Abstract: A method of forming a liquid film characterized by dropping a liquid on a substrate from a dropping unit while rotating the substrate, moving the dropping unit in the radial direction from the inner periphery of the substrate to the outer periphery of the substrate so that the move pitch of the dropping unit in the radial direction occurring in every revolution of the substrate may change slightly, and forming a liquid film on the substrate by adjusting the feed speed of the liquid to the substrate from the dropping unit, while lowering the rotational frequency of the substrate gradually, so that the liquid on the substrate may not move due to centrifugal force by rotation of the substrate, along with the move of the dropping unit in the radial direction of the substrate.

Abstract: A system and method for uniform deposition of material layers on wafers in a rotating disk chemical vapor deposition reaction system is provided, wherein a plurality of wafers are rotated on a susceptor at a first rate around a first axis by a first motor, and the plurality of wafers rotate independently exhibiting planetary motion at a second rate through application of a vibrational force from a vibration source in a direction transverse to the first axis of rotation.

Abstract: A method for producing a fluorine-containing polyimide film excelling in heat resistance, resistance to chemicals, water repellency, dielectric properties, electrical properties, and optical properties and a spin coater suitable for the method are to be provided. A method for the production of a fluorine-containing polyimide film which comprises forming a coating film of a fluorine-containing polyimide precursor in an atmosphere having a relative humidity thereof adjusted to a level of not more than 50 RH % and then subjecting the fluorine-containing polyimide precursor to heat treatment thereby forming a fluorine-containing polyimide film is provided. By adjusting the relative humidity in accordance with this method, the fluorine-containing polyimide precursor can be prevented from being decomposed by the absorption of moisture and consequently prevent effectively the fluorine-containing polyimide film from forming piriform spots and scratches.

Abstract: A liquid treatment apparatus treating a surface of a substrate held generally horizontally on a stage in a housing by supplying a treating liquid to said surface from a supply nozzle. The liquid treatment apparatus includes a cup body provided so as to surround the substrate held in the substrate holding part laterally, the cup body being mounted detachably to a base inside the housing from an upward direction thereof; a cup body holding part holding the cup body detachably; and an elevating mechanism moving the cup body holding part up and down between a first position at which the cup body is mounted upon the base body and a second position located above the first position.

Abstract: A method of preparing a coating solution, comprising the steps of providing a first solution comprising a lower alcohol; a polyethylene glycol; a complexing agent; and water; providing a second solution comprising a higher alcohol; and at least one metal alkoxide, wherein the metal in said at least one metal alkoxide is selected from the group consisting of zirconium, aluminium, titanium, tantalum and yttrium; forming a sol-gel solution by mixing said first and second solutions and thereby hydrolyzing said at least one metal alkoxide to a metal oxide and an alcohol; forming a concentrated solution by removing said lower alcohol and the alcohol resulting from the hydrolysis of said at least one metal alkoxide; and forming a coating solution by adding a medium alcohol to said concentrated solution.

Abstract: A method of fabricating semiconductor integrated circuits includes (1) providing a spin-on tool comprising a rotatable platen for holding and spinning a wafer disposed thereon, a fluid supply system for providing spin-on solution onto the wafer, and a detector fixed in a position above the wafer, wherein the wafer has a radius R; (2) spin-on coating the wafer by depositing the spin-on solution onto surface of the wafer from its center and spinning-off to leave a spin coat material layer; and (3) spinning the wafer and scanning the spin coat material layer by impinging an incident light beam emanated from the fixed detector and detecting a reflected light beam.

Abstract: Apparatus and method for heating a substrate in a bath containing a heated liquid inside a vessel of a thermal processing system. The liquid in the bath is heated and the substrate is brought into contact with the liquid in the bath. The substrate is heated to a process temperature by transferring heat energy from the heated liquid in the bath to the substrate. The substrate is removed from the heated liquid and dried before subsequent processing steps.

Abstract: An edge bead removal device for a spin coater apparatus and methods of edge bead removal that overcome the deficiencies of conventional edge bead removal techniques. The edge bead removal device includes a coater cup and a head situated within the coater cup proximate to a peripheral edge of a substrate. The head is movable in a radial direction relative to an azimuthal axis of a rotatable substrate support inside the coater cup. The position of the head relative to a rim of the peripheral edge is mapped using an optical sensor. When the substrate support rotates the substrate and the head is used to dispense edge bead removal chemical, the radial position of the head is adjusted, as guided by the map, relative to the azimuthal axis to maintain a constant gap between the head and the substrate's peripheral rim.

Abstract: Method of controlling the morphology of self-assembled monolayers (SAMS) on substrates having hydrophilic surfaces. The hydrophilic surface is exposed to a fluid having a mixture of molecules which can self-assemble on the hydrophilic surface and hydrophobic molecules for a sufficient length of time so that the molecules which can self-assemble on the hydrophilic surface form a complete self-assembled monolayer. In a particular embodiment octadecylphosphonic acid (OPA) molecules have been self-assembled on oxidized substrates including but not limited to mica, silicon, sapphire, quartz and aluminum by spin-coating a solution containing the octadecylphosphonic acid (OPA) molecules and hydrophobic molecules such as chloroform or trichloroethylene under a controlled relative humidity. Control of the morphology of OPA SAMs is affected by adjusting humidity and the duration of spin-coating. Atomic force microscopy revealed that relative humidity has a profound influence on the morphology of the OPA SAMs formed.

Abstract: A method of cleaning a spin coater apparatus is provided. In one embodiment, the method comprises providing a spin coater apparatus having a coater cup comprising a basin with sidewalls, a rotatable platform situated inside the cup adapted for holding and rotating a wafer to be coated, and a solvent dispensing means mounted under the rotatable platform; placing the substrate on the rotatable platform; rotating the rotatable platform; continuously dispensing a cleaning solvent from the solvent dispensing means to rinse the backside of the wafer with the cleaning solvent and to pre-wet an interior surface of the sidewalls; and dispensing a coating material upon the wafer, the substrate mounted on the rotatable platform.

Abstract: A compositions containing A) a silane-grafted, largely amorphous poly-? olefin which contains no organically bound chlorine, B) a ketone resin, ketone/aldehyde resin and/or urea/aldehyde resin and/or their hydrogenated derivatives, C) a solvent and D) optionally an auxiliary and/or additive, can be used as primers for promoting the adhesion of coating materials such as paints, varnishes, adhesives, sealants and inks, including printing inks, for example, to plastics, wood, paper, metals, glass, ceramics and concrete.

Abstract: The present invention supplies a solvent to the front surface of a substrate while rotating the substrate. Subsequently, the substrate is acceleratingly rotated to a first number of rotations, and a resist solution is supplied to a central portion of the substrate during the accelerating rotation and the rotation at the first number of rotations. Thereafter, the substrate is deceleratingly rotated to a second number of rotations, and after the number of rotations of the substrate reaches the second number of rotations, the resist solution is discharged to the substrate. The substrate is then acceleratingly rotated to a third number of rotations higher than the second number of rotations so that the substrate is rotated at the third number of rotations. According to the present invention, in application of the resist solution by spin coating, the consumption of the resist solution can be suppressed, and a high in-plane uniformity can be obtained for the film thickness of the resist film.

Abstract: An exemplary glue dispensing process is provided. A lens module including a lens barrel and an annular spacer received in the lens barrel is provided. The lens module is rotated around a central axis of the lens barrel in a manner such that rotational speed of the lens module is variable in an initial stage and is essentially constant in a subsequent steady stage. Whether the rotational speed of the lens module is in the initial stage or the subsequent steady stage is then detected. A first operating pressure and a second operating pressure different from the first operating pressure are applied onto the glue to dispense the glue onto the spacer during one revolution of the lens module, corresponding to both the rotational speed of the initial stage and the subsequent steady stage.

Abstract: In the present invention, a substrate is first rotated at a first rotation speed, and a resist solution is applied to the rotated substrate. Subsequently, the rotation of the substrate is decelerated to a second rotation speed lower than the first rotation speed so that the substrate is rotated at the low speed to smooth the resist solution on the substrate. The rotation of the substrate is then accelerated to a third rotation speed higher than the second rotation speed, and a solvent for the coating solution and/or a dry gas are/is supplied to the resist solution on the substrate. In this event, the solvent gas is supplied to a portion of the resist solution on the substrate thicker than a set thickness, and the dry gas is supplied to a portion of the coating solution on the substrate thinner than the set thickness. This thins the thicker portion of the resist solution and thickens the thinner portion to uniform the resist solution.

Abstract: Methods of Using Preformed Nanotubes to Make Carbon Nanotube Films, Layers, Fabrics, Ribbons, Elements and Articles are disclosed. To make various articles, certain embodiments provide a substrate. Preformed nanotubes are applied to a surface of the substrate to create a non-woven fabric of carbon nanotubes. Portions of the non-woven fabric are selectively removed according to a defined pattern to create the article. To make a nanofabric, a substrate is provided. Preformed nanotubes are applied to a surface of the substrate to create a non-woven fabric of carbon nanotubes wherein the non-woven fabric is substantially uniform density.

Abstract: Disclosed is a probe card for imager devices, and methods of fabricating same. In one illustrative embodiment, a method of forming a probe card includes performing at least one etching process to define a plurality of light openings in a body of the probe card and forming a plurality of probe pins extending from the body. In another illustrative embodiment, a probe card that includes a body, at least one light opening formed in the body and at least one light conditioning device positioned within the at least one light opening is disclosed.

Abstract: There is provided a plating apparatus and method which can control the temperature of a plating solution during plating more uniformly and easily form a uniform plated film on the to-be-plated surface of a workpiece, and which can simplify the device and decrease the footprint. The plating apparatus includes a plating bath having a double bath structure including an inner bath for holding a plating solution and carrying out plating, and an outer bath which surrounds the inner bath and is in fluid communication therewith. A heating device is disposed in the outer bath. The plating apparatus may further include means for circulating or stirring the plating solution in the plating bath.

Abstract: A surface processing method includes supporting a wafer in a vacuum chamber and generating a plasma in a confined portion of the chamber over only a selected portion of the wafer to thereby perform a surface processing treatment (e.g., an ashing process) on the selected portion of the wafer. While the plasma is being generated, the wafer and the confined portion of the chamber are displaced with respect to one another to thereby perform the surface processing treatment on a second selected portion of the wafer.

Abstract: A method and apparatus of coating a polymer solution on a substrate such as a semiconductor wafer. The apparatus includes a coating chamber having a rotatable chuck to support a substrate to be coated with a polymer solution. A dispenser to dispense the polymer solution over the substrate extends into the coating chamber. A vapor distributor having a solvent vapor generator communicable with the coating chamber is included to cause a solvent to be transformed into a solvent vapor. A carrier gas is mixed with the solvent vapor to form a carrier-solvent vapor mixture. The carrier-solvent vapor mixture is flown into the coating chamber to saturate the coating chamber. A solvent remover communicable with the coating chamber is included to remove excess solvent that does not get transformed into the solvent vapor to prevent the excess solvent from dropping on the substrate.

Abstract: A dummy dispense of liquid is controlled by recording a time at which a substrate is processed; recording a time at which a liquid is dispensed; comparing the time at which the substrate is processed and the time at which the liquid is dispensed to generate a dummy dispense signal when a dummy dispense is required. A system for controlling dummy dispense of liquid includes at least one information storage device storing a time at which a substrate is processed and a time at which a liquid is dispensed. At least one processor compares the time at which the substrate is processed and the time at which the liquid is dispensed to determine whether a dummy dispense is required.

Abstract: A coating and developing apparatus comprises a process block which forms a resist film on a wafer, then transfers the wafer to an exposure apparatus, and performs a developing process on the wafer after exposure, and an interface transfer mechanism provided between the process block and the exposure apparatus. The process block includes unit blocks for coating-film formation and unit blocks for development laid out in a stacked manner. When an abnormality occurs in the interface transfer mechanism, an ordinary process in the unit block for coating-film formation is performed on those substrates which are present in that unit block for coating-film formation, after which processed wafers are retreated to a retaining unit and transfer of any wafer into the unit block for coating-film formation is inhibited.

Abstract: A polymerization process is provided using a mixture of a solvent, a monomer, an oxidizing agent, and a moderator. The mixture is coated on a substrate and heated to initiate oxidative polymerization. At least one of three process conditions is used: the solvent having a boiling point in excess of about 120° C.; the total concentration of the monomer, the oxidizing agent, and the moderator being at least about 40% by weight; and the molar concentration of the moderator being greater than the molar concentration of the monomer.

Abstract: This invention relates to materials and processes for the preparation of high quality layers, for example for the fabrication of optical devices such as waveguides. In particular, the invention relates to the use of low volatility polymer materials for the deposition of high quality layers on large area substrates via a two-stage process, for example extrude-and-spin.

Abstract: An apparatus for introducing a testing material into an optical disc production includes a vessel for holding a test material and a regulator for pressurizing the vessel, wherein the vessel and regulator are connectable to a disc production for using the test material in lieu of bonding material in the disc production.

Abstract: The invention describes a method or methods to create, or extend a two-dimensional (two-dimensional) electronic delocalization of a deposited solution processible material by energetic and/or chemical means for use in electronic devices. The process allows for a high degree of tunability in the extent of delocalization that occurs. Therefore the electronic properties can be tailored to various electronic target applications such as thin film transistors and photovoltaic devices.

Abstract: Methods for forming data storage media and the media formed thereby are disclosed herein. In one embodiment, the method for forming a data storage media, comprises: injection molding a substrate comprising surface features, wherein said surface features have greater than about 90% of a surface feature replication of an original master; and disposing a data layer over at least one surface of said substrate; wherein said data storage media has an axial displacement peak of less than about 500? under shock or vibration excitation.

Abstract: The present invention wets the front surface of a substrate with a solvent in advance, then accelerates the substrate to a first number of rotations lower than a range of the numbers of rotations where a turbulence occurs on the front surface of the substrate, and starts supply of a resist solution to the central portion of the substrate during the acceleration to thereby apply the resist solution while spreading the resist solution outward on the substrate. Thereafter, the substrate is decelerated to a second number of rotations to adjust the distribution of the film thickness of the resist solution within a plane, and accelerated to a third number of rotations lower than the first number of rotations and higher than the second number of rotations to shake off the remaining resist solution.

Abstract: A liquid processing apparatus is arranged to planarize a film on a substrate by supplying onto the film a process liquid for dissolving the film while rotating the substrate. The apparatus includes a substrate holding member configured to rotatably hold the substrate in a horizontal state, a rotation mechanism configured to rotate the substrate holding member, and a liquid supply mechanism configured to supply the process liquid onto a surface of the substrate. The liquid supply mechanism includes first and second liquid delivery nozzles configured to deliver the same process liquid. The first liquid delivery nozzle has a smaller diameter and provides a smaller delivery flow rate, as compared to the second liquid delivery nozzle. The first liquid delivery nozzle is inclined to deliver the process liquid in a rotational direction of the substrate, and is movable between a center of the substrate and a peripheral edge thereof.

Abstract: A liquid coating apparatus and method for spraying a liquid on a wafer. The liquid coating apparatus may include a nozzle unit spraying the liquid on the wafer and moving relative to the wafer and a laminar flow forming unit forming a forced air flow around the nozzle unit. Though a wake may be formed around the nozzle unit by a movement of the nozzle unit, the laminar forming unit may reduce and/or minimize an influence of the wake.

Abstract: A slurry coating composition is described, which is very useful for enriching the surface region of a metal-based substrate with aluminum. The composition includes colloidal silica and particles of an aluminum-based powder, and is substantially free of hexavalent chromium. The slurry may include colloidal silica and an alloy of aluminum and silicon. Alternatively, the slurry includes colloidal silica, aluminum or aluminum-silicon, and an organic stabilizer such as glycerol. The slurry exhibits good thermal and chemical stability for extended periods of time, making it very useful for industrial applications. Related methods and articles are also described.

Abstract: A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with either of a case where antireflection films are formed and where any antireflection film is not formed. Film forming unit blocks: TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks: DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively where antireflection films are formed and any antireflection film is not formed. The coating and developing system is controlled by a carrying program and software.

Abstract: An infrared transmissive article includes an infrared transmissive substrate and a single layer anti-reflective (AR) composite broadband sol gel coating on a surface of the substrate. The AR coating includes a first chalcogenide including compound, and a second chalcogenide including compound intermixed with the first chalcogenide including compound. The percentages of the first chalcogenide and the second chalcogenide in the AR coating are selected to provide a refractive index of the AR coating that approximates the square root of a refractive index of the substrate.

Abstract: In the present invention, a plurality of heat treatment plates are provided side by side in a linear form on a base of a heat treatment apparatus in a coating and developing treatment system. In the heat treatment apparatus, three transfer member groups are provided which transfer a substrate in zones between adjacent heat treatment plates. At the time when performing a pre-baking treatment in the heat treatment apparatus, the substrate is transferred in order to the heat treatment plates at the same temperature, whereby the heat treatment is dividedly performed on the heat treatment plates. According to the present invention, substrates are subjected to heat treatment along the same route, so that the thermal histories are made uniform among the substrates.

Abstract: A method for making transparent continuous zeolite film is provided. First a transparent precursor sol is prepared, and the precursor sol is processed to a specific concentration. The precursor solution is coated on a surface of a substrate which is heated under an ambiance of 120˜250° C. in temperature and a humidity less than saturated humidity. The packing of zeolite nanocrystals in the film converted from coated precursor sol has preferred orientation and the film shows super-hydrophobic property.

Abstract: A shower head processes a wafer with a plate having a plurality of nozzles positioned thereon, each of the nozzles assigned to one of a plurality of processing zones for the wafer; and a manifold assembly coupled to each of the nozzles to control one or more of the nozzles as a group in each processing zone.

Abstract: Heterolayered thin films having ferroelectric/piezoelectric layers of alternating crystal structures and methods of their preparation are provided. In the ferroelectric/piezoelectric thin film, a first layer has a rhombohedral crystal structure and a second layer adjacent the first layer has a tetragonal crystal structure. The layers have a (100) preferred orientation with ?-axis normal to the surface of the film. The first layer can be a Zr-rich lead ziroconate titanate layer (e.g., PbZr0.8Ti0.2O3) and the second layer can be a Ti-rich PZT layer (e.g., PbZr0.2Ti0.8O3). Heterolayered ferroelectric/piezoelectric thin film comprising a plurality of such first and second layers in alternating sequence exhibits particularly improved electrical properties.

Abstract: An information layer for an optical information storage medium is formed in a centrifuge. A photopolymerizable composition is applied to a solid base having a relief pattern, and a flexible, transparent film layer is applied on top of the composition. The three are spun in a centrifuge to cause a thin, even distribution of the photopolymerizable composition, which is photopolymerized. The resulting replica is separated from the relief pattern and has a fluorescent material applied thereto. Alternatively, the replica has a non-fluorescent material applied thereto, and the non-fluorescent material is made fluorescent through diffusion. Multiple information layers thus formed can be glued together to form a multilayer optical information storage medium.

Abstract: A thermal cracking chemical vapor deposition method for synthesizing a nano-carbon material is provided. The method includes steps of (a) providing a substrate, (b) spreading a catalyst on the substrate, (c) putting the substrate into a reactor, (d) introducing a carbon containing material, and (e) heating the carbon containing material, thereby the carbon containing material being cracked to provide a carbon source for forming the nano-carbon material on the substrate.

Abstract: Among the methods provided is a method of coating the interior of a pipe comprising: providing a pipe having an interior surface; providing a cement composition comprising a cement component and high tensile strength fibers and/or a multi-purpose cement additive; coating the cement composition onto the interior surface of the pipe; and allowing the cement composition to set.

Abstract: A closed-loop system and process is used for applying fire retardant chemicals to fibers. Fibers are preferably positioned in a vessel such as a dye machine which circulates the fire retardant chemicals. After absorption of the fire retardant composition, non-absorbed fire retardant chemicals are recovered and re-used on subsequent batches of fibers. Recovery can be achieved by directing the non-absorbed fire retardant composition into a second dye machine containing additional fibers, or by extracting the fire retardant composition by centrifugation or other means, or by a combination of the two processes. The process is environmentally friendly, and allows for higher throughput on impregnating fibers with fire retardant chemicals.

Abstract: An fountain applicator for applying coating liquid onto a web of paper carried past the applicator, has a coating liquid flow path that includes a curved surface along which a sheet of the coating liquid is flowed to subject the sheet to centrifugal force to cause air entrained in the coating liquid to move away from one side of the sheet that is toward the curved surface, so that the one side is relatively free of entrained air. After being flowed along the curved surface, the sheet of coating liquid is directed toward the web in a free standing jet curtain of coating liquid, to contact the web surface primarily with the one relatively air-free side of the coating liquid sheet to decrease the occurrence of skip coating on the web surface, especially when the web is traveling past the applicator at high speeds. The coating is applied in excess onto the web surface and is metered and leveled to a desired coat weight by a downstream doctor.

Abstract: In drying a coating liquid such as a resist applied to a substrate under reduced pressure, a coating film in a peripheral portion tends to lose good shape regardless of duration of a drying period, and it is difficult to set an appropriate exhaust flow rate. After the substrate is loaded in an airtight container, a pressure is reduced from atmospheric pressure to a pressure slightly higher than the vapor pressure of a solvent, for example. Then, the solvent actively evaporates from the coating liquid. Here, evacuation is performed initially based on a first flow rate set value Q1, and thereafter, it is performed based on a second flow rate set value larger than Q1. Rounding of the surface in the peripheral portion is corrected by evacuation based on Q1, and more active evaporation of a solvent component is attained by switching to Q2.

Abstract: A method of and apparatus for mixing chemicals in a single wafer process. According to the present invention a chemical is fed into a valve system having a tube of a known volume. The chemical is fed into the valve system to fill the tube with a chemical to generate a measured amount of the chemical. The measured amount of chemical is then used in a single wafer process.

Abstract: Prior to transfer of an wafer W, a mixed gas is being generated and exhausted, thereby fluctuation of concentration and temperature of a solvent component at the beginning of gas introduction into a chamber 3 is suppressed. A step of gelling after the wafer W is carried into an aging unit is divided into several steps. Until a temperature of the wafer W reaches a predetermined treatment temperature, an average concentration of the solvent component in a mixed gas is gradually raised relative to the temperature of the wafer W. Thereby, immediately after the wafer W is transferred into a sealed chamber, the gas of the solvent component is prevented from condensing.

Abstract: A preferred embodiment of the invention provides a method of spin coating a liquid, such as a resist, onto a surface of a substrate. An embodiment of the invention comprises dispensing a liquid onto the surface; spinning the substrate at a first rotational velocity at least until the liquid forms a substantially uniform film on the surface of the substrate; and spinning the substrate at a second rotational velocity in an opposite direction at least until the liquid reforms a substantially uniform film on the surface of the substrate. Other embodiments include a first rotational acceleration for accelerating the substrate to the first rotational velocity, and a second rotational acceleration for accelerating the substrate to the second rotational velocity. Preferably, the second rotational acceleration is much larger than the first rotational acceleration. Still other embodiments include repeating the first velocity, second velocity sequence one or more times.

Abstract: A method for manufacturing thin-film magnetic head sliders is disclosed. Initially, an elastic layer, which may be made of poly-dimethyl siloxane (PDMS), is spun on a wafer and is thermally cured. Then, a resist layer is spun on the elastic layer. Both the resist layer and the elastic layer are subsequently peeled off together from the wafer. Next, the peeled resist layer/elastic layer is applied onto a group of magnetic heads with the resist layer in direct contact with the magnetic heads. Finally, the elastic layer is peeled off from the resist layer such that the resist layer remains attaching to the magnetic heads.

Abstract: A method for making a thin-film electrode, either an anode or a cathode, by preparing a precursor solution using an alkoxide reactant, depositing multiple thin film layers with each layer approximately 500–1000 ? in thickness, and heating the layers to above 600° C. to achieve a material with electrochemical properties suitable for use in a thin film battery. The preparation of the anode precursor solution uses Sn(OCH2C(CH3)3)2 dissolved in a solvent in the presence of HO2CCH3 and the cathode precursor solution is formed by dissolving a mixture of (Li(OCH2C(CH3)3))8 and Co(O2CCH3).H2O in at least one polar solvent.

Abstract: The present invention relates to a processing method for processing a substrate, and comprises a step of coating a coating solution on a surface of the substrate while relatively moving a coating solution discharge nozzle and the substrate and discharging the coating solution from the nozzle onto the substrate. Thereafter, the substrate is exposed to a solvent atmosphere of the coating solution or the pressure is temporarily applied thereto in a container. Thereafter, the pressure inside the container in which the substrate is housed is reduced to dry the coating solution on the substrate. According to the present invention, it is possible to narrow the so-called edge cutting width, which is at a periphery part of the substrate and is not commercialized, and to maintain an in-plane uniformity of the coating film.

Abstract: Patterned articles can be prepared by applying a release polymer to a substrate in a desired pattern, applying a substrate-adherent polymer over the pattern and substrate, and mechanically removing the substrate-adherent polymer from the pattern without requiring solvent. Suitable mechanical removal methods include applying adhesive tape to the substrate-adherent polymer and peeling the tape and substrate-adherent polymer away from the pattern, and abrading the substrate-adherent polymer from the pattern using impact media.

Abstract: Disclosed is a disc-shaped recording medium manufacturing method capable of making it difficult to leave the cutting wastage produced upon forming a notch for exfoliating a stamper on a disc-shaped substrate in the case of adopting a stamper-based transfer method, and surely forming the notch to improve a manufacturing yield. This disc-shaped recording medium manufacturing method is that a spacer layer having recording faces on both surfaces thereof is formed between the disc-shaped substrate and the stamper, a notch is formed in the vicinity of an outer peripheral edge of the stamper by a rotary blade of a circle cutter, and the stamper is exfoliated through the notch while the spacer layer stays on the disc-shaped substrate.