Abstract: A gas plasma emission source includes a solid state signal power source coupled to a resonant cavity. In an alternative embodiment of the invention, an atomic emission detector includes a solid state signal power source coupled to a resonant cavity and a spectrographic detector to sense atomic emissions from a gas within the resonant cavity. In yet another embodiment of the invention, a method of sustaining a plasma includes passing a gas through a resonant cavity and exciting the resonant cavity with signal power from a solid state power source to sustain the plasma in the gas. In another embodiment of the invention, a method of using a solid state power source includes passing a gas through a resonant cavity and coupling sufficient signal power from an output of the solid state power source to sustain a plasma in the gas where the sufficient power is less than 300 watts.

Abstract: The invention relates to a gas analysis system for analyzing gases in an enclosure under controlled pressure, which system comprises apparatus for ionizing the gases to be analyzed, and apparatus for analyzing the ionized gases. According to the invention the apparatus for ionizing the gases to be analyzed comprises a dedicated plasma source in contact with the gases contained in the enclosure and combined with a generator for generating a plasma from the gases to be analyzed; and the apparatus for analyzing the ionized gases comprises a radiation sensor situated in the vicinity of the zone in which the plasma is generated, and connected to an optical spectrometer for analyzing the variation of the radiation spectrum emitted by the generated plasma.

Abstract: This invention provides a method for accurately measuring a gap distance between two electrodes. According to the method, a plasma space is formed between the electrodes, across which a DC voltage is coupled. The plasma space has a reactive gas that emits a spectrum of spectral lines. The spectrum is monitored to determine at least one line distance between the spectral lines. Finally, the gap distance can be deduced according to the line distance and a specific rule.

Abstract: Torch glassware for use with inductively coupled plasma-optical emission spectrometers is provided. The glassware includes an outer tube and a stream of cool inert gas flowing radially within the inner surface thereof such that the cool inert gas creates a cushion between the tube and hot plasma contained within the stream of cool inert gas. The outer tube includes a sidewall having an open end and having a slot passing therethrough. The slot extends longitudinally along the sidewall from the open end thereof and is defined at least in part by a first longitudinal edge and a second longitudinal edge. The first longitudinal edge is offset radially inwardly from the second longitudinal edge. Stated another way, the tube includes a fixed center, and a distance between the fixed center and the first longitudinal edge is smaller than a distance between the fixed center and the second longitudinal edge.

Abstract: The present invention relates to a method for the colorimetric measurement of a defined region on an image representing a surface, characterized in that the said image of the said surface is taken using a color camera, in that the analogue information measured on the said surface is transformed and converted into digital form, in that the said defined region on the said image is delimited and in that the measurement of the chromatic values R, G, B is carried out for this region.

Abstract: The invention relates to a gas analysis system for analyzing gases in an enclosure under controlled pressure, which system comprises apparatus for ionizing the gases to be analyzed, and apparatus for analyzing the ionized gases.

Abstract: A method of detecting the presence of radioactive waste material (11) on the surface of a storage drum (10), wherein Laser Induced Breakdown Spectroscopy techniques are used to obtain electronic emission spectra characteristic of the waste material (11) where this is present on the surface of the drum (10). Because electronic emission spectra are not affected by the strong background nuclear radiation from the waste material contained within the drum (10), a much improved accuracy of detection is achieved.

Abstract: A method and an apparatus system feature detecting faults in process conditions of a plasma-based semiconductor processing system by sensing the spectral emissions of the plasma. As a result, the method includes sensing optical energy produced by the plasma and identifying the fault in the process conditions as a function of one or more of the plurality of spectral bands. To that end, the apparatus includes a detector in optical communication with the processing chamber to sense optical energy generated by the plasma, and a spectrum analyzer, in electrical communication with the optical detector. The spectrum analyzer resolves the spectral bands and produces information corresponding thereto. A processor is in electrical communication with the spectrum analyzer, and a memory is in electrical communication with the processor. The memory includes a computer-readable medium having a computer-readable program embodied therein that controls the system to carry-out the method.

Abstract: Aspects of the present invention provide novel methods and devices for sampling gas, exciting the sampled gas to emit radiation and detecting in real time from the emitted radiation a plurality of wave bands of an emission spectrum. Energy used to excite the sampled gas may be adjusted based on the detected wave bands. A process may be controlled in real time based on the detected wave bands. Novel interfaces may be used to display portions of the detected wave bands. A known flow of a reference gas may be included in the flow of sampled gases and an unknown flow of an unknown flow gas determined.

Abstract: An analyzer suitable for performing continuous gas analysis in ultra-high purity applications. The analyzer combines a low-level emission source and a gaseous emission spectrometer having a charge coupled device (CCD) diode array as a detector. The CCD detector replaces one or more photomultipliers and narrow bandpass filters typically used in spectrometers. The analyzer performs various processing operations to evaluate and eliminate the effect of background light level, or dark spectrum.

Abstract: Using a nebulizer gas, sub micron and micron size particulates can be generated from a solution containing salts covering a broad range of elements. The fractional concentration of elements can be determined by bubbling the aerosol through aqueous acid and analyzing the aqueous acid for metals. The nebulizer can be coupled to an ICP (Inductively Coupled Plasma) torch and the ICPMS (Inductively Coupled Plasma Mass Spectrometer) or ICPOES (Inductively Coupled Plasma Optical Emission Spectrometer) response to different elements can be determined. This provides the response factor of the ICPMS or ICPOES for different elements.

Abstract: A continuous emissions monitor for the measurement of vapor phase and particulate-based metals in gas streams such as those at coal-fired utility plants, incinerators and manufacturing facilities, in which a pulsed plasma source (10), utilizing a resonant reentrant microwave cavity (12) which is powered by a microwave generator (34), operates at sub atmospheric pressures (<50 Torr.) by using a pump (48) in order to eliminate quenching of the light emission processes by other species in the gas stream and reduce the background emission and where the pulsed operation of the source reduces background light emission from oxides of nitrogen produced in plasma sources operating with nitrogen and oxygen gases thus enhancing the contrast and signal-to-background; resulting in the instrument having a minimum detection level of 0.01 micrograms/m−3 for mercury, as well as, other metal elements such as arsenic and selenium, and requiring less than 10 Watts of microwave power.

Abstract: The disclosed invention relates to a calibration method, system and apparatus for a multimetals continuous emissions monitor system (hereinafter “multimetals CEMS”). More specifically, this invention relates to a calibration scheme for continuous monitoring of mercury emissions from stationary sources by plasma emission spectrometry. A source of mercury vapor, preferably a mercury permeation tube, entrains mercury vapor into a constant flow of carrier air. The carrier air mixes with a constant flow of diluent air in an aerosol mixer. The mixer is operably coupled to the analyzer. A gaseous mixture having a calibration mercury concentration flows from the mixer into the analyzer at a constant rate. A graph having coordinates of analyzer signal intensity and mercury concentration is used to plot the calibration scheme. A first signal intensity generated by the analyzer in response to the calibration mercury concentration is used for the first plot on the graph.

Abstract: Aspects of the present invention provide novel methods and devices for sampling gas, exciting the sampled gas to emit radiation and detecting in real time from the emitted radiation a plurality of wave bands of an emission spectrum. Energy used to excite the sampled gas may be adjusted based on the detected wave bands. A process may be controlled in real time based on the detected wave bands. Novel interfaces may be used to display portions of the detected wave bands. A known flow of a reference gas may be included in the flow of sampled gases and an unknown flow of an unknown flow gas determined.

Abstract: A method and apparatus for analyzing a semiconductor surface obtains a sample from a localized section of a wafer. The sample is obtained by isolating a section of a wafer with a sampling apparatus, dispensing liquid onto the isolated section of the wafer, dissolving compounds of interest in the liquid, removing a portion of the liquid, and analyzing the liquid and dissolved compounds of interest. The liquid can be an etching solution, an organic solvent, or other suitable solvent. Samples and analyses can, thus, be obtained as a function of position on the wafer. Analyses as a function of depth can also be determined by sampling and analyzing an isolated portion of the wafer as a function of time.

Abstract: Disclosed herein is a nebulizer capable of performing spraying over a wide flow-rate range from a low flow rate to a high flow rate stably and with high efficiency. Further, the present invention provides a supersonic nebulizer capable of improving the efficiency of spraying by a supersonic region spray gas, and a supersonic array nebulizer wherein a plurality of spray units are placed in array form.

Abstract: The present invention provides a method and an apparatus for analyzing nitrogen in a gas, in which the concentration of nitrogen can be continuously measured with good sensitivity without wasting a sample gas.

Abstract: Aspects of the present invention provide novel methods and devices for sampling gas, exciting the sampled gas to emit radiation and detecting in real time from the emitted radiation a plurality of wave bands of an emission spectrum. Energy used to excite the sampled gas may be adjusted based on the detected wave bands. A process may be controlled in real time based on the detected wave bands. Novel interfaces may be used to display portions of the detected wave bands. A known flow of a reference gas may be included in the flow of sampled gases and an unknown flow of an unknown flow gas determined.

Abstract: A substrate processing apparatus comprises a process chamber capable of processing a first material on the substrate. A radiation source is capable of emitting radiation that is reflected from the substrate during processing. A radiation detector is provided to detect the reflected radiation and generate a signal trace. A controller is adapted to receive the signal trace and evaluate an endpoint of processing the first material from a change in the signal trace that is distinctive of an exposure of a second material having a different reflectivity coefficient than the first material.

Abstract: There has been invented a process for analyzing ambient air in a microwave induced plasma without use of an additional carrier gas. There has also been invented an apparatus for analyzing ambient air, other sample gas, or nebulized and desolvated liquids wherein a novel arrangement of plasma gas and sample gas conduits is used to enhance dependability of the plasma. This apparatus embodiment of the invention has a concentric arrangement of plasma gas and sample gas conduits so as to provide a sheath of plasma gas both within and surrounding the flow of analyte into the plasma region. The microwave plasma torch can either be contained within a sealed housing or can be operated in ambient air at ambient pressures. The microwave plasma torch of this invention is portable and can be operated continuously for real-time analysis of air.

Abstract: Aspects of the present invention provide novel methods and devices for sampling gas, exciting the sampled gas to emit radiation and detecting in real time from the emitted radiation a plurality of wave bands of an emission spectrum. Energy used to excite the sampled gas may be adjusted based on the detected wave bands. A process may be controlled in real time based on the detected wave bands. Novel interfaces may be used to display portions of the detected wave bands. A known flow of a reference gas may be included in the flow of sampled gases and an unknown flow of an unknown flow gas determined.

Abstract: Torch glassware for use with inductively coupled plasma-optical emission spectrometers is provided. The glassware includes an outer tube and a stream of cool inert gas flowing radially within the inner surface thereof such that the cool inert gas creates a cushion between the tube and hot plasma contained within the stream of cool inert gas. The outer tube includes a sidewall having an open end and having a slot passing therethrough. The slot extends longitudinally along the sidewall from the open end thereof and is defined at least in part by a first longitudinal edge and a second longitudinal edge. The first longitudinal edge is offset radially inwardly from the second longitudinal edge. Stated another way, the tube includes a fixed center, and a distance between the fixed center and the first longitudinal edge is smaller than a distance between the fixed center and the second longitudinal edge.

Abstract: A method and apparatus are disclosed for measuring trace amounts of constituents in samples by using laser induced breakdown spectroscopy and laser induced fluorescence under ambient conditions. The laser induced fluorescence is performed at a selected wavelength corresponding to an absorption state of a selected trace constituent. The intensity value of the emission decay signal which is generated by the trace constituent is compared to calibrated emission intensity decay values to determine the amount of trace constituent present.

Abstract: A method for monitoring and/or controlling the positioning and/or condition of a plasma in a plasma spectrometer, which comprises:

Abstract: The invention relates to a device for analyzing gaseous samples comprising a device for generating a plasma, a feeding device for the sample to be analyzed and at least one detector unit which in particular comprises at least one interference filter, a lens arrangement and a photodetector for detecting radiation, especially atomic emission or molecular emission, emitted by the sample to be analyzed. According to the invention, said device for generating the plasma is made up of two in particular ring- or disk-shaped parallel, interspaced electrodes, wherein each electrode has one essentially centrical, especially circular through-opening, and an isolator positioned between said electrodes, said isolator having a particularly circular through-opening for confining the plasma. In addition the invention provides for an optical unit, in particular a collimator lens, to be placed between said device for generating the plasma and the detector unit for forming a parallel ray beam.

Abstract: High power microwave plasma torch. The torch includes a source of microwave energy which is propagated by a waveguide. The waveguide has no structural restrictions between the source of microwave energy and the plasma to effect resonance. The gas flows across the waveguide and microwave energy is coupled into the gas to create a plasma. At least 5 kilowatts of microwave energy is coupled into the gas. It is preferred that the waveguide be a fundamental mode waveguide or a quasi-optical overmoded waveguide. In one embodiment, the plasma torch is used in a furnace for heating a material within the furnace.

Abstract: A spectroscopic analyzing apparatus and process can increase the signal to noise ratio by executing an optimal spectroscopic analysis of light from a light source. The light source can provide different light spectrum intensities representative of an element at different temperatures across the light source. An optical system can form a two-dimensional image of the light source on a photo sensor for providing a plurality of output signals representative of the desired measurement areas for a particular component. Information representative of the various components can be prestored so that a computer can select the optimum pixel positions from the sensor to process the output signals in making a determination of a component while only using those output signals from the sensor that can optimize the signal to noise ratio.

Abstract: A convenient apparatus and method for inserting surrogate metal-entraining aerosols into exhaust stacks for the purpose of realistic dynamic testing of an emissions monitor. The aerosols contain elements required to be detected by the monitor. The 14 metals regulated by the EPA as hazardous air pollutants are of particular interest. The method requires less time and fewer skilled technicians than conventional testing methods. In a preferred embodiment of the present invention, a burner (e.g., propane or kerosene) is combined with a combustion chamber, a fan, an air compressor, at least one peristaltic pump, at least one surrogate reservoir, and the necessary ductwork for connection to an exhaust stack. The amount of surrogate aerosol to be introduced to the stack is adjusted at the peristaltic pump. After heating by the burner and subsequent introduction into the hot stack, the surrogate homogeneously mixes with the exhaust stream and is presented to the sensor as a dry gas component of the exhaust stream.

Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.

Abstract: This plasma torch (10) for the excitation of a gas for the purpose of analyzing it comprises a tubular injector (12), intended to be connected to a source for supplying a gas to be analyzed, and an external cylindrical sleeve (14) coaxial with the injector (12) and defining a cylindrical annular channel (32) for supplying a plasma gas, intended to be connected to a corresponding supply source for the purpose of generating a plasma (P). The diameter of the injector (12) can vary.

Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.

Abstract: A simple, relatively low-cost direct injection high efficiency nebulizer (DIHEN) is suitable for argon inductively coupled plasma (Ar ICP) spectrometry. The DIHEN may be operated at solution uptake rates of 1-100 .mu.L/min. Analytical performance indices for the DIHEN and fundamental characteristics of the aerosol produced are obtained using an ICP mass spectrometer (ICPMS) and a 2-dimensional phase Doppler particle analyzer (2D PDPA), respectively. Results are compared to those obtained with a conventional crossflow pneumatic nebulizer (PN), equipped with a Scott-type spray chamber. Droplet sizes and velocities produced with the DIHEN are smaller than those reported for the direct injection nebulizer (DIN). The DIHEN offers optimal sensitivity at low injector gas flow rates (approx. 0.25 L/min) and high RF power (approx. 1.5 kW). For the 17 elements tested, detection limits (ppt) and sensitivities achieved with the DIHEN (at 85 .mu.

Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.

Abstract: A new method of controlling the level of cleaning of the etch chamber by measuring the light emission caused by particles within the plasma of the etch chamber. The etch chamber clean process is invoked as soon as the level of contaminants within the etch chamber is observed as being too high. This measuring of the contaminants within the etch chamber is performed by measuring the particle light emission. The etch chamber cleaning process is considered complete when the light intensity created by existing particles in the chamber drops by a certain percentage.

Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.

Abstract: The device disclosed herein is useful in the development of a new plasma spectrometer with enhanced sensitivity. An alteration in the configuration of the optic lenses used in conjunction with a water-cooled disc allows for the use of a short depth of focus to more reliably sample a given analyte. The collimating lens used in this invention can be placed within 4 millimeters of the load coil, including in the tip of the axial plasma generated by the RF generator. When used with in conjunction with a high-efficiency nebulizer to more precisely control the size of the sample droplets present in the base of the plasma further reduces the matrix effects seen in other spectrometers, while enhancing sensitivity. The optics configuration disclosed in the instant invention allows for the retrofitting of a conventional radially-viewed plasma spectrometer into a more sensitive axially-viewed spectrometer.

Abstract: A system and process for analyzing the plasma discharge for various frequency components that can be correlated to wafer, chamber or equipment conditions. This system and process monitors (step 210), by using optical or electrical signals from the plasma, the low frequency plasma variations (step 220) generated during the wafer manufacturing process. For example, in endpoint detection applications, the amplitude variations of the plasma glow at a selected audio frequency, chosen for sensitivity to the etched material, is used to generate the endpoint signal (step 230). This endpoint signal has a potential response time equal to one cycle of the selected frequency plus minimal filtering due to noise reduction. To extract the vital parameters from the plasma glow, DSPs for frequency analysis or simple frequency filtering methods can be used.

Abstract: An end-point detector for a plasma etcher, includes a converging lens for receiving strip-like plasma light produced between a pair of opposed electrodes and a spectroscope, having a slit located at a substantial rear-side focal plane of the converging lens, for detecting an etching end time point from a time-based variation of spectrum light intensity of the plasma light which has been converged at the slit and has passed through the slit. The converging lens has a pupil diameter of not greater than ##EQU1## where W is a width of a short side of the strip-like plasma light produced between the electrodes, 1 is a distance between an end of each electrode and a pupil face of the converging lens, NAm is a numerical aperture required by the spectroscope, and h is a width of a short side of the slit of the spectroscope. The converging lens has a numerical aperture of not less than NAm.

Abstract: A method and portable apparatus for self-powered, sensitive analysis of solid, liquid or gas samples for the presence of elements is provided. The apparatus includes a compact sensor system which utilizes a microwave power source and a shorted waveguide to induce a plasma. The microwave power source may be a magnetron or the like. The device includes a portable power supply and preferably includes a portable battery charger. The portable power supply includes a compact generator-internal combustion engine unit. The device can be operated by directly using power from the portable power supply or in a more compact embodiment by using power from batteries that are recharged by a separate portable power supply module. Pulsed microwave operation can be used to reduce average power requirements and facilitate the use of very compact units using batteries. The device is capable of being transported to and from remote sites for analysis by an individual without the need for heavy transportation equipment.

Abstract: A pulsed laser is employed for quantitative spectral analysis of halogen-containing, nonmetallic or at most partially metallic materials in combination with an image recorder, a spectrometer and a CCD camera, by detecting, summing and analysing the luminous intensity of at least a volume slice from the expansion cone of the plasma, this making it possible, advantageously, for temperature and density gradients to be measured.

Abstract: This invention pertains generally to a method for improving the accuracy of particle analysis under conditions of discrete particle loading and particularly to a method for improving signal-to-noise ratio and instrument response in laser spark spectroscopic analysis of particulate emissions. Under conditions of low particle density loading (particles/m.sup.3) resulting from low overall metal concentrations and/or large particle size uniform sampling can not be guaranteed. The present invention discloses a technique for separating laser sparks that arise from sample particles from those that do not; that is, a process for systematically "gating" the instrument response arising from "sampled" particles from those responses which do not, is dislosed as a solution to his problem. The disclosed approach is based on random sampling combined with a conditional analysis of each pulse. A threshold value is determined for the ratio of the intensity of a spectral line for a given element to a baseline region.

Abstract: An electric discharge tube for a gas emission spectrometer and method for analyzing and measuring low concentration levels of multiple gas/vapor impurities in a gas stream under continuous flow conditions. The electric discharge tube comprises a plurality of analytical sites through which emissive radiation generated by an alternating source of power across the tube can be analyzed and measured.

Abstract: The invention relates to high power, spark induced breakdown spectroscopy (SIBS) detectors with controllable delay time and to spark induced breakdown spectroscopy plasma generators with dual electrodes with specific electrode material, both for use in methods and apparatuses for detecting spectral signatures of atomic emissions, (e.g., from heavy metals such as lead, mercury, chromium, cadmium, arsenic, antimony and beryllium and radioactive materials such as uranium, plutonium, thorium and technetium) for measuring, for example, atomic concentrations of samples such as vapors and airborne particulates.

Abstract: An trace analyzer apparatus and method useful in semiconductor processing for measuring trace impurities in gases and liquids comprising a gas chromatograph serving to replace a bulk gas in a composition of bulk gas including contaminants in a bulk gas stream with a carrier gas having a higher ionization potential than that of said contaminants, where such gas chromatograph is connected to a hollow electrode (14) for initiating ionization of said contaminants by electrical discharge, where such electrode is electrically isolated from a source housing (44) and adjacent to a skimmer plate (16) that ionizes trace contaminants that are measured using a mass spectrometer, is disclosed.

Abstract: A method and an apparatus determines at least one parameter of a material flow. The parameter is for example temperature, pressure or velocity of the gas or plasma flow. The material flow is either a gas or a plasma flow. The method and the apparatus are utilizing atomic absorption spectroscopy and feed a Rubidium compound into the gas or plasma flow, in which the Rubidium compound dissociates into Rubidium atoms. The Rubidium atoms are stimulated with a first laser beam and a first transmitted laser intensity is detected. First absorption lines are determined from the first transmitted laser intensity. Rubidium atoms are stimulated with a second laser beam, a second transmitted reference laser intensity is detected and second reference absorption lines are determined from the second transmitted reference laser intensity. Finally, at least one parameter of the gas or plasma flow is determined from the comparison of the first absorption lines and the second reference absorption lines of the Rubidium atoms.

Abstract: Disclosed are a laser ablation system and method for determining the presence of trace elements in liquid samples such as oils, and/or in powder samples. A sample containing microporous membrane is utilized to prevent "splashing", "splattering" and/or "scattering" of liquid and/or powder sample when laser contained sample effectively "nebulizing" energy is applied. The present invention is typically used in combination with an inductively coupled plasma and a detector system, such as an Atomic Emission Spectrometer or Mass Spectrometer.

Abstract: Method for determining the concentration of atomic species in gases and solids. Measurement of at least two emission intensities from a species in a plasma containing the species after a sufficient time period has elapsed after the generation of the plasma and during a second time period, permits an instantaneous temperature to be established within the sample. The concentration of the atomic species to be determined is then derived from the known emission intensity of a predetermined concentration of that species in the sample at the measured temperature, a quantity which is measured prior to the determination of the unknown concentration, and the actual measured emission from the unknown species, or by this latter emission and the emission intensity of a species having known concentration within the sample.

Abstract: Introduction of sample stream air into argon inductively coupled plasma permits continuous monitoring of hazardous air pollutant metals in combustion flue gases. In addition to entrained particulates, various molecular components of flue gas are in the plasma. These species, and reaction products thereof, such as CN species, also undergo excitation resulting in complex emission spectra of appreciable intensity. Serious spectral interference arises for several metal elements, from molecular emission bands associated with the stable CN radical, and other poly-atomic species, such as NO. Failure to account for these interferences can significantly degrade accuracy of monitoring particularly at low metal concentrations in the flue gas.

Abstract: An apparatus and method for controlling a semiconductor fabrication process. The method comprises sampling a byproduct of a semiconductor fabrication process, isolating the sample from the process, exciting the sample to produce radiation and analyzing the radiation. A small evacuated analysis chamber is added to a process chamber to sample byproducts of a reaction taking place in the main chamber. Energy supplied by an excitation source excites the byproducts in the analysis chamber to produce radiation. Preferably the byproducts are ionized by a RF energy to produce a discharge in the analysis chamber. Radiation from the discharge, in the form of IR, UV or visible light, is analyzed by a conventional optical techniques such as OES. The method and apparatus enable optical endpoint detection for normally non-ionized gaseous interactions.

Abstract: A susceptor on which a wafer is placed, and an upper electrode are arranged in the processing chamber of an etching apparatus to oppose each other. An optical transmission window is disposed in the side wall of the processing chamber. The upper electrode and the susceptor are supplied with RF powers from a second RF power supply and a first RF power supply, respectively, to excite a plasma in the processing chamber. Emission of the plasma is detected by an optical detector through the optical transmission window, and data is sampled. In a CPU, the sampling data is subjected to fitting based on the Weibull distribution function, thus obtaining an approximate equation, and furthermore the differential equation of the approximate equation is obtained. The virtual end point of etching is expected from the approximate equation and differential equation.