Abstract: An apparatus and method for the X-ray irradiation of materials is provided. This apparatus includes an irradiation chamber, a number of flat electromagnetic (X-ray) sources having a number of addressable cathode emitters, a support mechanism, a heat transfer system, a shielding system, and a process controller. A shielded portal within the shielding system allows access to an interior volume of the irradiation chamber. The electromagnetic sources are positioned on or embedded within interior surfaces of the irradiation chamber. These electromagnetic sources generate an electromagnetic flux, such as an X-ray flux, where this flux is used to irradiate the interior volume of the irradiation chamber and any materials placed therein. The operation of the electromagnetic sources and the number of addressable cathode emitters being controlled by the process controller. The materials placed within the interior of the chamber may be supported by a low attenuation support mechanism.

Abstract: A radiation source having self-shading electrodes is disclosed. Debris originating from the electrodes is reduced. The path from the electrodes to the EUV optics is blocked by part of the electrodes themselves (termed self-shading). This may significantly reduce the amount of electrode-generated debris.

Abstract: Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.

Abstract: A gas discharge source, in particular, for generating extreme ultraviolet and/or soft X-radiation, has a gas-filled intermediate electrode space located between two electrodes, devices for the admission and evacuation of gas, and one electrode that has an opening that defines an axis of symmetry and is provided for the discharge of radiation. A diaphragm exhibits at least one opening on the axis of symmetry and operates as a differential pump stage, between the two electrodes.

Abstract: In an extreme ultra violet light source apparatus having a comparatively large output power for exposing, a solid target is supplied fast and continuously while heat dissipation for irradiation of a driver laser light is performed successfully. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a target material supplying unit which coats a wire with target material, a wire supplying unit which supplies the wire coated with the target material to a predetermined position within the chamber, a driver laser which applies a laser beam onto the wire coated with the target material to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputting the extreme ultra violet light.

Abstract: An X-ray generator uses a high electrical field generated when a hemimorphic crystal is heated or cooled. The crystal may be lithium niobate polarized in one direction. An X-ray target is placed inside a housing inside which a vacuum is maintained. A tungsten line containing thorium is placed between the crystal and the target. When the crystal is heated or cooled by a Pelletier element, an intense electrical field is generated around the crystal. Thermoelectrons released from the tungsten line accelerate as a result of the electrical field and collide with the X-ray target. The X-rays released at this time radiate through a beryllium window exteriorly of the housing. Intense X-rays are generated without using large scale equipment, such as a high voltage power source.

Abstract: A multi-color X-ray generator includes an electron beam generator 10 which accelerates an electron beam to generate a pulse electron beam 1 and which transmits the beam along a predetermined rectilinear orbit 2, a composite laser generator 20 which successively generates a plurality of pulse laser lights 3a, 3b having different wavelengths, and a laser light introduction device 30 which introduces the pulse laser lights along the rectilinear orbit 2 to be opposed to the pulse electron beam 1, so that the plurality of pulse laser lights 3a, 3b successively head-on collide with the pulse electron beam 1 along the rectilinear orbit 2 so as to generate two or more types of monochromatic hard X-rays 4 (4a, 4b).

Abstract: The present invention relates to an X-ray tube, having a structure for effectively suppressing discharge at a tip of an anode, irradiated with electrons in order to generate X-rays, and an X-ray source including the X-ray tube. In the X-ray tube, electrons emitted from an electron gun are made to collide with an X-ray target, and X-rays generated at the X-ray target due to the collision are taken out to an exterior. The X-ray tube includes: a head, defining an internal space that houses a tip of an anode; an irradiation window, transmitting the generated X-rays to the exterior; an exhaust port, disposed at an inner wall surface of a casing and being for vacuum drawing of the internal space; and a shielding structure, hiding the exhaust port from the tip of the anode.

Abstract: Methods, systems, apparatus, devices for tracking, controlling and providing feedback on droplets used in EUV source technology. The method and system track and correct positions of droplet targets and generated plasma including generating the droplet target or plasma, optically imaging the generated target, determining position coordinates, comparing the position coordinates to a set optimal position to determine if a deviation has occurred and moving the generated target back to the optimal position if the deviation has occurred. The optical imaging step includes activating a light source to image the generated target, the light source is strobed at approximately the same rate as the droplet production to provide illumination of the droplet for stroboscopic imaging. The step of moving is accomplished mechanically by moving the generated target back to the predefined position or electronically under computer control.

Abstract: An x-ray beam processor and system that includes an x-ray beam generator for generating x-ray beams; a mirror shield for shielding the x-ray beams from select areas; a cylindrical waveguide for guiding x-ray beams traveling through the waveguide, which includes a plurality of entry ports and exit ports; a plurality of ring-shaped mirrors disposed adjacent to and generally parallel with the entry ports and the exit ports and sharing a common axis “X” with the waveguide; and mountings for mounting the mirrors to the waveguide.

Abstract: In an extreme ultra violet light source apparatus that exhausts debris including fast ions and neutral particles by the effect of a magnetic field, neutral particles emitted from plasma are efficiently ionized. The extreme ultra violet light source apparatus includes a plasma generating unit that generates plasma, that radiates at least extreme ultra violet light, through pulse operation; collective optics that collects the extreme ultra violet light radiated from the plasma; a microwave generating unit that radiates microwave through pulse operation into a space in which a magnetic field is formed to cause electron cyclotron resonance, and thereby ionizes neutral particles emitted from the plasma; a magnetic field forming unit that forms the magnetic field and a magnetic field for trapping at least ionized particles; and a control unit that synchronously controls at least the plasma generating unit and the microwave generating unit.

Abstract: A small X-ray laser generator including a device (1) for generating and accelerating an electron beam, a plurality of targets (2) placed on the transport trajectory of a generated electron beam (4), and X-ray mirrors (3) for monochromatizing X-rays (5) generated by making the electron beam (4) collide against the plurality of targets (2), in which the X-rays (6) generated from the respective targets (2) are made to interfere with each other to produce a hard X-ray laser beam of 1 keV or more.

Abstract: The invention relates to a radiation system for generating electromagnetic radiation. The radiation system includes a pair of electrodes constructed and arranged to generate plasma of a first substance and a pinch in the plasma. The radiation system also includes a plasma recombination surface that is arranged proximate to the pinch, and is configured to neutralize a plurality of plasma particles.

Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

Abstract: A method for filtering particles out of a beam of radiation propagating from a radiation source is provided. The method includes passing the beam of radiation through a filter having a first portion within the beam of radiation and a second portion outside of the beam of radiation, capturing at least some of the particles in the beam of radiation with the first portion, and moving the filter in a direction that is transverse to the beam of radiation so that the first portion is moved outside of the beam of radiation and the second portion is moved into the beam of radiation.

Abstract: A debris prevention system is constructed and arranged to prevent debris that emanates from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The debris prevention system includes an aperture that defines a maximum emission angle of the radiation coming from the radiation source, and a first debris barrier having a radiation transmittance. The first debris barrier includes a rotatable foil trap. The debris prevention system also includes a second debris barrier that has a radiation transmittance. The first debris barrier is configured to cover a part of the emission angle and the second debris barrier is configured to cover another part of the emission angle.

Abstract: A rod radiation source and its calibration phantom structure mainly have an anti-leak filter layer on one side of a lower lamination layer, and have the anti-leak filter layer evenly deposited with plural drops of liquid radiation sources with each drop of radiation source neighboring but not overlapping, and use an upper lamination layer to cover the anti-leak filter layer to protect each radiation source, and have the above assembly rolled into a rod as a rod radiation source. In another cylindrical container that has a stack of plural sheets, the rod radiation sources get evenly distributed along the axle center and pass each sheet to form a calibration phantom structure for a rod radiation source.

Abstract: A method and an apparatus generate radiation in the wavelength range from about 1 nm to about 30 nm by an electrically operated discharge, which can be used in lithography or in metrology. A working gas is provided between two electrodes. Plasma is ignited in the working gas to generate radiation which is forwarded via an opening for further use. Debris particles are produced in at least one region of at least one of the electrodes. To retain the debris particles, the region is arranged with respect to the opening in such a way that movement paths of the debris particles run at least predominantly outside an area delimited by the opening.

Abstract: A portable handheld digital radiographic device is disclosed. The device has a touchscreen interface, an x-ray generator, and a computer system. These components are integrated into one combined device that is designed to be small, lightweight and portable.

Abstract: An EUV light source apparatus capable of preventing the efficiency of generation of EUV light from decreasing due to deterioration of a window of an EUV light generation chamber. The EUV light source apparatus includes an EUV light generation chamber provided with a window, a driver laser which generates a laser beam, a concave lens which enlarges the laser beam, a convex lens which collimates the enlarged laser beam, a parabolic concave mirror which is arranged in the EUV light generation chamber and reflects the collimated laser beam to collect the laser beam to a target material, a parabolic concave mirror adjusting mechanism which adjusts position and angle of the parabolic concave mirror, an EUV light collector mirror which collects EUV light, and a purge gas supply unit which supplies a purge gas for protecting the window and the parabolic concave mirror.

Abstract: According to one exemplary embodiment, an extreme ultraviolet (EUV) source collector module for use in a lithographic tool comprises an EUV debris mitigation filter. The EUV debris mitigation filter can be in the form of an aerogel film, and can be used in combination with an EUV debris mitigation module comprising a combination of conventional debris mitigation techniques. The EUV debris mitigation filter protects collector optics from contamination by undesirable debris produced during EUV light emission, while advantageously providing a high level of EUV light transmittance. One disclosed embodiment comprises implementation of an EUV debris mitigation filter in an EUV source collector module utilizing a discharge-produced plasma (DPP) light source. One disclosed embodiment comprises implementation of an EUV debris mitigation filter in an EUV source collector module utilizing a laser-produced plasma (LPP) light source.

Abstract: A method and apparatus is disclosed that may comprise an ultraviolet light source; an optical element within an optical path of the light source mounted on an optical element mount; a vibration damping mechanism operatively connected to the optical element or to the mount which may comprise a wire mesh pad. The optical element may comprise a center wavelength selection optical element, which may comprise a grating, a mirror, or a prism. The vibration damping mechanism may comprise the wire mesh pad comprising an elastic interface between a driving mechanism lever arm operable to move the optical element or the mount and a driving lever arm actuator. The vibration damping mechanism may comprise a mass damping mechanism comprising a mounting plate connected to the optical element or to the mount; a damping mass; the wire mesh pad comprising an elastic interface between the mounting plate and the damping mass.

Abstract: Disclosed is a device and method for generating X-rays having different energy levels as well as a material discrimination system thereof. The method comprises the steps of: generating a first pulse voltage, a second pulse voltage, a third pulse voltage and a fourth pulse voltage, generating a first electron beam having a first beam load and a second electron beam having a second beam load, respectively, based on the first pulse voltage and second pulse voltage, generating a first microwave having a first power and a second microwave having a second power, respectively, based on the third pulse voltage and the fourth pulse voltage, accelerating the first and second electron beams respectively using the first and second microwave to obtain the accelerated first electron beam and the second electron beam, hitting a target with the accelerated first electron beam and the second electron beam to generate a first X-ray and a second X-ray having different energy levels.

Abstract: A beam of electronic charges and a standing wave laser beam are generated. The beam of charges is collided with the standing wave laser beam at a substantial angle to generate a burst cone of high energy x-rays. The x-ray cone is split, collimated and steered to a collapse point of diagnosis within a patient's body. A selected volume of the patient's body is scanned for diagnosis by directing subsequent burst cones at an array of points within the volume. The fluorescence spectra are detected from each of the points resulting from the high energy x-ray scanning. A chart is generated distinguishing fluorescence spectra emitted from various points within the volume.

Abstract: The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.

Abstract: A gas discharge source for EUV radiation and/or soft X-ray radiation is arranged in a vacuum chamber and includes at least two electrodes, each with a circular periphery and rotatably mounted for rotation. At one spatial position, the electrodes have a small spacing for the ignition of a gas discharge and are each connected to a reservoir for a liquid, electrically conductive material. During rotation, a liquid film of the electrically conductive material forms over the circular periphery of the electrodes and a flow of current to the electrodes is made possible. The electrodes connect to the reservoirs via a respective connecting element, wherein a gap is formed between electrode and connecting element over a partial section of the circular periphery of each electrode. The liquid material can penetrate from the reservoir and into the gap during rotation of the electrode via a feed channel formed in the connecting element.

Abstract: In accordance with an embodiment, a method of examining contents of objects comprises accelerating a plurality of electrons to a predetermined acceleration energy and colliding the accelerated electrons with a target. An object is scanned with the generated X-ray photons. First energies of X-ray photons are determined after scanning and second energies of accelerated electrons are determined after colliding with the target, and correlated. Energies of respective detected X-ray photons prior to scanning are determined based, at least in part, on the second energies of respective correlated accelerated electrons and the predetermined acceleration energy. A potential presence of suspect material is determined based, at least in part, on the first energies of respective X-ray photons after scanning and the third energies of the detected X-ray photons prior to scanning. Systems are also disclosed.

Abstract: A bearing assembly mounted in an x-ray tube includes a bearing race and a plurality of bearing balls positioned adjacent to the bearing race. The plurality of bearing balls are positioned within a bearing cage. The bearing cage is configured to evenly space the bearing balls within the bearing cage and prevent contact between adjacent bearing balls, thereby eliminating the problems of skidding wear and dynamic impact load between adjacent bearing balls in the bearing assembly.

Abstract: Nuclear gauges, their components and method for assembly and adjustment of the same are provided. The nuclear gauges are used in measuring the density and/or moisture of construction-related materials. The nuclear gauge can include a gauge housing having a vertical cavity therethrough and at least one radiation detector located within the housing. The nuclear gauge can include a vertically moveable source rod and a radiation source operatively positioned within a distal end of the source rod.

Abstract: An electrode-less discharge source of extreme ultraviolet (EUV) radiation (10) efficiently assembles a hot, dense, uniform, axially stable plasma column (5) with magnetic pressure and inductive current drive. It employs theta-pinch-type magnetic compression of plasma confined in a magnetic mirror. Plasma, confined in a magnetic mirror, is made to radiate by resonant magnetic compression. The device comprises a radiation-source gas input nozzle (1), an optional buffer-gas input flow (2), mirror-field coils (9a, 9b), theta-pinch coils (8a, 8b), a plasma and debris dump (11), and an evacuation port (7). The circular currents yield an axially stable plasma-magnetic-field geometry, and a reproducible, stable, highly symmetrical EUV source.

Abstract: A multi-color X-ray generator includes an electron beam generator 10 which accelerates an electron beam to generate a pulse electron beam 1 and which transmits the beam along a predetermined rectilinear orbit 2, a composite laser generator 20 which successively generates a plurality of pulse laser lights 3a, 3b having different wavelengths, and a laser light introduction device 30 which introduces the pulse laser lights along the rectilinear orbit 2 to be opposed to the pulse electron beam 1, so that the plurality of pulse laser lights 3a, 3b successively head-on collide with the pulse electron beam 1 along the rectilinear orbit 2 so as to generate two or more types of monochromatic hard X-rays 4 (4a, 4b).

Abstract: The present invention is a super conductor electromagnetic transmitter device. This superconductor takes x amount of electro-magnetic energy waves and concentrates them by expulsion into an extremely powerful non-dissipating enhanced Faraday rotated directional output. This expulsion field, since it surrounds a central point in space because of the inner surface of a tube, is concentrated energy in a small space. Thus, it is impulsive and also induces ultra-Faraday rotation effect. In example, instead of Faraday rotation speed of energy wave rotation, the rotation field is much, much faster because of the superconductive Meissner field.

Abstract: The present invention relates to a plasma discharge lamp for generating EUV radiation and/or soft X-rays by means of an electrically operated discharge. The proposed lamp comprises at least two electrodes arranged in a discharge space at a distance from one another to form a gap which allows the ignition of a plasma (14) in a gaseous medium between said electrodes. A metal applying device applies a metal to a surface of said electrodes. The electrodes are formed of conveyer belts (15) driven to transport the metal to said gap, wherein for each of the electrodes a shaper element (13) is provided at the gap to ensure a proper form and distance of the electrodes at the gap. An energy beam device (4) is adapted to direct an energy beam onto at least one of said surfaces in the gap evaporating said applied metal at least partially thereby producing said gaseous medium. With the proposed plasma discharge lamp high input powers can be achieved at a compact design of the lamp.

Abstract: The invention is directed to an arrangement for generating extreme ultraviolet radiation from a plasma generated by an energy beam with high conversion efficiency, particularly for application in radiation sources for EUV lithography. It is the object of the invention to find a novel possibility for generating EUV radiation by means of a plasma induced by an energy beam that permits a more efficient conversion of the energy radiation into EUV radiation in the wavelength region of 13.5 nm and ensures a long lifetime of the optical components and the injection device.

Abstract: A Compton backscattering x-ray source includes an electron storage ring for storing electron bunches. A timing system refreshes an orbiting electron bunch according to a schedule selected to improve at least one attribute of x-ray emission. In one implementation, the electron bunch is periodically refreshed with a period of at least about 10 Hz.

Abstract: An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing optical element having a first range of operating center wavelengths; a droplet detection radiation source having a second range of operating center wavelengths; a drive laser steering element comprising a material that is highly reflective within at least some part of the first range of wavelengths and highly transmissive within at least some part of the second range of center wavelengths; a droplet detection radiation aiming mechanism directing the droplet detection radiation through the drive laser steering element and the lens to focus at a selected droplet detection position intermediate the droplet generator and the irradiation site.

Abstract: There is disclosed a device including: an electron beam generation device 10 which accelerates a pulse electron beam 1 to transmit the beam through a predetermined rectilinear orbit 2; a laser generation device 20 which generates a pulse laser light 3; a laser light introduction device 30 which introduces the pulse laser light 3 onto the rectilinear orbit 2 so as to collide with the pulse electron beam 1; a metal target 42 which generates a particular X-ray 5 by collision with the pulse electron beam 1: and a target moving device 40 capable of moving the metal target between a collision position 2a on the rectilinear orbit and a retreat position out of the orbit.

Abstract: The present invention provides a method of delivering solid material at a position far enough from any surrounding solid with high enough target density without scattering debris to the environment. In the present invention, radiation is generated from plasma produced by laser irradiation on a material. This material is a cluster of particles that is composed of many fine particles bound together with a binder that vaporizes at temperature lower than melting point of fine particles. Density of particles in a particle-cluster 8 is increased by vaporizing a solvent 7 by heating a droplet 5 with the irradiation of laser 6. Solvent of a droplet occupies large fraction of the droplet in order to stabilize droplet generation. This solvent is vaporized prior to delivery to a vacuum chamber 9 for plasma generation. This vaporization helps to avoid degradation of vacuum of the chamber 9. The diameter of a particle-cluster thus condensed is several tens ?m.

Abstract: The present invention relates to a method of operating an electrical discharge device (12) comprising at least one first electrode (14) and at least one second electrode (16) at a distance therefrom, which electrodes are electrically connected to a power supply (18) and, upon ignition of a first gas discharge (22) between the electrodes (14, 16), transmit an electrical current (1), as a result of which a plasma (24) is produced in a working gas (26), which plasma emits radiation (28), in particular extreme ultraviolet and/or soft X-ray radiation, which is passed via a solid angle (30) into a chamber (32) outside the electrodes (14, 16). In order to prevent erosion at the electrodes (14, 16), it is proposed that the formation of a secondary plasma (34) in the chamber (32) is suppressed by a device (42).

Abstract: An x-ray generator comprising a vessel 1 in which a low pressure gas atmosphere is maintained, hemimorphic crystal supporting means 3a and 3b provided in the vessel, at least a pair of hemimorphic crystals 5a and 5b arranged oppositely at an interval and supported by the hemimorphic crystal supporting means in the vessel, and means 3a, 3b; 6b to 8a and 8b for elevating and lowering the temperature of the hemimorphic crystals. X-rays are radiated from the vessel as the temperature of the hemimorphic crystals is elevated or lowered.

Abstract: A description is given of a method and an apparatus for generating radiation (12) in the wavelength range from about 1 nm to about 30 nm by means of an electrically operated discharge, which can be used in lithography or in metrology. Use is made of at least one first electrode (14) and at least one second electrode (16) at a distance therefrom, wherein at least one working gas (22) is provided between the electrodes (14, 16). A plasma is ignited in the working gas (22), the generated radiation (12) of which plasma is forwarded via a first opening (30) for further use, and wherein debris particles (28) are produced in at least one region (26) of at least one of the electrodes (14, 16). In order to retain the debris particles (28), the method is configured such that at least the region (26) is arranged with respect to the first opening (30) in such a way that the movement paths (32) of the debris particles (28) run at least predominantly outside an area delimited by the first opening (30).

Abstract: A beam admission unit is disclosed. In at least one embodiment, the beam admission unit includes a plurality of admission segments having at least one admission slit for admitting radiation emanating from a radiation source onto a predetermined admission region. So as to implement a particularly space-saving, robust and reliable design, in at least one embodiment the admission segments are interconnected in an articulated fashion to form an admission plate chain which can be rolled up.

Abstract: In a device for exposure field monitoring of a therapeutic radiation exposure field with diagnostic x-ray image quality with the same or nearly the same projection as in therapeutic radiation, the focal spot from which the diagnostic radiation emanates is designed to cause the diagnostic radiation to penetrate the patient in the same or nearly the same projection as the therapeutic radiation located at the target of the radiation therapy apparatus or in close proximity thereto.

Abstract: A method for routine monitoring and quality assurance of field asymmetry of high energy circular radiation beam producing equipment. The quality assurance process of field symmetry for devices such as stereotactic radiosurgery (SRS) systems is simplified by directly measuring the integration of the half-beam profile. The method of the invention provides that the field symmetry is obtained by positioning the tip of an ion chamber, with a collecting length approximately half the diameter of the beam, at the central axis of the beam, and rotating the ion chamber at varying angular positions, acquiring and comparing readings at desired angular positions. Each pair of readings from positions 180 degrees opposed from each other, are plugged into the equation, Asymmetry=2(R1?R2)/(R1+R2) to compute asymmetry.

Abstract: A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or vapor in a space between anode and cathode and to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium and/or tin. The radiation source may comprise a plurality of discharge elements, each of which is only used for short intervals, after which another discharge element is selected. The radiation source may also comprise a triggering device, which device can facilitate improving the exact timing of the pinch formation and thus the pulse of EUV radiation. The radiation source may also be constructed to have a low inductance, and operated in a self-triggering regime.

Abstract: The present invention relates to an X-ray tube capable of efficiently extracting X-rays of low energy and provided with a structure having excellent durability. The X-ray tube is provided with a silicon foil having a thickness of 3 ?m or more but 30 ?m or less as a part of a vessel body. The silicon foil is directly or indirectly affixed on the closed vessel in a state that the silicon foil covers the opening provided in the closed vessel, and functions as a transmission window of the closed vessel.

Abstract: The invention relates the field of electron emitter of an X-ray tube. More specifically the invention relates to flat thermionic emitters to be used in X-ray systems with variable focus spot size and shape. The emitter provides two main terminals (3, 5) which form current conductors and which sup-port at least two emitting portions (7, 9). The emitting portions are structured in a way so that they are electron optical identical or nearly identical increasing the emergency operating options in case of emitter damage.

Abstract: A radiation source is disclosed that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a discharge space between the anode and the cathode and to form a plasma so as to generate electromagnetic radiation, the anode and the cathode being rotatably mounted around an axis of rotation, the cathode being arranged to hold a liquid metal. The radiation source further includes an activation source arranged to direct an energy beam onto the liquid metal so as to vaporize part of the liquid metal and a liquid metal provider arranged to supply additional liquid metal so as to compensate for the vaporized part of the liquid metal.

Abstract: A radiation source with an anode and a cathode to create a discharge in a discharge space between the anode and the cathode is disclosed. A plasma is formed in the radiation source which generates electromagnetic radiation, such as EUV radiation. The radiation source includes a first activation source to direct a first energy pulse onto a first spot in the radiation source near the discharge space to create a main plasma channel which triggers the discharge. The radiation source also has a second activation source to direct a second energy pulse onto a second spot in the radiation source near the discharge space to create an additional plasma channel. By directing the second energy pulse during the same discharge, a shortcutting of the main plasma current is realized which in turn may reduce the amount of fast ions produced.

Abstract: A system and method for collecting radiation, which may be used in a lithography illumination system. The system comprises a first surface shaped to reflect radiation in a first hemisphere of a source to illuminate in a second hemisphere of the source; and a second surface shaped to reflect radiation in the second hemisphere of the source to an output plane.