Abstract: A critical illumination condenser system, particularly adapted for use in extreme ultraviolet (EUV) projection lithography based on a ring field imaging system and a laser produced plasma source. The system uses three spherical mirrors and is capable of illuminating the extent of the mask plane by scanning either the primary mirror or the laser plasma source. The angles of radiation incident upon each mirror of the critical illumination condenser vary by less than eight (8) degrees. For example, the imaging system in which the critical illumination condenser is utilized has a 200 .mu.m source and requires a magnification of 26.times.. The three spherical mirror system constitutes a two mirror inverse Cassegrain, or Schwarzschild configuration, with a 25% area obstruction (50% linear obstruction). The third mirror provides the final pupil and image relay. The mirrors include a multilayer reflective coating which is reflective over a narrow bandwidth.

Abstract: A tapered, spherically slumped, microchannel plate.

Abstract: Two kinds of substances are deposited on the surface of a substrate with their thicknesses being gradually decreased according to a Fresnel pattern to form a deposited material. The material is sliced in a direction parallel to the direction of deposition of the two kinds of substance. The slice is fixed as an interference plate on the surface of a dispersing crystal in order to obtain an X-ray dispersing/focusing device. The interference plate fixed on the surface of the dispersing crystal focuses photons by the Fresnel diffraction during the incidence and reflection of X-rays to and from the dispersing crystal, and acts as a dispersing/focusing device as a whole. The dispersing crystal also acts as a base plate supporting the interference plate. Since an interference plate with an outermost zone width of the Fresnel pattern of 1 nm or less is producible, the focusing of X-rays to small regions can be realized.

Abstract: A phase-contrast X-ray CT apparatus is provided with an X-ray source for generating an X-ray beam, a crystal for generating a diffracted beam by irradiation with the X-ray beam, an object arranging section provided in the direction of propagation of the diffracted beam so that it is rotatable relative to the diffracted beam, an analyzer crystal for receiving a beam transmitted through the object arranging section to extract only a specified refraction angle component, and a sensor for detecting a beam extracted by the analyzer crystal.

Abstract: An X-ray lens includes a plurality of hollow cylinders of prescribed radius bored in a lens material piece having a phase lag coefficient appropriate for the wavelength of the X-rays to be focused such that the axes of the hollow cylinders are parallel and perpendicularly intersect a straight array axis.

Abstract: The present invention relates to an illuminating apparatus for illuminating an illuminated object in an arcuate pattern and, more particularly, to an illuminating apparatus suitably applicable to exposure apparatus suitably used in transferring a circuit pattern on a photomask (mask or reticle) through a reflection type imaging apparatus onto a substrate such as a wafer by the mirror projection method, for example of an X-ray optical system. The illuminating apparatus of the present invention can illuminate the illuminated surface in an arcuate pattern with uniform intensity. Exposure apparatus provided with the illuminating apparatus of the present invention can obtain an image with uniform exposure over the entire arcuate surface as the illuminated surface, so that the pattern on the mask located on the illuminated surface can be accurately transferred with high throughput onto the substrate.

Abstract: An optical element for X-ray reflection according to the present invention is provided with a number of fine convex surfaces or concave surfaces regularly arranged on a substrate. Multilayer films reflecting X-rays are formed over the convex surfaces or concave surfaces. The convex surfaces or concave surfaces have such a shape that when X-rays enter each concave surface or convex surface, they are reflected with a certain diverging angle by the multilayer films and as a result that a plurality of secondary X-ray sources having the diverging angle are formed on a same plane located a certain distance apart from the concave surfaces or convex surfaces. By this, a number of secondary X-ray sources are formed to enable uniform irradiation of X-rays in a wide region.

Abstract: This invention relates to novel methods of producing flat and curved optical elements with laterally and depth graded multilayer thin films, in particular multilayers of extremely high precision, for use with soft and hard x-rays and neutrons and the optical elements achieved by these methods. In order to improve the performance of an optical element, errors in d spacing and curvature are isolated and subsequently compensated.

Abstract: The invention relates to a measuring element for a portable micro-X-ray spectrometer, said element comprising a radiation protected housing, at least an X-ray source, a detector, cooling parts for the detector and means for activating the X-ray source and the detector. In accordance with the invention, in order to advantageously guide the X-rays obtained by the X-ray source away from the radiation protected housing (1), at least one capillary tube (3) has been mounted in the X-ray source (4), said capillary tube (3), at the opposite end of the tube as seen from the X-ray source, being connected to a hole formed in the detector (5) for conducting the X-rays out of the radiation protected housing (1). The inner section of the capillary tube (3) is smaller at the end which, seen from the X-ray source, is opposite than at the end at the X-ray source (4).

Abstract: A reflection type imaging optical system is provided with at least one reflecting mirror, whose reflecting surface is constructed of a plurality of zone areas different from each other in spectral reflectance characteristics. Further, in the optical system, the spectral reflectance characteristics of each zone area are selected so that an incident angle providing the maximum reflectance when a ray of light of a predetermined wavelength is incident on each zone area has a value between the maximum and the minimum of the incident angle in the zone area. The reflection type imaging optical system thus provides an important advantage in practical use in that the reflection efficiency of each reflecting surface is enhanced to bring about the brightness necessary for the imaging surface.

Abstract: A monochromator positioned in the path of a plurality of X-rays to simultaneously impinge the plurality of X-rays onto a thin-film at various angles of incidence, typically greater than a critical angle .psi..sub.c. The monochromator may be cylindrically or toroidally shaped, defining two focal areas with a source of X-rays positioned at the first focal point and a sample containing the thin-film layer positioned at the second focal point. A position sensitive detector is positioned to sense monochromatic X-rays reflected from the thin-film and produce a signal corresponding to both intensity and an angle of reflection of the monochromatic X-rays sensed. A processor is connected to receive signals produced by the detector to determine, as a function of intensity and angle of reflection of the monochromatic X-rays impinging on the detector, various properties of the structure of the thin-film layer, including the thickness, density and smoothness.

Abstract: A monochromator for radiant X-rays is composed of a first crystal which has a first surface of incidence having a concave letter V-shaped groove and cooling means for flowing a cooling material behind the first surface of incidence along the letter V-shaped groove, and a second crystal which has a second surface of incidence having a letter V-shaped convex. A parallel pencil of X-rays which impinges on the first surface of incidence elongates to a half-ellipse on the first surface of incidence and reflects in parallel therefrom to the second surface of incidence. Then, a pencil of emissive X-rays having the same size as the initial parallel pencil of X-rays exits the second surface of incidence to become useful light. The monochromator for radiant X-rays which has a high cooling efficiency, is easy to adjust, provides a pencil of emissive X-rays stably and highly accurately. The monochromator is easy to use and economical, and allows easy maintenance.

Abstract: An apparatus which allows monochromatic radiographs to be produced using conventional "table top" Coolidge tube generated x-rays, comprises of the use of known bent crystal x-ray diffractive optics to produce radiographic images. The apparatus for producing the desirable x-ray radiation in a predetermined maximum intensity includes a crystal of the type mentioned above which focuses the x-rays emitted from the tube, the crystal and tube being mounted on a linear translation table. In addition, a method of mammography and differential angiography employing that device are presented. Resolution of mammographs are improved and the method which uses images obtained with radiation above and below the absorption edge of the dye being used to detect anomalies in a circulatory system allows the use of dramatically reduced dye concentrations.

Abstract: An X-ray lens includes a plurality of hollow cylinders of prescribed radius bored in a lens material piece having a phase lag coefficient appropriate for the wavelength of the X-rays to be focused such that the axes of the hollow cylinders are parallel and perpendicularly intersect a straight array axis.

Abstract: An optical element for X-ray reflection according to the present invention is provided with a number of fine convex surfaces or concave surfaces regularly arranged on a substrate. Multilayer films reflecting X-rays are formed over the convex surfaces or concave surfaces. The convex surfaces or concave surfaces have such a shape that when X-rays enter each concave surface or convex surface, they are reflected with a certain diverging angle by the multilayer films and as a result that a plurality of secondary X-ray sources having the diverging angle are formed on a same plane located a certain distance apart from the concave surfaces or convex surfaces. By this, a number of secondary X-ray sources are formed to enable uniform irradiation of X-rays in a wide region.

Abstract: This invention relates to nondestructive testing of the internal structure of objects.The method for obtaining the image of The internal structure of an object consists in that the flux of a penetrating radiation emitted by a source (1) is collimated by a single-crystal monochromator (4), an object (7) is irradiated with the thus-collimated radiation, the radiation transmitted through the object (7) is collimated by a single-crystal (8) and then registered by a detector (9). According to the invention, use is made for irradiating the object, of an asymmetrical reflection of the radiation from the single-crystal monochromator (4), a pseudosheet-like beam (5) is formed, having a wide wavefront and a divergence in the Bragg diffraction plane at least twice as little as the width of the Bragg reflection of the single-crystal (8), which is set in the position of Bragg reflection with respect to the pseudosheet-like beam (5) formed by the single-crystal monochromator (4).

Abstract: A system comprising a novel combination of a multiple-channel monolithic capillary optic and an x-ray source with a spot size of less than 300 microns to produce a high intensity small diameter x-ray beam is described. A system of this invention can be easily adapted for use in the analysis of small samples where an intense quasi-parallel, or converging x-ray beam is required.

Abstract: An X-ray analytical apparatus of a wavelength dispersion type having a construction of essential parts improved using a microprobe of ion beam. An ion beam 10 is controlled to be deflected to scan in a fine region of a sample 3, a characteristic X-ray generated by irradiation of the ion beam is subjected spectro-process by a analyzing element 5 set to a predetermined radius of curvature by a curvature changing mechanism, and an X-ray having a specific wavelength selected by the spectro-process is detected by a proportional counter 7. When an angle of the analyzing element is set by a rotational stage to an incident angle of a specific X-ray determined by a detection element on the sample 3, a wide range of wavelength can be subjected to spectro-measured while the sample 3, the analyzing element 5 and the proportional counter 7 remain fixed in position.

Abstract: A multilayer film for X-rays comprising two kinds of films having different refractive indices, deposited alternately, wherein one of said two kinds of films which has smaller refractive index consists of an alloy containing Co and Cr. The multilayer film is capable of being utilized as an optical element such as a reflection mirror or a reflection-type X-ray mask.

Abstract: A 4-bounce dispersive crystal monochromator reduces the bandpass of synchrotron radiation to a 10-50 meV range without sacrificing angular acceptance. The monochromator includes the combination of an asymmetrical channel-cut single crystal of lower order reflection and a symmetrical channel-cut single crystal of higher order reflection in a nested geometric configuration. In the disclosed embodiment, a highly asymmetrically cut (.alpha.=20) outer silicon crystal (4 2 2) with low order reflection is combined with a symmetrically cut inner silicon crystal (10 6 4) with high order reflection to condition a hard x-ray component (5-30 keV) of synchrotron radiation down to the .mu.eV-neV level. Each of the crystals is coupled to the combination of a positioning inchworm and angle encoder via a respective rotation stage for accurate relative positioning of the crystals and precise energy tuning of the monochromator.

Abstract: An X-ray analysis apparatus comprises a dispersive system of crystals for monochromatizing an incoming beam in a diffractometer or for analyzing an X-ray beam in an X-ray spectrometer. The system of crystals comprises crystals whose crystal lattice planes do not extend parallel to effectively reflective crystal surfaces. As a result, a substantially higher effective radiation intensity can be obtained, for example notably for (220) crystal faces in germanium.

Abstract: An x-ray interface (40) provides increased x-ray collection efficiency for use in x-ray photolithography. The interface (40) comprises a housing (44) having a plurality of mirrored funnels (46) for collecting the x-rays. The mirrored funnels (46) are shaped to partially collimate and focus the x-rays. The interface (40) collects a greater percentage of the available x-rays from an x-ray source, and the interface (40) also permits a greater number of beamlines to be coupled to the x-ray source.

Abstract: X-ray dispersive and reflective structures utilizing special materials which exhibit improved performance in the specific ranges of interest. The structures are formed of alternating thin layers of uranium, uranium compound or uranium alloy and another spacer material consisting of elements or compounds with low absorptance chosen to match the wavelength of interest. These low index of refraction elements or compounds are those best suited for water window microscopy and nitrogen analysis, or are similar elements or compounds best suited for carbon analysis, boron analysis, and x-ray lithography. The structures are constructed using standard thin layer deposition techniques such as evaporation, sputtering, and CVD, or by novel methods which allow thinner and smoother layers to be deposited.

Abstract: An optical element which allows replication of a refined pattern and a projection exposure apparatus employing the optical element are disposed so that side face portions of predetermined patterns which create shadows from oblique incident exposure radiation may be minimized at a predetermined incidence angle of vacuum ultrasonic radiation or X-radiation, or the patterns of the optical element are formed such that the direction in which incident radiation is reflected regularly and the direction of side faces of the patterns may extend in parallel to each other. When the optical element is irradiated to replicate or image the patterns of the optical element, refined patterns can be replicated or imaged.

Abstract: An X-ray mirror has a silicon carbide substrate having a convex cylindrical surface, and a carbon layer coated on a surface of said substrate to a thickness ranging from 10 nm to 1 .mu.m by evaporation, such as CVD. In the X-ray mirror in which the carbon layer is coated thereon beforehand, changes in the intensity of reflected light, caused by a contaminating carbon layer attached to the surface of the mirror, can be restricted. When such a mirror is used in an X-ray lithographic apparatus, the number of times the intensity of X-rays is measured or corrected or the mirror is cleaned can be greatly reduced.

Abstract: X-ray wave diffraction devices are constructed using atomic layer epetaxy. A crystalline substrate is prepared with one or more surface areas on which multiple pairs of layers of material are to be deposited. These layers are then formed by atomic layer epetaxy on the surface areas of the substrate, one on top of another, with the material of each layer of each pair being selected to have a different index of refraction from that of the material of the other layer of each pair. The layers are formed so that the thickness of each layer of a pair is substantially the same as that of the corresponding layer of every other pair and so that x-ray waves impinging on the layers may be reflected therefrom. Layer pairs having a thickness of about 20 angstroms or less are formed on the substrate.

Abstract: An x-ray mirror material of high reflectance with a surface roughness which is very small and a high film density, the material being a Pt alloy film provided as a mirror surface for reflecting x-ray radiation. The composition of the mirror material is expressed by the general formula: Pt.sub.1-x M.sub.x. This material is deposited on a substrate surface which has been polished to a level form, where M is at least one substance selected from Mo, Ru, Rh, Pd, Ta, W, and Au, and x satisfies the formula: 0.005.ltoreq..times..ltoreq.0.10.

Abstract: An X-ray apparatus is disclosed which includes a mirror having a reflection surface, for expanding an X-ray beam in a predetermined direction, a detecting device for detecting a relative positional relationship between the X-ray beam and the reflection surface with respect to a direction perpendicular to the reflection surface, and an adjusting device for adjusting the relative position of the X-ray beam and the reflection surface on the basis of the detection. Also disclosed is an exposure apparatus and a semiconductor device manufacturing method using the X-ray apparatus.

Abstract: An X-ray analysis apparatus including an artificial multi-layered grating for rendering X-ray beams to be monochromatic before they are incident on a specimen to be analyzed. This artificial multi-layered grating operates to diffract the X-ray beam, generated from an X-ray radiation source and subsequently impinging on a reflective surface of the artificial multi-layered grating, at a predetermined angle of diffraction to provide the monochromatic X-ray beams. The periodicity of the spacing of lattice planes of the artificial multi-layered grating is so chosen as to be of a value progressively varying along the reflective surface thereof with an increase in distance from the X-ray radiation source. The X-ray analysis apparatus herein disclosed is designed to avoid any possible reduction of the intensity of the X-ray beams which would occur when they are rendered to be monochromatic, and to increase the intensity of the X-ray beams to ensure an improved accuracy in spectroscopic analysis.

Abstract: An optical arrangement includes an optical system for transforming synchrotron radiation light emitted from an emission point of a synchrotron ring into a substantially parallel beam, with respect to a first direction which is parallel to an orbit plane of the synchrotron ring and with respect to a second direction which is perpendicular to the orbit plane, wherein an absolute value of a focal length of the optical system in the first direction is smaller than that in the second direction.

Abstract: A temperature distribution of an object, such as an optical element, onto which radiation energy is irradiated, is measured. The change of the shape of the object is controlled by varying the temperature of a part of the object on the basis of the measured temperature distribution to stabilize the shape of the object. Also, the shape of the object being irradiated is stabilized by causing the same temperature distribution in the object when in the thermally stable condition to be generated in the object while it is being irradiated. If the shapes of masks used to manufacture semiconductor devices are stabilized by using the above methods, highly integrated semiconductor devices can be manufactured.

Abstract: X-ray dispersive elements comprise a stacked array of layer pairs of boron nitride and either nickel, tungsten, chromium, vanadium, iron, manganese, cobalt and combinations thereof. The boron nitride is preferably deposited through a planar magnetron sputtering process.

Abstract: An X-ray lithography beamline imaging system has a single condenser mirror with an aspherical reflecting surface, with symmetry only about a plane, without axial symmetry. For an X-ray beam emitted along a y axis and diverging along x and z axes, the reflecting surface is asymmetrical about the y axis and has different focusing power in directions along the x and z axes in an imaging plane orthogonal to the y axis and spaced from the mirror along the y axis such that the mirror reflects and focuses the X-ray beam to a point along the y axis in the imaging plane and to a line along the x axis in the imaging plane.This invention was made with United States Government support awarded by the National Science Foundation (NSF), Grant No. ECS-8921165, and the Naval Research Laboratory (NRL), Grant No. N00014-91-J-1876. The United States Government has certain rights in this invention.

Abstract: A method for detecting and evaluating crystal defects existing in the extreme neighborhood of the surface of a crystal specimen through the use of X-ray analyzing micrography. Synchrotron radiation is used as the X-ray source. A monochromatic X-ray beam generated from the synchrotron radiation is directed into the crystal specimen at a glancing angle smaller than the critical angle of said crystal specimen relative to said monochromatic X-ray beam. The diffracted X-rays from the crystal specimen due to asymmetrical reflection are detected in order to observe the resulting diffracted image.

Abstract: A solid state x-ray detector has a set of bilayers formed on its front surface. Each bilayer includes a spacing layer and an absorbing layer which have different indexes of refraction, and the impinging x-rays strike the bilayers at an angle which satisfies the Bragg condition. As a result, x-rays polarized in one direction are substantially reflected while x-rays polarized in an orthogonal direction pass through the bilayers for detection by the solid state x-ray detector.

Abstract: A self-apodizing collimator for collimating X-rays for use in VLSI lithography. The paraboloidal collimator uses a graded ML coating to collimate a range of wavelengths along the surface of the paraboloid such that a uniform resist response is provided. In addition, the collimated X-rays have a higher intensity than possible with a system using additional apodizing films.

Abstract: This invention relates to nondestructive testing of the internal structure of objects.The method for obtaining the image of the internal structure of an object consists in that the flux of a penetrating radiation emitted by a source (1) is collimated by a single-crystal monochromator (4), an object (7) is irradiated with the thus-collimated radiation, the radiation transmitted through the object (7) is collimated by a single-crystal (8) and then registered by a detector (9). According to the invention, use is made for irradiating the object, of an asymmetrical reflection of the radiation from the single-crystal monochromator (b 4), a pseudosheet-like beam (5) is formed, having a wide wavefront and a divergence in the Bragg diffraction plane at least twice as little as the width of the Bragg reflection of the single-crystal (8), which is set in the position of Bragg reflection with respect to the pseudosheet-like beam (5) formed by the single-crystal monochromator (4).

Abstract: On a substrate materials of different X-ray refractive indexes, for example, silicon (si) and molybdenum (Mo), are alternately deposited to form a multilayer film composed of silicon nd molybdenum layers and a hydrogenated interface layer is formed between each pair of adjacent layers.

Abstract: An instrument for surface analysis includes a gun for selectively focusing an electron beam on an anode spot, or rastering the beam across an array of such spots, to generate x-rays. A concave monochromator focuses an energy peak of the x-rays to a specimen surface, in a spot on a selected pixel area or across an array of pixel areas on the surface to emit photoelectrons. An analyzer with a detector provides information on the photoelectrons and thereby chemical species in the surface. A second detector of low energy photoelectrons is cooperative with the rastering to produce a scanning photoelectron image of the surface, for viewing of a specimen to be positioned, or for imaging an insulator surface. The monochromator is formed of platelets produced by cutting an array of platelets from a single crystal member, and bonding the platelets to a concave face of a base plate juxtaposed in crystalline alignment in a positioned array identical to that of the initial array.

Abstract: A soft X-ray microscope comprising a soft X-ray radiation source which is substantially a spot radiation source, a condenser for leading soft X-rays from the radiation source to a sample, a reflecting mirror for grazing incidence which is disposed between the radiation source and the condenser, and has a rough reflecting surface, an objective optical system for forming a magnified image of the sample, and a soft X-ray detector for receiving the soft X-rays from the objective optical system. This microscope exhibits excellent imaging characteristic even when it uses a spot radiation source.

Abstract: A mirror for reflecting radiation at a desired wavelength in the soft x-ray region, comprises a substrate and a coating on the substrate. The coating contains a first section and a second section. The first section comprises at least one layer made up of at least a spacer sublayer and a nodal sublayer. The optical thickness of each spacer sublayer is selected so that, upon application of the radiation of desired wavelength, the mirror generates a standing wave having a node in the middle of each nodal sublayer. The second section is disposed between the first section and the substrate, and comprises a plurality of optically absorptive layers.

Abstract: Reduction projection type X-ray lithography with an exposing beam wavelength of 40-150A, longer than in conventional 1:1 proximity exposure, has a high-vacuum space. This would reduce wafer replacement work efficiency and contaminate optical mirrors with substances released by a resist decomposed during exposure except for separating an optical system chamber and a wafer exposing chamber by a differential pumping section and a thin-film window. Wafer exposure is under atmospheric pressure, improving productivity, accuracy of exposure and longevity of the optical devices.

Abstract: An optical system and method comprising a diffraction grating which rotates about its surface normal to change the magnitude of the wavelength diffracted to an image location. At grazing incidence, such a rotation is determined to maintain the diffracted image in focus over a wide range in scanned wavelength. Monochromator and spectrometer embodiments include plane and curved surface gratings with both classical and varied-spaced groove patterns, and a variety of illumination geometries. In the simplest case, a grazing incidence monochromator is constructed in which a self-focusing classical spherical grating scans the value in wavelength which is transmitted between fixed slits located on the Rowland circle of the grating. The diffracted image remains in perfect focus over two octaves in wavelength at high efficiency, with both entrance and exit slits fixed in position, and the radiation aperture is constant.

Abstract: A mounting mechanism for a double crystal monochromator or the like has a parallelogram based mounting mechanism in which two of the vertices of the parallelogram are fixed in position, and two vertices are free to translate back and forth in a straight line parallel to the fixed base of the parallelogram. One diffractor is mounting for pivoting at one of the fixed vertices, and the second diffractor is mounted for pivoting at an adjacent movable vertex. The surfaces of the diffractors are maintained parallel as the angle of the diffractors with respect to input and output beams to the monochromator is changed to change the wavelength being passed. The diffractor mounted at the fixed pivot may be connected to a large diameter wheel which in turn is connected by a band to a smaller diameter wheel mounted for rotation at the other fixed vertex of the parallelogram, with a pivotable arm connected to the smaller wheel to rotate therewith.

Abstract: In one aspect, the invention involves an optical element in an x-ray imaging system. The element comprises a substrate overlain by a multilayer coating. The multilayer coating comprises plural first and at least second material layers in alternation. This coating is soluble in at least one etchant solution at an etching temperature less than 100.degree. C. The optical element further comprises a barrier layer intermediate the substrate and the multilayer coating. The barrier layer is relatively insoluble in the etchant solution at the etching temperature. In a second aspect of the invention, the optical element comprises a substrate and a multilayer coating as described above, and further comprises a release layer that underlies the multilayer coating. The release layer comprises a material that is relatively soluble in at least one etchant solution at an etching temperature less than 100.degree. C. In contrast to release layers of the prior art, the inventive release layer comprises germanium.

Abstract: Novel methods and apparatus for high resolution electron beam and X-ray lithography. For electron-beam lithography, a novel 1:1 imaging system is disclosed. For X-ray lithography, novel 1:1 imaging and n:1 reduction imaging systems are disclosed.

Abstract: A beam generating apparatus the combination comprising a first binary alloy target crystal consisting essentially of an alloy of copper and silver, for producing a primary x-ray beam; a second target crystal consisting essentially of copper in the path of the first x-ray beam and oriented to produce a CuK.alpha., radiation in response to impingement of the primary beam.

Abstract: X-ray exposure equipment which can effectively converge a synchrotron radiation, which tends to diverge to a great extent in a horizontal direction, to assure a sufficiently high intensity on a lithographic plane and can irradiate X-rays perpendicularly to a full lateral extent of the lithographic plane over an entire exposure area. The X-ray exposure equipment comprises a point X-ray source and a first reflecting mirror having first and second point focuses and disposed such that the first focal point coincides with the location of the X-ray source so as to focus X-rays to the second focal point. A second reflecting mirror is disposed such that the focus thereof substantially coincides with the second focal point of the first reflecting mirror so as to collimate X-rays received from the first reflecting mirror by way of the focusing property thereof in parallel to a principal optical axis of an optical system for X-rays which includes the first and second reflecting mirrors.

Abstract: A total reflection X-ray fluorescence apparatus comprises a base material having an optically flat surface for totally reflecting X-rays radiated at a small glancing angle, a first detector such as an SSD for detecting fluorescent X-rays emerging from a specimen located near the optically flat surface of the base material and a second detector such as a scintillation counter for detecting an intensity of an X-rays coming from the base material.

Abstract: A condenser optical system is provided for bringing a beam of light from a light source to a focus at a desired position. The condenser optical system has a reflecting surface including a quadric surface of revolution represented by Equation (1) described below. The reflecting surface satisfies the conditions of Equations (2) and (3) described below when the condenser optical system is disposed so that the light beam from the light source is incident, substantially parallel to a rotary axis of the quadric surface, on the reflecting surface:z=Cy.sup.2 /{1+(1-pC.sup.2 y.sup.2).sup.1/2 } (1)Ch<22 (2)78-4.theta..sub.