Abstract: An inspection system for inspecting a wafer and an inspection method thereof are provided. The inspection system includes a rotating means for turning and arranging a wafer to an inspection position, an angle measuring means for measuring a rotational angle used by the rotating means to rotate to the inspection position, an inspection apparatus for acquiring inspection data associated with the wafer, and a controller for determining an amending angle from the rotational angle and for amending the inspection data in accordance with the amending angle to calculate amended inspection data, wherein the amended inspection data reflects a state of the wafer on the rotating means.

Abstract: An optical target is provided. In one embodiment, the target is formed on a substrate. The target includes a first layer deposited below a second layer on the substrate. The second layer is deposited below a third layer on the substrate. The first layer has a topographic contour formed thereon, the first layer at least partially projecting a patterned topographical contour through the second layer to the third layer.

Abstract: An alignment target includes periodic patterns on two elements. The periodic patterns are aligned when the two elements are properly aligned. By measuring the two periodic patterns at multiple polarization states and comparing the resulting intensities of the polarization states, it can be determined if the two elements are aligned. A reference measurement location may be used that includes third periodic pattern on the first element and a fourth periodic pattern on the second element, which have a designed in offset, i.e., an offset when there is an offset of a known magnitude when the first and second element are properly aligned. The reference measurement location is measured at two polarization states. The difference in the intensities of the polarization states at reference measurement location and is used to determine the amount of the alignment error.

Abstract: An alignment target includes periodic patterns on two elements. The alignment target includes two locations, at least one of which has a designed in offset. In one embodiment, both measurement locations have a designed in offset of the same magnitude but opposite directions. For example, two separate overlay patterns that are mirror images of each other may be used. Alternatively, the magnitudes and/or directions may vary between the measurement locations. The radiation that interacts with the measurement locations is compared. The calculated difference is extremely sensitive to any alignment error. If the difference between the patterns is approximately zero, the elements are properly aligned. When an alignment error is introduced, however, calculated difference can be used to determine the error. In one embodiment, the alignment target is modeled to determine the alignment error. In another embodiment, additional overlay patterns with additional reference offsets are used to determine the alignment error.

Abstract: The invention relates to a system for the combined shadow-free illumination of a pre-definable area and for referencing three-dimensional spatial co-ordinates, and to an active or passive referencing system, each in particular for referencing surgical or medical instruments. The system is characterized in that at least two cameras and the light source (operation lamp) are held together such that the optical signals detected by the cameras, for referencing three-dimensional spatial co-ordinates in the area illuminated by the light source, can be evaluated. Since the field of view of the light source, in its conventional use, is not obscured or only negligibly obscured, this field of view can simultaneously be used for optical navigation by the cameras held together with the light source. In accordance with the invention, the cameras are automatically aligned optimally for optical navigation. The cameras can be rigidly or flexibly connected to the light source.

Abstract: A coordinate measuring instrument includes a horizontally X-Y displaceable measurement stage for receiving a substrate with a feature that is to be measured, an illumination system, and a detector device. The illumination system includes a light source, an optical fiber bundle, a coupling-in optical system before the optical fiber bundle, a coupling-out optical system after the optical fiber bundle, an illuminating optical system for illuminating an image field, and a homogenizing optical system which is arranged between said coupling-out optical system and said illuminating optical system. The homogenizing optical system homogenizes the non-uniform intensity distribution in the image field of the light emerging from the optical fiber bundle. The light of said light source is picked off via said coupling-in optical system with a large numerical entrance aperture, and is coupled into said optical fiber bundle.

Abstract: In an optical measuring system for determining spatial position and orientation of objects, a plurality of measuring points on the object is registered by cameras, laser measuring devices or a combination thereof. For identifying the measuring points, one target of a specific intensity and/or size or a predetermined pattern (3) of a plurality of targets (4) having specific differing intensities and/or sizes is associated with each measuring point. The intensities and/or sizes of the targets are detected in a pixel image of the target (4) by summing up intensities sensed by pixels included in the image of the target. The targets are light emitting devices consuming differing amounts of energy, reflecting, black or white spots of differing diameter or spots of differing shades of gray or other suitable color.

Abstract: An alignment apparatus for aligning a reflective reticle includes a light source for emitting alignment light, an optical alignment mark provided on the reticle, and a reference mark provided on a reticle stage that holds the reticle. A detecting unit detects the alignment light reflected from the alignment mark and the reference mark, and the reticle is aligned on the basis of the result of detection by the detection unit.

Abstract: A position measuring system that includes a scale having a measuring graduation extending along a first line and a scanning device. The scanning device includes a light source that transmits light beams that scan the measuring graduation, wherein the measuring graduation generates modified light from the transmitted light beams and a detector unit that receives the modified light from the measuring graduation. A lens arrangement, arranged between the scale and the detector unit, the lens arrangement generating a defined image of the measuring graduation on the, detector unit, wherein the defined image extends along a second line, whose curvature is different from a curvature of the first line.

Abstract: A system for certifying laser projection beam accuracy includes a certification fixture having a test pattern and a color background. The certification fixture is configured so that any portion of the laser projection beam reflected from the color background is reflected with a color contrasting to that of the laser beam or of the test pattern. Contrast can be further enhanced by making the pattern of a material that absorbs the laser beam color. Failure of the test is indicated by the presence of any of the laser beam light reflecting from the background. Passage of the test is indicated by the laser beam striking only the test pattern. A functional test pattern tests for both laser beam width and positioning accuracy. A method is provided to use a calibration test pattern to test laser beam width and length projection accuracy independently of one another.

Abstract: A method for tracking the movement and position of mobile agents using light detection and ranging (LIDAR) as a stand-off optical detection technique. The positions of the agents are tracked by analyzing the time-history of a series of optical measurements made over the field of view of the optical system. This provides a (time+3-D) or (time+2-D) mapping of the location of the mobile agents. Repeated pulses of a laser beam impinge on a mobile agent, such as a bee, and are backscattered from the agent into a LIDAR detection system. Alternatively, the incident laser pulses excite fluorescence or phosphorescence from the agent, which is detected using a LIDAR system. Analysis of the spatial location of signals from the agents produced by repeated pulses generates a multidimensional map of agent location.

Abstract: A method of determining relative position between a reflective reticle and a substrate includes a detection step of detecting relative position between a transmissive reference mark on a reticle stage and a substrate alignment mark on a substrate stage through a reflective optical system which projects a pattern of the reflective reticle onto the substrate with extreme ultraviolet light, and a determination step of determining relative position between the reflective reticle and the substrate based on the detection result in the detection step.

Abstract: A remote pointing apparatus including a remote control that generates an optical signal that is periodically expanded and/or reduced around the origin and an optical sensor that detects whether the optical signal is received, and a remote pointing method therefor. The remote pointing method includes projecting an optical signal that is periodically expanded and/or reduced around an origin; detecting whether the optical signal is received using a plurality of optical sensors that are two-dimensionally disposed; and detecting the position of the origin, which exists within a position recognition range including at least a polygon having the optical sensors as vertexes, based on the results of detection of the optical sensors. Since the remote pointing apparatus and method do not need a light receiving panel that is installed to fully cover a display screen or installed in vertical and horizontal directions of the display panel in order to receive a laser beam, a manufacturing cost thereof can be reduced.

Abstract: A method of calibrating a positioning stage includes placing a substrate on the positioning stage. The substrate has a contrast film above a portion of the substrate. At least one pattern is at a predetermined location above the substrate, corresponding to a predetermined location on the positioning stage if the positioning stage has zero offset from a registration position. A beam is applied to a position where the pattern on the substrate would be located if the positioning stage has zero offset. At least one of the group consisting of reflected, transmitted and scattered portions of the beam is measured. Whether the positioning stage has a non-zero offset is detected based on the measured portion of the beam.

Abstract: A carriage moves back and forth under a vehicle and three cameras or laser fixed along one axis pivot in a common plane, utilizing two cameras at time to locate a target fixed to a reference point on the undercarriage of the vehicle. Triangulation calculations, combined with the location of the cameras provide the location of the reference point in space in a three-dimensional coordinate system and compare that location with a stored designed location of the reference point prior to the crash, allowing the vehicle structure to be returned to its designed shape by other equipment.

Abstract: A system and method for use in obtaining precise positional information relating to one or more points. The points may comprise key locations on a large structure allowing for the geometry of the structure to be assessed based on the positional information. In one embodiment, a high accuracy angular resolution and measurement system includes a laser beam source (110), a bi-directional acousto-optic modulator (112), and an optical detector (104). The position of the optical detector (104) is determinable from deflection angles (120, 122) of the laser beam (106) when the laser beam (106) is deflected by the bi-directional acousto-optic modulator (112) in a direction corresponding to one of a plurality of illumination locations (140) coinciding with the position of the optical detector (104) within an illumination region (142) defined by the illumination locations (140).

Abstract: A sensor for a conductive coating delivery system subject to high voltage including a movable member, such as a pig received through a delivery line having a magnet and a sensor in the delivery system subject to high voltage including an optically polarizing device subject to magneto-optical change upon approach of the magnet generating a polarized light signal, optical fibers connected to the sensor receiving the polarized light signal connected to an electrical device situated remotely from the high voltage generating an electrical signal for controlling a valve, metering pump or the like.

Abstract: A mark comprising at least one set of calibration periodic structures and at least two sets of test periodic structures, both types of which are positioned along an axis. The mark is used to measure the relative position between two layers of a device. Each set of test periodic structures has its periodic structures formed within first and second sections. The periodic structures of the first and second sections are each formed on one of the two layers of the device, respectively. The first and second sections of each test set is positioned proximate to the second and first sections of the next test set, respectively. This mark allows two beams which scan the mark to travel over both a test section formed on one layer of the device and a test section formed on the other of the two layers. Scanning multiple test sets provides multiple registration error values which are then averaged to obtain an average registration error value.

Abstract: A first error coordinate between the image coordinate of a first indicator, which is arranged on the real space and detected on a first image captured by a first image sensing unit, and the estimated image coordinate of the first indicator, which is estimated to be located on the first image in accordance with the position/orientation relationship between the first image sensing unit (with the position and orientation according to a previously calculated position/orientation parameter) and the first indicator, is calculated.

Abstract: Methods and apparatus for introducing a plurality of optical markers to a field of view, capturing a two-dimensional image of said field of view on an image plate comprising a pixel array, determining a set of marker origin offset values and using said offset values to establish a set of orientation values describing the relationship between the field of view and the image plate are disclosed. These orientation values are used to relate the area of image captured by each pixel in the image plate to the real world. By applying projective geometry, vector analysis and trigonometrical surveys an image analysis is conducted to establish a three-dimensional positional data set describing the three-dimensional position of regions of reflectivity in the captured two-dimensional image. From this data set a three-dimensional model of the field of view can be reconstructed.

Abstract: A position measuring device having a scanning device and a scale, wherein the scanning device is movable in relation to the scale in a measuring direction. The scale including a measuring graduation, wherein periodic measuring signals are generated when the scanning device scans the measuring graduation and a reference marking, wherein a reference marking signal is generated when the scanning device scans the reference marking with a scanning beam bundle. The scale further includes a first optically scannable area marking next to the reference marking and a second optically scannable area marking next to the reference marking and which has a different optical deflection property than the first optically scannable area marking, wherein photoelectric scanning of the first and second optically scannable area markings with the scanning beam bundle from the scanning device generates an area signal that differentiates characteristics of the first and second optically scannable area markings.

Abstract: A fast wafer positioning method for optical metrology includes three main steps. In the first step, an initial measurement recipe is constructed for the host system and target wafer. In the next step, the host system performs a test run using the initial measurement and the target wafer. In this step, the initial measurement recipe is refined to eliminate positioning errors produced by the host system. In the final step, the refined measurement recipe is used by the host system to process production wafers (e.g., as part of a production environment). This is performed using the information included in the refined measurement recipe without reference to optical images of the wafers being processed.

Abstract: A laser beam positioning device for a laser processing equipment includes a beam scanning unit that scans a laser beam to process a work piece according to a command value; a measurement unit that measures a processed position on the work piece; and a control unit that calculates the command value from coordinates of the processed position and coordinates of a target position. The control unit calculates an unknown parameter matrix, which optimally determines the command value to guide the laser beam onto the target position on the work piece, by weighting the coordinates of the processed position and the command value, according to a distance between the coordinates of the target position and the coordinates of the processed position.

Abstract: A method of detecting relative position of a reflecting-type reticle and a substrate with the reticle having an alignment mark thereon. The method includes a holding step of holding the reticle on a reticle stage which has a reference mark, and a detection step of detecting position of the alignment mark on the reticle based on alignment light reflected from the alignment mark and detecting relative position between the reference mark on the reticle stage and the alignment mark.

Abstract: A motion detection system, and more particularly, a non-contact, movement-measurement and position-tracking device, and a method of applying the device on long, non-textured or regularly textured metal objects at an elevated temperature are invented. The invention takes advantage of the oxidation marks, also known as scale, on the surface of the metal object to track the motion. The oxidation marks are typically random and irregular, providing a means for pattern tracking using imaging technologies.

Abstract: The present invention relates to a method for determining a home position by means of a home position mark on a special microfluidic device type used in a microfluidic system. The method for determining a home position by means of a home position mark on a microfluidic device used in a microfluidic system comprising at least one programmable controller having storage means, a position device being able to communicate with the controller, and a home position mark detector connected to said controller, wherein said method comprises the following steps: scanning a disc for mark edges; rejecting false home mark(s) and identifying a correct home position mark; and determining a home position by use of mark edges of the correct home position mark identified in the previous step. The present invention also relates to a microfluidic system and a computer program product and a computer program product on a computer usable medium.

Abstract: A measurement system and method for detecting and tracking the pose of an object displaceable in a coordinate reference frame. In the system and method a visible target pattern is provided on the object. The visible target pattern includes a series of contrast regions for providing at least two feature points. Each of these feature points is located at a juncture of an optically detectable plurality of edges. Each edge in the optically detectable plurality of edges separates different contrast regions. The method and system determine the location of the feature points by first locating the edges using the change in contrast between contrast regions, and then determining junctures of multiple edges. The method and system also involve a stereoscopic digital camera for generating a pair of digital images of the target pattern and a marker template comprising a set of reference characteristics including a relationship between the feature points.

Abstract: A mark position detecting apparatus includes: an illuminating unit that illuminates a mark on a substrate; an image forming optical system that forms an image of the mark with light from the mark; an adjustment unit that adjusts distortion manifesting at the image forming optical system; an image capturing unit that captures the image of the mark formed by the image forming optical system in which the distortion has been adjusted and outputs image signals; and a calculation unit that calculates a substantial central position of the mark based upon the image signals output by the image capturing unit.

Abstract: An illumination device according to the present invention comprises a light source (1), an optical fiber bundle (4), a coupling-in optical system (3) before and a coupling-out optical system (5) after the fiber bundle (4), and an illuminating optical system (17; 20). A homogenizing optical system (6) between the coupling-out optical system (5) and illuminating optical system (17; 20) brings about a homogenization of the intensity distribution in the image field. The homogenizing optical system (6) advantageously comprises a micro-honeycomb condenser (7) and a lens member (8) which superimpose the exit opening of the fiber bundle (4) in an intermediate image plane (10) to form a homogeneous intermediate image.

Abstract: An apparatus and method for calibrating machine vision measuring systems that have more than one camera are disclosed. A first calibration target is mounted in a fixed relationship to a first camera of the machine vision measuring system. A third camera mounted in a fixed relationship to a second camera of the machine vision measuring system. Second and third calibration targets are mounted in a fixed relationship to one another and viewable by the first camera and by the third camera. A data processor is programmed to compute calibration of the first camera and the second camera, based on a position of the second calibration target relative to the third calibration target and a position of the first camera with respect to the third camera. The apparatus and method provide a way to continuously measure the positions of the cameras used in the measuring system to calibrate the system.

Abstract: An apparatus and method for detecting mispositioned wafers attributable to transfer shift of the wafer are disclosed. A calibration wafer has a target region comprising a pattern of optically distinguishable features from which is determined the position of the calibration wafer within the chamber subsequent to its transfer therein. Preferably, the features comprise a pattern of colors that can be detected by spectroscopy. A preferred form and manner of providing such color features is by way of dielectric thin film filters.

Abstract: A stereoscopic image display apparatus includes: an image display unit 22 for displaying image information corresponding to parallax in a first division and a second division; a divided wave plate filter unit 12 having a frame 41 and disposed adjacent to the first division and the second division of the image display unit, for rotating polarized light of the image information from the first division to a direction different from polarized light of the image information from the second division; and position adjusting means 35R and 35L for acting on the frame of the divided wave plate filter unit and thereby allowing adjustment of a relative position between the image display unit and the divided wave plate filter.

Abstract: An apparatus and method for calibrating machine vision measuring systems that have more than one camera are disclosed. A first calibration target is mounted in a fixed relationship to a first camera of the machine vision measuring system. A third camera mounted in a fixed relationship to a second camera of the machine vision measuring system. Second and third calibration targets are mounted in a fixed relationship to one another and viewable by the first camera and by the third camera. A data processor is programmed to compute calibration of the first camera and the second camera, based on a position of the second calibration target relative to the third calibration target and based on a position of the first camera with respect to the third camera. The apparatus and method provide a way to continuously measure the positions of two or more cameras used in the measuring system, and to use such measurements to calibrate the system.

Abstract: An optical alignment system for use in a semiconductor processing system is provided. The optical alignment system includes a wafer chuck that has an alignment feature integrated into the top surface of the wafer chuck. In addition, a beam-forming system, which is capable of emitting an optical signal onto the alignment feature, is disposed above the wafer chuck. Also, a detector is included that can detect an amplitude of the optical signal emitted onto the alignment feature. In one aspect, the alignment feature can be a reflective alignment feature that reflects a portion of the optical signal back to the beam detector. In additional aspect, the alignment feature can be a transmittance alignment feature capable of allowing a portion of the optical signal to pass through the wafer chuck to the detector. In this aspect, the detector can be disposed below the wafer chuck.

Abstract: An apparatus and method for calibrating machine vision measuring systems that have more than one camera are disclosed. A first calibration target is mounted in a fixed relationship to a first camera of the machine vision measuring system. A third camera mounted in a fixed relationship to a second camera of the machine vision measuring system. Second and third calibration targets are mounted in a fixed relationship to one another and viewable by the first camera and by the third camera. A data processor is programmed to compute calibration of the first camera and the second camera, based on a position of the second calibration target relative to the third calibration target and based on a position of the first camera with respect to the third camera. The apparatus and method provide a way to continuously measure the positions of two or more cameras used in the measuring system, and to use such measurements to calibrate the system.

Abstract: Features of the present invention provide an optical layout that can accommodate the relatively strict enclosure requirements for compact component alignment sensor. Specifically, aspects of the present invention provide a single optical component that reduces the degree of divergence, and preferably substantially collimates light from the plurality of divergent light sources prior to entering the sensing field. In this regard, part count is kept low and the physical size of the optical train itself is relatively small.

Abstract: A method is provided for assessing accuracy of positioning a NC machine having a spindle that is movable along each of at least two mutually orthogonal translational axes. The method Includes creating a master flame of reference relative to the translational axes by moving the machine along first and second translational axes. For each translational axis, coordinates of a target mounted adjacent the spindle are determined at a number of points along the respective translational axis. A linear fit of the coordinates is then calculated so as to create a set of mutually orthogonal axes defining the master frame of reference. Accuracy of positioning the machine in the master frame of reference is checked by positioning the spindle at a number of locations, measuring the coordinates of the target for each location, and determining errors in positioning of the machine by based upon the measured coordinates and machine-determined coordinates.

Abstract: Methods and apparatus for measuring orientation and distance. In one example, an orientation dependent radiation source emanates radiation having at least one detectable property that varies as a function of a rotation of the orientation dependent radiation source and/or an observation distance from the orientation dependent radiation source (e.g., a distance between the source and a radiation detection device). In one particular example, the rotation of the source is determined from a position or phase of the orientation dependent radiation on an observation surface of the source, and the observation distance between the source and the detection device is determined from a spatial frequency of the orientation dependent radiation. In another example, an image metrology reference target is provided that when placed in a scene of interest facilitates image analysis for various measurement purposes.

Abstract: A method of measuring the displacement of the optical axis of an optical microscope having an illumination optical system and a projection optical system includes a step of irradiating the evaluation mark having diffraction grating patterns formed on a substrate with illumination light by way of the illumination optical system and observing the evaluation mark by way of the projection optical system to obtain the brightness of the evaluation mark, and a step of measuring the displacement of the optical axis on the basis of the relationship between the brightness of the image of the evaluation mark and the direction of the diffraction grating patterns of the evaluation mark.

Abstract: A new tracking technique is essentially ”sourceless” in that it can be used anywhere with no set-up, yet it enables a much wider range of virtual environment-style navigation and interaction techniques than does a simple head-orientation tracker. A sourceless head orientation tracker is combined with a head-worn tracking device that tracks a hand-mounted 3D beacon relative to the head. The system encourages use of intuitive interaction techniques which exploit proprioception.

Abstract: A single fiducial mark with at least one characteristic of known value is placed on one or more objects that are examined by a machine vision system. Alternatively, a pre-existing object feature that has a known characteristic can be used. An image acquisition system can be calibrated by examining the objects with a vision tool that can align objects with translation and at least one additional degree of freedom and that can measure the value of the characteristic. In general, information measured by the vision tool can be used to infer similar information concerning the calibration. For example, in one embodiment, the single fiducial mark has a precise dimension and the vision tool can measure the dimension in order to calibrate the scale of the system. In another embodiment, each object to be examined is held in a predetermined position by a fixture on the materials handling system and a fiducial mark is placed on each object.

Abstract: A target system for determining the location of a position on a vehicle comprises a target body, one or more target elements, a trigger, and a point definer. The target elements are disposed on the target body and are detectable by a position determination system. The trigger is positioned on the target body and is remote from the position determination system. The trigger operates the position determination system by selectively changing the detection of one or more of the target elements by the position determination system. The point definer extends from the target body, and the point definer includes a point its a distal end. The point is capable of being located adjacent the position on the vehicle and is at a known location from the target body. The position determination system determines a location of the target body after detecting the target elements disposed on the target body. Methods of using the target system are disclosed.

Abstract: A coordinate inputting/detecting apparatus, for optically detecting a position of a designating device inserted into a flat or substantially flat two-dimensional coordinate inputting/detecting area, and including a coordinate determining device to determine two-dimensional coordinates of the designating device in the area. A distance determining device determines a distance of the designating device from a surface of the area when the designating device is located on or in vicinity to the area. A storing device stores information of the determined coordinates and information of the determined distance. A coordinates change detecting/storing device detects and stores a change of the coordinates information. A distance change detecting/storing device detects and stores a change of the distance information. A state allocating device allocates at least one designating state among designating states of the designating device stored in advance, based upon the coordinate change and distance change information.

Abstract: An offset measuring board is formed of a rectangular metal plate which can be positioned at a component mounting position by a positioning device and which has at least in proximity to one corner portion thereof a recognition through hole, serving as a recognition mark, having a black bottom face within a recessed portion.

Abstract: The present invention is a system and method of precisely locating a football on a football field in order to determine whether a first down has been achieved. The invention employs an optical distance measuring device that communicates via a wireless transceiver with a portable display device controlled by an on-field official. The portable display device is equipped with an operator interface used to request measurements of the ball location and is suitably programmed to calculate whether a first down has been achieved based on first and second ball location data points.

Abstract: Disclosed is a pattern forming method, in which a mask blank for preparation of a photomask is exposed in a desired pattern to form a mask pattern on the mask blank. Position measuring marks are formed on the diagonally facing corners of a main surface of the mask blank to detect a defect on the main surface of the mask blank. The relative positions of the detected defect and the mask pattern that is to be formed on the mask blank are compared, and the pattern position is selected such that the defect overlaps with the pattern. Then, the position measuring marks are measured to calculate the exposure position, and exposure treatment is applied to the selected position.

Abstract: A new tracking technique is essentially “sourceless” in that it can be used anywhere with no set-up, yet it enables a much wider range of virtual environment-style navigation and interaction techniques than does a simple head-orientation tracker. A sourceless head orientation tracker is combined with a head-worn tracking device that tracks a hand-mounted 3D beacon relative to the head. The system encourages use of intuitive interaction techniques which exploit proprioception.

Abstract: An object of the invention is to provide a position measuring apparatus which can measure position information of a mark formed on an object with high accuracy, and an exposure apparatus which can perform exposure by performing alignment highly accurately, based on the highly accurate position information measured by the position measuring apparatus, and as a result, can realize fine processing. In order to achieve the object, the present invention is a position information measuring apparatus for measuring position information of an alignment mark, by converting an image Im1 of an alignment mark formed on an image pickup plane F1 of an image pickup device into image information, while scanning the image Im1 in a scanning direction SC1, and performing calculation processing with respect to the obtained image information, wherein the measuring direction D11 of the image Im1 of the alignment mark is set so as to be orthogonal to the scanning direction SC1.

Abstract: The present invention discloses a displacement measurement marker capable of measuring displacement of an object moving on a plane by using a line scan camera, and a displacement measurement method using the same. The displacement measurement marker according to the present invention comprises a plurality of repeatedly arranged figures having the same size and shape. Each of the figures is measurable by means of the line scan camera and is asymmetric with respect to a direction of a scan line of the line scan camera. Preferably, each of the figures is a right-angled triangle of which base is a horizontal line. According to the present invention, there are advantages in that a two-dimensional planar motion of the object can be measured from one-dimensional linear image data, and the motion of the object which moves at a high speed or on which an impact is exerted can be accurately measured.

Abstract: In an optical measuring system for e.g. determining spatial position and orientation of objects a plurality of measuring points on the object is registered by cameras, laser measuring devices or a combination thereof. For identifying the measuring points, one target of a specific intensity and/or size or a predetermined pattern (3) of a plurality of targets (4) having specific differing intensities and/or sizes is associated to each measuring point. The intensities and/or sizes of the targets are detected e.g. in a pixel image of the target (4) by summing up intensities sensed by pixels being comprised in the image of the target. The targets are e.g. light emitting means consuming differing amounts of energy, reflecting, black or white spots of differing diameter or spots of differing shades of gray or other suitable color. Three to five grades of intensity and/or size can be realized easily.