Abstract: A method for focusing a charged particle beam, the method includes: (a) altering a focal point of a charged particle beam according to a first focal pattern while scanning a first area of a sample and collecting a first set of detection signals; (b) altering a focal point of a charged particle bean according to a second focal pattern while scanning a second area that is ideally identical to the first area and collecting a second set of detection signals; and (c) processing the first and second set of detection signals to determine a focal characteristic; whereas the first focal pattern and the second focal pattern differ by the location of an optimal focal point.

Abstract: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate includes a reference set of gratings provided in the substrate, the reference set including two reference gratings having line elements in a first direction and one reference grating having line elements in a second, perpendicular, direction. A measurement set of gratings is provided on top of the reference set of gratings, the measurement set comprising three measurement gratings similar to the reference gratings. Two of the measurement gratings are oppositely biased in the second direction relative to the respective reference gratings. An overlay measurement device is provided to measure asymmetry of the three gratings in the reference set and the measurement set, and to derive from the measured asymmetry the overlay in both the first and second direction.

Abstract: Apparatus for fabricating an array of aligned optical elements. A base tool is used to receive and align a planar material such as a glass sheet. A template tool is used to deposit secondary mirrors and adhesive patches onto the glass sheet. The adhesive patches are used to receive and mount primary mirrors. The primary mirrors are selectively held by an assembly tool. The primary mirrors are brought into alignment with the glass sheet by using actuators on the base tool and by using a registration mechanism to align the assembly tool with the glass sheet.

Abstract: A method for determining a position of a reference point in which there is no influence of aberration of a camera lens or the like, but an error caused by a failure in shape of an alignment mark can be reduced. An alignment mark consisting of a plurality of pattern portions (and background portions) centering at a design reference point is provided in advance. Positions of centers of border lines of the patterns are calculated. Obtained coordinate values of the centers are averaged in each axial direction. The averaged coordinate values are regarded as coordinate values of a machining reference point. Thus, even when a defect occurs in any pattern portion, an error caused by the defect is reduced so that the accuracy in machining can be improved.

Abstract: A lithographic apparatus includes a displacement measuring system configured to measure the position of a substrate table in at least three degrees of freedom. The displacement measuring system includes a first x-sensor configured to measure the position of the substrate table in a first direction and a first and a second y-sensor configured to measure the position of the substrate table in a second direction. Said displacement measuring system further comprises a second x-sensor. The first and second x-sensor and first and second y-sensors are encoder type sensors configured to measure the position of each of the sensors with respect to at least one grid plate. The displacement measuring system is configured to selectively use, depending on the position of the substrate table, three of the first and second x-sensors and the first and second y-sensors to determine the position of the substrate table in three degrees of freedom.

Abstract: A laser beam may be used to provide a virtual reference axis of travel for the in-axis direction of motion of lenses in a zoom assembly to be positioned during a zoom operation. The virtual reference axis is projected along the optical axis, parallel to existing mechanical lens slides. The virtual reference axis passes through an aperture on each of the lens assemblies, and is sampled by a set of optics and detectors on each of the lens assemblies. The optics and detectors are arranged such that any change in the position of a lens cell within a lens assembly relative to the virtual reference axis is sensed and corrected using a feedback signal to a positioning motor. Since the same virtual reference axis is used for each lens in the zoom assembly, each lens can be independently corrected for off-axis position errors to very high precision.

Abstract: Systems and methods are disclosed that facilitate tolerating and/or correcting light beam misalignment in a light-emitting device, such as a light curtain. Attributes of the light beam can be assessed and compared to predetermined threshold values to evaluate whether the light beam is misaligned, and corrective feedback can be generated to adjust the position of one or more transmissive apertures generated on an LCD, through which light is permitted to pass, in order to re-align the light beam.

Abstract: A measuring apparatus and a measuring method are provided, with which an accurate length measurement and position checking are achieved using a simple structure. The measuring apparatus according to the present invention is provided with a first and a second parallel prisms which capture light rays respectively reflected from a first and a second locations on one surface of an object to be measured, an optical lens which converges or diverges the light rays from the first and the second parallel prisms, an image sensor which captures the light rays from the optical lens, and converts images of the first and the second locations into an electrical signal, and a display unit which displays on one screen the images of the first and the second locations based on the electrical signal. According to the present invention, using just one optical system, measurement can be performed on one screen, as to multiple locations being spaced apart.

Abstract: Systems and methodology for orienting the tip/tilt and vertical height of samples, preferably automated, as applied in ellipsometer and the like systems.

Abstract: A device for aligning a substrate and a mask, and a method using the same, where the device includes aligning marks in unused portions of the substrate and the mask, a sensing unit for determining overlap of the aligning marks when the substrate is aligned with the mask, and a control unit for controlling an aligning process to be repeated on the basis of data sensed and determined by the sensing unit. The sensing unit may include a camera positioned in photographic range to determine any alignment error in the alignment marks. According to another embodiment of the present invention, the alignment error between the substrate and the mask is sensed to determine whether it is acceptable or not. When the alignment error is unacceptable, the operations for aligning the substrate with the mask are repeated until the alignment error is acceptable.

Abstract: An apparatus and method are disclosed for hard-docking of a tester head to a DUT, while permitting the angular alignment of a specimen to be inspected to the optical axis of an optical testing tool. In one example, a system for orthogonal alignment of a specimen to an optical axis of a collection optics is provided. The system comprises a self-leveling tabletop; a specimen holder coupled to the tabletop and held at a fix orientation; collection optics coupled to the tabletop; a plunger coupled to the tabletop and operable to maintain the leveling orientation of the tabletop; a control valve sensing the leveling orientation of the tabletop and coupled to the plunger to control the operation of the plunger; and an aligner coupled to the tabletop and operable to change the alignment of the optical axis of the collection optics with respect to the specimen without changing the fixed orientation of the specimen holder.

Abstract: This invention discloses a wafer surface level detection method.

Abstract: An optical alignment method is for a light-emitting module that includes a housing unit, a light-emitting unit disposed in the housing unit, and a lens unit. The optical alignment method includes: (a) through image-capturing techniques, finding a light-emitting point of the light-emitting unit and a predetermined reference point, and determining a total optical path length between the light-emitting point and an imaging plane; (b) finding a first center line that divides the total optical path length in half; (c) through image-capturing techniques, finding opposite first and second edges of the lens unit, and determining a lens length between the first and second edges; (d) finding a second center line that divides the lens length in half; and (e) assembling the lens unit to the housing unit so that the first and second center lines overlap. A light-emitting module and an assembly method therefor are also disclosed.

Abstract: The present invention relates to embodiments of: (1) a unitary holographic drive head assembly mounting structure; (2) an assembly comprising a unitary holographic drive head assembly mounting structure and a plurality of holographic drive head components and/or subassemblies; (3) a subassembly comprising a spatial light modulator, detector array, and a beam splitter; (4) a device comprising a spatial light modulator and a physical aperture positioned over or an imaged aperture projected onto the photoactive area of the spatial light modulator; (5) a system for optically aligning or pointing a laser in a holographic drive head assembly; (6) a light source subassembly comprising a laser, a fiber coupling lens; and an optical fiber having a fiber connector ready output end; and (7) a light source subsystem comprising a laser source, beam conditioning optics, fiber coupling optics for receiving the conditioned light beam, and a fiber optic connector for receiving the conditioned light beam from the fiber couplin

Abstract: Exposure position marks are reliably recognized and the displacement of an exposure position is correctly and efficiently detected based on measurement results produced by recognizing the marks. The exposure position marks are constructed of a first pattern made up of an inner quadrangular pattern and an outer quadrangular pattern and a second pattern shaped as a rectangular frame whose inner edge and outer edge are formed as quadrangular patterns. The first pattern and the second pattern are formed with an intention of making center positions of the first pattern and the second pattern match and of having the second pattern disposed inside a region between an inner quadrangular pattern and an outer quadrangular pattern of the first pattern.

Abstract: An apparatus including a stage configured to be moved. A first laser interferometer measures a position of the stage in a first direction. A second laser interferometer measures a position of the stage in the first direction. A control unit (i) obtains a position of the stage based on an output of one of the first and second laser interferometers, (ii) controls a position of the stage based on the obtained position of the stage, (iii) performs switching of one of the first and second laser interferometers to the other of the first and second laser interferometers while the stage is moved at a constant velocity in the first direction, (iv) calculates a distance by which the stage is to be moved during a time interval, and (v) sets an initial value of the other of the first and second laser interferometers after the switching, based on a position measured by the one of the first and second laser interferometers at a start time of the time interval and the calculated distance.

Abstract: An overlay mark is described, wherein the overlay mark is used for checking the alignment accuracy between a lower layer defined by two exposure steps and a lithography process for defining an upper layer, including a part of the lower layer and a photoresist patter. The part of the lower layer includes two first x-directional, two first y-directional bar-like patterns. The first x-directional and first y-directional bar-like patterns are defined by one exposure step to define a first rectangle. The second x-directional and second y-directional bar-like patterns are defined by another exposure to define a second rectangle, wherein the second rectangle is wider than the first rectangle. The photoresist pattern, which is formed by the lithograph process, is disposed over the part of the lower layer and is surrounded by the bar-like patterns.

Abstract: A spectroscopic microscope includes a laser or other light source which emits light from the entrance aperture of its spectrograph, and also includes a light sensor situated on the microscope sample stage upon which a specimen is to be situated for microscopic/spectrometric analysis. The sample stage is positioned such that the signal from the light sensor is maximized, thereby indicating good alignment between the sample stage and spectrograph. Additionally, the microscope sample stage bears a light source which can emit light to be detected by a light sensor situated at the vantage point of a user/viewer utilizing the microscope, and such a light sensor can simply take the form of a video camera or other image recordation unit associated with the microscope. The sample stage can also be positioned to optimize the signal at the light sensor to signify good alignment between the sample stage and the microscope.

Abstract: A system and method use a substrate with a pattern of individual, indiscrete alignment marks, i.e., the marks are separate and distinct from each other, and each mark is not divided into component parts. The pattern of marks is distributed over an area of the substrate, and the method also comprises the steps of providing a beam of radiation using an illumination system and an array of individually controllable elements to impart the beam with a pattern in its cross-section, providing a projection system to project the patterned beam onto the substrate, and providing a movement system to effect relative movement between the substrate and the projection system.

Abstract: The present invention is a system and method for use with alignment marks and search algorithms of diffraction pattern detection tools. The system and method of the invention significantly increases the capture range of diffraction pattern detection methods and enable more efficient operation of tools employing such detection methods.

Abstract: Modified MZ (Mach-Zender) interferometers preferably are utilized to analyze the transmitted, aspherical wavefront of an ophthalmic lens by mounting the lens in a cuvette having a rotatable carousel that can hold multiple lenses. Fresh, temperature controlled, saline solution is circulated about the lenses, and the cuvette is positioned in a vertical test arm of the interferometer configuration. Reverse raytracing preferably is utilized to remove aberrations induced into the wavefront as it is imaged from immediately behind the lens to the detector of the interferometer.

Abstract: An apparatus for positioning a transport system and a load port is described, including a signal emitting unit disposed on the transport system and a positioning board on the load port. The signal emitting unit has two positioning points thereon capable of emitting two light beams to the positioning board, while the positioning board has two holes thereon at two positions corresponding to the two positioning points. The two light beams can pass through the two holes perpendicular to the positioning board in a horizontal state when the load port is aligned with the transport system.

Abstract: To inspect all portions of the substrate the substrate table can be moved rotationally and linearly. Furthermore the detector can be moved rotationally. This enables all portions of a surface of the substrate to be inspected from all angles in a plane parallel to the substrate. Less linear motion is needed, so the apparatus occupies a smaller volume and generates smaller vibrations.

Abstract: A resultant image of a grating target may be obtained by dividing an image of the target into first and second portions and optically modifying the first and/or second portion such that a final image formed from their combination is characterized by a Moiré pattern. The resultant image may be analyzed to determine a shift in the grating target from a shift in the Moiré pattern. Optical alignment apparatus may include a first beam splitter, an image transformation element optically coupled to the first beam splitter, and a second beam splitter. The first beam splitter divides an image of a grating target into first and second portions. The second beam splitter combines the first portion and the second portion. The image transformation element optically modifies the first and/or second portion such that a final image formed from their combination is characterized by a Moiré pattern.

Abstract: In disclosed optical alignment method and apparatus thereof, external reflection entering laser diode by feedback from transmission line of low cost bidirectional optical transceiver module without optical isolator for subscribers is reduced so as to reduce RIN considering high optical coupling efficiency. The external reflection is minimized using property that output current increases in proportion to external reflection during optical alignment. For optimal optical alignment, external reflection and RIN are previously measured according to optical alignment position between subassembly and optical fiber. Optimal position is determined by both light output and RIN, and predetermined ratio of the mPD output current of minimum RIN position to that of maximum light output power position.

Abstract: A measuring system (100) for the optical measurement of an optical imaging system (150), which is provided to image a pattern arranged in an object surface (155) of the imaging system in an image surface (156) of the imaging system, comprises an object-side structure carrier (110) having an object-side measuring structure (111), to be arranged on the object side of the imaging system; an image-side structure carrier (120) having an image-side measuring structure (121), to be arranged on the image side of the imaging system; the object-side measuring structure and the image-side measuring structure being matched to each other in such a way that, when the object-side measuring structure is imaged onto the image-side measuring structure with the aid of the imaging system, a superposition pattern is produced; and a detector (130) for the locally resolving acquisition of the superposition pattern. The imaging system is designed as an immersion system for imaging with the aid of an immersion liquid (171).

Abstract: The invention relates to a method for controlling a vehicle washing installation with the use of a light-section procedure, wherein at least one treatment device (1) and a vehicle (2) to be washed are moved relative to each other in the washing direction (L), the vehicle surfaces are illuminated by two light fans (11, 12) starting from different positions, a first (FIG. 7) and a second (FIG. 8) two-dimensional depiction of the vehicle surfaces illuminated by the light fans (11, 12) are recorded from shooting angles which are oblique with respect to the planes of the light fans, and are stored in a control unit (20) together with the relative position and/or relative movement of treatment devices (1) and vehicle (2), the preceding steps are repeated during a traversing operation from one end to the other end of the vehicle (2), and, during or after the end of the traversing operation, a three-dimensional representation of the vehicle surfaces is calculated from the two-dimensional depictions (FIG. 7, FIG.

Abstract: An optical alignment method is for a light-emitting module that includes a housing unit, a light-emitting unit disposed in the housing unit, and a lens unit. The optical alignment method includes: (a) through image-capturing techniques, finding a light-emitting point of the light-emitting unit and a predetermined reference point, and determining a total optical path length between the light-emitting point and an imaging plane; (b) finding a first center line that divides the total optical path length in half; (c) through image-capturing techniques, finding opposite first and second edges of the lens unit, and determining a lens length between the first and second edges; (d) finding a second center line that divides the lens length in half; and (e) assembling the lens unit to the housing unit so that the first and second center lines overlap. A light-emitting module and an assembly method therefor are also disclosed.

Abstract: An exemplary apparatus for checking concentricity between a holder and a lens barrel of a lens module includes a light source, a gauge, and a detecting and analyzing device. The gauge includes an inner barrel and an outer barrel. The inner barrel is capable of rotating to a predetermined angle relative to the outer barrel. The inner barrel is configured for coupling with the lens barrel of the lens module. In addition, a method for checking the concentricity is also provided.

Abstract: An object detection system includes a radar detection means (2), an image detection means (3), and a collating means (4). The collating means (4) performs a collation between an object detected by the radar detection means (2) in a present collation and an object that has been determined as being detected by the radar detection means (2) and the image detection means (3) in a previous collation (S 10, S 11), further performs a collation between an object detected by the image detection means (3) in a present collation and an object that has been determined as being detected by the radar detection means (2) and the image detection means (3) in the previous collation (S 12, S 13) when it is determined that the identical object is detected by the radar detection means (2) and the image detection means (3) in the previous collation. Then the collating means (4) determines whether the radar detection means (2) and the image detection means (3) detect the identical object based on the collations (S 14).

Abstract: A shape value of a pattern having a pivotal characteristic is measured (step S1), an exposure energy variation is detected from the measured value, a first data base is accessed using a result of the measurement of the shape value (Step S2), an exposure energy is calculated (Step S3), a shape value of an isolated pattern is measured (Step S4), a second data base is accessed using a result of the measurement (Step S5), and a focal variation is determined using the calculated proper exposure energy (Step S6).

Abstract: An alignment apparatus which drives to a target position a stage capable of moving at least in a two-dimensional direction. A first measurement device and a second measurement device have a function of measuring positions of the stage in one direction from different positions, a switching device performs a switching operation for switching the first measurement device to the second measurement device, and a controller sets an initial value for the second position measurement device, which is used after the switching operation, based on the position of the stage finally measured by the first position measurement device before the switching operation.

Abstract: In a method for measuring the bonding quality of bonded substrates, such as bonded SOI wafers, a plurality of marks are created at a first side of a top substrate after, or before, the bonding of the top substrate onto a bottom substrate. Then, the positions of the plurality of marks are measured using a metrology tool. Next, for each of the marks, a difference between a measured position and an expected position is calculated. These differences can be used to determine delamination between the top substrate and the bottom substrate. By displaying a vector field representing the differences, and by not showing vectors that exceed a certain threshold, the delamination areas can be made visible.

Abstract: A combined overlay target and methods for its use are disclosed. The combined overlay target includes a grating-type overlay target and an image placement error target having substantially perpendicular features with spaced apart edges. The grating-type target and the image placement error target have a common centroid and are sufficiently separated that the grating-type overlay target does not interfere with measurement of image placement error.

Abstract: The present invention relates to a method and system for expeditious snowplow mounting in which a light beam source, such as a laser pointer, is used for aligning a vehicle to a target on the snowplow. The light beam source can be a laser pointer. The light beam source can be removably attached to a portion of the vehicle, such as a dashboard of the vehicle. The target preferably can be attached to the snowplow at a position above the hood of the vehicle substantially horizontal to the light beam source. For example, the target can be mounted to the back of a headlight of a snowplow system. Alternatively, a guide bar can extend vertically from the snowplow system to rise above the hood of the vehicle. The guide bar can serve as the target or a target can be attached to the guide bar.

Abstract: This invention can be attached to the head of a milling machine and performs the functions of a center scope and an edge finder. Unlike a center scope or an edge finder it does not have to be removed from the machine before the machine is used. The invention performs this function by processing images from two cameras that are shot from off axis vantage points. The two images are processed to create a synthetic image that appears to be shot from the on axis vantage point. The processor adds a cross hair to the image to indicate that point on the workpiece that is exactly at the center axis of the quill. This allows the machine operator to exactly position the spindle precisely over a target point on the workpiece in a convent and safe manner.

Abstract: A lithographic apparatus comprises a substrate table that supports a substrate having alignment marks on a surface thereof. The apparatus further comprises a frame moveable relative to the substrate to provide for a scanning or stepping mode of operation. An array of projection systems is disposed across the frame for projecting respective patterned beams onto a target portion of the substrate. A plurality of alignment mark detectors are attached to the frame and are moveable with respect to the frame using respective linear drive mechanisms. A position sensor is associated with each alignment mark detector for determining the position of the detector relative to the frame. A control system is responsible for both initial positioning of the detectors above alignment mark patterns on the substrate, and for dynamic alignment of the frame and substrate during a lithographic process.

Abstract: A method and apparatus is disclosed for aligning an optical instrument with respect to a celestial coordinate system, the optical instrument having a field of view and an optical instrument coordinate system, the celestial coordinate system having a plurality of objects each having celestial coordinates. The method includes the steps of receiving a plurality of captured optical instrument positions in the optical instrument coordinate system along with a plurality of associated capture times; calculating, for each associated capture time in the plurality of associated capture times, coordinates in the optical instrument coordinate system for the plurality of objects to create a plurality of calculated object positions for each associated capture time; and, determining, for each associated capture time, a match for each captured optical instrument position in the plurality of captured optical instrument positions with the plurality of calculated object positions to create a list of actual alignment objects.

Abstract: An overlay target with gratings thereon is illuminated and radiation scattered by the target is imaged onto detectors. A phase difference is then detected between the outputs of the detectors to find the mis-alignment error. In another aspect, an overlay target with gratings or box-in-box structures is illuminated and radiation scattered by the target is imaged onto detectors located away from the specular reflection direction of the illumination in a dark field detection scheme. Medium numerical aperture optics may be employed for collecting the radiation from the overlay target in a bright or dark field configuration so that the system has a larger depth of focus and so that the two structures of the target at different elevations can be measured accurately at the same time. Analytical functions are constructed for the grating type targets. By finding the phase difference between the two gratings at different elevations, misalignment errors can be detected.

Abstract: The orientation of a machine 2 relative to a work-piece 10 is manually controlled by means of an alignment device 4. The device 4 includes a light source 24 rigidly attached to a foot 12 that is resiliently movably attached to the main body 18 of the device. The body 18 of the device 4 houses a light detector 26 for detecting a light beam from the light source 24, the position of the region on the detector 26 illuminated by the beam depending on the orientation of the machine 2 relative to the work-piece 10. The operator is provided with feedback on whether the machine 2 is correctly aligned with a target orientation (usually perpendicular to the surface) and concerning the direction of corrective movement required, if any.

Abstract: An optical alignment apparatus comprising a plurality of subapertures and a plurality of detectors. The subapertures are optically coupled to a reflective surface which formed by a plurality of adjustable reflective segments. Each subaperture falls within one of two subsets. The first subset includes those subapertures that are positioned to receive light reflected from a single reflective segment. The second subset includes those subapertures that are positioned to receive light reflected across the abutting edges of adjacent reflective segments. Each detector is disposed at a focal plane of one of the subapertures and receives light reflected from that subaperture.

Abstract: A scanning transmission electron microscope for scanning a primary electron beam on a sample, detecting a transmitted electron from the sample by a detector, and forming an image of the transmitted electron. The scanning transmission electron microscope includes an electron-optics system which enables switching back the transmitted electron beam to the optical axis by a predetermined quantity, and a determining unit for determining the quantity based on a displacement of the transmitted electron with respect to the detector caused by the scanning of the primary electron beam.

Abstract: An alignment mark on a substrate includes a first pattern and a second pattern. The first pattern has a substantially planar upper surface by which parallel light is specularly reflected. The second pattern forms an interface with the first pattern and has a plurality of fine patterns. Parallel light is irregularly reflected by the second pattern.

Abstract: A lens blocking device is disclosed that includes a frame, a light source mounted on the frame, a carriage having a first end and a second end mounted on the frame for sliding movement between first and second positions, a first mirror mounted on the carriage first end and a lens block holder mounted on the carriage second end and shiftable between third and fourth positions with respect to the carriage, a stage disposed between the light source and the carriage, and including an opening, for supporting an object, an at least partially translucent screen generating a display image operably connected to the support frame, at least one second mirror arranged to reflect an image of an object on the stage from the first mirror, when the carriage is in the first position, onto the screen, and an actuator operably connected to the carriage.

Abstract: Non-imaging measurement is made of misalignment of lithographic exposures by illuminating periodic features of a mark formed by two lithographic exposures with broadband light and detecting an interference pattern at different wavelengths using a specular spectroscopic scatterometer including a wavelength dispersive detector. Misalignment can be discriminated by inspection of a spectral response curve and by comparison with stored spectral response curves that may be empirical data or derived by simulation. Determination of best fit to a stored spectral curve, preferably using an optimization technique can be used to quantify the detected misalignment. Such a measurement may be made on-line or in-line in a short time while avoiding tool induced shift, contact with the mark or use of a tool requiring high vacuum.

Abstract: A system and method include an object supported on a moveable support, an optical system that transmits radiation onto the object, a support having an aperture therethrough, a sensor system coupled to the support, and a control system coupled to the sensor system and the moveable support. The sensor system is arranged with respect to the aperture to measure a surface of the object and send measurement signals to the control system, such that the control system generates control signals received and used by the moveable support to ensure that the surface of the object receiving light transmitted by the optical system through the aperture is in a focus plane of the optical system.

Abstract: It is an object of the present invention to provide a substrate processing apparatus, comprising a housing body mounting unit that is capable of mounting a plurality of housing bodies which can house a plurality of substrates, a processing apparatus main body for processing a substrate extracted from the housing body, a transportation unit for transporting the substrate between the housing body and the processing apparatus main body, a processing control unit for controlling the transportation unit and making it transport the substrate between the housing body and the processing apparatus main body, and a transportation control unit for controlling the transportation unit and making it transport the substrate from one housing body to another housing body without passing through the processing apparatus main body.

Abstract: A method, apparatus, and computer program product for implementing inspection recipe services are provided. The apparatus includes a test structure including a semiconductor substrate and a number of arrays disposed on the semiconductor substrate. The arrays are linearly arranged and spaced equidistant. Each of the arrays corresponds to a reticle field and includes a number of cells. The test structure also includes a defect programmed into every third array. The defect is programmed in the same location on each third array. The test structure further includes an alignment site defined on the test structure for providing a point of reference upon inspection. The alignment site, in conjunction with a modified reticle pitch extending the distance of one reticle field plus a portion of an adjacent reticle field, are used to perform a random mode inspection of selected arrays in the test structure.

Abstract: An array of optical elements for processing a spatially dispersed optical beam including monitoring optical elements for determining the position of the optical beam in the array is disclosed. The monitoring optical elements have a width that varies in ay direction normal to the array axis, enabling the determination of the beam position across the monitoring elements in both x and y directions. The monitoring optical elements are preferably disposed in the end portions of the array for the beam tilt determination. The optical elements can be e.g. liquid crystal pixels or micro-mirrors.

Abstract: A method for measuring information provided by a substrate. The substrate includes a feature that has been created by a lithographic apparatus. The method includes projecting a beam of light onto a marker disposed above and/or near the feature on the substrate, and detecting information provided by the marker with a sensor. A coating is disposed on the substrate so that the coating lies between the beam of light and the feature to substantially prevent the beam of light from being reflected by the feature and causing an inaccurate readout of the information provided by the marker.