Abstract: The present invention relates to a procedure and a device for forming a plasma. The plasma generated can be used e.g. to examine the concentrations of elements contained e.g. in different gases, such as flue gases. The spark discharge and magnetic field used to form and maintain the plasma are produced by means of the same capacitor-coil resonator circuit. The device of the invention allows a very stable and controlled plasma to be achieved.

Abstract: When processing using a plasma is performed for an object to be processed, a photodetecting unit sequentially detects emission of two active species having specific wavelengths in a designated period during the processing. On the basis of the emission detection information of the two active species, two approximate expressions of linear functions are obtained in the relationship between the emission intensity and time. The ratio of the two approximate expressions of linear functions and the derivative of the ratio are obtained to form a graph in which the ratio is plotted on the abscissa, the derivative of the ratio is plotted on the ordinate, and the intersection between the average value of the ratio and the average value of the derivative of the ratio is the origin. The ratio and the derivative of the ratio are obtained by using the emission detection information of the two active species during the processing after the designated period.

Abstract: In a mounting apparatus for an induction coupled plasma generator, a housing assembly has a receptacle with a central opening aligned over a housing wall opening, electrical contact rings in the receptacle, and a gas block with a central aperture aligned with the openings. An outer passage in the gas block receives a plasma forming gas and extends to the central aperture. A mounting assembly has a mounting member with an annular contact ring, a second gas block, and a gas tube and a sample tube extending from the second gas block. The second gas block has an inner passage extending into the gas tube. The mounting assembly removably engages to the housing assembly, with the mounting member on the receptacle, the second gas block in the first gas block, and the rings in contact. The tubes extend to a load coil for the plasma, and the passages align to convey the plasma forming gas into the gas tube.

Abstract: The apparatus for analyzing a sample gas includes a source of microwave energy directed onto the sample gas to create a plasma. A spectrometer is arranged to receive light from the plasma to identify different elements and/or to determine the concentration of at least one element in the sample gas. In one embodiment, an attached calibration system is provided for calibrating the output of the spectrometer. The calibration system includes a nebulizer apparatus for introducing a controlled amount of at least one element into the sample gas. The apparatus also includes structure adapted to add a swirl component to the plasma gas flow as an aid to plasma confinement. It is also preferred that a pair of electrodes contacting the sample gas be provided for igniting the plasma.

Abstract: An instrument for analyzing a sample has an enclosure that forms a chamber containing an anode which divides the chamber into a discharge region and an analysis region. A gas inlet and outlet are provided to introduce and exhaust a rare gas into the discharge region. A cathode within the discharge region has a plurality of pins projecting in a geometric pattern toward the anode for exciting the gas and producing a plasma discharge between the cathode and the anode. Low energy electrons (e.g. <0.5 eV) pass into the analysis region through an aperture. The sample to be analyzed is placed into the analysis region and bombarded by the metastable rare gas atoms and the low energy electrons extracted into from the discharge region. A mass or optical spectrometer can be coupled to a port of the analysis region to analyze the resulting ions and light emission.

Abstract: A system for sampling and analyzing a material located at a hazardous site. A laser located remote from the hazardous site is connected to an optical fiber, which directs laser radiation proximate the material at the hazardous site. The laser radiation abates a sample of the material. An inductively coupled plasma is located remotely from the material. An aerosol transport system carries the ablated particles to a plasma, where they are dissociated, atomized and excited to provide characteristic optical reduction of the elemental constituents of the sample. An optical spectrometer is located remotely from the site. A second optical fiber is connected to the optical spectrometer at one end and the plasma source at the other end to carry the optical radiation from the plasma source to the spectrometer.

Abstract: The invention relates to a method of selecting low-pressure mercury discharge lamps each provided with a discharge vessel which supports a luminescent layer on an inner surface, by which method the luminescent layer is excited and the low-pressure mercury discharge lamps are selected in dependence on the emission spectrum of the light radiated by the luminescent layer. The invention also relates to a device for selecting low-pressure mercury discharge lamps which are each provided with a discharge vessel supporting a luminescent layer on an inner surface, which device is provided with an excitation source for exciting the luminescent layers of the low-pressure mercury discharge lamps to be selected and with detection means for detecting the light radiated by the low-pressure mercury discharge lamps to be selected.

Abstract: An inductively coupled plasma spectrometer including shielding/sampling means (1) located between a plasma torch (3) and an optical system (4) of the spectrometer, wherein said shielding/sampling (1) means is associated with an enclosure (9) for the plasma torch such that a relatively high independance path (10, 11) is established for limiting flow of electrical current between said shielding/sampling means (1) and said enclosure (9).

Abstract: A gas emission spectrometer and method for analyzing a continuously flowing gas stream using gas emission spectroscopy to measure low concentration levels of one or more gas/vapor impurities in the gas stream. Alternating power is applied to an electric discharge source to generate emissive radiation which is filtered into an optical signal at the emission wavelength of a preselected impurity gas. The optical signal is converted into an electrical signal which is selectively amplified within a narrow frequency range centered at substantially twice the excitation frequency of the alternating power source. The impurity concentration is measured from the amplified signal upon rectification.

Abstract: A method and portable apparatus for self-powered, sensitive analysis of solid, liquid or gas samples for the presence of elements is provided. The apparatus includes a compact sensor system which utilizes a microwave power source and a shorted waveguide to induce a plasma. The microwave power source may be a magnetron or the like. The device includes a portable power supply and preferably includes a portable battery charger. The portable power supply includes a compact generator- internal combustion engine unit. The device can be operated by directly using power from the portable power supply or in a more compact embodiment by using power from batteries that are recharged by a separate portable power supply module. Pulsed microwave operation can be used to reduce average power requirements and facilitate the use of very compact units using batteries. The device is capable of being transported to and from remote sites for analysis by an individual without the need for heavy transportation equipment.

Abstract: A housing provides temperature monitoring and temperature control of a specimen, while the specimen is being exposed to plasma environments for in-situ reactivity studies or other plasma processing purposes. The housing is adaptable for use with a temperature controller and a pressure measurement device. The housing includes a temperature monitoring mechanism and temperature control connections. The temperature monitoring mechanism provides in-situ specimen temperature indications. It includes a first enclosure having a specimen supporting portion on an exterior surface thereof. A fluid conduit has a first end in fluid communication with an interior portion of the first closure. A second enclosure has an interior portion thereof in fluid communication with a second end of the fluid conduit. The second enclosure includes the ability for attachment to a pressure measurement device.

Abstract: In an elemental analysis method of analyzing a sample as an analysis target using atoms generated upon dissociation of the sample, a plasma is generated using a gas serving as a plasma source to be supplied in a torch having a conical cylinder thereof. A sample flow obtained by evaporating the sample using the gas as a carrier gas or a sample flow containing a component of the sample is supplied to the plasma. The sample flow or the plasma containing the sample flow is changed into a spiral flow, and the component of the sample is dissociated. The sample is analyzed in accordance with the state of an atom generated by dissociation of the component of the sample. An elemental analysis apparatus is also disclosed.

Abstract: An arrangement for optically tracking moving objects and for measuring trajectories of the moving objects using triangulation. The arrangement includes a pair of measuring locations including a first measuring location and a second measuring location disposed at a distance with respect to the first measuring location. The arrangement further includes a plurality of pairs of theodolites for simultaneously tracking and measuring the trajectories of the moving objects, each pair of theodolites being effective for tracking and measuring a trajectory of a corresponding moving object and further having a first theodolite and a second theodolite. First theodolites of each pair of theodolites together form a first set of theodolites disposed on a common azimuthal axis at the first measuring location; and second theodolites of each pair of theodolites together form a second set of theodolites disposed on a common azimuthal axis at the second measuring location.

Abstract: A scanning optical rangefinder including an optical scanner and a light source. The optical scanner includes a rotating scan disc with a circular array of concave reflectors thereon. Mirrors are provided for directing light from the light source towards the concave reflectors on the rotating scan disc and then to direct light from the concave reflectors on the scan disc towards a target. Light received from the target is directed towards the concave reflectors on the scan disc by mirrors along a plurality of channels. A detector adapted to receive light reflected from the concave reflectors is provided for each channel, along with error correction for parallax data from the detector. The light is directed towards the target along a channel laterally displaced from a channel for light received from the target.

Abstract: The invention pertains to a process and a device for determining the composition and concentration of elements in material samples using laser-based plasma emission spectroscopy. The process comprises the following steps: a) transformation of a portion of the material sample (20) to be analysed to a plasma-like state (46) by means of a pulsed high-power laser (12) focussed on the material sample (20); b) spectral analysis of the radiation emitted by the plasma (46) using a spectrometer (26); c) measurement of the total emission spectrum (44) of the plasma (46) changing per laser pulse in one or more spectral ranges typical of the element, using a detector (40); and d) calculation of the composition and concentration of the elements based on the entire spectrum (44) of measured emissions, i.e. the sum of a number of measured individual spectra (42). The claimed device (10) comprises a high-power laser (12), a spectrometer (26) and at least one measuring head (14) with integrated radiation optics (22).

Abstract: A method for detecting a cause of an abnormal portion present on a surface of a steel product, which comprises the steps of: condensing a pulsed laser beam, irradiating the pulsed laser beam thus condensed onto an abnormal portion present on a surface of a steel product and a vicinity thereof, limiting pulse energy density of the pulsed laser beam at an irradiation point of the pulsed laser beam on the surface of the steel product within a range of from 10 kW/mm.sup.2 to 100 MW/mm.sup.

Abstract: In an analyzer in which plasma is generated, a sample is supplied to the plasma though an aerosol guide tube and analyzed by a quadrapole mass filter, the top end portion of the aerosol guide tube is made of sapphire.

Abstract: An observing apparatus by which a plurality of observers are able to easily find out the same target object includes first and second telescopes. The first telescope has an arithmetic control unit for generating positional data for indicating a position of the first telescope with respect to the observation target object when the observation target object is observed through the first telescope and a transmitter for transmitting the generated positional data to the second telescope. The second telescope has a receiver for receiving the positional data transmitted by the first telescope and a direction indicator for indicating an observation direction of the second telescope in which the observation target object should be observed through the second telescope on the basis of the positional data received by the receiver.

Abstract: A distance measuring apparatus of an apparatus having a moving mechanism includes: a speed detector; and a mechanism responsive to a moving speed signal supplied from the speed detector which varies a focus lens position and a focal length of a light receiving optical system, a scanning range of a light projecting optical system, a base length, a position where light axes of a pair of light receiving optical systems or light axes of the light receiving and light projecting optical systems cross with each other, or responsive to a moving direction signal supplied from a moving direction detecting means of the apparatus having the moving mechanism which changes a measurement direction of a field of view. Thus, optimal measurement accuracy and a field of view to be measured can always be provided even though the moving speed or the moving direction of the apparatus having the moving mechanism is varied.

Abstract: An apparatus used for detecting the endpoint or described completion point of an etching process has a detection window, an optical cable, and a bracket for fixedly holding the detection window and the optical cable with respect to each other. The detection window protrudes outwardly from a wall of a reaction chamber. The optical cable transmits light generated during an etching process from the detection window to a detecting device separate from the detection chamber. The bracket is attached to the wall of the reaction chamber so as to configure a space between the bracket and the detection window. The configuration reduces the intensity of the electric field formed between the bracket and plasma in the reaction chamber.

Abstract: The invention relates to a device for emission spectrum analysis with an analysis plasma containing the analysis sample and a spectrometer suitable for emission measurements, in which there is a plasma manipulator (4) with a cooled diaphragm (8) concentric with the axis (7) and perpendicular to the direction of expansion of the plasma with a free diameter smaller than that of the plasma which allows only the central part (6) or only the optical part of the analysis plasma to pass and masks off the remaining region, and an observation device (3) for the radiation emission of the volume of plasma allowed through.

Abstract: Disclosed herein is a method of detecting an end point of plasma process performed on an object, and a plasma process apparatus. The method includes the steps of detecting an emission spectrum over a wavelength region specific to C.sub.2 in the plasma, by optical detecting means, and determining the end point of the plasma process from the emission intensity of the emission spectrum detected by the optical detector. The apparatus has a process chamber, a pair of electrodes, a light-collecting device, an optical detector, and a determining device. The chamber has a monitor window. The electrodes are located in the process chamber. The first electrode is used to support the object. A high-frequency power is supplied between the electrodes to change a process gas into plasma. The light-collecting device collects the light from the plasma through the monitor window. The optical detector detects an emission spectrum from the light collected.

Abstract: A photogrammetric camera, in particular for photogrammetric measurements of technical objects, has a primary lens system (10) designed as a focussable objective and a combination of at least one high-resolution sensor (12, 14, 16) and a lens unit (18, 20, 22) which acts as a secondary lens system for producing an enlarged section of the focal plane of the primary objective on the high-resolution sensor. The secondary objective and the high-resolution sensor are movable across the optical axis (26) of the primary objective. High-resolution distance measurement devices (28, 30) which detect the distance between the projection center of the secondary objective and a reference point of the high-resolution sensor on the one hand and the optical axis of the primary objective on the other hand are associated to the secondary objective and to the high-resolution sensor.

Abstract: An in-torch vaporization sample introduction system for introducing a sample to be analyzed into a spectrometer, comprising a sample holder means for carrying the sample to be analyzed, a modified Fassel-type torch having a plasma fed by inert gas through outer and intermediate feed channels in an enlarged gas tube, an inner axial tube having one end open adjacent the plasma and an opposite end open for receiving the sample holder for feeding the sample to the plasma, the inner axial tube tapering to a reduced diameter adjacent the one end to form a well defined channel for feeding the sample to the plasma. The sample holder is positioned in the inner axial tube a predetermined distance below the plasma, and the opposite end of the inner axial tube is sealed for vaporizing the sample.

Abstract: The etch rate in a plasma etching system has been monitored in-situ by using optical emission spectroscopy to measure the intensities of two or more peaks in the radiation spectrum and then using the ratio of two such peaks as a direct measure of etch rate. Examples of such peaks occur at 338.5 and 443.7 nm and at 440.6 and 437.6 nm for the fluoride/SOG system. Alternately, the intensities of at least four such peaks may be measured and the product of two ratios may be used. Examples of peaks used in this manner occurred at 440.5, 497.2 and 502.3 nm, also for the fluoride/SOG system. The method is believed to be general and not limited to fluoride/SOG.

Abstract: A torch for Inductively Coupled Plasma Spectrometry (ICPS) is formed from quartz and has inner and outer tubes defining an annular channel. The end of the inner tube is within an end portion of the outer tube, to define a chamber for a plasma ball. An inlet for a main gas flow opens tangentially into the annular channel. The annular channel is configured so as to maximize the swirl component of this flow. To this end, a connection to the inlet is provided with an annular toroidal shape, having a cross-section to or larger than the inlet. Further, the inlet is mounted relatively close to the end of the inner tube, so as to minimise decay of the swirl component as the gas flows along the annular channel, the length of the annular channel being sufficient to ensure that the flow leaving the annular channel is uniform and has a uniform swirl component.

Abstract: The plasma dry cleaning rate of semiconductor process chamber walls can be improved by placing a non-gaseous dry cleaning enhancement material in the position which was occupied by the workpiece during semiconductor processing. The non-gaseous dry cleaning enhancement material is either capable generating dry cleaning reactive species and/or of reducing the consumption of the dry cleaning reactive species generated from the plasma gas feed to the process chamber.When process chamber non-volatile contaminant deposits are removed from plasma process chamber surfaces during plasma dry cleaning by placing a non-gaseous source of reactive-species-generating material within the plasma process chamber, the non-gaseous source of reactive-species-generating material need not be located upon or adjacent the workpiece support platform: however, this location provides excellent cleaning results in typical process chamber designs.

Abstract: Microwave-induced plasma for continuous, real time trace element monitoring under harsh and variable conditions. The sensor includes a source of high power microwave energy and a shorted waveguide made of a microwave conductive, high temperature capability refractory material communicating with the source of the microwave energy to generate a plasma. The high power waveguide is constructed to be robust in a hot, hostile environment. It includes an aperture for the passage of gases to be analyzed and a spectrometer is connected to receive light from the plasma. Provision is made for real time in situ calibration. The spectrometer disperses the light, which is then analyzed by a computer. The sensor is capable of making continuous, real time quantitative measurements of desired elements, such as the heavy metals lead and mercury. The invention may be incorporated into a high temperature process device and implemented in situ for example, such as with a DC graphite electrode plasma arc furnace.

Abstract: A method of monitoring the status of plasma in a chamber using real-time spectral data while conducting an etch process during the course of manufacturing of semiconductor wafers. Spectral data is collected during etching, with the spectral data characterizing an emission of light from etch species contained in the plasma, and maintaining the collected data as reference data. A model of principal components of the data is generated. Additional spectral data is extracted from the plasma and compared with the model. Discrepancies pinpoint the presence of foreign material faults and help determine the cause of the failures to ensure appropriate corrective action.

Abstract: An apparatus and method for mapping characteristics of a volume of plasma in a plasma reaction chamber uses a photosensitive detector, a scanner that scans the volume, and a light directing element that directs light emissions from the volume scanned by the scanner to the photosensitive detector. The photosensitive detector generates a signal corresponding to a detected amount of the light emissions from the volume and the signal is processed to estimate one or more characteristics of the volume.

Abstract: A sample liquid containing particles are caused to flow through a transparent flow cell. An image capturing device is used to capture different images for a single particle existing in an image capturing area of the flow cell. The image capturing device further preferably captures different images of the single particle from different directions. Further, the image capturing device can capture different images at different focal positions. The different images can include fluorescence images and chemiluminescence images.

Abstract: A dual-axis plasma imaging system for use in spectroscopic analysis of material. The system includes a plasma torch having a tubular member with an upstream inlet end for receiving a flow of material to be analyzed and a downstream end for discharge of the material. An induction coil is provided for effecting plasma optical emission from the material, and a spectrometer for analyzing the emission. A first optical imaging device collects and focuses an axial emission component onto a primary aperture of the spectrometer. The first device is in a principal optical path between the tubular member and the spectrometer. A second optical imaging device in a secondary optical path collects and focuses a radial emission component onto the primary aperture of the spectrometer. The secondary path is angularly offset from the principal path. A folding mirror in the principal optical path, when in a stowed position, permits the first device to collect and focus the axial emission component onto the primary aperture.

Abstract: A method for detecting an etching endpoint and a plasma etching apparatus and a plasma etching system using such a device are disclosed, in which time series data of a signal corresponding to the amount of light of the plasma light generated during the plasma etching process are arithmetically processed, so that the change of light amount is corrected and an etching endpoint is detected from the time series data after the correction.

Abstract: The present invention relates to a method for measuring radical species distribution in plasma by determining the intensity of the light emitted from the radical species and plasma parameters in plasma with the aid of optical and electrostatic probes, and an apparatus for measuring the radical species distribution. The method of the invention comprises the steps of: (i) measuring integral light intensity in a vacuum container by an optical probe inserted to the vacuum container; (ii) determining light intensity at each point of the vacuum container by differentiating the integral light intensity; (iii) measuring current and voltage applied to the electrostatic probe in the vacuum container; (iv) determining plasma parameters from the measured current and voltage; and, (v) measuring distribution of radical species from the light intensity and plasma parameters.

Abstract: A range imaging sensor for classifying and determining the position and orientation of remote objects combines a high resolution three-dimensional range imaging camera with a conventionally configured data processor. Three-dimensional object geometry sensed by the camera is compared with a plurality of three-dimensional models stored in a memory of the data processor. The spacial relationship between iteratively selected models and the sensed object is evaluated for varying positions and orientations of the model, and an optimum object classification and object position/orientation are detected and transmitted as an output signal.

Abstract: A portable apparatus for continuous real-time measurement of airborne met, comprising an isokinetic sampler, a sample line, a sampling interface device, a pump, and an inductively coupled plasma atomic emission spectrometry (ICP-AES). A method for measurement of airborne metals by use of such an apparatus is also described, in which the sampling interface device accommodates the high, continuous sample collection flow-rates necessary for isokinetic sampling while at the same time permits sample air to be introduced into the plasma at preferred moderate flow-rates. A method for field standardization of the ICP-AES is also described whereby a relationship between aqueous solutions of metals and their aerosol counterparts is established, thus later allowing the field use of the aqueous metal solutions to simulate a particular range of airborne metal concentrations.

Abstract: A spectroscopic apparatus applicable to both ICP (inductively coupled plasma) emission spectroscopy and atomic absorption spectrometry is provided. The spectroscopic apparatus includes a sample unit on which a plasma torch for ICP emission spectroscopy and a heating tube for atomic absorption spectrometry are mounted. A control unit shifts the sample unit to place a plasma flame that is on an end of the plasma torch in front of the light inlet of a spectroscopic unit when the apparatus is operating in the ICP emission spectroscopic mode and to place a central axis of the heating tube in front of the light inlet when the apparatus is operating in the atomic absorption spectrometric mode. The control unit also shifts the apparatus to a two stage spectral mode for ICP emission spectroscopy and to a one stage spectral mode for atomic absorption spectrometry.

Abstract: A new method is described that allows determination of the degree of molecular dissociation based on continuous, radio frequency (rf) and microwave driven discharges based on electrostatic probe and emission spectroscopy measurements only. Using this method costly laser-induced fluorescence spectroscopy (LIF) can be avoided. The method described is particularly applicable to hydrogen plasmas characterized by non-thermal electron energy distribution functions which are of great practical importance. A compact combined fiber optic/electrostatic probe facilitating the required measurements is described.

Abstract: The invention relates to a measuring sensor for the spectroscopic analysis of gas mixtures by means of a silent electrical discharge. A measuring sensor (1) includes a chamber (4), provided with a wall (16) made of a dielectric material, flow connections (5, 6) in this wall for carrying therethrough a gas mixture to be analyzed into (G.sub.1) and out of (G.sub.2) the chamber at a pressure (P) equal to that of ambient air, electrodes (2, 3) on the opposite sides of the chamber with a high alternating voltage (U) applied therebetween, and at least one window (8) in this wall, which is transmissive to wavelengths to be measured. In addition, the sensor includes a light detector element (12) for measuring the intensity of a radiation coming through the window. Said high alternating voltage (U) has a frequency which is at least in the order of 10 kHz for generating in a gas mixture (G) a radiation emission based on the non-ionizing excitation of molecules and/or atoms.

Abstract: A compact atomic absorption analyzer includes a xenon flashlamp, processing circuits, optics, electronic heating apparatus and a photomultiplier. A sample to be tested is heated using electronic (radio frequency) heating apparatus within the optics to subject the sample to thermal energy sufficient to excite the element of the sample to a level at which it will radiate its characteristic line-emission spectra. A high intensity background light having an ultraviolet component is generated by the xenon flashlamp within the optics and this spectral distribution of this light is received by the photomultiplier. The output of the photomultiplier is processed by the processing electronics, with the results of the test displayed, stored and/or downloaded to an external computer or printer.

Abstract: This invention provides an end point detection method including the steps of sequentially detecting, when a process using a plasma is performed for an object to be processed, emission spectra in a specific wavelength band of an active species in the plasma by using a photodetector, calculating sum average values of emission intensities of the emission spectra, calculating the ratio or the difference between the sum average values to obtain a calculated value, and determining a point at which the calculated value exceeds a predetermined reference value as an end point of the process.

Abstract: A range finding device and method for determining the distance between a merged submarine and a target above the surface having a first and second periscopes mounted on a submarine with a known separation. These periscopes are rotatable and extensible above the surface and can determine the bearing from each of the periscopes to the target. A computer receives the bearings from the first and second periscopes and uses the bearings with the known preset distance between the periscopes to calculate the distance between the submarine and the target.

Abstract: A method for analyzing steel which comprises: grinding an analysis area of a steel ingot; sealing the analysis area with a sealing section of a cell for generating fine particles; again grinding the analysis area, while an argon gas is introduced into the cell; irradiating a pulsed laser beam of 10.sup.8 W/cm.sup.2 or more onto the analysis area at an irradiating spot of at least 1 mm.sup.2 to generate the fine particles; moving the irradiating spot; and transferring the generated fine particles by the argon gas to a plasma emission analysis for analysis. A further method for analyzing steel comprises: solidifying a molten steel sample, forming a red-hot sample; putting the sample into a sample holding section of a sample chamber under a purified argon gas atmosphere, the sample holding section having an inner curved surface the same as a curved surface of the sample; irradiating a pulsed laser onto the sample to remove a sample surface layer of 25 .mu.

Abstract: The invention provides a nebulizer and spray chamber (3) for producing an aerosol (7) suitable for feeding into the plasma torch of an ICP or MIP emission or mass spectrometer. The aerosol (7) is subjected to rapid radiative heating (26) to evaporate the smaller droplets to dryness and preferably to cause the larger droplets to disintegrate into smaller droplets before they are completely evaporated. Nebulizer/spray chamber combinations according to the invention have higher sample transport efficiency than prior types. Optical and mass ICP and MIP spectrometers incorporating the nebulizer and spray chamber are also disclosed.

Abstract: A spectroanalytical system includes housing structure with vent structure open to the atmosphere; radiation dispersing apparatus in the housing structure for dispersing radiation into a spectrum for application to sensor apparatus; sample excitation apparatus for exciting sample material to be analyzed to spectroemissive levels for generating a beam of radiation for dispersion by the dispersing structure; a source of gas; structure for flowing gas from the source into the housing structure for exhaust from the housing structure through the vent structure at a flow rate that is less than one percent of the volume of the housing structure per hour; first control structure for maintaining the pressure of the gas in the housing structure at a constant (within about one millibar) pressure independent of atmospheric pressure; and second control structure for maintaining the temperature of the gas within the housing structure constant within about 0.1.degree. F. during system operation.

Abstract: Soluble metal complexes for use as standards in wear metal analysis of PFPAE fluids are provided. These standards are the metal complexes of 2,2-dimethyl-6,6,7,7,8,8,8,-heptafluoro-3,5-octanedione (HFOD). These complexes are soluble in PFPAE's to at least 100 ppm metal and are stable over a long period of time (months) in the presence of air. Generally, the metals of interest are Al, Na, Mg, Ca, Ba, Ni, Cu, Zn, Cd, Pb, Hg, Fe, Cr, Mn, V, Mo, Si, Ag, Na, Sn, Ti and Co. Also provided is a method for determining the concentration of at least one wear metal in a PFPAE fluid. This method is particularly suitable for determining determining the concentration of at least one wear metal in a PFPAE fluid by inductively coupled plasma-atomic emission spectroscopy.

Abstract: An analysis system includes induction coupled plasma apparatus into which sample material to be analyzed is introduced for excitation in the plasma, optical measuring apparatus coupled to the induction coupled plasma apparatus for analyzing the sample material, and mass spectrometer apparatus also coupled to the induction coupled plasma apparatus for analyzing the sample material. The mass spectrometer apparatus includes structure defining a first region, a sampling member adjacent the induction coupled plasma apparatus that has an orifice through which at least some ions characteristic of the sample material may pass into the first region, structure defining a second region, and a gate valve between the first and second regions. The gate valve is open when the analysis system is operating in mass spectrometer mode, and is closed when the system is operating only in optical measuring mode.

Abstract: A laser light detector is provided which can be used to detect pulsed laser light that is produced by a rotating laser light source on a construction job site. The laser light detector provides an easily-read display which is indicative of the present level or elevation of the laser light detector with respect to the plane of rotating laser light. The laser light detector has a very large dynamic range, while maintaining a very good signal-to-noise ratio, and can, therefore, be used at both short and long distances from the rotating laser light source. The laser light detector is not dependent upon the energy level received of laser light, or by the spot size of laser light as it reaches the light detectors. The laser light detector is available with several options, including dead band adjustment and audible indication of the elevation.

Abstract: An atomic emission spectrometer includes an induction coupled plasma generator and a detector system for detecting the radiation relative to spectral wavelength. A first mirror is on the longitudinal axis of the generator to receive axial radiation therefrom. A second mirror is disposed laterally from the generator so as to reflect radial radiation therefrom parallel to the longitudinal axis toward a third mirror disposed laterally from the longitudinal axis. The third mirror passes the radiation to a fourth mirror positioned adjacent to the axial radiation without interfering therewith so as to reflect the radial radiation to the first mirror. The first mirror is rotated to a first orientation to reflect the axial radiation into the detector system, or to a second orientation to reflect the radial radiation into the detector system.

Abstract: Microwave-induced plasma for continuous, real time trace element monitoring under harsh and variable conditions. The sensor includes a source of high power microwave energy and a shorted waveguide made of a microwave conductive, refractory material communicating with the source of the microwave energy to generate a plasma. The high power waveguide is constructed to be robust in a hot, hostile environment. It includes an aperture for the passage of gases to be analyzed and a spectrometer is connected to receive light from the plasma. Provision is made for real time in situ calibration. The spectrometer disperses the light, which is then analyzed by a computer. The sensor is capable of making continuous, real time quantitative measurements of desired elements, such as the heavy metals lead and mercury.