Lens, Lens System Or Component Patents (Class 359/355)
-
Patent number: 6985286Abstract: A projection exposure lens system has an object side catadioptric system, and intermediate image and a refractive lens system. The refractive lens system from its intermediate image side and in the direction of its image plane has a first lens group of positive refractive power, a second lens group of negative refractive power, a third lens group of positive refractive power, a fourth lens group of negative refractive power, and a fifth lens group of positive refractive power.Type: GrantFiled: February 25, 2004Date of Patent: January 10, 2006Assignee: Carl Zeiss SMT AGInventors: David R. Shafer, Helmut Beierl, Gerhard Fürter, Karl-Heinz Schuster, Wilhelm Ulrich
-
Patent number: 6980358Abstract: A truncated triangular prism has an entrance and an exit face perpendicular to each other and a reflecting face inclined at an angle ? to the entrance face where ? is about 135°??B, and where ?B is the external Brewster angle for the material of the prism at the wavelength of radiation to be reflected by the prism. A beam of p-polarized radiation directed into the prism through the entrance face at the Brewster angle is totally internally reflected from the reflecting face and leaves the exit face at the Brewster angle and at an angle of ninety degrees to the direction at which the radiation enters the prism.Type: GrantFiled: September 29, 2003Date of Patent: December 27, 2005Assignee: Coherent, Inc.Inventors: Tracy F. Thonn, R. Ian Edmond
-
Patent number: 6956694Abstract: An ultraviolet (UV) catadioptric imaging system, with broad spectrum correction of primary and residual, longitudinal and lateral, chromatic aberrations for wavelengths extending into the deep UV (as short as about 0.16 ?m), comprises a focusing lens group with multiple lens elements that provide high levels of correction of both image aberrations and chromatic variation of aberrations over a selected wavelength band, a field lens group formed from lens elements with at least two different refractive materials, such as silica and a fluoride glass, and a catadioptric group including a concave reflective surface providing most of the focusing power of the system and a thick lens providing primary color correction in combination with the focusing lens group. The field lens group is located near the intermediate image provided by the focusing lens group and functions to correct the residual chromatic aberrations. The system is characterized by a high numerical aperture (typ. greater than 0.Type: GrantFiled: November 6, 2001Date of Patent: October 18, 2005Assignee: KLA-Tencor Technologies Corp.Inventors: David R. Shafer, Yung-Ho Chuang, Bin-Ming B. Tsai
-
Patent number: 6946416Abstract: Fused silica articles exhibiting improved internal transmission and decreased absorption change when irradiated with a laser when compared with fused silica articles containing lower levels of aluminum. The articles also exhibit induced transmission when irradiated with a laser. The articles also exhibit improved off-axis refractive index homogeneity.Type: GrantFiled: December 13, 2002Date of Patent: September 20, 2005Assignee: Corning IncorporatedInventors: John E. Maxon, Christine E. Heckle
-
Patent number: 6946199Abstract: A monolayer or multilayer film has a single layer or multiple layers of silica containing fluorine. An optical element has the forgoing film laid on a surface of a substrate. A concentration of the fluorine in the layer or layers of silica is not less than 0.1 mol % (referably, not less than 1 mol %) nor more than 10 mol %.Type: GrantFiled: July 24, 2001Date of Patent: September 20, 2005Assignee: Canon Kabushiki KaishaInventor: Hideo Kato
-
Patent number: 6917472Abstract: An achromatic Fresnel optic that combines a Fresnel zone plate and a refractive Fresnel lens. The zone plate provides high resolution for imaging and focusing, while the refractive lens takes advantage of the refraction index change properties of appropriate elements near absorption edges to recombine the electromagnetic radiation of different energies dispersed by the zone plate. This compound lens effectively solves the high chromatic aberration problem of zone plates. The AFO has a wide range of potential applications in lithography, microimaging with various contrast mechanisms and measurement techniques.Type: GrantFiled: April 25, 2002Date of Patent: July 12, 2005Assignee: Xradia, Inc.Inventors: Wenbing Yun, Yuxin Wang
-
Patent number: 6914723Abstract: A mask blank inspection tool includes an AFO having a diffractive lens and a refractive lens formed on a common substrate. The diffractive lens is a Fresnel zone plate and the refractive lens is a refractive Fresnel lens. The AFO is used to image light from a defect particle on a multilayer mask blank or the surface of the multilayer mask blank to a detector.Type: GrantFiled: April 29, 2003Date of Patent: July 5, 2005Assignee: Xradia, Inc.Inventors: Wenbing Yun, Yuxin Wang
-
Patent number: 6906857Abstract: The present disclosure is directed to an optical filter that advantageously approximates sunlight that is both durable and stable for long periods of time when subject to harsh light intensity, thermal and moisture loads of accelerating weathering devices. The optical filter includes a glass having a lead content of between 0.5% and 50% by weight. In some examples, the filter can be constructed to have a thickness of 0.7 mm to 10 mm. In another aspect of the disclosure, the optical filter is part of an optical filter assembly suitable for manipulating spectral power distribution. The optical filter assembly includes a lead glass optical filter having a lead content of between 0.5% and 50% by weight and an ultraviolet transmissive optical filter. In one example, the ultraviolet transmissive optical filter is constructed from quartz glass. The ultraviolet transmissive optical filter can further include an infrared absorbing coating.Type: GrantFiled: March 17, 2004Date of Patent: June 14, 2005Assignee: 3M Innovative Properties CompanyInventors: Richard M. Fischer, Jr., Bradley D. Guth, Warren D. Ketola, James W. Riley
-
Patent number: 6885503Abstract: A lithography apparatus having achromatic Fresnel objective (AFO) that combines a Fresnel zone plate and a refractive Fresnel lens. The zone plate provides high resolution for imaging and focusing, while the refractive lens takes advantage of the refraction index change properties of appropriate elements near absorption edges to recombine the electromagnetic radiation of different energies dispersed by the zone plate. This compound lens effectively solves the high chromatic aberration problem of zone plates. The lithography apparatus allows the use of short wavelength radiation in the 1-15 nm spectral range to print high resolution features as small as 20 nm.Type: GrantFiled: November 5, 2002Date of Patent: April 26, 2005Assignee: Xradia, Inc.Inventors: Wenbing Yun, Yuxin Wang, Kenneth W. Nill
-
Patent number: 6863403Abstract: A 1X projection optical system for deep ultra-violet (DUV) photolithography is disclosed. The optical system is a modified Dyson system capable of imaging a relatively large field at high numerical apertures at DUV wavelengths. The optical system includes a lens group having first and second prisms and four lenses having a positive-negative-positive negative arrangement as arranged in order from the prisms toward the mirror. A projection photolithography system that employs the projection optical system of the invention is also disclosed.Type: GrantFiled: May 27, 2003Date of Patent: March 8, 2005Assignee: Ultratech, Inc.Inventors: Romeo I. Mercado, Shiyu Zhang
-
Patent number: 6863842Abstract: An optical component formed of a material that blocks noise-causing visible and near-infrared rays selectively or as a whole while transmitting far-infrared rays to the extent possible, and a method for producing the component. The component is produced by adding at least one additive that blocks visible and near-infrared rays to a ceramic material of ZnS, ZnSe, or Ge. The component is most suitable for a particular purpose or use of an optical component, such as a window or lens to be used in a high-performance infrared apparatus, because noise-causing visible and near-infrared rays are blocked.Type: GrantFiled: November 29, 2001Date of Patent: March 8, 2005Assignee: Sumitomo Electric Industries, Ltd.Inventor: Masato Hasegawa
-
Patent number: 6859311Abstract: A UV-transmissable window assembly for a DMD device includes a UV-transmissable glass window provided in a frame. The window and frame are bonded together to preferably effect a hermetic seal therebetween. Optical coatings specific to the intended wavelength of light transmission are applied to the inner and outer surfaces of the glass window to reduce reflection and increase light transmission therethrough. The window assembly, and DMD provided with the same, is adapted for excellent transmission of ultraviolet light, even at the deep ultraviolet portion of the spectrum. The DMD window assembly has application in the medical arts, both surgery and device manufacture, in the production of integrated circuits (IC), and in other optical lithography applications, among other fields.Type: GrantFiled: March 24, 2003Date of Patent: February 22, 2005Assignee: Memphis Eye & Cataract Associates Ambulatory Surgery CenterInventors: Roy E. Williams, Brian M. Callies, David E. Thomas
-
Patent number: 6859309Abstract: The present disclosure is directed to an optical filter that advantageously approximates sunlight that is both durable and stable for long periods of time when subject to harsh light intensity, thermal and moisture loads of accelerating weathering devices. The optical filter includes a glass having a lead content of between 0.5% and 50% by weight. In some examples, the filter can be constructed to have a thickness of 0.7 mm to 10 mm. In another aspect of the disclosure, the optical filter is part of an optical filter assembly suitable for manipulating spectral power distribution. The optical filter assembly includes a lead glass optical filter having a lead content of between 0.5% and 50% by weight and an ultraviolet transmissive optical filter. In one example, the ultraviolet transmissive optical filter is constructed from quartz glass. The ultraviolet transmissive optical filter can further include an infrared absorbing coating.Type: GrantFiled: December 19, 2001Date of Patent: February 22, 2005Assignee: 3M Innovative Properties CompanyInventors: Richard M. Fischer, Jr., Bradley D. Guth, Warren D. Ketola, James W. Riley
-
Patent number: 6844972Abstract: An optical system includes multiple cubic crystalline optical elements and one or more polarization rotators in which the crystal lattices of the cubic crystalline optical elements are oriented with respect to each other to reduce the effects of intrinsic birefringence and produce a system with reduced retardance. The optical system may be a refractive or catadioptric system having a high numerical aperture and using light with a wavelength at or below 248 nanometers. The net retardance of the system is less than the sum of the retardance contributions of the respective optical elements. In one embodiment, all cubic crystalline optical elements are oriented with identical three dimensional cubic crystalline lattice directions, a 90° polarization rotator divides the system into front and rear groups such that the net retardance of the front group is balanced by the net retardance of the rear group.Type: GrantFiled: June 20, 2002Date of Patent: January 18, 2005Inventor: James P. McGuire, Jr.
-
Patent number: 6835683Abstract: A silica glass member of the present invention is one wherein when a composition thereof is expressed by SiOx, x is not less than 1.85 nor more than 1.95, wherein a concentration of hydrogen molecules included therein is not less than 1×1016 molecules/cm3 nor more than 5×1018 molecules/cm3, and wherein a difference A−B between an absorption coefficient A immediately before an end of irradiation with 1×104 pulses of ArF excimer laser light in an average one-pulse energy density of 2 mJ/cm2 and a second absorption coefficient B at 600 seconds after a stop of the irradiation with the ArF excimer laser light is not more than 0.002 cm−1. When this silica glass member is applied to an illumination optical system and/or a projection optical system in projection exposure apparatus, it becomes feasible to implement uniform exposure while reducing variation in illuminance on a reticle surface and in an exposure area on a wafer.Type: GrantFiled: December 17, 2002Date of Patent: December 28, 2004Assignee: Nikon CorporationInventors: Norio Komine, Akiko Yoshida, Hiroki Jinbo, Seishi Fujiwara
-
Patent number: 6833949Abstract: The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.Type: GrantFiled: September 9, 2002Date of Patent: December 21, 2004Assignee: Corning IncorporatedInventors: Robert L. Maier, Lisa A. Moore, Charlene M. Smith
-
Patent number: 6831790Abstract: An optical element having a substrate formed by an optical material and able to improve mechanical strength, wherein the substrate has a convex part functioning as a convex lens, a flat part positioned around the convex part, and an outer circumference part positioned around the flat part. The thickness of the substrate at the outer circumference part is greater than that of the substrate at the flat part.Type: GrantFiled: August 21, 2001Date of Patent: December 14, 2004Assignee: Sony CorporationInventors: Koichiro Kishima, Akira Kouchiyama
-
Patent number: 6825975Abstract: The present invention is directed to a transparent medium incorporating the oxidative polymerization of 3-hydroxykynurenine, a synthetic version of the yellow-to-brown pigment that occurs in the ocular crystalline lens with age. Because this coloration in the ocular lens is believed to offer photoprotection to the retina, it may represent an ideal sun lens filter with an optical transmission spectrum that is compatible with the psychophysical and neuro-physiological characteristics of the vision system.Type: GrantFiled: August 27, 2002Date of Patent: November 30, 2004Assignee: Photoprotective Technologies, Inc.Inventor: James Gallas
-
Patent number: 6824277Abstract: A method for reducing the contamination of at least one optical component (2, 3) contained in the beam guidance space (6) and held by a frame (4, 5) defining the beam guidance space and a corresponding optical beam guidance system. The surfaces of the frame bordering on the beam guidance space are at least partially coated with a degassing barrier layer (7) that preferably does not increase reflectivity. The method and system have use, for example, in lithography irradiation systems working with UV light.Type: GrantFiled: February 22, 2002Date of Patent: November 30, 2004Assignee: Carl Zeiss SMT AGInventors: Ansgar Freitag, Ulrich Bingel, Josef Distl, Uwe W. Hamm
-
Publication number: 20040223212Abstract: An optical device for a photolithography apparatus comprises a lens formed of a fluoride crystal material, a holder holding the lens, and a pressing member attached to the holder and pressing the lens to generate a stress in the lens. The stress can be generated in the lens by pressing the lens in a specified orientation with the pressing member to reduce the birefringence of the lens. When the lens is composed of a calcium fluoride crystal, the maximum value of the birefringence amount with respect to a light beam having a wavelength of about 157 nm can be made not more than 2.0 nm/cm within an effective aperture (light-transmitting area) of the lens, or the maximum value of the birefringence amount with respect to a light beam having a wavelength of about 193 nm can be made not more than 1.0 nm/cm within the effective aperture of the lens.Type: ApplicationFiled: June 8, 2004Publication date: November 11, 2004Applicant: NIKON CORPORATIONInventor: Shigeru Sakuma
-
Patent number: 6813092Abstract: In the zoom lens apparatus, a lens frame for a variable-magnification lens or a correcting lens is configured of an inner frame and an outer frame, and any focus blurring due to variations in wavelength of subject light can be compensated for accurately by shifting the inner frame holding the lens relative to the outer frame. The correcting lens frame for the correcting lens is configured of the inner frame and the outer frame, and the inner frame is shifted according to variations in wavelength of subject light. Any focus blurring can be thereby compensated for steplessly according to variations in wavelength of subject light.Type: GrantFiled: July 7, 2003Date of Patent: November 2, 2004Assignee: Fuji Photo Optical Co., Ltd.Inventors: Shigeru Yoshida, Takahiro Shimakura
-
Patent number: 6801358Abstract: A design for inspecting specimens, such as photomasks, for unwanted particles and features such as pattern defects is provided. The system provides no central obscuration, an external pupil for aperturing and Fourier filtering, and relatively relaxed manufacturing tolerances, and is suited for both broad-band bright-field and laser dark field imaging and inspection at wavelengths below 365 nm. In many instances, the lenses used may be fashioned or fabricated using a single material. Multiple embodiments of the objective lensing arrangement are disclosed, all including at least one small fold mirror and a Mangin mirror. The system is implemented off axis such that the returning second image is displaced laterally from the first image so that the lateral separation permits optical receipt and manipulation of each image separately.Type: GrantFiled: January 27, 2003Date of Patent: October 5, 2004Assignee: KLA-Tencor CorporationInventors: David R. Shafer, Yung-Ho Chuang, J. Joseph Armstrong
-
Patent number: 6801357Abstract: An ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability. The microscope system, which comprises a catadioptric lens group and a zooming tube lens group, has high optical resolution in the deep UV wavelengths, continuously adjustable magnification, and a high numerical aperture. The system integrates microscope modules such as objectives, tube lenses and zoom optics to reduce the number of components, and to simplify the system manufacturing process. The preferred embodiment offers excellent image quality across a very broad deep ultraviolet spectral range, combined with an all-refractive zooming tube lens. The zooming tube lens is modified to compensate for higher-order chromatic aberrations that would normally limit performance.Type: GrantFiled: October 29, 2002Date of Patent: October 5, 2004Assignee: KLA - Tencor CorporationInventors: David R. Shafer, Yung-Ho Chuang, Bin-Ming B. Tsai
-
Publication number: 20040190127Abstract: A UV-transmissable window assembly for a DMD device includes a UV-transmissable glass window provided in a frame. The window and frame are bonded together to preferably effect a hermetic seal therebetween. Optical coatings specific to the intended wavelength of light transmission are applied to the inner and outer surfaces of the glass window to reduce reflection and increase light transmission therethrough. The window assembly, and DMD provided with the same, is adapted for excellent transmission of ultraviolet light, even at the deep ultraviolet portion of the spectrum. The DMD window assembly has application in the medical arts, both surgery and device manufacture, in the production of integrated circuits (IC), and in other optical lithography applications, among other fields.Type: ApplicationFiled: March 24, 2003Publication date: September 30, 2004Applicant: Memphis Eye & Cataract Associates Ambulatory Surgery Center (dba MECA Laser and Surgery CenterInventors: Roy E. Williams, Brian M. Callies, David E. Thomas
-
Patent number: 6788471Abstract: The invention relates to a projection exposure apparatus for microlithography at &lgr;<200 nm. The projection exposure apparatus for microlithography has a light source with a wavelength less than 200 nm and a bandwidth, which is less than 0.3 pm, preferably less than 0.25 pm and greater than 0.1 pm. The projection exposure apparatus includes an exclusively refractive projection objective which is made out of a single lens material. The projection objective provides for a maximum image height in the range of 12 mm to 25 mm, an image side numerical aperture in the range of 0.75 up to 0.95 and a monochromatic correction of the wavefront of rms<15‰ of the wavelength of the light source.Type: GrantFiled: October 17, 2002Date of Patent: September 7, 2004Assignee: Carl Zeiss Semiconductor Manufacturing Technologies AGInventors: Christian Wagner, Wilhelm Ulrich
-
Patent number: 6788389Abstract: A projection optical system in which an image of a first surface is projected onto a second surface based on a light beam having a predetermined wavelength. The projection optical system having at least one isometric system refractive member made of an isometric system crystal material. The isometric system crystal material transmits a light beam having the predetermined wavelength. The projection optical system also has an amorphous refractive member made of an amorphous material for compensating deterioration of optical performance due to intrinsic birefringence of the isometric system refractive member.Type: GrantFiled: July 10, 2002Date of Patent: September 7, 2004Assignee: Nikon CorporationInventors: Youhei Fujishima, Hironori Ikezawa, Toshihiko Ozawa, Yasuhiro Omura, Takeshi Suzuki
-
Publication number: 20040150877Abstract: An optical arrangement is equipped with lenses (22, 42) of double-refracting optically single-axis material in a pupillary plane (21, 41) and in tangentially polarized light or radially linearly polarized light. In this way, and for 157 nm lithography, MgF2 is usable as additional lens material with a deviating refracting index for achromatization with CaF2/BaF2.Type: ApplicationFiled: January 26, 2004Publication date: August 5, 2004Inventors: Artur Hogele, Karl-Heinz Schuster
-
Patent number: 6768581Abstract: A coated optical lens includes a lens element and a coating on the surface of the lens element. The coating exhibits a substantially balanced reflectance from the center to a radius proximate the edge of the lens element. The term “substantially balanced reflectance” means that where the thickness of the coating varies across the surface of the lens, the lightness, hue and chroma of the reflectance vary in a balanced manner such that variations in visual appearance are either imperceptible or generally acceptable to an observer. For example, variations in chromatic attributes, such as hue, from the center to the edge of the lens may be balanced by a reduction in lightness from the center to the edge. Preferably, the lens element includes a surface of high curvature upon which the balanced reflectance coating is deposited.Type: GrantFiled: August 14, 2001Date of Patent: July 27, 2004Assignee: Sola International Holdings Ltd.Inventors: Brandon Yip, Brian Douglas Adams, Paraic Begley
-
Publication number: 20040141230Abstract: An optical material, particularly a plastic lens for spectacles, which absorbs almost all UV rays of up to around 400 nm or so and is not too yellow in color, is obtained by adding 2-(2-hydroxy-4-octyloxyphenyl)-benzotriazole to a diethylene glycol bisallylcarbonate monomer, a (thio)urethane monomer or an episulfide monomer, mixing them, and polymerizing the monomer.Type: ApplicationFiled: January 5, 2004Publication date: July 22, 2004Inventor: Masahisa Kosaka
-
Publication number: 20040130780Abstract: The present invention relates to a method for making an achromatic lens. The invention provides a method for making a lens that makes use of the differences in the index of refraction of ZnSe and ZnS in the mm-wave and IR wavebands to minimize the differences in focal position between the two wavebands. A lens train thus made can be used in conjunction with a dual-band focal plane array to simultaneously focus two wavebands on a common focal plane and thus provide for simultaneous imaging in both wavebands.Type: ApplicationFiled: October 7, 2003Publication date: July 8, 2004Inventors: Robin J. Harvey, Franklin Dolezal
-
Patent number: 6754002Abstract: Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm2/pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02×1018 molecules/cm3 and about 0.18×1018 molecules/cm3 are provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.Type: GrantFiled: September 27, 2001Date of Patent: June 22, 2004Assignee: Corning IncorporatedInventors: Nicholas F. Borrelli, Charlene M. Smith, Johannes Moll
-
Patent number: 6717722Abstract: A projection exposure lens system has an object side catadioptric system, and intermediate image and a refractive lens system. The refractive lens system from its intermediate image side and in the direction of its image plane has a first lens group of positive refractive power, a second lens group of negative refractive power, a third lens group of positive refractive power, a fourth lens group of negative refractive power, and a fifth lens group of positive refractive power.Type: GrantFiled: February 20, 2002Date of Patent: April 6, 2004Inventors: David R. Shafer, Helmut Beierl, Gerhard Fürter, Karl-Heinz Schuster, Wilhelm Ulrich
-
Publication number: 20040042071Abstract: A light emitting module 10 is provided with a semiconductor light emitting device 21, a semiconductor light receiving device 22, a mount member 20 on which the semiconductor light emitting device 21 and semiconductor light receiving device 22 are mounted, a lens 32, and a lens holding member 30 for holding the lens 32. Part of light emitted by the semiconductor light emitting device 21 is reflected by a reflecting film 32c provided on a first surface 32a of the lens 32 to enter the semiconductor light receiving device 22. Therefore, the semiconductor light receiving device 22 can receive forward light from the semiconductor light emitting device 21, without using a half mirror.Type: ApplicationFiled: August 25, 2003Publication date: March 4, 2004Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.Inventor: Masahiro Sato
-
Publication number: 20040032648Abstract: An optical element, such as a lens, is described that provides good transmission of radiation in the infrared portion of the electromagnetic spectrum, that can be molded using an injection molding technique. The optical element comprises a moldable matrix in which is distributed a plurality of particles. The material comprising the matrix is selected so as to have a relatively low absorption of radiation in the infrared portion of the electromagnetic spectrum, and the material comprising the particles is selected to have a relatively high transmissivity of radiation in the infrared portion of the electromagnetic spectrum, and both materials are selected so as to have approximately the same index of refraction. The optical element comprising the matrix/particle composite is formed to provide surfaces having the contours that are required to provide the desired optical properties.Type: ApplicationFiled: December 19, 2002Publication date: February 19, 2004Inventor: Marc Daigle
-
Publication number: 20040021943Abstract: Systems and methods for improved correction of intrinsic birefringence are provided. Two pairs of optical elements correct for intrinsic birefringence of optical materials. A combination of design criteria for the set of optical elements, including refractive power type, intrinsic birefringence signs, and crystal axis rotation, is used to correct for intrinsic birefringence.Type: ApplicationFiled: November 27, 2002Publication date: February 5, 2004Applicant: ASML US, Inc.Inventor: Harry Sewell
-
Patent number: 6683714Abstract: A birefringence minimizing fluoride crystal vacuum ultraviolet (“VUV”) optical lithography lens element is provided for use with lithography wavelengths<230 nm. The VUV lithography lens element has an optical axis encompassed by a lens perimeter with the fluoride crystal lens having a variation in crystallographic orientation direction which tilts away from the optical center axis towards the lens perimeter to provide minimal birefringence. The invention includes a birefringence minimizing fluoride crystal optical lithography lens blank with a variation in crystallographic orientation direction across the blank.Type: GrantFiled: October 31, 2001Date of Patent: January 27, 2004Assignee: Corning IncorporatedInventors: Gautam Meda, Michael Rivera, Michael W. Price
-
Patent number: 6680794Abstract: The present invention provides a photolithography system having a catadioptric system with a polarizing beam splitter cube. The beam splitter cube transmits light at wavelengths equal to or less than 170 nm. The polarizing beam splitter cube can image at high quality light incident over a wide range of angles and including a numeric aperture greater than 0.6. In one embodiment, the polarizing beam splitter cube comprises a pair of prisms that are made of at least a fluoride material, such as calcium fluoride, and a coating interface having at least one layer of a thin film fluoride material. Layers in a multi-layer stack can also be graded across the hypotenuse face of a prism to adjust layer thicknesses at any point so as to compensate for changes in the incidence angle of the light. In one embodiment, the prisms and coating interface are joined by optical contact.Type: GrantFiled: October 4, 2002Date of Patent: January 20, 2004Assignee: ASML Holding N.V.Inventors: James A. McClay, Ronald A. Wilklow, Matthew Gregoire
-
Patent number: 6665116Abstract: The present invention relates to a method for designing an achromatic lens and a lens according to the design. The invention provides a lens that makes use of the differences in the index of refraction of ZnSe and ZnS in the mm-wave and IR wavebands to minimize the differences in focal position between the two wavebands. This lens train can be used in conjunction with a dual-band focal plane array to simultaneously focus two wavebands on a common focal plane and thus provide for simultaneous imaging in both wavebands.Type: GrantFiled: July 10, 2000Date of Patent: December 16, 2003Assignee: HRL Laboratories, LLCInventors: Robin J. Harvey, Franklin A Dolezal
-
Publication number: 20030227670Abstract: An optical element of the present invention comprises a fluorite substrate 1, and a lanthanum fluoride film 2 formed directly on the substrate 1. The substrate 1, on which the lanthanum fluoride film 2 is formed, has a plane which is a (111) plane or a plane inclined by an angle within ±30 degrees, preferably within 15 degrees from the (111) plane. Therefore, the lanthanum fluoride film undergoes the crystal growth subjected to the C-axis orientation on the optical substrate. Since the lanthanum fluoride film is dense and has a small surface area, it scarcely involves the oxidation and hydroxylation areas as well as the structural defect. Therefore, it is possible to reduce the optical loss of the optical element in the vacuum ultraviolet region.Type: ApplicationFiled: June 19, 2003Publication date: December 11, 2003Applicant: Nikon Corporation, Tokyo, JapanInventor: Yusuke Taki
-
Patent number: 6661580Abstract: Techniques for increasing the percentage of light that is transmitted through optical inspection systems that operate in or near the ultraviolet and deep ultraviolet electromagnetic spectrums are described. Along with increasing the amount of light transmission, the techniques of the present invention also provide additional advantages such as reduction of ripple, increased ability to match inspection systems, and improving manufacturability. The techniques of the present invention involve using an auto-focus light source near the operational range of the inspection system and slightly raising the lower end of the operational range.Type: GrantFiled: June 28, 2002Date of Patent: December 9, 2003Assignee: KLA-Tencor Technologies CorporationInventor: Richard William Solarz
-
Publication number: 20030218810Abstract: A mechanism element for optical devices has a light-incident part on which light having a wavelength of 700 nm or more is incident, and the light-incident part is made of aluminum or an alloy of aluminum or magnesium. An anodizing process treatment to form an anodized coating is performed at least on the light-incident part, and then the surface of the light-incident part is colored to be black by a secondary electrolytic coloring method.Type: ApplicationFiled: March 19, 2003Publication date: November 27, 2003Applicant: Fuji Photo Optical Co., Ltd.Inventors: Seiji Tohyama, Hiroshi Kobayashi, Shigeo Konno
-
Patent number: 6646797Abstract: An exposure apparatus (PE1) and exposure method for use in photolithographically manufacturing devices such as semiconductor devices, image pickup devices, liquid crystal display devices and thin film magnetic heads. The apparatus is capable of transferring onto a substrate (W) the image of a pattern on a reticle (R) and includes a light source (2) capable of supplying an exposure energy beam (IL) with a wavelength under 200 nm, and an illumination optical system arranged to receive the exposure energy beam from said light source. The illumination optical system is designed to guide the exposure energy beam to the reticle. The apparatus also includes a projection optical system (PL) arranged between the reticle and the substrate. The projection optical system is capable of forming an image of the reticle pattern onto the substrate based on the exposure energy beam passing through the reticle.Type: GrantFiled: August 1, 2002Date of Patent: November 11, 2003Assignee: Nikon CorporationInventors: Yutaka Suenaga, Yasuhiro Omura
-
Publication number: 20030206337Abstract: An exposure apparatus (10) for applying high-intensity, uniform polarized UV irradiation to a sensitized substrate such as an LCD alignment layer. A telecentric projection system (20) projects a uniformized light towards a surface (28) for irradiation. One or more individual light sources (12) can be combined to provide the intensity needed over the area of the surface (28). An integrator (40) with combining structures (42) allows combination of light from multiple light sources (12). A polarizer (18) is provided at one of an alternate number of locations in the exposure illumination path.Type: ApplicationFiled: May 6, 2002Publication date: November 6, 2003Applicant: Eastman Kodak CompanyInventors: Rongguang Liang, David Kessler
-
Patent number: 6636349Abstract: An imaging optical system includes a polarization beam splitter, a quarter waveplate, a reflection mirror and polarization state changing unit. The beam from an object plane is projected by way of the polarization beam splitter and the quarter waveplate to reflection mirror. The projected beam is reflected by the reflection mirror and is projected through the quarter waveplate and by way of the polarization beam splitter to an image plane, and the polarization state changing unit is disposed between the polarization beam splitter and the image plane to change the state of polarization of the beam projected by way of the polarization beam splitter. The polarization state changing unit includes a half waveplate effective to transform the beam projected by way of the polarization beam splitter into a rectilinearly polarized beam, being polarized in a desired direction.Type: GrantFiled: March 20, 2001Date of Patent: October 21, 2003Assignee: Canon Kabushiki KaishaInventors: Kazuhiro Takahashi, Masato Muraki
-
Publication number: 20030169491Abstract: A night vision system, suitable for vehicular use, including an infra-red detector mounted on a vehicle, a display mounted on the vehicle, a single-element lens mounted upstream of the infra-red detector so as to direct light from a scene onto the infra-red detector, and circuitry operative to receive a detector output from the infra-red detector and to provide an image output based on the detector output to the display. The system is suitable for applications other than vehicular use, where a comparatively narrow field of view is to be imaged.Type: ApplicationFiled: May 12, 2003Publication date: September 11, 2003Inventors: Eliyahu Bender, Nissim Asida
-
Publication number: 20030147128Abstract: A design for inspecting specimens, such as photomasks, for unwanted particles and features such as pattern defects is provided. The system provides no central obscuration, an external pupil for aperturing and Fourier filtering, and relatively relaxed manufacturing tolerances, and is suited for both broad-band bright-field and laser dark field imaging and inspection at wavelengths below 365 nm. In many instances, the lenses used may be fashioned or fabricated using a single material. Multiple embodiments of the objective lensing arrangement are disclosed, all including at least one small fold mirror and a Mangin mirror. The system is implemented off axis such that the returning second image is displaced laterally from the first image so that the lateral separation permits optical receipt and manipulation of each image separately.Type: ApplicationFiled: January 27, 2003Publication date: August 7, 2003Inventors: David R. Shafer, Young-Ho Chuang, J. Joseph Armstrong
-
Patent number: 6603601Abstract: The present invention provides an infrared laser optical element, in which a dense optical thin film with a low laser absorption and high moisture resistance is formed on the surface thereof, and a manufacturing method for the same. In this infrared laser optical element, the main surface of the optical substrate is smoothed, a BaF2 film formed on said main surface thereof and then a ZnSe film formed on said BaF2 film. The smoothing treatment for the main surface of the optical substrate is carried out by irradiating Xe gas ion beams. The BaF2 and the ZnSe films formed on said BaF2 film are formed on the main surface of the optical substrate, which has been smoothed, by Xe gas ion assisted vapor deposition. Superior performance can be achieved if the series of treatments are carried out under the specified conditions.Type: GrantFiled: November 7, 2001Date of Patent: August 5, 2003Assignee: Sumitomo Electric Industries, Ltd.Inventors: Hiromi Iwamoto, Hirokuni Nanba
-
Patent number: 6597498Abstract: The invention is directed to an optical system for the vacuum ultraviolet range wherein the optical system utilizes the isotropic point at which the wavelength of the double refraction of a crystal is eliminated. The crystal is preferably of MgF2. With the optical system, a known good optical material, namely, MgF2, which is limited only by its double refraction, becomes usable for the VUV optics.Type: GrantFiled: July 7, 2000Date of Patent: July 22, 2003Assignee: Carl-Zeiss-StiftungInventor: Karl-Heinz Schuster
-
Patent number: 6587262Abstract: This invention provides a synthetic silica glass optical member used together with light having a specific wavelength of 250 nm or less, in which the difference between the maximum value and the minimum value of transmittance [%/cm] per cm in thickness for the light in a predetermined direction within a plane perpendicular to the optical axis is 2.0%/cm or less.Type: GrantFiled: October 12, 2000Date of Patent: July 1, 2003Assignee: Nikon CorporationInventors: Seishi Fujiwara, Norio Komine, Hiroki Jinbo
-
Patent number: 6583931Abstract: In a projection optical system having at least two silica glass optical members, a birefringence value is measured at each of points in a plane normal to the optical axis with the center at an intersection of each optical member with the optical axis, a distribution of signed birefringence values in each optical member is obtained by assigning a positive sign to each birefringence value when a direction of the fast axis thereof is a radial direction to the intersection with the optical axis and assigning a negative sign to each birefringence value when the direction of the fast axis thereof is normal to the radial direction, and the optical members are combined with each other so as to satisfy such a placement condition that a signed birefringence characteristic value of the entire projection optical system calculated based on the distributions of signed birefringence values is between −0.5 and +0.5 nm/cm both inclusive.Type: GrantFiled: December 27, 2001Date of Patent: June 24, 2003Assignee: Nikon CorporationInventors: Hiroyuki Hiraiwa, Issey Tanaka