Abstract: A batched materials transferring apparatus includes an elongated drum, a bucket disposed in the drum, and a drive arrangement operable to move the bucket relative to the drum. The drum defines an interior chamber having a longitudinal axis. The drum has a top (or side) opening formed in a first end portion thereof and a bottom opening formed in a second end portion thereof with the top (or side) opening being axially displaced from the bottom opening. The bucket has a side opening formed therein and is slidably movable relative to the drum along the longitudinal axis between the first and second end portions. The drive arrangement is mounted adjacent to the drum and connected to the bucket through one end of the drum.

Abstract: A wafer transfer method and mechanism in a vertical CVD diffusion apparatus and a control device for the method and mechanism. The vertical-type CVD diffusion apparatus has a boat containing many wafers in a horizontal orientation, stacked vertically. Product wafers are transferred to the boat five by five, dummy wafers are transferred five by five or a fraction less than five, and monitor wafers are inserted one by one between a block of the product wafers and another block of the product wafers, or a block of the dummy wafers.

Abstract: A vertical heat-treating apparatus which is effective for preventing dust or fine particles from being attached to a wafer during the loading/unloading or transport of the wafer thereby to manufacture a high-quality wafers. This apparatus comprises a carrier stocker storing a plurality of wafer carriers, a loading/unloading mechanism for transferring the wafers between the wafer carriers and a heat-treating vessel, a plurality of heat-treating furnaces for heat-treating the wafers, a transport mechanism for transporting the heat-treating vessel to and from the vertical heat-treating furnace, and gas supply means for forming a clear gas stream passing exclusively through the loading/unloading mechanism and/or the transport mechanism.

Abstract: A hopper containing fuel pellets for a stove opens downward into a feed trough which extends generally horizontally toward the firebox of the stove. A feed plate is positioned such that pellets from the hopper are supported on the feed plate. The feed plate is reciprocated between a rearward position adjacent to the hopper and a forward position adjacent to the firebox so as to advance pellets toward the firebox. A gate member is mounted adjacent to the end of the feed trough remote from the hopper. The gate member is positioned to be engaged by the feed plate when the feed plate is in its forward position so as to close the feed trough and hopper from the firebox. The mechanism for reciprocating the feed plate normally maintains it in its forward position in which the feed trough and hopper are isolated from the firebox.

Abstract: An aluminium vacuum deposition machine for coating parts of lead frames, having a vacuum chamber containing the lead frames and aluminium to be vaporized. To reduce the incidence of imperfections in the aluminium coatings, a meissner trap is positioned within the vacuum chamber itself rather than or in addition to a meissner trap adjacent to a diffusion pump. Also, to reduce the thermal mass within the chamber, a support jig for the lead frames comprises a pair of end rings and a bracer member joining the end rings and holding them apart. Two pairs of spaced rollers are arranged in the chamber so that each ring rests on a respective pair of rollers, and the rollers are driven so that the support jig is rotated during vacuum deposition.

Abstract: A vertical heat-treatment apparatus is provided with a mechanism for automatically transferring semiconductor wafers from carriers to a boat for a vertical type furnace. The automatic transferring mechanism comprises a port for receiving a plurality of carriers arranged in series in an upright state, a posture change mechanism for changing the posture of wafers in the carriers from the upright state to the horizontal state, a parallel transfer mechanism for transferring the carriers on the boat to the posture change mechanism, a carrier loading/unloading mechanism for loading the carriers on a station, a wafer loading/unloading mechanism for taking out the wafers from the carriers on the station in turn and transferring the taken-out wafers to the boat in turn, and a mounting mechanism for mounting the boat in the furnace. The carrier loading/unloading mechanism and the wafer loading/unloading mechanism are mounted on a common frame and are rotated and lifted at the same time.

Abstract: A surge feeder for feeding refuse material into a furnace comprises a plurality of rollers mounted on a base supporting the rollers above the feed opening to the furnace. A chain and sprocket drive mechanism is mounted to the base and serves to counter-rotatably drive the rollers. Each roller has fixedly mounted thereto at equally angularly spaced apart locations a plurality of generally planar shaped paddles which extend continuously along the length of the roller. The paddles project radially from and alternate in height angularly about each roller.

Abstract: A horizontal/vertical conversion transporting apparatus, wherein a mechanism for variably changing a distance between upper and lower boat hands for clamping an article therebetween is mounted on a conversion arm, the conversion arm is vertically movable along a support arm, and at the same time, the conversion arm is rotatable within the plane of vertical movement.

Abstract: An apparatus is disclosed which can automatically load semiconductor wafers into a vertical type heat treatment furnace and unload treated semiconductor wafers out of the heat treatment furnace. The semiconductor wafer treating apparatus comprises exchange unit for exchanging the semiconductor wafers between the cassette and the wafer boat in a predetermined exchange position, transfer unit for allowing the wafer-held boat to be transported between the exchange position and a respective, vertical type heat treatment furnace and for allowing the transfer of the wafer boat to be effected between the transfer unit and the respective heat treatment furnace, and an elevator unit provided in the heat treatment furnace and adapted to receive the wafer boat from the transfer unit and to load the wafer boat into a vertically erect process tube and unload the wafer boat from the process tube.

Abstract: The invention relates to an apparatus for automatically feeding each of a sequence of crucibles (3), which are arranged on a conveyor, to a test oven (12) for vaporization and content analysis of a sample contained in each crucible. For cradling each crucible, a gripper head (13) is provided. In order to provide an apparatus in which the number of mechanically moving parts is minimized, the gripper head is rigidly mounted on the end of an operating piston (7). The gripper head preferably comprises two spaced, co-linear crosspieces (16) which face each other and engage under an outwardly extending circumferential flange (17) on the top of each crucible (3). The operating piston (7) and a lifting piston (6) are oriented vertically and connected together at their tops by a transverse crossbar (10). Lifting piston (6) is rotated about its axis (8) by a drive motor, thereby revolving operating piston (7) along a circle (11).

Abstract: A heat-treating apparatus includes a furnace for heat-treating wafers, installed so as to set its longitudinal direction vertically and having an opening which is formed in its lower end so as to allow a boat having semiconductor wafers mounted thereon to be loaded, a heat-insulating cylinder on which the boat is placed and which is adapted to keep the boat hot, a lifting unit for lifting and loading the boat and the heat-insulating cylinder into the furnace, and for lowering and unloading them from the furnace, a moving unit for pivoting the heat-insulating cylinder and retracting the cylinder from below the boat, and a handler unit for supporting and vertically moving the boat. After the wafers are heat-treated, the boat is moved downward by the lifting unit. The heat-insulating cylinder is retracted from below the boat by the moving unit while the boat is supported by the handler unit. Subsequently, the boat is further lowered by the handler unit so as to completely remove the boat from the furnace.

Abstract: A wafer transfer mechanism used for transferring wafers between cassettes and a boat uses sensors to detect and to measure any offset of the actual center of each wafer being transferred with respect to the expected or precalibrated center of that wafer. An appropriate adjustment is made to effectively eliminate such offset so that each wafer can be transferred throughout the system without any edge contact between a wafer and the boat or the cassette. The system also includes a boat exchange unit having a rotatable turntable which is used in association with two boats. The boat exchange unit permits a continuous mode operation in which one boat can be undergoing a loading or unloading of wafers at one station on the turntable while another boat is at or is moving to or from a heating chamber loading or unloading station on the turntable.

Abstract: A vertical furnace for heat-treating a semiconductor is capable of effectively and safely accomplishing the heat-treating of a semiconductor. The vertical furnace includes a furnace section which is opened at the lower end thereof to allow a boat for supporting a semiconductor thereon to be introduced and removed through the lower opened end with respect to the furnace section. Also, a vertical furnace is adapted to effectively prevent a semiconductor from being polluted by dust in an operation space.

Abstract: A loading device for a horizontal continuous furnace for the heating of glass plates comprises a roller conveyer (6) as part of a continuous conveying system. Support strips (12-15, 32-35) can be lowered and are arranged between conveying rollers (7) of the roller conveyer at a feed station (A). The glass plates (2, 3, 4, 5) are placed on the raised support strips (12-15, 32-35) and are lowered onto the conveying rollers at a preset time by simultaneous lowering of all support strips. Each support strip (12-15, 32-35) is supported independently of the other support strips on separate lifting devices (16-19, 36-39). These lifting devices (16-19, 36-39) are controlled by reflecting photoelectric barriers (22-25, 42-45) respectively dedicated to each support strip such that each support strip (12-15, 32-35) is individually raised to an upper position as soon as a glass plate transferred to the conveying rollers (7) has left the area of that support strip.

Abstract: A rotary kiln is charged with pneumatic tires by a lock chamber which carries two gates adapted to be opened in alternation. To ensure a desirable charging operation, the lock chamber provides a runway downwardly inclined towards the kiln inlet and having a length which is at least twice the tire diameter. The gate at the receiving end of the lock chamber is provided with a tire holder for holding each tire in a position for rolling on the runway. The tire holder comprises a gripping device having two gripping jaws operable to move in mutually opposite directions and engageable with the side wall of a pneumatic tire. The gripping jaws are mounted to be adjustable in a direction parallel to the runway and transversely to the direction of travel of the tire on the runway.

Abstract: An industrial furnace, for instance a heating and/or reducing furnace, arranged to treat material in powder or in small pieces and having a chamber with refractory walls to which energy is supplied by electric means and/or by combustion and into which the material to be treated is charged. The material is moved forward from an inlet orifice to a discharge orifice by a member provided with teeth which are preferably hollow and are cooled by water, air or vapor circulation.

Abstract: A system for minimizing manual handling of tobacco leaves for bulk cure comprises a container for use in forced air curing of tobacco in bulk, a kiln having a floor arrangement to effect better control of air flow in achieving forced air cure in such containers and apparatus to facilitate handling of containers from the field, placement in and removal from a kiln. The bulk cure container sidewalls have a plurality of projections to define internally of the container a plurality of obstructions which impede the flow of air along container sidewall interior filled with tobacco in bulk form. The kiln has a floor arrangement which provides a plurality of cavities adapted to sealingly engage container bottoms. The apparatus for handling the containers includes a mobile frame supporting a pair of spaced-apart rails. Such rails cooperate with corresponding pairs of rails in kiln so as to be interconnectable therewith.

Abstract: The furnace is circular in plan and comprises an annular charge space charged through chutes in its top wall. Effluent gas offtakes are provided in the furnace outer wall and the level of the charge bed is maintained above the chute bottoms but below those offtakes. Hot gases generated externally of the furnace pass into it through an opening in its bottom wall or hearth and travel upwardly through the charge. Solids are discharged downwardly through the same opening in counterflow. A vertical axle is journalled centrally in an upper wall of the annular furnace chamber spaced above the opening in the hearth, and a plow affixed to the lower end of the axle rotates in an open space between the hearth of the annular furnace chamber and its inside wall, so scraping heated charge solids into the discharge opening. The axle is pressure sealed to the wall through which it passes, and that seal is the only rotating seal required for the furnace.