Abstract: A four transistor (4T) memory device is provided. The device includes a first cell transistor and a second cell transistor, the first and second cell transistors coupled to each other and defining latch circuitry having at least one multi-stable node. The device further includes a first access transistor and a second access transistor, the first and second access transistors coupling the at least one multi-stable node to at least one bit-line. In the device, each of the first and second cell transistors and each of the first and second access transistors is a unidirectional field effect transistor configured for conducting current in a first direction and to be insubstantially incapable of conducting current in a second direction.

Abstract: A Random Access Memory (RAM) and method of using the same are disclosed. The RAM includes a plurality of memory cells arranged in columns and in rows with each memory cell coupled to at least one word line and at least one bit line. The RAM includes a plurality of switches with at least one of the switches coupled between two of the memory cells to allow data to be copied from one of the two memory cells to the other of the two memory cells. In another aspect, the two memory cells can be considered a dual bit cell that contains a copying mechanism. There are two interleaved memory planes, assembled from bit cells that contain two bits of information. One bit is the primary bit that corresponds to the normal RAM bit. The second bit is able to receive a copy and hold the primary value. When the copying mechanism is over, the two memory planes may act as two completely independent structures.

Abstract: An SRAM has at least two sets of pass transistors for coupling at least two sets of bit lines to true and complement data nodes of an SRAM cell based on the assertion of at least two word lines. The cell includes two pull up transistors and two pull down transistors coupled to the true and complement data nodes. None of the pass transistors are implemented in an active area that includes a pull up transistor or a pull down transistor of the cell.

Abstract: A global to local bit line interface circuit for domino static random access memory (SRAM) devices includes a pair of complementary global write bit lines in selective communication with an array of SRAM cells through corresponding local write bit lines, the complementary global write bit lines configured to write a selected SRAM cell with write data presented on a pair of complementary write data input lines; a pair of complementary global read bit lines in selective communication with the array of SRAM cells through corresponding local read bit lines, the complementary global read bit lines configured to read data stored in a selected SRAM cell and present the read data on a pair of complementary read data output lines; and write-around logic configured to directly couple the write data presented on the complementary global write bit lines to read data output circuitry associated with the complementary global read bit lines.

Abstract: In a loadless 4T-SRAM constituted using vertical-type transistor SGTs, a small SRAM cell area is realized. In a static memory cell constituted using four MOS transistors, the MOS transistors are SGTs formed on a bulk substrate in which the drains, gates, and sources are arranged in the vertical direction. The gates of access transistors are shared, as a word line, among a plurality of cells adjacent to one another in the horizontal direction. One contact for the word line is formed for each group of cells, thereby realizing a CMOS-type loadless 4T-SRAM with a very small memory cell area.

Abstract: An SRAM bit cell comprises a first inverter including a PMOS transistor and an NMOS transistor, and a second inverter including a PMOS transistor and an NMOS transistor. The first and second inverters are cross-coupled to each other. A plurality of pass transistors couple the inverters to bit lines. Approximately one-half of a supply voltage is provided to the bit lines during pre-charge operations.

Abstract: A word line control circuit includes a first PMOS transistor having a gate coupled to a first selection signal; a first NMOS transistor, coupled between a second node and a second voltage terminal, having a gate coupled to an inverted first selection signal, wherein the inverted first selection signal is obtained by inverting the first selection signal; and a plurality of word line drivers, at least one of the word line drivers comprising a first inverter and a second inverter, wherein a positive power terminal of the first inverter is coupled to the first voltage terminal, a negative power terminal of the first inverter is coupled to the second node, a positive power terminal of the second inverter is coupled to the first node, and a negative power terminal of the second inverter is coupled to the second voltage terminal.

Abstract: A capacitance coupled to a memory node and a word line of an SRAM cell provides an electrostatic capacitance between the memory node and the word line. The capacitance has a first electrostatic capacitance when the word line is in a nonselective state (usually a LOW level) and the memory node retains a HIGH level; the capacitance has a second electrostatic capacitance which is smaller than the first electrostatic capacitance when the word line is in the nonselective state (usually the LOW level) and the memory node retains the LOW level.

Abstract: One or more embodiments relate to a method comprising: raising a potential of a first bit line and a second bit line; switching on a first n-channel access transistor coupled between the first bit line and a first node of a first inverter; switching on a second n-channel access transistor coupled between the second bit line and a second node of a second inverter; and reading a static random access memory (SRAM) cell including the first inverter and the second inverter by sensing a potential on the first bit line and a potential on the second bit line.

Abstract: An SRAM bitcell includes first and second CMOS inverters connected as a latch defining a true node and a complement node. The bitcell further includes true and complement bitline nodes. A first direct connection is provided between the true bitline node and a back gate of at least a p-channel transistor, and perhaps also an n-channel transistor, in the second CMOS inverter. A second direct connection is provided between the complement bitline node and a back gate of at least a p-channel transistor, and perhaps also an n-channel transistor, in the first CMOS inverter. A first pass transistor is coupled between the true bitline node and the true node, and a second pass transistor is coupled between the complement bitline node and the complement node. Direct connections are also provided between a wordline and the back gates of each of the first and second pass transistors.

Abstract: Integrated circuits may have arrays of memory elements. Data may be loaded into the memory elements and read from the memory elements using data lines. Address lines may be used to apply address signals to write address transistors and read circuitry. A memory element may include a bistable storage element. Read circuitry may be coupled between the bistable storage element and a data line. The read circuitry may include a data storage node. A capacitor may be coupled between the data storage node and ground and may be used in storing preloaded data from the bistable storage element. The read circuitry may include a transistor that is coupled between the bistable storage element and the data storage node and a transistor that is coupled between the data storage node and the data line.

Abstract: A memory circuit according to an embodiment includes: a first transistor including a first source/drain electrode, a second source/drain electrode, and a first gate electrode; a second transistor including a third source/drain electrode connected to the second source/drain electrode, a fourth source/drain electrode, and a second gate electrode; a third transistor and a fourth transistor forming an inverter circuit, the third transistor including a fifth source/drain electrode, a sixth source/drain electrode, and a third gate electrode connected to the second source/drain electrode, the fourth transistor including a seventh source/drain electrode connected to the sixth source/drain electrode, an eighth source/drain electrode, and a fourth gate electrode connected to the second source/drain electrode; and an output terminal connected to the sixth source/drain electrode.

Abstract: Circuits and techniques for operating a memory cell on an integrated circuit (IC) are disclosed. A disclosed memory cell includes a first inverter coupled to a second inverter to form a first connection and a second connection. The first connection is operable to receive at least a first data signal at a first voltage and the second connection is operable to receive at least a second data signal at a second voltage. A first oxide capacitor and a second oxide capacitor are coupled to the first and second connections respectively. Both the first and second oxide capacitors are coupled to receive a programming signal at a third voltage that may be operable to rupture either one of the first or second oxide capacitor.

Abstract: Integrated circuits with memory elements are provided. An integrated circuit may include logic circuitry formed in a first portion having complementary metal-oxide-semiconductor (CMOS) devices and may include at least a portion of the memory elements and associated memory circuitry formed in a second portion having nano-electromechanical (NEM) relay devices. The NEM and CMOS devices may be interconnected through vias in a dielectric stack. Devices in the first and second portions may receive respective power supply voltages. In one suitable arrangement, the memory elements may include two relay switches that provide nonvolatile storage characteristics and soft error upset (SEU) immunity. In another suitable arrangement, the memory elements may include first and second cross-coupled inverting circuits. The first inverting circuit may include relay switches, whereas the second inverting circuit includes only CMOS transistors.

Abstract: A static random access memory (SRAM) cell having a dedicated read port separated from a write port comprises a first and a second bit-line placed in parallel forming a complimentary bit-line pair for the dedicated read port, a first and second metal line adjacently flanking in both side of and in parallel to the first bit-line, the first and second metal line being formed in the same metal layer as the first bit-line and having a first and second predetermined distance to the first bit-line, respectively, and a third and fourth metal line adjacently flanking in both side of and in parallel to the second bit-line, the third and fourth metal line being formed in the same metal layer as the second bit-line and having a third and fourth predetermined distance to the second bit-line, respectively, wherein the first predetermined distance is equal to the third distance and the second predetermined distance is equal to the fourth distance for keeping the first and second bit-lines having balanced capacitance loading

Abstract: A SRAM cell having two cross-coupled inverters formed by CMOS technology and first and second chalcogenic elements integrated with the SRAM cell to add nonvolatile properties to the storage cell. The PCM resistors are programmed to the SET state and the RESET state, and upon power-up the SRAM cell takes on the data contained in the PCM cells.

Abstract: A method and apparatus to provide random access to a programmable logic register. A processing device in a programmable logic system retrieves data from a memory of the programmable logic system. The data is loaded into a configuration register configured to store configuration data for a programmable logic function over a system bus. The processing device programs a programmable logic block to implement the programmable logic function based on the configuration data, where the processing device is configured to access a first configuration register in the configuration register set, the first configuration register corresponding to a first programmable logic block in the programmable logic system, without affecting a second configuration register corresponding to a second programmable logic block.

Abstract: A memory circuit properly workable under low working voltage includes a plurality of write word lines, a plurality of write bit lines, a plurality of read/write word lines, a plurality of read/write bit lines, a plurality of read/write inverted word lines, a plurality of virtual voltage source circuits, a plurality of virtual ground circuits, and a plurality of asymmetrical RAM cells constituting a cell array. The asymmetrical RAM cells are formed of seven transistors, five of which are NMOS transistors and two of which are PMOS transistors. The virtual voltage power source circuit and the virtual ground circuit can reinforce the write-in and read abilities under low working voltage to make the write-in and read actions more stable, decrease leakage current, and lower power consumption.

Abstract: A method and circuit for implementing write assist for Static Random Access Memory (SRAM) arrays, and a design structure on which the subject circuit resides are provided. The circuit includes a write driver including a common bit line supply node, and a common bit line source node. The circuit includes voltage boost circuitry that temporarily boosts the common bit line supply node above supply voltage and temporarily boosts the common bit line source node below source voltage through isolation devices for applying the boosted source and supply voltages to a selected SRAM cell during a write operation. Splitting the boost differential between the common bit lines decreases an overall device voltage differential for providing substantially enhanced reliability of the SRAM array.

Abstract: An asymmetric memory cell is disclosed. The memory cell includes a refresh control line, a pass gate transistor, and a refresh transistor. The refresh transistor is coupled to the refresh control line, and provides a feedback between the pass gate transistor and a plurality of inverters, when the refresh control line is in a default state.

Abstract: A circuit includes a first node; a second node; a first PMOS transistor having a source coupled to the first node, a drain coupled to a first control transistor, and a gate driven by a first voltage; and a first NMOS transistor having a source coupled to the second node, a drain coupled to the first control transistor, and a gate driven by a second voltage. The first PMOS transistor is configured to automatically turn off based on the first voltage and a first node voltage at the first node. The first NMOS transistor is configured to automatically turn off based on the second voltage and a second node voltage at the second node. When the first PMOS transistor, the control transistor, and the first NMOS transistor are on, the first node voltage is lowered while the second voltage is raised.

Abstract: Exemplary embodiments for SRAM cells, new control units for SRAM systems, and embodiments of SRAM systems are described herein. An SRAM cell is configured to receive a first input voltage signal and a second input voltage signal with a different value from the first input voltage signal, and to maintain a first stored value signal and a second stored value signal. A control circuit is configured to receive a first input voltage signal and a second input voltage signal, and controlled by a sleep signal, a selection signal, and a data input signal, so that the output of the control circuit is data sensitive to the data input signal. An SRAM system comprises a plurality of SRAM cells, controlled the disclosed control circuit wherein an SRAM cell has two input voltage signals controlled by a data input signal and its complement signal respectively.

Abstract: For example, one memory cell is configured using two memory cell transistors and one phase change element by disposing a plurality of diffusion layers in parallel to a bit-line, disposing gates between the diffusion layers so as to cross the bit-line, disposing bit-line contacts and source contacts alternately to the plurality of diffusion layers arranged in a bit-line direction for each diffusion layer, and providing a phase change element on the source contact. Also, the phase change element can be provided on the bit-line contact instead of the source contact. By this means, for example, increase in drivability of the memory cell transistors and reduction in area can be realized.

Abstract: Methods and apparatus for providing finFET SRAM cells. An SRAM cell structure is provided including a central N-well region and a first and a second P-well region on opposing sides of the central N-well region, having an area ratio of the N-well region to the P-well regions between 80-120%, the SRAM cell structure further includes at least one p-type transistor formed in the N-well region and having a gate electrode comprising a gate and a gate dielectric over a p-type transistor active area in the N-well region; and at least one n-type transistor formed in each of the first and second P-well regions and each n-type transistor having a gate electrode comprising a gate and a gate dielectric over an n-type transistor active area in the respective P-well region. Methods for operating the SRAM cell structures are disclosed.

Abstract: An embodiment of the invention provides a method for decreasing power in a static random access memory (SRAM). A first voltage is applied between latch sourcing and latch sinking supply lines for columns of memory cells that are column addressed during a read cycle. A second voltage is applied between latch sourcing and latch sinking supply lines for columns of memory cells that are not column addressed during a read cycle. Because the second voltage is less than the first voltage, power in the SRAM is reduced. In this embodiment, a memory cell in the SRAM includes at least one read buffer and a latch connected between the latch sourcing and latch sinking supply lines.

Abstract: An SRAM-type memory cell that includes a semiconductor on insulator substrate having a thin film of semiconductor material separated from a base substrate by an insulating layer; and six transistors such as two access transistors, two conduction transistors and two charge transistors arranged so as to form with the conduction transistors two back-coupled inverters. Each of the transistors has a back control gate formed in the base substrate below the channel and able to be biased in order to modulate the threshold voltage of the transistor, with a first back gate line connecting the back control gates of the access transistors to a first potential and a second back gate line connecting the back control gates of the conduction transistors and charge transistors to a second potential. The first and second potentials can be modulated according to the type of cell control operation.

Abstract: In an exemplary hidden refresh method for a pseudo SRAM, a system clock is received. A duty-on period of the system clock signal is adapted for performing a data access operation such as write or read operation. A refresh clock signal subjected to the control of the system clock signal is generated. A duty-on period of the refresh clock signal is non-overlapped with the duty-on period of the system clock signal. A refresh control pulse then is triggered by a starting edge of the duty-on period of the refresh clock signal to activate a word line, for performing a refresh operation.

Abstract: A memory cell includes a storage element, a write circuit coupled to the storage element and a read circuit coupled to the storage element. At least a portion of the storage element and at least a portion of the write circuit are fabricated using a thicker functional gate oxide and at least a portion of the read circuit is fabricated using a thinner functional gate oxide.

Abstract: Example embodiments relate to an SRAM device and a method of manufacturing the same. The SRAM device may include first transistors operating in a horizontal direction and second transistors that are disposed on the first transistors to operate in a vertical direction. In example embodiments, the second transistors may be vertically connected to the first transistors. In example embodiments, the second transistors may be vertical transistors that include vertical gates surrounding vertical channels.

Abstract: A semiconductor memory includes an array of volatile memory cells, wherein one of the volatile memory cells has transistors connected in a first memory cell circuit, and at least one non-volatile memory cell having transistors connected in a second memory cell circuit, wherein the transistors in the first memory cell circuit are at least one more than the transistors in the second memory cell circuit.

Abstract: A SRAM includes a first CMOS inverter of first and second MOS transistors connected in series, a second CMOS inverter of third and fourth MOS transistors connected in series and forming a flip-flop circuit together with the first CMOS inverter, and a polysilicon resistance element formed on a device isolation region, each of the first and third MOS transistors is formed in a device region of a first conductivity type and includes a second conductivity type drain region at an outer side of a sidewall insulation film of the gate electrode with a larger depth than a drain extension region thereof, wherein a source region is formed deeper than a drain extension region, the polysilicon gate electrode has a film thickness identical to a film thickness of the polysilicon resistance element, the source region and the polysilicon resistance element are doped with the same dopant element.

Abstract: A word line driver circuit for providing a suppressed word line voltage includes a switch configured to selectively load a word line to a suppressed word line voltage node and a word line charging circuit coupled between a high power supply node and the suppressed word line voltage node. The word line charging circuit includes a first transistor device responsive to a control pulse for charging the suppressed word line voltage node to a suppressed word line voltage and a second transistor device for maintaining the suppressed word line voltage.

Abstract: A magnetic random access memory is configured as a read/write memory and at least a first section of the magnetic random access memory is configured to be converted to a read only memory.

Abstract: Memory elements are provided that exhibit immunity to soft error upset events when subjected to high-energy atomic particle strikes. The memory elements may each have ten transistors including two address transistors and four transistor pairs that are interconnected to form a bistable element. Clear lines such as true and complement clear lines may be routed to positive power supply terminals and ground power supply terminals associated with certain transistor pairs. During clear operations, some or all of the transistor pairs can be selectively depowered using the clear lines. This facilitates clear operations in which logic zero values are driven through the address transistors and reduces cross-bar current surges.

Abstract: The invention provides a semiconductor integrated circuit device provided with an SRAM that satisfies the requirements for both the SNM and the write margin with a low supply voltage. The semiconductor integrated circuit device include: multiple static memory cells provided in correspondence with multiple word lines and multiple complimentary bit lines; multiple memory cell power supply lines that each supply an operational voltage to each of the multiple memory cells connected to the multiple complimentary bit lines each; multiple power supply circuits comprised of resistive units that each supply a power supply voltage to the memory cell power supply lines each; and a pre-charge circuit that supplies a pre-charge voltage corresponding to the power supply voltage to the complimentary bit lines, wherein the memory cell power supply lines are made to have coupling capacitances to thereby transmit a write signal on corresponding complimentary bit lines.

Abstract: A global to local bit line interface circuit for domino static random access memory (SRAM) devices includes a pair of complementary global write bit lines in selective communication with an array of SRAM cells through corresponding local write bit lines, the complementary global write bit lines configured to write a selected SRAM cell with write data presented on a pair of complementary write data input lines; a pair of complementary global read bit lines in selective communication with the array of SRAM cells through corresponding local read bit lines, the complementary global read bit lines configured to read data stored in a selected SRAM cell and present the read data on a pair of complementary read data output lines; and write-around logic configured to directly couple the write data presented on the complementary global write bit lines to read data output circuitry associated with the complementary global read bit lines.

Abstract: Provided is a semiconductor memory device including a plurality of memory cells arranged in a matrix, a plurality of word lines arranged corresponding to each row of the memory cells, a plurality of bit line pairs arranged corresponding to each column of the memory cells, a column selector that selects any of the plurality of bit line pairs based on a column selection signal and connects the selected bit line pair to a data line pair, a precharge circuit that precharges the data line pair, a sense amplifier that amplifies a potential difference of the data line pair, and a control circuit that controls current for driving the sense amplifier based on potentials of the data line pair after a lapse of a specified period from start of amplification of the potential difference of the precharged data line pair by the sense amplifier.

Abstract: A storage cell is provided with improved robustness to soft errors. The storage cell comprises complementary core storage nodes and complementary outer storage nodes. The outer storage nodes act to limit feedback between the core storage nodes and are capable of restoring the logical state of the core storage nodes in the event of a soft error. Similarly the core storage nodes act to limit feedback between the outer storage nodes with the same effect. This cell has advantages compared with other robust storage cells in that there are only two paths between the supply voltage and ground which limits the leakage power. An SRAM cell utilizing the proposed storage cell can be realized with two access transistors configured to selectively couple complementary storage nodes to a corresponding bitline. A flip-flop can be realized with a variety of transfer gates which selectively couple data into the proposed storage cell.

Abstract: According to one embodiment, a switch array includes first and second switches provided in a switch unit. The first switch includes first and second memory cell transistors and a first pass transistor. A second switch includes third and fourth memory cell transistors and a second pass transistor. The first and second memory cell transistor is provided in a first active region. The first pass transistor is provided in a second active region in the substrate. The third and fourth memory cell transistor is provided in the first active region. The second pass transistor is provided in the second active region adjacent to the first pass transistor in the channel length direction. The first and second active regions are adjacent to each other in a channel width direction.

Abstract: SRAM cells and SRAM cell arrays are described. In one embodiment, an SRAM cell includes a first inverter and a second inverter cross-coupled with the first inverter to form a first data storage node and a complimentary second data storage node for latching a value. The SRAM cell further includes a first pass-gate transistor and a switch transistor. A first source/drain of the first pass-gate transistor is coupled to the first data storage node, and a second source/drain of the first pass-gate transistor is coupled to a first bit line. The first source/drain of the switch transistor is coupled to the gate of the first pass-gate transistor.

Abstract: An embodiment of the invention provides a method of repairing soft failures in memory cells of an SRAM array. The SRAM array is tested to determine the location and type of soft failures in the memory cells. An assist circuit is activated that changes a voltage in a group of memory cells with the same type of soft failure. The change in voltage created by the assist circuit repairs the soft failures in the group. The group may be a word line or a bit line. The type of soft failures includes a failure during a read of a memory cell and a failure during the write of a memory cell.

Abstract: An embodiment of a memory device of SRAM type integrated in a chip of semiconductor material is proposed. The memory device includes a plurality of memory cells each for storing a binary data having a first logic value represented by a first reference voltage or a second logic value represented by a second reference voltage. Each memory cell includes a bistable latch—having a main terminal, a complementary terminal, a set of field effect main storage transistors coupled to the main terminal for maintaining the main terminal at the reference voltage corresponding to the stored logic value or to a complement thereof, a set of field effect complementary storage transistors coupled to the complementary terminal for maintaining the complementary terminal at the reference voltage corresponding to the complement of the logic value associated with the main terminal—and a field effect access transistor for accessing the main terminal.

Abstract: The present invention provides an SRAM cell which does not have the constraints on the size of transistors in order to realize stabilized write and read operations, which has a fewer number of control signal lines per port, and which can be easily multi-ported in the read operation as well as the write operation so that the write and read operations can be performed through a single bit line. The SRAM cell includes a feedback control transistor for controlling connection or disconnection of a positive feedback circuit between particularly two inverters, a write control transistor and a read control transistor connected to a single bit line, and a read buffer transistor connected to the read control transistor.

Abstract: The present disclosure provides an integrated circuit formed in a semiconductor substrate. The integrated circuit includes a first static random access memory (SRAM) cell having a first cell size; and a second SRAM cell having a second cell size greater than the first cell size. The first SRAM cell includes first n-type field effect transistors (nFETs) each having a first gate stack. The second SRAM cell includes second nFETs each having a second gate stack different from the first gate stack.

Abstract: An SRAM memory cell with an internal supply feedback loop is provided herein. The memory cell includes a latch that has a storage node Q, a storage node QB, a supply node, and a ground node. The supply node is coupled via a gating device to a supply voltage and ground node is connected to ground. In addition, storage node Q is fed back via feedback loop into a control node of the gating device. In operation, writing into the memory cell may be carried out in a similar manner to dual port SRAM cells, utilizing one or two write circuitries and for writing into storage node Q and storage node QB respectively. Differently from standard SRAM cells, the feedback loop, by controlling the gating device is configured to weaken the write contention.

Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.

Abstract: A SRAM memory element comprises an influencing element which sets the state of the memory cells within the memory element on start-up to defined values. These defined values are set at the design stage such that on start-up the volatile memory contains firmware or other data. Dependent upon the implementation of the influencing element, the values of stored in the memory cells may be fixed or may subsequently be overwritten during operation of the device. The memory cell may comprise two cross-coupled inverters and the influencing element comprises at least one transistor arranged to connect the input to one of the inverters to ground or a power supply rail when voltage is applied to a controlling node of the transistor.

Abstract: An example embodiment is a memory cell including a SOI substrate. A first and second set of lateral bipolar transistors are fabricated on the SOI substrate. The first and second set of lateral bipolar transistors are electrically coupled to form two inverters. The inverters are cross coupled to form a memory element.

Abstract: A memory circuit includes a plurality of bit line structures (each including a true and a complementary bit line), a plurality of word line structures intersecting the plurality of bit line structures to form a plurality of cell locations; and a plurality of cells located at the plurality of cell locations. Each of the cells includes a logical storage element, a first access transistor selectively coupling a given one of the true bit lines to the logical storage element, and a second access transistor selectively coupling a corresponding given one of the complementary bit lines to the logical storage element. One or both of the first and second access transistors are configured with asymmetric current characteristics to enable independent enhancement of READ and WRITE margins. Also included within the 6-T scope are one or more design structures embodied in a machine readable medium, comprising circuits as set forth herein.

Abstract: A semiconductor chip has an SRAM (static random access memory). The SRAM includes a data dependent write assist circuit which, on writes, reduces a supply voltage on one of a cross coupled inverter pair in an SRAM cell, thereby making it easier to overcome the one of the cross coupled inverters.