Abstract: An optical material includes lithium tantalate, and a molar composition ratio of lithium oxide and tantalum oxide (Li2O/Ta2O5) in the lithium tantalate is in the range of 0.975 to 0.982. Since an optical material having a high refractive index is provided in an optical unit, at the same focal distance, a lens thickness can be significantly reduced. As a result, an optical electronic component and an optical electronic device including the optical material has a reduced size and thickness and is highly functional.

Abstract: An electro-optic window is made of a material substantially transparent to infra-red radiation and is treated to have reduced RF transmission characteristics by the provision of carbon nanotubes within the window or on at least one, surface thereof.

Abstract: In order that an image pickup lens, an image pickup module, a method for manufacturing an image pickup lens, and a method for manufacturing an image pickup module may be realized each of which makes it possible to realize a higher resolution of a periphery of a formed image, an image pickup lens of the present invention satisfies the following formulas (1)and (2): 0.080<d1/d2<0.22??(1); and d1?/d1<1.00??(2) where: d1 is a center thickness of the single lens; d1 is a thickness of a lateral side of the single lens; and d2 is a length in air between the image surface and a center of that surface of the single lens which faces the image surface.

Abstract: A stacked disk-shaped optical lens array, a stacked disk-shaped lens module array and a method of manufacturing the same are revealed. The stacked disk-shaped optical lens array is produced by stacked disk-shaped optical lens modules whose optical axis is aligned. The stacked disk-shaped lens module array is produced by a stacked disk-shaped optical lens array whose optical axis is aligned by an alignment fixture, stacked and assembled with required optical element arrays. In the stacked disk-shaped lens module array produced by this method, the lens optical axis is aligned precisely. Moreover, the manufacturing process is simplified and the cost is reduced.

Abstract: A stacked disk-shaped optical lens array, a stacked lens module and a method of manufacturing the same are revealed. The stacked disk-shaped optical lens array is produced by at least tow disk-shaped optical lens arrays whose optical axes are aligned. After the optical axes of the stacked disk-shaped optical lens array being aligned by alignment fixtures, the stacked disk-shaped optical lens array is cut to produce a single stacked optical lens element. The optical lens element and optical elements required are mounted into a lens holder to form the stacked lens module. The stacked lens module produced by the method has optical lens elements whose axes are aligned precisely. The processes for manufacturing lens modules are simplified and the cost is reduced.

Abstract: A lensholder holds at least one fixed optical lens and a variable focusing element in a spaced relation along an optical path through which light passes in an electro-optical reader. The variable focusing element has a pair of electrodes across which a voltage is applied to optically modify the light passing through the fixed optical lens and the variable focusing element. The lensholder directly electrically conductively contacts the electrodes and establishes an electrically conductive path between each electrode and an exterior of the lensholder.

Abstract: An object of the present invention is to provide a resin composite-type optical element capable of cutting off ultraviolet light even though it uses a photocurable resin. A resin composite-type optical element of the embodiment of the present invention is a resin composite-type optical element having a base material and a resin layer, and the resin layer has at least a first resin layer which is a molded product of a photocurable resin and which has an internal transmittance of not less than 85% for light of the wavelength of 400 nm in the thickness of 100 ?m and an internal transmittance of not more than 3% for light of the wavelength of 360 nm in the thickness of 100 ?m.

Abstract: An EUV projection lens includes a substrate and concentric diffraction patterns on the substrate. The concentric diffraction patterns have an out-of phase height with respect to EUV light and include a material through which the EUV light has a transmittance higher than about 50% at the out-of phase height. The EUV projection lens has a high first order diffraction light efficiency and an optic system having the EUV projection lens has a high resolution.

Abstract: A surface plasmonic polariton lens is disclosed that has an optical plate having incident thereupon waves of electromagnetic radiation. The plate also has a thin metal film of a metal having a negative permittivity. There are slits in the thin film, the slits being of decreasing radial width, and decreasing radial separation at increasing radius and being for the transmission therethrough of diffracted waves of the electromagnetic radiation. There are rings between the slits, the rings being of decreasing radial width at increasing radius and being for the transmission therethrough of evanescent waves of the electromagnetic radiation. The diffracted waves and the evanescent waves form propagated waves. A probe with such a lens, and an inspection apparatus and method using the probe are also disclosed.

Abstract: Provided is an optical system (PS) which is used in a wavelength range including a near ultraviolet light range having a wavelength longer than approximately 350 nm and a visible light range. The optical system includes at least two first positive lenses which satisfies a predetermined conditional expression concerning anomalous dispersion characteristic and a rate of change of the refractive index with respect to temperature, and is disposed closer to a contraction side than an aperture stop (ST), and at least one second positive lens which satisfies a predetermined conditional expression concerning anomalous dispersion characteristic and a rate of change of the refractive index with respect to temperature.

Abstract: A catadioptric objective includes a plurality of optical elements arranged along an optical axis to image a pattern from an object field in an object surface of the objective to an image field in an image surface region of the objective at an image-side numerical aperture NA with electromagnetic radiation from a wavelength band around a central wavelength ?<300 nm. The optical elements include a concave mirror and a plurality of lenses. The projection objective forms an image of the pattern in a respective Petzval surface for each wavelength ? of a wavelength band, the Petzval surfaces deviating from each other for different wavelengths. The plurality of lenses include lenses made from different materials having substantially different Abbe numbers.

Abstract: A device (100) for imaging an object (101), wherein the device (100) comprises an objective lens (102) adapted to manipulate a beam of electromagnetic radiation (103) transmitted through the object (101), a collimator lens (104) adapted to manipulate the beam of electromagnetic radiation (103) transmitted through the objective lens (102), and an actuator (105) adapted for displacing the objective lens (102) in a direction essentially parallel and in a direction essentially perpendicular to a propagation direction of the beam of electromagnetic radiation (103) between the objective lens (102) and the collimator lens (104), wherein the objective lens (102) and the collimator lens (104) are arranged so that the beam of electromagnetic radiation (103) between the objective lens (102) and the collimator lens (104) is essentially parallel.

Abstract: Illumination optics that can be used, for example, for EUV projection microlithography are disclosed. Also disclosed are illumination systems provided with such illumination optics, projection exposure apparatuses provided with such illumination systems, related methods of manufacturing microstructured elements, and microstructured elements obtained by these methods.

Abstract: An exposure apparatus includes an illumination optical system configured to illuminate a mask with a laser beam having a wavelength shorter than 250 nm, and a projection optical system configured to project and expose a pattern image of the mask onto an exposed substrate, in which an optical element made of a synthetic quartz member is disposed in the illumination optical system and/or the projection optical system. The synthetic quartz member satisfies the following conditions of initial transmittance relative to light having a wavelength of 150 nm being equal to or above 60% per centimeter, striae satisfying either grade 1 or grade 2 (Japan Optical Glass Industry Society Standard), an absorption coefficient ? at 3585 cm?1 equal to or below 0.035/cm, and the content of aluminum and lithium being equal to or below 1 and 0.5 ppm, respectively.

Abstract: The present invention provides an optical element including: a substrate; and an antireflection film formed on a surface of the substrate. The antireflection film includes a plurality of lower refractive index layers, and a plurality of higher refractive index layers which are layered alternately. Each of at least two of the plurality of lower refractive index layers comprises a same main component each other and comprises a side component with a different content ratio independently.

Abstract: An imaging microoptics, which is compact and robust, includes at least one aspherical member and has a folded beam path. The imaging microoptics provides a magnification |??| of >800 by magnitude. Furthermore, a system for positioning a wafer with respect to a projection optics includes the imaging microoptics, an image sensor positionable in the image plane of the imaging microoptics, for measuring a position of an aerial image of the projection optics, and a wafer stage with an actuator and a controller for positioning the wafer in dependence of an output signal of the image sensor.

Abstract: A method for protecting a wet lens element from liquid degradation is provided. The method includes applying a thin coating of an organoxy-metallic compound to the side portions of a wet lens element to leave behind an optically inert, light absorbing metal oxide film. A liquid shield coating is applied on top of the metal oxide coating. The two coating layers protect the wet lens element from liquid degradation when the side portion of the wet lens element is submerged into a liquid. In an embodiment, the wet lens element is an immersion lithography wet lens element and the liquid is an immersion lithography liquid.

Abstract: This invention pertains to the use of miniaturized filters and light conditioners to enable conventional basic optical equipment such as telescopes, microscope, otoscopes, to be converted to more advanced devices such as a conventional microscope to a metallurgical microscope, or an otoscope to be converted to a fingerprint or trace fluorescence identification device. Additionally this particular invention uniquely creates the means by which a UV light can be cheaply and portably deployed in a field setting without the use of larger or traditional bulky UV lights.

Abstract: A plastic lens exhibiting excellent ability of absorbing ultraviolet light having a wavelength of about 400 nm, suppressed coloring and excellent transparency and a process for producing the plastic lens are provided. The plastic lens comprises a plastic lens substrate obtained by polymerizing a composition comprising (A) a lens material monomer, (B) a cobalt compound expressed by CoO.Al2O3 and/or Co.Al2O4, (C) fine particles of Au having an average diameter of 1 to 1,000 nm and (D) at least one ultraviolet light absorber selected from benzophenone-based ultraviolet light absorbers and benzotriazole-based ultraviolet light absorbers. The process comprises mixing Component (A), a dispersion of a cobalt compound which comprises Component (B), a dispersion of fine particles of Au which comprises Component (C) and Component (D), and polymerizing the obtained composition to prepare a plastic lens substrate.

Abstract: An ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability. The microscope system, which includes a catadioptric lens group and a zooming tube lens group, has high optical resolution in the deep UV wavelengths, continuously adjustable magnification, and a high numerical aperture. The system integrates microscope modules such as objectives, tube lenses and zoom optics to reduce the number of components, and to simplify the system manufacturing process. The preferred embodiment offers excellent image quality across a very broad deep ultraviolet spectral range, combined with an all-refractive zooming tube lens. The zooming tube lens is modified to compensate for higher-order chromatic aberrations that would normally limit performance.

Abstract: Very high aperture microlithography projection objectives operating at the wavelengths of 248 nm, 193 nm and also 157 nm, suitable for optical immersion or near-field operation with aperture values that can exceed 1.4 are made feasible with crystalline lenses and crystalline end plates P of NaCl, KCl, KI, RbI, CsI, and MgO, YAG with refractive indices up to and above 2.0. These crystalline lenses and end plates are placed between the system aperture stop AS and the wafer W, preferably as the last lenses on the image side of the objective.

Abstract: A method of readily producing a gradient optical element having infrared absorbing ability by easily forming a refractive index distribution in a desired portion of a glass substrate having infrared absorbing ability without requiring a specific treatment atmosphere nor using a molten salt. More specifically, the present invention provides a method for producing a gradient-index optical element having infrared absorbing ability, the method comprising applying a paste containing an organic resin, an organic solvent, and at least one compound selected from the group consisting of lithium compounds, potassium compounds, rubidium compounds, cesium compounds, silver compounds, copper compounds, and thallium compounds onto a glass substrate containing an alkali metal component, at least one member selected from the group consisting of iron, copper, cobalt and vanadium, and over 3 wt.

Abstract: A method and apparatus are disclosed for forming an optical trap with light directed through or above a semiconductor material. A preferred embodiment selected light-trapping wavelengths that have lower absorption by the semiconductor. A preferred embodiment provides for an optical trapping through semiconductor employing a thin silicon (Si) wafer as a substrate. Further embodiments of the invention provide for microchannel fabrication, force probe measurement, sorting, switching and other active manipulation and assembly using an optical trap.

Abstract: A plurality of optical members (lenses) for use in ultraviolet region are mutually stuck. A fluorine-based organic compound (for example, fluorine-based oil) is provided between them. The periphery of the optical members is sealed with a sealant. As the sealant, an adhesive fluorine resin, for example, a soluble fluorine resin is used.

Abstract: An optical element (1) made of a material that is transparent to wavelengths in the UV region, which optical element (1) includes an oleophobic coating (6, 7) outside of its optically free diameter whose disperse component of the surface energy is preferably 25 mN/m or less, particularly preferably 20 mN/m or less, in particular 15 mN/m or less. In addition or as an alternative, the optical element (1) within its optically free diameter comprises an oleophilic coating (9b, 9c) that is transparent to wavelengths in the UV region, with the disperse component of the surface energy of this coating preferably being more than 25 mN/m, particularly preferably more than 30 mN/m, in particular more than 40 mN/m. The optical element may be provided in an arrangement in which it dips at least partially into an organic liquid.

Abstract: A projection objective for a microlithographic projection exposure apparatus. The projection objective can project an image of a mask that can be set in position in an object plane onto a light-sensitive coating layer that can be set in position in an image plane. The projection objective can be designed to operate in an immersion mode, and it can produce at least one intermediate image. The projection objective can include an optical subsystem on the image-plane side which projects the intermediate image into the image plane with an image-plane-side projection ratio having an absolute value of at least 0.3.

Abstract: The present invention provides a projection optical system which projects an image on a first object plane onto a second object plane, comprising at least four optical members which are arrayed in turn from the second object plane, and made of an isotropic crystal, wherein the at least four optical members are formed by alternately arraying optical members in each of which a <1 1 1> crystal axis is oriented along a direction of an optical axis, and optical members in each of which a <1 0 0> crystal axis is oriented along the direction of the optical axis.

Abstract: To provide an optical component of quartz glass for use in a projection objective for immersion lithography at an operating wavelength below 250 nm, which component is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction and birefringence induced by anisotropic density change, it is suggested according to the invention that the quartz glass should contain hydroxyl groups in the range of from 1 wtppm to 60 wtppm and chemically bound nitrogen, and that the mean hydrogen content of the quartz glass should be in the range of 5×1015 molecules/cm to 1×1017 molecules/cm3.

Abstract: The present invention provides a projection optical system for projecting a pattern of an object plane onto an image plane, including a first lens whose refractive index irreversibly increases by ultraviolet irradiation, and a second lens whose refractive index irreversibly decreases by the ultraviolet irradiation.

Abstract: Disclosed is an optical element for use in an optical apparatus having a light source which emits a light flux with a wavelength ? (350 nm???450 nm), the optical element containing: a molded portion formed by molding a resin; and one or a plurality of anti-reflection layers formed on the molded portion, wherein at least one of the anti-reflection layers is made of SixOy; and an elemental ratio r (r=y/x) designating an ratio of O to Si in the molecule of SixOy satisfies a requirement represented by Formula (1): 1.40?r?1.80.

Abstract: A cost-effective photosensor system for rotor position detection includes securing an aperture assembly to an off-the-shelf infrared radiation-emitting component and/or an off-the-shelf infrared radiation-detecting component. The application discloses an aperture assembly that may be stamped from a thin, opaque, elongated piece of plastic having an aperture window through which a radiation beam may pass and be focused. The aperture assembly also has a locking system for securing the assembly to the off-the-shelf photosensor system component, and an alignment system to direct the infrared radiation beam. A replaceable stamped aperture assembly for use in a rotor-sensing system and a method of providing a replaceable aperture assembly and securing it to an infrared component of a photosensor system are also disclosed.

Abstract: Disclosed are CuX-containing, Nd2O3-containing, UV-absorbing and contrast-enhancing glasses and article comprising the same. The glass has improved UV-absorption and color enhancing capabilities compared to glasses described in the prior art. The glass can be used in sunglass lenses and light filters of information displays.

Abstract: An optical element irradiated with a light flux having a wavelength of 350 nm to 450 nm, is provided with a synthetic resin base material; and an antireflection film provided on the synthetic resin base material and including a contact layer being in contact with the synthetic resin base material, wherein the contact layer is a film made of a material containing no oxygen atom or a film made of a mixed material or a material containing no oxygen atom and a material containing an oxygen atom in which the mixed material contains the material containing an oxygen atom less than 10%.

Abstract: The present invention provides a method for producing a distributed refractive index-type optical element which can be optically designed readily, enables to provide a desired optical element in a simple manner and has an ultraviolet ray-absorbing ability. The present invention provides a method for producing a distributed refractive index-type optical element having an ultraviolet ray-absorbing ability, which comprises of the steps of: applying a paste comprising at least one compound selected from the group consisting of a lithium compound, a potassium compound, a rubidium compound, a cesium compound, a silver compound, a copper compound and a thallium compound, an organic resin and an organic solvent onto a glass substrate comprising an alkali metal component and an ultraviolet ray-absorbing component as glass constituent components; and heat-treating the resulting substrate at a temperature lower than the softening point of the glass substrate.

Abstract: As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.

Abstract: A laser device includes a laser source and an optical module. The laser source is configured for emitting a UV laser beam with a single wavelength. The optical module includes a first optical element disposed on a light path of the UV laser beam. The first optical element has a first surface and a second surface at opposite sides thereof. The first surface faces toward the laser source. At least one of the first and second surfaces is aspherical such that the UV laser beam is capable of focusing on a focal plane with a satisfactory depth of focus.

Abstract: The present invention provides an optical device and an exposure apparatus capable of suppressing a reduction in light output. The optical device of the present invention includes a laser light source which emits laser light having a short wavelength (e.g., 160 to 500 nm), a lens, a transparent member and an optical fiber provided with a junction-inhibiting film. The optical device is configured such that light density of abutment faces between the transparent member and the optical fiber formed with the junction-inhibiting film is 4464 W/mm2 or less, thereby suppressing a reduction in light output which may be caused by fusion.

Abstract: A system for use with a reduced size catadioptric objective is disclosed. The system including the reduced size objective includes various subsystems to allow enhanced imaging, the subsystems including illumination, imaging, autofocus, positioning, sensor, data acquisition, and data analysis. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range, and elements of the objective are less than 100 mm in diameter. The objective comprises a focusing lens group and at least one field lens oriented to receive focused light energy from the focusing lens group and provide intermediate light energy. The objective also includes a Mangin mirror arrangement. The design imparts controlled light energy with a numerical aperture in excess of 0.65 and up to approximately 0.90 to a specimen for imaging purposes, and the design may be employed in various environments.

Abstract: A production method of an objective lens for optical pickup apparatus having a numerical aperture NA of image side of 0.80 to 0.90 is disclosed. The method includes steps of molding resin composition containing copolymer of ?-olefin and a cyclic olefin represented by Formula (I) or (II) to form lens shape, and thermally processing the molded product under a condition at a temperature between Tg ?45° C. and Tg ?15° C. for 12 to 168 hours, wherein the Formula (I) and (II) is detailed in the specification.

Abstract: A reduced size catadioptric inspection system employing a catadioptric objective and immersion substance is disclosed. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range, and can provide numerical apertures in excess of 0.9. Elements are less than 100 millimeters in diameter and may fit within a standard microscope. The objective comprises a focusing lens group, a field lens, a Mangin mirror arrangement, and an immersion substance or liquid between the Mangin mirror arrangement and the specimen. A variable focal length optical system for use with the objective in the catadioptric inspection system is also disclosed.

Abstract: Imaging optical systems having good transmission and that are well corrected over the full 315 nm-1100 nm ultraviolet-visible-infrared (UV-VIS-IR) wavelength band are disclosed. A wide variety of apochromatic and superachromatic design examples are presented. The imaging optical systems have a broad range of applications in fields where large-bandwidth imaging is called for, including but not limited to forensics, crime scene documentation, art conservation, forgery detection, medicine, scientific research, remote sensing, and fine art photography.

Abstract: The synthetic resin lens has a function to generate heat by selectively absorbing infrared rays with wavelengths of 780 to 3000 nm. The synthetic resin lens includes an infrared absorber. Selective absorption of infrared rays allows the synthetic resin lens itself to generate heat and thus the lens of the present invention has the same function as being electrically heated to prevent fogging.

Abstract: An imaging system (FIG. 3) is disclosed that has a wavelength dependent focal shift caused by longitudinal chromatic aberration in a lens assembly (203) that provides extended depth of field imaging due to focal shift (213,214) and increased resolution due to reduced lens system magnification. In use, multiple wavelengths of quasi-monochromatic illumination, from different wavelength LEDs (206,207) or the like, illuminate the target, either sequentially, or in parallel in conjunction with an imager (200) with wavelength selective (colored) filters. Images are captured with different wavelengths of illumination that have different focus positions (208,209), either sequentially or by processing the color planes of a color imager separately. Extended depth of field, plus high resolution are achieved. Additionally, information about the range to the target can be determined by analyzing the degree of focus of the various colored images.

Abstract: A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element (L3) with an index of refraction greater than 1.6. This element (L3) has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume (L3?) which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.

Abstract: A method of repairing radiation-induced damage and reducing accumulated laser-induced wavefront distortion and polarization-induced birefringence in a fused silica article, such as a lens in a DUV optical system, prisms, filters, photomasks, reflectors, etalon plates, and windows. The distortion is reduced by irradiating the fused silica article with an irradiation source, such as an infrared laser. The radiation causes localized heating which repairs at least a portion of the fused silica lens. A fused silica lens that has been treated by the method and a lithographic system are also described.

Abstract: An infrared target for use with indoor industrial G.P.S. has at least one mask or overlay applied to the lens of the target. The mask increases the precision of setting the location of any instrument, assembly, machinery, or component to be machined, during industrial applications. The mask improves position tolerances to 0.0005 inch or less. Further, a reflective ring positioned upon the overlay serves as a marker for laser light at lesser tolerance than the overlay.

Abstract: New and useful concepts are provided for the objective portion of a liquid or solid immersion microscope are provided, that uses 193 nm light for illumination and imaging of a sample, and includes a liquid or solid immersion lens configuration. The illumination and imaging can be provided, e.g. with (a) a liquid immersion lens with a final objective lens element that comprises a lutetium aluminum garnet (LuAg) lens element, a barium lithium fluoride (BaLiF) lens element, or a fused silica lens element, and a liquid immersion layer that has an index of refraction that is equal to or greater than the index of refraction of water at a wavelength of approximately 193 nm, or (b) a solid immersion lens with a final objective lens element that has an index of refraction greater than or equal to the index of refraction of fused silica at a wavelength of approximately 193 nm.

Abstract: A surface plasmonic polariton lens is disclosed that has an optical plate having incident thereupon waves of electromagnetic radiation. The plate also has a thin metal film of a metal having a negative permittivity. There are slits in the thin film, the slits being of decreasing radial width, and decreasing radial separation at increasing radius and being for the transmission therethrough of diffracted waves of the electromagnetic radiation. There are rings between the slits, the rings being of decreasing radial width at increasing radius and being for the transmission therethrough of evanescent waves of the electromagnetic radiation. The diffracted waves and the evanescent waves form propagated waves. A probe with such a lens, and an inspection apparatus and method using the probe are also disclosed.

Abstract: An apparatus for providing light to molecules of a specimen in a fluorescence microscope includes a light emitting diode and an optical element including a phosphor. The molecules have a peak excitation wavelength. The LED emits light at a first wavelength; the phosphor is capable of receiving the light at the first wavelength and emitting light at a preselected second wavelength different than the first wavelength. The second wavelength is substantially similar to the peak excitation wavelength of the molecules.

Abstract: An apparatus and method for performing optical microscopy are disclosed. In at least one embodiment, the apparatus includes a deep ultraviolet light source configured to generate light having a wavelength within a window in the deep ultraviolet region of the electromagnetic spectrum within which a local minimum in the absorption coefficient of Oxygen occurs. Further, the apparatus includes a lens device that receives at least a first portion of the generated light, directs at least some of the first portion of the generated light toward a location, receives reflected light from the location, and directs at least some of the reflected light toward a further location. Additionally, the apparatus includes a camera device that is positioned at one of the further location and an additional location, where the camera device receives at least a second portion of the reflected light, whereby an image is generated by the camera device.