Abstract: A soft x-ray generator includes a unique pulse trigger assembly which reliably and reproducibly provides a plasma to initiate the discharge between a cathode and an anode, and having a cone-shaped geometry. The soft x-ray generator of the present invention also includes a rotating anode which is generally disk-shaped with an outer circumferential edge which can be rotated with respect to the cathode to expose different sections of the anode to the plasma discharge, thereby reducing anode wear and providing longer term operation. Anode erosion is also reduced by the liquid cooling of the anode during use. The generator utilizes a relatively low capacitance for the cathode-to-anode discharge and a relatively high voltage and pulse repetition rate (frequency) to achieve continuous reproducible results.

Abstract: Methods, systems and apparatus for using nanoparticle seeded short-wavelength discharge generator sources discharge sources, for use with X-ray, XUV and EUV light emissions. Applications can include EUV lithography. Additional embodiments can use the generator sources for Hollow Cathode Plasma Discharge (HCPD) lamps, and dense plasma focus (DPF) devices and other sources. Target streams of gases such as Xe and nanoparticles such as tin, copper, or lithium can be heated with laser type sources to emit nano-droplets therefrom.

Abstract: A charged particle beam including charged particles (e.g., electrons) is generated from a charged particle source (e.g., a cathode or scanning electron beam). As the beam is projected, it passes between plural alternating electric fields. The attraction of the charged particles to their oppositely charged fields accelerates the charged particles, thereby increasing their velocities in the corresponding (positive or negative) direction. The charged particles therefore follow an oscillating trajectory. When the electric fields are selected to produce oscillating trajectories having the same (or nearly the same) as a multiple of the frequency of the emitted x-rays, the resulting photons can be made to constructively interfere with each other to produce a coherent x-ray source.

Abstract: An LPP EUV light source is disclosed having an optic positioned in the plasma chamber for reflecting EUV light generated therein and a laser input window. For this aspect, the EUV light source may be configured to expose the optic to a gaseous etchant pressure for optic cleaning while the window is exposed to a lower gaseous etchant pressure to avoid window coating deterioration. In another aspect, an EUV light source may comprise a target material positionable along a beam path to participate in a first interaction with light on the beam path; an optical amplifier; and at least one optic directing photons scattered from the first interaction into the optical amplifier to produce a laser beam on the beam path for a subsequent interaction with the target material to produce an EUV light emitting plasma.

Abstract: An x-ray tube having a removable aperture structure that can be detached from a portion of the x-ray tube without damaging either component is disclosed. The aperture structure includes heat conducting surfaces in communication with a coolant supplied to the fluid reservoir. The removable aperture structure includes a bond surface configured to receive a removable bond with the x-ray tube evacuated enclosure.

Abstract: In embodiments of the invention, a radiosensitizer or other agent is relatively uniformly accumulated in the cells of a tumor. An external monochromatic x-ray beam, which is tuned to a predetermined energy level associated with k-edge effects in the agent, is then directed to the tumor. The monochromatic x-ray beam activates the release of additional localized radiation from the agent. The additional radiation destroys the DNA of at least some tumor cells, making those tumor cells incapable of reproduction and repair. In embodiments of the invention, a single monochromatic x-ray beam source is used for both imaging and radiotherapy.

Abstract: A device for irradiating tissue encompassing at least one electron source for generating an electron beam, numerous radiation heads that are firmly and annularly arranged in a supporting frame around an isocenter of the device and emit radiation towards the isocenter, and one beam guidance system to guide the electron beam in the housing towards the radiation heads. The beam guidance system has been built as a polygon, especially as a pentagon arranged like a ring around the isocenter, in which case media for deflecting the electron beam have been placed at every corner point of the polygon.

Abstract: An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 ?m at an effective plasma producing energy if not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.

Abstract: Contrast agents developed specifically for x-ray diagnostics provide dose-enhanced radiotherapy and radiosurgery. The presence of heavy elements, for example, gold or iron, from these contrast agents, even small quantities, leads to a major dose increase in target tissue when combined with in vivo calibration of the amount of contrast agent. The technique can also be used in combination with other techniques, such as focused x-rays, to achieve further enhancement of therapeutic ratio. The technique is enhanced by employing oil-based contrast agents, which will remain in the target much longer than conventional agents. Through optimization of the equipment it is possible to achieve very large ratios of dose in target to dose in healthy tissue.

Abstract: An X-ray imaging apparatus is disclosed. The apparatus includes a radiator housing, an X-ray tube, a source of X-rays and at least one filtration material disposed on the X-ray tube. The X-ray tube is rotatable about a longitudinal axis and is disposed at least partially within the radiator housing. The source of X-rays emits at least one X-ray beam at least partially through the X-ray tube. The X-ray beam exits the X-ray tube at an annular X-ray window. The filtration material at least partially covers a portion of the annular X-ray window. Rotation of the X-ray tube causes the X-ray beam to pass through a plurality of locations in the annular X-ray window and at least a portion of the X-ray beam is filtered by the filtration material.

Abstract: The invention relates to a device for generating X-rays (18) comprising an electron source (3) for emitting electrons accommodated in a vacuum space (2), a liquid metal circuit including a liquid metal for emitting X-rays as a result of the incidence of electrons and a pumping means (11) for causing a flow of the liquid metal through a constriction (7) where the electrons emitted by the electron source (3) impinge upon the liquid metal, and a radiation window (12) bounding said constriction (7), which is transparent to electrons and X-rays and separates the constriction (7) from the vacuum space (2).

Abstract: An extreme ultraviolet source with wide-angle vapor containment and reflux is described. In the optical output directions radiating from the source plasma there is an array of tapered buffer gas heat pipes, with wick structures in the walls. In directions toward the insulators separating the discharge electrodes there are disc-shaped buffered gas heat pipes that prevent metal vapor from condensing on these insulators. A preferred electrode configuration has three electrode discs that operate in the star pinch mode. Another electrode configuration comprises two electrode discs and supports a pseudospark discharge. The star pinch variant of this source has efficiently generated 13.5 nm radiation with lithium vapor and helium buffer gas.

Abstract: Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in plasma generated EUV light source chambers, particularly where the plasma source material is reactive with one or more of the MLM materials.

Abstract: An EUV light source is disclosed which may comprise a laser source generating a laser beam and a source material, e.g. tin, SnBr4, SnBr2, SnH4, tin-gallium alloys, tin-indium alloys, tin-indium-gallium alloys or combinations thereof, that is irradiated by the laser beam to form a plasma and emit EUV light. The EUV light source may also comprise a beam dump positioned to receive the laser beam and a system controlling the temperature of the beam dump within a pre-selected range. In one embodiment, the source material may be irradiated at an irradiation zone and the source may further comprises a receiving structure formed with a surface shaped to receive source material ejected from the irradiation zone and direct the received source material for subsequent collection. The receiving structure and the beam dump may be formed as a single integrated unit.

Abstract: A method and apparatus for tracking a target by tracking the location of an imaging device while the imaging device is tracking the target is described.

Abstract: An X-ray source and an X-ray apparatus with an X-ray source are provided, the X-ray source includes a liquid metal target which flows through a system of ducts and is conducted through a duct section which has a flow cross-section that is reduced relative to that of the system of ducts. The X-ray source provides a pressure source for acting on the liquid metal target such that the pressure in the liquid metal target at the area of the reduced flow cross-section equals essentially a selectable reference value or remains essentially in a pressure range between selectable limit values of the pressure. A comparatively small thickness of a window can thus be realized in conjunction with a comparatively high flow speed.

Abstract: A device for generating an x-ray point source includes a target, and an electron source for producing electrons which intersect with the target to generate an x-ray point source having a size which is confined by a dimension of the target.

Abstract: A device for generating radiation source based on a discharge includes a cathode and an anode. A discharge is created in a material comprising an alloy of two or more substances.

Abstract: A supporting member supports an anode target at one end thereof and is provided with an attachment portion around the outer circumference of the other end. The attachment portion is attached to the inner circumferential surface of the cylindrical portion of the second vacuum envelope member so that the heat conductivity from the supporting member to the second vacuum envelope member can be improved by means of the attachment portion. A terminal is provided at the end surface portion on the side of the other end of the second vacuum envelope member for applying a voltage to the anode target. The terminal is positioned away from the attachment portion so that the temperature of the insulating material that insulates the terminal can be kept low and the insulating characteristics can be ensured over the long term.

Abstract: An energy beam is irradiated onto a target from an energy beam source, thereby generating an X-ray with an irradiating area to be irradiated onto an object. Then, the X-ray is introduced into a spectrometer, thereby generating an X-ray with parallelism through the selection of wavelength and wavelength range.

Abstract: Target 1 that is arranged in the disc direction is sprayed from nozzle 2 that has a slit-shaped aperture. Target 1 is conveyed on a gas stream. He gas is used in this example. Nozzle 2 may be vibrated by a piezo apparatus to spray disc-shaped target 1. Target 1 that is sprayed from nozzle 2 reaches the irradiation position of laser light with its direction unchanged since the exterior of nozzle 2 is maintained in a high vacuum. Synchronized with delivery of target 1, pulse laser light 5 from Nd:YAG light source 4 is focused by lens 3 and irradiated onto target 1. The spot diameter of the laser is the same 1 mm diameter as that of target 1. The thickness is not more than 1000 nm. Therefore, virtually the entire target is converted into plasma, debris generation is inhibited and the conversion efficiency is elevated.

Abstract: A rotatable contamination barrier is disclosed that has a plurality of closely packed blades configured to trap contaminant material coming from a radiation source. The blades are radially oriented relative to a central rotation axis of the contamination barrier. The blades comprise a metal compound having crystals oriented generally radially relative to the central rotation axis.

Abstract: An EUV target delivery system and method are disclosed which may comprise: a target material purification system connected to deliver liquid target material comprising: a first container and a second container in fluid contact with the target material reservoir; a filter intermediate the first chamber and the second chamber; a liquid target material agitation mechanism, or at least one purification chamber containing the target material in a form reactive with impurities contained in the inert gas reacting with such impurities and removing from the inert gas the impurities, or providing an evaporation chamber in fluid communication with an impurity chamber and with a target droplet mechanism liquid target material reservoir and containing liquid source material; heating the liquid source material to a first temperature sufficient to evaporate a first set of contaminants; heating the liquid source material to a second temperature sufficient to evaporate lithium.

Abstract: Erosion of material in an electrode in a plasma-produced extreme ultraviolet (EUV) light source may be reduced by treating the surface of the electrode. Grooves may be provided in the electrode surface to increase re-deposition of electrode material in the grooves. The electrode surface may be coated with a porous material to reduce erosion due to brittle destruction. The electrode surface may be coated with a pseudo-alloy to reduce erosion from surface waves caused by the plasma in molten material on the surface of the electrode.

Abstract: A mirror is reflective to light and transmissive to x-rays. The mirror has a continuous mirror surface and an x-ray aperture within a body portion of the mirror proximate the continuous mirror surface that is transmissive to x-rays.

Abstract: An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 ?m at an effective plasma producing energy if not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.

Abstract: In one example, a radiation source comprises a housing and an acceleration chamber within the housing, with a peak acceleration energy greater than the lowest neutron production threshold of tantalum. A source of charged particles is supported by the housing to emit charged particles into the acceleration chamber. A target is supported by the housing downstream of the acceleration chamber. The target consists essentially of at least one isotope having a neutron production threshold greater than the peak acceleration energy. No neutrons are therefore generated. The source may also comprise a collimator, target shielding, and/or housing shielding comprising at least one isotope having a neutron production threshold greater than the peak acceleration energy, reducing or eliminating neutron generation as compared to the prior art, as well. Systems comprising the source, methods of operation of the source, and methods of manufacture of the source are also disclosed.

Abstract: An X-ray generator for generating plasma and X-ray emitted from the plasma includes a unit for generating the plasma, and plural reflection optical systems for introducing the X-ray through different optical paths.

Abstract: An X-ray source includes a magnetic appliance to provide electron beam focusing. The magnetic appliance can provide variably focused and non-focused configurations. The magnetic appliance can include one or more electromagnets and/or permanent magnets. An electric potential difference is applied to an anode and a cathode that are disposed on opposite sides of an evacuated tube. The cathode includes a cathode element to produce electrons that are accelerated towards the anode in response to the electric field between the anode and the cathode. The anode includes a target material to produce x-rays in response to impact of electrons.

Abstract: Disclosed herein are systems and methods for advancing tape/ribbon through a targeting area where laser ablation of the tape occurs in laser produced plasma equipment. Disclosed systems include a first positioning surface perpendicular to further positioning devices, where all of the positioning components work to precisely position the advancing tape in the point source area. After the first positioning device, the remaining positioning surfaces are parallel and provide positioning forces on the tape along a single horizontal axis, but in alternately opposing directions. Such forces assist to precisely position the tape in the desired target location, and to control the rate of advancement of the tape by imparting friction on the tape in alternating, opposing directions. A steady drive roller serves to pull the tape through the system, and works in conjunction with the friction imparted by the positioning surfaces to advance the tape at a substantially constant velocity.

Abstract: Modular X-ray tube (10) and method for the production of such an X-ray tube, in which an anode (20) and a cathode (30) are arranged in a vacuumized inner space (40) situated opposite each other, electrons (e?) being produced at the cathode (30) and X-rays (y) at the anode (20). The X-ray tube (10) according to the invention comprises a multiplicity of acceleration modules (41, . . . , 45), complementing one another, and each acceleration module (41, . . . , 45) comprises at least one potential-carrying acceleration electrode (20/30/423/433/443). A first acceleration module (41) thereby comprises the cathode (30), a second acceleration module (45) the anode (20). The X-ray tube (10) further comprises at least one other acceleration module (42, . . . , 44). In particular, the X-ray tube according to the invention can possess a re-closeable vacuum valve, enabling individual defective parts of the tube (10) to be replaced in a simple manner or enabling the tube (10) to be modified in a modular way.

Abstract: The invention describes an X-ray source in which a cooling plate (36) for water-cooling the anode (28) of an X-ray tube (26) is firmly mounted on a radiation protection casing (20) and the X-ray tube (26) is rotatably borne relative to the cooling plate (36) in the radiation protection casing (20). The cooling plate (36) and X-ray tube (26) have small axial play with respect to each other, which allows for rotation. Radial seals (R1, R2) ensure adequate sealing of the cooling water throughout the entire axial play. Advantageously, a sealing plate (27) for adaptation to the cooling plate (36) is attached to the X-ray tube (25). With the X-ray source in accordance with the invention, it is easy to switch between various focus types in one casing structure.

Abstract: The invention concerns a radiation source, comprising an anode (2), a cathode (3), an electric discharge gap (4) between the anode (2) and the cathode (3) and a gas input conduit (30) in the discharge gap (4). The gas input conduit (30) is electrically connected to the anode and the cathode. The invention is characterized in that the gas input conduit (30) is supplied with gas by a gas supply conduit (32), designed to form between its portion (42) connected to the gas input conduit (30) and another of its portions connected to a fixed potential, an electric impedance such that it counters the generation of electric discharges inside the gas input conduit (30).

Abstract: An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a ibeus defining a desired plasma initiation site, comprising; a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis genemily perpendicular to the target stream track from a desired stream truck intersecting the desired plasma initiation site.

Abstract: The device comprises a device (2) for creating an essentially linear target (4) in an evacuated space where laser beams (1) are focused, the target being suitable for interacting with the focused laser beams (1) to emit a plasma emitting radiation in the extreme ultraviolet. A receiver device (3) receives the target (4) after it has interacted with the focused laser beams (1), and a collector device (110) collects the EUV radiation emitted by the target (4). The focusing elements (11) for focusing the laser beams on the target (4) are arranged in such a manner that the laser beams (1) are focused on the target (4) laterally, being situated in a common half-space relative to the target (4) and being inclined at a determined angle lying in the range about 60° to about 90° relative to a mean collection axis (6) perpendicular to the target (4).

Abstract: The present invention is made to provide an extreme ultraviolet light source target or an X-ray source target having a good operationality. An extreme ultraviolet light source target in accordance with an aspect of the present invention is obtained by including a heavy metal such as tin into a matrix made of a polymeric material such as hydroxylpropylcellulose (HPC). The target can be manufactured by mixing the heavy metal and the polymeric material with a solvent, and evaporating the solvent. Since the target uses the polymeric material as a matrix, the target can be easily deformed to have a desired shape. For this reason, the target can be easily attached to a target holder irrespective of the shape of the holder, resulting in a good operationality of the target. Furthermore, an emission efficiency can be improved by including the heavy metal at a low density.

Abstract: Metallic solutions at room temperature used a laser point source target droplets. Using the target metallic solutions results in damage free use to surrounding optical components since no debris are formed. The metallic solutions can produce plasma emissions in the X-rays, XUV, and EUV(extreme ultra violet) spectral ranges of approximately 11.7 nm and 13 nm. The metallic solutions can include molecular liquids or mixtures of elemental and molecular liquids, such as metallic chloride solutions, metallic bromide solutions, metallic sulphate solutions, metallic nitrate solutions, and organo-metallic solutions. The metallic solutions do not need to be heated since they are in a solution form at room temperatures.

Abstract: An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site.

Abstract: A method of generating energetic electromagnetic radiation comprises, during each of a plurality of separated radiation intervals, injecting laser radiation of a given wavelength into an optical cavity that is characterized by a round-trip transit time (RTTT) for radiation of that given wavelength. At least some radiation intervals are defined by one or more optical macropulses, at least one optical macropulse gives rise to an associated circulating optical micropulse that is coherently reinforced by subsequent optical micropulses in the optical macropulse and the electric field amplitude of the circulating optical micropulse at any given position in the cavity reaches a maximum value during the radiation interval.

Abstract: An apparatus for applying x-rays to an interior surface of a body cavity includes a catheter assembly, and one or more flexible probe assemblies. An x-ray generator assembly, including an optically activated x-ray source, is coupled to a distal end of each flexible probe assembly. The catheter assembly includes a body member defining one or more interior channels; an x-ray absorption control layer surrounding the body member; at least one inner tube enclosing the body member and the absorption control layer; at least one outer tube; and one or more inflatable elements coupled to the inner tube. The inflatable elements, when inflated, fixedly position the catheter assembly within the body cavity. Each flexible probe assembly is slidably positionable within at least one of the interior channels, and includes a transmission path adapted to transmit an activating energy, such as light from laser, onto a cathode within the x-ray source.

Abstract: An x-ray source assembly capable of producing x-rays suitable for use in medical, explosive detection, and other areas. The assembly includes a housing having a two-part socket member (which holds the assembly's x-ray tube therein) positioned therein. The two-part housing defines an opening through with the tube's x-rays are emitted.

Abstract: An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing optical element having a first range of operating center wavelengths; a droplet detection radiation source having a second range of operating center wavelengths; a drive laser steering element comprising a material that is highly reflective within at least some part of the first range of wavelengths and highly transmissive within at least some part of the second range of center wavelengths; a droplet detection radiation aiming mechanism directing the droplet detection radiation through the drive laser steering element and the lens to focus at a selected droplet detection position intermediate the droplet generator and the irradiation site.

Abstract: An EUV lithographic apparatus includes an EUV radiation source, an optical element and a cleaning device. The cleaning device includes a hydrogen radical source and a flow tube in communication with the hydrogen radical source. The cleaning device is configured to provide a flow of hydrogen radicals and the flow tube is arranged to provide a hydrogen radical flow at a predetermined position within the lithographic apparatus, for example for cleaning a collector mirror.

Abstract: Various mechanisms are provided relating to plasma-based light source that may be used for lithography as well as other applications. For example, a device is disclosed for producing extreme ultraviolet (EUV) light based on a sheared plasma flow. The device can produce a plasma pinch that can last several orders of magnitude longer than what is typically sustained in a Z-pinch, thus enabling the device to provide more power output than what has been hitherto predicted in theory or attained in practice. Such power output may be used in a lithography system for manufacturing integrated circuits, enabling the use of EUV wavelengths on the order of about 13.5 nm. Lastly, the process of manufacturing such a plasma pinch is discussed, where the process includes providing a sheared flow of plasma in order to stabilize it for long periods of time.

Abstract: The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.

Abstract: The invention is directed to an arrangement for metering target material for the generation of short-wavelength electromagnetic radiation from an energy beam induced plasma, in particular X radiation and EUV radiation. The object of the invention is to find a novel possibility for metering target material for the generation of short-wavelength electromagnetic radiation from an energy beam induced plasma which makes it possible to provide reproducibly supplied mass-limited targets in such a way that only the amount of target material for plasma generation that can be effectively converted to radiating plasma in the desired wavelength region arrives in the interaction chamber and, therefore, debris generation and the gas burden in the interaction chamber are minimized.

Abstract: An apparatus and method for cleaning a plasma source material compound from a plasma produced EUV light source collector optic which may comprise reacting the plasma source material compound with hydrogen to form a hydride of the plasma source material from the plasma source material contained in the plasma source material compound on the collector optic. The method may further comprise initiating the reacting by introducing hydrogen into a plasma formation chamber containing the collector optic, and may further comprise removing the hydride from the collector optic, e.g., by cleaning plasma action and/or plasma source material sputtering, or other means as may be determined to be effective. An apparatus and method of extending the useful life of a plasma produced EUV light source collector coating layer may comprise in situ replacement of the material of the coating layer by deposition of the coating layer material onto the coating layer.

Abstract: According to one aspect of the invention a robust anode structure and methods of making and using said structure to produce ionizing radiation are disclosed. An ionizing radiation producing layer is bonded to the target side of a highly conductive diamond substrate, by a metal carbide layer. The metal carbide layers improves the strength and durability of the bond, thus improving heat removal from the anode surface and reducing the risk of delaminating the ionizing radiation producing layer, thus reducing degradation and extending the anode's life. A smoothing dopant is alloyed into the radiation producing layer to facilitate keeping the layer surface smooth, thus improving the quality of the x-ray beam emitted from the anode. In an embodiment, the heat sink comprises a metal carbide skeleton cemented diamond material. In another embodiment, the heat sink is bonded to the diamond substrate structure in a high temperature reactive brazing process.

Abstract: Systems and methods are disclosed for cleaning a chamber window of an extreme ultraviolet (EUV) light source. The window may have an inside surface facing a chamber interior and an opposed outside surface and the light source may generate debris by plasma formation. For the system, a subsystem may be positioned outside the chamber and may be operable to pass energy through the window to heat debris accumulating on the inside surface of the window. In a first embodiment, the subsystem may place a flowing, heated gas in contact with the outside surface of the window. In another embodiment, electromagnetic radiation may be passed through the window.

Abstract: An X-ray generator for generating plasma and X-ray emitted from the plasma includes a unit for generating the plasma, and plural reflection optical systems for introducing the X-ray through different optical paths.