Abstract: An in-situ interferometer includes an image modifying optic that produces light ray bundles. The light ray bundles are projected onto a reticle with a plurality of measurement fiducials encoded onto a face of the reticle. The measurement fiducials are exposed onto a sensing plane and their locations measured. Aberrations in the projection system are determined from the measurements of the exposed reticles.

Abstract: A lithographic apparatus is described, the apparatus comprising an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a chuck constructed to hold the substrate table; a positioning device for, in use, displacing the chuck; a control unit configured to control the positioning device, wherein the control unit is arranged to drive the positioning device to excite the chuck by a substantially dynamic force to enable deformation of the chuck, prior to aligning the patterning device.

Abstract: A positioning stage that can prevent an excessive force from being imparted to a positioned wafer, a bump forming apparatus equipped with such a positioning stage, and a bump forming method performed using such a positioning stage are provided. A biasing member that biases a wafer towards a positioning member has a contact surface that substantially faces a wafer-holding surface at an angle. The contact surface is in contact with an outer peripheral area of the wafer so as to bias the wafer slantwise towards the wafer-holding surface. With a resiliently deformable member, the positioning member is brought into contact with the wafer and is held at a predetermined position. When a bias force exceeding a predetermined magnitude is imparted to the positioning member, the resiliently deformable member becomes resiliently deformed so as to allow the positioning member to recede from the predetermined position.

Abstract: A projection exposure system and method of manufacturing a miniaturized device using the projecting exposure system uses an imaging of a patterning structure onto a substrate using a projection optical system. Measuring light is directed through the projection optical system to be incident on the substrate and measuring light reflected from the substrate is superimposed with reference light to generate an interference pattern. The interference pattern is analyzed to determine imaging properties of the projecting optical system. Actuators of the projection optical system may be used to improve the imaging characteristics.

Abstract: An apparatus and a method for mounting a pellicle includes a pellicle compression plate formed to apply a plurality of particular pressures to a plurality of points or areas of a region of the reticle where a pellicle frame of the pellicle contacts a reticle.

Abstract: A lithographic apparatus includes a first component; an actuator to move the first component relative to a second component; a measurement system to measure at least one of a position, velocity, acceleration and higher order time derivatives of the position; and a control system to control the actuator according to an output of the measurement system. The control system includes various filter branches, each branch acting on an output of the measurement system and determining therefrom characteristic parameters of a different one of a plurality of pre-determined independent variables of a first analytical expression of the output; and a prediction unit that the characteristic parameters and the first analytical expression to provide a version of the output that is time-shifted to at least partially compensate for a delay between a measurement of a property of the second component and the effect of the measurement on an operation of the actuator.

Abstract: A lithographic apparatus including a projection system configured to project a patterned radiation beam onto a target portion of a substrate includes a position measuring system configured to determine the position of a movable object in at least one direction. The measuring system includes at least a first sensor arranged spaced from one side of the object and at least a second sensor arranged spaced from an opposite side of the movable object, and a calculation device configured to calculate the position of the object on the basis of distances measured by the first sensor and the second sensor between the first and the object and the second sensor and the object, respectively. By using the (weighted) difference between measured signals for calculation of the position of the object, the errors in the sensor signals caused by disturbances, such as global and/or local changes of the refractive index and expansion can be substantially reduced.

Abstract: Calibration of spot height offsets in a level sensor is performed on a resist-coated substrate to eliminate process dependencies of substrate position measurements obtained by the level sensor.

Abstract: A holographic mask includes a plurality of pixels each imparting a calculated phase and/or amplitude change to the projection beam to provide an image that is parallel to the mask. The holographic mask is used displaced from the best object plane of the projection lens.

Abstract: A stage device includes a stage and a frame-shaped member that move in three degrees of freedom directions in a two-dimensional plane while floating above a surface plate. The stage also holds an object. First fixed elements and second fixed elements are fitted to the frame-shaped member, and cooperate with first movable elements and second movable elements to generate drive forces to drive the stage in the two-dimensional plane. A reaction force generated by the driving of the stage acts on the first and/or second fixed elements, and causes the frame-shaped member to move in the two-dimensional plane. Because the reaction force caused by the movement of the stage is substantially completely cancelled, and because the movement of a center of gravity of a system including the stage and the frame-shaped member does not occur, no unbalanced load acts on the surface plate.

Abstract: A lithographic apparatus includes an illumination system for projecting a beam of radiation onto a substrate. The lithographic apparatus further has a chuck assembly for supporting at least one of the substrate or a patterning device, the patterning device serving to impart the beam with a pattern in its cross-section. A heat transfer system is operable between a first surface and a second surface. The heat transfer system is capable of transferring heat between the first surface and the second surface. The first surface is at least partially formed by at least a part of the chuck assembly. The second surface is at least partially formed by at least a part of a component spaced a distance from the chuck. The second surface is mechanically isolated from and thermally coupled to the first surface.

Abstract: Devices and methods are disclosed for holding a reticle or analogous object, particularly a planar object. An exemplary reticle-holding device includes a reticle chuck having a reticle-holding surface on which a reticle is placed to hold the reticle. The device includes at least one ultrasonic transducer (as an exemplary vibration-inducing device) sonically coupled to the reticle to excite, whenever the ultrasonic transducer is being energized, a vibrational mode in the reticle or reticle chuck, or both. The vibration mode is sufficient to reduce an adhesion force holding the reticle to the reticle-holding surface. Sonic coupling can be by direct contact with the transducer or across a gap.

Abstract: A position alignment of a transfer point of a transfer arm is performed by using a position detecting wafer capable of being loaded into an apparatus having a thin transfer port. The position detecting wafer S includes an electrostatic capacitance detecting sensor 50 for detecting an electrostatic capacitance in relation with a reference object for the position alignment. The electrostatic capacitance detecting sensor 50 includes a plurality of electrostatic capacitance detecting electrodes 52, each forming the electrostatic capacitance in relation with the reference object; and a control circuit 51 for controlling a detection of the electrostatic capacitance by each electrostatic capacitance detecting electrode 52, while communicating with each electrostatic capacitance detecting electrode 52. The electrostatic capacitance detecting electrodes 52 are provided on a rear surface of the position detecting wafer S, and the control circuit 51 is provided on a front surface of the position detecting wafer S.

Abstract: The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a robotic arm with a support frame for supporting, e.g. the substrate. The support frame includes a clamping structure having one or more clamps for holding the substrate during movement. The robot arm comprises one or more compliant parts. The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.

Abstract: With respect to a substrate conveyor apparatus that, being a substrate conveyor apparatus that carries substrate on which patterns are formed, carries the substrate in a state protected by a protective cover when the substrate is not used, a substrate conveyor apparatus having a cover protection means that covers the inner surface of the protective cover when the substrate is used.

Abstract: In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.

Abstract: An exposure apparatus configured to expose a substrate to light to transfer a pattern of a reticle onto the substrate includes a reticle stage configured to mount the reticle, a structure configured to support the reticle stage, a plurality of first supporting members configured to support the structure; and a second supporting member configured to support the structure outside an area formed by connecting the three first supporting members. The second supporting member includes a unit configured to dampen vibration of the structure.

Abstract: An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. The enclosure in conjunction with a heater and heat sink provides thermophoretic protection of an enclosed reticle.

Abstract: An exposure apparatus which can change a reticle efficiently with a simple arrangement is provided. When changing the reticle, a table is moved to a predetermined change operation position. At this time, a second magnet is retreated to a position where a repulsion force generated by a first magnet and the second magnet does not act on the table. After the reticle is changed, the second magnet is restored to a position where a repulsion force generating unit exerts a repulsion force upon the table.

Abstract: A lithographic apparatus includes a first movable element and a first control system to control a position quantity thereof. Also, the lithographic apparatus includes a second movable element and a second control system to control a position quantity thereof. To reduce a tracking error, i.e., a relative error between the first and second movable parts, a feedforward table is provided which includes a feedforward table programming to generate a feedforward signal in synchronism with a setpoint signal to be provided to the first and second control systems. The feedforward is provided to the first control system to correct the position quantity of the first movable element so as to reduce the relative error between the position quantities of the first and second movable elements.

Abstract: A lithographic apparatus equipped with a patterning device safety mechanism, is presented herein. In one embodiment, the apparatus comprises an illumination system for providing a beam of radiation, a support structure for supporting a patterning device that serves to impart the beam of radiation with a pattern in its cross-section, a substrate holder for holding a substrate having a plurality of target portions, a projection system for projecting the patterned beam onto the substrate target portions, a connector for securing the patterning device relative to the support structure, and a safety mechanism configured to reduce uncontrolled displacement of the patterning device in case of failure of the connector.

Abstract: An exposure apparatus is disclosed. The exposure apparatus has a projection optical system, aligns a reticle and a substrate and projects a pattern of the reticle to the substrate via the projection optical system to expose the substrate to light. The apparatus comprises a measuring device configured to perform measurement for the alignment, a first support configured to support the measuring device; and a second support configured to support the projection optical system. The first support and the second support are isolated from each other.

Abstract: A container is adapted to receive a mask blank having a resist film and includes a container body having an upper opening and a cap put on the container body. The container body has an opening edge provided with an annular elastic member made of polyolefin elastomer or the like and extending throughout entire circumference. When the cap is put on the container body, the elastic member is interposed at a joint portion between the cap and the container body to hermetically seal the container.

Abstract: An alignment apparatus includes driving means having a movable element and a stator, a measurement unit which measures a position of a moving member moved by the driving means using measurement light, and a discharging unit to discharge gas existing in an optical path of the measurement light. The discharging unit is provided to the stator.

Abstract: Systems and methods for controlling ambient pressure during processing of microfeature workpieces, including during immersion lithography, are disclosed. A system in accordance with one embodiment includes a support configured to carry a microfeature workpiece with a surface of the microfeature workpiece at a support location, and a liquid supply device positioned proximate to the support to dispense liquid at the surface location. The system can further include a generally gas-tight enclosure disposed around at least a portion of the surface location. The enclosure can be coupleable to a vacuum source and can be configured to withstand an internal pressure less than atmospheric pressure. This arrangement can be used in the context of an immersion photolithography system, or other systems for which a liquid is disposed on the surface of the microfeature workpiece.

Abstract: Methods and apparatus for controlling a stage assembly in up to six degrees of freedom using actuators which each allow for forces to be generated in a horizontal direction and a vertical direction are disclosed. According to one aspect of the present invention, a stage apparatus includes a stage assembly and a first stator arrangement. The stage assembly includes a first magnet arrangement of an actuator assembly, and the first stator arrangement is part of the actuator assembly. The first magnet arrangement cooperates with the first stator arrangement to allow the stage assembly to move relative to a first horizontal axis as well as a vertical axis.

Abstract: A position measurement device 29 measures the position of a position measurement mark 26 formed on the lower surface of a reticle 1, thereby measuring the position of the reticle 1. A position measurement device 30 measures the position of the position measurement mark 27 formed on the lower surface of a lower lid 2b, thereby measuring the position of the lower lid 2b. The relative displacement of the reticle 1 and lower lid 2b is known when the position of the reticle 1 and the position of the lower lid 2b are known. Therefore, when the lower lid 2b having the reticle 1 loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid 2b is determined by taking this displacement into account. As a result, the reticle 1 can be correctly set in the exposure device.

Abstract: The present invention supports a reticle 12 in a safe and secure manner. A reticle-carrying container 11 includes a pod 13 for storing the reticle 12, a door 14 and a seal 15 for blocking and sealing hermetically the pod 13. A pair of reticle retainers 25 and 45 is provided on the insides of the pod 13 and door 14. Each of the reticle retainers 25 and 45 includes an inclined plane 28 that contacts an upper corner 12A or a lower corner 12B of peripheral edge of the reticle 12 and supports the reticle 12 elastically. The inside of the inclined plane 28 is provided with concave portions 31 and 52 that enables a shock-absorbing function of allowing the deformation of the inclined plane 28 and supporting the reticle elastically, at the time of contact with the upper corner 12A or the lower corner 12B of peripheral edge of the reticle 12.

Abstract: An apparatus for reducing contamination in immersion lithography includes a wafer chuck assembly having a wafer chuck configured to hold a semiconductor wafer on a support surface thereof. The wafer chuck has a gap therein, the gap located adjacent an outer edge of the wafer, and the gap containing a volume of immersion lithography fluid therein. A fluid circulation path is configured within the wafer chuck so as to facilitate the radial outward movement of the immersion lithography fluid in the gap, thereby maintaining a meniscus of the immersion lithography fluid at a selected height with respect to a top surface of the semiconductor wafer.

Abstract: This invention discloses a stage apparatus which has a stage (202) and moves the stage (202) in at least a first direction. The stage apparatus includes a holding unit (208) fixed on the stage (202) to extend in the first direction. The holding unit (208) includes a first portion and a second portion (213) inserted between the first portion and the stage (202). The first portion includes a holding surface which holds an object (201). The length of the second portion (213) in the first direction is less than that of the first portion.

Abstract: A position control system for a substrate support of a lithographic apparatus includes a position measurement system configured to determine a position of a sensor or sensor target on the substrate support, a controller configured to provide a control signal based on a desired position of a target portion of the substrate and the determined position, and one or more actuators configured to act on the substrate support. The position control system includes a stiffness compensation model of the substrate support, the stiffness compensation model including a relation between a difference in a change in position of the target portion and a change in position of the sensor or sensor target as a result of a force exerted on the substrate support. The position control system is configured to substantially correct at least during projection of a patterned radiation beam on the target portion, the position of the target portion using the stiffness compensation model.

Abstract: A method for aligning a substrate in a lithographic apparatus, the method including irradiating a first target portion of the substrate with a first patterned beam to form a first pattern on the substrate. Then, a second target portion of the substrate is irradiated with a second pattern beam to form a second pattern on the substrate. The second target portion at least partly overlaps the first target portion. A diffraction beam is detected during irradiation of the second pattern, due to a diffraction of the second patterned beam on the first pattern. The diffraction beam is compared with a desired diffraction beam, and the substrate is aligned based on a comparison between the detected diffraction beam and the desired diffraction beam.

Abstract: A stage apparatus including: a movement member movable with a plate member placed on a placement surface; and a fixing apparatus that fixes said plate member to said placement surface in parallel with said movement member passing through a prescribed first region.

Abstract: A reticle cassette includes a bearing portion and a cover, a reticle being disposed on the bearing portion and accommodated in a space between the bearing portion and the cover. The bearing portion includes electrodes for attracting using an electrostatic force and supporting a first surface of the reticle, the first surface having a pattern being formed thereon.

Abstract: The exposure apparatus is provided with: an optical member; and a holding member that holds the optical member. Both end portions of the optical member are held by the holding member with a first adhering unit that is cured by light irradiation for first duration and a second adhering unit that is cured by light irradiation for second duration which is longer than the first duration.

Abstract: A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system comprises: a plate that has a first surface and a second surface on the side opposite the first surface; and a liquid recovery part, at least part of which opposes the second surface with a first gap interposed therebetween. The liquid recovery system recovers the liquid on a movable object that opposes the first surface of the plate via the liquid recovery part.

Abstract: The invention pertains to a lithographic apparatus that includes a docking system for positioning a patterning device, such as a reticle, relative to the reticle stage. The lithographic projection apparatus has an operational cycle that includes a projection phase, in which the reticle stage carries the patterning device and an exchange phase, in which the patterning device is exchanged and the docking system positions the patterning device relative to the reticle stage. The docking system is configured to be spaced from the patterning device during the projection phase in order to ensure that a higher accuracy of the projected image is obtained.

Abstract: A pellicle is provided to one end surface of end surfaces of a frame. Another end surface of the end surfaces of the frame has an area that opposes a substrate. A configuration is adopted that prevents the deformation of the one end surface of the frame and the shape of the opposing area on the other end surface from affecting one another.

Abstract: An exposure apparatus which comprises a reticle stage configured to hold a reticle, and executes multiple exposure of a substrate in a lot to light using a plurality of reticles. The apparatus comprises a calculator configured to calculate a conveyance times taken to convey each of the plurality of reticles to the reticle stage, based on arrangements of the plurality of reticles before start of a process of the lot and a controller configured to determine a sequence in which the plurality of reticles are used, based on the conveyance times of the plurality of reticles calculated by the calculator.

Abstract: The present invention allows a reticle-carrying container 11 to be fastened in a reticle stocker 2 even if the reticle-carrying container 11 is wrongly oriented. The reticle-carrying container 11 includes an interior with an opening at one end for storing a reticle 12, a door 14 for covering and blocking the opening, and a seal material 15 for sealing the interior hermetically when the door 14 closes the pod 13. The reticle-carrying container 11 is provided with two sets of kinematic pin grooves 61 for positioning and fastening the reticle-carrying container 11, which are turned 180 degrees from each other on the outer surface of the door 14. Receiving parts 22 for receiving and holding the kinematic pin grooves 61 are arranged in the positions corresponding to the kinematic pin grooves 61 on the outer surface of the pod 13 so that the two sets of kinematic pin grooves 61 can be engaged with the pins in both orientations.

Abstract: The present invention includes a method for supporting a substrate that features a chuck body having a body surface with a pin extending therefrom having a contact surface lying in a plane, with the pin being movably coupled to the chuck body to move with respect to the plane. To that end, the method includes disposing the substrate upon two spaced-apart bodies; and moving one of the two spaced-apart bodies away from the substrate.

Abstract: In an embodiment of the invention, an apparatus includes a reticle having a frontside including a pattern to be imaged onto a semiconductor wafer, a thin film located over a backside of the reticle to form a global convex shape and to reduce friction when sliding on a chuck, and the chuck having a topside to which the backside of the reticle conforms.

Abstract: A method for providing a vacuum isolated environment in a lithography system is disclosed. The method for dechucking a reticle includes providing a mask chamber having one or more vacuum valves for isolating the mask chamber from the lithography system. The one or more vacuum valves are closed to isolate the mask chamber from the rest of the lithography system. After the mask chamber is isolated, an inert gas is provided to the mask chamber to dechuck the reticle.

Abstract: A lithographic projection apparatus in which a balance mass is supported by a base frame using at least one supporting member which is coupled to both the base frame and balance mass. Free horizontal movement is provided by providing the supporting member with at least two pivot points.

Abstract: In order to improve the productivity of a lithographic apparatus, a stage apparatus for holding two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length of the pattern in the scanning direction. By doing so, an improved exposure sequence may be performed by exposing a first die with a first pattern, skipping a second die adjacent to the first die, and exposing a third die adjacent to the second die using a second pattern.

Abstract: A stage assembly (220) that moves a work piece (200) about a first axis and along a first axis includes a first stage (238), a second stage (240) that retains the work piece (200), a second mover assembly (244), a measurement system, and an initialization system (1081A). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) about the first axis. The measurement system (22) monitors the position of the second stage (240) about the first axis when the second stage (240) is positioned within a working range about the first axis. The initialization system (1081A) facilitates movement of the second stage (240) about the first axis when the second stage (240) is rotated about the first axis outside the working range. The second mover assembly (244) can include a mover (255) and a dampener (410) that reduces the transmission of vibration from the first stage (238) to the second stage (240).

Abstract: A particle remover includes an irradiation unit for irradiating plural lights onto a target from different directions, and for scanning the lights on the target, and a collector for collecting particles carried as a result of scanning of the lights.

Abstract: One or more patterning arrays are mounted to a mounting plate via height adjustment structures that enable the flatness of the active surfaces of the patterning arrays to be controlled. The height adjustment structures may comprise an array of piezoelectric actuators or screws. Alternatively, the backside of the patterning means may be polished to optical flatness and bonded by crystal bonding to an optically flat surface of a rigid mounting body.

Abstract: A lithographic apparatus comprises a substrate table to hold a substrate, a reference structure and a measurement system to measure a position of the substrate table with respect to the reference structure. The measurement system comprises a first measurement system to measure a position of the substrate table with respect to an intermediate structure and a second measurement system to measure a position of the intermediate structure with respect to the reference structure. The intermediate structure may be connected or connectable to a drive mechanism to drive the substrate table. A distance between the substrate table and the intermediate structure, and a distance between the intermediate structure and the reference structure may be small which results in a highly accurate position measurement.

Abstract: The invention relates to a method for positioning a substrate relative to a substrate table, is presented. When the substrate is positioned on the substrate table for a first time, a first relative position of the substrate with respect to the substrate table is determined. When the substrate is positioned on the substrate table a second subsequent time, a second relative position of the substrate with respect to the substrate table is determined and the position of the substrate table with respect to the substrate is adjusted based on the first and second relative positions, so that the substrate is positioned with respect to the substrate table substantially equally to the first relative position.