Abstract: The invention is directed to a radiation source for generating extreme ultraviolet (EUV) radiation, particularly for photolithography exposure processes. The object of the invention is to find a novel possibility for realizing radiation sources for generating extreme ultraviolet (EUV) radiation which permits a uniform basic construction for ensuring beam characteristics that are reproducible over the long term and in which the source is conceived so as to be flexible with respect to specific applications.

Abstract: The invention is directed to an arrangement for the suppression of particle emission in the generation of radiation based on hot plasma in x-ray radiation sources, particularly EUV radiation sources.

Abstract: A structure to generate x-rays has a plurality of stationary and individually electrically addressable field emissive electron sources with a substrate composed of a field emissive material, such as carbon nanotubes. Electrically switching the field emissive electron sources at a predetermined frequency field emits electrons in a programmable sequence toward an incidence point on a target. The generated x-rays correspond in frequency and in position to that of the field emissive electron source. The large-area target and array or matrix of emitters can image objects from different positions and/or angles without moving the object or the structure and can produce a three dimensional image. The x-ray system is suitable for a variety of applications including industrial inspection/quality control, analytical instrumentation, security systems such as airport security inspection systems, and medical imaging, such as computed tomography.

Abstract: An EUV radiation source that creates a stable solid target filament. The source includes a nozzle assembly having a condenser chamber for cryogenically cooling a gaseous target material into a liquid state. The liquid target material is forced through an orifice of a target filament generator into an evaporation chamber as a liquid target stream. The evaporation chamber has a higher pressure than a vacuum process chamber of the source to allow the liquid target material to freeze into a target filament in a stable manner. The frozen target filament is emitted from the evaporation chamber into the process chamber as a stable target filament towards a target area. The higher pressure in the evaporation chamber can be the result of the evaporative cooling of the target material alone or in combination with a supplemental gas.

Abstract: Special liquid droplet targets that are irradiated by a high power laser and are plasmarized to form a point source EUV, XUV and x-ray source. Various types of liquid droplet targets include metallic solutions, and nano-sized particles in solutions having a melting temperature lower than the melting temperature of some or all of the constituent metals, used a laser point source target droplets. The solutions have no damaging debris and can produce plasma emissions in the X-rays, XUV, and EUV(extreme ultra violet) spectral ranges of approximately 0.1 nm to approximately 100 nm, approximately 11.7 nm and 13 nm, approximately 0.5 nm to approximately 1.5 nm, and approximately 2.3 nm to approximately 4.5 nm. The second type of target consists of various types of liquids which contain as a miscible fluid various nano-size particles of different types of metals and non-metal materials.

Abstract: Special liquid droplet targets that are irradiated by a high power laser and are plasmarized to form a point source EUV, XUV and x-ray source. Various types of liquid droplet targets include metallic solutions, and nano-sized particles in solutions having a melting temperature lower than the melting temperature of some or all of the constituent metals, used a laser point source target droplets. The solutions have no damaging debris and can produce plasma emissions in the X-rays, XUV, and EUV(extreme ultra violet) spectral ranges of approximately 0.1 nm to approximately 100 nm, approximately 11.7 nm and 13 nm, approximately 0.5 nm to approximately 1.5 nm, and approximately 2.3 nm to approximately 4.5 nm. The second type of target consists of various types of liquids which contain as a miscible fluid various nano-size particles of different types of metals and non-metal materials.

Abstract: An x-ray emitting window is formed at a front end face, and a taper surface tilted with respect to the x-ray emitting direction is formed near the emitting window, whereby an object to be inspected can be prevented from abutting against the front end face even if the object is pivoted about an axis intersecting the emitting direction while the object is disposed closer to the x-ray emitting window. As a consequence, while the object is disposed closer to the x-ray emitting position, the orientation of the object can be changed. Therefore, when inspecting the internal structure of the object and the like by irradiating the object with x-rays and detecting the x-rays transmitted through the object, not only a magnified penetration image of the object with a high magnification rate is obtained, but also the internal structure of the object and the like can be verified in detail by changing the orientation of the object.

Abstract: A laser-plasma, EUV radiation source (10) that controls the target droplet delivery rate so that successive target droplets (66, 72) are not affected by the ionization of a preceding target droplet. A source nozzle (50) of the source (10) has an orifice (56) of a predetermined size that allows the droplets (54) to be emitted at a rate set by the target materials natural Rayleigh instability break-up frequency as generated by a piezoelectric transducer (58). The rate of the droplet generation is determined by these factors in connection with the pulse frequency of the excitation laser (14) so that buffer droplets (70) are delivered between the target droplets (66, 72). The buffer droplets (70) act to absorb radiation generated from the ionized target droplet (66) so that the next target droplet (72) is not affected.

Abstract: An x-ray generating device includes a field emission cathode formed at least partially from a nanostructure-containing material having an emitted electron current density of at least 4 A/cm2. High energy conversion efficiency and compact design are achieved due to easy focusing of cold cathode emitted electrons and dramatic reduction of heating at the anode. In addition, by pulsing the field between the cathode and the gate or anode and focusing the electron beams at different anode materials, pulsed x-ray radiation with varying energy can be generated from a single device.

Abstract: A system and method for delivering radiation that comprises a source for creating an electron beam, a system that focuses the electron beam and then deflects the beam such that the beam is swept across a first target as an arbitrary pattern. The arbitrary pattern on the first target is given an additional intensity modulation. Thereafter, a lens focuses the arbitrary pattern of electrons from the first target onto a second target.

Abstract: Some embodiments include a ring anode to emit radiation, and a conical monochromator to monochromatize the emitted radiation. According to some aspects, an outer diameter of the ring anode is greater than an outer diameter of a base of the monochromator.

Abstract: An EUV radiation source that creates a stable solid filament target. The source includes a nozzle assembly having a condenser chamber for cryogenically cooling a gaseous target material into a liquid state. The liquid target material is filtered by a filter and sent to a holding chamber under pressure. The holding chamber allows entrained gas bubbles in the target material to be condensed into liquid prior to the filament target being emitted from the nozzle assembly. The target material is forced through a nozzle outlet tube to be emitted from the nozzle assembly as a liquid target stream. A thermal shield is provided around the outlet tube to maintain the liquid target material in the cryogenic state. The liquid target stream freezes and is vaporized by a laser beam from a laser source to generate the EUV radiation.

Abstract: Metallic solutions at room temperature used a laser point source target droplets. Using the target metallic solutions results in damage free use to surrounding optical components since no debris are formed. The metallic solutions can produce plasma emissions in the X-rays, XUV, and EUV (extreme ultra violet) spectral ranges of approximately 11.7 nm and 13 nm. The metallic solutions can include molecular liquids or mixtures of elemental and molecular liquids, such as metallic chloride solutions, metallic bromide solutions, metallic sulphate solutions, metallic nitrate solutions, and organo-metallic solutions. The metallic solutions do not need to be heated since they are in a solution form at room temperatures.

Abstract: An x-ray source (32) for performing energy discrimination within an imaging system (10) includes a cathode-emitting device (82) emitting electrons and an anode (81) that has a target (80) whereupon the electrons impinge to generate an x-ray beam (93) with multiple x-ray quantity energy peaks (116 and 120). A method of performing energy discrimination in the imaging system (10) includes emitting the electrons. The x-ray beam (93) with the x-ray quantity energy peaks (116 and 120) is generated. The x-ray beam (93) is directed through an object (44) and is received. An x-ray image having multiple energy differentiable characteristics is generated in response to the x-ray beam (93).

Abstract: A target cap for preventing the production of contaminating secondary x-rays from a stationary anode x-ray tube is disclosed. The x-ray tube includes an evacuated enclosure in which is disposed a cathode and an anode. The target cap is useful in applications such as x-ray fluorescence spectroscopy for improving the spectral purity of the stream of primary x-rays produced by electron bombardment of the anode target surface by the cathode. In one embodiment, the target cap comprises a top target surface and a side wall covering a portion of the anode substrate. Electrons backscattered from the target surface are attracted to the anode substrate and impact the side wall of the target cap, producing secondary x-rays having characteristic wavelengths that are substantially identical to those of the primary x-rays produced by the target surface and are therefore not contaminating to the primary x-ray stream.

Abstract: A device for generating an x-ray point source includes a target, and an electron source for producing electrons which intersect with the target to generate an x-ray point source having a size which is confined by a dimension of the target.

Abstract: An x-ray treatment apparatus includes an x-ray generating device, a head unit, a manipulator and a microwave source. The x-ray generating device produces x-rays, by letting electrons, which have been emitted from an electron gun, be accelerated by a linear accelerator and strike a target. The acceleration of electrons is effected by microwaves. The x-ray generating device is accommodated in the head unit. The head unit is attached to a distal end portion of the manipulator. The manipulator positions the head unit such that x-rays emitted from the head unit may be applied to a part for medical treatment in a patient. The microwave source is disposed at a proximal end portion of the manipulator. Microwaves are propagated from the microwave source to the accelerator through a waveguide.

Abstract: A collector optic assembly for a EUV radiation source. The collector optic assembly includes an elliptical meniscus having a reflective Si/Mo coating for collecting and reflecting EUV radiation generated by the source. The meniscus is machined from a single piece of silicon. The collector optic assembly further includes a heat exchanger that includes cooling channels through which flows a liquid coolant. The heat exchanger is fabricated from a plurality of machined silicon sections fused together by a glass frit bonding process. The meniscus is fused to a front side of the heat exchanger by a glass frit bonding process. A liquid coolant inlet manifold and a liquid coolant outlet manifold are also each machined from a single silicon block and are mounted to a back side of the heat exchanger.

Abstract: The present invention provides a high flux X-ray source 100 comprising a sealed X-ray tube contained within an X-ray shield (101), an optic housing 103 containing a multi-layer optic for collecting and focussing X-rays generated in the sealed X-ray tube, and an X-ray beam conditioner 104. The multi-layer optic 103 is located at a predetermined distance from the sealed X-ray tube 101, with the optic housing 103 being adjustable relative to the sealed X-ray tube 101 and the beam conditioner 104 adjustable relative to the optic housing 103. The use of a multi-layer optic provides for the efficient collection and focussing of X-rays generated in a compact sealed tube and wavelength selectively enables it to act as a monochromator, providing a beam of X-rays with a predetermined range of photon energy.

Abstract: The present invention provides a high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. Preferably the electrodes are configured co-axially. The central electrode is preferably hollow and the active gas is introduced out of the hollow electrode. This permits an optimization of the spectral line source and a separate optimization of the buffer gas. In preferred embodiments the central electrode is pulsed with a high negative electrical pulse so that the central electrode functions as a hollow cathode.

Abstract: An apparatus is provided for delivering x-ray radiation to interior surface tissue of a body cavity. The apparatus comprises a flexible introducer guide having a distal end and a proximal end, the distal end for insertion into the body cavity. An inflatable balloon is mounted proximate the distal end of the flexible introducer guide and is selectively inflated to conform the balloon to the body cavity. A flexible x-ray catheter is configured for movement within the introducer guide, and an x-ray emitter is coupled to the distal end of the x-ray catheter for generating x-rays to irradiate the interior surface tissue. The x-ray emitter is also coupled to a source of high voltage. A controller is coupled to the x-ray emitter to control the area of irradiation and the dosage of radiation generated by the emitter.

Abstract: An apparatus for emitting x-rays comprises a housing which contains an anode having an electron receiving surface and a cathode having an electron emitting surface. A cable couples the anode to a source of high voltage. An optical fiber secured to the cable has a proximal end coupled to a source of optical energy and a distal end configured to direct the optical energy onto the cathode's electron emitting surface. The cathode emits electrons which strike the anode to create x-ray radiation.

Abstract: An x-ray tube having sensors, magnets, and/or active compensation means operatively coupled thereto or integrated therein for aligning its electron beam with an external magnetic field. Permanent magnets positioned behind the anode and cathode respectively or electromagnets are used to produce a strong, properly aligned internal magnetic field. The x-ray tube is thus less sensitive to other magnetic fields that are not parallel to the anode-cathode axis. The x-ray tube can be mounted in a manner that it can pivot, allowing it to move and align itself. The x-ray tube can also be mounted such that a torque can be sensed. This sensed mechanical force is then used as an input to determine current applied to electromagnetic coils arranged to oppose a transverse magnetic field.

Abstract: Erosion-resistive coatings are provided on critical plasma-facing surfaces of an electrical gas plasma head for an EUV source. The erosion-resistive coatings comprise diamond and diamond-like materials deposited onto the critical plasma-facing surfaces. A pure diamond coating is deposited onto the plasma exposed insulator surfaces using, for example, a chemical vapor deposition processes. The diamond coating is made conductive by selective doping with p-type material, such as, but not limited to, boron and graphite.

Abstract: Metallic solutions at room temperature used a laser point source target droplets. Using the target metallic solutions results in damage free use to surrounding optical components since no debris are formed. The metallic solutions can produce plasma emissions in the X-rays, XUV, and EUV(extreme ultra violet) spectral ranges of approximately 11.7 nm and 13 nm. The metallic solutions can include molecular liquids or mixtures of elemental and molecular liquids, such as metallic chloride solutions, metallic bromide solutions, metallic sulphate solutions, metallic nitrate solutions, and organo-metallic solutions. The metallic solutions do not need to be heated since they are in a solution form at room temperatures.

Abstract: An X-ray source to be introduced into the body vessels of a living being by means of a catheter is designed as a laser plasma X-ray source and is arranged in a housing, which has a diameter of a maximum of about 2 mm transversely to the direction from which the X-ray source is intended to be introduced into the body vessel. A catheter with such an X-ray source and a system for an intracorporeal X-ray source irradiation with such a catheter also are provided.

Abstract: The method and system herein pertain to an EUV photon source which includes a plasma chamber filled with a gas mixture, multiple electrodes within the plasma chamber defining a plasma region and a central axis, a power supply circuit connected to the electrodes for delivering a main pulse to the electrodes for energizing the plasma around the central axis to produce an EUV beam. The system can also include a preionizer for ionizing the gas mixture in preparing to form a dense plasma around the central axis upon application of the main pulse from the power supply circuit to the electrodes. A set of baffles may be disposed along the beam path outside of the pinch region to diffuse gaseous and contaminant particulate flow emanating from the pinch region and to absorb or reflect acoustic waves emanating from the pinch region away from the pinch region.

Abstract: An HV insulator system for a mono-polar X-ray device includes a top of an insulator including a substantially cone-shaped central portion. A bottom of the insulator defines a flat surface on which the HV contacts are adapted to receive spring loaded pins from HV connectors. A flanged outer edge of the top and bottom is adapted for coupling to an HV connector. The top defines an inverse cone central channel coaxial with the cone-shaped central portion and adapted to receive the HV conductor. The substantially cone-shaped portion further defines the inverse cone channel such that a base of the inverse cone channel is defined at a tapered apex of the substantially cone-shaped central portion.

Abstract: An EUV radiation source (50) that employs a steering device (74) for steering a stream (66) of droplets (68) generated by a droplet generator (52) so that the droplet (68) are directed towards a target location (76) to be vaporized by a laser beam (78). The direction of the stream (66) of droplets (68) is sensed by a sensing device (84). The sensing device (84) sends a signal to an actuator (88) that controls the orientation of the steering device (74) so that the droplets (68) are directed to the target location (76).

Abstract: The invention relates to a device for generating extreme ultraviolet and soft x-rays from a gas discharge, operated on the left-hand branch of the Paschen curve. There are two main electrodes, between which there is a gas-filled space, and each main electrode exhibits an opening, by means of which an axis of symmetry [(5)] is defined; and there are means to increase the conversion efficiency. Preferred fields of application are those requiring extreme ultraviolet (EUV) radiation or soft x-rays at a wavelength ranging from approximately 1 to 20 nm, and in particular around 13 nm, such as in EUV lithography.

Abstract: An insulator may be operable to electrically insulate a cathode from an anode in an extreme ultraviolet (EUV) source of an EUV lithography tool. The insulator may be made of an aluminosilicate or a SiN/SiC material. The extreme ultraviolet source may be operable to produce a plasma which emits extreme ultraviolet radiation.

Abstract: Special liquid droplet targets that are irradiated by a high power laser and are plasmarized to form a point source EUV, XUV and x-ray source. Various types of liquid droplet targets include metallic solutions, and nano-sized particles in solutions having a melting temperature lower than the melting temperature of some or all of the constituent metals, used a laser point source target droplets. The solutions have no damaging debris and can produce plasma emissions in the X-rays, XUV, and EUV(extreme ultra violet) spectral ranges of approximately 0.1 nm to approximately 100 nm, approximately 11.7 nm and 13 nm, approximately 0.5 nm to approximately 1.5 nm, and approximately 2.3 nm to approximately 4.5 nm. The second type of target consists of various types of liquids which contain as a miscible fluid various nano-size particles of different types of metals and non-metal materials.

Abstract: A miniature x-ray tube has an anode assembly capable of transmitting x-rays through the anode and over a wide angular range. The anode is in the shape of a cone or truncated cone with an axis on the x-ray tube frame axis, formed of low-Z material with high thermal conductivity for heat dissipation. A target material on the anode body is in a thin layer, which may be approximately 0.5 to 5 microns thick. In one embodiment a tube evacuation exhaust port at the tail end of the anode assembly forms a cavity for a getter, with a pinched-off tubulation at the end of the cavity.

Abstract: It is an object to provide an X-ray generating apparatus which permits easy alignment of an X-ray tube and easy insulation against high voltages. A screw through hole and pin through holes corresponding respectively to a screw hole and plural pin holes formed in an end face of a base portion of an X-ray tube are formed in an abutment face of a bracket against which the end face of the base portion of the X-ray tube comes into abutment, and a screw and plural pins are inserted respectively from the bracket side into the screw hole and plural pin holes in the X-ray tube through the screw through hole and the pin through holes, thereby mounting the X-ray tube to the bracket. The bracket is formed by an integral structure of FR 4.

Abstract: It is an X-ray generating apparatus having an X-ray shielding means superior in thermal conductivity. The X-ray generating apparatus comprises an X-ray tube, an X-ray tube container, and a support member which is constructed of an electrically insulating material and which supports the X-ray tube within the X-ray tube container, the X-ray tube container being constituted by a combination of copper alloy plates with lead incorporated therein and a plate of a composite material, the composite material being formed by laminating lead and epoxy laminated glass cloth sheets so as to include an intermediate layer of lead, the X-ray tube container having an aperture (for X-ray emission and containing the X-ray tube so as to prevent the emission of X-ray from any other portion than the aperture.

Abstract: X-ray generator devices and methods for operating the same that utilizes anodes comprising thin cylinders to generate characteristic X-ray spectra, which emerges from the cylinders axially, as an intense beam.

Abstract: An X-ray source comprises a cold cathode and an anode. The cold cathode has a curved emission surface capable of emitting electrons. The anode is spaced apart from the cathode. The anode is capable of emitting X-rays in response to being bombarded with electrons emitted from the curved emission surface of the cathode.

Abstract: An X-ray tube has a metal-ceramic envelope having rotatably mounted therein an anode disk, which may be axially translatable and provided with a peripheral rim surface wherein a focal track spiral groove (or multiple annular grooves) is disposed. The groove(s) include a focal spot(s) area spaced from an electron emitting cathode(s), which is associated with a beam-forming structure and an X-ray transparent window mounted within an insulating structure aligned with the focal spot area. The insulating structure incorporates a multiplicity of imbedded annular electrodes which control an accelerating electric field, and which are structurally and operationally integrated into a power-control assembly that provides the electrical power and control signals necessary for the functioning of the X-ray tube.

Abstract: A photolithography tool includes an anode and a cathode composed of a first material and a second material. The second material has a lower work function than the first material. Electrons emitted from the cathode ionize a gas into a plasma that generates EUV light. The EUV light is focused on a mask to produce an image of a circuit pattern. The image is projected on a semiconductor wafer to produce a circuit.

Abstract: In a method of generating X-ray or EUV radiation, a substance is urged through an outlet to generate a jet in a direction from the outlet, at least one energy beam is directed onto the jet, the energy beam interacting with the jet to generate the X-ray or EUV radiation, and the temperature of the outlet is controlled, such that the stability of the jet is improved. An apparatus is also disclosed.

Abstract: An X-ray source comprises a cold cathode and an anode. The cold cathode has a curved emission surface capable of emitting electrons. The anode is spaced apart from the cathode. The anode is capable of emitting X-rays in response to being bombarded with electrons emitted from the curved emission surface of the cathode.

Abstract: An electric discharge detection circuit includes an x-ray tube, a power supply that applies a high voltage to the x-ray tube, a tube voltage that detects the voltage applied to the x-ray tube, a differentiation circuit that differentiates a signal output from the tube voltage detector, a zero-crossing comparator that discriminates the polarity of an output signal from the differentiation circuit; a re-triggerable one-shot pulse generating circuit that generates one-shot pulses at a regular period, using the pulse output from zero-crossing comparator as the trigger, a counter that is input with the one-shot pulse output and counts the pulses to output from the zero-crossing comparator while operation is enabled period, an x-ray cut-off circuit that terminates the generation of high voltage when it receives the carry output and a display that displays the occurrence of an electric discharge phenomenon upon receipt of the carry output.

Abstract: Erosion-resistive coatings are provided on critical plasma-facing surfaces of an electrical gas plasma head for an EUV source. The erosion-resistive coatings comprise diamond and diamond-like materials deposited onto the critical plasma-facing surfaces. A pure diamond coating is deposited onto the plasma exposed insulator surfaces using, for example, a chemical vapor deposition processes. The diamond coating is made conductive by selective doping with p-type material, such as, but not limited to, boron and graphite.

Abstract: An EUV radiation source that creates a stable solid target filament. The source includes a nozzle assembly having a condenser chamber for cryogenically cooling a gaseous target material into a liquid state. The liquid target material is forced through an orifice of a target filament generator into an evaporation chamber as a liquid target stream. The evaporation chamber has a higher pressure than a vacuum process chamber of the source to allow the liquid target material to freeze into a target filament in a stable manner. The frozen target filament is emitted from the evaporation chamber into the process chamber as a stable target filament towards a target area. The higher pressure in the evaporation chamber can be the result of the evaporative cooling of the target material alone or in combination with a supplemental gas.

Abstract: An EUV radiation source (12) that generates a sheet (36) of a liquid target material that has a width that matches the desired laser spot size (28) for good conversion efficiency and a thickness that matches the laser beam/target interaction depth. The EUV source (12) includes a reservoir (10) containing a pressurized cryogenic liquid target material, such as liquid Xenon. The reservoir (10) also includes an array (14) of closely spaced orifices (16). The liquid target material is forced through the orifices (16) into a vacuum chamber as separated liquid stream filaments (20) of the target material that define the sheet (36). The liquid streams freeze to form an array of frozen target filaments (20). A laser beam (24) is directed to a target area (28) in the vacuum chamber where it irradiates the stream of filaments (20) to create a plasma (30) that emits EUV radiation (32).

Abstract: Numerous embodiments of a debris mitigation device are disclosed. One embodiment of the claimed subject matter may comprise a debris mitigation device for use in photolithography processes. In one embodiment, the debris mitigation device comprises a foil trap device. The foil trap device, in this embodiment, comprises a plurality of electrically conductive elements and one or more mounting devices, where the plurality of electrically conductive elements are coupled to the one or more mounting devices in such as way as to provide a space between one or more adjacent elements. In this embodiment, the elements are foil elements, and adjacent foil elements carry alternating potentials.

Abstract: A target material delivery system in the form of a nozzle (50) for an EUV radiation source (10). The nozzle (50) includes a target material supply line (66) having an orifice (68) through which droplets (76) of a liquid target material (64) are emitted, where the droplets (76) have a predetermined size, speed and spacing therebetween. The droplets (76) are mixed with a carrier gas (74) in a mixing chamber (54) enclosing the target material chamber (60) and the mixture of the droplets (76) and the carrier gas (74) enter a drift tube (56) from the mixing chamber (54). The droplets (76) are emitted into an accelerator chamber (124) from the drift tube (56) where the speed of the droplets (76) is increased to control the spacing therebetween. A vapor extractor (90) can be mounted to the accelerator chamber (124) or the drift tube (56) to remove the carrier gas (74) and target material vapor, which would otherwise adversely affect the EUV radiation generation.

Abstract: An oil-free electron source including a vacuum chamber within which a vacuum is maintained. A rigid insulated receptacle and an anode extend into the vacuum chamber and are mounted to opposite ends of the housing. A cathode-focus electrode assembly is mounted to an outer end of the receptacle and is suspended within the vacuum chamber by the receptacle. A high voltage connector is inserted into the receptacle and conveys voltage in an oil-free environment. The cathode and anode surfaces face each other and are aligned with respect to each other along an electron beam axis. The electron source may be provided within an electron beam scanner including a patient table, an x-ray source and detector obtaining x-ray scans of a patient, and a focus member directing an electron beam onto the x-ray source.

Abstract: A laser-plasma EUV radiation source (10) that employs one or more approaches for preventing vaporization of material from a nozzle assembly (40) of the source (10) by electrical discharge from the plasma (30). The first approach includes employing an electrically isolating nozzle end, such as a glass capillary tube (46). The tube (46) extends beyond all of the conductive surfaces of the nozzle assembly (40) by a suitable distance so that the pressure around the closest conducting portion of the nozzle assembly (40) is low enough not to support arcing. A second approach includes providing electrical isolation of the conductive portions of the source (40) from the vacuum chamber wall. A third approach includes applying a bias potential (52) to the nozzle assembly (40) to raise the potential of the nozzle assembly (40) to the potential of the arc.

Abstract: A method and counter for reducing the background counting rate in gas-filled alpha particle counters wherein the counter is constructed in such a manner as to exaggerate the differences in the features in preamplifier pulses generated by collecting the charges in ionization tracks produced by alpha particles emanating from different regions within the counter and then using pulse feature analysis to recognize these differences and so discriminate between different regions of emanation. Thus alpha particles emitted from the sample can then be counted while those emitted from the counter components can be rejected, resulting in very low background counting rates even from large samples. In one embodiment, a multi-wire ionization chamber, different electric fields are created in different regions of the counter and the resultant difference in electron velocities during charge collection allow alpha particles from the sample and counter backwall to be distinguished.