Abstract: An illumination system, particularly for wavelengths ?100 nm, with an object plane and a field plane, comprises a grating element and a physical diaphragm in a diaphragm plane, which is arranged downstream to the grating element in the beam path from the object plane to the field plane.

Abstract: The invention relates to an optical assembly with a laterally graded reflective multilayer whose reflecting surface reflects incident X-rays under low incidence angles to produce a two-dimensional optical effect. The reflecting surface comprises a single surface conformed along two curvatures corresponding to two different directions. The invention also relates to a manufacturing method of such an optical assembly. The method includes coating a substrate already having a curvature. The invention also relates to a device for generating and conditioning X-rays for applications for angle-dispersive X-ray reflectometry. The device includes the optical assembly connected to an X-ray source so that X-rays emitted by the source are conditioned along two dimensions so as to adapt the beam emitted by the source to the sample, with the X-rays having different angles of incidence on the sample under consideration.

Abstract: An x-ray optical device includes an optic and an adjustable aperture that selectively occludes a portion of an x-ray beam. The adjustable aperture may be positioned between the optic and a sample and may be integrated with the optic or located in close proximity to the optic. The adjustable aperture enables a user to easily and effectively adjust the convergence of the x-rays. In doing so, the flux and resolution of the x-ray optical device can be optimized by using an optic having the maximum convergence allowed for all potential measurements, and then selecting a convergence for a particular measurement by adjusting the aperture.

Abstract: A method for manufacturing a reflector (5) for X-ray radiation (2, 3, 10, 11) which is curved in a non-circular arc shape, along a first cross-section (13) in a plane (XZ) which contains a x-direction, wherein the reflector (5) is also curved along a second cross-section (14) in a plane (YZ) which is perpendicular to the x-direction, is characterized in that the reflector (5) has a curvature along the second cross-section (14) which also differs from the shape of a circular arc. This makes the design of X-ray mirrors and the beam profile of reflected X-ray radiation more flexible, facilitates production of X-ray mirrors and at the same time provides high reflection capacity and good focusing properties for X-ray mirrors.

Abstract: An x-ray diffraction technique for measuring a known characteristic of a sample of a material in an in-situ state. The technique includes using an x-ray source for emitting substantially divergent x-ray radiation—with a collimating optic disposed with respect to the fixed source for producing a substantially parallel beam of x-ray radiation by receiving and redirecting the divergent paths of the divergent x-ray radiation. A first x-ray detector collects radiation diffracted from the sample; wherein the source and detector are fixed, during operation thereof, in position relative to each other and in at least one dimension relative to the sample according to a-priori knowledge about the known characteristic of the sample. A second x-ray detector may be fixed relative to the first x-ray detector according to the a-priori knowledge about the known characteristic of the sample, especially in a phase monitoring embodiment of the present invention.

Abstract: An optical system comprises a Bragg reflector configured to diffract incident light having a wavelength between about 0.1 nm and about 0.7 nm. The optical system also comprises a diffraction grating comprising parallel lines engraved on a surface of the Bragg reflector. Specifically, the diffraction grating is configured to diffract incident light having a wavelength between about 0.6 nm and about 150 nm.

Abstract: A Lobster Eye X-ray Imaging System based on a unique Lobster Eye (LE) structure, X-ray generator, scintillator-based detector and cooled CCD (or Intensified CCD) for real-time, safe, staring Compton backscatter X-ray detection of objects hidden under ground, in containers, behind walls, bulkheads etc. In contrast to existing scanning pencil beam systems, Lobster Eye X-Ray Imaging System's true focusing X-ray optics simultaneously acquire ballistic Compton backscattering photons (CBPs) from an entire scene irradiated by a wide-open cone beam from one or more X-ray generators. The Lobster Eye X-ray Imaging System collects (focuses) thousands of times more backscattered hard X-rays in the range from 40 to 120 keV (or wavelength ?=0.31 to 0.1 ?) than current backscatter imaging sensors (BISs), giving high sensitivity and signal-to-noise ratio (SNR) and penetration through ground, metal walls etc.

Abstract: An X-ray reflectance is measured with the use of an X-ray detector, which is not less than 107 cps in upper-limit counting rate and is not more than twenty cps in noise level, under the condition that a measuring time length per interval of scattering angle 2? is not more than fifty milliseconds, so that the measurement of one reflectance curve is completed in a short time as several seconds. In another aspect of the invention, the X-ray detector used is not less than 107 cps in upper-limit counting rate and is not more than 0.01 cps in noise level, and the measuring time length per interval is not less than a hundred seconds, so that the X-ray reflectance curve is obtained with not less than a nine-digit dynamic range. The X-ray detector may be an avalanche photo diode.

Abstract: Compact, low-power-consuming systems and methods for exposing samples to high-energy radiation, for example, for exposing samples to x-rays for implementing x-ray absorption near edge analysis (XANES). The systems and methods include a low-power-consuming radiation source, such as an x-ray tube; one or more tunable crystal optics for directing and varying the energy of the radiation onto a sample under analysis; and a radiation detecting device, such as an x-ray detector, for detecting radiation emitted by the sample. The one or more tunable crystal optics may be doubly-curved crystal optics. The components of the system may be arranged in a collinear fashion. The disclosed systems and methods are particularly applicable to XANES analysis, for example, XANES analysis of the chemical state of chromium or another transition metal in biological processes.

Abstract: The present invention makes it possible to obtain a multilayer film reflective mirror 61 comprising a first multilayer film 67 which is formed by alternately laminating Mo layers 671 and Si layers 673 on a substrate 63, and a second multilayer film 65 which is formed on top of the first multilayer film 67, and which is formed by alternately laminating Mo layers 651 and Si layers 653, wherein the thickness of the Mo layers in the first multilayer film is substantially equal to or smaller than the thickness of the Mo layers in the second multilayer film, and the ratio of the thickness of the Mo layers to the thickness of the Si layers in the first multilayer film is different from the ratio of these thicknesses in the second multilayer film. As a result, a multilayer film reflective mirror with a low internal stress in which a drop in the reflectivity is suppressed can be obtained.

Abstract: A monochromator to be used in an X-ray device having an X-ray source is formed by a crystal for spectral restriction of X-rays produced by the X-ray source. The monochromator includes a positioning device that can move the crystal so that it changes the spectral composition of the X-radiation. The crystal can be moved so that it changes the angle between an X-ray path and the crystal, or so that the crystal is removed out of X-ray path or returned into it.

Abstract: An X-ray multi-layer mirror having a reflection characteristic with a wider incident angle range is realized by conducting optimization processing on an Mo/Si alternate layer having a constant thickness. Film thickness distributions of Si layers and Mo layers in the Mo/Si alternate layer are determined by optimization processing for widening the angle reflection characteristic of the Mo/Si alternate layer having the constant thickness, which is a fundamental structure.

Abstract: Detecting unit comprises position-sensitive detector 1 and collimating system 2, situated in front of its window 19. Collimating system being made in the form of honeycomb structure comprising multitude of tubular channels for transmittance of diffracted X-ray radiation. Walls of adjacent tubular channels are fused together. Outlet ends of the channels, forming outlet end face 22 of the collimating system, are oriented towards window 19 of the position-sensitive detector. Outlets of the channels in outlet end face of the collimating system 2 are arranged in several rows along window 19 of the position-sensitive detector 1. Walls of the tubular channels are formed from material absorbing X-ray radiation. Collimating system 2 is installed with possibility of adjusting its position relative to the window 19 alignment of the position-sensitive detector. The embodiment specified provides for prevention of the difractograms distortion and the increase of sensitivity of the detecting unit.

Abstract: Thin film thickness measurement accuracy in x-ray reflectometry systems can be enhanced by minimizing scattering and beam spreading effects. A reflectometry system can include an x-ray tube that can produce an x-ray beam having any cross-sectional shape by scanning an electron beam in an appropriate pattern over a target in an x-ray tube. For example, the electron beam can be scanned over the target in a pattern having a non-unitary aspect ratio, so that the x-ray beam is generated from a source region having a non-unitary aspect ratio. The elongation allows the beam direction dimension to be substantially reduced, without causing overheating of the target. By blocking portions of the x-ray beam focused on the thin film and generating reflectivity curves in increments, the effects of scattering can be minimized.

Abstract: In an apparatus and a method for the analysis of atomic or molecular elements contained in a sample by wavelength dispersive X-ray spectrometry, wherein primary x ray or electron radiation is directed onto the sample whereby fluorescence radiation is emitted from the sample, the fluorescence radiation is directed onto a mirror or focussing device consisting of a multi-layer structure including pairs of layers of which one layer of a pair comprises carbon or scandium and the other comprises a metal oxide or a metal nitride and the fluorescence radiation is reflected from the mirror or focussing device onto an analysis detector for the analysis of the atomic or molecular elements contained in the sample.

Abstract: The complex is intended for carrying out research in the X-ray range at several analytical devices 5 simultaneously. The complex comprises a source 1 of divergent X-rays, for example an X-ray tube and x-ray lenses 2 for radiation transporting toward the analytical devices 5 and the apparatus of these devices. The X-ray lenses 2 form the x-rays into quasi-parallel beams. Usage of the X-ray lenses provides for the scientists in the analytical devices the requisite brightness, being not less than in the complexes where the radiation source is a synchrotron.

Abstract: A double crystal analyzer linkage includes the fixed pivot point, a fixed pivot point shaft, and three sliding axis points constrained to allow only sliding motion along given linear, parallel paths. The three paths are arranged such that one path passes through the fixed pivot point shaft on a central path and the two remaining paths are on opposite sides and equidistant from the central path. Two diffracting devices (200, 200?) are mounted to axis points which traverse the outer paths (204, 204?). A right angle slide (210) constrains the two linear paths to only slide through a single axis point and constrains the two linear paths to be at right angles to each other. An inline slide constrains two paths to slide through a single axis point, and constrains the two paths to be parallel to each other. First (212) and second linkage (214) devices are connected to the right angle slide (210) and the two remaining axis points, and constrain the two diffracting devices (200, 200?) to remain parallel at all times.

Abstract: A method for detecting a mass density image of an object. An x-ray beam is transmitted through the object and a transmitted beam is emitted from the object. The transmitted beam is directed at an angle of incidence upon a crystal analyzer. A diffracted beam is emitted from the crystal analyzer onto a detector and digitized. A first image of the object is detected from the diffracted beam emitted from the crystal analyzer when positioned at a first angular position. A second image of the object is detected from the diffracted beam emitted from the crystal analyzer when positioned at a second angular position. The first image and the second image are combined mathematically to derive a mass density image of the object.

Abstract: An x-ray metrology system includes one or more transmissive x-ray optical elements, such as zone plates or compound refractive x-ray lenses, to shape the x-ray beams used in the measurement operations. Each transmissive x-ray optical element can focus or collimate a source x-ray beam onto a test sample. Another transmissive x-ray optical element can be used to focus reflected or scattered x-rays onto a detector to enhance the resolving capabilities of the system. The compact geometry of transmissive x-ray optical element allows for more flexible placement and positioning than would be feasible with conventional curved crystal reflectors. For example, multiple x-ray beams can be focused onto a test sample using a transmissive x-ray optical element array. Robust zone plates can be efficiently produced using a damascene process.

Abstract: A system includes substantial focus of radiation on a focal area, the focused radiation following a radiation path from a lens to the focal area, and projection of light on a surface so as to substantially indicate an intersection of the radiation path with the surface. In some aspects, the light projected on the surface substantially indicates a distance between the surface and the focal area.

Abstract: Some embodiments include a ring anode to emit radiation, and a conical monochromator to monochromatize the emitted radiation. According to some aspects, an outer diameter of the ring anode is greater than an outer diameter of a base of the monochromator.

Abstract: Apparatus for imaging an object (13) irradiated with an X-ray beam (12) by detecting a transmitted X-ray beam transmitted through the object. A crystal analyser (15) receives the transmitted X-ray beam and emits a first diffracted X-ray beam to a detector assembly (14) comprising first and second X-ray detectors (16 and 17). The first detector (16) is a monochromating semiconductor detector which detects a first portion of the first diffracted X-ray beam to generate first image data, and which diffracts a second portion of the first diffracted beam to the second detector (17) which generates second image data. Image processing means (18) are provided for combining the first and second image data to derive a refraction image and an absorption image of the object (13).

Abstract: In an apparatus and a method for generating monochromatic X-ray radiation, an X-ray source, a monochromator and a slit collimator are arranged relative to one another such that X-rays of a specific energy among the X-rays emanating from the X-ray source are reflected at the monochromator and emerge through the slit of the slit collimator as a fan-shaped beam of monochromatic X-radiation. For scanning an examination subject with the X-ray beam, the monochromator is adjustable relative to the X-ray source and the slit collimator such that the condition for the reflection angle required for the reflection of X-rays of the specific energy at the monochromator remains substantially satisfied during the adjustment, and essentially only X-rays of the specific energy pass through the slit of the slit collimator.

Abstract: Devices for improving the capturing and utilization of high-energy electromagnetic radiation, for example, x-rays, gamma rays, and neutrons, for use in physical, medical, and industrial analysis and control applications are disclosed. The devices include optics having a plurality of optical crystals, for example, doubly-curved silicon or germanium crystals, arranged to optimize the capture and redirection of divergent radiation via Bragg diffraction. In one aspect, a plurality of optic crystals having varying atomic diffraction plane orientations are used to capture and focus divergent x-rays upon a target. In another aspect, a two- or three-dimensional matrix of crystals is positioned relative to an x-ray source to capture and focus divergent x-rays in three dimensions.

Abstract: There is provided a substrate material for an optical component for X-rays of wavelength ?R. The substrate includes (a) a glass phase made of amorphous material having a positive coefficient of thermal expansion, and (b) a crystal phase including microcrystallites having a negative coefficient of thermal expansion and a mean size of less than about 4 ?R. The substrate material has a stoichiometric ratio of the crystal phase to the glass phase such that a coefficient of thermal expansion of the substrate material is less than about 5×10?6 K?1 in a temperature range of about 20 °C. to 100°C. The substrate material, following a surface treatment, has a high spatial frequency roughness (HSFR) of less than about ?R/30 rms.

Abstract: A spectrometer for detecting and quantifying elements in a sample. An exciter ionizes atoms in the sample, and the atoms thereby produce characteristic x-rays. A detector receives the x-rays and produces signals based on the x-rays. A filter system selectively blocks the x-rays from attaining the detector. The selective blocking of the x-rays is accomplished based on an energy of the x-rays. An analyzer receives the signals from the detector and detects and quantifies the elements in the sample based at least in part on the signals. In this manner, detector receives the light element x-rays, and the medium and heavy element x-rays are filtered out to avoid overwhelming the detector. This invention combines the large solid angle, high efficiency, and ability to measure the continuous background spectrum of the energy dispersive x-ray detector with the selectivity of the wavelength dispersive x-ray detector. It thus enables faster and more accurate measurement of light elements in thin films.

Abstract: X-ray microscope comprise extended X-ray source, as well as means for placement of test object 3 and recording means, and located between them X-ray capillary lens. Channels of the latter are diverging towards recording means. Means for placement of the test object is located between extended X-ray source and lesser end side of the X-ray capillary lens. The device is characterized in that the walls of the channels (14, 16) for radiation transmission have a coating or are made of material absorbing or scattering X-ray radiation, and have lateral surface shape of truncated cone or pyramid, or that of cylinder or prism. With specified choice of the material, phenomenon of total external reflection is excluded, while rectilinearity of longitudinal axes of the channels ensures their functioning as collimators. Therefore, channels capture radiation only from the fragments of the test object 3 situated exactly opposite their entrances.

Abstract: An X-ray optical system for small angle scattering has a parabolic multilayer mirror and, so that switching to other X-ray incident optical systems for X-ray analysis can be easily performed. A parabolic multilayer mirror, an optical-path selecting slit device, a small-angle selecting slit device and a Soller slit are arranged between an X-ray source and a specimen-side slit. An X-ray beam having passed through the first aperture of an aperture slit plate is interrupted by the optical-path selecting slit. An X-ray beam having passed through the second aperture of the aperture slit plate is reflected at the reflecting surface of the multilayer mirror to become a parallel beam. This parallel beam passes through an aperture of the optical-path selecting slit device. The beam width is restricted by a narrow slit of the small-angle selecting slit device.

Abstract: An optical element of a lithographic projection apparatus includes a Si/Mo multilayer structure, an outer capping layer and an interlayer positioned between the multilayer structure and the outer capping layer. The interlayer has a thickness of between 0.3 and 0.7 times the wavelength of the incident radiation. The interlayer may be C or Mo and has a thickness of between 6.0 and 9.0 nm. The interlayer may include an inner interlayer including Mo next to the multilayer structure and an outer interlayer including C next to the capping layer. The outer interlayer is at least 3.4 nm thick and the capping layer is Ru and at least 2.0 nm thick.

Abstract: An X-ray exposure apparatus extracts exposure X-rays from light called synchrotron radiation from a synchrotron radiation source by an optical path including an X-ray mirror and performs exposure using the extracted X-rays. The X-ray mirror contains a material having an absorption edge in at least one of a wavelength range of less than 0.45 nm and a wavelength range exceeding 0.7 nm, thereby implementing exposure using the X-ray in the range of 0.45 nm to 0.7 nm. The X-ray mirror contains at least one material selected from the group consisting of iron, cobalt, nickel, copper, manganese, chromium, and their alloys, nitrides, carbides, and borides.

Abstract: X-ray fluorescence (XRF) spectroscopy systems and methods are provided. One system includes a source of x-ray radiation and an excitation optic disposed between the x-ray radiation source and the sample for collecting x-ray radiation from the source and focusing the x-ray radiation to a focal point on the sample to incite at least one analyte in the sample to fluoresce. The system further includes an x-ray fluorescence detector and a collection optic comprising a doubly curved diffracting optic disposed between the sample and the x-ray fluorescence detector for collecting x-ray fluorescence from the focal point on the sample and focusing the fluorescent x-rays towards the x-ray fluorescence detector.

Abstract: The projection lithographic method for producing integrated circuits and forming patterns with extremely small feature dimensions includes an illumination sub-system (36) for producing and directing an extreme ultraviolet soft x-ray radiation ? from an extreme ultraviolet soft x-ray source (38); a mask stage (22) illuminated by the extreme ultraviolet soft x-ray radiation ? produced by illumination stage and the mask stage (22) includes a pattern when illuminated by radiation ?. A protection sub-system includes reflective multilayer coated Ti doped high purity SiO2 glass defect free surface (32) and printed media subject wafer which has a radiation sensitive surface.

Abstract: An X-ray optical system with two X-ray mirrors (A,B) for imaging an X-ray source (S) on a target region is characterized in that the X-ray mirrors (A,B) are mutually tilted by an angle other than 90° such that the combined region of acceptance of the X-ray mirror (A,B) is adjusted to the shape of the X-ray source (S) and/or the target region. This increases the intensity of the focused X-ray radiation on the sample for a given emission of the X-ray source (S) power using a few, technically simple modifications.

Abstract: A mirror element for the reflection of x-rays, particularly for EUVL exposure systems for the manufacture of semiconductor structures, wherein the x-rays reach the mirrors under a certain incident angle, consists of a substrate with a multilayer structure disposed thereon which multilayer structure comprises at least a first layer of a lanthanum-containing compound and a second layer of a boron-containing compound alternately disposed on the substrate.

Abstract: Parallel X-ray beams with two kinds of wavelength are made with the use of a single parabolic multilayer mirror. A single parabola prepared for a CuKa X-ray is used for making parallel X-ray beams of both the CuKa X-ray and the CoKa X-ray. The CuKa ray emitted from a first X-ray focal spot located at the focus of the parabola is reflected at a reflecting surface composed of the parabola to become a parallel beam going out. When a second X-ray focal spot is arranged at the position apart from the first X-ray focal spot by a predetermined distance, the CoKa X-ray emitted from the second X-ray focal spot is reflected at the same reflecting surface to become a parallel beam going out.

Abstract: Apparatus and methods are disclosed for milling selected regions on the surface of a multilayer-film reflective surface of an X-ray mirror to correct the reflected wavefront produced by the mirror, thereby producing a more uniform or otherwise more desirable phase distribution of the reflected wavefront. The milled multilayer films include multiple lamina sets each including respective layers of at least two respective substances. The layers usually are “stacked” alternatingly at a fixed period length on a mirror substrate. By selectively removing one or more surficial layers in selected locations, local corrections of the phase shift of the reflective wavefront are achieved. At each milling location, the depth profile can be stepwise or smoothly gradated. Milling methods can include lapping, ion-beam bombardment, plasma-enhanced chemical vapor machining (CVM), reactive-ion etching, photochemical reactions, or laser ablation.

Abstract: A method for testing a surface includes finding respective first and second critical angles for total external reflection of radiation from an area of the surface at first and second wavelengths. The first and second critical angles are compared to determine an orientation of a tangent to the surface in the area.

Abstract: An X-ray optical system with an X-ray source (Q) and a first graded multi-layer mirror (A), wherein the extension Qx of the X-ray source (Q) in an x direction perpendicular to the connecting line in the z direction between the X-ray source (Q) and the first graded multi-layer mirror (A) is larger than the region of acceptance (F) of the mirror (A) at a focus (Oa) of the mirror (A) in the x direction, is characterized in that a first collimator (bl) is disposed at a focus of the first graded multi-layer mirror (A) between the X-ray source (Q) and the mirror (A) whose opening in the x direction corresponds to the region of acceptance of the first graded multi-layer mirror (A) and the separation qzA between first collimator (bl) and X-ray source (Q) is: qzA=Qx/tan ?x, wherein ?x is the angle subtended by the first graded multi-layer mirror (A) in the x direction, as viewed from the first collimator (bl).

Abstract: A fluorescent X-ray analysis apparatus includes: an X-ray generation source for radiating a beam of primary X-rays; spectroscopic elements circularly arranged so that their inner surfaces describe a circle centered on an optical axis of the beam of primary X-rays for monochromatizing the beam of primary X-rays and condensing the beam on a surface of an irradiation object; a spectroscopic element position adjuster for adjusting the positions of the spectroscopic elements; secondary X-rays detector for detecting secondary X-rays radiated from the surface of the irradiation object irradiated with the monochromatized beam of primary X-rays; a secondary X-ray detector position adjuster adjusting the position of the secondary X-ray detector; an irradiation object surface position detector detecting the position of the surface of the irradiation object; and a controller adjusting the positions of the spectroscopic elements through the spectroscopic element position adjuster to condense the monochromatized beam of pr

Abstract: A lithography device including a soft X-ray source 1 transforming to a quasi-parallel radiation apparatus for placing a mask 3 and a plate-substrate 4 coated with a resist 5, and an absorbing filter 6 for smoothing of intensity decreasing as from the center to the periphery of a beam. The filter 6 is placed between the source 1 and the input face of the half-lens 2. The half-lens has an enlarged capture angle. This angle is chosen depending on radiation energy (0.6-6 keV) of the source 1. As a result, there is an opportunity to increase the size of the plate-substrate.

Abstract: A system includes a plurality of treatment heads, each of the plurality of treatment heads including a radiation source and a radiation-focusing lens. The system also includes a plurality of voltage sources, each of the plurality of voltage sources associated with a respective one of the plurality of treatment heads, and a control device to control an intensity of radiation emitted from each radiation-focusing lens of the plurality of treatment heads in accordance with a treatment plan.

Abstract: Provided is an apparatus for measuring an energy resolving power of X-ray monochromator and a solid sample used for the same. The apparatus comprises an X-ray generator, a monochromator to select a X-ray discharged from the X-ray generator, a main chamber to which the selected X-ray by the monochromator is injected, a solid sample disposed in the main chamber where the selected X-ray is injected for measuring the energy resolving power of the monochromator, and equipments to analyze and handle data obtained from the solid sample while the X-ray is injected to the solid sample. The solid sample is composed of a plurality of atoms, wherein a molecule having at least two atoms exists between the plurality of atoms.

Abstract: There is provided a multilayered spectroscopic device effective to achieve in a short length of time the highly accurate fluorescent X-ray analysis of boron wherein the influence that may be brought about by the interfering X-rays and the background is sufficiently reduced and the strength of reflection of B-K&agr; line is sufficient. In this multilayered spectroscopic device 3, lanthanum (La), an alloy containing lanthanum as a principal component or lanthanum oxide (La2O3) is used for the reflecting layers 31 and boron is used for the spacer layers 32 and the periodic length d is chosen to be within the range of 7 to 14 nm and the film thickness ratio of the reflecting layers 31 to the spacer layers 32 is chosen to be within the range of 2/3 to 3/2. It has a total laminated film thickness t of a value sufficient to allow the strength of reflection of B-K&agr; line to be equal to or higher than 98% of a saturation value.

Abstract: An improved total-reflection x-ray fluorescence (TXRF) apparatus using a doubly-curved optic is presented for use in detecting foreign matter on surfaces, for example, semiconductor wafers. The apparatus includes an x-ray source, a doubly-curved x-ray optic for diffracting and focusing the x-rays, a surface onto which at least some of the diffracted x-rays are directed, and an x-ray detector for detecting resultant x-ray fluorescence emitted by any foreign matter present on the surface One or more apertures may be provided for limiting the dispersion angle of the x-rays. The crystal or multi-layer doubly-curved optic typically adheres to Bragg's law of x-ray diffraction may be curved to a toroidal, ellipsoidal, spherical, parabolic, hyperbolic, or other doubly-curved shape. An apparatus for diffracting x-rays is also presented.

Abstract: Apparatus for X-ray analysis has a combination of a rotating target X-ray tube and a composite monochromator. The composite monochromator has a first and a second elliptic monochromators joined with each other side by side. Each of the elliptic monochromators has a first focal point at which an X-ray focal spot on a target of the X-ray tube is disposed. Each of the elliptic monochromators has a synthetic multilayered thin film whose d-spacing varies continuously along an elliptic-arc. The shortest distance between the X-ray focal spot and the composite monochromator is set to 40 to 100 mm. Under the shortest distance condition, the effective focal spot size on the target is set to 40 to 100 micrometers to obtain the maximum X-ray intensity on a sample to be analyzed.

Abstract: An X-ray diffractometer has an X-ray source (10), a double pinhole collimator (14), a sample (22) mounted on a rotatable sample stage (20), an analyser crystal (30) and a detector (34). The analyser crystal and detector are arranged to rotate together about an axis (21) that is coaxial with the axis of rotation of the sample stage. Very few scattered X-rays (26) reach the detector (34). The diffractometer has particular use for routine quality control measurements.

Abstract: A grating that includes a multilayer structure that has alternating layers of materials, a plurality of grooves formed between a plurality of lands, wherein at least one structural parameter of the plurality of grooves and plurality of lands is formed randomly in the multilayer structure.

Abstract: In the measurement with the focusing method, an X-ray beam from an X-ray source passes through an opening of a path-selection slit device and is narrowed by a divergence slit with a predetermined divergence angle and is thereafter incident upon a sample. The changing operation from the focusing method into the parallel beam method is carried out by turning, by 180 degrees, the path-selection slit device around its axis of rotation and by moving the divergence slit in a direction perpendicular to an X-ray traveling direction. Then, the X-ray beam from the X-ray source is reflected by a multilayer mirror to become a parallel beam and passes through the opening of the path-selection slit device and is thereafter incident upon the sample. Thus, the turning of the path-selection slit device enables the change between the focusing method and the parallel beam method, requiring no re-setting operation for the optical system.

Abstract: An x-ray optical device includes an optic and an adjustable aperture that selectively occludes a portion of an x-ray beam. The adjustable aperture may be positioned between the optic and a sample and may be integrated with the optic or located in close proximity to the optic. The adjustable aperture enables a user to easily and effectively adjust the convergence of the x-rays. In doing so, the flux and resolution of the x-ray optical device can be optimized by using an optic having the maximum convergence allowed for all potential measurements, and then selecting a convergence for a particular measurement by adjusting the aperture.

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a support structure constructed to support a patterning structure. The patterning structure is adapted to pattern a beam of radiation according to a desired pattern. The apparatus also includes a substrate holder that is constructed to hold a substrate, a projection system that is constructed and arranged to project the patterned beam onto a target portion of the substrate, and a downstream radical source that is connected to a gas supply and is configured to provide a beam of radicals onto a surface to be cleaned.