Abstract: UV curing of adhesives with light beam shaping utilizes a spot curing process that focuses a limited amount of UV light onto a target area, such as glue dots. A focusing lens may be used to direct the UV light beam to the target area. The target areas have different geometrical shapes, and the UV light is advantageously concentrated in a more efficient manner. Beam-shaping optics or lenses are used to facilitate re-shaping and re-defining the UV-light beam. The UV beam may be defined and limited to a rectangular spot to improve the spot process quality and efficiency.

Abstract: A lighting assembly topology that utilizes spectrum controlling materials to render the illumination compatible with night vision imaging systems. The lighting assembly can be used as either a general illumination source or can be used as a backlight for a transmissive display such as a liquid crystal display. The lighting assembly makes use of spectral filtering which is both transmissive and absorptive for specific spectral regions. The exit port of the lighting assembly is completely filtered with a red and near infrared reflective filter. The absorption of the near infrared spectrum to which NVIS are sensitive is reflected by the typical near infrared reflective filter covering the exit port and absorbed within the material lining the housing of the lighting assembly.

Abstract: A design for inspecting specimens, such as photomasks, for unwanted particles and features such as pattern defects is provided. The system provides no central obscuration, an external pupil for aperturing and Fourier filtering, and relatively relaxed manufacturing tolerances, and is suited for both broad-band bright-field and laser dark field imaging and inspection at wavelengths below 365 nm. In many instances, the lenses used may be fashioned or fabricated using a single material. Multiple embodiments of the objective lensing arrangement are disclosed, all including at least one small fold mirror and a Mangin mirror. The system is implemented off axis such that the returning second image is displaced laterally from the first image so that the lateral separation permits optical receipt and manipulation of each image separately.

Abstract: A deep ultraviolet transmissive adhesive capable of transmitting deep ultraviolet light which comprises a substance represented by the chemical formula given below, and a substrate produced using the deep ultraviolet transmissive adhesive, CH2?CH—CH2—O—(CH2)2n—O—CH2—CH?CH2 In the above formula, n is an odd number represented by 2m+1 (m being a natural number).

Abstract: An ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability. The microscope system, which comprises a catadioptric lens group and a zooming tube lens group, has high optical resolution in the deep UV wavelengths, continuously adjustable magnification, and a high numerical aperture. The system integrates microscope modules such as objectives, tube lenses and zoom optics to reduce the number of components, and to simplify the system manufacturing process. The preferred embodiment offers excellent image quality across a very broad deep ultraviolet spectral range, combined with an all-refractive zooming tube lens. The zooming tube lens is modified to compensate for higher-order chromatic aberrations that would normally limit performance.

Abstract: The present invention is directed to a salt optic provided with a multilayer coating in order to improve upon the moisture resistance of a salt optic, when compared to the moisture resistance of an uncoated salt optic. In one aspect, the present invention is comprised of a coated salt optic having at least a first coating layer and a second coating layer, the first coating layer being surface-smoothing layer and adhesion layer, and the second coating layer being a moisture barrier layer.

Abstract: An optical protective filter (1, 3) includes at least one first and one second partial lens (1, 2), wherein the first partial lens (1) includes a flexible substrate (4). On the substrate (4), a thin film filter (2) is applied, and the thin film filter (2) comprises at least one metallic layer (8) with a layer thickness of between 2 nm and 100 nm. The substrate (4) in the completed protective filter, thanks to its flexibility, is bent into the final shape as a whole; this in contrast to such lenses, which while comprising a curved shape and curved surfaces, have been ground or cast into this curved shape.

Abstract: A projection optical system comprises a plurality of lenses disposed along an optical axis of the projection optical system; wherein the plurality of lenses is dividable into four non-overlapping groups of lenses of positive and negative refractive powers, wherein the following relation is fulfilled: 2 · y · NA · 1 k · ? i = 1 k ? ? ? i ? ? V 1 wherein: y is half a diameter in mm of a maximum image field imaged by the projection optical system, NA is a maximum numerical aperture on a side of the second object, ?i is a refractive power in mm?1 of the ith lens, k is a total number of lenses of the projection optical system, and wherein V1 is greater than 0.045.

Abstract: An optical component has a substrate, on which at least one curved substrate surface is formed that defines an optical axis of the optical component, wherein the substrate surface is coated with a multilayer coating that is active in the ultraviolet region at a design wavelength ?0 and includes a first layer, applied to the substrate surface, made from a first dielectric material and at least one second layer, applied to the first layer, made from a second dielectric material. The substrate consists essentially of a crystal material that has an axially parallel crystal direction, running parallel to the optical axis, and edge crystal directions perpendicular to edge regions of the curved substrate surface. An angle between the axially parallel crystal direction and the edge crystal directions is at least 17°, and the first layer has an essentially untextured layer structure. An anisotropy, caused by the substrate structure, in the optical properties of the multilayer coating can thereby be avoided.

Abstract: An optical scanning device provides a radiation source (2,200), a collimator lens (4,40), an objective (7,90) for converting a beam (5,30?) to a scanning spot at the position of an information layer (101) of a record carrier (1,100). The device also includes an electrowetting cell (6). The electrowetting cell (6) acts such that a beam (5,30?) enters the objective (7,90) at a predetermined height of an entrance pupil of the objective (7,90) independent of the position of the objective (7,90) and that the beam (5,30?) forms a predetermined angle at the entrance pupil of the objective (7,90) with the optical axis (8). In this way the rim intensity may be kept constant over the entrance pupil of the objective (7,90).

Abstract: In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.

Abstract: Projection objective, projection exposure apparatuses and related systems and components are disclosed.

Abstract: There is provided a coating composition which can be applied to a substrate such as a plastic lens so as to form a photochromic coating layer having good photochromic properties and excellent adhesion to the substrate on the surface of the substrate. This composition comprises, for example, as monomer components, 0.1 to 20 wt % of monomer having a group which produces a silanol group through hydrolysis such as ?-methacryloyloxypropyltrimethoxysilane and 0.1 to 50 wt % of monomer having at least one oxycarbonyl group in a molecule. The composition can further contain a maleimide compound as a monomer component and further desirably contains an amine compound.

Abstract: A hybrid lens (3) has a structure in which a resin layer (2) composed of an ultraviolet curable resin is formed on the surface of a lens base material (1) composed of translucent ceramic. The lens base material (3) is composed of translucent ceramic containing as a main component an oxide with a perovskite structure represented by A{M,(B1, B2)}O3 (A is at least one selected from Ba, Sr and Ca, B1 is at least one selected from In, Y, Zn and Mg, B2 is at least one selected from Ta and Nb, and M is at least one selected from Ti, Zr, Hf and Sn) and at least Fe and Cu as sub-components. When the Fe content and Cu content in the translucent ceramic are x and y, respectively, 3x+y is 40 ppm by weight or less so that the hybrid lens (3) having excellent uniformity in optical properties and no crack defect can be obtained.

Abstract: A lighting optical apparatus using a deep ultraviolet light source that are easy to adjust due to a configuration with fewer components, has high illuminant and illuminant uniformity on an irradiated surface are provided. The apparatus has a deep ultraviolet light source from which deep ultraviolet rays are emitted, a first double-sided cylindrical lens which has a cylindrical lens array on both sides with a configuration of cylinder axes intersecting at right angles, a second double-sided cylindrical lens which has a cylindrical lens array on both sides with a configuration of cylinder axes intersecting at right angles, and a condenser lens.

Abstract: An ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability. The microscope system, which comprises a catadioptric lens group and a zooming tube lens group, has high optical resolution in the deep UV wavelengths, continuously adjustable magnification, and a high numerical aperture. The system integrates microscope modules such as objectives, tube lenses and zoom optics to reduce the number of components, and to simplify the system manufacturing process. The preferred embodiment offers excellent image quality across a very broad deep ultraviolet spectral range, combined with an all-refractive zooming tube lens. The zooming tube lens is modified to compensate for higher-order chromatic aberrations that would normally limit performance.

Abstract: An imaging system (FIG. 3) is disclosed that has a wavelength dependent focal shift caused by longitudinal chromatic aberration in a lens assembly (203) that provides extended depth of field imaging due to focal shift (213,214) and increased resolution due to reduced lens system magnification. In use, multiple wavelengths of quasi-monochromatic illumination, from different wavelength LEDs (206,207) or the like, illuminate the target, either sequentially, or in parallel in conjunction with an imager (200) with wavelength selective (colored) filters. Images are captured with different wavelengths of illumination that have different focus positions (208,209), either sequentially or by processing the color planes of a color imager separately. Extended depth of field, plus high resolution are achieved. Additionally, information about the range to the target can be determined by analyzing the degree of focus of the various colored images.

Abstract: An objective system (1?) for an optical scanning device for ultraviolet and/or deep-ultraviolet wavelengths is provided. The objective system (1?) comprises at least one glass component (3?) with an aspherical surface. The at least one glass component (3?) is made of a glass material comprising a low softening temperature and a low absorption coefficient for ultraviolet and/or deep-ultraviolet wavelengths.

Abstract: Optical filters comprising a small concentration of visible light absorbing components optionally in combination with small concentrations of ultraviolet and infared absorbing components suitable for use in an illuminator for an accelerated weathering device and methods of accelerated weathering.

Abstract: The invention relates to an illumination system with a light source emitting radiation with a wavelength ?193 nm, especially radiation in the EUV wavelength range. The invention comprises a first facetted optical element in a first plane with at least a first and second field raster element which receive the light of the light source and divide the same into a first and second bundle of light; a optical component comprising at least a second facetted optical element in a second plane with a first and second pupil raster element, with the first light bundle impinging upon the first pupil raster element and the second light bundle impinging upon the second pupil raster element, with an attenuator being arranged in or close to the second plane or a plane conjugated to the second plane at least in the first light bundle extending from the first field raster element to the first pupil raster element, wherein the optical component images the first and second field raster element into a field plane.

Abstract: An optical member comprising OD-doped silica glass, optionally doped with fluorine. The optical member is particularly advantageous for use in connection with radiation having a wavelength shorter than about 248 nm. In certain embodiments the optical member can be advantageously used for wavelength as short as about 157 nm.

Abstract: An optical system projecting onto an image plane an object that is disposed at infinity by an intermediate image. The optical system includes a front group and a relay optic, each including a plurality of lenses, the intermediate image disposed between the front group and the relay optic. The optical system being configured as the object lying at infinity with at least two switchable and/or zoomable fields of view, the fields of view being imaged into the image plane. The front group including at least three lenses successively disposed towards the image plane. A first one of the lenses including of Ge, at least a second of the lenses including of ZnSe, and at least a third of the lenses including of either MgF2, CaF2 or MgO.

Abstract: A projection exposure apparatus for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask that is arranged in the region of an object surface of the projection objective has a light source for emitting ultraviolet light from a wavelength band having a bandwidth ??>10 pm around a central operating wavelength ?>200 nm; an illumination system for receiving the light from the light source and for directing illumination radiation onto the pattern of the mask; and a projection objective for the imaging of the structure of the mask onto a light-sensitive substrate.

Abstract: An image forming system and lens system including at least one molded chalcogenide lens element and configured to simultaneously image light at the medium wave infrared region (MWIR) and the long wave infrared region (LWIR) at a common focal plane.

Abstract: An optical element used such that at least one surface thereof is in contact with a liquid in a liquid immersion exposure apparatus in which a substrate is exposed by exposure light illuminated on the substrate via the liquid with a refraction index in a range between 1.60 and 1.66 to the light with a wavelength of 193 nm, comprising: a base material with a refraction index in a range between 2.10 and 2.30 to the light with a wavelength of 193 nm; and a first antireflection film formed on the contact surface between the base material and the liquid, wherein the first antireflection film includes a first antireflection layer with a refraction index in a range between 1.80 and 2.02 to the light with a wavelength of 193 nm and an optical film thickness in a range between 0.25? and 0.42? to the wavelength ? of the exposure light, a second antireflection layer with a refraction index in a range between 1.65 and 1.77 to the light with a wavelength of 193 nm and an optical film thickness in a range between 0.

Abstract: Methods for fabricating refractive element(s) and aligning the elements in a compound optic, typically to a zone plate element. The techniques are used for fabricating micro refractive, such as Fresnel, optics and compound optics including two or more optical elements for short wavelength radiation. One application is the fabrication of the Achromatic Fresnel Optic (AFO). Techniques for fabricating the refractive element generally include: 1) ultra-high precision mechanical machining, e.g,. diamond turning; 2) lithographic techniques including gray-scale lithography and multi-step lithographic processes; 3) high-energy beam machining, such as electron-beam, focused ion beam, laser, and plasma-beam machining; and 4) photo-induced chemical etching techniques. Also addressed are methods of aligning the two optical elements during fabrication and methods of maintaining the alignment during subsequent operation.

Abstract: Methods and apparatus are provided. An image sensor has an array of light sensing elements and a transparent cover overlying the array of light sensing elements. The cover has a first roughened surface facing the array of light sensing elements and a second roughened surface facing away from the light sensing elements.

Abstract: Holding devices for optical elements, as well as related modules, systems and methods are disclosed. The devices, modules, systems and methods may, for example, be used in the context of microlithography used in manufacturing microelectronic circuits.

Abstract: A reduced size catadioptric inspection system employing a catadioptric objective and immersion substance is disclosed. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range, and can provide numerical apertures in excess of 0.9. Elements are less than 100 millimeters in diameter and may fit within a standard microscope. The objective comprises a focusing lens group, a field lens, a Mangin mirror arrangement, and an immersion substance or liquid between the Mangin mirror arrangement and the specimen. A variable focal length optical system for use with the objective in the catadioptric inspection system is also disclosed.

Abstract: As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.

Abstract: An image forming system and lens system configured to simultaneously image light at the short wave infrared region (SWIR) and the near infrared region (NIR).

Abstract: An optical element and a manufacturing method therefor, an exposure apparatus, and a device manufacturing method that can reduce the effect of intrinsic birefringence under high NA conditions. According to an optical element as one aspect of the present invention, an angle between a [0 0 1] axis of an isometric crystal and an optical axis is less than 10°, and preferably 0°.

Abstract: An optical system for ultraviolet light having wavelengths ??200 nm, which may be designed in particular as a catadioptric projection objective for microlithography, has a plurality of optical elements including optical elements made of synthetic quartz glass or a fluoride crystal material transparent to a wavelength ??200 nm. At least two of the optical elements are utilized for forming at least one liquid lens group including a first delimiting optical element, a second delimiting optical element, and a liquid lens, which is arranged in an interspace between the first delimiting optical element and the second delimiting optical element and contains a liquid transparent to ultraviolet light having wavelengths ??200 nm. This enables effective correction of chromatic aberrations even in the case of systems that are difficult to correct chromatically.

Abstract: An objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens is disclosed. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with a lens axis which is approximately perpendicular to the {100} crystallographic planes or to the crystallographic planes equivalent thereto of the fluoride crystal. A further reduction in the detrimental influence of birefringence is obtained by covering an optical element with a compensation coating.

Abstract: An imaging system (FIG. 3) is disclosed that has a wavelength dependent focal shift caused by longitudinal chromatic aberration in a lens assembly (203) that provides extended depth of field imaging due to focal shift (213,214) and increased resolution due to reduced lens system magnification. In use, multiple wavelengths of quasi-monochromatic illumination, from different wavelength LEDs (206,207) or the like, illuminate the target, either sequentially, or in parallel in conjunction with an imager (200) with wavelength selective (colored) filters. Images are captured with different wavelengths of illumination that have different focus positions (208,209), either sequentially or by processing the color planes of a color imager separately. Extended depth of field, plus high resolution are achieved. Additionally, information about the range to the target can be determined by analyzing the degree of focus of the various colored images.

Abstract: Microlenses and microlens arrays made from Group III-nitride material.

Abstract: A reduced size catadioptric objective and system is disclosed. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range. Elements are less than 100 mm in diameter. The objective comprises a focusing lens group configured to receive the light energy and comprising at least one focusing lens. The objective further comprises at least one field lens oriented to receive focused light energy from the focusing lens group and provide intermediate light energy. The objective also includes a Mangin mirror arrangement positioned to receive the intermediate light energy from the field lens and form controlled light energy for transmission to a specimen. The Mangin mirror arrangement imparts controlled light energy with a numerical aperture in excess of 0.65 and up to approximately 0.90, and the design may be employed in various environments.

Abstract: An objective lens for converging a monochromatic light flux having a specific wavelength in a range of 350 to 450 nm on an optical information recording medium while the objective lens is placed facing the optical information recording medium, the objective lens comprising: a lens body containing a polymer resin having an alicyclic structure; a first film having a refractive index of less than 1.7 for light having a wavelength of 405 nm; a second film having a refractive index of 1.7 or more for the light having the wavelength of 405 nm; and a third film having a refractive index of 1.55 or less for the light having the wavelength of 405 nm, wherein: the first film, the second film and the third film are provided on the lens body; the first film is provided between the lens body and the second film; the second film is provided between the first film and the third film; and a thickness of the first film is in a range of 50 to 15000 nm.

Abstract: An optical system and method comprising acquiring radiation in a plurality of spectral bands, each acquired by a discrete collector, receiving the acquired radiation in one or more of the spectral bands with one or more afocal zoom optics, each receiving radiation from a different collector, and aligning each point of fields of view of the collectors to a fraction of a pixel.

Abstract: An infrared zoom lens having no aspheric lens elements comprises, six distinct lens groups each having two or less spherical lens elements. The first group has a positive power, the second group has a negative power, the third group has a positive power, the fourth group has a negative power, the fifth has a positive power and the sixth group has either a positive or negative power with the purpose of relaying and focusing the output of the fourth lens group onto the focal plane of the imaging device. The second and fourth groups are axially movable but fixed relative to each other and move as a group relative to stationary groups one and three. The zoom ratio is thus varied, and no additional motion is required to keep the imagery sharp at the output focal plane as the lens is varied from the wide angle to the telephoto position.

Abstract: The present invention relates to a method for making an achromatic lens. The invention provides a method for making a lens that makes use of the differences in the index of refraction of ZnSe and ZnS in the mm-wave and IR wavebands to minimize the differences in focal position between the two wavebands. A lens train thus made can be used in conjunction with a dual-band focal plane array to simultaneously focus two wavebands on a common focal plane and thus provide for simultaneous imaging in both wavebands.

Abstract: A birefringence correction is incorporated into an optical imaging system for imaging with deep ultraviolet light. Optical elements which exhibit an intrinsic birefringence with deep ultraviolet light are arranged in a fashion that renders accumulated birefringence less sensitive to the angular orientation of the beam's rays around the optical axis. A compensating optic corrects a residual radially symmetric component of the birefringence.

Abstract: A DUV-capable dry objective for microscopes comprises lens groups made of quartz glass, fluorite, and in some cases also lithium fluoride. It possesses a DUV focus for a DUV wavelength region ?DUV±??, where ??=8 nm, and additionally a parfocal IR focus for an IR wavelength ?IR, where 760 nm??IR?920 nm. For that purpose, the penultimate element is of concave configuration on both sides, and its object-side outer radius is much smaller than its image-side outer radius. The DUV objective is IR autofocus-capable.

Abstract: An objective lens includes a diffractive optical element constructed of a medium having an internal transmittance of at least 50% at a wavelength of 300 nm when the thickness is 10 mm and a cemented doublet made up of two lenses having media of different refractive indices and Abbe's numbers. The diffractive optical element is optimized to take advantage of a fluorescent wavelength. An NA of the objective lens where correction for aberration is made and an NA of the objective lens where the effective diameter is determined are different from each other to satisfy the following condition: NAe>1.5×NAc where NAe is the NA of the objective lens where the effective diameter is determined and NAc is the NA of the objective lens where correction for aberration is made. The objective lens is constructed as a water-immersion objective lens in which the NA of the objective lens where the effective diameter is determined is at least 0.6.

Abstract: An infrared device in accordance with the present invention includes an optical train for receiving incident radiation into the device, a focal plane array for receiving the incident radiation from the optical train, and an optical power limiter (OPL) that is positioned therebetween. To improve the overall optical gain for the device, the optical train initially focuses the incident radiation into an intermediate focal plane that is located within the OPL. With this configuration, however, the incident radiation begins to lose focus once it passes through the intermediate focal plane and exits the OPL. To prevent this, the infrared device includes a plurality of microlenses on the OPL surface that is facing the focal plane array. The plurality of microlenses re-focuses the incident radiation onto a final focal plane that is coincident with the focal plane array.

Abstract: The present invention relates to the use of water soluble melanin in solid plastic films of polyvinyl alcohol to be used in conjunction with other plastics to make laminated sheets or lenses. Such laminates will be used as filters to protect against photochemical damage from electromagnetic radiation.

Abstract: An inspection microscope (1) having a light source (3) that emits light of a first wavelength below 400 nm for illumination of a specimen (13) to be inspected, and having an objective (11) that is composed of multiple optical components and has a numerical aperture and a focal length, and having a tube optical system (21) and an autofocus device (25) that directs light of a second wavelength onto the specimen (13), is disclosed. The inspection microscope (1) is characterized by the objective (11), which has an optical correction that eliminates the longitudinal chromatic aberrations with respect to the first and the second wavelength and whose optical components are assembled in cement-free fashion, the second wavelength being greater than 400 nm.

Abstract: A photolithography tool including an optical system for transmitting a beam of radiation toward a substrate is presented. The optical system includes a plurality of calcium fluoride lens elements, optically transmissive of the beam of radiation, each having respective optical axes and imparting a retardance to the beam. The plurality of calcium fluoride lens elements are aligned along an optical path for propagation of the beam of radiation therethrough. Each of the calcium fluoride lens elements includes a cubic crystalline calcium fluoride that is aligned with its [111] lattice direction, or a lattice direction optically equivalent to the [111] lattice direction, substantially parallel with its optical axis. A first calcium fluoride lens element of the plurality of calcium fluoride lens elements is rotated about its optical axis with respect to a second calcium fluoride lens element. The optical system has less than or about 0.015 waves RMS of wavefront aberration.

Abstract: An imaging apparatus for DUV beams is provided which includes a lens for receiving a DUV beam and producing an image of the DUV beam, wherein the lens has an aplanatic surface and a hemispheric surface, and wherein at least the aplanatic surface is made from or otherwise has a down-converting medium for producing a down-converted beam; an image sensing member for viewing an image of the down-converted beam; and optics for relaying the image of the down-converted beam from the lens to the image sensing member. A processor can be communicated with the image sensing member for analyzing the image of the DUV beam.

Abstract: The invention relates to optical filters comprising an opacified portion. The optical filters are preferably suitable for use in illuminators for weathering devices.