Abstract: An optical interrogation system and method are described herein that are capable of detecting and correcting a positional misalignment of a label independent detection (LID) microplate so that the LID microplate can be properly interrogated after being removed from and then re-inserted back into a microplate holder/XY translation stage.

Abstract: A method for determining the position of one of two components in relative motion with respect to each other, using optical means, comprises: directing at least one light beam emitted by a light source attached to one component towards a diffractive support attached to the second component, calculated and manufactured for generating an optical signal indicative of the positioning of said support, the optical signal being produced by the diffractive support in transmission and/or in reflection, and the optical signal including information indicative of its quality; detecting and reading at least one optical code formed by said signal, which corresponds to a unique position of the diffractive support relatively to the beam; and assigning a position to each detected optical code.

Abstract: A particle-optical apparatus comprising: A first source, for generating a first irradiating beam (E) along a first axis (A1); A second source, for generating a second irradiating beam (I) along a second axis (A2) that intersects the first axis at a beam intersection point, the first and second axes (A1, A2) defining a beam plane, A stage assembly (3) for positioning a sample in the vicinity of the beam intersection point, provided with: A sample table (21) to which the sample can be mounted; A set of actuators, arranged so as to effect translation of the sample table along directions substantially parallel to an X-axis perpendicular to the beam plane, a Y-axis parallel to the beam plane, and a Z-axis parallel to the beam plane, said X-axis, Y-axis and Z-axis being mutually orthogonal and passing through the beam intersection point, wherein the set of actuators is further arranged to effect: rotation of the sample table about a rotation axis (RA) substantially parallel to the Z-axis, and; rotation of the sa

Abstract: A system for generating orientation information includes a reflector, an image collection system, and a processor. The image collection system is configured to collect at least two sets of image data, where one set of image data includes a stronger indication of the reflector than the other set of image data. The two sets of image data are collected using at least one reflector with some orientation-specific characteristic or a reflector integrated into a device that includes some orientation-specific structural feature. Once collected, the two sets of image data are used to generate orientation information related to the reflector. In particular, orientation information related to the reflector is generated by taking the difference between the two sets of image data.

Abstract: A position sensing system for an optical metrology system, includes a plurality of photonic devices distributed on a carrier for providing a photonic response when interrogated with a measuring light, wherein a collective photonic response from the plurality indicates the position of the carrier. A method and an optical metrology system are also provided.

Abstract: A position detection method of detecting a position of a detection mark. The method includes a matching step of calculating a value of a correlation using a template for an image including the detection mark, a change step of changing the template to be used for the correlation, a repeat step of, when a value of a correlation in the matching step is not more than a predetermined value, changing the matching processing while changing the template in the change step, and a step of performing position detection on the basis of a result of correlation in the matching step or the repeat step.

Abstract: A wireless substrate-like sensor is provided to facilitate alignment and calibration of semiconductor processing systems. The wireless substrate-like sensor includes an optical image acquisition system that acquires one or more images of targets placed within the semiconductor processing system. Analysis of images of the targets obtained by the wireless substrate-like sensor provides position and/or orientation information in at least three degrees of freedom. An additional target is affixed to a known location within the semiconductor processing system such that imaging the reference position with the wireless substrate-like sensor allows the measurement and compensation for pick-up errors.

Abstract: A position detecting apparatus for detecting position of an object disposed in a first space by receiving light from the object with a light receiving element disposed outside said first space, said position detecting apparatus includes an optical system for directing light from the object to the light receiving element, and a first optical element transmitting light from the object, disposed in a partitioning member for partitioning said first space and space outside said first space, wherein said first optical element is located on a position on or near a pupil plane or a plane conjugate to the pupil plane of said optical system.

Abstract: Systems and techniques for laser metrology. A system may include a laser source and a fanning apparatus configured to generate a fanned laser beam. The fanned laser beam may be scanned across the surface of an object, and may reflect off a plurality of targets positioned on the surface. A position detection module may determine a position of the metrology targets based on the reflected beam.

Abstract: An imaging system and method are provided that use imaging information relating to positions of one or more retroreflectors attached to one or more surfaces of an object of interest to determine the shape and/or displacement of the surface or surfaces on which the retroreflector or retroreflectors are located. A variety of types of information may then be ascertained based on the determination as to the shape and/or displacement of the surface of the object, such as the value of some physiological parameter of a patient, internal and external pressure of an object, acoustical vibrations sensed by a microphone, positions of fingertips on a keyboard, etc.

Abstract: A cost-effective method for detecting the three-dimensional shape of interior spaces such as footwear, prosthesis funnels, etc. is described. For this purpose the inner wall of the interior space is lined with a formfitting, elastic and photogrammetrically marked envelope (2), a series of overlapping recordings of said interior space marked in this way is produced with the aid of one or more imaging devices (4) and from this the 3D-shape of the interior space is determined using photogrammetrical methods. The invention describes various methods of lining the interior space, of guiding the imaging devices (9) into the different recording positions and of the type of the measurable interior spaces.

Abstract: The disclosure relates to an actuating drive for control of an actuating element for automation in process installations. An exemplary actuating device drive for control of an actuating element comprising: a position detection device configured for detection of an actual position of the actuating element; a regulator unit configured for operational connection with the position detection device for comparison of an actual position with a predeterminable set position and for production of an actuating signal for driving the actuating drive, wherein the position detection device has a pattern support, at least part of whose surface is covered by a pattern which can be scanned optically; and a stationary optical scanning device, whose optical axis is aligned with the pattern.

Abstract: A substrate comprises a first mark and a second mark. The first mark comprises a first pattern with at least one mark feature formed by a first material and at least one region formed by a second material. The first and second materials have different material characteristics with respect to a substrate treatment process such that a step height in a direction substantially perpendicular to the surface of the substrate may be created by applying the substrate treatment process. The second mark can be provided with a second step height by applying the substrate treatment process. The second step height is substantially different from the first step height.

Abstract: A method for controlling a scanning signal of a light-electric position measuring arrangement, the method includes in a first mode of operation providing the scanning signal to a control device and the control device comparing an amplitude of the scanning signal with a predetermined level and makes a differentiation as to whether the amplitude lies above or below the predetermined level. In a second mode of operation the method includes reducing the amplitude of the scanning signal by attenuating light within a light beam path, and the reduced amplitude is compared with the predetermined level and generating an indication which is suitable for controlling a basic setting of a scanning head relative to a scale.

Abstract: A user positioning device comprising a stand (1) carrying two positioning markers (5) that are disposed so that each can be seen by a respective one of the eyes of a user, when the user is positioned correctly, and means (7) for forming a light path between each of the eyes of the user and the corresponding positioning marker, the light paths being optically separate from each other relative to the eyes of the user.

Abstract: A method of sensing motion of a sensing device relative to a surface, the method including the steps of: optically imaging a position-coding pattern disposed on or in the surface; independently sensing relative position changes of the sensing device using a motion sensor; generating absolute motion data by determining a plurality of absolute positions of the sensing device relative to the surface using the imaged position-coding pattern; independently generating relative motion data using the relative position changes sensed by the motion sensor; and determining the motion of the sensing device using the absolute motion data supplemented with the relative motion data.

Abstract: Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. 3 or more of the at least 3 optical encoders being connected to the substrate table at different locations in the 3 dimensional coordinate system.

Abstract: A method for measuring a synchronization error between a first stage and a second stage in a scanning exposure apparatus including the first stage which supports a reticle, the second stage which supports a substrate, and a projection optical system which projects a pattern of the reticle onto the substrate, the method comprises the steps of measuring, using a measurement unit, a light intensity distribution formed by a measurement pattern while synchronously scanning a measurement mask which has the measurement pattern and is arranged on the first stage, and the measurement unit arranged on the second stage, and calculating the synchronization error between the first stage and the second stage based on a time change in the light intensity distribution measured in the measuring step.

Abstract: A light source unit (100A) for alignment is provided with a camera (30), a lighting apparatus (102), and furthermore, a changing section (110), an image processing section (112), an extracting section (114) and a setting section (116). The changing section (110) controls drive of a shifting mechanism (118) based on information from the setting section (116), and the lighting apparatus (102) is shifted to a desired position. The image processing section (112) acquires a quantitative data relating to an alignment mark (50) and contrast of its peripheral part (104), based on image pickup information from the camera (30). The extracting section (114) extracts an interval wherein the contrast is optimized as an optimum interval, based on the quantitative data. The setting section (116) gives information to the changing section (110) so that the interval between the lighting apparatus (102) and the alignment mark (50) is the optimum interval.

Abstract: A part of a plate of a predetermined shape detachably mounted on a moving body is detected by an alignment system while the position of the moving body is measured by a measurement unit that sets a movement coordinate system of the movement body, and based on the detection results and the measurement results of the measurement unit corresponding to the detection results, position information of an outer periphery edge of the plate is obtained. Therefore, even if there are no alignment marks on the moving body for position measurement, the position of the plate, or in other words, the position of the moving body can be controlled on the movement coordinate system set by the measurement unit, based on the position information of the outer periphery edge of the plate.

Abstract: An exposure apparatus performs a relative alignment between a reticle and a substrate, and exposes the substrate to light via a pattern formed on the reticle. The exposure apparatus includes a movable stage that carries one of the reticle and the substrate and a position measurement apparatus that measures a position of at least one of the reticle and the substrate. The position measurement apparatus includes an illumination unit configured to emit light toward a mark that indicates the position of the reticle or the substrate, a light intensity measurement unit configured to measure an intensity of the light, an imaging unit configured to capture an image of the mark, a stage position measurement unit configured to measure a position of the stage, and a signal waveform correction unit configured to correct a signal waveform output from the imaging unit based on a change in stage position and a change in illumination light intensity.

Abstract: The invention relates to a device for positioning markings, having a first equipment unit (10), having means (14) for disposing the first equipment unit (10) at a predeterminable first position (18) of a reference face (16), and having optical signal means (20, 22, 50, 54, 60, 62, 64, 66) for generating directional information. According to the invention, it is proposed that the device has a second equipment unit (12, 13), which is positionable relative to the first equipment unit (10) and which has means (20, 22, 28, 50, 54, 60, 62, 64, 66), which make it possible to ascertain the spacing of the second equipment unit (12, 13) from the first equipment unit (10) in the direction predetermined by the first equipment unit.

Abstract: An exposure apparatus exposes each of a plurality of regions arranged on a substrate. The apparatus includes a processor configured to i) cause a measurement device to acquire an image signal of an alignment mark formed in each of plural regions which are at least a part of the plurality of regions and to measure a position of the alignment mark under a plurality of measurement conditions, ii) calculate a feature value of the signal acquired with respect to each of the plural regions under each of the plurality of measurement conditions, and iii) calculate, with respect to each of the plurality of measurement conditions, a coefficient of a transformation equation which transforms a coordinate of a designed position of the alignment mark to a value that approximate the feature value corresponding to the designed position, and a console configured to display information of the calculated coefficients.

Abstract: An exposure apparatus for exposing shot areas on a substrate comprises a measuring device configured to measure a position of an alignment mark in each of the shot areas on the substrate, and a controller configured to generate sample shot sets from the shot areas on the substrate, to cause the measuring device to measure the position of the alignment mark in each of the sample shot sets under each of measurement conditions, to calculate a shot arrangement based on the measured positions with respect to each of combinations of the measurement conditions and the sample shot sets, to calculate a variation of the shot arrangements calculated with respect to the sample shot sets with respect to each of the measurement conditions, and to display the variation calculated with respect to each of the measurement conditions.

Abstract: Linear sensors are provided in two rows along a moving route of a moving body. A relative position of a magnet provided in the moving body relative to the linear sensor is determined, and an origin coordinate of the linear sensor is added to the determined relative position to determine an absolute position of the moving body.

Abstract: A method of scanning an object includes the steps of: providing a digitizer adapter having at least three markers disposed along a target surface thereof, wherein the digitizer adapter includes a spherical member disposed a predetermined distance at its center point to each of the at least three markers; securing the adapter along an outer surface of the object; creating a plurality of digital images of the object; extracting the coordinates of the at least three markers from the image using photogrammetry; calculating the coordinates of the center point of the spherical member based on the coordinates of the at least three markers; generating surface data by scanning the outer surface of the object and the spherical member; calculating the coordinates of the center point of the spherical member based on at least three points from the surface data of the spherical member; and aligning the center point coordinates to facilitate combining the data from the photogrammetric and surface scan processes.

Abstract: A method of determining alignment error in electronic substrates comprises providing on a layer of a substrate a first contrasting set of elements forming a first grid pattern having a plurality of grid segments in the x and y directions. The method also includes providing nested within at least one of the first grid pattern segments, on the same or different layer of a substrate, a second contrasting set of elements forming a second grid pattern having a plurality of grid segments in the x and y directions. The method then includes determining the center of the first set of elements in the first grid pattern and determining the center of the second set of elements in the second grid pattern. The method then comprises comparing the centers of the first and second sets of elements and determining alignment error of the first and second grid patterns.

Abstract: According to a first embodiment of the invention, a first and second reticle are used to form layers using a photolithographic process. The first and second reticles each include a grating positioned so that when the reticles are printed, the two gratings will at least partially overlap each other. The two gratings produce an interference pattern, which is used to measure overlay error.

Abstract: A method detects a center of a wafer having a notch when aligning the wafer mounted on a movable mounting table. The method includes capturing an image of the wafer by using an imaging unit, the image including the notch; extracting an edge line from the image of the wafer; detecting a shape of the notch from the edge line; and calculating the center of the wafer based on the shape of the notch.

Abstract: The invention provides a liquid ejecting head alignment apparatus that is used for positional determination and adhesion of nozzle plates and a fixation member, each of the nozzle plates having nozzle openings through which each of a plurality of liquid ejecting heads ejects liquid and further having alignment marks for positional alignment, the fixation member holding the nozzle-plate side of the plurality of liquid ejecting heads.

Abstract: An apparatus for detecting a position of a mark from a mark signal obtained by capturing an image of the mark includes a signal processor. The signal processor is configured to set a processing window with respect to each of a plurality of positions relative to the mark signal, to calculate an even function intensity of the mark signal in the processing window with respect to each of the plurality of positions, and to detect the positions of the marks based on the even function intensity calculated with respect to each of the plurality of positions.

Abstract: An apparatus and associated method for measuring spatial characteristics of a test object with stacked features. First and second measurement assemblies for measuring opposing first and second planar features, respectively, of a test object, by directing light beams into a gap between the features to measure a position and a static attitude of each feature.

Abstract: The present invention is an optical electronic input device for identifying the coordinates of an object in a given area. The device may capture two-dimensional or three-dimensional input information, using a minimal number of optical units (one for two dimensional coordinates and two for three dimensional coordinates). The invention requires only basic optical elements such as a photo sensing unit, lenses, a light source, filters and shutters which may reduce manufacturing costs significantly. Since this device enables inputting the coordinates of an object in a set area, it may not only be used in systems such as optical touch screens, but also in virtual keyboard applications and in implementation for machine vision.

Abstract: A radiometer includes a sighting system that generates a digital image of an object surface having an area that is to be imaged onto the IR detector. A shape outline is overlaid on the digital image of an object surface to indicate the extent of the energy zone that is imaged onto the IR detector. In one embodiment, a shape is displayed between the locations of two imaged skewed laser dots to indicate the extent of the energy zone without requiring a range determination.

Abstract: An apparatus for detecting a position of a target mark out of a plurality of marks in a region of an object to obtain a position of the region of the object. The apparatus includes a scope configured to sense a first image of the object at a first magnification and a second image of the object at a second magnification higher than the first magnification, and a processor configured to extract, from the first image, a position of a first mark out of the plurality of marks and a feature of a region outside the first mark, to identify the first mark based on the extracted feature, to extract, from the second image, a position of the target mark, to evaluate reliability of the extracted position of the target mark, to select a second mark, different from the target mark, from the plurality of marks as a new target mark based on the evaluated reliability and the identified first mark in order to extract a position of the selected second mark from an image sensed by the scope at the second magnification.

Abstract: The invention describes a method of determining the position of fluorescent markers in a sample (4), with a high spatial resolution. To this end, the sample (4) is illuminated with an exciting light beam (11), while the sample (4) is simultaneously scanned by a particle beam (3). During scanning, markers will be impinged upon by the particle beam (3) and will be damaged, in such a manner that the marker impinged upon will no longer emit fluorescence radiation. This leads to a reduction of the flux of fluorescence radiation. This reduction is detected. Seeing as the position of the particle beam (3) w.r.t. the sample is known at the moment that the marker is damaged, the position of the marker in the sample is, accordingly, also known.

Abstract: Pattern recognition targets including regions of one or more layers of gratings are used for semiconductor fabrication wafer alignment. Grates of the gratings are below the resolution limit of the alignment microscopes, and have dimensions compatible with design rules applied to actual device circuitry. Targets may be located by the contrast of light 0racted back from the regions and through a numerical aperture of the microscope. Target contrast may be achieved by controlling the diffractive properties of the regions. A grating with a pitch that causes a significant amount light to diffract out of the numerical aperture will appear darker, while a grating with a pitch that produces minimal diffraction with appear much brighter. Moreover, for a darker causing pitch, a region of layers gratings having grates stacked on each other can appear even darker, while a region having layers of grates interleaved can appear even brighter.

Abstract: A method and system position a laser beam spot relative to a semiconductor substrate having structures on or within the semiconductor substrate to be selectively processed by delivering a processing laser beam to a processing laser beam spot. The method generates a metrology laser beam and propagates the metrology laser beam along a propagation path to a metrology laser beam spot on or near a structure to be selectively processed. The method detects a reflection of the metrology laser beam from the structure, thereby generating a reflection signal, and determining, based on the reflection signal, a position of the metrology laser beam spot relative to the structure.

Abstract: An exposure apparatus includes an original stage arranged to hold a reflective original having a pattern, a substrate stage arranged to hold a substrate, an illumination optical system arranged to emit exposure light along a first direction inclined from a direction of a reflection surface of the reflective original, a projection optical system arranged to project the pattern onto the substrate along a second direction using the exposure light reflected by the reflection surface of the reflective original, an original reference member arranged on the original stage or the reflective original, a substrate reference member, having a substrate mark, arranged on the substrate stage or the substrate, and a detector arranged to detect light from the substrate mark of the substrate reference number, which is illuminated with light.

Abstract: An object pattern is imaged by an imaging system onto the image plane of the imaging system at a location where a reference pattern suited to the object pattern is situated in order to measure the imaging fidelity of an optical imaging system, for example, an eyeglass lens, a photographic lens, or a projection lens, for use in the visible spectral range. The resultant, two-dimensional, superposition pattern is detected in a spatially resolved manner in order to determine imaging parameters therefrom. The object pattern is generated with the aid of at least one electronically controllable pattern generator that serves as a self-luminous, electronically configurable, incoherent light source and may, for example, have a color monitor. The measuring system allows rapidly, flexibly, checking optical imaging systems with minimal time and effort spent on the mechanical setup required.

Abstract: A measurement system processes data representing an images of an optical target, e.g. on a contact probe, to determine position of each of a number of points on a vehicle or other object. The system uses two reference frames and processes an image of the two frames, to define a three-dimensional (3D) coordinate system, for example, in relation to a designated first frame. The image processing determines the position of the other frame in that coordinate system. For any measurement in which the first reference frame is visible in an image with the probe, processing directly determines position of the point in the 3D coordinate system. For any measurement in which that reference frame is not sufficiently visible, but the second reference frame is sufficiently visible, the image processing determines position relative to the second reference frame and transforms that position into a measurement in the defined three-dimensional coordinate system.

Abstract: A new tracking technique is essentially “sourceless” in that it can be used anywhere with no set-up, yet it enables a much wider range of virtual environment-style navigation and interaction techniques than does a simple head-orientation tracker. A sourceless head orientation tracker is combined with a head-worn tracking device that tracks a hand-mounted 3D beacon relative to the head. The system encourages use of intuitive interaction techniques which exploit proprioception.

Abstract: A position detecting apparatus for detecting position of an object disposed in a first space by receiving light from the object with a light receiving element disposed outside said first space, said position detecting apparatus includes an optical system for directing light from the object to the light receiving element, and a first optical element transmitting light from the object, disposed in a partitioning member for partitioning said first space and space outside said first space, wherein said first optical element is located on a position on or near a pupil plane or a plane conjugate to the pupil plane of said optical system.

Abstract: Various methods and systems measure, determine, or align a position of a laser beam spot relative to a semiconductor substrate having structures on or within the semiconductor substrate to be selectively processed by delivering a processing laser beam to a processing laser beam spot. A metrology laser beam spot is directed to one or more of those structures to be selectively processed (e.g., laser-severable conductive links), and reflections of the metrology laser beam off of those structures to be selectively processed are detected to perform the measurement, determination, or alignment. The processing laser beam can then be accurately directed onto those structures to process them on a selective basis. The various methods and systems thus utilize those structures themselves—rather than relying exclusively on dedicated alignment markers—to perform the measurement, determination, or alignment.

Abstract: As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.

Abstract: Disclose is a combined scatterometry mark comprising a scatterometry critical dimension (CD) or profile target capable of being measured to determine CD or profile information and a scatterometry overlay target disposed over the scatterometry CD or profile target, the scatterometry overlay target cooperating with the scatterometry CD or profile target to form a scatterometry mark capable of being measured to determine overlay.

Abstract: A wireless substrate-like sensor is provided to facilitate alignment and calibration of semiconductor processing systems. The wireless substrate-like sensor includes an optical image acquisition system that acquires one or more images of targets placed within the semiconductor processing system. Analysis of images of the targets obtained by the wireless substrate-like sensor provides position and/or orientation information in at least three degrees of freedom. An additional target is affixed to a known location within the semiconductor processing system such that imaging the reference position with the wireless substrate-like sensor allows the measurement and compensation for pick-up errors.

Abstract: Spectrophotometer color measurement with a target illumination system and a reflected illumination sensing system where the target surface is variably spaced from said spectrophotometer. Color correction calibration information corresponding to color measurements for known different spacings of a test target surface from the spectrophotometer are obtained and stored. In use, the spacing of the actual target surface from the spectrophotometer is measured to provide a target spacing information signal. That signal is automatically combined with the stored color correction calibration information for the corresponding distances to provide at least partial correction of color measurement errors of the spectrophotometer for variable spacing of the target surface relative to the spectrophotometer even with low cost fixed focus optics. The spectrophotometer output can be so corrected by changing the target illumination, such as by LED pulse width changes, and/or by corrective adjustment of the measured reflectances.

Abstract: A system and method of inspecting a semiconductor wafer that may be employed to detect and to characterize defects occurring on an edge of the wafer. The wafer inspection system includes an optical module for providing a light source to scan the wafer edge, a light channel detector for detecting light reflected from the wafer edge, and a processor and memory for converting detected signals to digital form, and for filtering and processing the digital data. The module includes a wafer edge scanning mechanism for projecting a collimated laser beam toward the wafer edge at a predetermined angle of incidence to scan the wafer edge for defects. The light channel detector detects light reflected from the wafer edge to obtain wafer edge data, which are applied to thresholds to determine the location of defects in the wafer edge.

Abstract: A system (100) and method for a touchless tablet that produces a touchless sensory field over a form (111). The touchless tablet includes a touchless sensing unit (110) for identifying a finger action above the form, and a controller (130) communicatively coupled to the sensing unit for associating the finger action with at least one form component on the form. The touchless tablet identifies a selection of a form component (122) based on a location and action of the finger above the form. A display (140) connected to the touchless tablet can expose a graphical application, wherein a touchless selection of a form component corresponds to a selection of a graphical component on the graphical application.