or the light incident portion is inclined with respect to a longitudinal direction of the connector exterior. For example, the connector exterior has a length at which at least a part of light emitted from the light emitting portion can be emitted to an inner side (inner wall) of the connector exterior.

Abstract: A projection lens is disclosed for imaging a pattern arranged in an object plane of the projection lens into an image plane of the projection lens via electromagnetic radiation having an operating wavelength ? from the extreme ultraviolet range. The projection lens includes a multiplicity of mirrors having mirror surfaces arranged in a projection beam path between the object plane and the image plane so that a pattern of a mask in the object plane is imagable into the image plane via the mirrors. A first imaging scale in a first direction running parallel to a scan direction is smaller in terms of absolute value than a second imaging scale in a second direction perpendicular to the first direction. The projection lens also includes a dynamic wavefront manipulation system for correcting astigmatic wavefront aberration portions caused by reticle displacement.

Abstract: An alignment system, method and lithographic apparatus are provided for determining the position of an alignment mark, the alignment system comprising a first system configured to produce two overlapping images of the alignment mark that are rotated by around 180 degrees with respect to one another, and a second system configured to determine the position of the alignment mark from a spatial distribution of an intensity of the two overlapping images.

Abstract: Methods of determining a value of a parameter of interest are disclosed. In one arrangement, a symmetric component and an asymmetric component of a detected pupil representation from illuminating a target are derived. A first metric characterizing the symmetric component and a second metric characterizing the asymmetric component vary non-monotonically as a function of the parameter of interest over a reference range of values of the parameter of interest. A combination of the derived symmetric component and the derived asymmetric component are used to identify a correct value from a plurality of candidate values of the parameter of interest.

Abstract: A variable-volume enclosure that enables the photographing, from outside the enclosure, of highly reflective, objects placed in the enclosure without the reflections of things in the environment surrounding the enclosure being seen in the objects includes: (a) a translucent, planar base, (b) a pliable, two-way mirror that is configured so that, when its opposing edges are brought towards one another, the mirror's central portion bends upward to create a temporary enclosed region of the enclosure, (c) an attachment mechanism for fixedly attaching said one of the mirror's edges to the base's top surface, (d) an adjustable attachment mechanism that temporarily and adjustably attaches the mirror's other edge to the base's top surface, (e) a translucent covering which is adjustably attached to a mirror end.

Abstract: Embodiments described herein provide a system, a software application, and a method of a lithography process, to write full tone portions and grey tone portions in a single pass. One embodiment of the system includes a controller configured to provide mask pattern data to a lithography system. The controller is configured to divide a plurality of spatial light modulator pixels temporally by grey tone shots and full tone shots of a multiplicity of shots, and the controller is configured to vary a second intensity of a light beam generated by a light source and vary a first intensity of the light beam generated by the light source of each image projection system at the full tone shots.

Abstract: An alignment mechanism to position and focus a lens assembly includes a housing and an eccentric shaft supported by the housing. The eccentric shaft is configured to rotate with respect to the housing. The alignment mechanism further includes a lens assembly having a bracket coupled to the eccentric shaft, and an actuator assembly, coupled to the bracket of the lens assembly and configured to rotate the lens assembly about the eccentric shaft. The alignment mechanism further includes at least one thrust drive nut mounted on the eccentric shaft, the at least one thrust drive nut being configured to move the eccentric shaft and the bracket of the lens assembly in a z-axis direction.

Abstract: A projection optical unit images an object field in an image field. The projection optical unit includes a plurality of mirrors guides imaging light from the object field to the image field. At least two of the mirrors are arranged directly behind one another in the beam path of the imaging light for grazing incidence with an angle of incidence of the imaging light which is greater than 60°. This results in an imaging optical unit that can exhibit a well-corrected imageable field with, at the same time, a high imaging light throughput.

Abstract: The disclosure relates to a device for changing a shape of a surface of an optical element via electron irradiation. The device includes an electron irradiation unit for radiating electrons onto the surface with a locally resolved energy dose distribution for the purpose of producing local material densifications in the optical element. Furthermore, the device includes a control unit for determining a locally resolved energy dose distribution from a predefined desired change of a surface shape of the optical element by optimization via a minimization of a merit function, in such a way that a difference between the desired change and an actual change of the surface shape of the optical element, the actual change being brought about on account of the predefinition determined, is minimized.

Abstract: A lithographic apparatus comprises a substrate table for holding a substrate and a projection system for projecting a radiation beam onto a target region of the substrate so as to form an image on the substrate. The projection system comprises a lens element arrangement having a first lens element. A first pressure sensor is arranged to measure at least one pressure value adjacent the first lens element. A controller determines a first change in a pressure difference over the first lens element and/or a further lens element based on a signal received from the pressure sensor, determines adjustments to a position of one of the substrate table and projection system based upon the determined first change, and causes actuators to make adjustments to the substrate table or the projection system.

Abstract: Techniques are disclosed for magnification compensation and/or beam steering in optical systems. An optical system may include a lens system to receive first radiation associated with an object and direct second radiation associated with an image of the object toward an image plane. The lens system may include a set of lenses, and an actuator system to selectively adjust the set of lenses to adjust a magnification associated with the image symmetrically along a first and a second direction. The lens system may also include a beam steering lens to direct the first radiation to provide the second radiation. In some examples, the lens system may also include a second set of lenses, where the actuator system may also selectively adjust the second set of lenses to adjust the magnification along the first or the second direction. Related methods are also disclosed.

Abstract: Digital cameras, optical lens modules for such digital cameras and methods for assembling lens elements in such lens modules. In various embodiments, the digital cameras comprise an optical lens module including N?3 lens elements Li, each lens element comprising a respective front surface S2i?1 and a respective rear surface S2i. In various embodiments the first lens element toward the object side, L1 and its respective front surfaces S1 have optical and/or mechanical properties, such as a clear aperture, a clear height and a mechanical height that are larger than respective properties of following lens elements and surfaces. This is done to achieve a camera with large aperture stop, given a lens and/or camera height.

Abstract: An imaging optical unit for projection lithography has a plurality of mirrors for imaging an object field into an image field with imaging light guided along a path from the object field to the image field. The penultimate mirror in the path has no passage opening to pass the imaging light. The imaging optical unit has a stop to predefine an outer marginal contour of a pupil of the imaging optical unit. The stop is between the penultimate and last mirrors in the path. The imaging optical unit can have exactly one stop for predefining at least one section of the outer pupil marginal contour. An entrance pupil of the imaging optical unit can be upstream of the object field. The imaging optical unit can be well defined regarding its pupil and exhibit desirable properties for projection lithography.

Abstract: An optical element for transmitting radiation includes: a first surface region surrounding an optically used area of the optical element; and a second surface region that adjoins the first surface region. A circumferential edge is formed between the first and second surface regions. The optical element further includes a one-piece film which covers the first surface region, the edge and the second surface region. The film includes a hydrophobic material at least on its side facing away from the first and the second surface regions. An optical assembly includes at least one such optical element. A method produces such an optical element.

Abstract: A method for setting an illumination setting for illuminating an object field of a projection exposure apparatus includes taking into account the sensitivity of a performance variable for changes in the intensity of the illumination radiation in the illumination pupil.

Abstract: A method for generating a radiation light in a lithography exposure system is provided. The method includes connecting a first nozzle assembly coupled to a support to an outlet of a storage member that receives a target fuel inside. The method further includes guiding the target fuel flowing through the first nozzle assembly and supplying a droplet of the target fuel into an excitation zone via the first nozzle assembly. The method also includes moving the support to connect a second nozzle assembly coupled to the support with the outlet. In addition, the method includes guiding the target fuel flowing through the second nozzle assembly and supplying a droplet of the target fuel into the excitation zone via the second nozzle assembly. The method further includes irradiating the droplet of the target fuel in the excitation zone with a laser pulse.

Abstract: Embodiments of the present disclosure generally provide improved photolithography systems and methods using a digital micromirror device (DMD). The DMD comprises columns and rows of micromirrors disposed opposite a substrate. Light beams reflect off the micromirrors onto the substrate, resulting in a patterned substrate. Certain subsets of the columns and rows of micromirrors may be positioned to the “off” position, such that they dump light, in order to correct for uniformity errors, i.e., features larger than desired, in the patterned substrate. Similarly, certain subsets of the columns and rows of micromirrors may be defaulted to the “off” position and selectively allowed to return to their programmed position in order to correct for uniformity errors, i.e., features smaller than desired, in the patterned substrate.

Abstract: A light outputting apparatus includes a light outputting section that outputs light, and the light outputting section includes a light source that emits light, a collimator lens for parallelizing the light emitted from the light source, and an optical element including a plurality of lenslets that widen the light having passed through the collimator lens in a direction perpendicular to the optical axis of the light source and corresponding to a first direction that is one of first and second directions perpendicular to each other.

Abstract: An exposing device according to an embodiment includes: a light emitter; a first light blocking member including first apertures; a first lens array including first lenses, wherein each of the first lenses converges the light passing through the corresponding first aperture; a second light blocking member including second apertures; and a second lens array including second lenses, wherein each of the second lenses converges the light passing through the corresponding second aperture. An optical axis of each of the first lenses and an optical axis of the corresponding one of the second lenses substantially coincide with each other. A first aperture center of each of the first apertures and a second aperture center of the corresponding second aperture are disposed at a predetermined distance from the optical axis of the corresponding first lens and the optical axis of the corresponding second lens in an array direction of the light emitter.

Abstract: A facet mirror for EUV projection lithography has a plurality of facets for reflecting EUV illumination light. At least some of the facets are in the form of alignment facets and have a reflection surface, the edge contour of which is aligned along two alignment coordinates of an overall facet arrangement. The reflection surface of at least one of the alignment facets has a surface shape that exhibits different curvatures along two axes of curvature. The axes of curvature are tilted about a finite axis tilt angle relative to the alignment coordinates of the overall facet arrangement. The result is a facet mirror with increased EUV throughput, particularly for prolonged operation of a projection exposure apparatus that is equipped therewith.

Abstract: An imaging optical system has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and the image field has a through-opening for the passage of the imaging light. A penultimate mirror of the imaging optical system in the beam path of the imaging light between the object field and the image field has no through-opening for the passage of the imaging light. The result is an imaging optical system that provides a combination of small imaging errors, manageable production and a good throughput for the imaging light.

Abstract: A sensor arrangement includes at least one position sensor apparatus for providing a position signal for a mirror and an evaluation apparatus for ascertaining the position of the mirror depending on the position signal.

Abstract: An optical system comprising: an illumination system configured, to form a periodic illumination mode comprising radiation in a pupil plane of the optical system having a spatial intensity profile which is periodic in at least one direction, a measurement system configured to measure a dose of radiation which is received in an field plane of the optical system as a function of position in the field plane, and a controller configured to: select one or more spatial frequencies in the field plane at which variation in the received dose of radiation as a function of position is caused by speckle, and determine a measure of the variation of the received dose of radiation as a function of position at the selected one or more spatial frequencies, the measure of the variation in the received dose being indicative of speckle in the field plane.

Abstract: A measurement system is disclosed in which a first optical system splits an input radiation beam into a plurality of components. A modulator receives the plurality of components and applies a modulation to at least one of the components independently of at least one other of the components. A second optical system illuminates a target with the plurality of components and directs radiation scattered by the target to a detection system. The detection system distinguishes between each of one or more components, or between each of one or more groups of components, of the radiation directed to the detection system based on the modulation applied to each component or each group of components by the modulator.

Abstract: A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of the radiation beam.

Abstract: Disclosed is an illumination system for a metrology apparatus and a metrology apparatus comprising such an illumination system. The illumination system comprises an illumination source; and a linear variable filter arrangement configured to filter a radiation beam from said illumination source and comprising one or more linear variable filters. The illumination system is operable to enable selective control of a wavelength characteristic of the radiation beam subsequent to it being filtered by the linear variable filter arrangement.

Abstract: An illumination apparatus for providing light and for illuminating an illumination plane with a rectangular light distribution is provided. The illumination apparatus includes at least one light source configured to generate light, a collimation optical unit configured to collimate the light, a condenser optical unit configured to shape a rectangular angular distribution of the light coming from the collimation optical unit, and a freeform optical unit having at least one freeform area for modifying the angular distribution such that a rectangular light distribution is produced in an illumination plane that is optically connected downstream.

Abstract: A system and method for isolating and analyzing single cells, comprising: a substrate having a broad surface; a set of wells defined at the broad surface of the substrate, and a set of channels, defined by the wall, that fluidly couple each well to at least one adjacent well in the set of wells; and fluid delivery module defining an inlet and comprising a plate, removably coupled to the substrate, the plate defining a recessed region fluidly connected to the inlet and facing the broad surface of the substrate, the fluid delivery module comprising a cell capture mode.

Abstract: An optical mechanism is provided. The optical mechanism includes a fixed member, a movable member, an optical element, a first sensing magnet and a first sensing element, wherein the movable member is movably connected to the fixed member, and the optical element is disposed on the movable member. The first sensing magnet corresponds to the optical element and has a first magnetic polar direction. The first sensing element corresponds to the first sensing magnet for detecting the rotation of the first sensing magnet around a first axis direction relative to the fixed member, wherein the first axis is perpendicular to the first magnetic polar direction.

Abstract: A method for printing a desired periodic pattern into a photosensitive layer on a substrate includes providing a mask bearing a periodic pattern whose period is a multiple of that of the desired pattern. The substrate is disposed in proximity to the mask, at least one beam is provided for illuminating the mask pattern to generate a transmitted light-field described by a Talbot distance. The layer is exposed to time-integrated intensity distributions in a number of sub-exposures by illuminating the mask pattern with the at least one beam while changing the separation between substrate and mask by at least a certain fraction of, but less than, the Talbot distance. The illumination or the substrate is configured relative to the mask for the different sub-exposures so that the layer is exposed to the same time-integrated intensity distributions that are mutually laterally offset by a certain distance and in a certain direction.

Abstract: An illumination optical system includes a fly's-eye lens having a back focal plane arranged on a pupil plane of the illumination optical system or in a vicinity of the pupil plane; a first spatial light modulator which is arranged on an incident side of the fly's-eye lens and which includes a plurality of first mirror elements; a first optical system arranged in an optical path between the first spatial light modulator and the fly's-eye lens; a second spatial light modulator arranged in an optical path between the first optical system and the fly's-eye lens and which includes a plurality of second mirror elements; and a polarizing element arranged in the optical path between the first spatial light modulator and the fly's-eye lens.

Abstract: A mark forming method includes: exposing a wafer with a mask image to form first and second resist marks that have different shapes than one another based on a portion of the mask image; applying a polymer layer that contains a block copolymer to the wafer by spin-coating; forming self-assembled regions in the applied polymer layer; selectively removing a portion of the self-assembled regions; and forming first and second wafer marks on the wafer using the first and second resist marks. This makes it possible to form the marks when forming circuit patterns using self-assembly of a block copolymer.

Abstract: A system and method of determining data representing a mapping of optical signals described by image data of a reflecting surface of a structure to a three-dimensional surface geometry of the reflecting surface is provided. At least first, second and third light sources are provided, comprising a broadband point light source, a spectrally variable point light source and a movable linear broadband light source, respectively. First, second and third images are acquired, corresponding to each light source. Surface geometry data describing a three-dimensional surface geometry of the reflecting surface is acquired. Based on the image data and the surface geometry data, reflecting surface mapping data describing a mapping between the reflections described by the first image data, second image data and third image data, and the three-dimensional surface geometry of the reflecting surface is determined.

Abstract: The disclosure relates to a cooler for use in a device in a vacuum, wherein the partial pressure of the cooling medium in the vacuum environment during the operation of the cooler is less than 10?3 mbar. The cooler includes a heat sink, wherein a cavity through which the cooling medium flows is formed in the heat sink, and wherein the heat sink includes a connection element which surrounds one end of the cavity through which the cooling medium flows. The cooler also includes a connecting piece for joining a coolant line to the cavity. The connecting piece includes a jacket secured on the connection element by a thermal connecting process. An intermediate layer is between the jacket and the connection element. The jacket exerts a force in the direction of the connection element so that the intermediate layer is under compressive stress in the radial direction during operation of the cooler.

Abstract: Light-emitting quantum dot films, quantum dot lighting devices, and quantum dot-based backlight units are provided. Related compositions, components, and methods are also described. Improved quantum dot encapsulation and matrix materials are provided. Quantum dot films with protective barriers are described. High-efficiency, high brightness, and high-color purity quantum dot-based lighting devices are also included, as well as methods for improving efficiency and optical characteristics in quantum dot-based lighting devices.

Abstract: An overlay measurement (OV) is based on asymmetry in a diffraction spectrum of target structures formed by a lithographic process. Stack difference between target structures can be perceived as grating imbalance (GI), and the accuracy of the overlay measurement may be degraded. A method of predicting GI sensitivity is performed using first and second images (45+, 45?) of the target structure using opposite diffraction orders. Regions (ROI) of the same images are used to measure overlay. Multiple local measurements of symmetry (S) and asymmetry (A) of intensity between the opposite diffraction orders are made, each local measurement of symmetry and asymmetry corresponding to a particular location on the target structure. Based on a statistical analysis of the local measurements of symmetry and asymmetry values, a prediction of sensitivity to grating imbalance is obtained. This can be used to select better measurement recipes, and/or to correct errors caused by grating imbalance.

Abstract: An exposure device according to an embodiment includes: a substrate in which light-emitting elements are mounted; an optical system which converges light emitted from the light-emitting elements; a holding member includes a holding member body which holds the substrate and the optical system, and a cut fringe projected from the holding member body; and a support member provided at a predetermined position in the holding member between the substrate and the optical system. The support member is formed of a cured agent attached to a shear surface of the cut fringe of the holding member, and the support member includes a contact surface with which the substrate is in contact.

Abstract: An optical module, in particular for microlithography, includes an optical element and a support unit. The optical element has at least one optically utilized area, which defines a rotational axis of symmetry. To support the optical element the support unit has a plurality of more than three support elements. Each of the support elements in the area of a first end is connected with the optical element and in the area of a second end is connected with the support structure. The support unit is designed such that the degree of freedom of rotation of the optical element around the rotational axis of symmetry is restricted, while the position or orientation of the optical element in the other five degrees of freedom is spatially adjustable via the support unit.

Abstract: A Lidar system configured to have a wide field of view. The LIDAR system includes a substrate. The substrate is planar. An array of electronic laser scan transceiver chips are mounted to the substrate. An lenslet array is spaced apart from the array of electronic laser scans transceivers so as to increase the field of the array of electronic laser scan transceiver chips. A plurality of baffles extend between the array of electronic laser scan transceiver chips and the lenslet array so as to separate the electronic laser scan transceiver chips and the lenslets from each other. The baffles provide structural support for the lenslet array and are further configured to absorb scatter from the laser beams transmitted and received by respective electronic laser scan transceiver chips. Accordingly, the Lidar system increases the field of view of the individual electronic scan transceivers without complicating the manufacturing process relative to Lidar systems with convex substrates.

Abstract: A photolithography method includes producing, from an optical source, a pulsed light beam; and scanning the pulsed light beam across a substrate of a lithography exposure apparatus to expose the substrate with the pulsed light beam including exposing each sub-area of the substrate with the pulsed light beam. A sub-area is a portion of a total area of the substrate. For each sub-area of the substrate, a lithography performance parameter associated with the sub-area of the substrate is received; the received lithography performance parameter is analyzed, and, based on the analysis, a first spectral feature of the pulsed light beam is modified and a second spectral feature of the pulsed light beam is maintained.

Abstract: The invention relates to a projection exposure apparatus for semiconductor lithography, comprising at least one manipulator for reducing image aberrations, wherein the manipulator has at least two optical elements that can be positioned relative to one another, wherein at least one of the optical elements is spatially dependent in terms of its effect on an optical wavefront passing therethrough such that a local phase change of a wavefront propagating in the optical system is produced in the case of a relative movement of the optical elements against one another. Here, the spatially dependent effect of the at least one optical element can be set in a reversible dynamic manner.

Abstract: A lithography apparatus includes a radiation source configured to produce radiation having a repetition frequency. The lithography apparatus also includes an optical component configured to guide the radiation within the lithography apparatus. The lithography apparatus further includes an actuator device configured to displace the optical component. In addition, the lithography apparatus includes a measurement device configured to determine a position of the optical component via a measurement signal having a measurement signal frequency. The measurement signal frequency is unequal to the repetition frequency, and the measurement signal frequency is unequal to integer multiples of the repetition frequency.

Abstract: A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.

Abstract: Devices and methods for processing a radiation beam with coherence are disclosed. In one arrangement, an optical system receives a radiation beam with coherence. The radiation beam comprises components distributed over one or more radiation beam spatial modes. A waveguide supports a plurality of waveguide spatial modes. The optical system directs a plurality of the components of the radiation beam belonging to a common radiation beam spatial mode and having different frequencies onto the waveguide in such a way that each of the plurality of components couples to a different set of the waveguide spatial modes, each set comprising one or more of the waveguide spatial modes.