Abstract: A method for evaluating an optical member for photolithography composed of a fluoride crystal comprises a step of measuring a crystal plane orientation of the optical member, and a step of specifying a twin region on the basis of a result of the measurement. The twin region in an effective region of an optical element is specified as a total area of a region obtained by projection onto a plane perpendicular to an optical axis of the optical element. It is judged that the optical member is usable when the total area is not more than 10% of an effective diametric area or a partial diametric area of the optical element. The obtained optical element has satisfactory image formation characteristics because of less birefringence.

Abstract: An optical element (1) of the present invention is provided with an optical substrate (10) and a multilayered optical thin film (11-16) formed on the optical substrate (10). An MgF2 layer (12, 16) of the multilayered optical thin film has a refractive index of 1.10 to 1.35, especially 1.15 to 1.25 with respect to a vacuum ultraviolet light beam having a wavelength of not more than 250 nm. Therefore, when the optical element (1) is used together with an excimer laser light beam having a wavelength of, for example, 248 nm (KrF), 193 nm (ArF), or 157 nm (F2), excellent optical characteristics are exhibited concerning, for example, the reflectance (anti-reflection), the polarization characteristics, and the dependency on the angle of incidence. The MgF2 layer (12, 16) can be produced in accordance with the sol-gel method. The optical element is preferably used for a projection lens of an exposure apparatus which uses the excimer laser light beam as a light source.

Abstract: An optical system includes multiple cubic crystalline optical elements and one or more polarization rotators in which the crystal lattices of the cubic crystalline optical elements are oriented with respect to each other to reduce the effects of intrinsic birefringence and produce a system with reduced retardance. The optical system may be a refractive or catadioptric system having a high numerical aperture and using light with a wavelength at or below 248 nanometers. The net retardance of the system is less than the sum of the retardance contributions of the respective optical elements. In one embodiment, all cubic crystalline optical elements are oriented with identical three dimensional cubic crystalline lattice directions, a 90° polarization rotator divides the system into front and rear groups such that the net retardance of the front group is balanced by the net retardance of the rear group.

Abstract: The invention provides a method of making a <194 nm wavelength calcium fluoride crystal optical lithography element for transmitting wavelengths less than about 194 nm along an optical axis with minimal birefringence by providing an optical element optical calcium fluoride crystal with an input face {100} crystal plane and forming the input face {100} crystal plane into an optical lithography element surface of an optical lithography element having an optical axis, with the optical axis aligned with a <100> crystal direction of the optical calcium fluoride crystal. In a preferred embodiment, the below 194 nm transmitting optical element is a <100>oriented calcium fluoride lens. In a preferred embodiment, the below 194 nm transmitting optical element is a <100> oriented calcium fluoride beam splitter.

Abstract: An infrared optical system for infrared cameras has a convex lens held by a holding member composed of a low-dispersion material that transmits infrared light. A stop for restricting light beams entering the convex lens is disposed on an object side from the convex lens. An aberration correcting plate for reducing spherical aberration is provided in the vicinity of the stop. A field flattener, the thickness of which changes along image height to offset curvature of field, is disposed on an image side of the convex lens.

Abstract: A pellicle comprising a box-shaped pellicle frame having top and bottom openings, and a pellicle sheet bonded to the pellicle frame to cover one of the openings of the pellicle frame, wherein the pellicle frame is made of quartz glass, a plurality of vent holes are formed as distributed on opposing side walls of the pellicle frame, and the size of the vent holes in the direction of the height of the pellicle frame is at most ⅗ of the height of the pellicle frame.

Abstract: A silica glass has a structure determination temperature of 1200 K or lower and an OH group concentration of at least 1,000 ppm. The silica glass is used for photolithography together with light in a wavelength region of 400 nm or shorter.

Abstract: A method for fabricating a geometric beamsplitter involves applying a reflective coating having at least one metallic layer to a transparent substrate. A pattern of holes containing numerous holes that are preferably randomly distributed over its reflective surface is created in the reflective coating using laser processing. The method allows inexpensively fabricating beamsplitters that have accurately defined transmittances. Beamsplitters in accordance with the invention are suitable for use as dosimetry mirrors on, for example, the illumination systems of microlithographic projection exposure systems.

Abstract: A design for inspecting specimens, such as photomasks, for unwanted particles and features such as pattern defects is provided. The system provides no central obscuration, an external pupil for aperturing and Fourier filtering, and relatively relaxed manufacturing tolerances, and is suited for both broad-band bright-field and laser dark field imaging and inspection at wavelengths below 365 nm. In many instances, the lenses used may be fashioned or fabricated using a single material. Multiple embodiments of the objective lensing arrangement are disclosed, all including at least one small fold mirror and a Mangin mirror. The system is implemented off axis such that the returning second image is displaced laterally from the first image so that the lateral separation permits optical receipt and manipulation of each image separately.

Abstract: A bright wide-angle infrared lens, suitable for a wavelength band of 8 to 12 &mgr;m, having favorable imaging performances comprises, successively from the object side, a first lens L1 made of a positive meniscus lens having a convex surface directed onto the object side and an image-side surface formed aspheric, a second lens L2 made of a negative meniscus lens having a convex surface directed onto the object side, and a third lens L3 having a positive refracting power with a convex surface directed onto the object side.

Abstract: An infrared lens is made from a moldable IR transmissive material and has an optically significant surface with a surface relief holographic grating. The moldable IR transmissive material is an arsenic selenide glass. The lens and the optically significant surface are manufactured as a unitary structure in a molding operation.

Abstract: A projection exposure lens system has an object side catadioptric system, and intermediate image and a refractive lens system. The refractive lens system from its intermediate image side and in the direction of its image plane has a first lens group of positive refractive power, a second lens group of negative refractive power, a third lens group of positive refractive power, a fourth lens group of negative refractive power, and a fifth lens group of positive refractive power.

Abstract: A projection exposure lens system has an object side catadioptric system, and intermediate image and a refractive lens system. The refractive lens system from its intermediate image side and in the direction of its image plane has a first lens group of positive refractive power, a second lens group of negative refractive power, a third lens group of positive refractive power, a fourth lens group of negative refractive power, and a fifth lens group of positive refractive power.

Abstract: A novel thin infrared lens comprising an infrared lens and a hard and thin substrate that allows infrared lights to penetrate, is disclosed. The infrared lens may be a Fresnel refraction lens, prepared as a thin film by injection or casting. The infrared lens is attached to the thin substrate to form a lens assembly. The infrared lens may be pressed or adhered to the thin substrate or enveloped by the thin substrate to form the assembly.

Abstract: Plasticized polyvinyl butyral sheet containing dispersed therein, an infrared-absorbing effective amount of at least one quaterrylenetetracarboxylic diimide infrared-absorbing additive of formula I in the specification. A glass laminate having visible light transmitting and infrared light absorbing properties contains such sheet sandwiched between glass layers.

Abstract: An optical system for integrated circuit fabrication comprises optical members made of synthetic quartz glass and fluorite, wherein: an optical member disposed in a position through which laser light is transmitted at a high light energy density, is made of single crystal fluorite; and an optical member in a position through which laser light is transmitted at a low light energy density, is made of synthetic quartz glass containing approximately such a hydrogen molecule concentration as can be doped under atmospheric pressure.

Abstract: A synthetic glass member for use in excimer laser lithography, having superior homogeneity, high transmittance for ArF excimer laser beams and an excellent resistance against lasers is made from high purity synthetic quartz glass, and it is characterized in that layered structures, striae in three directions and internal strains are thermally and mechanically removed, the distribution of refractive index (&Dgr;n) in a plane orthogonal to the optical axis is up to about 1×10−6, the distribution of refractive index (&Dgr;n) in a plane parallel to the optical axis is up to about 5×10−6, the birefringence is up to about 2 nm/cm, the hydrogen molecule concentration is at least about 2×1017 molecules/cm3, and the internal transmittance is at least about 99.8% at a wavelength of 193.4 nm.

Abstract: A multi-beam zoom lens for producing variable spot sizes on a photosensitive medium from a plurality of individually modulated light sources wherein each light source emits a light beam parallel to each of the other light sources and parallel to an optical axis and wherein a numerical aperture of each of said light beams is greater than 0.125, comprising an afocal zoom lens (10). The afocal zoom lens comprises a first moving group of lenses (13), a second group of moving lenses (14), and a third group of moving lenses (15). A constant barrel length of the afocal zoom lens is less than 160 mm and the zoom lens has a constant distance from the light sources to the photosensitive medium of less than 180 mm. The zoom lens has an afocal magnification of at least 45% across a zoom range.

Abstract: Disclosed is an optical element including a substrate made of a monocrystal of a fluoride compound, and a fine structure formed on the substrate and made of a non-monocrystal of metal fluoride. Also disclosed are an optical system having such optical element, and an exposure apparatus having such optical system incorporated therein.

Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed with the silicon oxyfluoride glass having a preferred fluorine content<0.5 weight percent. The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a “dry,” silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract: A silica glass optical material for projection lens to be used in vacuum ultraviolet radiation lithography using radiation from 155 to 195 nm in wavelength, wherein, said silica glass optical material is of ultrahigh purity, contains from 1 to 10 wtppm of OH groups, from 100 to 10,000 wtppm of F, and from 1×1017 to 1×1019 molecules/cm3 of H2, and has a distribution in concentration of F that is axially symmetrical to the central axis.

Abstract: A silica glass member is provided for use in an optical system using light of a wavelength equal to or less than about 400 nm as a light source. The silica glass member has striae in a direction different from an optical axis of the optical system. The strength of the striae is equal to or less than about 2×10−6 in terms of refractive index differential.

Abstract: The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.

Abstract: An exposure apparatus (PE1) and exposure method for use in photolithographically manufacturing devices such as semiconductor devices, image pickup devices, liquid crystal display devices and thin film magnetic heads. The apparatus is capable of transferring onto a substrate (W) the image of a pattern on a reticle (R) and includes a light source (2) capable of supplying an exposure energy beam (IL) with a wavelength under 200 nm, and an illumination optical system arranged to receive the exposure energy beam from said light source. The illumination optical system is designed to guide the exposure energy beam to the reticle. The apparatus also includes a projection optical system (PL) arranged between the reticle and the substrate. The projection optical system is capable of forming an image of the reticle pattern onto the substrate based on the exposure energy beam passing through the reticle.

Abstract: High-density polyethylene (HDPE) is used as a coating for optical elements operating in transmission in the infrared spectrum, which are made up of a material other than polyethylene, such as hygroscopic salt, semiconductor materials, fluorides, chalcogenides, silver halides, and others, so as to exploit the optical properties of HDPE, at the same time keeping the thickness reduced.

Abstract: An apparatus and method of fabricating and operating a micro-electromechanical systems (MEMS) integrated optical structure is disclosed. Micro-optics is integrated with MEMS actuators to provide a building block for a micro-optical communication device. Such micro-optical communication device may realize a variety of optical communication systems including optical interconnects, laser communications, or fiber optic switches. In accordance with one aspect of the present invention, a micro-optical element such as a micro-lens is advantageously integrated with an actuator such as MEMS comb drive actuator to form a MEMS lens assembly. The MEMS lens assembly is further coupled to an optical source which may provide a MEMS integrated micro-optical communication device. This integration substantially obviates the generally needed external or manual positioning of the micro-optical element to align a light beam or an optical signal being emitted from the optical source.

Abstract: A dual field-of-view objective system (40) which is inexpensive, has high transmission and is essentially achromatized and athermalized. The system (40) uses a silicon front lens A and all lens elements have positive temperature/refractive index change coefficient.

Abstract: An infrared imaging system (10) includes a catheter (11). The catheter is inserted into a small passageway, such as a blood vein (23), in order to collect infrared information from the vein. The information is refracted by at least one lens (32, 46, 52, 57, 63) in a collecting section (17, 45, 56, 61) of the catheter, and is imaged onto the ends (38) of an array of optical fibers (34). The fibers transmit the information to a relay lens (42), which images the information onto respective detector elements of an infrared detector (12). The infrared detector converts the information received from the relay lens into electrical information, which is transmitted to a circuit (13). The circuit generates electrical data that is transmitted to a display (16), which displays a visible image based on the infrared radiation emitted by the scene.

Abstract: An optical member for photolithography made of a calcium fluoride crystal exhibits an internal transmittance of 99.5%/cm or greater with respect to light having a specific wavelength of 185 nm or shorter.

Abstract: In a projection optical system having at least two silica glass optical members, a birefringence value is measured at each of points in a plane normal to the optical axis with the center at an intersection of each optical member with the optical axis, a distribution of signed birefringence values in each optical member is obtained by assigning a positive sign to each birefringence value when a direction of the fast axis thereof is a radial direction to the intersection with the optical axis and assigning a negative sign to each birefringence value when the direction of the fast axis thereof is normal to the radial direction, and the optical members are combined with each other so as to satisfy such a placement condition that a signed birefringence characteristic value of the entire projection optical system calculated based on the distributions of signed birefringence values is between −0.5 and +0.5 nm/cm both inclusive.

Abstract: A catadioptric anamorphic beam expanding telescope expands an optical beam in a first axis substantially perpendicular to the beam propagation axis, and deflects it in a plane substantially perpendicular to the first axis. The beam expanding telescope can include reflective, refractive, and combined reflective/refractive elements. An embodiment includes an off axis convex spheric reflector and an off axis combined reflective/reflective optical element, commonly known as a Mangin mirror, incorporating a refractive first surface and a reflective rear surface, which compensate for aberrations introduced by the off axis deflection of the beam. The telescope is particularly useful for deep ultraviolet (DUV) applications at wavelengths shorter than about 250 nm. In some applications, the telescope illuminates a diffraction grating or other wavelength dispersive element, aligned to retroreflect a preferential wavelength, thereby providing wavelength narrowing.

Abstract: A mirror projection system for use in a step-and-scan lithographic projection apparatus in which a mask pattern (15) is repetitively scan-imaged on a number of areas of a substrate (20) by means of a beam (b) of EUV radiation having a circular segment-shaped cross-section. This system, which is easier to manufacture at lower cost than a projection system with six or more imaging mirrors, has only five imaging mirrors (5-9) with a good numerical aperture and an acceptable image-ringfield width. An EUV lithographic projection apparatus provided with the new projection system has a wafer throughput which is approximately 50% higher than that of an apparatus provided with a six-mirror projection system. Moreover, it has a compact construction.

Abstract: An optical device includes a substrate 60 and three prisms 10, 20 and 30. The first prism 10 is disposed adjacent to an upper surface of the substrate 60. An incoming beam aperture 65 is positioned adjacent a first surface 12 of the first prism 10, the first surface 12 extending away from the upper surface of the substrate 60. The second prism 30 is disposed adjacent to the upper surface of the substrate 60 and is spaced from the first prism 10 by a first distance. The third prism 20 is also disposed adjacent to the upper surface of the substrate 60. The third prism 20 may be spaced from the second prism 30 by the same first distance. An outgoing beam aperture 66 is positioned adjacent a first surface 22 of the third prism 20. The substrate 60 has phase changing reflective surfaces 40 and 50 along the upper surface between the first prism 10 and the second prism 30 and between the second prism 30 and the third prism 20.

Abstract: The present invention is a method of making a lithography photomask and photomask blank. The method of making the lithography photomask and photomask blank includes providing a silicon oxyfluoride glass tube having an OH content less than 50 ppm. The method further includes cutting the silicon oxyfluoride glass tube, flattening the silicon oxyfluoride glass tube, and forming the flattened cut silicon oxyfluoride glass tube into a photomask blank having a planar surface. The present invention includes a glass lithography mask preform. The glass lithography mask preform is a longitudinal silicon oxyfluoride glass tube that has an OH content ≦10 ppm, a F wt. % concentration ≧0.5 wt. %.

Abstract: An optical element includes a first substrate having a diffractive surface or a surface structure with a surface level difference, a second substrate for covering the diffractive surface or the surface structure to provide a shield therefor, and a groove provided at the diffractive surface or the surface structure, and extending from a central portion to a peripheral portion thereof, for discharging or replacing a gas at the diffractive surface or the surface structure therethrough.

Abstract: A multiwavelength imaging and spectroscopic photoemission microscope system (100) which simultaneously provides images in a broad range of the electromagnetic spectrum, such as between 200 nm-1000 nm (optical or visible light) and 1000 nm-500 nm (infrared light). The multiwavelength imaging and spectroscopic photoemission microscope system comprises a microscope (102), a spectrometer (106), a beam splitter (108), a first spectrum focal plane array (110) including an appropriate photodiode (114A), a second spectrum focal plane array (120) including an appropriate photodiode (114B), and a cryogenic vessel (160) to maintain relevant portions of the system at a very low temperature. The invention may be used in failure analysis of integrated circuits and in semiconductor and low temperature physics.

Abstract: A particularly constructed objective lens unit is provided for reflective fluorescence that transmits excitation light well, generates little self-fluorescence, and can correct for various aberrations. The objective lens unit has a front lens group closer to a specimen side than a rear lens group. Among the lens components forming the front lens group, at least the lens components arranged on the specimen side are formed from a prescribed optical material. This optical material has a higher transmissivity for excitation light and generates less fluorescence due to the excitation light than the other lens components forming the objective lens unit. The excitation light, fed into a position path between the front lens group and the rear lens group, is guided through the front lens group to the specimen. An image of the specimen is formed, based on the fluorescence from the specimen, through the front lens group and the rear lens group.

Abstract: Multi-spectral images are detected using a refractive objective lens system. Magnesium oxide (MgO) and calcium fluoride (CaF2) lenses are used to image scenes in both the visible and infra-red (IR) spectrums. The inventors have discovered that the combination of magnesium oxide, only recently made available in a pure crystal form, and calcium fluoride can be used to fabricate an objective lens for imaging objects in both the visible and infra-red spectrums. Moreover, the combination of magnesium oxide and calcium fluoride results in a super-achromatic condition across visible and infra-red spectrums. This chromatically-corrected spectral range includes wavelengths between 0.4 and 5.9 microns which covers medium-wave IR (MWIR), short-wave IR (SWIR), and the near-IR/visible windows. Combinations of MgO and CaF2 lenses are used in different compound objective lens designs including doublet, Petzval, inverted telephoto, and telephoto arrangements.

Abstract: A method of fabrication is provided for multi-step microlithographic structures including Fresnel lenses whereby the process includes the formation of intermediate etch stop layers that are embedded with the structure material. This is accomplished in one aspect of the invention by depositing Fresnel lens material using known techniques and the selectively altering the chemistry of the material being deposited to form the intermediate etch stop layers at suitable positions without interrupting the deposition process. In another aspect, etch stop layers are patterned on layers of the lens material and embedded between such layers. The structure, or lens, is then formed using masking, patterning and etching techniques.

Abstract: Methods and apparatus for generating uniform reference sources for use in calibrating multiple-detector imaging devices. In exemplary embodiments, a plano-plano reference lens is inserted at a non-focusing position in the optics path of a multiple-detector imaging device. The reference lens includes a highly polished side coated with a semi-reflective film and a rough polished side coated with an anti-reflective coating. The smooth polished side causes the detector array to see a reflected image of itself and a portion of the incoming scene energy simultaneously. The energy emitted by the detector array thus mixes with the scene energy to create a detected photon flux level which is dependent upon, but deviates in a controlled manner from, that of the scene energy alone. At the same time, the rough polished side and the thickness of the reference lens blur the detected image to eliminate scene structure and to provide a uniform photon flux level at each detector in the array.

Abstract: An all-reflective optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first concave mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle of less than substantially 12°, and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 15°. Four of the six reflecting surfaces have an aspheric departure of less than substantially 7 &mgr;m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 14 &mgr;m. Each of the six reflecting surfaces has an aspheric departure of less than 16.0 &mgr;m.

Abstract: In a method for evaluating the homogeneity of the refractive index of an optical member, the refractive index distribution of the optical member is measured, the measured refractive index distribution is separated into a rotationally symmetric element and a non-rotationally symmetric element in the optical axis direction before or after correction of the power element, and the rotationally symmetric element is further subjected to 2nd/4th-order element correction. Upon execution of such comprehensive evaluation, a photolithography optical member, which can realize a fine, sharp exposure-transfer pattern (e.g., a line width of 0.3 &mgr;m or less) is provided.

Abstract: An optical architecture for an infrared vision system for binoculars or a camera. This system includes a front afocal, a scanner, an optical device forming an image of the scene and a cooled detector with cold stop. This architecture has an aperture stop which is seperate from the cold stop thereby causing varaitons in the structure flux over the extent of the detector. These varations are corrected by a suitable shape of the cold stop which smooths out the photometric inefficiency over the extent of the detector and decreases the photometric inefficiency.

Abstract: An infrared afocal lens assembly for providing an observed magnified IR ie scene with a field of view and a substantially less temperature dependent performance. The assembly includes a collecting lens, focusing lens subassembly movable along the optical axis to provide range focus, an intermediate focal plane, an eyepiece lens subassembly, and an aperture stop. A wide field of view lens subassembly may be used on the optical axis. All lenses are made of either GaAs or ZnS, and all lenses are single lenses only.

Abstract: A UV image forming optical system includes a collimating lens for collimating light emitted from a UV light source, an imaging lens for forming an image of the collimated light transmitted through the collimating lens, and a beam splitting optical system positioned in an optical path of the collimated light between the collimating lens and the imaging lens. At least one of the collimated light emitted from the collimating lens and the light transmitted through the imaging lens, reflected by a reflector and transmitted again through the imaging lens is made incident upon an external viewing optical system.

Abstract: An achromatic lens system, in particular for uses in the deep ultraviolet range below 350 nm wavelength, and therefore especially for projection exposure systems for microlithography, combines quartz glass with lenses made of germanium dioxide glass (GeO.sub.2). The production of GeO.sub.2 glass by CVD on an amorphous base made of the same material is described.

Abstract: An optical member is provided for use in an image-focusing optical system for guiding light having a wavelength shorter than about 300 nm. The optical member includes a calcium fluoride crystal having a sodium concentration of less than about 0.2 ppm.

Abstract: An illumination apparatus for an optical instrument includes an illumination section for outputting illumination light, and a lens made of rubber and arranged on the optical path of the illumination light output from the illumination section.

Abstract: A known projection aligner for integrated circuit fabrication, in which an integrated circuit pattern image is projected on a wafer, comprises an ArF excimer laser and an optical system composed of groups of quartz glass optical members made of synthetic quartz glass. To provide a projection aligner having optical properties, such as durability, optical transmittance and the like, which are not degraded over a long time of operation and the optical system can be constructed at a low cost as a whole, it is suggested that the optical system comprises a first quartz glass optical member group whose hydrogen molecule concentration is in the range between 1.times.10.sup.17 and 5.times.10.sup.18 molecules/cm.sup.3 and a third quartz glass optical member group whose hydrogen molecule concentration is in the range between 5.times.10.sup.18 to 5.times.10.sup.19 molecules/cm.sup.3.

Abstract: In a method for evaluating the homogeneity of the refractive index of an optical member, the refractive index distribution of the optical member is measured, the measured refractive index distribution is separated into a rotationally symmetric element and a non-rotationally symmetric element in the optical axis direction before or after correction of the power element, and the rotationally symmetric element is further subjected to 2nd/4th-order element correction. Upon execution of such comprehensive evaluation, a photolithography optical member, which can realize a fine, sharp exposure-transfer pattern (e.g., a line width of 0.3 .mu.m or less) is provided.