Abstract: A method for operating a chemical deposition chamber is disclosed. First, a digital liquid flow controller is provided to guide a precursor fluid into a chemical deposition chamber. Then, a pre-cleaning step is performed in the chemical deposition chamber. Later, a pre-tuning step is performed on the digital liquid flow controller so that the precursor fluid can be substantially stably guided into the chemical deposition chamber. Afterwards, the chemical deposition chamber is used to carry out the chemical deposition.

Abstract: Depositing one or more layers of material on a substrate using atomic layer deposition (ALD) followed by surface treating the substrate with radicals of inert gas before subjecting the substrate to further deposition of layers. The radicals of the inert gas appear to change the surface state of the deposited layer to a state more amenable to absorb subsequent source precursor molecules. The radicals of the inert gas disconnect bonding of molecules on the surface of the substrate, and render the molecules on the surface to have dangling bonds. The dangling bonds facilitate absorption of subsequently injected source precursor molecules into the surface. Exposure to the radicals of the inert gas thereby increases the deposition rate and improves the properties of the deposited layer.

Abstract: Methods and hardware for depositing thin conformal films using plasma-activated conformal film deposition (CFD) processes are described herein. In one example, a method for forming a thin conformal film comprises, in a first phase, generating precursor radicals off of a surface of the substrate and adsorbing the precursor radicals to the surface to form surface active species; in a first purge phase, purging residual precursor from the process station; in a second phase, supplying a reactive plasma to the surface, the reactive plasma configured to react with the surface active species and generate the thin conformal film; and in a second purge phase, purging residual reactant from the process station.

Abstract: A method of fabricating a low-k dielectric material with increased cohesive strength for use in electronic structures including interconnect and sensing structures is provided. The method includes the deposition of the dielectric material from a first precursor which is an carbosilane or an alkoxycarbosilane molecule.

Abstract: A glass product includes a glass substrate, and a metallic nano-network layer embedded and continuously extending in the glass substrate. A method for producing the glass product is also disclosed.

Abstract: Provided is a process for producing a dyed plastic lens in accordance with which in accordance with which deformation and change in the color of the plastic lens can be suppressed and a plastic lens having a refractive index of 1.7 or greater and, in particular, a refractive index of 1.7 to 1.8, can be preferably dyed uniformly to a great density without unevenness.

Abstract: In one embodiment, an article includes a surface; a metallic layer including a first metal and contacting the surface; and an oxide layer including an oxide of a second metal different from the first metal and contacting the metallic layer. The article may further include a polymer layer contacting the surface of the oxide layer directed away from the article surface. In certain instances, the article is a vehicle wheel.

Abstract: A MAX-phase material is provided for a cutting tool and other applications.

Abstract: A method for deposition of functional coatings comprises igniting a non-thermal equilibrium plasma within an ambient pressure plasma chamber having a gas supply inlet and a plasma outlet; and providing a substrate to be coated adjacent to the plasma outlet. A gas phase pre-cursor monomer is provided to the plasma chamber through the gas inlet. A specific energy is coupled into the plasma during the flow of the pre-cursor through the chamber sufficient to disassociate at least the weakest intra-molecular bond required to allow polymerisation of the pre-cursor when deposited on a surface of the substrate adjacent the plasma outlet, the coupled specific energy not exceeding a specific energy required break intra-molecular bonds required for the functionality of the monomer molecule.

Abstract: Coated articles and methods and systems for coating the articles are described herein. The methods and systems described herein include, but are not limited to, steps for actively or passively controlling the temperature during the coating process, steps for providing intimate contact between the substrate and the support holding the substrate in order to maximize energy transfer, and/or steps for preparing gradient coatings. Methods for depositing high molecular weight polymeric coatings, end-capped polymer coatings, coatings covalently bonded to the substrate or one another, metallic coatings, and/or multilayer coatings are also disclosed. Deposition of coatings can be accelerated and/or improved by applying an electrical potential and/or through the use of inert gases.

Abstract: There is provided a silicon oxide film forming method including forming a silicon oxide film on a processing target substrate W by supplying a silicon compound gas, an oxidizing gas and a rare gas into a processing chamber 32 while maintaining a surface temperature of a holding table 34 capable of holding thereon the processing target substrate W at a temperature equal to or lower than about 300° C. and by generating microwave plasma within the processing chamber 32, and performing a plasma process on the silicon oxide film formed on the processing target substrate W by supplying an oxidizing gas and a rare gas into the processing chamber 32 and by generating microwave plasma within the processing chamber 32.

Abstract: A multilayer dielectric structure is formed by vacuum depositing two-dimensional matrices of nanoparticles embedded in polymer dielectric layers that are thicker than the effective diameter of the nanoparticles, so as to produce a void-free, structured, three-dimensional lattice of nanoparticles in a polymeric dielectric material. As a result of the continuous, repeated, and controlled deposition process, each two-dimensional matrix of nanoparticles consists of a layer of uniformly distributed particles embedded in polymer and separated from adjacent matrix layers by continuous polymer dielectric layers, thus forming a precise three-dimensional nanoparticle matrix defined by the size and density of the nanoparticles in each matrix layer and by the thickness of the polymer layers between them. The resulting structured nanodielectric exhibits very high values of dielectric constant as well as high dielectric strength.

Abstract: A system and method for combined material deposition and plasma and/or controlled atmosphere treatment processing of substrates. In one variation, plasma and/or controlled atmosphere treatment and deposition are performed using a single processing system with multiple processing areas. In another variation, plasma and/or controlled atmosphere treatment and deposition are performed using a single processing system with a single processing area. Variations of deposition include printing or direct-write techniques. Processing areas may be atmospherically controlled or selectively sealable.

Abstract: This invention relates to a method of depositing an inorganic SiO2 film at temperatures below 250° C. using plasma enhanced chemical vapour deposition (PECVD) in a chamber including supplying tetraethylorthosilicate (TEOS) and O2, or a source thereof, as precursors, with an O2/TEOS ratio of between 15:1 and 25:1.

Abstract: Methods for forming boron-containing films are provided. The methods include introducing a boron-containing precursor and a nitrogen or oxygen-containing precursor into a chamber and forming a boron nitride or boron oxide film on a substrate in the chamber. In one aspect, the method includes depositing a boron-containing film and then exposing the boron-containing film to the nitrogen-containing or oxygen-containing precursor to incorporate nitrogen or oxygen into the film. The deposition of the boron-containing film and exposure of the film to the precursor may be performed for multiple cycles to obtain a desired thickness of the film. In another aspect, the method includes reacting the boron-containing precursor and the nitrogen-containing or oxygen-containing precursor to chemically vapor deposit the boron nitride or boron oxide film.

Abstract: One embodiment comprises a method for increasing the hydrophobic characteristics of a surface. A coupling agent is applied to the surface, and the surface is subsequently exposed to a first ionizing gas plasma at about atmospheric pressure for a predetermined period of time. The ionizing gas plasma may be formed from a mixture of a carrier gas and a reactive gas. The reactive gas may be comprised of one or more hydrocarbon compound such as an alkane, an alkene, and an alkyne. Alternatively, the reactive gas may be a fluorocarbon or organometallic compound. A lubricant may then be applied to the surface, followed by exposure to second ionizing gas plasma.

Abstract: The invention relates to a process for obtaining a hydrophobic coating on a substrate, preferably consisting of a glass material, a ceramic or a glass-ceramic, said process being characterized in that it comprises: a) a first deposition step, consisting in applying a primer first layer essentially consisting of the silicon oxycarbide SiOxCy type on said substrate, said primer layer having an RMS surface roughness of greater than 4 nm; b) an activation step, in which said SiOxCy primer layer is activated by a plasma of a gas chosen from the noble gases of the Ar or He type and the gases N2, O2 or H2O or by a plasma of a mixture of these gases; and c) a second deposition step, in which a hydrophobic coating comprising at least one fluorocompound, preferably a fluoroalkylsilane, is deposited on said first layer. The invention also relates to hydrophobic glazing comprising or formed by a substrate as defined above, this glazing being in particular used as glazing for transport vehicles or for buildings.

Abstract: Processes are described herein for preparing medical devices and other articles having a low-fouling surface on a substrate comprising a polymeric surface. The polymeric surface material may possess a range of polymeric backbones and substituents while providing the articles with a highly efficient, biocompatible, and non-fouling surface. The processes involve treating the substrate to reduce the concentration of chemical species on the surface of or in the substrate without altering the bulk physical properties of the device or article, and thereafter forming a grafted polymer layer on the treated substrate surface.

Abstract: The present invention relates to a method for applying a coating to workpieces and/or materials containing at least one readily oxidizable nonferrous metal or an alloy containing at least one readily oxidizable nonferrous metal. The method comprises the following steps: b) Pretreating the workpiece and/or material by plasma reduction c) Applying a cover layer by plasma coating in a plasma coating chamber (FIG. 4a).

Abstract: A touch screen according to an embodiment of the present invention includes: a transparent conductive material deposited on a top surface of a flexible plastic film; and a metal layer vacuum-deposited on the transparent conductive film. According to the embodiment of the present invention, the touch screen capable of providing the excellent flexibility and simplifying the manufacturing process, and the method of manufacturing the same can be provided.

Abstract: A method of providing a printhead assembly having a hydrophilic ink pathway and a hydrophobic ink ejection face. The method includes the steps of: providing a printhead assembly comprising a printhead attached to an ink supply manifold, the printhead comprising a nozzle plate having a hydrophobic coating and a protective metal film disposed on the hydrophobic coating; treating surfaces of an ink pathway in the printhead assembly with a solution comprising an alkoxylated polyethyleneimine; drying the surfaces; and removing the protective metal film so as to reveal the hydrophobic coating.

Abstract: Showerhead electrodes for a semiconductor material processing apparatus are disclosed. An embodiment of the showerhead electrodes includes top and bottom electrodes bonded to each other. The top electrode includes one or more plenums. The bottom electrode includes a plasma-exposed bottom surface and a plurality of gas holes in fluid communication with the plenum. Showerhead electrode assemblies including a showerhead electrode flexibly suspended from a top plate are also disclosed. The showerhead electrode assemblies can be in fluid communication with temperature-control elements spatially separated from the showerhead electrode to control the showerhead electrode temperature. Methods of processing substrates in plasma processing chambers including the showerhead electrode assemblies are also disclosed.

Abstract: A system and method for treating films. The method comprises steps of: providing a flexible film having a first side and a second side; flame treating the first side of the flexible film; subsequently treating the first side with plasma. the treated film may subsequently have a coating applied and cured to the first side. The system for treating a flexible film comprises: an unwind element adapted to unwind a wound roll of flexible film, the flexible film having a first side and a second side; a flame treatment element disposed to receive unwound film proceeding from the unwind element and adapted to flame treat the first side of the flexible film; and a plasma treatment element disposed to receive film proceeding from the flame treatment element and adapted to treat the first side of the flexible film with plasma.

Abstract: A structure for protecting a device includes a first layer, one or more first microstructures on the first layer, and a second layer disposed on the first layer. The second layer is disposed on a surface of the first layer on which one or more microstructures are provided. The microstructure may have a hemispheric shape or other random shapes having a curved surface. Since the area of the interface surface between layers is increased due to the at least one microstructure, the stress per unit area of the interface surface is reduced. Further, the microstructure increases the length of the path that ambient species need to travel in order to reach a device or other active components, thereby reducing the amount of infiltrating ambient species.

Abstract: The invention relates to a method for producing a brake disc (BS) for a vehicle, comprising a main body (G) of a metal material, in particular gray cast iron, which has friction surfaces (R). The friction surfaces (R) are after-treated according to the invention by carboring, carbonitriding, case hardening, gas nitriding, oxide nitriding, gas nitro carburizing, plasma nitriding, plasma oxidizing, borating, plasma carborating or plasma borating.

Abstract: Provided is a transparent carbon nanotube (CNT) electrode comprising a net-like (i.e., net-shaped) CNT thin film and a method for preparing the same. More specifically, a transparent CNT electrode comprises a transparent substrate and a net-shaped CNT thin film formed on the transparent substrate, and a method for preparing a transparent CNT electrode, comprising forming a thin film using particulate materials and CNTs, and then removing the particulate materials to form a net-shaped CNT thin film. The transparent CNT electrode exhibits excellent electrical conductivity while maintaining high light transmittance. Therefore, the transparent CNT electrode can be widely used to fabricate a variety of electronic devices, including image sensors, solar cells, liquid crystal displays, organic electroluminescence (EL) displays, and touch screen panels, that have need of electrodes possessing both light transmission properties and conductive properties.

Abstract: A fibrillar, nanotextured coating is deposited on a substrate by contacting the substrate with a reaction mixture comprising a reagent which is hydrolyzable to produced a cross-linked reaction product, and a first solvent which solvates the reagent and the reaction product. The reagent is hydrolyzed so as to provide a cross-linked reaction product which is bonded to the substrate. The substrate is then contacted with a second solvent which is a non-solvent for the reaction product so as to cause nanoscopic phase separation of the reaction product, resulting in the formation of a fibrillar nanotextured coating which is bonded to the substrate. The thus produced coating may be subjected to further chemical modification. The method may be utilized to produce superhydrophobic coatings. Also disclosed are coatings made by the method of the present invention.

Abstract: One embodiment of the present invention provides a method for forming a nanoparticle film, which comprises the steps of: preparing a nanoparticle solution, which comprises a solvent and supersaturated nanoparticles with surface ligand molecules; and dip coating a substrate to the nanoparticle solutions to form a first monolayer of the nanoparticles on the substrate, the first monolayer and repeatedly formed monolayers on top of the first monolayer constructing the nanoparticle film. Another embodiment of the present invention provides a nanoparticle film, comprising a first monolayer consisted of a two-dimensional nanoparticles array that are near-field coupled with each other to have tunable plasmonic properties by changing the number of stacked monolayers.

Abstract: The present invention relates to an enhanced cyclic deposition process suitable for deposition of barrier layers, adhesion layers, seed layers, low dielectric constant (low-k) films, high dielectric constant (high-k) films, and other conductive, semi-conductive, and non-conductive films. The deposition enhancement is derived from ions generated in a plasma. The techniques described reduce the time required for plasma stabilization, thereby reducing deposition time and improving efficiency.

Abstract: A magnetoresistive effect element is produced by forming a first magnetic layer, a spacer layer including an insulating layer and a conductive layer which penetrates through the insulating layer and passes a current, on the first magnetic layer, and a second magnetic layer all of which or part of which is treated with ion, plasma or heat, on the formed spacer layer.

Abstract: A method of vapor depositing a vapor deposition substance onto substrates within a vacuum vessel includes holding the substrates with a dome shaped holder disposed within the vacuum vessel, rotating the dome shaped holder, vapor depositing a substance from a vapor deposition source disposed oppositely to the substrates, supplying ions from an ion source to the substrates, and supplying neutralizing electrons from a neutralizer to the substrates.

Abstract: A fluid ejector includes a substrate having an exterior surface and an interior surface. A non-wetting coating can cover at least a portion of the exterior surface and can be substantially absent from the flow path. A non-wetting coating can be formed of a molecular aggregation. A precursor of a non-wetting coating may flow into a chamber at a higher temperature higher than the substrate. A non-wetting coating can be over a seed layer. An outer portion of the seed layer can have a higher concentration of water molecules or a greater density than an inner portion. The outer portion can be deposited at a ratio of partial pressure water to partial pressure matrix precursor that is higher than the ratio for the inner portion. An oxygen plasma can be applied to a seed layer on the exterior surface, and the non-wetting coating can be applied on the seed layer.

Abstract: A device for removal of at least a portion of carbon dioxide from an aqueous fluid includes at least one membrane through which carbon dioxide can pass to be removed from the fluid and immobilized carbonic anhydrase on or in the vicinity of a first surface of the membrane to be contacted with the fluid such that the immobilized carbonic anhydrase comes into contact with the fluid. The first surface exhibits carbonic anhydrase activity of at least 20% of maximum theoretical activity of the first surface of the membrane based on monolayer surface coverage of carbonic anhydrase in the case that the carbonic anhydrase is immobilize on the first surface.

Abstract: A copper interconnect includes a copper layer formed in a dielectric layer. A liner is formed between the copper layer and the dielectric layer. A barrier layer is formed at the boundary between the liner and the dielectric layer. The barrier layer is a metal oxide.

Abstract: A method for producing a barrier film substrate with excellent gas-barrier capability having, on at least one surface of a plastic film, a barrier layer that contains at least one inorganic layer and at least one organic layer, which includes forming the organic layer by polymerization of a monomer mixture containing a vinyl monomer that has a sulfinyl group or a sulfonyl group and a tertiary carbon atom.

Abstract: In a method for producing a hose with a sealing layer, a hose body having a resin innermost layer is prepared, a rod-like core member is disposed through a center portion of a hollow interior of a connecting portion of the hose body so as to occupy the center portion, and the plasma gas is fed and distributed in an interior of an innermost layer of the connecting portion to modify an inner surface of the innermost layer. Then, the sealing layer is formed on the inner surface by coating an elastic material for the sealing layer on the inner surface of the connecting portion.

Abstract: A method of processing a multilayer film is provided. The method includes providing a substrate film having a substrate film first surface and a substrate film second surface. The method also includes providing a barrier layer adjacent to the substrate film second surface. The barrier layer has at least one opening allowing fluid communication between the substrate film and an outer surface of the barrier layer. Further, the method includes contacting the substrate film first surface with a first reactant and finally contacting the outer surface of the barrier layer with a second reactant, said second reactant being reactive with said first reactant. The method of contacting the substrate film first surface to the first reactant and contacting the outer surface of the barrier layer to the second reactant is carried out under conditions under which reaction between said first reactant and the second reactant results in a formation of a reaction layer.

Abstract: The invention is related to a treatment for a base material using plasma. Various particulate substances, porous substances, or film-state substances can be easily formed on the base material. Alternatively, a particulate substance, a porous substance, or a film-state substance, such as ceramic, can be formed even on a base material having low heat resistance. In a treatment method using plasma, in which the plasma is irradiated on a precursor substance 12 deposited on a surface of a base material 10 and a portion of the component materials of the precursor substance 12 is removed, the base material 10 is in particulate form, filamentous form, or three-dimensional form. The precursor substance 12 is liquid, gas, suspension, powder, or a solid applied to the base material. The precursor substance 12 is deposited on the base material 10 by coating, spraying, transfer, or printing.

Abstract: An apparatus for processing a substrate includes a gas-atmosphere applying unit for applying gas atmosphere to the substrate, and a light-exposure unit for exposing the substrate to light through a lower surface of the substrate.

Abstract: Microporous polyolefin membrane modified by aqueous polymer of the invention is obtained by the following steps: copolymerizing 100 parts of a water-soluble polymer, 30-500 parts of a hydrophobic monomer, 0-200 parts of a hydrophilic monomer and 1-5 parts of an initiator into polymeric colloid emulsion; adding 0-100% of an inorganic filler and 20-100% of a plasticizer based on 100% solid content of the polymeric colloid emulsion to obtain slurry; and coating the slurry on one or two surfaces of the surface modified microporous polyolefin membrane and then drying. The microporous polyolefin membrane modified by aqueous polymer has thermal shutdown effect and little thermal shrinkage, and improves the main problem of shrinkage of the microporous polyolefin membrane at high temperature.

Abstract: There are provided a sheet having a silicon/plastic bi-layer structure capable of easily transferring a paste even when a hard roll is used, the hard roll having excellent durability but having disadvantages that the paste is poorly transferred when the paste is printed on a plastic base, and a method for producing the same. The bi-layer structured sheet having excellent printability when printed by hard roll includes a flexible substrate and a silicon resin formed on the substrate.

Abstract: A method for processing a substrate by plasma CVD includes: (i) forming a film on a substrate placed on a susceptor by applying RF power between the susceptor and a shower plate in the presence of a film-forming gas in a reactor; and (ii) upon completion of step (i), without unloading the substrate, applying amplitude-modulated RF power between the susceptor and the shower plate in the absence of a film-forming gas but in the presence of a non-film-forming gas to reduce a floating potential of the substrate.

Abstract: A method applies a coating (17) of a thermoplastic material on a substrate (11) made of a polymeric material, with the thermoplastic material and the polymeric material being incompatible. Firstly, the substrate and/or the powder are exposed to a plasma discharge (12) or the reactive gas stream resulting therefrom in order to obtain a plasma treated surface layer (14) introducing compatibility at the interface between substrate and coating. Secondly, laser cladding (15) the powder (16) on the substrate is conducted in order to form a coating on the substrate.

Abstract: A method for producing a thermoelectric material is provided. A semiconductor material powder is provided. An electroless plating process is preformed to deposit metal nano-particles on the surface of semiconductor material powder. An electrical current activated sintering process is performed to form a thermoelectric material having one and plurality grain boundaries.

Abstract: Provided is a method for controlling a plasma apparatus. The method includes measuring a plasma spectrum in a plasma chamber by an optical emission spectroscopy, setting a baseline of the measured plasma spectrum, normalizing the measured plasma spectrum by dividing a value of the measured plasma spectrum by a value of the baseline, and controlling the plasma chamber by setting parameters of a plasma process using the normalized plasma spectrum. A plasma apparatus is also provided.

Abstract: According to the invention, an insulating or semi-insulating barrier layer which has a thickness where a tunnel current can flow through is provided between a hole injection electrode and an organic compound layer with hole transport characteristics (a hole injection layer or a hole transport layer). Specifically, a thin insulating or semi-insulating barrier layer which contains silicon or silicon oxide; silicon or silicon oxide and a light transmitting conductive oxide material; or silicon or silicon oxide, a light transmitting conductive oxide material, and carbon may be provided between a light transmitting conductive oxide film formed of a light transmitting conductive oxide material, such as ITO and a hole injection layer containing an organic compound.

Abstract: There is disclosed a method of forming crystalline tantalum pentoxide on a ruthenium-containing material having an oxygen-containing surface wherein the oxygen-containing surface is contacted with a treating composition, such as water, to remove at least some oxygen. Crystalline tantalum pentoxide is formed on at least a portion of the surface having reduced oxygen content.

Abstract: Disclosed are partially deactivated metal catalysts useful for modifying structures of nanomaterials. The present invention is also directed to a method for preparing the partially deactivated metal catalysts, which comprises patterning a substrate with micelles containing iron nanoparticles, removing the micelles from the patterned substrate to deposit the iron nanoparticles thereon, nitriding the iron nanoparticles using a nitrogen plasma, and exposing the nitrided iron nanoparticles to a mixture of ethanol and nitric acid to remove iron from the surface of the nitrided nanoparticles. The iron nitride metal catalyst with a nano-size according to the present invention comprises a core that includes deactivated iron nitride and an active shell surrounding the core. Thus, when preparing a carbon nanotube, the metal catalyst can be effectively used to control the number of walls formed in the carbon nanotube.

Abstract: The present invention relates to a method for preparing oxide thin films with high sensitivity and reliability, which can be advantageously used in the fabrication of articles such as gas sensors. The present invention establishes a high reliability process for preparing large area microsphere templates which may be applicable to silicone semiconductor processes by simple plasma surface treatment and spin coating. The present invention achieves remarkably enhanced sensitivities of thin films of gas sensors by controlling the nanostructure shapes of hollow hemisphere oxide thin films by using simple plasma treatment. In particular, the gas sensor based on the nanostructured TiO2 hollow hemisphere according to the present invention exhibits higher sensitivity, faster response and recovery speed to CO gas over conventional TiO2 gas sensors.

Abstract: A composite part is produced by a process in which at least one of components a) and b) of said composite part is treated with an Openair plasma on a contact surface between said components a) and b) prior to production of the composite part, followed by molding-on of the other component; wherein said components are as follows: a) a part which entirely or to some extent comprises a molding composition comprising at least 40% by weight of a polyamide whose monomer units contain an average of at least 8 carbon atoms, and b) a part comprising another molding composition.