Abstract: A balanced positioning system for use in lithographic apparatus having a pair of balance masses which are supported so as to be moveable in at least one degree of freedom, such as Y translation. Oppositely directed drive forces in this degree of freedom act directly between the driven body and the balance masses to rotate the driven body about an axis perpendicular to the one direction. Reaction forces arising from positioning movements result in linear movements of the balance masses and all reaction forces are kept within the balanced positioning system.

Abstract: A long-stroke movement is fed-through into a vacuum chamber by providing a sliding seal over an aperture in the vacuum chamber wall. The object to be moved, which may be a mask or wafer table in a lithographic apparatus, within the vacuum chamber is connected to or mounted on the sliding seal and moved by movement of the sliding seal. The sliding seal may be a plate, a bowl or a labyrinth of interleaved plates.

Abstract: A board stage of an aligner that can avoid bending of a printed circuit board to be exposed and accomplish high accurate exposure. In one preferred modes a suction plate 2 having small holes 20 is mounted on a supporting body on which a space 30 bigger than the small holes is provided. The holes 20 are connected to the space 30 and to a vacuum device via an air passage 31 and a bottom passage 32. The diameter of the suction hole 20 is so less than 0.4 mm not to make at the printed circuit board such bending that causes exposure troubles.

Abstract: The invention includes a process which provides a projection system which projects an image of a predetermined pattern formed on a reticle to a photosensitive substrate; a setting process which sets a correction member which corrects residual aberration in the projection system at a predetermined position between a reticle setting position where the reticle is arranged and a substrate setting position where the photosensitive substrate is set; and a process which corrects degradation of optical characteristics of the projection system caused by setting the correction member at the predetermined position. Furthermore, the correction process includes a first adjusting process which adjusts at least one of the reticle setting position and the substrate setting position.

Abstract: An apparatus for supporting a mask comprises a pair of members. The mask held against each member by a vacuum arrangement which prevents relative motion between the mask and members. The members are compliant such that they accommodate flatness variations in the mask but without deforming the mask.

Abstract: A support assembly (12) for an exposure apparatus (10) includes a frame assembly (34), an elevator assembly (36) and a pivot assembly (38) for supporting at least one subassembly above an isolation base (32). The elevator assembly (36) selectively lifts the frame assembly (34) and the subassembly relative to the isolation base (32). Further, the pivot assembly (38) allows a portion of the frame assembly (34) and the subassembly to be rotated relative to the isolation base (32). As a result of this design, the subassemblies of the exposure apparatus (10) can be removed relatively easily for service and adjustment.

Abstract: An illumination optical system is revolved at a given speed around a rotation shaft and emanates exposure light onto a reticle. The light having passed through the reticle is projected onto a semiconductor substrate, by means of a projection optical system which is revolved around the rotation shaft such that a relative positional relationship between the illumination optical system and the projection optical system is maintained.

Abstract: A base assembly is provided to support a wafer stage chamber assembly of a wafer manufacturing system. The wafer stage chamber assembly isolates semiconductor substrates from the atmosphere so that the resulted wafers have an improved quality and meet certain wafer manufacturing specifications. The base assembly includes a stage base to support the stage device, a base frame to support the stage base, and a plurality of support members to attach the base frame to an apparatus frame of the semiconductor substrate manufacturing apparatus. The base assembly also includes at least one mover base positioned adjacent the stage base to support at least one mover assembly. In addition, the base assembly is provided with an accessory channel to store accessories, such as cables, hoses, and wires, away from various moving parts in the wafer stage chamber assembly.

Abstract: A supporting assembly for use in a lithographic projection apparatus includes a moveable member which is journalled in a housing such that substantially no vibration forces are transmitted between the moveable member and the housing. The assembly comprises a gas filled pressure chamber in which the gas in the pressure chamber acts on the moveable member so as to at least partially counteract the force due to the weight of the moveable member and any other object which it carries. The pressure chamber is supplied with gas and the whole assembly is constructed and arranged such that substantially no gas flows through the pressure chamber when the moveable member is substantially stationary. The supporting assembly may be applied to a lithographic projection apparatus, object table, or metrology frame.

Abstract: Vibrational movement between the top of a lens and a main plate on which the lens is mounted is reduced by attaching between the lens and the main plate a lens support which detects relative movement between the lens and the main plates using piezoelectric sensors and compensates for that movement to reduce vibration using piezoelectric actuators which are in series with the piezoelectric sensors. The control signal which is generated to actuate the actuated piezoelectrics is generated by a controller.

Abstract: A positioning device for positioning a wafer table and an exposure apparatus including the positioning device are disclosed. The positioning device comprises a housing, a piezoelectric actuator, and a structure for moving the wafer table in a second direction. The piezoelectric actuator has a first and second end. The first end is fixedly mounted to the housing and the second end is movable in a first direction in response to a change in voltage applied to the piezoelectric actuator. The structure comprises a first joint, a second joint, a diagonal member, and a flexure. The first joint is movable in the first direction in response to the second end of the piezoelectric actuator moving in the first direction. The second joint is movable in the second direction to move the wafer in the second direction. The diagonal member is connected to the first and second joints at an angle with respect to the first direction.

Abstract: In addition to first and second pneumatic springs, first and second electromagnetic actuators are provided, and a target position and target speed of a stage are feed-forwarded to them. At this time, the first and second pneumatic springs and the first and second electromagnetic actuators divide a frequency band with predetermined filters.

Abstract: In order to eliminate the cam member, which is mounted to the mounting member side and to which grease is applied, to prevent, as much as possible, the portions to which grease has been applied from becoming exposed to the side of an original placed on the contact glass, an original cover closer is arranged from a mounting member, which has a mounting base and side plates, which are raised from both sides of the mounting base, and has the abovementioned mounting base mounted to the main device unit side, a supporting member, which supports an original cover, has a back plate as well as side plates and a top plate, which are bent from the back plate, and has one end of each of the side plates being rotatably mounted via a hinge pin to the corresponding side plate of the abovementioned mounting member, a cam slider, which is fitted inside the supporting member in a manner enabling sliding towards the side of the abovementioned mounting member, a pressure bearing pin, which is axially mounted between the respect

Abstract: A semiconductor manufacturing apparatus having a guard system, an interlocking system operable in response to loss of function in a portion of the guard system, to stop a corresponding operation in the apparatus, and an interlock disabling switch for disabling the interlocking through the interlocking system. The structure accomplishes prompt disabling of the interlocking, to improve the efficiency of a maintenance or service operation. A safeguard can be achieved without a decrease of throughput.

Abstract: An apparatus, system, and method for configuring a dual isolation system lithography tool is described. An isolated base frame is supported by a non-isolated tool structure. A wafer stage component is supported by the isolated base frame. The wafer stage component provides a mount for a semiconductor wafer. A reticle stage component is supported by the isolated base frame. The reticle stage component provides a mount for a reticle. An isolated bridge provides a mount for a projection optics. The isolated bridge is supported by the isolated base frame. Alternatively, an isolated bridge is supported by a non-isolated base frame. A wafer stage component is supported by the non-isolated base frame. A reticle stage component is supported by the non-isolated base frame. An isolated optical relay is supported by the non-isolated base frame. The isolated optical relay includes one or more individually servo controlled framing blades.

Abstract: In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.

Abstract: A stage assembly and support system are provided to stabilize a stage base, such as a wafer stage base or a reticle stage base, minimizing forces transmitted from the stage assembly to a stationary surface, such as the ground, and thereby preventing vibration of other parts or systems in a wafer manufacturing process. Depending of the applicable photolithography system, a reticle stage and/or a wafer stage are accelerated in response to a wafer manufacturing control system to position the semiconductor substrates. The jerking motions of the reticle stage and/or wafer stage cause reaction forces acting on the reticle stage base and/or wafer stage base. The reaction forces induce vibration to the stationary surface and surrounding parts of the photolithography system. The wafer stage assembly and support system according to this invention allow the reticle stage base and/or wafer stage base to move relative the stationary surface.

Abstract: An object table is supported in a vacuum chamber by an elongate beam or beams extending though elongate slots in opposite walls of the vacuum chamber. Displacement of the beam in two orthogonal directions is achieved by displacing the beam laterally and longitudinally. The elongate slots are sealed by sliding plates supported by a gas bearing. The beam is driven longitudinally by linear motors acting against between a balance mass and the beam. The beam is driven laterally by linear motors acting between a balance mass and the sliding plates. The two balance masses may be separate or combined.

Abstract: Stage devices are disclosed for use especially in a vacuum environment as encountered in a charged-particle-beam (CPB) microlithography (exposure) apparatus. An embodiment of the stage device includes a bottom plate that serves as a guide plate providing two opposing parallel edge planes that serve as respective guide planes. A top plate and a moving table are sandwiched between the guide planes. Extending from one edge of the moving table is a sample platform desirably configured to carry at least two objects such as two reticles or two wafer substrates. Between the top surface of the bottom plate and the bottom surface of the top plate are air pads that provide near frictionless motion of the moving table relative to the guide planes. The moving table is provided with multiple (e.g., three) linear motor coils that provide motion of the moving table in two dimensions relative to the guide planes (e.g.

Abstract: An object of the invention is to provide a substrate transport apparatus which enables prompt transfer of a substrate, and a substrate processing apparatus incorporating this. A substrate transport apparatus of the invention comprises a transport arm (45, 46, 145, 146) for supporting a peripheral portion of a substrate (W) at at least two places on the peripheral portion, and transporting the substrate to a stage (7).

Abstract: Misalignment errors in a lithographic system resulting from the effect of environmental changes on the lens system itself are detected and corrected. A fiducial on the reticle adjacent to its working area is projected through the lens. A metrology plate carried by the lens holds reference mirrors and detectors The reference mirrors receive the resultant image and reflect it to detectors in a reflected image plane. This provides feedback to the reticle alignment system as to the extent of misalignment, if any. Correction is made by moving the reticle until alignment is achieved and detected. This motion is achieved by using a reticle chuck with linear motors.

Abstract: A manufacturing method for exposure apparatuses is provided in which a reticle R1 held on a reticle stage system RST is illuminated by exposure light from an exposure light source 16 via the illumination systems IL1 and IL2. In a first manufacturing line, a main body module composed of a frame caster 2, a main body support section 3, and a main body column 5 is assembled, and an illumination system and the projection optical system PL are mounted on this main body module. Then a stage module, which is assembled and adjusted using another main body module in a second manufacturing line, is mounted on the main body module of the first manufacturing line. Therefore exposure apparatuses can be efficiently manufactured without using dedicated large scale adjustment jigs.

Abstract: A lithographic projection apparatus comprises an illumination system for supplying a projection beam of radiation, a mask table provided with a mask holder for holding a mask, a substrate table provided with a substrate holder for holding a substrate, and a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate. The lithographic projection apparatus further comprises a mask-handling apparatus to exchange a mask between a load-port module for receiving masks and the mask holder, the mask-handling apparatus having first and second robots for carrying out the exchange. The first robot exchanges a mask between the load-port module and the second robot, and the second robot exchanges a mask between the first robot and the mask holder. Further, the first robot may also transfer a mask to an internal mask library and a mask inspection module.

Abstract: A vibration control method of a stage apparatus having a main stage body that is driven over a base plate, which controls vibration by providing a force to the base plate. The position of a center of gravity and a position of a major inertia axis of the stage apparatus is detected when vibration is applied to the base plate, and the force is controlled based on the detected position of the center of gravity and the major inertia axis. As a result, in this vibration control method, force is controlled based on the actual position of the center of gravity and the major inertia axis, which is determined when vibration is applied to the base plate of actual equipment or by simulation rather than based on the position of the center of gravity and the major inertia axis in a design model. Hence, residual vibration of the base plate is effectively controlled.

Abstract: A photographic paper magazine, for containing a photographic paper roll of photographic paper, includes a magazine case. A support shaft is contained in the magazine case in a rotatable manner, and secured to an axis of the paper roll in rotationally immovable manner. First and second flanges are disposed on the support shaft, for neatening end faces of the paper roll. A passageway is formed in the magazine case, for passage of the photographic paper in and out. 16 receiving pins are formed to project from and edge portion of the first flange toward the second flange, for defining a passage space between. The passage space allows passage of the photographic paper extending from the paper roll toward the passageway. When the support shaft is rotated in a winding direction, the 16 receiving pins temporarily wind a portion of the photographic paper extending out of the passage space.

Abstract: A jacket is provided to surround coils in a stationary member of a linear motor. An inlet of the jacket is directed toward the optical path of a laser beam from a laser interferometer, and a temperature-controlled fluid is circulated through the jacket. Temperature sensors are provided at the outlet and inlet, respectively, of a temperature controller. The temperature of the fluid supplied to the stationary member is controlled so as to become equal to the temperature around the optical path of the laser beam on the basis of the values of temperature measured by the temperature sensors, thereby suppressing fluctuations of air in the optical path of the laser beam. An exhaust groove is provided in a guide bar transport member so as to surround a bearing surface around a gas outlet, and partition walls flush with the bearing surface are provided outside the exhaust groove.

Abstract: An exposure apparatus for transferring a pattern on a master to a substrate via an optical system includes a first housing for surrounding the exposure position of the master, a second housing for stocking the master, and a third housing for transferring the master between the inside and outside of the first housing. The interior of each housing is controlled to a predetermined atmosphere.

Abstract: A device for effectively purging part of an ultraviolet path in an exposure apparatus with inert gas has been developed in an exposure apparatus for forming a mask pattern on a photosensitive substrate via a projection optical system by using ultraviolet rays as exposure light. An exposure apparatus according to this invention includes a chuck for holding a substrate, a stage for aligning the substrate via the chuck, a mechanism for purging an exposure optical path near the stage with inert gas, and a top plate which is mounted on the stage and forms a surface almost flush with the surface of the substrate. A gap is formed between the side surface of the substrate and the top plate, and the depth of the gap is equal to or larger than the width of the gap. Oxygen, moisture, or the like in the gap can be satisfactorily purged. This invention can provide an exposure apparatus for strictly removing oxygen in the exposure optical path and performing stable exposure.

Abstract: An exposure apparatus includes a support for holding (i) a pellicle-equipped reticle, the pellicle-equipped reticle including a pellicle frame having an opening, and (ii) a nozzle disposed in an opposed relation to the opening formed in the pellicle frame of the reticle held on the support, the nozzle being used to substitute an inert gas for gas in a pellicle space surrounding the reticle, the pellicle frame and a pellicle film. By purging out air including impurities from the pellicle space with the inert gas, a reduction in transmittance of exposure light through the pellicle space can be suppressed and the exposure operation can be performed with stability.

Abstract: Control of particle contamination on the reticle and carbon contamination of optical surfaces in photolithography systems can be achieved by the establishment of multiple pressure zones in the photolithography systems. The different zones will enclose the reticle, projection optics, wafer, and other components of system. The system includes a vacuum apparatus that includes: a housing defining a vacuum chamber; one or more metrology trays situated within the vacuum chamber each of which is supported by at least one support member, wherein the tray separates the vacuum chamber into a various compartments that are maintained at different pressures; and conductance seal devices for adjoining the perimeter of each tray to an inner surface of the housing wherein the tray is decoupled from vibrations emanating from the inner surface of the housing.

Abstract: Control of particle contamination on the reticle and carbon contamination of optical surfaces in photolithography systems can be achieved by the establishment of multiple pressure zones in the photolithography systems. The different zones will enclose the reticle, projection optics, wafer, and other components of system. The system includes a vacuum apparatus that includes: a housing defining a vacuum chamber; one or more metrology trays situated within the vacuum chamber each of which is supported by at least one support member, wherein the tray separates the vacuum chamber into a various compartments that are maintained at different pressures; and conductance seal devices for adjoining the perimeter of each tray to an inner surface of the housing wherein the tray is decoupled from vibrations emanating from the inner surface of the housing.

Abstract: An electronic device (205) is attached to a container (200) that carries a lithography mask (201) through a semiconductor factory (100) form a first station (110) to a second station (120). In the device, a receiver unit (210) receives first data (111) indicating how the first station has used the mask in a first process; a memory unit (220) temporarily stores the first data; a processor unit (230) processes the first data and provides second data (122) indicating how the second station uses the mask in a second future process; and a transmitter unit (240) transmits the second data to the second station or to a factory host.

Abstract: A windowless system and apparatus are provided that prevent outgases from contaminating the projection optics of an in-vacuum lithography system. The outgassing mitigation apparatus comprises a chimney that is substantially closed at one end, a duct fluidly coupled to the chimney, and a baffle disposed within the chimney. The chimney of the outgassing mitigation apparatus is funnel shaped at the end that is substantially closed. This end of the chimney has an opening that permits a beam or bundle of light to pass through the chimney. A rotating barrier, having at least one aperture for the passage of light, can be positioned near the chimney so that the rotating barrier substantially closes an open end of the chimney except when one of the apertures of the rotating barrier is passing by the chimney. This rotating barrier can be chilled by a refrigerator unit, which is radiantly coupled to a portion of the rotating barrier. A motor is used to rotate the barrier.

Abstract: A first pattern is illuminated in a first exposure step with a light beam which is inclined by a predetermined amount in a direction perpendicular to a line direction of a first L/S pattern with respect to an optical axis of a projection optical system. The illumination in this manner causes two-beam illumination effected by a 0-order diffracted light beam and a −1-order diffracted light beam generated from the first pattern formed on a mask. Modified illumination is performed in a second exposure step for a mask formed with an L/S second pattern including a line pattern in a direction perpendicular to the first line pattern. A pattern image, which has a high resolution and a large depth of focus in the respective line directions, can be formed on a photosensitive substrate by performing multiple exposure by using the modified illumination in the separate steps respectively for the first and second patterns which are in an orthogonal relationship.

Abstract: A laser unit is arranged in an area of a floor surface, the width of which area is defined by maintenance areas, on both sides of an exposure-apparatus main body, inclusive. Furthermore, the exposure-apparatus main body and the laser unit are arranged on the floor surface such that maintenance areas of the both overlap each other at least partially. Moreover, a C/D is connected in-line with the front surface of the exposure-apparatus main body, and in the side of the exposure-apparatus main body, which side is in front of the optical axis of the projection optical system and which is connected with the C/D, a housing is provided which has a delivery port into and from which a mask container is loaded and unloaded by a ceiling-transport system that moves along a rail.

Abstract: Disclosed is a substrate conveying system for conveying a substrate to and from an accommodating container, wherein a fork-like hand arranged to hold a reticle by attraction is relatively moved close to or away from and upwardly or downwardly, relative to the container. The container has a supporting member for supporting one or more reticles and a positioning member for positioning the same in a horizontal plane. The conveying system has an obstacle detector, comprising a transmission type sensor, for detecting presence/absence of any obstacle in a region through which the hand is inserted to transfer a reticle. This structure avoids interference between the hand and the container or the reticle.

Abstract: A projection exposure apparatus is provided. The projection exposure apparatus includes an illumination optical system for illuminating a portion of a mask pattern on a mask with an exposing radiation flux of a predetermined shape, a fixed support, a projection optical system fixed to the fixed support for projecting the image of the illuminated portion of the mask pattern onto a substrate, and a carriage for integrally holding the mask and the substrate, the carriage being movable in a predetermined direction with respect to the projection optical system to successively exposing the substrate with the image of the mask pattern formed by the exposing radiation flux.

Abstract: Disclosed is a moving mechanism which includes a reference structure having a guide surface, a movable portion being movable along the guide surface, and an actuator having a movable element disposed at the movable portion side and at least two stators, the stators being separated from each other and being moved by a reaction force produced as the movable portion is driven.

Abstract: A vertical alignment table mechanism 21 for a board 25 to form a printed wiring board has a vertical support wall 43, and an alignment table 33 disposed in vertical attitude opposite to the front surface of the support wall 43, having an opening in which an exposure mask 23 is disposed. The alignment table 33 is supported for movement in a vertical plane on the vertical support wall 43 by a means of plurality of table support devices 35. Each of the table support devices 35 includes a ball caster 51 fixed to the support wall 43 having a ball 51a therein and a contact block 53 fixed to the alignment table 33. A tension spring 55 urges the surface of the contact block 53 against the ball. Table moving devices 37 are also provided between the support wall 43 and the alignment table 33. Each table moving device 37 includes a contact block 85 on the alignment table, and a follower roller 83 on the support wall 43. A spring 37 urges the follower roller 83 against the contact block 85.

Abstract: An exposure apparatus for photoengraving stamps includes a light-proof cabinet having a flash light therein and a drawer adapted to be drawn out therefrom. A clamp is carried on the drawer for holding the stamp. The clamp includes a base fixed to the drawer and formed with a pair of parallel rails, a pair of opposed holders movable on the base along the parallel rails, and means for moving the holders along the parallel rails in opposite directions synchronously. Each of the holders is also provided with a lifter for lifting up the middle plank between the bars and a handle for operating the lifter. Therefore the stamp may be held between the planks just under the flash light when the holders are moved closer together and the middle planks are lifted by turning the handles.

Abstract: A weight compensation mechanism made up of at least three spring members (3a-3c), and linear motors (4a-4c) for finely translating a fine moving stage (1) in the Z direction are interposed between the fine moving stage (1) and a coarse moving stage (2). The barycenter (G) of a structure including the fine moving stage (1) deviates from the stage center (O) owing to bar mirrors (10) or the like. When the spring members (3a-3c) return the fine moving stage (1) to a statically balanced state, a rotation moment is generated to score or damage the stage. The spring constants of the three spring members (3a-3c) are set based on the relative positions of the spring members (3a-3c) to the barycenter (G), thereby preventing generation of the rotation moment.

Abstract: A stage system includes a movable stage having a static bearing and a magnet preloading mechanism, and a base having a guiding surface for guiding the movable stage. The base has an accumulated structure including a first layer of a magnetic material provided at the guiding surface, and a second layer of a non-magnetic material.

Abstract: An exposure apparatus includes a chamber which incorporates an optical element and surrounds a predetermined region, a closed vessel which surrounds the chamber, and a pump for reducing the internal pressure of the chamber. The pressure of the closed vessel is also reduced when the internal pressure of the chamber is reduced.

Abstract: A substrate handling method includes a first step for holding a substrate with a hand mechanism, the hand mechanism being provided for positioning the substrate, a second step for discharging a gas out of a gas pad provided on a stage, such that the substrate held by the hand mechanism is floated relative to the gas pad, wherein the hand mechanism is provided separately from the stage, a third step for moving the hand mechanism such that the substrate is positioned finely with respect to the plane of the substrate and a fourth step for stopping gas discharging from the gas pad.

Abstract: A stage device includes a movable body, movable along a guide surface, for moving an element mounted on the movable body, a static pressure bearing, having at least one pad, for guiding the movable body along the guide surface, the at least one pad being attached to the movable body at a first position, and a linear motor, having a movable part and a relatively stationary part, for moving the movable body, the movable part of the linear motor being attached to the movable body at a second position. The movable body has a hollow structure at at least one of the first position and the second position. The hollow structure has an enclosure structure or a rib structure.

Abstract: In a lithographic projection apparatus, a reflective-type mask MA is attached to a compliant membrane 110 on a mask table MT. The backside of the membrane is in turn attached to a plurality of actuators 140 which are operable to deform the membrane. A mask level sensor can be used to detect the level of the mask and the actuators operate to keep the mask at a constant level. Additionally, the actuators may also serve to keep the mask flat and in the correct planar orientation. FIG.

Abstract: In an automatic exposure apparatus for printing plates, a photopolymer plate is taken out of an accommodating cassette in which stacked photopolymer plates are accommodated, and an image is recorded onto the photopolymer plate. A shutter which opens and closes an opening of the accommodating cassette is configured as a thin plate, and thus, the accommodating cassette is thin and light.

Abstract: A vacuum holddown for sheet materials has a surface having a field of vacuum ports in which each individual port is gated. When a vacuum is applied to the underside of the holddown, the gates close. When a sheet of material is introduced onto a region of the field, the gates only within vacuum manifold passageway covered by the material are configured to spring open, applying a suction force to the sheet via the now opened ports. The holddown thus automatically adjusts to material size. An implementation for use in an ink-jet printer with cut-sheet print media is demonstrated.

Abstract: An optical element (1) of an optical system has at least one chamber (5) that is sealed against atmospheric pressure and is enclosed by boundary surfaces and that has a fluid filling. At least one of the boundary surfaces of the chamber (5) is exposed at least partially to illumination light. It is configured so that a change in the fluid pressure inside the chamber (5) results in a change in non-rotational-symmetric imaging properties of the optical element (1) having n-fold symmetry. For this purpose, a fluid source has a fluid connection to the chamber via a fluid supply line (17). Furthermore, a control device is provided for the pressure in the fluid filling.

Abstract: A supporting device (53) provided with a first part (69), a second part (71), and a gas spring (73) for supporting the second part relative to the first part parallel to a support direction (Z). The gas spring (73) comprises a pressure chamber (75) which is provided in an intermediate part (79) and is bounded by a piston (81) which is displaceable in the intermediate part (79) parallel to the support direction and is supported perpendicularly to the support direction by means of a static gas bearing (85). A stiffness of the supporting device parallel to the support direction is thus substantially entirely determined by a stiffness of the gas spring, and a low stiffness can be achieved through a suitable design of the gas spring. A transmission of vibrations directed parallel to the support direction from the first part to the second part is prevented as much as possible thereby. The invention also relates to a lithography device having a plurality of such supporting devices.