Abstract: An exposure apparatus configured to expose a substrate to light to transfer a pattern of a reticle onto the substrate includes a reticle stage configured to mount the reticle, a structure configured to support the reticle stage, a plurality of first supporting members configured to support the structure; and a second supporting member configured to support the structure outside an area formed by connecting the three first supporting members. The second supporting member includes a unit configured to dampen vibration of the structure.

Abstract: An imaging system comprises a lid having a light source disposed therein and a media carriage coupled to the lid. The media carriage is adapted to support at least two media objects and is movable relative to the light source to alternately expose the two media objects to the light source for generating scanned images thereof.

Abstract: The present invention provides methods and systems for fast purging of pellicle volumes. A purge device has a base which is enclosed in a controlled environment filled with purge gas. The base has a cavity formed on a surface therein. The cavity receives a reticle-pellicle assembly including a pellicle surface and an enclosed pellicle volume. A first region within the cavity can be formed to hold purging gas at a high pressure. A gap region is formed below the pellicle within the cavity. A displacement force on the pellicle due to a pressure difference between purging gas in the enclosed volume and purging gas in the gap region is kept within a tolerance range of the pellicle. According to further embodiments, a purge device is provided that includes a flow barrier (e.g., non-contacting and/or contacting barriers). A pressure balancing plate and/or flow resistant plates are provided in a purge device.

Abstract: The present invention provides a reticle container that is equipped with a secondary container which houses the reticle and is housed in the primary container. The secondary container is held within the primary container with shock and vibration isolation members so that the secondary container has multiple degrees of freedom of motion within the primary container. The reticle is secured inside the secondary container such that shock and vibration transmission from the reticle container to the reticle is substantially attenuated.

Abstract: A mask transport system is configured to transport a mask into and out of a lithographic apparatus. The mask transport system includes a first container configured to shield a top side and a bottom side of the mask. At least a portion of the container is at least partially translucent for radiation having a predetermined wavelength used to detect contamination on the top side or the bottom side of the mask when the mask is shielded by the first container. The mask transport system also includes a second container configured to enclose the first container. The second container includes a first part defining a first opening and an openable cover that covers the first opening. The cover is configured to open and release the first container within the lithographic apparatus or at an interface with the lithographic apparatus.

Abstract: For the correction of anamorphism in the case of a projection lens of an EUV projection exposure apparatus for wafers it is proposed to tilt the reticle bearing the pattern to be projected and preferably also the wafer by a small angle about an axis that is perpendicular to the axis A of the lens and perpendicular to the scan direction and that in each instance passes through the middle of the light field generated on the reticle or on the wafer. For the correction of a substantially antisymmetric quadratic distortion the reticle and/or the substrate is instead rotated about an axis of rotation that is disposed at least approximately parallel to an optical axis of the projection lens.

Abstract: A near-field exposure mask includes a light blocking film having an opening smaller than a wavelength of exposure light, and a mask base material for holding the light blocking film. The near-field exposure mask is configured and positioned to effect exposure of an object to be exposed to near-field light generated corresponding to the opening during contact thereof with the object to be exposed. The mask base material is transparent to the exposure light and comprises a synthetic resin material having Young's modulus in a range of 1 GPa or more to 10 GPa or less.

Abstract: A substrate holding apparatus which contacts an undersurface of a substrate and holds the substrate, at least a portion of a top surface of the substrate being immersed in liquid. The apparatus includes a chuck unit for supporting the substrate, and a groove, arranged along an outer periphery of a substrate supporting surface of the chuck unit, for storing a fluorinated inert refrigerant, fluorinated oil or a gelatinous polymer material.

Abstract: A lithographic apparatus includes a displacement measuring system to measure a position of a moveable object with respect to a reference frame of the lithographic apparatus, in at least three coplanar degrees of freedom (x, y, Rz) of an orthogonal x-y-z coordinate system centered in the center of the moveable object. The moveable object includes a support structure configured to support a patterning device or a substrate table configured to support a substrate. The displacement measuring system includes at least three sensor heads, each sensor head being positioned with a measuring direction substantially coplanar with the x-y plane of the coordinate system and each sensor head being furthermore positioned with the measuring direction substantially perpendicular to a connection line connecting the sensor head with the center of the movable object and extending coplanar with the x-y plane.

Abstract: A method of processing a substrate includes forming a first layer having a photosensitive response to incident radiation on the substrate, forming a first pattern in the first layer, and exposing the first pattern to ultra-violet radiation. The exposure of the first pattern to ultra-violet radiation increases the resistance of the first pattern to a developer. The method also includes forming a conformal protective layer over the first pattern and at least a portion of the substrate. The method further includes forming a second layer having a photosensitive response to incident radiation over the conformal protective layer and forming a second pattern in the second layer.

Abstract: Systems and methods for lithography include actuating an electroactive polymer member to position mask and/or substrate.

Abstract: A reading apparatus comprising a plate on which a transparent original is placed, and a guide unit for setting the transparent original at a predetermined position on the original plate. A light source unit is settable at plural positions in contact with the guide unit for illuminating the transparent original which is urged against the original plate by the light source unit. A portion of the light source unit which is contacted with the transparent original is chamfered (R-worked) not to damage the transparent original. Further, a portion of the light source unit which is contacted with the transparent original is designed to urge the transparent original at an out of an image area of the original.

Abstract: An article support constructed to support an article for lithographic processing purposes is described. The article support includes a channel configuration arranged to guide thermally stabilizing media in the article support to provide thermal stabilization to the article, wherein the channel configuration comprises an input channel structure and an output channel structure, the input and output channel structures arranged in a nested configuration and connected to each other by a fine grid structure provided at or near a surface of the article support. A lithographic apparatus and device manufacturing incorporating the article support is also described.

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a chuck configured to hold and position an object, for example, the patterning device onto the support or the substrate onto the substrate table, the chuck including a base and a constraining layer. A damping layer including a viscoelastic material is provided between the base and the constraining layer.

Abstract: A drive device has movable elements connected to a stage and stationary elements arranged in one predetermined axial direction. The drive device causes the stage to generate drive force parallel to a two-dimensional plane and drives the stage in a direction in the two-dimensional plane and in a direction inclined relative to the two-dimensional plane. The structure above makes it possible to move the stage in the directions in the two-dimensional plane and the inclined plane without employing, as conventionally used, a structure having a two-dimensionally moving stage and a table movable on the stage in the inclined direction, and thus the stage can be formed as a simple integrated body.

Abstract: A substrate conveyor apparatus carries a substrate on which patterns are formed, carries the substrate in a state protected by a protective cover when the substrate is not used, and carries a cover protection means that covers the inner surface of the protective cover when the substrate is used. The substrate conveyor apparatus has a grounding means that grounds the substrate or the protective cover.

Abstract: A projector includes a projection optical device that magnifies and projects image light and a projection position adjusting device that moves the projection optical device in a plane orthogonal to a projecting direction and adjusts a projection position of the projection optical device. The projection position adjusting device includes a fixed member fixed in the projector, a first moving plate that supports the projection optical device and moves in a first axial direction and a second axial direction orthogonal to each other in the plane orthogonal to the projecting direction, a second moving plate that is interposed between the fixed member and the first moving plate, engages with the first moving plate, and moves in the second axial direction together with the first moving plate, adjusting and driving units that move the first moving plate and the second moving plate, and plural coupling members that movably couple the first moving plate to the fixed member.

Abstract: A method for matching a first OPE curve (700) for a first exposure apparatus (10A) used to transfer an image to a wafer (28) to a second OPE curve (702) of a second exposure apparatus (10B). The method can include the step of adjusting a tilt of a wafer stage (50) that retains the wafer to adjust the first OPE curve. As provided herein, the first exposure apparatus (10A) has the first OPE curve (700) because of the design of the components used in the first exposure apparatus (10A), and the second exposure apparatus (10B) has a second OPE curve (702) because of the design of the components used in the second exposure apparatus (10B). Further, the tilt of the wafer stage (50) can be selectively adjusted until the first OPE curve (700) approximately matches the second OPE curve (702). With this design, the two exposure apparatuses (10A) (10B) can be used for the same lithographic process.

Abstract: A lithographic apparatus includes a movable object and a control system to control the position of the movable object. The control system includes a position measurement system configured to measure the position of the movable object, a comparative unit configured to generate a servo error signal by subtracting a position signal representative of an actual position of the movable object from a reference signal, a control unit configured to generate a first control signal based on the servo error signal, a feed-forward unit configured to generate a feed-forward signal based on the reference signal, an addition unit configured to generate a second control signal by adding the first control signal and the feed-forward signal, and an actuator unit configured to actuate the movable object. A gain of the feed-forward unit is dependent on the position of the movable object.

Abstract: There are provided a sheet paper identification device and method capable of preventing use of the device in an abnormal state by preventing erroneous identification caused by dust attached to an interior of a pickup section, detecting the abnormal state in the pickup section due to the dust, and notifying it outside. When a sheet paper is inserted from a sheet paper insert section (3), the sheet paper is fed by a sheet paper feed section (4). An image pickup section (7) images the interior of the image pickup section (7) before the sheet paper is fed to the image pickup section (7) so as to acquire image data without any sheet paper so as to acquire image data having the sheet paper. A dust detection section (8) calculates the position and the area of the image indicating dust of the image data having no sheet paper.

Abstract: A method and apparatus to create two dimensional and three dimensional structures using a maskless photolithography system is provided. In an embodiment, the pattern generator comprises a micromirror array wherein the positioning of the mirrors in the micromirror array and the time duration of exposure can be modulated to produce patterns to photoform photosensitive material. The desired pattern can be designed and stored using conventional computer aided drawing techniques and can be used to control the positioning of the individual mirrors in the micromirror array to reflect the corresponding desired pattern. A fixture for mounting of the substrate can be incorporated and can allow the substrate to be moved three dimensions. The fixture can be rotated in one, two, or three directions.

Abstract: A document reading device includes a movable member and a flexible document holder. The document holder is fixed at a first end to a free end of the movable member. The document holder is also fixed at a second end to the vicinity of a right-side end of a bottom surface of the document reading device. A portion of the document holder positioned immediately below a pivot axis of the movable member is not fixed to the bottom surface. When the movable member is pivoted to expose a portion of a document transport path, the document holder, except for the first and second ends as fixed to the bottom surface, hangs down without being folded.

Abstract: An imaging system comprises a base unit having a platen. The imaging system also comprises a lid coupled to the base unit and adapted to be disposed over the platen. The lid comprises a door openable relative to the lid to enable access to the platen therethrough.

Abstract: A lithographic apparatus is disclosed that has a track comprising a plurality of gas outflow openings positioned along the track. A gas conduit is configured to feed pressurized gas to the gas outflow openings to form a gas bearing configured to moveably bear an object along the track. Further, a gas flow device is provided that is configured to cause or prevent flow of gas through one or more of the gas outflow openings dependent on a position of a guide surface of the object with respect to the gas outflow openings.

Abstract: A lithographic scanning apparatus includes a light projection device for seamlessly and uniformly projecting a scanning light onto a light exposing area. The light projecting device further includes an array of micromirrors having a predefined distribution pattern of reflectance variations for reflecting an incident light onto the light exposing area to seamlessly and uniformly scanning a reflecting light over the light exposing area. In one of a lithographic scanning apparatus, the micromirrors of the micromirror array are coated with a reflective coating of different reflectance to provide the predefined distribution pattern of reflectance variations. In another lithographic scanning apparatus, the micromirrors of the micromirror array are coated with stripes of reduced reflectance whereby each micromirror may have predefined total reflectance to provide the predefined distribution pattern of reflectance variations.

Abstract: A lithographic apparatus is disclosed that includes an article support constructed to support a first article, capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, in a beam path of the radiation beam or a second article to be placed in a beam path of the patterned radiation beam, the article support having a plurality of supporting protrusions on which the first article or the second article is disposed in use, wherein the plurality of supporting protrusions are constructed to define a support zone to provide a plane of support for the first article or the second article, so that when the first article or the second article is subjected to a thermal load the support zone allows at least a portion of the first article or the second article to expand or contract to reduce the build up of a mechanical stress in the first article or second article, respectively, while maintaining the first article or second article substantially fixed to the article suppor

Abstract: An optical projection unit comprising a first optical element module and at least one second optical element module is provided. The first optical element module comprises a first housing unit and at least a first optical element, the first optical element being received within the first housing unit and having an optically used first region defining a first optical axis. The at least one second optical element module is located adjacent to the first optical element module and comprises at least one second optical element, the second optical element defining a second optical axis of the optical projection unit. The first housing unit has a central first housing axis and an outer wall extending in a circumferential direction about the first housing axis. The first optical axis is at least one of laterally offset and inclined with respect to the first housing axis. Furthermore, the first housing axis is substantially collinear with the second optical axis.

Abstract: A circular cylinder-shaped mask is used to form an image of a pattern on a substrate via a projection optical system. The mask has a pattern formation surface on which the pattern is formed and that is placed around a predetermined axis, and the mask is able to rotate, with the predetermined axis taken as an axis of rotation, in synchronization with a movement of the substrate in at least a predetermined one-dimensional direction. When a diameter of the mask on the pattern formation surface is taken as D, and a maximum length of the substrate in the one-dimensional direction is taken as L, and a projection ratio of the projection optical system is taken as ?, and circumference ratio is taken as ?, then the conditions for D?(?×L)/? are satisfied.

Abstract: Two independent fine adjustment stages are arranged on one coarse adjustment stage to simultaneously perform all of focus measurement and part of alignment measurement in parallel with an exposure operation. A method of transporting a wafer together with a chuck is adopted as a precondition. Alignment of a pattern on a wafer with a chuck is performed before the chuck is mounted on each fine adjustment stage.

Abstract: Techniques for minimizing contamination by particles that wear off of components that come into and out of contact with each other. The invention involves forming at least one of the components out of a magnetic material so that the particles that wear off of the component are magnetic themselves. Then a magnetic field is used to attract the particles. In one embodiment, the particles are attracted to and collected by a magnet. In this way, the particles are drawn away from any components that might be contaminated. In some embodiments, the magnetic component is also magnetized. In other embodiments, a magnet is placed in contact with the magnetic component. In other embodiments, each of the components that come into contact with each other are formed of a magnetic material.

Abstract: An original cover closer of which the energy absorption capability can be freely adjusted by a damper is described. The development period for the original cover closer is therefore shortened. The original cover closer comprises: an attachment member to be mounted on the main body of a device; a support member pivotally connected to the attachment member and operable to support an original cover; a first and a second slider slidably installed in the support member; a compression coil spring interposed between the first and second sliders and operable to urge the original cover to open; and a fluid damper located in the compression coil spring.

Abstract: A stage assembly (218) for positioning a work piece (30) includes a stage (238), a heat transfer region (246), a stage mover assembly (240), and an environmental system (226). The stage (238) retains the work piece (30). The heat transfer region (246) is positioned near the stage (238). The stage mover assembly (240) moves the stage (238) relative to the heat transfer region (246). The environmental system (226) directly controls the temperature of the heat transfer region (246). For example, the environmental system (226) can circulate a circulation fluid near the heat transfer region (246). A bearing (254B) can maintain the stage (238) spaced apart from the heat transfer region (246).

Abstract: The invention provides a chuck plate assembly that includes a shadow mask formed with a predetermined pattern; a shadow mask frame holding the shadow mask and having heat-radiating and cooling functions; a substrate aligned with the shadow mask and onto which deposition materials from a deposition source are deposited; and a chuck plate, attaching the substrate to the shadow mask, that includes a refrigerant circulating duct. The temperature of the substrate is optimized in consideration of the temperature of the shadow mask so that an alignment error due to thermal deformation is minimized. That is, the temperature of the shadow mask itself is prevented from rising, and thereby prevents deformation of the shadow mask due to thermal expansion, which improves the precision of a substrate pattern position.

Abstract: The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.

Abstract: A reticle and an exposure apparatus using the reticle are provided. The reticle includes alignment marks having a plurality of segments along coordinate directions corresponding to a plurality of regions of the reticle, in symmetrical positions about coordinate axes. The reticle also includes detection sensors having detection regions corresponding to a mirror image of the alignment marks of the reticle. Accordingly, it is possible to prevent alignment errors generated due to aberration of a lens from being different on different sides of each coordinate axis, thus enabling more precise reticle alignment and therefore overlay alignment.

Abstract: According to one aspect of the present invention, a method and apparatus for processing a substrate may be provided. A reticle may be positioned relative to a substrate. The reticle may have a plurality of features with dimensions extending in a first and a second direction and being asymmetric in the first direction. Electromagnetic radiation may be directed onto the reticle. The electromagnetic radiation may have a first portion propagating onto the reticle in substantially the first direction and being incident on the reticle at a first angle and a second portion propagating onto the reticle in substantially the second direction and being incident on the reticle at a second angle. The second angle being greater than the first angle.

Abstract: An exposure process using photomasks, the process includes the steps of: providing a plurality of glass photomasks for optical lithography with respect to a target substrate to be processed, the photomasks having identical exposure patterns, and exposing the target substrate a plurality of times using the plurality of glass photomasks.

Abstract: An exposure apparatus is configured to expose a pattern formed on an original onto a substrate using extreme ultraviolet light. The exposure apparatus includes a stage configured to move at the time of exposure, an electrostatic chuck which is provided on the stage and is configured to hold the original, an electrode which is provided outside the electrostatic chuck on the stage via an insulator, and an electric field forming member which is provided so that an absolute value of an electric potential difference with respect to the electrode is greater than an absolute value of an electric potential difference with respect to the original at a position facing the electrode. The particle adherence to the original can be effectively avoided.

Abstract: The present invention provides a method for determining the forces to be applied to a substrate in order to deform the same and correct for overlay misalignment.

Abstract: A moving apparatus including a first movable body which moves in a first direction in a horizontal plane, a second movable body arranged in a location different from a location of the first movable body in a vertical direction, which moves in a second direction intersecting with the first direction in the horizontal plane, a first linear motor which moves the first movable body in the first direction, a second linear motor which moves the second movable body in the second direction, a third movable body which is moved in the first direction and is moved in the second direction, a vacuum container which puts the first, second and third movable bodies in a vacuum, driving force transmission rods, and a sealing mechanism for sealing the driving force transmission rods and the vacuum container.

Abstract: An apparatus includes a support table for supporting a substrate. The support table includes a plurality of support protrusions that contact the substrate during use for supporting the substrate. The support table includes a plurality of heat transfer protrusions that extend towards the substrate during use without contacting the substrate when the substrate is supported by the support protrusions. Gas-containing heat exchanging gaps for exchanging heat with the substrate extend between the heat transfer protrusions and the substrate.

Abstract: An apparatus for measuring the relative positions of frontside and backside alignment marks located on opposite sides of a substrate is disclosed. The apparatus includes upper and lower optical systems that allow for simultaneous imaging of frontside and backside alignment marks. The frontside and backside alignment mark images are processed to determine the relative position of the marks, as a measurement of the alignment and/or overlay performance of the tool that formed the marks on the substrate.

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation. The protrusions are generally spaced apart equidistantly at a first distance. The article holder also includes a pair of electrodes for clamping the article to the holder. The electrodes are disposed in substantially the same plane above or below the protrusions, and are spaced apart from one another by a gap. Neighboring protrusions within the plurality of protrusions that are located on opposite sides of the gap are spaced apart by a second distance that is greater than the first distance.

Abstract: The present invention is a pod for containing a particulate sensitive substrate and for providing pressure equalization between the exterior and an interior environment of the pod and for minimizing gaseous fluid flow inside adjacent to the particulate sensitive substrate. The pod comprises a primary pod, a diaphragm positioned in a cover, the diaphragm having a normal undeflected position, the diaphragm deflectable from the normal undeflected position. Preferably, the pod comprises a secondary pod disposed in the primary pod defining a second enclosure for containing the particulate sensitive substrate. The pod may comprise a filter attached to the pod and providing gaseous fluid communication between the exterior of the pod and the interior of the pod. The diaphragm is responsive to rapid pressure changes and the filter is responsive to slower pressure changes and allows the diaphragm to return to its normal undeflected position.

Abstract: An array of individually controllable elements for a lithographic apparatus comprise reflectors that can be actuated by an actuator and are biased to return to a given position by a force that varies non-linearly with the displacement of the reflector from that position.

Abstract: A lithographic apparatus includes a control unit arranged to perform a first position measurement of the patterning device, apply an asymmetric acceleration profile to the support supporting the patterning device, perform a second position measurement of the patterning device, determine a slip characteristic of the pattering device based on the two position measurements and the applied acceleration profile, and perform a scanning exposure of a substrate taking into account the slip characteristic of the patterning device.

Abstract: A lithographic apparatus has a mechanism with a movable element, at least partially made from a magnetizable material. The movable element is movable between a first position and a second position. A pretensioner exerts a pretension force on the movable element urging it to the first position. A permanent magnet produces a magnetic field exerting a force on the movable element urging it to the second position. A coil produces, when energized in a first direction, a magnetic field exerting a force on the movable element urging it to the second position. The combined magnetic field of the magnet and the coil exerts a force on the movable element which is higher than the pretension force.

Abstract: A container including at least two structural members welded to each other to define an inside space, and a material containing an organic compound provided in the inside space, in which in at least one structural member of the at least two structural members has (i) a groove formed between a welded portion thereof and the material in order to release the organic compound, as the organic compound is vaporized when the structural members are welded to each other, and (ii) a communication member to communicate the groove and an outside space of the container with each other, so that the vaporized organic compound is exhausted to the outside space.

Abstract: A substrate processing apparatus is provided with a substrate transport apparatus. The transport apparatus is used for automating alignment of the processing apparatus. In one aspect, a through-beam sensor on the transport apparatus is used to level parts of the processing apparatus. In another aspect, a through-beam sensor on the transport apparatus is used to determine the locations and angular orientations of substrate stations within a plane. In another aspect, the transport apparatus teaches itself the accurate location of a substrate aligner by repeatedly placing the substrate on the aligner, recording positional data, constructing a cost function, and determining the location of the aligner by minimizing the cost function using a numerical technique.

Abstract: A positioning device with a drive unit with which an object table is displaceable over a guide which is fastened to a first frame thereof. A stationary part of the drive unit is fastened to a second frame thereof and dynamically isolated from the first frame while a reaction force of the object table arising from a driving force exerted by the drive unit on the object table is transmittable exclusively into the second frame.