Abstract: A photolithography method using near-field light includes a step of controlling the position of an exposure mask and an object to be processed so as to make the object to be located in a region where near-field light is present, and a step of exposing the object to near-field light while controlling the intensity of such light as a function of the aperture density of the exposure mask. The intensity of near-field light is controlled by modifying the aperture width or modifying the transmissivity of the exposure mask depending on the aperture density.

Abstract: An adjuster assembly (12) that adjusts the location where an image (18) from an object (20) is transferred onto a device (16) includes an adjuster (54) and a stage mover assembly (244). The stage mover assembly (244) adjusts the position of the adjuster (54). This moves the position where the image (18) is transferred onto the device (16). The adjuster assembly (12) can include a damper assembly (250) that is coupled to the stage mover assembly (244) and reduces the effect of vibration from the stage mover assembly (244) causing vibration on the rest of the apparatus.

Abstract: The present invention provides for an imaging device such as a scanner or printer. The imaging device includes a unique media gate arrangement in which each of the media gates is positioned along the same optical axis. This provides for a gate arrangement in which media of a first format will be conveyed across one of the gates and media of a second format will be conveyed across a second one of the gates. With the arrangement of the present invention it is not necessary to change a media gate based on the format of the film or media used, since the media gates based are positioned along the same optical axis and are positioned such that the light beam passes through both gates.

Abstract: A holder for exposing both faces of a panel to light in order to make a double-sided printed circuit using first and second flexible artworks. The holder has a first frame with no transparent plane support member for receiving the first flexible artwork, and a second frame with no transparent plane support member for receiving the second flexible artwork. The holder includes a system for positioning and fixing the peripheries of the artworks to their respective frames. The holder further includes a mechanism for positioning and holding the panel between the frames. There is an approach mechanism for causing the frames to move towards the faces of the panel. There is also a system for establishing suction in the volume defined between the frames having the panel therebetween.

Abstract: Two stages WS1, WS2 holding wafers can independently move between a positional information measuring section PIS under an alignment system 24a and an exposing section EPS under a projection optical system PL. The wafer exchange and alignment are performed on the stage WS1, during which wafer W2 is exposed on the stage WS2. A position of each shot area of wafer WS1 is obtained as a relative position with respect to a reference mark formed on the stage WS1 in the section PIS. Relative positional information can be used for the alignment with respect to an exposure pattern when the wafer WS1 is moved to the section EPS to be exposed. Therefore, it is not necessary that a stage position is observed continuously in moving the stage. Exposure operations are performed in parallel by the two wafer stages WS1 and WS2 so as to improve the throughput.

Abstract: A lithographic projection apparatus with a chuck in which a dielectric element of the electrostatic chuck has a specific resistivity of at least 1016 SE cm so that once the potential difference between electrodes of the chuck is removed the force on the article to be clamped reduces below a predetermined minimum level quickly. The dielectric element also has a coefficient of thermal expansion of less than 0.02×10−6K−1. A method of manufacturing a chuck includes joining a first glass ceramic element with a second glass element with an electrode therebetween in which a current is passed through the second glass element.

Abstract: A support device for a stage provides flexibility in at least two degrees of freedom. The support device uses a mounting device with stiffness in at least a first degree of freedom and rotational flexibility in a second degree of freedom, capable of receiving the stage device. An extension device configured to extend from a base and affix to the mounting device has flexibility in at least the first degree of freedom and rotational stiffness in the second degree of freedom. This support device can be used in precision manufacturing including lithographic processing. Rotational flexibility in the mounting device is facilitated using at least two flexures arranged at angles to each other and capable of providing rotational flexibility in the second degree of freedom and stiffness in at least the first degree of freedom. Materials in the flexures include metallic, non-metallic and composite materials.

Abstract: A double bellows seal comprising a plurality of rings including first and second end rings, a middle ring, a first bellows, and a second bellows. The first bellows is formed from a flexible material that is sealingly connected between the first end ring and the middle ring, and it has a twist bias in a first rotational direction relative to an axis of the rings. The second bellows is formed from a flexible material that is sealingly connected between the second end ring and the middle ring. The second bellows has a twist bias in a second rotational direction relative to an axis of the rings that is opposite that of the first rotational direction.

Abstract: Stage devices are disclosed that include gas-actuation and reaction-force-canceling mechanisms. In an embodiment, an X-axis moving guide extending in the X direction engages a lower stage via a gas bearing. Y-axis sliders (movable elements) are provided at both ends of the X-axis moving guide. A Y-axis fixed guide 8 engages each Y-axis slider via a gas bearing. Each Y-axis slider and respective fixed guide constitute a respective pneumatic actuator. Respective mounting members are provided near the ends of each fixed guide, with interposed gas bearings, and each fixed guide is slidably affixed to a base plate. An actuator for stroke correction is provided in association with each mounting member.

Abstract: A scanning exposure apparatus includes an illumination optical system for illuminating a pattern on a mask using arc-shaped illumination light, a projection optical system for projecting the pattern on the mask illuminated by the illumination optical system onto a plate, a mask stage for scanning the mask, a plate stage for scanning the plate, the scanning exposure apparatus scanning the mask stage and plate stage synchronously relative to the projection optical system, a mask support mechanism for supporting a peripheral of the mask, and a mask stage tilt mechanism for arranging the pattern in an area illuminated by the arc-shaped illumination light in an object-surface-side focal plane of the projection optical system, wherein the mask deforms due to its own weight from the peripheral supported.

Abstract: A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.

Abstract: In a barrel of an optical unit a ring shaped support member is integrally arranged, and three projected portions are arranged on the upper surface of the support member. The projected portions support a lower surface of a parallel flat plate supported in direct contact. In this supported state, the parallel flat plate opposes a surface of the support member with a clearance of several &mgr;m in between. With this arrangement, the space in one side of the parallel flat plate is substantially isolated from the space in the other side. Accordingly, for example, even if gas environment in the space on one side of the parallel flat plate is different from the other side, gases can be effectively kept from mixing. In addition, since the parallel flat plate is supported at three coplanar points, deformation of the parallel flat plate can be suppressed due to the force supporting the parallel flat plate, thereby suppressing the index of refraction from varying.

Abstract: It is an object of this invention to cancel a moment reaction force generated upon driving an object and reduce its effect. A driving apparatus of this invention includes the first linear motor which drives an object (e.g., an X-Y slider) in the X direction, the second linear motor which drives the object in the Y direction, and a controller which controls the first and second linear motors. The first and second linear motors have the first and second reaction force counters, respectively, which move upon receipt of a reaction force generated upon driving the object. In moving the object standing at a point A to a point B and stopping the object, the controller controls the first and second linear motors such that the object moves on a straight line connecting the point A and the point B.

Abstract: An exposure apparatus for exposing a substrate with an image of a pattern formed on a mask, including an illumination system or irradiation for illuminating or irradiating the mask with exposure light. A projection optical system is included for projecting, onto the substrate, an image of the pattern illuminated by the exposure light. The mask is securely supported on a movable mask stage. In one example, a mask holder is provided for supporting the mask from below. A pressing member is also included for applying, from above, a prescribed force to the mask, outside of the points supported by the mask holder.

Abstract: Methods and apparatus for ensuring the proper handling of reticles in the manufacturing of microdevices are disclosed. The methods and apparatus employ one or more reticle stop blocks fixed to a reticle handling arm. The one or more reticle stop blocks are designed and arranged to engage an edge of the reticle in order to place the reticle in a desired position on the reticle handling arm should the reticle be improperly arranged in a cassette in which the reticle is stored. By ensuring proper placement of the reticle on the reticle handling arm when the reticle is removed from the cassette, the likelihood of a subsequent fault in handling the reticle is greatly reduced.

Abstract: A stage assembly (10) for moving and positioning a device (30) includes a stage (14), a stage mover assembly (16), a device table (18), a table mover assembly (20) and a damping assembly (22). The table mover assembly (20) moves the device table (18) along a Z axis, about an X axis and about a Y axis relative to the stage (14) and generates reaction forces. The damping assembly (22) is coupled to the table mover assembly (20). Uniquely, the damping assembly (22) reduces the reaction forces created by the table mover assembly (20) that are transferred to the stage (14).

Abstract: A method, system, and apparatus for management of reaction loads in a lithography system is described. An isolated structure is supported by a non-isolated structure. The isolated structure supports a moveable stage. A linear motor includes a first linear motor element and a second linear motor element. The first linear motor element is coupled to the moveable stage. A plurality of parallel flexure plates mount the second linear motor element on the isolated structure. A flexure rod is coupled between the non-isolated structure and the second linear motor element.

Abstract: Methods and apparatus for isolating vibrations associated induced by reaction forces and ground vibration are disclosed. According to one aspect of the present invention, a scanning stage apparatus includes a stage base, a stage, a driver, and a reaction frame. The stage moves over the stage base in a first translational direction, a second translational direction, and a first rotational direction. The driver causes the stage to move, and also causes at least one reaction force to be created when the stage moves. The reaction frame at least partially supports the driver, and along with the driver, is substantially decoupled from the stage base. The reaction force is arranged to be transmitted to the reaction frame. The electromagnetic coupling electromagnetically couples the reaction frame to a ground, and provides a stiffness and a damping between the reaction frame and the ground.

Abstract: A mask holder for irradiating UV-rays is disclosed in the present invention. The mask holder includes a lower part having a frame and a mask supporting member supporting a mask, wherein the mask supporting member is in the frame and has a plurality of first connecting portions, and an upper part having a plurality of second connecting portions to be aligned with the first connecting portions.

Abstract: The invention provides systems and a method for reducing pellicle distortion. One feature of the invention reduces distortion of a pellicle by providing an airtight mounting structure for coupling a pellicle to a mask; and a port on the mounting structure though which a pressure difference can be created between the interior portion and an exterior environment. Hence, distortion can be reduced by controlling the pressure in the interior portion between the pellicle, the pellicle mounting structure and the mask. Another feature places an aerodynamic fairing adjacent the mask to reduce aerodynamic drag and, hence, suppress turbulent air flow over the pellicle. The features can be used separately or in combination.

Abstract: A container is provided for storing a lithographic printing mask. A first container section is formed of a sturdy material which defines a central inner recess area that is shaped to house a mask and to hold outer edges of a mask without touching a pattern on the mask. A second identical container section is placed against the first container section with a mask housed within recesses of, both to form a container which has a common pressure level all around and therein. A higher pressure level is then applied outside the container causes the first and second sections of the container to be held together. To remove the mask from the container, the pressure outside the container is reduced to substantially the pressure level inside the container and the first and second sections are pulled apart.

Abstract: A bearing for use in a vacuum chamber comprises a gas bearing discharging pressurised gas into a gap between two members to maintain a predetermined separation between those members. To avoid the gas forming the gas bearing being an unacceptable leak into the vacuum chamber, a vacuum pump is provided between the vacuum chamber and the gas bearing.

Abstract: Distortion of a pattern projected onto a wafer that is caused by, e.g., the surface shape of a reticle held by a reticle stage is corrected at a high precision. In a scanning exposure apparatus, an optical element (G1) is held by a reticle stage (RST) and moved together with a reticle (R). The optical element (G1) is so processed as to correct distortion caused by the surface shape of the reticle (R) held by the reticle stage (RST).

Abstract: Original cover closer with mounting base and supporting member has bent side plates rotatably mounted to each other. A lifting member with document pressure plate has side plates mounted to the supporting member side plated enabling the lifting member side plates to rotate in a different direction. A pressure bearing pin is mounted between the mounting member side plates and a cam slider is in the supporting member with a cam part in contact with the pin. A spring between the slider and the lifting member urges the supporting member to open the original cover while urging the lifting member in a direction overlapping the supporting member.

Abstract: A stage device includes a first stationary member, a second stationary member, a moving member and positioning devices. The first stationary member extends in a first direction. The second stationary member extends in the first direction and is spaced apart from the first stationary member in a second direction perpendicular to the first direction. The moving member can cooperate with the first stationary member and with the second stationary member. The positioning devices selectively position the moving member into cooperation with one of the first and second stationary members without physically contacting the moving member with the first and second stationary members. In addition, a stage device provided with a moving member that can move within a two-dimensional plane having a first direction and a second direction perpendicular to the first direction includes a first stationary member and a second stationary member.

Abstract: The stage apparatus can improve static and dynamic features by reducing the number of electrical wiring or tubes for air pressure disposed in a movable main stage member of a movable stage apparatus. The movable stage apparatus has a base structure body and a movable stage structure body. When the movable stage structure body is transferred on the base structure body to a position in which to exchange wafers, a receiving terminal part disposed on the movable stage structure body comes into contact with a feed terminal part disposed on the base structure body and a battery loaded on the movable stage structure body is charged with electric current supplied from the feed terminal part. When the stage structure body is apart from the position in which to exchange wafers, adsorption of the wafer loaded on the stage structure body is sustained electrically by utilizing the electricity of the battery.

Abstract: A printer has a media transport with a rigid, air-transmissive platen. A movable air-transmissive flexible web overlays the platen. A suction device communicates with the platen to draw air through the web and through the platen such that a sheet of media carried on the web is biased toward the platen. A valve sheet overlays or underlies the platen, and includes a plurality of shut-off elements, each movable in response to temperature changes between a closed position in which the element contacts a portion of the platen to prevent air flow through that portion of the platen, and an open position, in which the element is spaced apart from the platen to admit air to the platen portion. The shut off elements may include resistive heaters and bimetallic strips, so that application of electricity generates heat to flex the strip to an open position.

Abstract: A sheet to be scanned is conveyed to a sheet holding device provided with a support member having an arcuate and concave sheet holding surface and a sheet holding mechanism for holding the sheet on the sheet holding surface in which the sheet is conveyed along the sheet holding surface in its circumferential direction and is positioned in a predetermined position on the sheet holding surface. Air is blown into between the sheet holding surface and the sheet when the sheet is conveyed to and out of the sheet holding device through an air blow hole formed in the sheet holding surface.

Abstract: Optical pellicles for photomasks are described, where the optical pellicle is configured to be reversibly affixed to the photomask with a non-adhesive mounting member, such as a vacuum system or an electrostatic film. The optical pellicles of the invention are readily removed from the photomask and reattached without the use of adhesives, and are well-suited for use by automated methods.

Abstract: A stage assembly (10) for moving and positioning a device (26) includes a device table (20), a device holder (24) that retains the device (26), and a stage mover assembly (14). The stage assembly (10) includes one or more features that can isolate the device holder 24 and the device (26) from deformation. In some embodiments, the stage assembly (10) allows precise rotation of the device (26) between a first position (42) and a second position (44) without influencing the flatness of the device (26) and without deflecting and distorting the device (26). For example, the stage assembly (10) can include a carrier (60) and a holder connector assembly (62). The carrier (60) is supported above the device table (20) and rotates relative to the device table (20). The holder connector assembly (62) connects the device holder (24) to the carrier (60). Further, the stage assembly (10) can include a holder mover (120) that rotates the device holder (24) relative to the device table (20).

Abstract: In a lithographic projection apparatus, a slider is provided for motion of the substrate table or mask table. The slider is supported on a gas-bearing and separates a region at atmospheric pressure from a vacuum space region. A differential pressure pump is provided to maintain the pressure difference in the presence of the gas-bearing. A pressure compensation vessel is provided on top of the slider and also contains a vacuum. Over most of the area of the slider, the pressure on its opposed first and second sides is the same and so deformation of the slider is avoided. The sidewalls of the pressure compensation vessel transmit the external gas pressure to the slider such that they are in line with the forces of the gas-bearing.

Abstract: A structure for attaching a pellicle to a photomask, the pellicle comprising a pellicle frame and a pellicle sheet attached to an opening portion formed in the pellicle frame, wherein at least a portion of the pellicle frame surface in contact with the photo-mask has a direct contact with the photo-mask without interposing an adhesive.

Abstract: This invention relates to a method for positioning two stages during semiconductor wafer processing. More particularly, the invention facilitates the use of two stages to improve system throughput by decreasing the rest-time of certain system components. While a typical single-stage apparatus requires that each step in the process be performed serially, this invention allows an amount of parallel processing with each stage at different steps of the process, and thus improves system throughput.

Abstract: With respect to exposure apparatus, apparatus and methods are disclosed for compensating for lateral shift of a leveling table caused by a tilt (&thgr;) of the leveling table. One embodiment includes a wafer-stage-position loop servo, a leveling-table tilt-position loop servo, and a first feed-forward loop from the leveling-table tilt-position loop servo to the wafer-stage-position loop servo. The first feed-forward loop converts a torque-control signal for the leveling table to a linear-acceleration-control signal for the wafer stage. Thus, the wafer stage moves laterally to compensate for lateral shift of the leveling table. If the exposure apparatus includes a reticle stage controlled by a reticle-stage-position loop servo, then the subject apparatus can include (in addition to or in place of the first feed-forward loop) a second feed-forward loop from the leveling-table tilt-position loop servo to the reticle-stage-position loop servo.

Abstract: Control of particle contamination on the reticle and carbon contamination of optical surfaces in photolithography systems can be achieved by the establishment of multiple pressure zones in the photolithography systems. The different zones will enclose the reticle, projection optics, wafer, and other components of system. The system includes a vacuum apparatus that includes: a housing defining a vacuum chamber; one or more metrology trays situated within the vacuum chamber each of which is supported by at least one support member, wherein the tray separates the vacuum chamber into a various compartments that are maintained at different pressures; and conductance seal devices for adjoining the perimeter of each tray to an inner surface of the housing wherein the tray is decoupled from vibrations emanating from the inner surface of the housing.

Abstract: A reticle carrier used in semiconductor manufacture. The carrier includes a bottom cover and a top cover having a transparent window. A protective lid may also be included. The box includes ports to allow nitrogen gas to enter and purge the inside. The transparent window is used for inspection and photochemical clean. However, since no material is available which can suitably handle smaller wavelength radiation, the reticle is removed from the carrier when exposure at these wavelengths is required.

Abstract: A sliding seal system for providing a fluid seal that is slidable in two linear and one rotational degrees-of-freedom and that is flexible in one linear and two rotational degrees-of-freedom is disclosed. The sliding seal system includes a support member having a working surface arranged to provide a seal interface with a sealing surface on a first body. A flexible membrane is attached to the support member and coupled to a second body. A fluid supply system is provided to deliver a fluid to a region between the working surface of the support member and the sealing surface of the first body to provide buoyant flotation to the seal support member at the working surface. In a preferred embodiment, a fluid exhaust system is also provided to remove the fluid delivered by the fluid supply system. One particularly useful application of the described sliding seal system is in a photolithography system to provide a seal between an exposure apparatus and a wafer chamber.

Abstract: An apparatus and method for supporting and precisely positioning a table or stage with respect to a frame. The table is supported by at least one flexible member which is flexible in a plurality of degrees of freedom. The flexible member is mounted on a base which is movable in an additional degree of freedom. In the context of lithographic semiconductor processing, a wafer stage can thereby be precisely positioned with respect to a frame or reticle in six degrees of freedom.

Abstract: A lithographic apparatus according to one embodiment of the invention includes a movement detector configured to detect movement of the projection system and to generate a movement signal; a controller responsive to the movement signal and configured to generate a control signal; and an actuator assembly responsive to the control signal and configured to reduce movement of the projection system.

Abstract: A stage assembly (10) for moving a device (26) along an X axis and a Y axis includes a stage base (12), a device table (16), a stage mover assembly (18), a measurement system (21), and a control system (22). The stage mover assembly (18) includes a pair X guide movers (82) (84) and a Y table mover (87). The measurement system (21) includes a first X system (100) and a second X system (102). The control system (22) receives the position signals from the measurement system (21) and directs current to the X movers (82) (84) to move the device table along the X axis. The control system (22) can be designed to not skip any servo cycles during switching of position signals.

Abstract: A double bellows seal comprising a plurality of rings including first and second end rings, a middle ring, a first bellows, and a second bellows. The first bellows is formed from a flexible material that is sealingly connected between the first end ring and the middle ring, and it has a twist bias in a first rotational direction relative to an axis of the rings. The second bellows is formed from a flexible material that is sealingly connected between the second end ring and the middle ring. The second bellows has a twist bias in a second rotational direction relative to an axis of the rings that is opposite that of the first rotational direction.

Abstract: A reaction frame structure for isolating the vibrations induced by reaction forces from stage motions, such as for a guideless stage. The reaction frame supports the driving motors in a manner whereby the reaction frame is structurally decoupled from the stage (e.g., by a slidable coupling) at least with respect to reaction forces in one direction of motion. In one embodiment, the fixed portion of the drive devices for effecting stage motion in a first direction is coupled to the reaction frame by a slidable coupling. The reaction frame is coupled to ground. The rest of the system including the stage is isolated from ground by deploying a vibration isolation system. A spring damper absorbs the reaction forces of the drive devices in the first direction. In another embodiment, the reaction frame is slidably supported on the same base as the stage. Dampers may be provided to the reaction frame along the first direction and/or a second orthogonal direction.

Abstract: An apparatus and method precisely position a table or stage with respect to a frame in six degrees of freedom. The system includes a plurality of actuators between the stage and the frame which adjust the position of the frame in three degrees of freedom. The stage is also attached to at least one block assembly. Adjustment of the block assemblies adjusts the position of the stage with respect to the frame in an additional three degrees of freedom. In the context of photolithographic semiconductor processing, a wafer stage can thereby be precisely positioned with respect to a frame or reticle.

Abstract: An air bearing stage device which is suitable for use with a vacuum environment is disclosed. According to one aspect of the present invention, a stage apparatus includes a table that is positioned in a system vacuum chamber, a first rod that carries the table, and first and second plates that support the first rod. The first plate includes an air bearing surface that is held against the first side of a first wall by a first vacuum force. A first drive mechanism drives the first plate to move the first rod in a first direction, and also drives the second plate to move the first rod in the first direction, while a second drive mechanism which includes a second rod and a first linear motor causes the second rod to move the first rod in a second direction.

Abstract: Apparatus and methods are disclosed for detecting and measuring a tool-induced shift in a microlithography apparatus (“stepper”). The apparatus and methods are set forth in the context of microlithography apparatus that include a wafer stage and a holding member to which the wafer is mounted for exposure. The holding member can include, for example, a wafer table and wafer chuck, wherein the wafer table desirably includes a respective movable mirror for each of X- and Y-directions of movement. The holding member is rotatable, relative to the wafer stage, from a first rotational position to a second rotational position, which can be angularly displaced, e.g., 90° and/or 180° from each other. At each of the first and second rotational positions, a respective location of an alignment feature on the holding member (e.g., on the substrate, wafer chuck, or wafer table) is determined.

Abstract: A reticle capturing system includes a reticle that defines a first recess extending into the reticle from a first edge of the reticle and a second recess extending into the reticle from a second edge of the reticle. The reticle capturing system also includes a first finger selectively extending into the first recess and a second finger selectively extending into the second recess. The first and second fingers may be tapered so that the reticle capturing system will be self centering. The reticle capturing system may also include a third recess defined by the reticle and a third finger selectively extending into a recess. A method for capturing a reticle includes providing a reticle that defines a recess at an edge of the reticle and inserting the finger into the recess. The method may further include inserting a second finger into a second recess.

Abstract: An anti-vibration system with air dampers of high natural frequency, in a compact space. A pair of air dampers are disposed with their driving directions opposed to each other, and inside pressures of these dampers are variably controlled so as set the natural vibration frequency.

Abstract: An aligner which enables a uniform close contact between a photo mask and a printed circuit board is provided. The aligner includes: a photo mask (20) provided with tapered portions (21); a mask holder (2) for supporting the photo mask (20) at the tapered portions; a copy frame (1) for supporting the mask holder (2); a load regulating system (3); and a Z-axis moving system (8) having supporting arms (80) on which the mask holder (2) is placed through the load regulating system (3); and a guide system (4) having a guide shaft (40), so that the photo mask (20) can be moved relative to a printed circuit board (B) while maintaining the position in X and Y directions by the guidance of the guide system (4). The photo mask (20) closely contacts with a printed circuit board (B) by a tare weight of the copy frame (1), mask holder (2), and the photo mask (20), and the contact pressure is regulated by the load regulating system (3).

Abstract: Pure water (3) with a resistivity of 1 M&OHgr;·cm or more is externally supplied in an exposure apparatus in which a master and substrate are relatively moved and aligned by a stage driven by a linear motor (1) and a pattern on the master is transferred onto the substrate. While being adjusted to a predetermined temperature, the pure water (3) undergoes deoxidation processing and UV sterilization processing and is circulated to cool the linear motor (1).

Abstract: In a stage device of an exposure apparatus, a first stage is driven in the X-axis direction by a first X-axis motor while being supported at one side by a first guide bar, and a second stage is driven in the X-axis direction by a second X-axis motor while being supported at one side by a second guide bar. The first guide bar and the second guide bar are independently driven in the Y-axis direction by a Y-axis linear motor. In a state in which the first guide bar and the second guide bar are closest to each other, the end of the first stage opposite from the side supported by the first guide bar is placed above the second guide bar, and the end of the second stage opposite from the side supported by the second guide bar is placed above the first guide bar. First and second substrate tables are supported above the first and second stages, respectively, via first and second minutely driving devices.