Abstract: A method for determining the position of an edge bead removal line of a disk-like object having an edge area and an alignment mark on the edge area is disclosed, wherein the edge area including the edge bead removal line is imaged on a line-by-line basis, an intensity profile I of the imaged edge area including the edge bead removal line is obtained with a camera on a line-by-line basis, and the edge area and the alignment mark are detected, wherein the local intensity maxima I?max of the intensity profile I are plotted as points in a diagram, segment sets are formed in the diagram, the segment sets are fitted in ellipses, and a quality criterion qges is determined for each ellipse.

Abstract: There is provided an optical displacement detection mechanism in which, even if a measurement object changes, a detection sensitivity and a ratio of a noise are adjustable without depending on optical characteristics such as reflectivity, or a shape and mechanical characteristics of a measurement object, an influence of a thermal deformation of the measurement object by an irradiated light to the measurement object can be made small, and a measurement accuracy can be ensured under optimum conditions.

Abstract: Structures of a backside of a wafer can be aligned to structures of a frontside of the wafer for a lithographic treatment of the backside. The wafer is transparent for electromagnetic radiation of a specific wavelength. The wafer is placed on a wafer stage such that the frontside is facing the wafer stage and the backside is facing alignment optics. The backside is illuminated with electromagnetic radiation of the specific wavelength in a dark-field configuration, such that the electromagnetic radiation propagates through the wafer towards three-dimensional structures of a three-dimensional alignment target located at the frontside or inside the wafer and is scattered at the three-dimensional structures. The scattered electromagnetic radiation is captured with the alignment optics, and the backside is aligned to the frontside of the wafer based on the scattered electromagnetic radiation.

Abstract: Apparatus and methods for calibrating a laser projection system that is used for marking and guidance of components during manufacturing are disclosed. The apparatus includes a structural frame. One or more positioning stages are coupled to the structural frame. Each of the positioning stages is provided with a movable reflective target that is configured to reflect a corresponding laser beam.

Abstract: A detector for detecting a position of a mark comprises: an image sensing device; an optical system which projects the mark onto an image sensing surface of the image sensing device; a pattern located in a position between the image sensing surface and an optical element located closest to a plane on which the mark is to be located, among optical elements forming the optical system, the position being optically conjugated with the plane; and a processor which calculates a position of the mark with respect to one of a position of the pattern and a position already known from the position of the pattern, based on a moire pattern formed on the image sensing surface by the mark and the pattern.

Abstract: A method of measurement of at-resolution overlay offset may be implemented in a scatterometer. At least three targets are provided on a wafer, each target comprising a first marker grating and a second interleaved marker grating and each target having a different overlay bias between its first and second marker. The first and second markers are provided by subsequent lithography steps in a double patterning lithographic process. The targets are measured with a scatterometer and for each target a measured CD of at least one of the markers is determined using reconstruction. The CD of the first marker may be fixed in the reconstruction. The measured CDs and at least one of the overlay biases is used to determine an overlay result corresponding to a minimum measured CD. The overlay result may be determined by fitting a function such as a parabola to the measured CDs and the overlay biases and determining the overlay at the minimum of the fitted function.

Abstract: A system for overlay offset measurement in semiconductor manufacturing including a radiation source, a detector, and a calculation unit. The radiation source is operable to irradiate an overlay offset measurement target. The detector is operable to detect a first reflectivity and a second reflectivity of the irradiated overlay offset measurement target. The calculation unit is operable to determine an overlay offset using the detected first and second reflectivity by determining a predetermined overlay offset amount which provides an actual offset of zero.

Abstract: A method for detecting alignment of a door surround structure. The method comprising the steps of mounting a light source to one side of the door surround structure; mounting a target to an opposite side of the door surround structure, the target comprising a marking and configured to receive a light beam from the light source; and determining a distance between the marking and the light beam on the target; wherein an alignment is detected based on the distance between the marking and the light beam on the target.

Abstract: An instrumented fastener (e.g., a “tack” fastener) includes one or more light sources (e.g., light-emitting diodes) configured to produce a light beacon that includes encoded information regarding the instrumented fastener (e.g., part number), wherein the direction of the light beacon can be used to align external and/or internal assembly systems to the instrumented fasteners. The light beacon may be activated automatically, or via an instruction received from an external system. Once aligned, the assembly system may, for example, proceed with installing permanent fasteners between neighboring tack fasteners.

Abstract: An imprint lithography apparatus is disclosed, the apparatus including a substrate table arranged to support a substrate having a first surface to be imprinted and a second surface, facing the substrate table, comprising a substrate alignment mark, a template holder arranged to hold a template to imprint the first surface of the substrate, and an alignment system arranged to align the template to a substrate alignment mark provided on the substrate, wherein the substrate table further comprises a substrate table optical system to allow the substrate alignment mark to be viewed by the alignment system.

Abstract: An image forming apparatus includes: a functional element substrate to which a pixel is formed in a predetermined cycle; an opposed substrate formed on the functional element substrate; and an optical device arranged on the opposed substrate, which includes a transparent layer and an optical absorption layer arranged in a cycle of 1/n (n is an integer number) of the cycle of arranging the pixel, and restricts spread of transmitted light.

Abstract: A first driving section and a second driving section apply a drive farce in an X-axis direction, a Y-axis direction, a Z-axis direction, and a ?x direction, respectively, with respect to one end and the other end of a fine movement stage whose one end and the other end in the Y-axis direction are each supported, so that the fine movement stage is relatively movable with respect to a coarse movement stage within an XY plane. Accordingly, by the first and the second driving sections making drive forces in directions opposite to each other in a ?x direction apply simultaneously to one end and the other end of the fine movement stage (refer to the black arrow in the drawing), the fine movement stage (and the wafer held by the stage) can be deformed to a concave shape or a convex shape within a YZ plane.

Abstract: A position measuring target includes four or more reference points and a plurality of shading pattern portions. The four or more reference points are defined on a plane. The references points have positional relationships among them. The plurality of shading pattern portions corresponds a plurality of geometric curved surfaces in relation to the degree of shading used for defining the reference points.

Abstract: The present invention provides a position detection apparatus including a sensor in which a plurality of regions where light from a mark formed on a substrate held by a stage is detected are arrayed in a first direction, a driving unit configured to drive the stage, a control unit configured to control the driving unit so as to drive the stage in a second direction perpendicular to a height direction of the substrate, so that the light guided from the mark to the sensor enters the plurality of regions while moving in the first direction, and to drive the stage in the height direction of the substrate, and a processing unit configured to process the signals from the sensor, wherein the processing unit determines a position of the substrate in the height direction, which exhibits a peak in a light intensity distribution in the first direction generated by the signals.

Abstract: An optical target for temporary application in non-determined placement on a surface of an object such as a vehicle wheel assembly within the field of view of an imaging sensor of a machine vision vehicle service system. The optical target consists of a flexible body which is relatively thin and generally flat, capable of conforming to the contours of a surface onto which it is secured in releasable manner by a means of adhesion. A set of visible optical elements are disposed on a front face of the target body for observation and imaging by the imaging sensors.

Abstract: A combined metrology mark, a system, and a method for calculating alignment on a semiconductor circuit are disclosed. The combined metrology mark may include a mask misregistration structure and a wafer overlay mark structure.

Abstract: Disclosed is a method of determining higher order distortions of a patterning device of a lithographic apparatus, and associated apparatus. The higher order distortions are measured using the transmission imaging device. In a main embodiment, enhanced reticles are used which may have additional alignment gratings in the perimeter, in the scribe lanes of the image field or in the image field itself.

Abstract: Methods are disclosed wherein the structural health of a civil structure, such as, but not limited to, a bridge or the like is measured by electronic distance measurement from a plurality of stable locations to a plurality of cardinal points on the structure in a methodical manner. By measuring the coordinates of the cardinal points, the dynamic and long-term static behavior of the structure provide an indication of the health of the structure. Analysis includes; comparison to a Finite Element Model (FEM), comparison to historical data, linearity, hysteresis, symmetry, creep, damping coefficient, and harmonic terms.

Abstract: An overlay measuring apparatus includes a light source which generates visible light with a plurality of wavelengths, an optical module which selects visible light with a single wavelength from the visible light generated by the light source, makes the visible light with a single wavelength incident on a plurality of overlay patterns, and uses visible light reflected from the plurality of overlay patterns to project the overlay patterns with a predetermined color, an imaging unit which acquires images of the plurality of overlay patterns according to individual wavelengths of the visible light and acquires corresponding image signals, and a control unit which outputs a control signal to the optical module so that the optical module can project the overlay pattern with a specific color using information associated with the individual wavelengths of the visible light that is used to project the overlay pattern image selected by a selection unit.

Abstract: The invention relates to a focusing and positioning ancillary device for a particle-optical scanning microscope, a particle-optical scanning microscope including a corresponding positioning aid, and a method for focusing and positioning an object in a particle-optical scanning microscope. The focusing and positioning ancillary device includes an illuminating device, a camera, a display and a control unit. The illuminating device produces a collimated or focused light beam at an angle to the particle-optical beam axis which intersects the particle-optical beam axis at a predetermined position. The camera is sensitive to the wavelength of the light beam and records an image of the object, which is positioned on the object table, at a second angle to the particle-optical beam axis. The control unit produces an image captured by the camera on the display together with a marking which indicates the position of the particle-optical beam axis in the image.

Abstract: The present invention provides a detection apparatus which detects an upper-surface mark and lower-surface mark formed on an upper surface and lower surface, respectively, of a substrate, the apparatus including an optical system configured to form an image of the lower-surface mark on a light-receiving surface of a photoelectric conversion device using a first light, with a wavelength which is transmitted through the substrate, which is emitted by a light source, applied to the lower-surface mark from the upper surface of the substrate, and reflected by the lower-surface mark, and to form an image of the upper-surface mark on the light-receiving surface of the photoelectric conversion device using a second light, with a wavelength which is not transmitted through the substrate, which is emitted by the light source, applied to the upper-surface mark from the upper surface of the substrate, and reflected by the upper-surface mark.

Abstract: A mark used in the determination of overlay error comprises sub-features, the sub-features having a smallest pitch approximately equal to the smallest pitch of the product features. The sensitivity to distortions and aberrations is similar as that for the product features. When the mark is developed the sub-features merge and the outline of the larger feature is developed.

Abstract: An image position detecting device includes a light irradiating unit and a photodetector. The light irradiating unit is disposed so as to face a movable body which is being moved in a certain direction. The light irradiating unit irradiates any of marks formed on the movable body with light having a wavelength in an ultraviolet range at a time. The marks are formed of color components, respectively. The photodetector is provided separately from the light irradiating unit to face the movable body. The photodetector detects light having a wavelength in the ultraviolet range from light regularly reflected by the irradiated mark.

Abstract: A method serves for the determination of the 3D coordinates of an object (1). An improved method of this kind is characterized in that the object (1) is surrounded by a plurality of reference probes (2, 3, 4, 5, 6) having coded reference marks (7, 8); and in that a plurality of shorts (10) are taken of the object (1) such that a part of the object (1) and a part of a reference probe (2, 3) is in each case included thereon.

Abstract: When a liquid immersion area (liquid) formed on a wafer stage is moved onto another wafer stage, a fine movement stage position measuring system measures positional information of the wafer stage, interferometers of a coarse movement stage position measuring system measure positional information of the another wafer stage, and different interferometers measure positional information of the wafer stage. Based on these measurement results, the wafer stage and the another wafer stage are made to be in proximity to each other and are driven while the scrum state is maintained, and thereby the liquid immersion area (liquid) formed on the wafer stage can be moved onto the another wafer stage.

Abstract: A method for evaluating three-dimensional (3-D) coordinate system measurement accuracy of an optical 3-D measuring system using targeted artifacts is provided. In this regard, an exemplary embodiment of a method for evaluating 3-D coordinate system measurement accuracy using targeted artifacts comprises: taking a series of measurements from different positions and orientations using target dots on a targeted artifact with an optical 3-D measuring system; and calculating measurement errors using the series of measurements. An exemplary embodiment of a targeted artifact used with the method includes a base and target dots located on the base.

Abstract: A three-dimensional measurement apparatus comprises: a model holding unit configured to hold a three-dimensional shape model of a measurement object; a determination unit configured to determine a distance measurement region on the measurement object based on information indicating a three-dimensional shape of the measurement object; an illumination unit configured to irradiate the measurement object with a predetermined illumination pattern; an image sensing unit configured to sense an image of the measurement object while the illumination unit irradiates the measurement object; a distance calculation unit configured to calculate distance information indicating a distance from the image sensing unit to the measurement object based on region corresponding to the distance measurement region within the sensed image; and a position and orientation calculation unit configured to calculate a position and orientation of the measurement object based on the distance information and the three-dimensional shape model.

Abstract: A first method determines a position of a point of interest on a target object surface in a target object coordinate system using orientation and distance measurements of a pointing instrument in an instrument coordinate system. A second method determines an orientation of a pointing instrument in an instrument coordinate system for the instrument to be aligned with a point of interest on a target object surface having a target object coordinate system, wherein a position of the point of interest in the target object coordinate system is known. A third method controls orientation of a laser beam of a laser in an instrument coordinate system for the laser beam to trace an image on a target object surface having a target object coordinate system, wherein positions of points for the image on the surface of the target object in the target object coordinate system are known.

Abstract: A semiconductor device includes an alignment mark. A probe beam is scanned on the alignment mark so as to detect a position coordinate of the alignment mark, and the alignment mark comprises a plurality of bar marks which are arranged in a first predetermined interval along a first direction of scanning the detection beam. Each of the plurality of bar marks comprises a plurality of interconnection marks which are arranged along a second direction orthogonal to the first direction, and a first space between adjacent two of the plurality of interconnection marks is shorter than a wavelength of the detection beam within a range of a design constraint.

Abstract: A method is disclosed whereby a laser-based spherical coordinate measurement system is dynamically calibrated. A mechanical oscillator, such as, but not limited to, a Foucault pendulum is used to generate periodic motions which can be fitted to Fourier series models. The residuals between the experimental measurements and the model can provide information which can be used to calibrate the instrument. The calibration information is used to augment the ASME B89.4.19-2006 standard to improve sensitivity to cyclic errors and include the servo systems.

Abstract: The invention relates to a method for length and/or velocity measurement, in particular for positioning tasks, in which an optical sensor carries out a length and/or velocity measurement on a measurement object in a contactless manner, wherein the optical sensor carries out the length and/or velocity measurement via an image processing method, via a spatial frequency filter method and/or by way of a laser Doppler method and reference markings are recognized by the optical sensor, and to a corresponding apparatus. The object of providing a simple method and a simple apparatus for length and/or velocity measurement which offers a higher degree of measurement reliability with the result that it can also be used in safety-relevant areas of application is achieved by evaluation means carrying out reference marking recognition operations and by a plausibility test being carried out, in which a signal is generated as a function of the result of the plausibility test.

Abstract: An analyzing device 1 includes position detection marks 18, each having one of a reflective surface, a refractive surface, and a light shielding surface that block output light incident on a sensor 113 from a light source 12 when the output light reaches a rotation detection position just before or behind measurement spots 17a, 17b, and 17c of the analyzing device 1. Output signals from the sensor 113 for reading the measurement spots 17a, 17b, and 17c are stored in a memory 28, the positions of the measurement spots 17a, 17b, and 17c are determined based on light receiving data stored in the memory 28, and only a desired analyzing signal is extracted. Thus even when the number of measurement spots increases, it is possible to read the measurement spots without adding any components.

Abstract: An apparatus performs an alignment measurement for a mark of each of at least two shots selected from a plurality of shots on a substrate, and positions the substrate based on the alignment measurements to transfer a pattern to each the plurality of shots. The apparatus comprises a detector configured to detect the mark and a controller configured to control the alignment measurements. The controller is configured to cause the detector to detect two of the mark, and decide whether the alignment measurements include an erroneous measurement based on whether a distance between the two of the mark detected by the detector is outside a tolerance.

Abstract: A sensor system for analyzing a feature in a sensing volume. The sensor system includes a laser source and a sensor. The first laser source projects a laser line into the sensing volume and onto the feature forming a laser stripe on the feature. The sensor images the laser stripe where the laser line intersects with the feature. The relationship between the sensor and the first laser source is precalibrated. The sensor uses the laser stripe to determine the position and/or orientation of the feature.

Abstract: A metrology system (1) and a method for determining low order errors are disclosed. At least one measurement objective (9) for the determination of the position of structures (3) on a substrate (2) is provided. The substrate (2) to be measured rests in a support on three points of support (52). The support exhibits an opening (53) for measuring the substrate (2). At least two marks (54) are provided on the support for the mask (2) in such a way that the marks (54) are capturable with the measurement objective (9) by moving the measurement table (20). Furthermore the substrate (2) in the support does not screen the marks (54) on the support.

Abstract: A method for determining the position of one of two components in relative motion with respect to each other, using optical means, comprises: directing at least one light beam emitted by a light source attached to one component towards a diffractive support attached to the second component, calculated and manufactured for generating an optical signal indicative of the positioning of said support, the optical signal being produced by the diffractive support in transmission and/or in reflection, and the optical signal including information indicative of its quality; detecting and reading at least one optical code formed by said signal, which corresponds to a unique position of the diffractive support relatively to the beam; and assigning a position to each detected optical code.

Abstract: An apparatus includes a measurement station configured to perform a measurement including a reference mark measurement in which a position of a reference mark provided on a stage that supports a substrate is measured, an alignment measurement, and a focus measurement, and an exposure station configured to perform exposure of the substrate by using a result of the measurement, wherein the apparatus performs the measurement of (N+1)th substrate in parallel with exposure of the Nth substrate wherein N is a natural number, and wherein, when time taken to perform the exposure of the Nth substrate is longer than time taken to perform the measurement of (N+1)th substrate in parallel with the exposure, the apparatus performs again the reference mark measurement.

Abstract: The mark position detection device of the present invention, which detects a position of a mark provided on a substrate, includes an image sensor with changeable resolution and readout area, an optical system that directs light reflected from the mark to the image sensor, and a control unit configured to detect the position of the mark based on an output of the image sensor. The control unit performs a first position detection based on the output of the image sensor with a first resolution and a first readout area, and a second position detection based on the output of the image sensor with a second resolution, which has higher resolution than the first resolution, and a second readout area, which is determined to be narrower than the first readout area and lies within the first readout area based on the first position detection.

Abstract: A position sensing system for an optical metrology system, includes a plurality of photonic devices distributed on a carrier for providing a photonic response when interrogated with a measuring light, wherein a collective photonic response from the plurality indicates the position of the carrier. A method and an optical metrology system are also provided.

Abstract: A position detection apparatus includes an imaging system, an illumination system including a rotary table having first and second aperture stops, both of which can be positioned on the pupil plane of the illumination system, a first image sensor that detects the image of the mark formed by the imaging system, a second image sensor that senses an image of the aperture stop for the imaging system and that of the first aperture stop, and a controller. The controller corrects the first aperture stop so as to reduce the adverse influence of a displacement of the first aperture stop, based on sensed images of the aperture stop for the imaging system and the first aperture stop. Based on the detected position of the image of the mark, the apparatus detects the position of an object to be detected using the illumination light having passed through the corrected first aperture stop.

Abstract: A substrate of the invention has a positioning marker formed with a light absorbing agent that selectively absorbs light of a specific wavelength region or with a light reflecting agent that selectively reflects light of a specific wavelength region. Preferably, the light of a specific wavelength range is near infrared light, infrared light, near ultraviolet light, or ultraviolet light. Preferably, the positioning marker is formed on a rear surface of the substrate.

Abstract: A method and apparatus 10 for detecting the height of non-flat and transparent substrates using one or more reflectors 30 patterned on the surface of the substrate 40 and adjusting the position of the substrate in its holder based on measurement of the height of the reflectors in comparison to a calibration marker 60 on the holder and using appropriate spacers 50 with appropriate thickness to adjust the placement of the substrate at various locations to place the greatest portion of the substrate in an optimal focal range of the lithography system.

Abstract: The throughput of the alignment in an alignment apparatus is improved. There is provided an alignment apparatus for aligning a substrate having an alignment mark, including a first aligner that aligns the substrate to a first reference position, a second aligner that aligns a substrate holder to a second reference position before the substrate holder holds the substrate, and a position detector that detects a position of the alignment mark of the substrate after the substrate holder holds the substrate.

Abstract: Systems and techniques for laser metrology. Two or more fanned probe beams are scanned relative to a surface including one or more targets. A position detection module receives return beam information from the fanned probe beams, and determines a position of at least a first target of the one or more targets based on the return beam information.

Abstract: The invention relates to an image for detection of an aerial pattern comprising spatial differences in radiation intensity in a cross section of a beam of radiation in a lithographic apparatus for exposing a substrate. The image sensor comprises a lens (5) arranged to form a detection image of the aerial pattern and an image detector (6) arranged to measure radiation intensities in a plurality, of positions in the detection image.

Abstract: An anomaly detection system and a method thereof are disclosed. The system comprises at least a light reflecting unit, a light-emitting unit, an image pick-up unit and a processing module. Each of the light reflecting unit is disposed on an object-to-be-detected that all of which are capable of reflecting light emitted from the light-emitting unit and thus cooperatively generating a reflection image relating to the object-to-be-detected to be received by the image pick-up unit for enabling the same to generate an image signal accordingly. The image signal is then transmitted to the processing module where it is analyzed and compared with a standard image signal so as to determine whether the position of the object-to-be-detected is abnormal.

Abstract: A pitch measurement method of performing noncontact measurement of a pitch of target portions, the target portions being provided in an object and adjacent to each other, includes moving the object such that the target portions move along a same path, continuously acquiring and storing optical data of the target portions passing a predetermined position on the path from a fixed position, while focusing on the predetermined position, calculating a focusing evaluation value representing a degree of focus at an area corresponding to the predetermined position, using a movement distance of the target portions as a variable, according to a relationship between the optical data and the movement distance, and obtaining a point group of combinations of the movement distance and the focusing evaluation value, and applying a reference curve to the point group, thereby determining the pitch based on a position where the reference curve is applied.

Abstract: A register mark detecting apparatus detects a transparent register mark printed on a conveyed transparent web. The register mark detecting apparatus includes a light source, a parallel light flux irradiation optical system, a collective optical system, a knife-edge, and a light receiving element. The parallel light flux irradiation optical system converts a light flux from the light source into a parallel light flux to irradiate a transparent web with the parallel light flux. The collective optical system collects the light flux transmitted through the transparent web. The knife-edge is disposed near a back focus of the collective optical system. The knife-edge interrupts the light flux going straight in the transparent web and causes only the light flux refracted by being transmitted through the transparent register mark to pass by. The light receiving element receives the light flux transmitted through the knife-edge.

Abstract: A conductive line pattern of a pad area includes a plurality of terminals arranged side by side. Each terminal includes an opening portion with a side edge and a line portion connecting with the side edge of the corresponding opening portion. The relative position of each line portion and the corresponding opening portion varies according to the location of the terminal in the pad area.

Abstract: A tape feeder includes a feeding member which feeds a carrier tape having feed holes in its lengthwise direction, and accommodating pockets which are arranged in the lengthwise direction, accommodate respective circuit components and have a predetermined position relative to the holes. The feeding member feeds the tape so that the circuit components are sequentially positioned at a component-supply position. The tape feeder also includes a tape-support surface which supports a surface of the tape and which has, in a path-related portion thereof located along a path of movement of the holes, one or more optical-characteristic giving portions each of which is larger than one of the holes and has a first optical characteristic that is given to the one hole and is recognized differently by an optical recognizing device than a second optical characteristic of another portion of the path-related portion.