Abstract: A DC mode word-line coupling noise restriction circuit for multiple-port Random Access Memory cells. This circuit may comprise a Static Random Access Memory array. The SRAM array contains a plurality of columns and a plurality of rows with an SRAM cell formed at a cross-point of the columns and rows. Each SRAM cell has a first word-line conductor and a second word-line conductor. The first word-line conductor is connected to a first coupling noise restriction circuit. The first coupling noise restriction circuit comprises an inverter and a NMOSFET. The inverter has another NMOSFET and a PMOSFET.

Abstract: A semiconductor device includes a memory cell which includes a first inverter and a second inverter, the first inverter includes a first drive transistor and a first load transistor, the second inverter includes a second drive transistor and a second load transistor, and an input terminal and an output terminal thereof, respectively, connected to an input terminal and an output terminal of the first inverter, a first transmission transistor provided between the output terminal of the first inverter and a line of a first bit line pair, a second transmission transistor provided between the output terminal of the second inverter and another line of the first bit line pair, a third transmission transistor provided between the output terminal of the first inverter and a line of a second bit line pair, a fourth transmission transistor provided between the output terminal of the second inverter and another line of the second bit line pair, and a first isolation transistor which isolates the second drive transistor a

Abstract: A loadless static random access memory cell is provided. The memory cell includes four transistors. The first transistor has a gate terminal corresponding to a word line of the memory cell, a source/drain terminal corresponding to a first bit line of the memory cell, and a drain/source terminal corresponding to a first storage node of the memory cell. The second transistor has a gate terminal corresponding to the word line, a source/drain terminal corresponding to a second bit line of the memory cell, and a drain/source terminal corresponding to a second storage node of the memory cell. The third transistor has a gate terminal coupled to the second storage node, a drain terminal coupled to the first storage node, a source terminal corresponding to a reference voltage, and a body terminal directly connected to the third gate terminal.

Abstract: An integrated circuit including an array of SRAM cells containing a write port with a write word line and two read buffers with read word lines. The write port includes passgate transistors connected to each data node of the SRAM cell. A process of operating the integrated circuit in which source nodes of read buffer driver transistors are biased during a read operation. A process of operating the integrated circuit in which source nodes of read buffer driver transistors are floated during a read operation. A process of operating the integrated circuit in which the write port and the read ports share data lines and the source nodes of read buffer driver transistors are floated during a write operation.

Abstract: Integrated circuits with sequential access memory cells are provided. A sequential access memory cell may include an inverter-like circuit, an inverter, a preset transistor, an access transistor, and a read circuit. The inverter-like circuit and the inverter are cross-coupled to form a bi-stable latch that is powered by a positive power supply line and that has first and second storage nodes. The preset transistor may be connected between the positive power supply line and the first storage node. The inverter-like circuit may include a transistor in its pull-down path. The preset transistor is enabled while the transistor is disabled to write a “1” at the first storage node. The access transistor may be used to write a “0” into the cell. The read circuit may be connected to the second storage node to read data from the cell without inducing a voltage rise at the second storage node.

Abstract: In a random access memory, one of a first conductivity type well constituting a first bit in one column group and another first conductivity type well constituting a second bit selected simultaneously to the first bit in an adjacent column group, is isolated from a common well of the first conductivity type by providing a deep well of a second conductivity type, such that the area of the deep well of the second conductivity type does not exceed the area of one column group.

Abstract: High manufacturing yield is realized and variation in threshold voltage of each MOS transistor in a CMOS·SRAM is compensated. Body bias voltages are applied to wells for MOS transistors of each SRAM memory cell in any active mode of an information holding operation, a write operation and a read operation of an SRAM. Threshold voltages of PMOS and NMOS transistors of the SRAM are first measured. Control information is programmed into control memories according to results of determination. Levels of the body bias voltages are adjusted based on the programs so that variations in the threshold voltages of the MOS transistors of the CMOS·SRAM are controlled to a predetermined error span. Body bias voltage corresponding to a reverse body bias or an extremely shallow forward body bias is applied to a substrate for the MOS transistors with an operating voltage applied to the source of each MOS transistor.

Abstract: One or more embodiments relate to a memory device, comprising: a substrate; a gate stack disposed over the substrate, the gate stack comprising a control gate disposed over a charge storage layer; and a spacer select gate disposed over the substrate and laterally disposed from the gate stack, the select gate comprising a carbon allotrope.

Abstract: Static random access memory (SRAM) cells are disclosed. In one example embodiment the SRAM cell includes a latch having a first node and a second node for storing bit information at the first node and a complement of the bit at the second node. The SRAM cell further includes a first switch controlled by a write operation signal, connected between a supply voltage and a first pull-up transistor of the latch and a third switch controlled the write operation signal, connected between the second node and a ground. The SRAM cell further includes a second switch controlled by the write operation signal, connected between the supply voltage and a second pull-up transistor and a fourth switch controlled by the write operation signal, connected between the second node and the ground. The write operation signals are generated by a first complex gate and a second complex gate.

Abstract: A single event upset (SEU) hardened memory cell to be utilized in static random access memories is disclosed. The SEU hardened memory cell includes a first transistor, a second transistor and a first resistor connected between a source of the first transistor and a drain of the second transistor. The SEU hardened memory cell also includes a third transistor, a fourth transistor and a second resistor connected between a source of the third transistor and a drain of the fourth transistor. The first resistor is also connected between a gate of the third transistor and the drain of the second transistor. The second resistor is also connected between a gate of the first transistor and the drain of the fourth transistor.

Abstract: According to one embodiment, a dummy cell simulates an operation of a memory cell. A main dummy bit line transmits a signal read out from the dummy cell. An inverter makes a sense amplifier circuit to operate based on a potential of the main dummy bit line. n (n is a positive integer) number of auxiliary dummy bit lines are provided. A switching element connects at least one of the n number of auxiliary dummy bit lines to the main dummy bit line.

Abstract: An integrated circuit containing an SRAM cell array in which each SRAM cell includes an auxiliary NMOS driver or PMOS load transistor plus a bit-side passgate transistor and a bit-bar-side passgate transistor. An integrated circuit containing an SRAM cell array in which each SRAM cell includes an auxiliary PMOS driver or NMOS load transistor plus a bit-side passgate transistor and a bit-bar-side passgate transistor. A process of operating an integrated circuit containing an SRAM cell array in which each SRAM cell includes an auxiliary NMOS driver or PMOS load transistor plus a bit-side passgate transistor and a bit-bar-side passgate transistor. A process of operating an integrated circuit containing an SRAM cell array in which each SRAM cell includes an auxiliary PMOS driver or NMOS load transistor plus a bit-side passgate transistor and a bit-bar-side passgate transistor.

Abstract: An integrated circuit can include an SRAM array having cells arranged in columns, each column being connected to true and complementary read local bitlines RLBLT and RLBLC. A local bit-select circuit can be connected to the cells of a column of the SRAM array, which can include first and second pull-down devices for pulling down a respective one of RLBLT and RLBLC at a timing controlled by a write control signal WRT. The circuit can include cross-coupled p-type field effect transistors (“PFETs”) including a first PFET having a gate connected to RLBLT and having a drain connected to RLBLC, and a second PFET of the pair having a gate connected to RLBLC and having a drain connected to RLBLT. A first device can control a strength of the cross-coupled PFETs. A pair of cross-coupled n-type field effect transistors (“NFETs”) can have gates connected to gates of the first and second pull-down devices. A second device can control a strength of the cross-coupled NFETs.

Abstract: The present invention provides an SRAM cell which does not have the constraints on the size of transistors in order to realize stabilized write and read operations, which has a fewer number of control signal lines per port, and which can be easily multi-ported in the read operation as well as the write operation so that the write and read operations can be performed through a single bit line. The SRAM cell includes a feedback control transistor for controlling connection or disconnection of a positive feedback circuit between particularly two inverters, a write control transistor and a read control transistor connected to a single bit line, and a read buffer transistor connected to the read control transistor.

Abstract: A single event upset (SEU) hardened memory cell to be utilized in static random access memories is disclosed. The SEU hardened memory cell includes a first transistor, a second transistor and a first resistor connected between a source of the first transistor and a drain of the second transistor. The SEU hardened memory cell also includes a third transistor, a fourth transistor and a second resistor connected between a source of the third transistor and a drain of the fourth transistor. The first resistor is also connected between a gate of the third transistor and the drain of a the second transistor. The second resistor is also connected between a gate of a the first transistor and the drain of the fourth transistor.

Abstract: An integrated circuit containing SRAM cells with auxiliary load transistors on each data node. The integrated circuit also contains circuitry so that auxiliary load transistors in addressed SRAM cells may be biased independently of half-addressed cells. A process of operating an integrated circuit containing SRAM cells with auxiliary load transistors on each data node. The process includes biasing the auxiliary load transistors in addressed SRAM cells independently of half-addressed cells.

Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.

Abstract: The present invention provides a Schmitt trigger-based FinFET static random access memory (SRAM) cell, which is an 8-FinFET structure. A FinFET has the functions of two independent gates. The new SRAM cell uses only 8 FinFET per cell, compared with the 10-FinFET structure in previous works. As a result, the cell structure of the present invention can save chip area and raise chip density. Furthermore, this new SRAM cell can effectively solve the conventional problem that the 6T SRAM cell is likely to have read errors at a low operating voltage.

Abstract: A dual port SRAM cell includes an auxiliary driver transistor on each data node. The SRAM cell is capable of single sided write to each data node. The auxiliary driver transistors in addressed cells may be biased independently of half-addressed cells. During write and read operations, the auxiliary driver transistors may be floated or biased. Auxiliary driver transistors in half-addressed SRAM cells may be biased. During standby modes, the auxiliary driver transistors may be floated. During sleep modes, the auxiliary driver transistors may be biased at reduced voltages. The auxiliary driver transistors in each cell may be independent or may have a common source node within each cell. Additional single sided write ports and read buffers may be added. A process of operating an integrated circuit that includes performing a single-sided write bit-side low, a single-sided write bit-side high, and a read bit-side operation.

Abstract: A driver circuit includes a memory cell for storing data and a data switching circuit. The memory cell includes a first inverter having a first output terminal and a first input terminal and a second inverter having a second output terminal and a second input terminal. The first output terminal is connected to the second input terminal and the second output terminal is connected to the first input terminal. A switch is connected to the first input terminal so that the data is fed to the memory cell through the switch. A voltage shifter supplies a first supply voltage to the first inverter and second inverter while the data is being written into the memory cell and a second supply voltage to the first inverter and second inverter after the data has been written into the memory cell.

Abstract: A circuit includes a first node; a second node; a first PMOS transistor having a source coupled to the first node, a drain coupled to a first control transistor, and a gate driven by a first voltage; and a first NMOS transistor having a source coupled to the second node, a drain coupled to the first control transistor, and a gate driven by a second voltage. The first PMOS transistor is configured to automatically turn off based on the first voltage and a first node voltage at the first node. The first NMOS transistor is configured to automatically turn off based on the second voltage and a second node voltage at the second node. When the first PMOS transistor, the control transistor, and the first NMOS transistor are on, the first node voltage is lowered while the second voltage is raised.

Abstract: An SRAM cell containing an auxiliary driver transistor is configured for a single sided write operation. The auxiliary driver transistor may be added to a 5-transistor single-sided-write SRAM cell or to a 7-transistor single-sided-write SRAM cell. The SRAM cell may also include a read buffer. During read operations, the auxiliary drivers are biased. During write operations, the auxiliary drivers in half-addressed SRAM cells are biased and the auxiliary drivers in the addressed SRAM cells may be floated or biased.

Abstract: A full complementary metal-oxide semiconductor (CMOS) static random access memory (SRAM) may have a reduced cell size by arranging a word line of a pair of transistors arranged on the uppermost layer of the SRAM. First and second transistors may be arranged on first and second active regions. Third and fourth transistors may be arranged on first and second semiconductor layers formed over the first and second active regions. Fifth and sixth transistors may be arranged on the third and fourth semiconductor layers over the first and second semiconductor layers. A word line may be arranged in a straight line between the first and second gates of the first and second transistors and between the third and fourth gates of the third and fourth transistors.

Abstract: A memory device includes bitlines, wordlines and a matrix of memory cells arranged in rows and columns. Each of the bitlines is electrically connected to memory cells in one of the columns. Each of the wordlines is electrically connected to memory cells in one of the rows. A bitline write voltage is applied to a first bitline. A wordline voltage is applied to a first wordline for writing data to a first memory cell connected to the first wordline and the first bitline. The first bitline and the second bitline are electrically connected for charge sharing between the first bitline and the second bitline. A predetermined time after electrically connecting the first bitline and the second bitline, the first and the second bitline are electrically disconnected and the bitline write voltage is applied to the second bitline. The wordline voltage is applied to a second wordline for writing data to a second memory cell connected to the second wordline and the second bitline.

Abstract: Memory elements are provided that exhibit immunity to soft error upset events when subjected to high-energy atomic particle strikes. The memory elements may each have ten transistors including two address transistors and four transistor pairs that are interconnected to form a bistable element. Clear lines such as true and complement clear lines may be routed to positive power supply terminals and ground power supply terminals associated with certain transistor pairs. During clear operations, some or all of the transistor pairs can be selectively depowered using the clear lines. This facilitates clear operations in which logic zero values are driven through the address transistors and reduces cross-bar current surges.

Abstract: A static random access memory (SRAM) includes an SRAM cell to store a bit of data. A word line accesses the SRAM cell, which, responsively, during a read, drives either a bit line true (BLT) or a bit line complement (BLC) low. Both BLT and BLC are precharged to a supply voltage, then, subsequently are discharged to a reference voltage, lower than the supply voltage, prior to the word line being activated. Because the bit lines are at a voltage lower than the supply voltage when the SRAM cell is activated, the SRAM cell stability is improved.

Abstract: Included are a memory cell, a first metal interconnection, a variable capacitance circuit and a connection switch. The memory cell includes cross-coupled first and second inverters which are connected to a power supply node. The first metal interconnection is connected to the power supply node. The variable capacitance circuit includes: second and third metal interconnections electrically connected to a connection node; and a controller capable of controlling electrical connection between the third metal interconnection and the connection node. The connection switch is connected between the first metal interconnection and the connection node of the variable capacitance circuit. The connection switch is configured to electrically connect the first metal interconnection and the connection node in a write operation of the memory cell.

Abstract: An object is to provide a semiconductor memory device which holds data of an SRAM or a flip-flop circuit and holds data in the SRAM while electric power is not supplied from a reader or electric power is not enough, without changing a battery for driving a power supply corresponding to deterioration of the battery with time, and a semiconductor device provided with the semiconductor memory device. An SRAM cell, a decoder connected to the SRAM cell through a word line, a read/write circuit connected to the SRAM cell through the data line, and a power storage unit connected to the SRAM cell are provided. The power storage unit is charged when data is written to or read from the SRAM cell through the data line.

Abstract: A memory circuit includes a plurality of bit line structures (each including a true and a complementary bit line), a plurality of word line structures intersecting the plurality of bit line structures to form a plurality of cell locations and a plurality of cells located at the plurality of cell locations. Each of the cells includes a logical storage element, a first access transistor selectively coupling a given one of the true bit lines to the logical storage element, and a second access transistor selectively coupling a corresponding given one of the complementary bit lines to the logical storage element. One or both of the first and second access transistors are configured with asymmetric current characteristics to enable independent enhancement of READ and WRITE margins. Also included within the 6-T scope are one or more design structures embodied in a machine readable medium, comprising circuits as set forth herein.

Abstract: A semiconductor storage device includes a memory cell array, a plurality of word lines, a plurality of bit lines, a first gate wiring element 3a, 3b, a second gate wiring element 3c, 3d, a first connector 5a, 5b, and a second connector 5c, 5d. Each memory cell 10 has first and second sets having a driver transistor 11, a load transistor 12, and an access transistor 13. The word lines are arranged in parallel to each other along a first direction. The bit lines are arranged in parallel to each other along a second direction perpendicular to the first direction. The first gate wiring element comprises a gate electrode of the first driver transistor and the first load transistor, and has a rectangular shape having straight line on opposite sides. The second gate wiring element comprises a gate electrode of the access transistor and has a rectangular shape having straight line on opposite sides.

Abstract: According to one embodiment, a semiconductor device includes a first transistor and a second transistor having a conductivity type which is different from a conductivity type of the first transistor, the first transistor and the second transistor being disposed on a semiconductor substrate such that a gate electrode of the first transistor and a gate electrode of the second transistor are connected to each other. The gate electrode of the first transistor includes first impurities and second impurities which suppress diffusion of the first impurities, and a concentration peak of the first impurities is formed at a shallower position than a concentration peak of the second impurities.

Abstract: An object is to provide a semiconductor memory device which holds data of an SRAM or a flip-flop circuit and holds data in the SRAM while electric power is not supplied from a reader or electric power is not enough, without changing a battery for driving a power supply corresponding to deterioration of the battery with time, and a semiconductor device provided with the semiconductor memory device. An SRAM cell, a decoder connected to the SRAM cell through a word line, a read/write circuit connected to the SRAM cell through the data line, and a power storage unit connected to the SRAM cell are provided. The power storage unit is charged when data is written to or read from the SRAM cell through the data line.

Abstract: A semiconductor device according to the present invention includes a first memory cell array in which a plurality of first memory cells are arranged as a matrix, data being read from or written to the first memory cells, and a second memory cell array in which a plurality of second memory cells amplifying and storing the data of one of the plurality of the first memory cells arranged in a corresponding column are arranged as a matrix. The first memory cell array and the second memory cell array are arranged face to face in the column direction. An area of the second memory cell is larger than that of the first memory cell. An area of the first memory cell array is twice or more as large as that of the second memory cell array.

Abstract: The present invention discloses an asymmetric virtual-ground single-ended SRAM and a system thereof, wherein a first inverter is coupled to a high potential and a virtual ground, and wherein the first inverter and a second inverter form a latch loop, and wherein a third inverter is electrically connected with the second inverter, and wherein the third inverter and the second inverter are jointly coupled to the high potential and a ground. A write word line and a read word line control an access transistor and a pass transistor to undertake writing and reading of signals. A plurality of asymmetric virtual-ground single-ended SRAMs forms a memory system.

Abstract: A device for storing data using nanoparticle shuttle memory having a nanotube. The nanotube has a first end and a second end. A first electrode is electrically connected to the first end of the nanotube. A second electrode is electrically connected to the second end of the nanotube. The nanotube has an enclosed nanoparticle shuttle. A switched voltage source is electrically connected to the first electrode and the second electrode, whereby a voltage may be controllably applied across the nanotube. A resistance meter is also connected to the first electrode and the second electrode, whereby the electrical resistance across the nanotube can be determined.

Abstract: A semiconductor device has a pair of gate electrodes extending adjacent to and non-parallel to each other, a source and/or drain region located between the pair of gate electrodes for forming a pair of transistors with the gate electrodes, and a contact electrode disposed between the pair of gate electrodes in contact with the source and/or drain region in a contact area so that the center of the contact area is shifted from the center of the source and/or drain region in a direction along which the distance between the pair of gate electrodes becomes greater.

Abstract: A memory to which a bit line potential step-down technique is applied is provided. The memory includes an IO block including first transistors which control potentials of first bit lines provided with respect to columns of memory cells, and first logic gates which control the first transistors. The drain or source of each first transistor is connected to an input of the corresponding first logic gate, and the gate of each first transistor is connected to an output of the corresponding first logic gate. The first transistors are driven by pulses.

Abstract: The present invention provides a semiconductor device including SRAM cell units each including a data holding section made up of a pair of driving transistors and a pair of load transistors, a data write section made up of a pair of access transistors, and a data read section made up of an access transistor and a driving transistor, wherein each of the transistors includes a semiconductor layer projecting upward from a base plane, a gate electrode extending from a top to opposite side surfaces of the semiconductor layer so as to stride the semiconductor layer, a gate insulating film between the gate electrode and the semiconductor layer, and source/drain areas, a longitudinal direction of each of the semiconductor layers is provided along a first direction, and for all the corresponding transistors between the SRAM cell units adjacent to each other in the first direction, the semiconductor layer in one of the corresponding transistors is located on a center line of the semiconductor layer along the first dire

Abstract: The invention concerns a random access memory cell comprising: at least one first plurality of symmetrical dual-gate transistors (TL1T, TL1F, TD1T, TD1F, TL2T, TL2F) forming a flip-flop, at least a first asymmetric dual-gate access transistor (TA1T, TAW1T) and at least a second asymmetric dual-gate access transistor (TA1F, TAW1F) disposed respectively between a first bit line (BLT, WBLT) and a first storage node (T), and between a second bit line (BLF, WBLF) and a second storage node (F), a first gate of the first access transistor (TA1T, TAW1T) and a first gate of the second access transistor (TA1F, TAW1F) being connected to a first word line (WL, WWL) able to route a biasing signal, a second gate (TA1F, TAW1F) of the first access transistor connected to the second storage node (F) and a second gate of the second access transistor connected to the first storage node (T).

Abstract: Positive logic circuits, systems and methods using MOSFETs operated in a depletion-mode, including electrostatic discharge protection circuits (ESD), non-inverting latches and buffers, and one-to-three transistor static random access memory cells. These novel circuits supplement enhancement-mode MOSFET technology and are also intended to improve the reliability of the complementary metal-oxide-semiconductor (CMOS) integrated circuit (IC) products.

Abstract: A static random access memory (SRAM) can include a plurality of columns forming a memory array, wherein each column comprises a plurality of memory cells coupled to bitlines and wordlines, and a write replica circuit generating a signal when data has been written to the write replica circuit. A wordline of the memory array is turned off responsive to the signal. The write replica circuit can include an additional column comprising at least one dual port dummy memory cell, and write detection circuitry coupled to the dual port dummy memory cell detecting when data has been written to the dual port dummy memory cell and responsively generating the signal. The signal generated by the write detection circuitry indicates a successful write operation to the dual port dummy memory cell.

Abstract: Static random access memory cells and methods of making static random access memory cells are provided. The static random access memory cells contain two non-planar pass-gate transistors, two non-planar pull-up transistors, two non-planar pull-down transistors. A portion of a fin of the non-planar pull-up transistor is electrically connected to a portion of a fin of the non-planar pull-down transistor by an assist-bar. The methods involve forming an assist-fin between fins of a non-planar pull-up transistor and a non-planar pull-down transistor and between gate electrodes, and widening a width of the assist-fin to form the assist-bar so that a portion of the fin of non-planar pull-up transistor is electrically connected to a portion of the fin of non-planar pull-down transistor via the assist-bar.

Abstract: In two inverters included in a latch in a memory cell, the source or drain of a PMOS load transistor connected to a memory node is cut off, and the source or drain of an NMOS drive transistor connected to another memory node is cut off, whereby internal data is fixed or permanently stored in the memory cell while ensuring a resistance to damage to the gate of the transistor and without impairing the regularity of the layout.

Abstract: A semiconductor storage device includes a memory cell array having a plurality of SRAM cells arranged along a pair of bit lines that extend along a first direction. A read circuit is arranged for each column at one side of the memory cell array and detects a potential of any one of the pair of bit lines. A write circuit is arranged, separately from the read circuit, at the other side of the memory cell array. The write circuit provides written data to the pair of bit lines to write data to the SRAM cells.

Abstract: High manufacturing yield is realized and variations in threshold voltage of each MOS transistor in a CMOS.SRAM is compensated. Body bias voltages are applied to wells for MOS transistors of each SRAM memory cell in any active mode of an information holding operation, a write operation and a read operation of an SRAM. The threshold voltages of PMOS and NMOS transistors of the SRAM are first measured. Control information is respectively programmed into control memories according to the results of determination. The levels of the body bias voltages are adjusted based on the programs so that variations in the threshold voltages of the MOS transistors of the CMOS.SRAM are controlled to a predetermined error span. A body bias voltage corresponding to a reverse body bias or an extremely shallow forward body bias is applied to a substrate for the MOS transistors with an operating voltage applied to the source of each MOS transistor.

Abstract: A single-chip microcomputer comprising: a first bus having a central processing unit and a cache memory connected therewith; a second bus having a dynamic memory access control circuit and an external bus interface connected therewith; a break controller for connecting the first bus and the second bus selectively; a third bus having a peripheral module connected therewith and having a lower-speed bus cycle than the bus cycles of the first and second buses; and a bus state controller for effecting a data transfer and a synchronization between the second bus and the third bus. The single-chip microcomputer has the three divided internal buses to reduce the load capacity upon the signal transmission paths so that the signal transmission can be accomplished at a high speed. Moreover, the peripheral module required to have no operation speed is isolated so that the power dissipation can be reduced.

Abstract: A solid-state memory in which each memory cell includes a cross-point addressable write element. Each memory cell includes a storage element, such as a pair of cross-coupled inverters, and a read buffer for coupling one of the storage nodes to a read bit line for the column containing the cell. The write element of each memory cell includes one or a pair of write select transistors controlled by a write word line for the row containing the cell, and write pass transistors connected to corresponding storage nodes and connected in series with a write select transistor. The write pass transistors are gated by a write bit line for the column containing the cell. In operation, a write reference is coupled to one of the storage nodes of a memory cell in the selected column and the selected row, depending on the data state carried by the complementary write bit lines for that column.

Abstract: An embodiment of a memory device of SRAM type is proposed. The memory device includes a plurality of memory cells each for storing a first logic value represented by a first reference voltage or a second logic value represented by a second reference voltage. Each memory cell includes a bistable latch—having a main terminal, a complementary terminal, a set of main storage transistors for maintaining the main terminal at the reference voltage corresponding to the stored logic value, and a set of complementary storage transistors to maintain the complementary terminal at the reference voltage corresponding to the complement of the stored logic value—a main access transistor and a complementary access transistor for accessing the main terminal and the complementary terminal, respectively.

Abstract: An improved method for performing a write through operation during a write operation of a SRAM cell (10) of a SRAM array (1) is disclosed. The method comprises suppressing a false write through data propagation at an output node (C, F) of the SRAM array (1) in case of a failure causing transition at a first node (t) or a second node (c) of the SRAM cell (10) by using information about the input data (data, data_b) to be written in the SRAM cell (10) and read data propagation paths to retain the output node (C, F) after a global bit line (gb_t, gb_c) at a precharge level independently from a logical level of the global bit line (gb_t, gb_c), if a corresponding node (c, t) of the SRAM cell (10) is performing the failure causing transition based on input data (data, data_b) to be written in the SRAM cell (10).

Abstract: A solid-state memory in which write assist circuitry is implemented within each memory cell. Each memory cell includes a storage element, such as a pair of cross-coupled inverters, that is connected in series with a pair of power switch transistors between a power supply node and ground. One of the power switch transistors is gated by a word line indicating selection of the row containing the cell, and the other is gated by a column select signal indicating selection of the column containing the cell in a write cycle. Upon a write to the cell, both power switch transistors are turned off, removing bias from the inverter that assists its change of state in a write operation. In other embodiments, a single power switch transistor gated by either a word line or a column select signal may be used.