Abstract: An EUV light source plasma source material handling system and method is disclosed which may comprise a droplet generator having a droplet generator plasma source material reservoir in fluid communication with a droplet formation capillary and maintained within a selected range of temperatures sufficient to keep the plasma source material in a liquid form; a plasma source material supply system having a supply reservoir in fluid communication with the droplet generator plasma source material reservoir and holding at least a replenishing amount of plasma source material in liquid form for transfer to the droplet generator plasma source material reservoir, while the droplet generator is on line; a transfer mechanism transferring liquid plasma source material from the supply reservoir to the droplet generator plasma source material reservoir, while the droplet generator is on line.

Abstract: The complex is intended for carrying out research in the X-ray range at several analytical devices 5 simultaneously. The complex comprises a source 1 of divergent X-rays, for example an X-ray tube and x-ray lenses 2 for radiation transporting toward the analytical devices 5 and the apparatus of these devices. The X-ray lenses 2 form the x-rays into quasi-parallel beams. Usage of the X-ray lenses provides for the scientists in the analytical devices the requisite brightness, being not less than in the complexes where the radiation source is a synchrotron.

Abstract: An exposure apparatus for projecting and transferring a pattern on a master onto a surface of a target exposure object by radiation exposure, including a radiation generating unit for generating radiation having a plurality of different wavelengths, and a wavelength selecting unit for selecting a wavelength of the radiation generated by the radiation generating unit. The wavelength selecting unit acquires information on the pattern on the master, and selects a wavelength on the basis of wavelength information or wavelength distribution information contained in the acquired information.

Abstract: According to a first embodiment of the invention, a dual cathode electrode for generating EUV light is disclosed. The dual cathode electrode may include a first outer cathode, a second inner cathode, and an anode disposed between the inner and outer cathodes. The dual cathode electrode also includes a plasma disposed in between the cathodes that emits EUV photons when it is excited by an arc between the anode and the cathodes. According to a second embodiment of the invention, several Dense Plasma Focus (DPF) electrodes are placed along a circle. The DPF electrodes, when activated, will emit electron photons from the circle in which they are placed thereby avoiding obscuration used to protect UV mirrors against debris.

Abstract: A multiple energy x-ray source capable of rapidly generating and delivering x-rays in the form of successive pulses that alternate between at least two different energy levels, as well as a multiple energy x-ray inspection apparatus for inspecting moving objects that employs such a multiple energy x-ray source, are provided. The inventive x-ray source facilitates the use of differential absorption characteristics as a means for distinguishing materials contained within objects during a moving inspection.

Abstract: An x-ray emitting window is formed at a front end face, and a taper surface tilted with respect to the x-ray emitting direction is formed near the emitting window, whereby an object to be inspected can be prevented from abutting against the front end face even if the object is pivoted about an axis intersecting the emitting direction while the object is disposed closer to the x-ray emitting window. As a consequence, while the object is disposed closer to the x-ray emitting position, the orientation of the object can be changed. Therefore, when inspecting the internal structure of the object and the like by irradiating the object with x-rays and detecting the x-rays transmitted through the object, not only a magnified penetration image of the object with a high magnification rate is obtained, but also the internal structure of the object and the like can be verified in detail by changing the orientation of the object.

Abstract: The EUV radiation source of the invention comprises an irradiation chamber (1) containing an irradiation zone (3) into which a stream of radiation-generator material is generated such as a flow of xenon propagating along a direction (II—II) extending transversely relative to an optical axis (I—I). The irradiation zone (3) is in the proximity of a diaphragm (4) oriented on the optical axis (I—I) and putting the irradiation chamber (1) into communication with a transmission chamber (2). Power laser beams (5, 6) strike the stream of radiation-generator material in the irradiation zone (3) and produce EUV radiation which propagates through the diaphragm (4) and which is conditioned in the transmission chamber (2) by elliptical mirrors (13). Differential pumps (11, 12) maintain a pressure P2 in the transmission chamber (2) that is well below the pressure P1 in the irradiation chamber (1).

Abstract: Metallic solutions at room temperature used a laser point source target droplets. Using the target metallic solutions results in damage free use to surrounding optical components since no debris are formed. The metallic solutions can produce plasma emissions in the X-rays, XUV, and EUV(extreme ultra violet) spectral ranges of approximately 11.7 nm and 13 nm. The metallic solutions can include molecular liquids or mixtures of elemental and molecular liquids, such as metallic chloride solutions, metallic bromide solutions, metallic sulphate solutions, metallic nitrate solutions, and organo-metallic solutions. The metallic solutions do not need to be heated since they are in a solution form at room temperatures.

Abstract: An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site.

Abstract: An electron emitter assembly and a method for adjusting a power level of an electron beam are provided. The electron emitter assembly includes a laser configured to emit a first light beam. The electron emitter assembly further includes a light-attenuating device configured to receive the first light beam and to attenuate the first light beam between a first light intensity and a second light intensity greater than the first light intensity. The electron emitter assembly further includes a photo-cathode configured to receive the first light beam from the light-attenuating device. The photo-cathode is further configured to emit a first electron beam having a first power level in response to receiving the first light beam having the first light intensity. The photo-cathode is further configured to emit a second electron beam having a second power level greater than the first power level in response to receiving the first light beam having the second light intensity.

Abstract: An invention related to an X-ray device for the generation of brief X-ray pulses comprising an X-ray tube having a thermionic cathode and an anode and an X-ray generator having a first circuit for the generation of a high-voltage pulse which is applied to the anode for the generation of the X-ray pulse. The X-ray generator further comprising a second circuit by which a low voltage is continuously applied to the anode which pre-heats the X-ray tube and is at most sufficient for the generation of low-energy X-radiation. The first circuit can have a high-voltage power supply unit which charges a high-voltage capacitor which can be applied to the anode via a high-voltage switch. The first circuit can be a Marx generator. There may be only one power supply, which both generates the continuously low voltage and also drives the Marx generator for the generation of the high voltage.

Abstract: The present invention is directed to an air-cooled radiographic apparatus, and its method of manufacture, that utilizes a single integral housing for providing an evacuated envelope for an anode and cathode assembly. The integral housing is preferably formed from a substrate material that has a radiation shielding layer comprising a powder metal that is deposited with a plasma spray process. The powder metal includes, for example, tungsten and iron, so that the radiation shield layer provides sufficient radiation blocking and heat transfer characteristics such that an additional external housing is not required. In one alternative embodiment, the integral housing is composed of a solidified, integrated mixture of metallic powders that function together as both the integral housing wall and the radiation shielding. In another alternative embodiment, chromium is intermixed into the mixture of metallic powders to form a thermally emissive surface upon firing the housing in a wet hydrogen environment.

Abstract: A light source device which has small etendue so that high power can be drawn out and which is subject to less damage by debris. The light source device for generating extreme ultra violet light by irradiating a target with a laser beam, includes a target supply unit for supplying a material which becomes the target; a laser unit including an oscillation stage laser having a lower-order transverse mode and at least one amplification stage laser for amplifying a lower-order transverse mode laser beam generated by the oscillation stage laser, for irradiating the target with the amplified laser beam to generate plasma; and a collection optical system for collecting the extreme ultra violet light emitted from the plasma to output the collected extreme ultra violet light.

Abstract: A source of extreme ultraviolet or soft X-ray photon source includes discharge chamber containing a buffer gas, first and second electrodes in the discharge chamber configured to deliver a heating current to a plasma discharge region, and an injector to project a particle of a working substance into the plasma discharge region. The particle is evaporated and ionized by the heating current to form a hot plasma that radiates extreme ultraviolet or soft X-ray photons.

Abstract: Briefly in accordance with one embodiment, the present technique provides an X-ray source. The X-ray source includes an electron source configured to generate an electron beam. The X-ray source also includes an ultra-violet photon source configured to generate one or more mono-energetic streams of ultra-violet photons. The X-ray source further includes an interaction region configured to facilitate interaction of the electron beam and the one or more mono-energetic streams of ultra-violet photons to generate X-rays having a substantially monochromatic or multimodal distribution.

Abstract: Some embodiments include a ring anode to emit radiation, and a conical monochromator to monochromatize the emitted radiation. According to some aspects, an outer diameter of the ring anode is greater than an outer diameter of a base of the monochromator.

Abstract: An extreme ultraviolet light source device which makes it possible to increase a working distance and obtain extreme ultraviolet light with a high output. The extreme ultraviolet light source device generates a plasma by irradiating a target (22) with laser light from a driving laser device (25), and generates extreme ultraviolet (EUV) light with a wavelength of several nanometers to several tens of nanometers. The extreme ultraviolet light source device comprises a target supply device which has a charge applying unit (23) that applies a charge to the target (22), and an acceleration unit (24) which accelerates the charged target (22) using an electromagnetic field. The target supply device supplies the target (22) comprised of a rare gas element such as xenon (Xe) or the like, or a metal such as lithium (Li), tin (Sn), tin oxide (SnO2) or the like, as ionized molecules, atoms or masses comprising a plurality of atoms, or as ionized clusters.

Abstract: A lithographic projection apparatus for EUV lithography includes a foil trap, or channel barrier. The foil trap forms an open structure after the source to let the radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse transverse to the direction of propagation of the radiation can be transferred on debris present in the beam. This debris will not pass the foil trap. In this way, the amount of debris on the optical components downstream of the foil trap is reduced. The foil trap may be alternately rotated around the optical axis in a first direction and a second direction opposite the first direction.

Abstract: A microfocus X-ray tube is provided, and comprises a head that during operation of the X-ray tube faces an object that is to be inspected. The head has an outer surface with a cross-section that tapers toward a free end of the head. A target is disposed on or in the head. A mechanism is provided for forming an electron beam adapted to bombard the target, and forms the electron beam such that the X-ray tube has a focus with a diameter of ?200 ?m. The target has an outer surface with a cross-section that tapers toward an end of the target that during the operation of the X-ray tube faces an object that is to be inspected. A collimator can be provided for the target and also has an outer surface with a cross-section that tapers toward an end of the collimator that during operation of the X-ray tube faces an object that is to be inspected.

Abstract: An object of the invention is to provide a high-resolution transmission type X-ray tube. With an X-ray imaging device according to the present invention, electron lens forming part 100A includes a central axis part 131, which is formed at the interior of a yoke 130, and an outer peripheral part 133, which defines the outer periphery of yoke 130. A part of a front end part 135 of central axis part 131 becomes a magnetic pole 110 that is positioned at the side of an electron gun. A first opening 111 is defined by magnetic pole 110. A part of a front end part 137 of outer peripheral part 133 becomes a magnetic pole 120 that is positioned at the side of a target 300. A second opening 121 is defined by magnetic pole 120. The value of diameter d2 of second opening 121 is greater than the value of diameter d1 of first opening 111.

Abstract: A system for generating images by using monochromatic x-rays is described. The system includes an accelerator configured to increase energy of an electron beam, at least one detector element configured to receive x-rays having multiple energies generated by interaction of the electron beam with at least one laser beam, and an image reconstructor configured to reconstruct at least one image by processing the x-rays.

Abstract: A method and an apparatus for generating X-rays in which continuous X-rays can be generated by irradiating a focused laser in the air using a liquid as a target, thereby generating plasma. A high concentration electrolyte aqueous solution, such as CsCl and RbCl, is circulated by means of a pump (2) and the surface of a jet of high concentration electrolyte aqueous solution injected from a glass nozzle (3) is exposed to an irradiation of focused femtosecond laser pulse (6) via an objective lens (7), thereby generating X-ray pulses.

Abstract: A Laminography system with x-ray source and a detector assembly. The x-ray source uses a narrow, deflected pencil beam to scan to a linear target. An x-ray cone beam detected by the detector assembly is produced where the electron beam strikes the target. The target is a layer of high-emitting material that is partitioned with narrow regions of low-emitting material, where the low flux intensity is sufficiently low to be easily distinguished from the flux intensity of the high-emitting material. The target may be constructed as a discontinuous layer of high-emitting material applied to a substrate of low-emitting material, or as strips of low-emitting material applied to a continuous layer of high-emitting material.

Abstract: The invention provides a system for generating X-rays via the process of inverse Compton scattering. The system includes a high repetition rate laser adapted to direct high-energy optical pulses in a first direction in a laser cavity and a source of pulsed electron beam adapted to direct electron beam in a second direction opposite to the first direction in the laser cavity. The electron beam interacts with photons in the optical pulses in the laser cavity to produce X-rays in the second direction.

Abstract: The present invention discloses an X-ray source comprising an X-ray tube including a target generating an X-ray in response to an electron beam incident thereon emitted from an electron gun and an X-ray exit window emitting thus generated X-ray; a power supply having a structure including an insulating block molding therein a voltage generating part supplying a voltage to the X-ray tube; a first planar member securing the X-ray tube while being arranged on one side of the insulating block; and a second planar member disposed on a side of the insulating block opposite from the first planar member. The first and second planar members are fastened to each other while holding the insulating block therebetween.

Abstract: Plasma discharge sources for generating emissions in the VUV, EUV and X-ray spectral regions. Embodiments can include running a current through liquid jet streams within space to initiate plasma discharges. Additional embodiments can include liquid droplets within the space to initiate plasma discharges. One embodiment can form a substantially cylindrical plasma sheath. Another embodiment can form a substantially conical plasma sheath. Another embodiment can form bright spherical light emission from a cross-over of linear expanding plasmas. All the embodiments can generate light emitting plasmas within a space by applying voltage to electrodes adjacent to the space. All the radiative emissions are characteristic of the materials comprising the liquid jet streams or liquid droplets.

Abstract: The invention is directed to an arrangement for generating intensive radiation based on a plasma, particularly short-wavelength radiation from soft x-ray radiation to extreme ultraviolet (EUV) radiation. The object of the invention is to find a novel possibility for generating radiation generated from plasma in which the individual pulse energy coupled into the plasma and, therefore, the usable radiation output are appreciably increased while retaining the advantages of mass-limited targets. According to the invention, this object is met in that the target generator has a multiple-channel nozzle with a plurality of separate orifices, wherein the orifices generate a plurality of target jets, the excitation radiation for generating plasma being directed simultaneously portion by portion to the target jets.

Abstract: A miniature x-ray tube capable of intra vascular use, has a micro cathode preferably formed by MEMS techniques. The very fine wire of the cathode filament is formed on a semiconductor base and draws a current sufficiently low that lead wires in a cathode heater circuit, passing through a probe line connected to the x-ray tube, can be very small wires, which helps maintain sufficient dielectric spacing in the high voltage circuit handled by the same probe line. In a preferred embodiment the probe line comprises a glass fiber, held at a small diameter to allow flexibility for navigating small-radius turns within the vessels. In a preferred embodiment the fiber is overcoated with a high-dielectric polymer to significantly increase the dielectric strength of the overall cable, without adding significantly to stiffness. The high voltage ground conductor is a coaxial sheath on the outside of the polymer. Exterior to the ground conductor is a further flexible layer having paths for coolant.

Abstract: The present invention provides apparatus and method for providing a stabilized x-ray output from a field emission x-ray apparatus by monitoring the operating current and adjusting the gap between the anode and cathode to stabilize the output.

Abstract: A slotted window collector assembly for an x-ray tube having an anode and a cathode includes a collector having an anode side and a cathode side, which opposes the anode side. The anode side and the cathode side define an internal bore there between for receiving x-rays from the anode. The slotted collector further includes a window side common to both the anode side and the cathode side and having a window coupled thereto, wherein a window aperture is defined extending from the window to the internal bore. Within the collector assembly, a slot is defined intersecting the window aperture and extending trans-axially thereto and beyond a set length. The slot also extends circumferentially with the window such that plastic strain on the window and heat transferred to the window are reduced.

Abstract: A flat panel x-ray tube assembly is provided comprising a cathode assembly including a plurality of emitter elements. An anode substrate is included having a substrate upper surface facing the plurality of emitter elements and a substrate lower surface. The substrate upper surface is positioned parallel to the plurality of emitter elements. A plurality of target wells are formed in the substrate upper surface. Each of the plurality of target wells comprises a first angled side surface positioned at an acute angle relative to the substrate upper surface. A plurality of first target elements is applied to each to one of the first angled side surfaces. The first target elements generate x-rays in a direction perpendicular to the plurality of emitter elements in response to electrons received from one of the plurality of emitter elements.

Abstract: The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.

Abstract: An EUV radiation source that employs a low energy laser pre-pulse and a high energy laser main pulse. The pre-pulse generates a weak plasma in the target area that improves laser absorption of the main laser pulse to improve EUV radiation emissions. High energy ion flux is reduced by collisions in the localized target vapor cloud generated by the pre-pulse. Also, the low energy pre-pulse arrives at the target area 20–200 ns before the main pulse for maximum output intensity. The timing between the pre-pulse and the main pulse can be reduced below 160 ns to provide a lower intensity of the EUV radiation. In one embodiment, the pre-pulse is split from the main pulse by a suitable beam splitter having the proper beam intensity ratio, and the main pulse is delayed to arrive at the target area after the pre-pulse.

Abstract: In a method for generating extreme ultraviolet radiation or soft x-ray radiation by means of gas discharge, in particular, for EUV lithography, a discharge vessel is provided with two electrodes that are connected to high voltage. Between the electrodes, in an area of two electrode recesses that are coaxial to one another, a gas fill with predetermined gas pressure in accordance with a discharge operation realized on the left branch of the Paschen curve is provided. In this area, a plasma emitting the radiation is generated when supplying energy. The plasma is displaced or deformed by a pressure change of the gas fill in the area of the electrode recesses.

Abstract: A method of at least partially compensating for an x-ray tube target angle heel effect includes positioning a filter having an anode side and a cathode side between an x-ray source and an x-ray detector, wherein the cathode side has a higher attenuation coefficient than the anode side, to at least partially compensate for the target angle heel effect.

Abstract: A UV light source in which Xenon (Xe) gas is mixed with a substance which, in the temperature range in which 10-valent Xe ions (Xe10+) occur, emits a number of free electrons from a molecule or an atom that at least half the number of electrons which are released from a Xe atom, and which at room temperature is molecular or atomic (for example Ar, Kr, Ne, N2 and NH3). A high voltage is applied in a pulse-like manner to the electrode on the ground side and the electrode on the high voltage side to produce a plasma with a high temperature and from which extreme UV light with a wavelength of 13.5 nm is formed and emitted. The invention can also be used an extreme UV light source of the capillary, plasma focus, and Z pinch types for example.

Abstract: Numerous embodiments of a debris mitigation device are disclosed. One embodiment of the claimed subject matter may comprise a debris mitigation device for use in photolithography processes. In one embodiment, the debris mitigation device comprises a foil trap device. The foil trap device, in this embodiment, comprises a plurality of electrically conductive elements and one or more mounting devices, where the plurality of electrically conductive elements are coupled to the one or more mounting devices in such as way as to provide a space between one or more adjacent elements. In this embodiment, the elements are foil elements, and adjacent foil elements carry alternating potentials.

Abstract: The invention relates to a device for generating X-rays (31). The device has a source (5) for emitting electrons (27) accommodated in a vacuum space (3). The X-rays are emitted by a liquid metal as a result of the incidence of the electrons. The liquid metal flows through a constriction (13) where the electrons emitted by the source impinge upon the liquid metal. The constriction is bounded by a thin window (23), which is made from a material which is transparent to electrons and X-rays and which separates the liquid metal in the constriction from the vacuum space, and by a wall (25) opposite to the window. According to the invention, the wall (25) has a profile (p) which matches a profile (p?) which the window (23) has, during operation, as a result of a deformation of the window caused by a pressure of the liquid metal in the constriction (13).

Abstract: An oil-free electron source including a vacuum chamber within which a vacuum is maintained. A rigid insulated receptacle and an anode extend into the vacuum chamber and are mounted to opposite ends of the housing. A cathode-focus electrode assembly is mounted to an outer end of the receptacle and is suspended within the vacuum chamber by the receptacle. A high voltage connector is inserted into the receptacle and conveys voltage in an oil-free environment. The cathode and anode surfaces face each other and are aligned with respect to each other along an electron beam axis. The electron source may be provided within an electron beam scanner including a patient table, an x-ray source and detector obtaining x-ray scans of a patient, and a focus member directing an electron beam onto the x-ray source.

Abstract: A radiation source unit is provided that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a space between said anode and cathode and to form a plasma so as to generate electromagnetic radiation. The substance may comprise xenon, indium, lithium, tin or any suitable material. To improve conversion efficiency, the source unit may be constructed to have a low inductance, and operated with a minimum of plasma. To, for example, improve heat dissipation, a fluid circulation system can be created within the source volume and a wick by using a fluid in both its vapor and liquid states. To, for example, prevent contamination from entering a lithographic projection apparatus, the source unit can be constructed to minimize the production of contamination, and a trap can be employed to capture the contamination without interfering with the emitted radiation.

Abstract: An EUV radiation source (40) that includes a nozzle (42) positioned a far enough distance away from a target region (50) so that EUV radiation (56) generated at the target region (50) by a laser beam (54) impinging a target stream (46) emitted from the nozzle (42) is not significantly absorbed by target vapor proximate the nozzle (42). Also, the EUV radiation (56) does not significantly erode the nozzle (42) and contaminate source optics (34). In one embodiment, the nozzle (42) is more than 10 cm away from the target region (50).

Abstract: The present invention relates to a high-energy X-ray imaging device that is suitable for precise medical diagnosis and capable of enhancing the accuracy of nondestructive examinations. The high-energy X-ray imaging device of the present invention includes an electron-circulating type high luminance X-ray generator and a two-dimensional X-ray detector that is sensitized for high-energy X-rays. The electron-circulating type X-ray generating device consists of a tinytarget together with a LINAC or microtron injector and a synchrotron. The synchrotron stores electrons, and electrons are bombarded against a tinytarget placed on the electron orbit to generate high-energy X-rays. The means to sensitize the two-dimensional X-ray detectors consists of a thin film made of lead or other heavy elements. This thin film is placed in front of and in close contact with the two-dimensional detector, such as X-ray film. The X-ray image thus generated is a transmissive image.

Abstract: The invention relates to a device (1) for generating X-rays (57). The device comprises a source (7) for emitting electrons (53) and a liquid metal for emitting X-rays as a result of the incidence of electrons. The device further comprises a displacing member (11) for displacing the liquid metal through an impingement position (55) where the electrons emitted by the source impinge upon the liquid metal. As a result of the flow of liquid metal through the impingement position the heat, which is generated in the impingement position as a result of the incidence of the electrons upon the liquid metal, is transported away from the impingement position. According to the invention, the displacing member (11) has a contact surface (61), which is in contact with the liquid metal in the impingement position (55), and a driving member (31) for moving the contact surface in a direction which, in the impingement position, is substantially parallel to the contact surface.

Abstract: An HV connector for high power X-ray device consists of thermally conductive epoxy, cable terminal, faraday cup, spring-loaded contact, and lead lined housing. The thermally conductive epoxy includes fillers. The epoxy can also be loaded with gravels of similar materials. A Faraday cup is included in the center area to offer electric field relief. Spring-loaded contacts are included for the easiness of pin alignment and robustness of handling. An efficient thermal management solution is accomplished through proper selection of thermal conductivities of gasket and epoxy.

Abstract: A therapeutic radiation source includes an in situ radiation detecting system for monitoring in real time an amount of the therapeutic radiation that has been generated. An electron source generates electrons in response to light that is transmitted through a fiber optic cable and impinges upon the electron source. The electrons are accelerated toward the target and strike the target, causing the target to emit therapeutic radiation, such as x-rays. A scintillator is disposed along a path of a portion of the emitted therapeutic radiation, and generates scintillator light corresponding to the intensity of the therapeutic radiation that is incident upon the scintillator. A photodetector in optical communication with the scintillator produces a signal indicative of the intensity of the therapeutic radiation incident upon the scintillator.

Abstract: An apparatus for emitting x-rays comprises a housing which contains an anode having an electron receiving surface and a cathode having an electron emitting surface. A cable couples the anode to a source of high voltage. An optical fiber secured to the cable has a proximal end coupled to a source of optical energy and a distal end configured to direct the optical energy onto the cathode's electron emitting surface. The cathode emits electrons which strike the anode to create x-ray radiation.

Abstract: A laser-plasma EUV radiation source (10) that employs one or more approaches for preventing vaporization of material from a nozzle assembly (40) of the source (10) by electrical discharge from the plasma (30). The first approach includes employing an electrically isolating nozzle end, such as a glass capillary tube (46). The tube (46) extends beyond all of the conductive surfaces of the nozzle assembly (40) by a suitable distance so that the pressure around the closest conducting portion of the nozzle assembly (40) is low enough not to support arcing. A second approach includes providing electrical isolation of the conductive portions of the source (40) from the vacuum chamber wall. A third approach includes applying a bias potential (52) to the nozzle assembly (40) to raise the potential of the nozzle assembly (40) to the potential of the arc.

Abstract: An imaging tube (52, 52?) includes a vacuum vessel (96) and an atmospheric-side supply line assembly (104, 104?). The vacuum vessel (96) has an internal vacuum (98). The supply line assembly (104, 104?) has an electromagnetic shield (94, 94?). An insulator (106, 106?) separates the internal vacuum (98) from an external atmosphere (126). A cathode post (92, 92?) resides within the vacuum vessel (96). The cathode post (92, 92?) is in conductive proximity with the electromagnetic shield (94, 94?) and prevents the bending of electrostatic field lines within the imaging tube (52, 52?).

Abstract: The invention is directed to a method and an arrangement for generating extreme ultraviolet (EUV) radiation, i.e., radiation of high-energy photons in the wavelength range from 11 to 14 nm, based on a gas discharge. The object of the invention, to find a novel possibility for generating EUV radiation in which an extended life of the system is achieved with stable generation of a dense, hot plasma column, is met according to the invention in that a preionization discharge is ignited between two parallel disk-shaped flat electrodes prior to the main discharge by a surface discharge along the superficies surface of a cylindrical insulator with a plasma column generated through the gas discharge with pulsed direct voltage, which preionization discharge carries out an ionization of the working gas in the discharge chamber by means of fast charged particles.

Abstract: Method and apparatus for mitigating the transport of debris generated and dispersed from electric discharge sources by thermophoretic and electrostatic deposition. A member is positioned adjacent the front electrode of an electric discharge source and used to establish a temperature difference between it and the front electrode. By flowing a gas between the member and the front electrode a temperature gradient is established that can be used for thermophoretic deposition of particulate debris on either the member or front electrode depending upon the direction of the thermal gradient. Establishing an electric field between the member and front electrode can aid in particle deposition by electrostatic deposition.