By High Frequency Field (e.g., Plasma Discharge) Patents (Class 356/316)
  • Patent number: 7952709
    Abstract: The present invention describes a torch for producing a plasma for a spectrochemical analysis comprising: an alumina ceramic injector, a vitreous material inner tube concentric with the injector, and an annular joint between the injector and the inner tube. The joint fixedly attaches the injector and the inner tube together and comprises of an adhesive compatible with vitreous material and alumina ceramic. A method of manufacturing the torch is also described.
    Type: Grant
    Filed: March 6, 2009
    Date of Patent: May 31, 2011
    Assignee: SCP Science
    Inventors: George Feilders, Arthur Ross, Neil Ernest Davison
  • Patent number: 7944558
    Abstract: A method for physicochemical analysis of a material during its ablation with a pulsed laser. The method uses the ratio of intensity levels of two emission lines of a tracer element derived from plasma generated by the laser beam to characterize the plasma excitation temperature. The method determines concentration of an element to be measured in the plasma using standard measurements indicating correspondence between a concentration of the element to measured and a variation of intensity of an emission line and different ratios between intensity levels of two emission lines of the tracer element, the ratios representing the plasma temperature.
    Type: Grant
    Filed: February 22, 2006
    Date of Patent: May 17, 2011
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Daniel L'Hermite, Patrick Mauchien, Jean-Luc Lacour
  • Patent number: 7911598
    Abstract: Components (30) in the interior of an EUV lithography device for extreme ultraviolet and soft X-ray wavelength range are cleaned by igniting a plasma, adjacent to the component (30) to be cleaned, using electrodes (29), wherein the electrodes (29) are adapted to the form of the component (30) to be cleaned. The residual gas atmosphere is measured spectroscopically on the basis of the plasma. An emission spectrum is preferably recorded in order to monitor the degree of cleaning. An optical fiber cable (31) with a coupling-in optical unit (32) is advantageously used for this purpose. Moreover, in order to monitor the contamination in the gas phase within the vacuum chambers during the operation of an EUV lithography device, it is proposed to provide modules configured to initiate a gas discharge and to detect radiation emitted on account of the gas discharge. The contamination in the gas phase can be deduced from the analysis of the measured spectrum.
    Type: Grant
    Filed: September 8, 2009
    Date of Patent: March 22, 2011
    Assignee: Carl Zeiss Smt AG
    Inventors: Dieter Kraus, Dirk Heinrich Ehm, Thomas Stein, Harald Woelfle, Stefan-Wolfgang Schmidt
  • Patent number: 7908104
    Abstract: The invention provides a method for detecting and managing the status of a plasma processing apparatus with high sensitivity so as to enable long-term stable processing. In a plasma processing apparatus comprising a vacuum processing chamber 10, a plasma generating high frequency power supply 16, and a measurement device unit 3 for estimating the status of the apparatus via reflected waves 54 of the incident waves 53 reflected from the processing apparatus including a waveform generator 32, a VCO 33, a directional coupler 34, a detector 35 and a measurement data processing unit 36, frequency-swept high frequency waves 53 for measurement are introduced to the processing chamber where no plasma discharge is performed, so as to monitor the change of absorption spectrum frequency of the reflected waves 54 to thereby monitor the change in status of the processing apparatus.
    Type: Grant
    Filed: February 4, 2008
    Date of Patent: March 15, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tsutomu Tetsuka, Naoshi Itabashi, Atsushi Itou
  • Patent number: 7900525
    Abstract: A pre-assembled, disposable cathode handler assembly facilitates automated or manual loading of a cathode with analyte for spectrometric analysis and is intended for a single use application. This cathode handler assembly is comprised of several parts which work cooperatively together to stabilize a separate cathode and direct an analyte into the cathode. A stopper and channeling unit are disposed in supporting interconnection with the cathode so as to maintain it in a stable orientation for loading. The channeling unit may be used in combination with a liner which also interacts with the cathode to guide the analyte into an interior chamber therein, and further contains an analyte cap holder. A stopper prevents the introduced analyte from escaping the cathode and a housing is connected exteriorly of the cathode and supporting components to further stabilize the cathode during the loading procedure. A loading base may be integrated to assist in manual loading of a cathode.
    Type: Grant
    Filed: May 29, 2008
    Date of Patent: March 8, 2011
    Inventor: Darden Gwaltney Hood
  • Patent number: 7901940
    Abstract: A method is provided for measuring the concentration of a catalytic clement in a fuel cell powder. The method includes depositing on a porous substrate at least one layer of a powder mixture comprising the fuel cell powder and an internal standard material, ablating a sample of the powder mixture using a laser, and vaporizing the sample using an inductively coupled plasma. A normalized concentration of catalytic element in the sample is determined by quantifying the intensity of a first signal correlated to the amount of catalytic element in the sample, quantifying the intensity of a second signal correlated to the amount of internal standard material in the sample, and using a ratio of the first signal intensity to the second signal intensity to cancel out the effects of sample size.
    Type: Grant
    Filed: June 6, 2008
    Date of Patent: March 8, 2011
    Assignee: BASF Corporation
    Inventors: Lawrence Shore, Ramail Matlin
  • Patent number: 7884925
    Abstract: A disclosed device comprises an edge bonding seal configured to be mounted to an edge bead of the electrostatic chuck. The edge bonding seal includes a monitoring layer comprised of a first material configured to either emit a species capable of being optically monitored or having an electrical resistance value capable of being monitored, or both. The edge bonding seal further includes an edge bonding layer configured to be interspersed at least between the monitoring layer and the plasma environment. The edge bonding layer is comprised of a second material susceptible to erosion due to reaction with the plasma environment and configured to expose the monitoring layer to the plasma environment upon sufficient exposure to the plasma environment.
    Type: Grant
    Filed: May 23, 2008
    Date of Patent: February 8, 2011
    Assignee: Lam Research Corporation
    Inventors: Bradley J. Howard, Eric Pape, Siwen Li
  • Patent number: 7852471
    Abstract: An RF power generator (10) for an induction coil (26) for exciting an inductively coupled plasma in a torch (27) for spectrometry. The generator (10) comprises a switching circuit (12) for alternately switching ON and OFF solid state switching devices (20) via gate drive voltages (22) for supplying RF power into a resonant load circuit (16) comprising the induction coil (26) and parallel connected capacitance (25). The gate drive circuits (24) for each solid state switching device (20) each include a portion (30) that is mutually inductively coupled with leads of the induction coil (26) to provide the gate drive voltages (22). The circuit allows for reduced componentry and therefore a relatively inexpensive RF power generator for exciting and sustaining an inductively coupled plasma for spectrometry.
    Type: Grant
    Filed: May 9, 2007
    Date of Patent: December 14, 2010
    Assignee: Varian Australia Pty Ltd
    Inventor: Steven William Hosemans
  • Patent number: 7847934
    Abstract: The present invention relates to a method for correcting spectral interference in a spectrum which is determined using an inductively coupled plasma spectrometer (ICP) for analysing element contents of a liquid or gaseous sample, comprising the following steps: recording the spectrum of a matrix solution containing all spectrally interfering components, which are also contained in the sample, in a first concentration; recording the spectrum of the matrix solution in at least one dilution of the first concentration; regressing the signal intensities obtained in steps a. and b. against the concentration for a number of wavelength positions; calibrating the spectrometer, background correction using the values determined from the regression in step c. and determining the calibration function c=f(I); recording the sample spectrum using at least one analyte which is contained therein; determining the concentration of the spectrally interfering components in the sample using the results obtained in step c.
    Type: Grant
    Filed: November 27, 2006
    Date of Patent: December 7, 2010
    Assignee: Spectro Analytical Instruments GmbH
    Inventor: Lutz Neitsch
  • Publication number: 20100296087
    Abstract: The present invention provides for spectrometric methods of analyzing blood plasma or serum for metal distribution in metalloproteins by subjecting the sample to size-exclusion chromatography (SEC) and determining the metal content of the separated protein fractions by inductively-coupled plasma atomic emission spectrometry (ICP-AES). The methods can be used to assess such conditions as toxicity and disease in subjects.
    Type: Application
    Filed: May 29, 2008
    Publication date: November 25, 2010
    Inventor: Juergen Gailer
  • Patent number: 7839499
    Abstract: A hydrogen sensor for detecting/quantitating hydrogen and hydrogen isotopes includes a sampling line and a microplasma generator that excites hydrogen from a gas sample and produces light emission from excited hydrogen. A power supply provides power to the microplasma generator, and a spectrometer generates an emission spectrum from the light emission. A programmable computer is adapted for determining whether or not the gas sample includes hydrogen, and for quantitating the amount of hydrogen and/or hydrogen isotopes are present in the gas sample.
    Type: Grant
    Filed: February 13, 2008
    Date of Patent: November 23, 2010
    Assignee: Los Alamos National Security, LLC
    Inventors: Yixiang Duan, Quanxi Jia, Wenqing Cao
  • Publication number: 20100277724
    Abstract: The object of the invention is a system (2) for analyzing gases which are at a pressure on the order of a secondary vacuum. The system includes a gas ionisation device (4) that comprises a cathode (14) having conducting walls (12) defining a cylindrical volume (11) and a disc (15) including at least one central through hole (31), an anode (13) placed substantially at the centre of the hole (31), a plasma source, the plasma being generated in the cylindrical volume by the combined action of an electric field E (17) and a magnetic field B (19) orthogonal to the electric field E (17), a system for collecting the light radiation emitted by the plasma, a cylindrical cavity (23) coaxial to the anode (13) having a conductance lower than that of the cylindrical volume (11) and arranged between the ionisation device (5) and the collector system (5), and and an analysis device (6) for the ionised gases including an optical spectrometer (41) for analysing the evolution of the radiating spectrum.
    Type: Application
    Filed: July 22, 2008
    Publication date: November 4, 2010
    Inventors: Julien Bounouar, Smail Hadj-Rabah
  • Publication number: 20100225909
    Abstract: The present invention describes a torch for producing a plasma for a spectrochemical analysis comprising: an alumina ceramic injector, a vitreous material inner tube concentric with the injector, and an annular joint between the injector and the inner tube. The joint fixedly attaches the injector and the inner tube together and comprises of an adhesive compatible with vitreous material and alumina ceramic. A method of manufacturing the torch is also described.
    Type: Application
    Filed: March 6, 2009
    Publication date: September 9, 2010
    Inventors: George Feilders, Arthur Ross, Neil Ernest Davison
  • Patent number: 7782456
    Abstract: An ICP analysis method for solid samples which can secure reliability of the analytical results. The present invention provides an analytical method in which a finely powdered solid sample is directly injected into an inductively coupled plasma-aided emission spectrometer, wherein standard liquid samples of known concentration of objective element are analyzed by the spectrometer to establish a calibration curve for the element; at least one standard sample of finely powdered solid of known concentration is analyzed by the spectrometer to determine a conversion factor by a given procedure; and the result of the finely powdered solid sample is corrected using the conversion factor.
    Type: Grant
    Filed: February 12, 2008
    Date of Patent: August 24, 2010
    Assignee: Tanaka Kikinzoku Kogyo K.K.
    Inventor: Hiroshi Sawai
  • Publication number: 20100201978
    Abstract: To provide a light source which realizes accurate determination of the particle density of a plasma atmosphere without disturbing the state of the plasma atmosphere. The light source of the invention includes a tubular casing 12; a cooling medium passage 30 for causing a cooling medium to flow therethrough, the passage being provided along the inner wall of the casing; a lens 50 provided at a tip end of the casing; a first electrode 44 and a second electrode 45 which are provided in the casing and before the lens so as to be vertical to the axis of the casing and parallel to each other; and an insulating spacer 46 provided between the first electrode and the second electrode.
    Type: Application
    Filed: March 24, 2008
    Publication date: August 12, 2010
    Inventors: Masaru Hori, Hiroyuki Kano, Shoji Den
  • Patent number: 7768639
    Abstract: A method for detecting and correcting inaccurate results in inductively coupled plasma-atomic emission spectrometry (ICP-AES). ICP-AES analysis is performed across a plurality of selected locations in the plasma on an unknown sample, collecting the light intensity at one or more selected wavelengths of one or more sought-for analytes, creating a first dataset. The first dataset is then calibrated with a calibration dataset creating a calibrated first dataset curve. If the calibrated first dataset curve has a variability along the location within the plasma for a selected wavelength, errors are present. Plasma-related errors are then corrected by diluting the unknown sample and performing the same ICP-AES analysis on the diluted unknown sample creating a calibrated second dataset curve (accounting for the dilution) for the one or more sought-for analytes. The cross-over point of the calibrated dataset curves yields the corrected value (free from plasma related errors) for each sought-for analyte.
    Type: Grant
    Filed: September 18, 2008
    Date of Patent: August 3, 2010
    Assignee: The United States of America as represented by the United States Department of Energy
    Inventors: George C. Y. Chan, Gary M. Hieftje
  • Patent number: 7763820
    Abstract: A piece of material that includes low-Z elements is classified based on photonic emissions detected from the piece of material. Both XRF spectroscopy and OES techniques, for example, Laser-Induced Breakdown Spectroscopy (LIBS) and spark discharge spectroscopy, may be used to classify the piece of material. A stream of pieces of material are moved along a conveying system into a stimulation and detection area. Each piece of material, in turn, is stimulated with a first and second stimulus, of a same or different type, causing the piece of material to emit emissions, for example, photons, which may include at least one of x-ray photons (i.e., x-rays) and optical emissions. These emissions then are detected by one or more detectors of a same or different type. The piece of materials is then classified, for example, using a combination of hardware, software and/or firmware, based on the detected emissions, and then sorted.
    Type: Grant
    Filed: November 27, 2007
    Date of Patent: July 27, 2010
    Assignee: Spectramet, LLC
    Inventors: Edward J. Sommer, Jr., David B. Spencer, R. Lynn Conley, Richard E. Hill, Robert H. Parrish, Charles E. Roos
  • Patent number: 7742167
    Abstract: A device for optical emission spectroscopy comprising a chamber comprising an atomization source, at least one boost device configured with a radio frequency source to provide radio frequency energy to the chamber, and an optical detector configured to detect optical emission of species in the chamber is provided. In certain examples, a boost device may be used with a flame or plasma to provide additional energy to a flame or plasma to enhance desolvation, atomization, and/or ionization. In other examples, the boost device may be configured to provide additional energy for excitation of species.
    Type: Grant
    Filed: June 17, 2005
    Date of Patent: June 22, 2010
    Assignee: PerkinElmer Health Sciences, Inc.
    Inventor: Peter Morrisroe
  • Patent number: 7741621
    Abstract: There is disclosed an apparatus and method for focused electric field enhanced plasma-based ion implantation. The apparatus includes an implantation chamber, a vacuum pump for maintaining the pressure in the implantation chamber at a desired level, a sample holder, means for applying a negative potential to the sample holder, and means for supplying a gaseous or vaporized implantation material. The supplying means takes the form of a feed conduit having an exit opening located in the implantation chamber above the sample holder, and when a negative potential is applied to the sample holder the exit opening of the feed conduit is maintained at a potential that is positive relative to the sample holder.
    Type: Grant
    Filed: July 14, 2004
    Date of Patent: June 22, 2010
    Assignee: City University of Hong Kong
    Inventors: Paul K. Chu, Liuhe Li
  • Patent number: 7733482
    Abstract: A system and method for measuring air quality using a micro-optical mechanical gas sensor is disclosed. According to one embodiment of the present invention, the system includes an emission source that includes a conduit gap for receiving a gas; a plurality of electrodes for applying an electric field to at least a portion of the conduit gap, the application of the electric field creating a plasma in the conduit gap; and a detector that detects an emission from the plasma. The emission source and the detector may be micro-optical mechanical devices. A method for measuring air quality is discloses.
    Type: Grant
    Filed: March 26, 2007
    Date of Patent: June 8, 2010
    Inventors: Harry E. Ruda, Carlos Fernandes
  • Patent number: 7732759
    Abstract: Method and system for producing a neutral beam source is described. The neutral beam source comprises a plasma generation system for forming a first plasma in a first plasma region, a plasma heating system for heating electrons from the first plasma region in a second plasma region to form a second plasma, and a neutralizer grid for neutralizing ion species from the second plasma in the second plasma region. Furthermore, the neutral beam source comprises an electron acceleration member configured to accelerate the electrons from the first plasma region into the second plasma region. Further yet, the neutral beam source comprises a pumping system that enables use of the neutral beam source for semiconductor processing applications, such as etching processes.
    Type: Grant
    Filed: May 23, 2008
    Date of Patent: June 8, 2010
    Assignee: Tokyo Electron Limited
    Inventors: Lee Chen, Merritt Funk
  • Patent number: 7710562
    Abstract: An atomic analyzer includes a plasma generator, in which a discharge gas is fed in a micro gap between a pair of electrodes to generate nonequilibrium atmospheric pressure plasma, a bias voltage controller that includes a plasma-leading electrode for leading the nonequilibrium atmospheric pressure plasma generated by the plasma generator to an object to be irradiated, the object to be irradiated with the nonequilibrium atmospheric pressure plasma is placed on the plasma-leading electrode, a bias voltage is applied between the plasma-leading electrode and the electrodes of the plasma generator to irradiate the object with the nonequilibrium atmospheric pressure plasma, and a spectrometer that analyzes atoms spectroscopically from light emitted from atomized generated by atomizing a substance composing the object to be irradiated by the nonequilibrium atmospheric pressure plasma irradiation or from light absorbed by the atomized atoms.
    Type: Grant
    Filed: February 22, 2008
    Date of Patent: May 4, 2010
    Assignee: NU Eco Engineering Co., Ltd.
    Inventors: Masaru Hori, Masafumi Ito
  • Patent number: 7705973
    Abstract: Provided are methods and systems for monitoring a state of a plasma chamber. In the method, an optical characteristic of plasma generated in a plasma chamber including a window is measured in a predetermined measurement wavelength band. A process status index (PSI) is extracted from the measured optical characteristic. A state of the plasma chamber is evaluated by analyzing the extracted PSI. The optical characteristic of the plasma is measured in the predetermined measurement wavelength band in which a transmittance of light passing through the window is substantially independent of a wavelength of the light.
    Type: Grant
    Filed: May 7, 2008
    Date of Patent: April 27, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Keun-Hee Bai, Yong-Jin Kim
  • Patent number: 7701578
    Abstract: A micro-sized gas detecting device with two electrodes separated by a gap of width ranging from 1 to 500 microns, where the detection is based on emission spectroscopy of gases in an electric discharge across the gap (discharge region) as the gas flows through the region. The characteristic light emitted by molecules during the discharge can be detected directly with photodiodes or transferred through optical fiber and detected with remote optical sensing components. The device can have single or multiple discharge regions in an array so that light emitted can be monitored at different wavelengths simultaneously. The device can operate under gaseous pressure ranging from a few milli-Torr to a few atmospheres. The device consumes little power (50 mW-100 mW) and can be powered with an alternating current and has the potential to be battery powered.
    Type: Grant
    Filed: September 10, 2004
    Date of Patent: April 20, 2010
    Inventor: Cyrus M. Herring
  • Patent number: 7670455
    Abstract: The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.
    Type: Grant
    Filed: July 2, 2007
    Date of Patent: March 2, 2010
    Assignee: FEI Company
    Inventors: John Keller, Noel Smith, Roderick Boswell, Lawrence Scipioni, Christine Charles, Orson Sutherland
  • Publication number: 20100022400
    Abstract: The present invention relates in particular to a method for the quantitative measurement of biomolecular targets that have been deposited on a biochip (1) of the type with a matrix of probes hybridized by the targets, the matrix comprising a multitude of measurement points (2) each comprising a plurality of probes, characterized in that it comprises the following steps: a) at least one laser beam (18) is focused onto each measurement point, in order to extract therefrom a hot confined plasma comprising a chemical element to be quantified that is present in the targets and optionally in the probes; b) the light emission lines from the plasma are detected and analysed for each measurement point, by measuring the respective intensities of these lines; and then c) the concentration in each measurement point of the element or of a group incorporating it within the targets is determined via a prior calibration of the lines establishing a correlation between the intensities of the lines specific to the element to be
    Type: Application
    Filed: September 14, 2007
    Publication date: January 28, 2010
    Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE
    Inventors: Nicolas Ugolin, Denis Menut, Julien Le Meur, Pascal Wodling, Sylvie Chevillard
  • Publication number: 20090299668
    Abstract: An advance process control (APC) system for a plasma process machine is provided, which includes at least an optical emission spectroscopy (OES) system and an APC analysis apparatus. The OES system is used for monitoring a testing object in the plasma process machine. The APC analysis apparatus is used for analyzing the data received from the OES system.
    Type: Application
    Filed: August 12, 2009
    Publication date: December 3, 2009
    Applicant: MACRONIX Industrial Co., Ltd.
    Inventors: Tuung Luoh, Sheng-Hui Hsieh, Shing-Ann Luo, Chin-Ta Su, Ta-Hung Yang, Kuang-Chao Chen
  • Patent number: 7599058
    Abstract: Methods for obtaining and analyzing data from a spectral source is provided. The method includes identifying an environment that is capable of generating spectral information, and obtaining the generated spectral information from the environment. The method further includes splitting the generated spectral information into a plurality of spectral data units. The spectral data units are further captured in separate storage entities and separately processed in parallel in order to produce a complete processing and quantification of the environment.
    Type: Grant
    Filed: December 24, 2007
    Date of Patent: October 6, 2009
    Assignee: Lam Research Corporation
    Inventors: David Craven, Ryan Roberts
  • Patent number: 7586100
    Abstract: A method of controlling a plasma doping process using a time-of-flight ion detector includes generating a plasma comprising dopant ions in a plasma chamber proximate to a platen supporting a substrate. The platen is biased with a bias voltage waveform having a negative potential that attracts ions in the plasma to the substrate for plasma doping. A spectrum of ions present in the plasma is measured as a function of ion mass with a time-of-flight ion detector. The total number ions impacting the substrate is measured with a Faraday dosimetry system. An implant profile is determined from the measured spectrum of ions. An integrated dose is determined from the measured total number of ions and the calculated implant profile. At least one plasma doping parameter is modified in response to the calculated integrated dose.
    Type: Grant
    Filed: February 12, 2008
    Date of Patent: September 8, 2009
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Deven M. Raj, Ludovic Godet, Bernard Lindsay, Timothy Miller, George Papasouliotis
  • Patent number: 7580119
    Abstract: The present invention relates to monitoring chemicals in a process chamber using a spectrometer having a plasma generator, based on patterns over time of chemical consumption. The relevant patterns may include a change in consumption, reaching a consumption plateau, absence of consumption, or presence of consumption. In some embodiments, advancing to a next step in forming structures on the workpiece depends on the pattern of consumption meeting a process criteria. In other embodiments, a processing time standard is established, based on analysis of the relevant patterns. Yet other embodiments relate to controlling work on a workpiece, based on analysis of the relevant patterns. The invention may be either a process or a device including logic and resources to carry out a process.
    Type: Grant
    Filed: November 24, 2008
    Date of Patent: August 25, 2009
    Assignee: Lightwind Corporation
    Inventors: Gary B. Powell, Herbert E. Litvak
  • Publication number: 20090201500
    Abstract: A hydrogen sensor for detecting/quantitating hydrogen and hydrogen isotopes includes a sampling line and a microplasma generator that excites hydrogen from a gas sample and produces light emission from excited hydrogen. A power supply provides power to the microplasma generator, and a spectrometer generates an emission spectrum from the light emission. A programmable computer is adapted for determining whether or not the gas sample includes hydrogen, and for quantitating the amount of hydrogen and/or hydrogen isotopes are present in the gas sample.
    Type: Application
    Filed: February 13, 2008
    Publication date: August 13, 2009
    Inventors: Yixiang Duan, Quanxi Jia, Wenqing Cao
  • Patent number: 7554660
    Abstract: A spectroscopy system for spectro-chemical analysis of a sample includes a plasma torch (50) for generating a microwave induced plasma (90) as a spectroscopic source. The plasma forming gas is nitrogen which can contain an oxygen impurity. Thus the system includes a nitrogen generator (70) which is preferably supplied with compressed atmospheric air from a compressor (75) for oxygen to be removed from the air by adsorption. The invention allows the use of an on-site nitrogen gas generator and thus gives cost savings because the need to obtain supplies of bottled high purity gas is eliminated.
    Type: Grant
    Filed: March 31, 2006
    Date of Patent: June 30, 2009
    Assignee: Varian Australia Pty Ltd
    Inventor: Michael Ron Hammer
  • Patent number: 7542140
    Abstract: A detection apparatus includes a sample holding section, an irradiation means, a detection means, a calculation means, and an evaluation means. The irradiation means irradiates a substance held in the sample holding section with a THz wave. The detection unit detects a THz wave that has passed through or been reflected from the substance. The calculation unit determines a frequency dependence of a property of the substance with respect to the irradiated THz wave and then calculates a slope of a straight line or a slope of a straight line obtained by straight-line approximation of the frequency dependence of the property of the substance. The evaluation unit evaluates the state change of the substance by comparing a previously-obtained slope of a straight line of the frequency dependence of the property of the substance in a standard state and the slope of the straight line of the substance calculated.
    Type: Grant
    Filed: November 30, 2007
    Date of Patent: June 2, 2009
    Assignees: Canon Kabushiki Kaisha, Riken
    Inventors: Toshihiko Ouchi, Shintaro Kasai, Haruko Yoneyama, Masatsugu Yamashita
  • Patent number: 7532322
    Abstract: An apparatus for measuring plasma electron density precisely measures electron density in plasma even under a low electron density condition or high pressure condition. This plasma electron density measuring apparatus includes a vector network analyzer in a measuring unit, which measures a complex reflection coefficient and determines a frequency characteristic of an imaginary part of the coefficient. A resonance frequency at a point where the imaginary part of the complex reflection coefficient is zero-crossed is read and the electron density is calculated based on the resonance frequency by a measurement control unit.
    Type: Grant
    Filed: December 4, 2006
    Date of Patent: May 12, 2009
    Assignee: Tokyo Electron Limited
    Inventors: Chishio Koshimizu, Tatsuo Matsudo, Sumie Segawa
  • Patent number: 7511246
    Abstract: A device for sustaining a plasma in a torch is provided. In certain examples, the device comprises a first electrode configured to couple to a power source and constructed and arranged to provide a loop current along a radial plane of the torch. In some examples, the radial plane of the torch is substantially perpendicular to a longitudinal axis of the torch.
    Type: Grant
    Filed: September 2, 2005
    Date of Patent: March 31, 2009
    Assignee: Perkinelmer Las Inc.
    Inventor: Peter J. Morrisroe
  • Publication number: 20090068768
    Abstract: A non-destructive and simple analytical method is provided which allows in situ monitoring of plasma damage during the plasma processing such as resist stripping. If a low-k film is damaged during plasma processing, one of the reaction products is water, which is remained adsorbed onto the low-k film (into pores), if the temperature is lower than 100-150 C. A plasma (e.g. He) that emits high energy EUV photons (E>20 eV) which is able to destruct water molecules forming electronically excited oxygen atoms is used to detect the adsorbed water. The excited oxygen is detected from optical emission at 777 nm. Therefore, the higher the adsorbed water concentration (higher damage), a more intensive (oxygen) signal is detected. Therefore, intensity of oxygen signal is a measure of plasma damage in the previous strip step.
    Type: Application
    Filed: September 4, 2008
    Publication date: March 12, 2009
    Applicants: Interuniversitair Microelektronica Centrum vzw (IMEC), Katholieke Universiteit Leuven, K.U. LEUVEN R&D
    Inventors: Adam Michal Urbanowicz, Mikhail Baklanov
  • Publication number: 20090059221
    Abstract: A spectroscopy system for spectro-chemical analysis of a sample includes a plasma torch (50) for generating a microwave induced plasma (90) as a spectroscopic source. The plasma forming gas is nitrogen which can contain an oxygen impurity. Thus the system includes a nitrogen generator (70) which is preferably supplied with compressed atmospheric air from a compressor (75) for oxygen to be removed from the air by adsorption. The invention allows the use of an on-site nitrogen gas generator and thus gives cost savings because the need to obtain supplies of bottled high purity gas is eliminated.
    Type: Application
    Filed: March 31, 2006
    Publication date: March 5, 2009
    Inventor: Michael Ron Hammer
  • Patent number: 7460225
    Abstract: Low-power, low flow-rate, portable, miniaturized plasma devices are provided. A portable, low-power, low flow-rate, miniaturized sample introduction device is also provided. The devices are inexpensive to make, have low operating cost and can be used with a variety of gases and gas mixtures. The devices can be used for elemental analysis from liquid or solid micro-samples by optical emission or mass spectrometry provided that an appropriate sample introduction system is used.
    Type: Grant
    Filed: March 7, 2005
    Date of Patent: December 2, 2008
    Inventor: Vassili Karanassios
  • Patent number: 7456939
    Abstract: The present invention relates to monitoring chemicals in a process chamber using a spectrometer having a plasma generator, based on patterns over time of chemical consumption. The relevant patterns may include a change in consumption, reaching a consumption plateau, absence of consumption, or presence of consumption. In some embodiments, advancing to a next step in forming structures on the workpiece depends on the pattern of consumption meeting a process criteria. In other embodiments, a processing time standard is established, based on analysis of the relevant patterns. Yet other embodiments relate to controlling work on a workpiece, based on analysis of the relevant patterns. The invention may be either a process or a device including logic and resources to carry out a process.
    Type: Grant
    Filed: June 30, 2006
    Date of Patent: November 25, 2008
    Assignee: Lightwind Corporation
    Inventors: Gary B. Powell, Herbert E. Litvak
  • Patent number: 7453566
    Abstract: Hybrid plasma monitor. A ground electrode is spaced apart from a high voltage electrode supporting an electric discharge therebetween to generate a plasma. The ground electrode and the high voltage electrode form an annular region into which a sample is introduced for generating a plasma. Microwave radiation couples into the plasma to sustain the plasma. A light detector such as a spectrometer receives light resulting from atomic emissions from the sample to analyze elements in the sample.
    Type: Grant
    Filed: August 31, 2006
    Date of Patent: November 18, 2008
    Assignee: Massachusetts Institute of Technology
    Inventors: Kamal Hadidi, Paul Woskov
  • Patent number: 7440097
    Abstract: An in-situ laser plasma spectroscopy (LPS) system for automated near real-time elemental depth profiling of a target including: an optical source configured to generate an optical beam, wherein the optical beam is pulsed; an optical probe system configured to deliver the optical beam from the optical source to a surface of a target to generate an ablation plasma; a time resolved spectral detection system configured to generate time resolved spectral data from emission signals from the ablation plasma; and a data acquisition and processing system configured to acquire the time resolved spectral data to determine, in combination with predetermined calibration data, an absolute elemental concentration as a function of depth in near real-time.
    Type: Grant
    Filed: June 27, 2006
    Date of Patent: October 21, 2008
    Assignee: General Electric Company
    Inventors: Pamela King Benicewicz, Pavel Alexeyevich Fomitchov, Elena Rozier, John Ruediger Mader Viertl, Tymm Bradner Schumaker
  • Publication number: 20080239309
    Abstract: A system and method for measuring air quality using a micro-optical mechanical gas sensor is disclosed. According to one embodiment of the present invention, the system includes an emission source that includes a conduit gap for receiving a gas; a plurality of electrodes for applying an electric field to at least a portion of the conduit gap, the application of the electric field creating a plasma in the conduit gap; and a detector that detects an emission from the plasma. The emission source and the detector may be micro-optical mechanical devices. A method for measuring air quality is discloses.
    Type: Application
    Filed: March 26, 2007
    Publication date: October 2, 2008
    Inventors: Harry E. Ruda, Carlos Fernandes
  • Publication number: 20080222881
    Abstract: A method of producing an active material for a lithium secondary battery, by which impurities causing problems in synthesizing an active material for a lithium secondary battery, including a lithium transition metal oxyanion compound are removed efficiently and enhancement of an energy density is realized, is provided. By cleaning the active material for a lithium secondary battery, including a lithium transition metal oxyanion compound, with a pH buffer solution, for example, it is possible to efficiently remove just only impurities such as Li3PO4 or Li2CO3, or a substance, other than LiFePO4, in which the valence of Fe is bivalent such as FeSO4, FeO or Fe3(PO4)2 without dissolving Fe of LiFePO4.
    Type: Application
    Filed: February 27, 2008
    Publication date: September 18, 2008
    Inventors: Denis Yau Wai Yu, Kazunori Donoue, Toshikazu Yoshida, Tetsuo Kadohata, Tetsuyuki Murata, Shigeki Matsuta
  • Patent number: 7417730
    Abstract: An apparatus and method for monitoring diabetes through breath acetone detection and quantitation employs a microplasma source in combination with a spectrometer. The microplasma source provides sufficient energy to produce excited acetone fragments from the breath gas that emit light. The emitted light is sent to the spectrometer, which generates an emission spectrum that is used to detect and quantify acetone in the breath gas.
    Type: Grant
    Filed: March 31, 2006
    Date of Patent: August 26, 2008
    Assignee: Los Alamos National Security, LLC
    Inventors: Yixiang Duan, Wenqing Cao
  • Patent number: 7403283
    Abstract: A method and apparatus for detecting minority gaseous species in a mixture by light-emission spectroscopy by means of an optical spectrometer (8), in which the radiation emitted by a plasma (4) present in the gas mixture for analysis is used and, in the spectrum of the radiation, lines are identified of a majority gaseous species that present amplitudes that are sensitive to the presence of a minority species, and information about the concentration of a minority gaseous species is deduced from the amplitude(s) of the sensitive line(s). This makes it possible to monitor minority gaseous species in real time.
    Type: Grant
    Filed: February 24, 2005
    Date of Patent: July 22, 2008
    Assignee: Alcatel
    Inventors: Gloria Sogan, Julien Bounouar, Jean-Pierre Desbiolles, Isabelle Gaurand
  • Patent number: 7397560
    Abstract: A contamination detector in accordance with one embodiment of the invention includes a plasma generation system operable to direct an atmospheric plasma discharge towards a surface. The contamination detector further includes a light capture system to capture light generated by interaction of the atmospheric plasma discharge with the surface. The light capture system guides the captured light to an optical detection system configured to detect a contaminant.
    Type: Grant
    Filed: April 4, 2006
    Date of Patent: July 8, 2008
    Assignee: Agilent Technologies, Inc.
    Inventors: Karen L. Seaward, David T. Dutton
  • Patent number: 7372563
    Abstract: The invention relates to a method and a device for carrying out emission spectroscopy, in particular laser emission spectroscopy. According to said method, a pulsed laser beam is automatically focussed on a workpiece to generate a laser-induced plasma, the radiation emitted from the plasma is detected and an elemental analysis is performed using the captured radiation spectrum. The invention is characterised in that a laser beam impingement is carried out with a variable pulse interval ?T, that prior to the plasma generation, additional geometric parameters P1, P2 . . . PN of a potential measurement location on the workpiece surface, in addition to the distance d of the autofocus lens from said workpiece surface are determined and in that an elemental analysis is only performed for the potential measurement locations, at which at least one of the additional geometric parameters lies within a predefined tolerance range [T1 . . . T2].
    Type: Grant
    Filed: June 25, 2003
    Date of Patent: May 13, 2008
    Assignee: Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E.V.
    Inventors: Michael Stepputat, Reinhard Noll
  • Publication number: 20080055594
    Abstract: Hybrid plasma monitor. A ground electrode is spaced apart from a high voltage electrode supporting an electric discharge therebetween to generate a plasma. The ground electrode and the high voltage electrode form an annular region into which a sample is introduced for generating a plasma. Microwave radiation couples into the plasma to sustain the plasma. A light detector such as a spectrometer receives light resulting from atomic emissions from the sample to analyze elements in the sample.
    Type: Application
    Filed: August 31, 2006
    Publication date: March 6, 2008
    Inventors: Kamal Hadidi, Paul Woskov
  • Patent number: 7319316
    Abstract: A probe apparatus configured to measure a set of electrical characteristics in a plasma processing chamber, the plasma processing chamber including a set of plasma chamber surfaces configured to be exposed to a plasma is disclosed. The probe apparatus includes a collection disk structure configured to be exposed to the plasma, whereby the collection disk structure is coplanar with at least one of the set of plasma chamber surfaces. The probe apparatus also includes a conductive path configured to transmit the set of electrical characteristics from the collection disk structure to a set of transducers, wherein the set of electrical characteristics is generated by an ion flux of the plasma. The probe apparatus further includes an insulation barrier configured to substantially electrically separate the collection disk and the conductive path from the set of plasma chamber surfaces.
    Type: Grant
    Filed: June 29, 2005
    Date of Patent: January 15, 2008
    Assignee: Lam Research Corporation
    Inventors: Christopher Kimball, Eric Hudson, Douglas Keil, Alexei Marakhtanov
  • Patent number: 7317186
    Abstract: An apparatus and method for providing direct liquid sample introduction using a nebulizer are provided. The apparatus and method include a short torch having an inner tube and an outer tube, and an elongated adapter having a cavity for receiving the nebulizer and positioning a nozzle tip of the nebulizer a predetermined distance from a tip of the outer tube of the short torch. The predetermined distance is preferably about 2-5 mm.
    Type: Grant
    Filed: December 22, 2004
    Date of Patent: January 8, 2008
    Assignee: The George Washington University
    Inventors: Akbar Montaser, Craig S. Westphal, Kaveh Kahen, William F. Rutkowski