Abstract: A position measuring apparatus includes a holder having storage spaces in which a three-point support member for supporting a backside of a substrate being a mask at three points, and a vacuum chuck member for holding a backside of a substrate being a mask are prepared, a stage on which one of the three-point support member and the vacuum chuck member prepared in the storage spaces of the holder is mounted, a vacuum pump to hold and chuck the substrate through the vacuum chuck member in a state of being mounted on the stage, and a recognition unit to recognize a position of a pattern written on the substrate supported by the three-point support member mounted on the stage and a position of a pattern written on the substrate held by the vacuum chuck member on the stage.

Abstract: The present invention is directed towards a chucking system to hold a substrate, said system including, inter alia, a chuck body having first and second opposed sides, said first side including an array of fluid chambers arranged in rows and columns, said fluid chambers each comprising first and second spaced-apart recesses defining first and second spaced-apart support regions, with said first support region cincturing said second support region and said first and second recesses, and said second support region cincturing said second recess, with said substrate resting against said first and second support regions, with said first recess and a portion of said substrate in superimposition therewith defining a first chamber and said second recess and a portion of said substrate in superimposition therewith defining a second chamber, with each column of said first chambers and each row of said second chambers being in fluid communication with a differing source of fluid to control a flow of fluid in said array

Abstract: A near-field exposure mask includes a light blocking film having an opening smaller than a wavelength of exposure light, and a mask base material for holding the light blocking film. The near-field exposure mask is configured and positioned to effect exposure of an object to be exposed to near-field light generated corresponding to the opening during contact thereof with the object to be exposed. The mask base material is transparent to the exposure light and comprises a synthetic resin material having Young's modulus in a range of 1 GPa or more to 10 GPa or less.

Abstract: A near-field exposure method including preparing a photomask for near-field exposure, having a light blocking film provided on a base material constituting a membrane portion and a support member supporting the base material, wherein a first alignment mark for rough alignment is provided on the support member and a second alignment mark for fine alignment is provided on the membrane portion, setting the photomask and an object to be exposed in a near-field exposure apparatus, aligning the photomask and the object using the first alignment mark, flexing the membrane portion to contact with the object and detecting a positional relation between the membrane portion and the object using the second alignment mark, aligning the photomask and the object based on the detected positional relation and flexing the membrane portion to contact with the object, and exposing the object to light from a light source by way of the photomask.

Abstract: A lithographic apparatus includes a liquid supply system configured to supply an immersion liquid between a downstream optical element of a projection system of the lithographic apparatus and the substrate, and a control system which is arranged to drive the substrate table so as to perform an acceleration profile to accelerate the substrate table from a first velocity in a first direction to a second velocity in a second direction. The acceleration profile is asymmetric in time and is dimensioned so that when the substrate table is accelerated according to the acceleration profile, a force to break a meniscus of the immersion liquid remains lower than a force to maintain the meniscus of the immersion liquid.

Abstract: In an embodiment a mask stage is used for an exposure process. The mask stage includes a first module. The first module includes a plurality of support surfaces on which a plurality of masks are mounted. The first module has a substantially cylindrical shape having a cavity. The support surfaces are provided on an inner surface of the first module. Replacement of a mask is performed by rotating the first module around a central axis of the first module. A magnetic force may be used to rotate the first module.

Abstract: A reticle is supported by flexible reticle holders at its +X and ?X end portions, and therefore even if there is unevenness on the supported portions of the reticle, the surfaces of the reticle holders are transformed following the unevenness, which makes it possible to restrain deformation of the reticle as much as possible. Further, with support pins that contact with the reticle holders at three points that are not in a same straight line, the positions of the reticle holders in a height direction (Z-axis direction) at the contacting portions are set, and in addition, with a self-weight cancelling mechanism that includes piston members that contact with the reticle holders at three points that are not in a same straight line, bending due to self weights of the reticle and the reticle holders is restrained.

Abstract: A scanner has a transport system for transporting a document along a transport path for scanning by at least a first camera. A first removable image guide is disposed between the first camera and a first side of the document. The first removable image guide has a first manifold with a first patter of holes for applying a first level of air pressure or vacuum to the document. Replacement of the first removable image guide with an upgrade removable image guide provides an alternate manifold with an alternate pattern of holes that provide a second level of air pressure or vacuum to the document, different from the first level.

Abstract: The invention pertains to a lithographic apparatus that includes a docking system for positioning a patterning device, such as a reticle, relative to the reticle stage. The lithographic projection apparatus has an operational cycle that includes a projection phase, in which the reticle stage carries the patterning device and an exchange phase, in which the patterning device is exchanged and the docking system positions the patterning device relative to the reticle stage. The docking system is configured to be spaced from the patterning device during the projection phase in order to ensure that a higher accuracy of the projected image is obtained.

Abstract: A stage device includes a stage configured to move along a base while holding a heating medium, and a heat exchange section configured to perform heat exchange of the heating medium. The heat exchange section includes an instruction unit configured to give instructions to move the stage to a heat exchange position, and a heat exchange unit configured to perform heat exchange of the heating medium at the heat exchange position.

Abstract: A near-field exposure method wherein a pressure difference is applied between a front face and a rear face of an elastically deformable exposure mask to cause deformation of the exposure mask in accordance with a substrate to be exposed, and to cause the exposure mask surface to follow a surface irregularity state of the substrate so that these surfaces closely contact each other, for exposure based on near field light. The method includes setting the pressure difference applied between the front and rear faces of the exposure mask at a predetermined pressure difference corresponding to a surface roughness of the substrate to be exposed.

Abstract: An exposure apparatus for exposing an object to be exposed by elastically deforming an exposing mask having a micro-opening pattern so as to bring the exposing mask into contact with the object includes a compression/decompression section for elastically deforming the exposing mask with compression/decompression so as to bring the exposing mask into contact with the object or into detachment from the object; and a controlling section for controlling the compression/decompression operation with the compression/decompression section. The controlling section controls the compression/decompression operation with the compression/decompression section based on control data prepared in advance.

Abstract: A near-field photomask includes a light shield film having openings to constitute a light shield portion. The photomask can be used to expose an exposure target with near-field light generated through the openings. The openings formed in the light shield film include two or more parallel rows of first slit openings each having a width smaller than 100 nm, and two or more parallel rows of second slit openings each having a width smaller than 100 nm, which extend perpendicularly to the rows of first slit openings while interlinking at least two of the rows of first slit openings. A near-field exposure apparatus includes the near-field photomask with a positioning unit and a source for illuminating polarized light parallel to the first slit openings for forming a latent-dot-image on an exposure target only where a second slit opening crosses the light shield portion on the near-field photomak.

Abstract: The invention relates to an exposure machine for printed circuit panels. The machine comprises: a support (26) for said panel (24); a moving artwork support (10) comprising a substantially rectangular frame (12) and a transparent plate (14) suitable for receiving said artwork; means (22) for establishing peripheral sealing; means for establishing suction in the volume; at least one deformable leaktight balloon (30, 32) disposed between said support and said transparent plate around at least a portion of said panel; and a source of gas under pressure at a pressure greater than the pressure of said suction for the purpose of feeding said balloon, thus that when suction is established in said volume, the periphery of said transparent plate presses against said balloon.

Abstract: In a projection apparatus for projecting optical images, an optical mask support stage having a pair of separated arms. Each arm being provided with a respective mask chucking bar that supports a respective edge of a thin glass mask and applies to the respective edge a bending moment away from the center of the mask to reduce or eliminate any gravitational induced sag in the center of the mask thereby improving the quality of the images projected by the apparatus.

Abstract: Disclosed is an illumination system for illuminating a surface to be illuminated, with light from a light source, the illumination system including a first optical integrator having a plurality of lens groups, for forming a plurality of first secondary light sources by use of light from the light source, a second optical integrator for forming a second secondary light source by use of light from the first secondary light sources, a first collecting optical system for superposing light from the first secondary light sources on a light entrance surface of the second optical integrator, a second collecting optical system for superposing light from the second secondary light source on the surface to be illuminated, and a driving mechanism for moving at least one of the plurality of lens groups translationally along a plane perpendicular to an optical axis, whereby the telecentricity of light illuminating the surface to be illuminated can be adjusted.

Abstract: An apparatus for holding a wafer and a method for immersion lithography. The apparatus, including a wafer chuck having a central circular vacuum platen, an outer region, and a circular groove centered on the vacuum platen, a top surface of the vacuum platen recessed below a top surface of the outer region and a bottom surface of the groove recessed below the top surface of the vacuum platen; one or more suction ports in the bottom surface of the groove; and a hollow toroidal inflatable and deflatable bladder positioned within the groove.

Abstract: An immersion optical projection system for photolithography is provided. A transparent plate is located between a last lens element and the wafer during a usage of the system. The transparent plate has a lens-side surface and a wafer-side surface. The system is adapted to have a layer of lens-side fluid located between the last lens element and the lens-side surface of the transparent plate, e.g., when the last lens element is operably located over the wafer during a photolithography process. The system is also adapted to have a layer of wafer-side fluid located between the wafer-side surface of the transparent plate and the wafer, during a usage of the system. The wafer-side fluid may or may not be fluidly connected to the lens-side fluid. The wafer-side fluid may or may not differ from the lens-side fluid.

Abstract: A carrier for a reticle used in photolithographic semiconductor processing, having a base portion and a cover portion. The base portion has a plurality of reticle supports and a plurality of reticle positioning members. The cover portion is adapted to sealingly mate with the base portion, and has an inner surface with a plurality of spaced apart reticle restraints and a pair of reticle positioning tabs projecting inwardly therefrom. Each reticle positioning tab has a diagonal edge portion, and is oriented so that the diagonal edge portion urges a reticle resting on the reticle supports into engagement with the reticle restraints when the cover portion is mated with the base portion.

Abstract: A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The illumination system includes a radiation-production system that produces extreme ultra-violet radiation, and a radiation-collection system that collects extreme ultra-violet radiation. Particles that are produced as a by-product of extreme ultra-violet radiation production move substantially in a particle-movement direction. The radiation-collection system is arranged to collect extreme ultra-violet radiation which radiates in a collection-direction, which is substantially different from the particle-movement direction.

Abstract: A lithographic apparatus includes at least one object support structure in a high vacuum chamber. The object support structure includes a carrier device in which a number of dividing walls are provided forming a number of compartments in the carrier device. At least one of the compartments is shielded from the high vacuum chamber and is provided with separate gas evacuating structures.

Abstract: A liquid-filled balloon may be positioned between a workpiece, such as a semiconductor structure covered with a photoresist, and a lithography light source. The balloon includes a thin membrane that exhibits good optical and physical properties. Liquid contained in the balloon also exhibits good optical properties, including a refractive index higher than that of air. Light from the lithography light source passes through a mask, through a top layer of the balloon membrane, through the contained liquid, through a bottom layer of the balloon membrane, and onto the workpiece where it alters portions of the photoresist. As the liquid has a low absorption and a higher refractive index than air, the liquid-filled balloon system enhances resolution. Thus, the balloon provides optical benefits of liquid immersion without the complications of maintaining a liquid between (and in contact with) a lithographic light source mechanism and workpiece.

Abstract: A knuckle arm interconnects a machine body and a top cover of a machine, and includes a base fixed on the machine body and having a receiving frame, an inner sliding seat slidable within the receiving frame and having a cam surface, a resilient member disposed between the receiving frame and the inner sliding seat, a first pivotable seat sleeved on the base, a pressing rod extending through the first pivotable seat and biased to contact the cam surface, and a second pivotable seat slidable on the first pivotable seat and attached to the top cover of the machine.

Abstract: Devices are disclosed for placement between first and second masses for attenuating transmission of motions from one of the masses to the other. A general embodiment of such a device includes a fluid isolator and a lateral fluid bearing situated along a support axis. The fluid isolator includes a housing defining an isolator chamber pressurized with a gas at pressure Pisol. The fluid isolator is situated such that motion of the masses relative to each other along the support axis is at the fluid isolator, and lateral motion is at the lateral fluid bearing. The lateral fluid bearing includes first and second bearing surfaces that are transverse to the support axis. At least one such surface defines three channels: pressure channel, atmospheric pressure channel, and vacuum channel. In order from the isolator chamber, the pressure channel (at pressure PXYbearing?Pisol) is first, the atmospheric pressure channel (at pressure Patm) is second, and the vacuum channel (at pressure Pvac) is third.

Abstract: Disclosed is a positioning system effective to cancel a moment reaction force, and it includes a movable portion and a reaction force absorbing mechanism for absorbing a propulsion reaction force to be produced by motion of the movable portion. A first distance between a reference plane and a gravity center position of the movable portion, being supported for movement along the reference plane, and a second distance between the reference plane and a gravity center position of the reaction force absorbing mechanism are made substantially equal to each other, and/or the second distance and a third distance between the reference plane and a motor movable element for propelling the movable portion along the reference plane are made substantially equal to each other.

Abstract: This present invention provides an image reading apparatus aiming at improving its operability while saving the cost and an image forming apparatus provided with the same. Sponges for pressing a pressing plate against a platen glass are constituted of nine sponges. Then, restoration forces Fa to Fc generated when sponges on a front side of a document feeding apparatus far from a fulcrum shaft of a hinge unit are crushed are set smaller than restoration forces Fg to Fi generated when sponges on a deep side of the document feeding apparatus near the fulcrum shaft 45 of the hinge unit are crushed.

Abstract: An exposure device includes a light irradiator for irradiating light, a mask having a pattern to be formed on a substrate, the mask having a size larger than at least two display panel areas positioned on the substrate, and at least two vacuum pads positioned along sides of the mask for affixing the mask over the substrate.

Abstract: An exposure apparatus has a triangular shaped stage which is movable in a two-dimensional plane while holding a substrate. The stage has a reflecting surface provided on a side face of the stage so that the surface extends in a specific direction intersecting Y axis and X axis. An interferometer radiates a beam onto the reflecting surface to measure a position of the stage in a direction perpendicular to the specific direction. Using the measured position and an angle of the specific direction, a calculator can calculate the position of the stage on rectangular coordinate system defined by X and Y axes. The size and weight of the stage can be reduced, and the throughput of the exposure apparatus is improved.

Abstract: An alignable, low-profile substrate chuck for processing, one by one, a number of substrate panels, which may be larger than the chuck itself. The substrate chuck is adjustable in x, y and theta while on the movable platform of a stage, and comprises a nested set of rotatable or sliding brackets adjustable in x, y and theta a positionable vacuum diffuser plate mounted within a coplanar apron on the top bracket. The vacuum diffuser plate fits within a relief cut about the periphery of the apron, which, together with a pattern of islands with their tops coplanar to a ledge formed by the relief, provide location and both bottom and peripheral support for the high-flatness vacuum diffuser plate. The vacuum airflow passes through the vacuum diffuser plate, through the pattern around supporting islands and out through a central yaw shaft about which the yaw rotation centers.

Abstract: Methods and apparatus for ensuring the proper handling of reticles in the manufacturing of microdevices are disclosed. The methods and apparatus employ one or more reticle stop blocks fixed to a reticle handling arm. The one or more reticle stop blocks are designed and arranged to engage an edge of the reticle in order to place the reticle in a desired position on the reticle handling arm should the reticle be improperly arranged in a cassette in which the reticle is stored. By ensuring proper placement of the reticle on the reticle handling arm when the reticle is removed from the cassette, the likelihood of a subsequent fault in handling the reticle is greatly reduced.

Abstract: An anti-vibration apparatus includes a table, a pneumatic spring for applying a force to the table, an electromagnetic actuator for applying a force to the table, and a first generator which generates a driving signal for the electromagnetic actuator based on at least one of a target position and a target speed with respect to a movable object on the table.

Abstract: The stage apparatus has a movable stage structure body which holds a substrate plate to be processed and is movable on a base structure body. This stage apparatus comprises a receipt edge orifice disposed at least at a portion of a fluid path which is disposed at said stage structure body; and a feed edge orifice being detachably engageable with said receipt edge orifice at a predetermined position on a base structure body and providing or discharging a predetermined fluid to the receipt edge orifice during said engagement of said feed edge orifice with said receipt edge orifice.

Abstract: A bearing for use in a vacuum chamber comprises a gas bearing discharging pressurised gas into a gap between two members to maintain a predetermined separation between those members.

Abstract: An exposure apparatus illuminates a pattern on an original form, introduces light from the pattern to a plate, and exposes the plate. The exposure apparatus includes at least one optical element, and forcing member that applies a force to the at least one optical element in a non-contact manner.

Abstract: An automatic both sides exposing apparatus 1 is provided, and includes a first exposing mechanism 10 having a first mask and the second exposing mechanism 20 having a second mask; a carrying-in portion 2 and a carrying-out portion 30; an optical system for exposing the substrate; and a first holder A and a second holder B for holding the substrate and delivering the substrate from the first holder A to the second holder B with reversal of sides at a spot located in an interval between the first and second exposing mechanisms where both holders meet each other. Accordingly, a frequency at which the substrate is delivered is minimized, the substrate can be turned over without the reversing mechanism, the substrate can be transferred (and delivered) at good efficiency in limited space and exposed accurately, any inconvenient origin for the substrate may be minimized, and the apparatus is made compact.

Abstract: This invention is directed to precision positioning devices which are well suited to manufacturing and inspection of semiconductor devices. A pair of coil assembles are attached to a base plate. The base plate forms a static portion of a gas bearing assembly. A carriage assembly, forming a movable portion of the gas bearing assembly, is capable of in-plane motion over the coil assembly. The carriage assembly contains permanent magnets and a soft magnetic bridge. A metrology component, such as a mirror, is attached to the carriage kinematically. Three in-plane constraints consist of substantially straight line connections between the metrology component and the carriage in a plane substantially parallel to the plane of motion of the gas bearings. Three out-of-plane constraints on the metrology component comprise substantially straight line connections between it and the gas bearings. The positioning device is operable in vacuum by directing the flow of gas out of the bearings to a vacuum pump.

Abstract: A positioning device for positioning a wafer table and an exposure apparatus including the positioning device are disclosed. The positioning device includes a housing, a piezoelectric actuator, and a structure for moving the wafer table in a second direction. The piezoelectric actuator has a first and second end. The first end is fixedly mounted to the housing and the second end is movable in a first direction in response to a change in voltage applied to the piezoelectric actuator. The structure includes a first joint, a second joint, a diagonal member, and a flexure. The first joint is movable in the first direction in response to the second end of the piezoelectric actuator moving in the first direction. The second joint is movable in the second direction to move the wafer in the second direction. The diagonal member is connected to the first and second joints at an angle with respect to the first direction.

Abstract: Methods and apparatus for providing a stage apparatus which is modular and allows for reaction force cancellation are described. According to one aspect of the present invention, a stage apparatus includes a table assembly and a first stage. The table assembly supports an object, e.g., a wafer or a reticle, which is to be moved. The first stage includes a counter mass arrangement, a plurality of carriages, and a plurality of linkages. The plurality of carriages is coupled to the table assembly through the plurality of linkages such that a first carriage and a second carriage are arranged to move in substantially opposite directions along a first axis to cause the table assembly to move along a second axis while reaction forces generated when the first carriage and the second carriage are substantially cancelled by the counter mass arrangement.

Abstract: In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.

Abstract: Disclosed is a positioning system effective to cancel a moment reaction force, and it includes a movable portion and a reaction force absorbing mechanism for absorbing a propulsion reaction force to be produced by motion of the movable portion. A first distance between a reference plane and a gravity center position of the movable portion, being supported for movement along the reference plane, and a second distance between the reference plane and a gravity center position of the reaction force absorbing mechanism are made substantially equal to each other, and/or the second distance and a third distance between the reference plane and a motor movable element for propelling the movable portion along the reference plane are made substantially equal to each other.

Abstract: An apparatus for maintaining an optical gap between a pellicle and a reticle in a photolithography system includes a frame defining first and second opposing surfaces, a reticle mated to the first opposing surface using magnetic coupling; and a pellicle mated to the second opposing surface using magnetic coupling.

Abstract: A de-pellicle tool for removing a pellicle from a reticle during the formation of circuit patterns on substrates in the fabrication of integrated circuits. The de-pellicle tool of the present invention comprises a support frame on which is mounted the reticle and the pellicle supported on the reticle. A pair of handle-actuated lift pins on opposite sides of the support frame are extended into respective pin openings in the pellicle frame, after which the handles are pushed downwardly to raise the lift pins and lift the pellicle frame from the reticle. Accordingly, no moving parts contact the reticle during the pellicle-removing procedure, preventing scratching or other damage to the reticle.

Abstract: The conversion kit of the invention is intended for converting an existing photolithographic machine for treating semiconductor wafers of a predetermined size to a machine for treating semiconductor wafers of a larger size. This is achieved without changing the basic parameters, characteristics, and dimensions of the existing machine and without the need of purchasing an expensive new machine. The kit of the invention consists of the following main replaceable parts and units listed in the direction of movement of the wafer through the machine: a notch-orientation unit for preliminary alignment of a wafer with a predetermined position of the notch; a wafer floating support for supporting the wafer on air cushion; a mechanical arm for transferring wafers between the wafer floating support and a wafer chuck; a wafer chuck for holding and securing the wafer during alignment, e.g.

Abstract: A fused silica pellicle for use on photomasks having increased durability and improved transmission uniformity and birefringence properties. The pellicle is to be intimately secured to the patterned surface of a photomask.

Abstract: A vibration isolation system is provided. A frame is provided. A stage supported by the frame is provided. The stage comprises a stage body supported by the frame, a first isolation stage supported by the stage body, a first stage vibration isolation device that reduces vibrations transferred from the stage body to the first isolation stage, a second isolation stage supported by the first isolation stage, and a second stage vibration isolation device that reduces vibrations transferred from the first isolation stage to the second isolation stage.

Abstract: A lithographic projection apparatus including at least one temperature control member that at least partly surrounds at least one component selected from a group comprising mask and substrate tables, the projection system and an isolated reference frame for controlling the temperature of the surrounded components. The surface finish of the member is chosen to help keep the components which it partly surrounds isothermal during operation.

Abstract: A lithographic projection apparatus includes conduits which supply utilities to components in a vacuum chamber such as object tables and/or associated motors and/or sensors. The conduits are shielded from exposure to the vacuum by conduit conducts having at least the same number of degrees of freedom as their associated object table.

Abstract: A bearing for use in a vacuum chamber comprises a gas bearing discharging pressurised gas into a gap between two members to maintain a predetermined separation between those members.

Abstract: An EUV exposure apparatus is provided in which coils of an electromagnetic motor for driving a stage are kept from overheat damage as a result of heat generated by the coils themselves. In an EUV exposure apparatus for exposing a mask pattern to a wafer in a vacuum, the apparatus comprises an electromagnetic motor disposed in the vacuum and driving at least one of a mask stage and a wafer stage, and a cooling unit for cooling the electromagnetic motor to prevent overheat damage of the electromagnetic motor caused by heat generated by the electromagnetic motor.

Abstract: A printer has a media transport with a rigid, air-transmissive platen. A movable air-transmissive flexible web overlays the platen. A suction device communicates with the platen to draw air through the web and through the platen such that a sheet of media carried on the web is biased toward the platen. A valve sheet overlays or underlies the platen, and includes a plurality of shut-off elements, each movable in response to temperature changes between a closed position in which the element contacts a portion of the platen to prevent air flow through that portion of the platen, and an open position, in which the element is spaced apart from the platen to admit air to the platen portion. The shut off elements may include resistive heaters and bimetallic strips so that application of electricity generates heat to flex the strip to an open position.