Abstract: Disclosed is an electrostatic chuck with a temperature sensing unit, exposure equipment having the electrostatic chuck, and a method of detecting temperature on photomask surfaces. The temperature sensing unit and method of detecting temperature may include obtaining reflectance of a photomask using a multi-wavelength interferometer and determining a temperature on the photomask based on the reflectance.

Abstract: A reticle transport apparatus transports a reticle to and from a processing atmosphere. A reticle loader loads the reticle into the processing atmosphere, with at least a portion of the reticle being covered by a cover. A cover manipulator, in the processing atmosphere, removes the reticle from the cover and transfers the cover, without the removed reticle, to the reticle loader, and the reticle loader unloads the cover from the processing atmosphere. A cover cleaner, outside of the processing atmosphere, cleans the cover. When processing involving the reticle is completed, the reticle is returned to the cleaned cover or is placed in a different cover.

Abstract: A method of removing a substrate from a substrate table of a lithographic apparatus. The substrate table is provided with a mask arranged to form a peripheral exposure exclusion region on a substrate. The method includes moving the mask from an in use position to a storage position. The storage position is adjacent to a projection system of the lithographic apparatus. The method also includes removing the substrate from the lithographic apparatus.

Abstract: An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. A method for transporting the reticle to an exposure position from a position outside an exposure chamber is disclosed, including a method for use of a load-lock chamber.

Abstract: A lithographic workpiece processing tool includes a loading area for loading a workpiece; and a processing area for processing a workpiece. The workpiece processing tool further includes a multi-table system arranged between the loading area and the processing area. The multi-table system includes at least two tables configured to pass each other while moving between the loading area and the processing area. Each of the at least two tables is configured to hold a workpiece.

Abstract: A stage system for a lithographic apparatus includes a stage, an over-determined number of actuators to act on the stage, at least two sensors to measure a position dependent parameter of the stage and to provide a respective sensor signal. The at least two sensors are arranged to measure the respective position dependent parameters in a same degree of freedom. A controller is provided to provide a controller output signal to at least one of the actuators in response to a setpoint and the position dependent parameter as measured by at least one of the sensors. A further controller is provided with the position dependent parameters measured by the sensors. The further controller is configured to determine a difference between the position dependent parameters from the sensors and to provide a further controller output signal to at least one of the actuators in response to the determined difference.

Abstract: A top plate is configured to surround a space with a first plate member and a second plate member which oppose each other and a side wall member. The top plate includes a rib arranged in the space. The rib includes a plurality of connecting portions. Each connecting portion respectively connects to either the side wall member or a member in the space. The rib has a thickness at a portion between adjacent connecting portions which is larger than the thickness at each connecting portion.

Abstract: An exposure apparatus of the present invention is an exposure apparatus which exposes a pattern of an original plate 3 onto a substrate 5, and the exposure apparatus comprises an original plate alignment detection system 13 which moves the original plate 3 in an in-plane direction at an outside of an exposure region to measure positions of a plurality of alignment marks of the original plate 3, an interferometer 23 which measures a position of the original plate alignment detection system 13, a calculator which calculates a position and a shape of the original plate 3 from the positions of the plurality of alignment marks, and a correction unit which performs a correction in accordance with the position and the shape of the original plate 3 during exposure.

Abstract: A device container assembly (30) for storing a reticle (26) includes a device container (246) and a shield assembly (250). The device container (246) encircles the reticle (26). Further, the device container (246) includes a fluid port (254) that allows for the flow of fluid (276) into and out of the device container (246). The shield assembly (250) is encircled by the device container (246). Further, the shield assembly (250) is positioned between the fluid port (254) and the reticle (26) when the reticle (26) is positioned within the device container (246). The shield assembly (250) can inhibit contaminants (278) near the fluid port (254) from being deposited on the reticle (26) and can maintain the integrity of the reticle (26).

Abstract: The present invention is directed towards a method for determining deformation parameters that a patterned device would undergo to minimize dimensional variations between a recorded pattern thereon and a reference pattern, the method including, inter alia, comparing spatial variation between features of the recorded pattern with respect to corresponding features of the reference pattern; and determining deformation forces to apply to the patterned device to attenuate the dimensional variations, with the forces having predetermined constraints, wherein a summation of a magnitude of the forces is substantially zero and a summation of moment of the forces is substantially zero.

Abstract: A contact lithography apparatus, system and method use a deformation to facilitate pattern transfer. The apparatus, system and method include a spacer that provides a spaced apart parallel and proximal orientation of lithographic elements, such as a mask and a substrate, when in mutual contact with the spacer. One or more of the mask, the substrate and the spacer is deformable, such that deformation thereof facilitates the pattern transfer.

Abstract: An image forming apparatus includes a sheet discharge unit, a reading unit disposed above the sheet discharge unit, an operating panel, and an opening portion formed between the reading unit and the sheet mount unit such that the sheet can be taken out from the front side of the apparatus. The operating panel extends to the front side of the apparatus in the reading unit so that the tip thereof is located at the same position as the front end portion side of the sheet mount unit or projects from the front end portion side. There is provided an area where the projection amount from the reading unit is set to be smaller than the maximum projection amount of the operating panel.

Abstract: A mask (MM) with patterns (MF) for use in a reflection lithography device with a photon beam with a wavelength of less than about 120 nm. Said mask (MM) comprises a planar substrate (ST) fixed to a reflecting structure (SMR) comprising a front face provided with selected patterns (MF) made from a material which is absorbent at the given wavelength and further comprises protection means (SP) which are transparent to the given wavelength and arranged such as to maintain a distance (H) between the perturbing particles (PP) and the patterns (MF) greater than or equal to one of the values of the depth of focus of the lithographic device and the height associated with the percentage of photon absorption by the perturbing particles (PP) which is acceptable.

Abstract: A stage body has a holding surface for placing a substrate thereon. A predetermined embossed configuration is formed by embossing on the holding surface, and thereafter an alumina film in an amorphous state is formed by an anodic oxidation process on the holding surface. The alumina film having an amorphous structure is dense and strong to provide high wear resistance and to substantially prevent separation electrification. This provides a substrate stage having high wear resistance and capable of preventing separation electrification.

Abstract: A stage apparatus includes a base, a stage that can move on a surface of the base, a first imparting unit arranged inside the base, which has a mass body and an actuator that is fixed to the base and moves the mass body in a direction vertical to the surface, the first imparting unit being configured to apply a force to the base by moving the mass body, and a controlling unit that controls the movement of the mass body in the vertical direction in the first imparting unit in accordance with movement of the stage, so that a force, which is generated in the base by the movement of the stage in a rotational direction around an axis parallel to the surface, is reduced.

Abstract: A document reading device of the present invention includes a glass platen on which a document is to be laid and document reading means including scanning optics for reading the image of the document laid on the glass platen. A document pressing member presses the document against the surface of the document table. The document pressing member is removably mounted to the body of the document reading device by hook and loop fasteners.

Abstract: A sheet post-processing apparatus of the invention includes a sheet guiding unit configured to have plural components including paper carrying components be attached thereto, a tray onto which a sheet of paper is discharged, and a protection cover attached to the sheet guiding unit at a portion in close proximity to the tray side. A protection cover has a cover main body, a screw attachment portion, a screw cover that covers the screw attached to the screw attachment portion, and a slit used for the tip end of the screw cover to be inserted into the cover main body to be fixed thereto.

Abstract: An apparatus including an original stage that holds an original, a substrate stage that holds a substrate, and a projection optical system that projects a pattern of the original onto the substrate, and being configured to scan and expose the substrate during a period in which the speeds of the original stage and the substrate stage change, comprises a controller configured to correct, a distortion generated in an image transferred onto the substrate due to at least one of deformation of the original stage in response to a change in speed of the original stage and deformation of the substrate stage in response to a change in speed of the substrate stage, based on a correction value determined by an acceleration of the substrate stage.

Abstract: In a lithographic apparatus, a slip of a patterning device relative to a support, the support being constructed to support the patterning device, may be provided by: measuring a position of the support relative to a structure of the lithographic apparatus; measuring a position of the patterning device relative to the structure of the lithographic apparatus; determining a correlation between the position of the patterning device and the position of the support; and deriving from the correlation a slip of the patterning device relative to the support. The structure may include a projection system to project a radiation beam patterned by the patterning device onto a target portion of the substrate. The projection system may be connected to a frame, such as a metrology frame of the lithographic apparatus.

Abstract: Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the body. The body may be of a material that is substantially transparent to activating light. At least a portion of the plurality of recesses may define features having a feature size less than about 250 nm. A template may be formed by obtaining a material that is substantially transparent to activating light and forming a plurality or recesses on a surface of the template. In some embodiments, a template may further include at least one alignment mark. In some embodiments, a template may further include a gap sensing area. An imprint lithography template may be used to form an imprinted layer in a light curable liquid disposed on a substrate. During use, the template may be disposed within a template holder.

Abstract: A position control system for a substrate support of a lithographic apparatus includes a position measurement system configured to determine a position of a sensor or sensor target on the substrate support, a controller configured to provide a control signal based on a desired position of a target portion of the substrate and the determined position, and one or more actuators configured to act on the substrate support. The position control system includes a stiffness compensation model of the substrate support, the stiffness compensation model including a relation between a difference in a change in position of the target portion and a change in position of the sensor or sensor target as a result of a force exerted on the substrate support. The position control system is configured to substantially correct at least during projection of a patterned radiation beam on the target portion, the position of the target portion using the stiffness compensation model.

Abstract: An adapter is disclosed, comprising a frame including an inner edge with a first side, a second side, a third side and a fourth side, wherein the first side and the fourth side are opposite and the second side and the third side are opposite. At least two fixed hold elements are connected to the first side of the inner edge of the frame. A plurality of first flexible clip elements are connected to the second and third sides of the inner edge of the frame. At least two second flexible clip elements are connected to the fourth side of the inner edge of the frame.

Abstract: An apparatus and method for aligning a substrate and a mask are discussed. In one aspect of the present invention, the apparatus includes a mask stage, wherein the mask stage includes a mask fixing stage configured to fixedly support a mask; a base stage supporting the mask fixing stage; and at least one guide unit disposed in the base stage, coupled to the mask fixing stage, and configured to move the mask fixing stage, so as to move the mask in a predetermined direction.

Abstract: Methods and apparatus for shielding a reticle within an illumination system are disclosed. According to one aspect of the present invention, a blind arrangement for shielding an object such as a reticle includes a coil assembly which has at least one coil, an air supply that supplies air, and a first blind portion. The first blind portion includes at least one magnet and is not in physical contact with the coil. The first blind portion is supported at a distance from the coil by the air, and the coil assembly cooperates with the magnet to cause the first blind portion to move. The first blind portion shields the object when the first blind portion is in a first position.

Abstract: An apparatus that exposes a pattern of an original onto a plate through a projection optical system. The apparatus includes a reference base that holds the projection optical system, a supporting unit configured to elastically support the reference base, a base structure that holds the supporting unit on an installation floor, a detection unit configured to detect a relative position between the base structure and the reference base, and an adjustment unit, which is disposed at the installation floor of the base structure, configured to adjust an attitude of the base structure based on the results detected by the detection unit.

Abstract: An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.

Abstract: Reticle management systems and methods. The system comprises at least one reticle and at least one cabinet with an inert gas environment. The cabinet comprises a plurality of storage spaces. When the reticle is put in a storage space, the cabinet identifies the reticle and the storage space occupied thereby. The cabinet provides inert gas to the reticle. The storage information of the reticle in the cabinet and/or an inert gas status of the reticle are provided to a query system and a dispatch system for reticle location query and lot dispatching.

Abstract: A lithographic apparatus is disclosed having a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, the support including a support clamp constructed to clamp the patterning device to the support, and a bending mechanism constructed to apply a bending torque to the clamped patterning device, the bending mechanism comprising a force/torque actuator configured to act on the clamped patterning device without substantially reducing the clamping force exerted on the patterning device by the support clamp.

Abstract: An exposure apparatus for exposing a substrate to radiant energy includes: a stage including a chuck, and configured to hold the substrate on the chuck with vacuum and to be moved; a recovery device configured to recover the substrate from the stage; a first detector configured to detect an error of holding of the substrate on the chuck; a measuring device configured to measure an amount of positional deviation of the substrate relative to the chuck; and a controller configured to cause the measuring device to measure the amount of positional deviation in a case where the first detector detects the error, and to control an operation of the stage such that the amount of positional deviation falls within a tolerance based on the measured amount.

Abstract: There are provided a wafer stage, an exposure apparatus having the same, and a wafer flatness correction method using the same. The wafer stage includes a chuck having first and second vacuum holes, a first vacuum pump applying a vacuum suction force to the first vacuum holes and a second vacuum pump applying a vacuum suction force to the second vacuum holes. Further, the exposure apparatus and the wafer flatness correction method using the same are disclosed.

Abstract: In order to improve the productivity of a lithographic apparatus, a stage apparatus for holding two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length of the pattern in the scanning direction. By doing so, an improved exposure sequence may be performed by exposing a first die with a first pattern, skipping a second die adjacent to the first die, and exposing a third die adjacent to the second die using a second pattern.

Abstract: A lithographic apparatus includes a support constructed to support a patterning device. The patterning device is capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. The support includes a force actuator device to exert a force onto the patterning device in a direction of movement of the support. The force actuator device includes a movable part which is pivotably about a pivot axis and thereby connected to the support. The movable part is in the direction of movement of the support substantially balanced with respect to the pivot axis. The force actuator device further includes an actuator to exert via the movable part the force onto the patterning device, to at least partly compensate for the information or a risk of slippage due to acceleration of the support in the direction of movement.

Abstract: A filter device disposed in the reticle library of a lithography system, the lithography system comprising: a light emitting unit for providing a light source, a reticle library disposed with a plurality of reticles, a reticle stage disposed with a fastener for fastening the reticle, a substrate stage disposed with a fastener for fastening the substrate, and a lens module for focusing the light source provided by the light emitting unit and transferring the emitted part of the reticle on the reticle stage to the substrate; the filter device being composed of a bottom base, a top cover, and a chemical absorbent layer, wherein the filter device and the reticle in the lithography system have equal size and are aligned next to each other on support shelves in the reticle library. Thus, the filter device can effectively filter the airborne molecular contaminants (AMC) surrounding the reticle.

Abstract: An exposure apparatus, and exposure method and a device manufacturing method, wherein the exposure apparatus includes a projection optical system, an original stage configured to hold an original thereon and to move the original, a position measuring system configured to measure a position of a pattern surface of the original held by the original stage, with respect to a direction parallel to an optical axis of the projection optical system, an exposure system configured to expose a substrate through the original and the projection optical system, on the basis of the measurement by the position measuring system, a memory configured to store therein compensation information that interrelates a temperature of the position measuring system and a compensation quantity for compensating for an output of the position measuring system, and a controller configured to compensate for an output of the position measuring system on the basis of the compensation information stored in the memory, to obtain a position measure

Abstract: An exposure apparatus for performing exposure of a substrate to light via a reticle. The apparatus includes a first stage configured to hold a chuck. The chuck has a support base with an electrode, and forms a container, for one of the substrate and the reticle, together with a cover. The container electrostatically chucks the one on the support base by the electrode. A transporter transports the container in which the one is contained, and loads the chuck, which chucks the one, on the first stage without the cover. A second stage holds the other of the substrate and the reticle. The apparatus obtains a first positional shift amount between the chuck and the one chucked on the chuck before the transportation by the transporter, to measure a second positional shift amount between a reference mark on the chuck held by the first stage and a reference mark on the second stage, and corrects positions of the first and second stages based on the first and second positional shift amounts, to perform the exposure.

Abstract: A processing unit including a supply section for storing a mask having a patterned surface having a pattern to be exposed to a plate, the supply section being maintained under atmospheric pressure, a process chamber for processing the plate, the process chamber being maintained in a reduced pressure or vacuum atmosphere and the processing unit transferring the mask between the supply section and the process chamber, and a protection unit for protecting the patterned surface in a non-contact manner and for holding part of the mask other than the patterned surface. The protection unit covers the mask while opening at least a part of the other side surface of the patterned surface. The processing unit further includes a transfer unit for adsorbing the protection unit and for transferring the protection unit and the mask held by the protection unit, between the supply section and the process chamber.

Abstract: A method of controlling a component within a lithographic apparatus is presented. The component is moved relative to a reference within the lithographic apparatus by a first actuator. A second actuator that exerts a force between the component and a reaction mass is used to adjust at least one of a position, velocity and acceleration of the component relative to the reference within the lithographic apparatus.

Abstract: The present invention provides an apparatus and method for handling a reticle during manufacturing processes of semiconductor devices in the fabrication line. The apparatus includes a holder for the reticle, the holder is configured to securely hold the reticle and a level indicator attached to and operative with the holder to indicate leveling condition of the holder. The apparatus further includes a shaft connected to the holder for holding and a switch connected to the shaft. The method includes providing a reticle and clamping the reticle with a reticle holder including a switch and a leveling indicator operative with the holder to indicate leveling condition of the holder. The method further includes loading the reticle into a reticle pod while maintaining the leveling condition of the holder.

Abstract: An apparatus that projects a pattern of an original, onto a substrate held by a substrate stage having a top plate, to expose the substrate, comprises a cleaning unit, the cleaning unit including a discharge nozzle configured to discharge a fluid toward the top plate, and a recovery nozzle configured to recover the fluid discharged from the discharge nozzle, wherein an opening of the recovery nozzle has a shape which surrounds a path of the fluid discharged from the discharge nozzle.

Abstract: The present invention includes a substrate support system having a chuck body. The chuck body includes a body surface with a pin extending therefrom having a contact surface lying in a plane. The pin may be movably coupled to the chuck body to move with respect to the plane. The pin may also include a cross-member having multiple contact lands.

Abstract: Provided are an off-axis illumination apparatus, an exposure apparatus, and an off-axis illumination method. The off-axis illumination apparatus may include a mask, a light source for emitting light to the mask, and an incident angle varying section for varying an incident angle of the light. The exposure apparatus may include the off-axis illumination apparatus in addition to a wafer stage and an optical detector. The off-axis illumination method may include irradiating light from the light source to a mask, and moving positions of the light source and the mask to vary an incident angle of the light to the mask.

Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate. The substrate has a surface coated at least partially with a layer of radiation sensitive material. The lithographic apparatus also includes a projection system configured to project the patterned beam onto a target portion of the substrate, and a liquid supply system. The liquid supply system is configured to supply a prewetting liquid on top of the layer of radiation sensitive material to prewet the substrate, and is configured to supply an immersion liquid in a space between the prewet substrate and at least a portion of the projection system.

Abstract: A position measuring apparatus includes a holder having storage spaces in which a three-point support member for supporting a backside of a substrate being a mask at three points, and a vacuum chuck member for holding a backside of a substrate being a mask are prepared, a stage on which one of the three-point support member and the vacuum chuck member prepared in the storage spaces of the holder is mounted, a vacuum pump to hold and chuck the substrate through the vacuum chuck member in a state of being mounted on the stage, and a recognition unit to recognize a position of a pattern written on the substrate supported by the three-point support member mounted on the stage and a position of a pattern written on the substrate held by the vacuum chuck member on the stage.

Abstract: The invention provides a height detecting apparatus for a lithographic apparatus. The height mapping apparatus includes a height mapping unit for providing at least one height map of a top surface of an object to be placed in a radiation beam of the lithographic apparatus, the object to be clamped by a clamping force applied thereto on a support constructed to support the object. The height mapping apparatus also includes a control unit for controlling the mapping unit to provide the at least one height map of the object relative to at least two different clamping pressure levels.

Abstract: This invention provides a positioning apparatus which can safely stop a movable body irrespective of its driving status. This invention relates to a positioning apparatus which positions a movable body (4) of an exposure apparatus and includes a driver (2) which drives the movable body (4), a power source (3) which supplies power to the driver (2), and a controller (1). The controller (1) stops the power supply from the power source (3) to the driver (2) after the elapse of a time period, which is determined in accordance with the driving status of the movable body (4) driven by the driver (2), in response to a stop instruction signal (11) which instructs to stop the driving of the movable body (4).

Abstract: A lithographic apparatus including a projection system configured to project a patterned radiation beam onto a target portion of a substrate; a metrology frame supported by a vibration isolation support device; an object movable with respect to the metrology frame; and a displacement determining unit to determine positions, speeds and/or accelerations of the object with respect to the metrology frame and/or the projection system. At least one actuator is provided for applying correcting forces and/or torques on the metrology frame, and a controller is provided which is configured to calculate the correcting forces and/or torques to be applied to the metrology frame based on the determined positions, speeds and/or accelerations of the object in order to compensate for pressure pulses exerted on the metrology frame due to movements of the object with respect to the metrology frame.

Abstract: A lithographic apparatus has a patterning support holding a patterning device. At least one position sensor measures a position of the patterning device relative to the patterning support, and generates a measuring signal. A positioning device controls a position of the patterning support on the basis of the measuring signal input to the positioning device. In a corresponding device manufacturing method a patterning support is provided. A patterning device is held on the patterning support. The patterning support is moved along a line of movement. A position of the patterning device relative to the patterning support is measured, and a position of the patterning support is controlled on the basis of the measurement of the position of the patterning device relative to the patterning support. Thus, the controlling of the position of the patterning support compensates for a slip of the patterning device relative to the patterning support.

Abstract: A substrate processing apparatus and method are disclosed.

Abstract: Reticle stages for lithography systems and lithography methods are disclosed. In a preferred embodiment, a lithography reticle stage includes a first region adapted to support a first reticle, and at least one second region adapted to support a second reticle.

Abstract: An apparatus for supporting a mask comprises a pair of members. The mask held against each member by a vacuum arrangement which prevents relative motion between the mask and members. The members are compliant such that they accommodate flatness variations in the mask but without deforming the mask.