Abstract: A grating that includes a multilayer structure that has alternating layers of materials, a plurality of grooves formed between a plurality of lands, wherein at least one structural parameter of the plurality of grooves and plurality of lands is formed randomly in the multilayer structure.

Abstract: X-ray radiation from conventional electron-impact x-ray sources can be focused to very high intensity using a curved array of silicon wafers or other crystals having a spiral shape. This optic is of use for high-speed radiation treatment, radiosurgery, and radiotherapy.

Abstract: An X-ray focusing apparatus comprises a waveguide (3) closely coupled to an X-ray focusing mirror (5). The mirror comprises an interior reflecting surface having a rotational axis of symmetry. The waveguide may comprise a tapered polycapillary lens.

Abstract: A multilayer mirror 1 that has elliptical reflection faces and provides a divergent angle &dgr; of X-rays, is included. The elliptical reflection faces of the multilayer mirror 1 have two focal points. When an X-ray source 2 is arranged at one focal point A, and X-rays that are diverged from the X-ray source 2 are reflected at the multilayer mirror 1, the reflected X-rays converge on another focal point B. The X-ray source 2 is arranged at one focal point A of the multilayer mirror 1. Additionally, a distance L2 from the center of the reflection faces of the multilayer mirror 1 to another focal point B (in other words, convergent point of reflected X-rays) is set to make a convergent angle &thgr;c of X-rays at the focal point B nearly twice as great as the divergent angle &dgr;. With the above-noted configuration, both small angle resolution and intensity of incident X-rays to a sample may be optimized, and small angle scattering may be performed with high precision.

Abstract: An optical sample X-ray testing apparatus including an X-ray source which is configured to radiate X-rays including a group of line spectra. At least one line spectrum selecting device is provided between the X-ray source and an optical sample and configured to direct substantially one line spectrum among the group of line spectra from the X-ray source toward the optical sample. An optical characteristics finding device is configured to find optical characteristics of the optical sample based on radiation of the substantially one line spectrum through the line spectrum selecting device onto the optical sample.

Abstract: A grating that includes a multilayer structure that has alternating layers of materials, a plurality of grooves formed between a plurality of lands, wherein at least one structural parameter of the plurality of grooves and plurality of lands is formed randomly in the multilayer structure.

Abstract: A method and apparatus for fabricating x-ray optics of the type having a doubly curved crystal lamella attached to a backing plate that is positioned and aligned for use in a spectrometer, monochromator or point-focusing instrument. This method utilizes an apparatus with a removable top and a removable liner; the top containing one or more micrometer screws, and the liner being made of a material to which the bonding agent does not adhere. During fabrication of the optic by pressing the crystal against a doubly curved mold via the viscous bonding agent, excess bonding agent escapes through channels in the liner. The liner is suitably configured so that the completed optic can be easily removed and the mold and fabrication apparatus can be reused many times.

Abstract: An X-ray source is provided for delivering a high intensity X-ray beam with a predefined energy level of monochromatization, intensity and spatial distribution to a desired region of a sample. The source includes a linear accelerator with a thin anode 4, an electron trap 5 for separating an electron beam from an X-ray beam and conditioning optics which direct, shape and monochromatize the X-ray beam. The conditioning optics include a housing 8 within which are contained entrance slits, multi layer Kirkpatrick-Baez mirrors, exit slits, and a stop diaphragm. The invention also include a method of generating X-rays and a method of using them.

Abstract: The invention relates to an X-ray optics arrangement having an X-ray source, one element focussing X-rays and one element reflecting X-rays for the generation of a parallel X-radiation having a small beam cross section of high photon flux density. To solve this problem the X-radiation of the X-ray source is directed with the focussing element upon the convex, parabolic and reflecting surface of the reflecting element, and allowed to be advantageously employed in the X-ray analysis, e.g. with the X-ray diffraction measurement, reflectometry and/or fluoro-chemical analysis.

Abstract: The present invention refers to a refractive arrangement for X-rays, and specially to a lens comprising: a member of low-Z material, said member of low-Z material having a first end adapted to receive x-rays emitted from an x-ray source and a second end from which emerge said x-rays received at said first end. It further comprises a plurality of substantially saw-tooth formed grooves disposed between said first and second ends, said plurality of grooves oriented such that said x-rays which are received at said first end, pass through said member of low-Z material and said plurality of grooves, and emerge from said second end, are refracted to a focal point.

Abstract: An illumination system comprises (a) a first optical element upon which a light beam impinges, where the first optical element has first raster elements that partition said light beam into light channels; (b) a second optical element that receives said light channels, where the second optical element has a second raster elements; (c) an object plane that receives said light channels via said second optical element; and (d) an exit pupil that is provided with an illumination via said object plane. The system is characterized by an assignment of a member of said first raster elements and a member of said second raster elements to each of said light channels to provide a continuous beam path from said first optical element to said object plane for each of said plurality of light channels. The assignment is changeable to provide an adjustment of said illumination in said exit pupil.

Abstract: An x-ray generation apparatus includes an x-ray reflecting mirror and x-ray generation part. The x-ray reflecting mirror is formed on an inner surface of a concave aspheric surface. The x-ray generation part receives at least one incident energy beam. The x-ray generation part is arranged near a focal point including a focal point of a paraboloid, and the x-ray reflecting mirror has at lest one aperture formed in a position except for a part of the concave aspheric surface crossing an axis including the focal point of the concave aspheric surface, and an incident energy beam irradiates the x-ray generation part through the aperture.

Abstract: An X-ray spectrometer having a curved crystal monochromator which diffracts a continuous X-ray beam from an X-ray source to produce a monochromatic X-ray beam. An angle of incidence of the continuous X-ray beam can be changed with respect to the monochromator so as to change the wavelength of the monochromatic X-ray beam which is focused on and taken out from a receiving slit. The X-ray source, the monochromator and the receiving slit must be positioned always on a Rowland circle. The X-ray source and the monochromator can be moved so that the angle of incidence changes, while the receiving slit remains always stationary and the direction of an X-ray path from the center of the monochromator to the receiving slit remains always constant. Such an X-ray spectrometer is usable as an X-ray irradiation system of XAFS (X-ray Absorption Fine Structure) apparatus so that XAFS measurements require no movement of the sample.

Abstract: Mirror substrate consisting of crystal, especially silicon crystal, on which an amorphous layer, especially a quartz glass layer, is applied.

Abstract: The reflectivity of multilayered EUV mirrors tuned for 11-16 nm, for which the two-component Mo/Be and Mo/Si multilayered systems are commonly used, is enhanced by incorporating additional elements and their compounds mainly from period 5 of the periodic table. In addition, the reflectivity performance of the multilayer stacks is further enhanced by a numerical global optimization procedure by which the layer thicknesses are varied for optimum performance in, contradistinction to the constant layer thickness—i.e. constant partition ration—multilayer stacks commonly designed and fabricated hitherto. By incorporating additional materials with differing complex refractive indices in various regions of the stack, or by wholly replacing one of the components (typically Mo), peak reflectivity enhancements of up to 5% for a single reflector are achieved, compared to a standard unoptimized stack. The additional materials used are: Rb, RbCl, Sr, Y, Zr, Ru, Rh, Tc, Pd, Nb and Be.

Abstract: A rotating table 2 that holds a flat neutron lens component 1 and rotates about an axis of rotation Z, a circular-disk type of metal-bonded grinding wheel 3 with tapering surface 3a on the outer periphery thereof, a grinding wheel driving device 4 drives and rotates the grinding wheel around the axis A thereof, an electrode 5 with a surface close to the single tapering surface or the plurality of tapering surfaces of the grinding wheel, a power source 6 that applies an electrolytic voltage between the grinding wheel and the electrode, and a grinding fluid feeder 8 that supplies a conducting grinding fluid between the grinding wheel and the electrode are provided.

Abstract: A multi-layered mirror has a substrate, a first layer of a first substance, a second layer of a second substance. The refractive index of the first substance in a utilized wavelength region is different from that of the second substance. The first and second layers are laminated alternately on the substrate. To obtain a high reflectivity and superior optical characteristics, a multi-layered structure is formed within either the first layer or the second layer using at least two substances whose real parts of the complex indices of refraction in the utilized wavelength region are approximately the same. Alternatively, a layer surface is smoothed before forming a next layer thereon. An exposure apparatus that uses multi-layered mirrors of the present invention uses light with higher efficiency.

Abstract: The invention is an improved energy dispersive x-ray spectrometer comprising x-ray source (10), sample (12), optics (20) and detector (16). The improvement comprises the use of optics using the principle of total external reflection for delivering an increased flux of x-rays onto the detector. These flux concentrating optics are generally shaped as tubes having a figure of revolution as a longitudinal cross section such as a cone, parabola, hyperbola, ellipsoid and others. These optics may also be used as low energy pass filters by incorporating a stop (22) at or near the aperture of the optic. The reflecting surface of the flux concentrator optic may be selected from the group of metals and their alloys, the choice made to optimize the optic's performance.

Abstract: X-ray focusing instrument is provided with an annular analyzing element and a collimator. The analyzing element has an inner periphery. The analyzing element analyzes and reflects X-ray beams incident on the inner periphery. The collimator has a surface and total reflects X-ray beams on the surface to irradiate parallel beams toward a specimen. The collimator is placed within an internal space defined by the inner periphery of the analyzing element. The analyzing element and the collimator are arranged such that the axis of the analyzing element is substantially coincident with the axis of the collimator.

Abstract: Apparatus for guiding X-rays from a radiation source to a measurement object (16) having at least two reflecting areas (18) forming a slit.

Abstract: The present invention provides methods and instruments for focusing and imaging x-rays using grazing incidence optics and medical and microscopic uses thereof.

Abstract: The invention relates to an apparatus for total reflection X-ray fluorescence analysis, which allows a faster and more precise detection of the X-ray fluorescence spectrums of a sample. DRIFT detectors are used in the transducer of the apparatus in which charge carriers created can be accelerated towards a collecting anode of a very small design by a radial component of the electrical field generated by annular electrodes. A faster and more precise measurement of the charge carriers generated in the detector interior is possible due to the low capacitance of the collecting anode. The X-ray fluorescence of a sample can be measured in high-sensitive resolution by an array comprising such DRIFT detectors. The surface concentrations of the different foreign atoms in the sample can be determined in high-sensitivity resolution from the X-ray fluorescence spectrums obtained.

Abstract: An electromagnetic reflector having a multilayer structure where the electromagnetic reflector is configured to reflect multiple electromagnetic frequencies.

Abstract: An electromagnetic reflector having a multilayer structure where the electromagnetic reflector is configured to reflect multiple electromagnetic frequencies.

Abstract: In the production of optical elements, not only flat substrates but also spherical or aspherical substrates are used. The costs of such a substrate can exceed the coating costs by a multiple. Particularly in development work, cost savings may be achieved if a substrate can be used repeatedly. To recover a substrate, it is proposed to provide an interlayer between the substrate and the functional layers, which comprises at least one layer of chromium and one layer of scandium. By immersing the optical element into a hydrochloric acid solution, this interlayer is dissolved, so that the functional layer is also removed from the substrate and the substrate is ready for reuse.

Abstract: An X-ray source is provided for delivering a high intensity X-ray beam with a predefined energy level of monochromatization, intensity and spatial distribution to a desired region of a sample. The source includes a linear accelerator with a thin anode 4, an electron trap 5 for separating an electron beam from an X-ray beam and conditioning optics which direct, shape and monochromatize the X-ray beam. The conditioning optics include a housing 8 within which are contained entrance slits, multi layer Kirkpatrick-Baez mirrors, exit slits, and a stop diaphragm. The invention also include a method of generating X-rays and a method of using them.

Abstract: The reflectivity and thermal stability of Mo/Si (molybdenum/silicon) multilayer films, used in soft x-ray and extreme ultraviolet region, is enhanced by deposition of a thin layer of boron carbide (e.g., B4C) between alternating layers of Mo and Si.

Abstract: The invention provides a system and method for microscopic X-ray fluorescence. An X-ray source, X-ray focusing element and a tapered X-ray opaque focusing aperture provide a focused X-ray spot on a sample. The system translates a sample between an imaging position and a testing position. In the imaging position, the sample is aligned in three dimensions and after alignment, the system automatically translates the sample between the imaging position and the testing position. To avoid collision between the sample and other elements of the system, a position detecting device terminates the sample translation if the sample trips the position detecting device. The focusing aperture of the system has a tapered through opening to block unfocused X-rays and reduce or eliminate a halo effect. To detect low atomic number elements, a detector aperture is vacuum sealed to an X-ray detector and X-ray elements of the system are vacuum evacuated.

Abstract: A system and method for utilizing a radiation source for irradiating a product, the system including an radiation reflector comprised of a low Z, high density material. The reflector is positioned to receive radiation penetrating and exiting the product, and the reflector reflects the radiation back to the product to provide additional irradiation energy to the product.

Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.

Abstract: A system is provided for measuring the polarity and intensity of extreme ultraviolet, soft x-ray, and x-ray radiation. The system comprises a reflective surface, a capillary array, and a detector. The reflective surface is adapted to reflect radiation from a source on to a receiving end of the capillary array. The reflective surface may have a variety of shapes, such as a curved, parabolic shape or a flat shape, for reflecting the radiation in a desired manner. The capillary array may also have a variety of shapes for directing the radiation to the detector, such as a curved shape or a conical shape. The capillaries in the capillary arrays may have an inner diameter that decreases from the receiving end of the array to the emitting end of the array. This increases the flux density of the radiation emitted by the capillary array and helps the detector measure weak radiation.

Abstract: In a projection exposure apparatus used in lithography process for transferring a predetermined pattern formed on a reflection type mask onto a photosensitive substrate, the reflection mask and the substrate are moved relative to each other by a scanning driver, and the illumination optical system located between a radiation light source and the reflection mask includes a field stop located near a position conjugate with the reflection mask. In another embodiment a scanning driver changes the positional relationship between the reflection mask and the projection optical system, or/and between the substrate and the projection optical system. In another embodiment an image of the field stop is formed on the reflection mask by a relay optical system, preferably a catoptric system, forming the predetermined pattern.

Abstract: A method of manufacturing X-ray lenses which transmit X-rays which has a first step of providing a layer of liquid on the flat surface of a first substrate, a second step of arranging numerous pipe-shaped lens components in a row following an axis which extends parallel to the flat surface in the layer of liquid, and a third step of holding the pipe-shaped lens components between the surface of a second substrate having a flat surface and the flat surface of the first substrate, and filling the liquid in spaces formed by the exterior surface of the pipe-shaped lens components and the flat surface of the first substrate or the flat surface of the second substrate. The pipe-shaped lens components can be carbon nanotubes, and the liquid can be a mixture of a solvent and a lubricant such as silicon grease which has had its viscosity reduced.

Abstract: A x-ray apparatus includes an x-ray source, an x-ray optical system, wherein the x-ray optical system extracts x-rays of a specific wavelength from the x-ray source and converts the x-rays into a beam, and an irradiation source that causes radiation to be incident on surfaces of optical elements contained in the x-ray apparatus.

Abstract: An X-ray exposure apparatus extracts exposure X-rays from light called synchrotron radiation from a synchrotron radiation source by an optical path including an X-ray mirror and performs exposure using the extracted X-rays. The X-ray mirror contains a material having an absorption edge in at least one of a wavelength range of less than 0.45 nm and a wavelength range exceeding 0.7 nm, thereby implementing exposure using the X-ray in the range of 0.45 nm to 0.7 nm. The X-ray mirror contains at least one material selected from the group consisting of iron, cobalt, nickel, copper, manganese, chromium, and their alloys, nitrides, carbides, and borides.

Abstract: A soft X-ray projection exposure apparatus has at least one metal mirror in either an illumination optical system or a projection optical system. The mirror includes a metal substrate and a thin film of an amorphous substance formed thereon. The surface of the amorphous substance is polished to optical smoothness. On the surface of the thin film is a multi-layer film that reflects X-rays of a specified wavelength. The metal substrate efficiently dissipates heat to the back surface of the mirror where it can be easily cooled. The mirror has a small shape error and surface roughness, and sufficiently suppresses thermal deformation caused by irradiating electromagnetic radiation such as X-rays or light. In this manner, the soft X-ray projection exposure apparatus achieves a higher through-put of wafers.

Abstract: A method of manufacturing X-ray lenses which transmit X-rays which has a first step of providing a layer of liquid on the flat surface of a first substrate, a second step of arranging numerous pipe-shaped lens components in a row following an axis which extends parallel to the flat surface in the layer of liquid, and a third step of holding the pipe-shaped lens components between the surface of a second substrate having a flat surface and the flat surface of the first substrate, and filling the liquid in spaces formed by the exterior surface of the pipe-shaped lens components and the flat surface of the first substrate or the flat surface of the second substrate. The pipe-shaped lens components can be carbon nanotubes, and the liquid can be a mixture of a solvent and a lubricant such as silicon grease which has had its viscosity reduced.

Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.

Abstract: An apparatus for X-ray analysis of materials advantageously utilizes a parabolic multilayer mirror for parallelizing the X-rays. Moreover, it may be desirable to monochromatize the parallelized radiation, for example by means of a crystal monochromator. According to the invention an influencing device for the X-rays is constructed as a single mechanical unit comprising a combination of an X-ray mirror (46) and a monochromator (48). This unit (66) can be arranged in the analysis apparatus in at least two positions (74, 76) in such a manner that the X-rays travel via the X-ray mirror (46) and the monochromator (48) in the first position (74) whereas the X-rays travel only via the X-ray mirror (46) in the second position (76). Consequently, no separate units comprising only an X-ray mirror or a combination of an X-ray mirror and a monochromator are required, so that a substantial saving in costs is achieved.

Abstract: The present invention provides methods and instruments for focusing and imaging x-rays using grazing incidence optics and medical and microscopic uses thereof.

Abstract: A microfocus x-ray system for producing a quasi-parallel x-ray beam is disclosed which includes an x-ray source, a polycapillary optic and a monochromator. The x-ray system achieves a high rate of x-ray flux, and the angular divergence of the x-ray beam has been reduced. The x-ray system is particularly well suited for use on small macromolecular crystals.

Abstract: An x-ray optical assembly for increasing the intensity of a formed x-ray beam. The optical assembly includes a capillary type optical device and an x-ray reflective mirror device configured and aligned to provide a desirable x-ray crystallography beam. An x-ray beam from an x-ray source enters the individual capillaries of the capillary optical device, where the exit beam intensity is increased. The beam exits the capillary optical device at a particular convergent or divergent angle, and is directed into the mirror device. The mirror device either focuses or collimates the beam to have a small convergent or divergent angle suitable for the sample being analyzed. The mirror device can be any suitable device known in the art, such as a grazing incidence flat mirror device, a grazing incidence bent mirror device, a grazing incidence shaped mirror device or a graded multilayer mirror device.

Abstract: The invention concerns an optical device for radiation with a wavelength ≦160 nm, preferably EUV radiation with

Abstract: An optical sample X-ray testing apparatus including an X-ray source which is configured to radiate X-rays including a group of line spectra. At least one line spectrum selecting device is provided between the X-ray source and an optical sample and configured to direct substantially one line spectrum among the group of line spectra from the X-ray source toward the optical sample. An optical characteristics finding device is configured to find optical characteristics of the optical sample based on radiation of the substantially one line spectrum through the line spectrum selecting device onto the optical sample.

Abstract: The parallel radiation (12) emanating from a sample 4 in a known apparatus for X-ray analysis (for example, for diffraction) is analyzed according to wavelength and focused in a focus 20 by a parabolic multilayer mirror 14. A collimator 28 is positioned around said focus. The resolution of the apparatus can be enhanced by making the angular passage width of the collimator smaller than the maximum range of its reflection angle &agr;max. In accordance with the invention the resolution of the apparatus will be better defined and hence enhanced by implementing the exit collimator 28 in such a way that the angular value for the passage width from every reflecting point A or B of the mirror surface is substantially independent of the position of the reflecting points. Preferably, the exit collimator 28 is implemented in the form of two mutually parallel knife edges which are situated at different distances from the reflecting points of the multilayer mirror.

Abstract: Apparatus and methods are disclosed for producing a flux of X-rays, from a plasma, wherein the flux remains rotationally symmetrical about a propagation axis over a period of use, even if the plasma produce flying debris. The plasma can be generated by a laser-plasma source or a discharge-plasma source, for example. The X-rays produced by the plasma are directed by an optical element to a downstream location. To such end, the optical element is located where it is subject to deposition and accumulation of flying debris from the plasma. The optical element has an axis of rotational symmetry. A rotational actuator is situated relative to the optical element and is configured to rotate the optical element about the axis of rotational symmetry during use. Hence, if deposits of flying debris form on the optical element, the deposits will be rotationally symmetrical and thus have an identical affect on the X-ray flux at any angle about the axis of rotational symmetry.

Abstract: A channel-cut monochromator has at least two kinds of reflecting surface pairs processed on a common single crystal block. Each reflecting surface pair has a first and a second reflecting surfaces between which X-rays are reflected even-number times. The channel-cut monochromator can be rotated around an axis of rotation perpendicular to a reference plane so as to switch the reflecting surface pair which reflects X-rays. An X-ray beam incident on any reflecting surface pair or its extension line is tangent to a common imaginary circle whose center coincides with the axis of rotation. With this structure, the switchover of the reflecting surface pair is accomplished by only the rotation of the channel-cut monochromator around its axis of rotation, so that various X-ray beams reflected by various Miller indices can be taken out selectively. The channel-cut monochromator may have a direct path through which an X-ray beam passes in no contact with any reflecting surface.

Abstract: An x-ray analysis system including a focusing optic for focusing an x-ray beam to a focal point, a first slit optically coupled to the focusing optic, a second slit optically coupled to the first slit, and an x-ray detector, where the focal point is located in front of the detector.

Abstract: A three-dimensional imaging device comprising a stationary monochromatic beam source projecting a beam onto a plurality of reflective mosaic crystals, wherein the plurality of mosaic crystals reflect the beam through a stationary object onto a stationary detector. A way for scanning the object includes moving the entire set of the mosaic crystals linearly along a line in the plane of the crystals, and rotating the entire plurality of crystals about an axis through the stationary beam source while maintaining the plurality of crystals in a fixed relative orientation. A potential application of the invention is to improve the accuracy of mammography in the diagnosis of breast cancer.

Abstract: An X-ray exposure apparatus has a plasma X-ray source for generating X-rays by producing a plasma, and a collimator for converging X-rays that diverge from the X-ray source and reducing a global divergence angle to irradiate a mask with the X-rays. A local convergence angle as seen from one point on the mask is changed by moving the position or angle of the collimator in a direction perpendicular or parallel to the axis of the collimator. The pattern on the mask is transferred to a wafer using X-rays having a convergence angle thus controlled. As a result, controllable parameters are increased and a more suitable resist pattern can be obtained. In addition, process tolerance in terms of exposing finer patterns is improved.