Plasma (e.g., Cold Plasma, Corona, Glow Discharge, Etc.) Patents (Class 427/535)
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Patent number: 7846496Abstract: Mixed matrix membranes that are capable of separation and purification of gas mixtures are disclosed. These membranes comprise polymers that include dispersed therein nanomolecular sieve particles. In a preferred embodiment, the nanomolecular sieve particles contain attached functional groups to prevent their agglomeration.Type: GrantFiled: February 26, 2007Date of Patent: December 7, 2010Assignee: UOP LLCInventors: Chunqing Liu, Stephen T. Wilson, Beth McCulloch
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Publication number: 20100305673Abstract: An implantable electrode device and a corresponding method of fabricating such a device are described. An electrode network of wires and contacts is developed by inkjet deposition of conductive metal material over portions of the electrode substrate for electrically connecting an implant processor device to targeted tissue in a patient. An electrode substrate beneath the electrode network provides structural support to the electrode network. A biocompatible encapsulation layer selectively covers a portion of the electrode network and provides electrical insulation for the covered portion of the electrode network while leaving exposed portions of the electrode network which allow electrical contact with adjacent tissue.Type: ApplicationFiled: May 26, 2010Publication date: December 2, 2010Applicant: MED-EL ELEKTROMEDIZINISCHE GERAETE GMBHInventors: Claude Jolly, Stefan B. Nielsen
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Publication number: 20100285276Abstract: Provided is the preparation of a coil-comb block copolymer and a method for producing nanostructures formed by the copolymer. Particularly, provided is a method for producing nanostructured polymer thin films, including: preparing a coil-comb block copolymer via a controlled polymer polymerization process; forming a thin film of the block copolymer on a substrate and carrying out heat treatment to form nanostructures including vertically aligned cylindrical microstructures; and irradiating ultraviolet rays to the thin film and carrying out oxygen plasma treatment to form nanostructured polymer thin films including cylindrical pores.Type: ApplicationFiled: April 9, 2010Publication date: November 11, 2010Applicant: Korea Advanced Institute of Science and TechnologyInventors: Sang Youl Kim, Myungeun Seo
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Publication number: 20100285301Abstract: The invention relates to a method for modifying the surface of a membrane by plasma treatment, wherein said method imparts water-repellent and imperviousness properties to said membrane while preserving the steam perviousness and the elastic properties thereof. The method comprises, inter alia, a step of treating the membrane with a plasma of a precursor compound selected from a hydrocarbon gas, a fluorocarbon gas, mixtures thereof, a fluorocarbon liquid, a fluorocarbon solid, wherein the precursor compound is selected in such a way that the F/C ratio is lower than 2, followed by a step of treating the same surface of the substrate from the previous step with a plasma of a fluorocarbon gas selected in such a way that the F/C ratio is at least 2. The invention also relates to the resulting membranes.Type: ApplicationFiled: November 7, 2008Publication date: November 11, 2010Inventors: Marie Dieudonné, Natacha De Dominicis, Philippe Sonntag
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Publication number: 20100284108Abstract: A method for producing a magnetic recording medium having a magnetically partitioned magnetic recording pattern, comprising a step of forming a magnetic layer contains 0.5-6 atomic % of an oxide on a non-magnetic substrate; and a step of exposing regions of the magnetic layer, which magnetically partition the magnetic recording pattern, to a reactive plasma or reactive ion. The magnetic layer preferably has a non-granular structure, and in-plane orientated. After the step of exposure of the magnetic layer to a reactive plasma or reactive ion, a surface at least in said regions of magnetic layer having been exposed to the reactive plasma or reactive ion is preferably irradiated with an inert gas. Thus, a magnetic recording medium having a magnetic recording pattern with a high precision, and having high electromagnetic conversion characteristics and high recording density can be produced with an enhanced productivity.Type: ApplicationFiled: January 9, 2009Publication date: November 11, 2010Applicant: SHOWA DENKO K.K.Inventors: Masato Fukushima, Akira Sakawaki
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Publication number: 20100285235Abstract: The present invention provides a process for the preparation of nano structured silicon thin film using radio frequency (rf) plasma discharge useful for light emitting devices such as light emitting diode, laser etc. The present invention shows the possibility of precise control of the nanocrystal size of silicon and its uniform distribution without doping using plasma processing for obtaining efficient photoluminescence at room temperature. Process developed to deposit the photo luminescent nano structured silicon thin films using plasma enhanced chemical vapour deposition technique can find use in electroluminescence devices like light emitting diodes (LEDs), LASER etc. This could also be advantageous for integration of silicon photonic devices with the existing silicon microelectronic technology.Type: ApplicationFiled: June 13, 2008Publication date: November 11, 2010Inventors: Sushil Kumar, Prakash Narain Dixit, Chandra Mohan Singh Rauthan
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Patent number: 7829157Abstract: Methods of making multi-layered, hydrogen-containing thermite structures including at least one metal layer and at least one metal oxide layer adjacent to the metal layer are disclosed. At least one of the metal layers contains hydrogen, which can be introduced by plasma hydrogenation. The thermite structures can have high hydrogen contents and small dimensions, such as micrometer-sized and nanometer-sized dimensions.Type: GrantFiled: April 7, 2006Date of Patent: November 9, 2010Assignee: Lockheed Martin CorporationInventors: James Neil Johnson, Ilissa Brooke Schild
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Publication number: 20100276072Abstract: A carbon nanotube-infused fiber and a method for its production are disclosed. Nanotubes are synthesized directly on a parent fiber by first applying a catalyst to the fiber. The properties of the carbon nanotube-infused fiber will be a combination of those of the parent fiber as well as those of the infused carbon nanotubes.Type: ApplicationFiled: January 3, 2007Publication date: November 4, 2010Applicant: LOCKHEED MARTIN CORPORATIONInventors: Tushar K. Shah, Slade H. Gardner, Mark R. Alberding
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Publication number: 20100278892Abstract: A dodecamer peptide, and its modified variant, having a repeating glycine-lysine sequence was created and found to bind with high affinity to oxide surfaces and certain activated polymeric surfaces. Reversible binding characteristics of the peptides were demonstrated. The peptides were integrated with proteins, cells and fusion proteins to provide attachment of the proteins, cells and fusion proteins to solid material structures. The peptides can be used to functionalize surfaces of components within mechanical, in mechanical, biomechanical, micro fluidic, electronic, bioelectronic, bio-optical, and biochemical devices. Experiments were carried out to assess functionalization and reusability of a suspended mass resonator's cantilever.Type: ApplicationFiled: September 19, 2008Publication date: November 4, 2010Applicant: Massachusetts Institute of TechnologyInventors: Eric Mark Krauland, Stephen Kottmann, Roberto Juan Barbero, Angela Belcher
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Patent number: 7824600Abstract: The invention relates to a method for raising the surface tension of biaxially-stretched films made of thermoplastic polymers. According to the method, a film is first treated on a surface by means of an atmospheric pressure plasma before being stretched transversally or simultaneously across the width thereof, and the film is additional a subjected to a second treatment by means of a corona or flame after being stretched transversally or simultaneously, the second treatment being done on the same surface which has already been plasma-treated.Type: GrantFiled: October 31, 2006Date of Patent: November 2, 2010Assignee: Treofan Germany GmbH & Co. KGInventors: Joachim Jung, Thomas Gottfreund
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Publication number: 20100272918Abstract: The invention relates to a method and a system for the plasma treatment of successive substrates comprising one or more steel products in which the substrates are transported, one after another, through at least one plasma treatment zone, characterized in that the electric power for generating the plasma in the treatment zone is varied according to the area of the substrate is present in this treatment zone when the substrate is running through this zone.Type: ApplicationFiled: November 7, 2008Publication date: October 28, 2010Inventor: Pierre VANDENBRANDE
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Publication number: 20100267203Abstract: Method for isolating a flexible film from a support substrate and method for fabricating an electronic device are provided. The method for isolating a flexible film from a support substrate includes providing a substrate with a top surface. A surface treatment is subjected to the top surface of the substrate, forming a top surface with detachment characteristics. A flexible film is formed on the top surface with detachment characteristics. The flexible film within the top surface with detachment characteristics is cut and isolated.Type: ApplicationFiled: October 1, 2009Publication date: October 21, 2010Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Dong-Sen CHEN, Hsiao-Fen WEI, Liang-You JIANG, Yu-Yang CHANG
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Publication number: 20100255326Abstract: A method is provided for enhancing the gas barrier properties of substrates such as materials used in packaging, by applying a composition comprising a vinyl alcohol/vinyl amide copolymer, a cross linker and, optionally, a diacrylate or other polyacrylate and a photo initiator to the material and curing the composition by irradiation with UV light, visible light, IR irradiation and/or electron beam or by exposure to heat. The method includes the optional step of subjecting the material to a low-temperature plasma discharge or a corona discharge prior to applying the composition. The method provides, for example, packaging materials, such as, flexible packaging materials such as plastic films producing packaging materials with excellent gas barrier properties, for example oxygen barrier properties, which are readily printed upon.Type: ApplicationFiled: October 5, 2009Publication date: October 7, 2010Applicant: CIBA CORPORATIONInventors: Emanuela Chiappini, Stefano Gardi, Andrew J. Naisby, Rosanna Telesca, Walter Taplin, Neil Forsythe
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METHOD AND APPARATUS FOR ATOMIC LAYER DEPOSITION USING AN ATMOSPHERIC PRESSURE GLOW DISCHARGE PLASMA
Publication number: 20100255625Abstract: Apparatus and method for atomic layer deposition on a surface of a substrate (6) in a treatment space. A gas supply device (15, 16) is present for providing various gas mixtures to the treatment space (1, 2). The gas supply device (15, 16) is arranged to provide a gas mixture with a precursor material to the treatment space for allowing reactive surface sites to react with precursor material molecules to give a surface covered by a monolayer of precursor molecules attached via the reactive sites to the surface of the substrate. Subsequently, a gas mixture comprising a reactive agent capable to convert the attached precursor molecules to active precursor sites is provided. A plasma generator (10) is present for generating an atmospheric pressure plasma in the gas mixture comprising the reactive agent, the plasma generator being arranged remote from the treatment space (1, 2).Type: ApplicationFiled: August 20, 2008Publication date: October 7, 2010Applicant: FUJIFILM MANUFACTURING EUROPE B.V.Inventor: Hindrik Willem De Vries -
Patent number: 7807219Abstract: A process of repairing a plasma etched low-k dielectric material having surface-bound silanol groups includes exposing at least one surface of the dielectric material to (a) a catalyst so as to form hydrogen bonds between the catalyst and the surface-bound silanol groups obtaining a catalytic intermediary that reacts with the silane capping agent so as to form surface-bound silane compounds, or (b) a solution comprising a supercritical solvent, a catalyst, and a silane capping agent so as to form hydrogen bonds between a catalyst and the surface-bound silanol groups obtaining a catalytic intermediary that reacts with the silane capping agent so as to form surface-bound silane compounds. Horizontal networks can be formed between adjacent surface-bound silane compounds.Type: GrantFiled: June 27, 2006Date of Patent: October 5, 2010Assignee: Lam Research CorporationInventor: James DeYoung
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Patent number: 7807212Abstract: A biomedical material is prepared through a plasma method. The material is a film containing titanium oxide onto polymer sheet. The film is hydrophilic, bacterial inactivated and biocompatible. The present invention can be applied to artificial guiding tube and wound dressing material.Type: GrantFiled: October 26, 2006Date of Patent: October 5, 2010Assignee: Atomic Energy Council-Institute of Nuclear Energy ResearchInventors: Te-Hsing Wu, Ko-Shao Chen, Chia-Chieh Chen, Lie-Hang Shen, Yi-Chun Yeh, Nini-Chen Tsai
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Patent number: 7807231Abstract: A process for protecting a thermal barrier coating (TBC) on a component used in a high-temperature environment, such as the hot section of a gas turbine engine. The process applies a protective film on the surface of the TBC to resist infiltration of contaminants such as CMAS that can melt and infiltrate the TBC to cause spallation. The process generally entails applying to the TBC surface a metal composition containing at least one metal whose oxide resists infiltration of CMAS into the TBC. The metal composition is applied so as to form a metal film on the TBC surface and optionally to infiltrate porosity within the TBC beneath its surface. The metal composition is then converted to form an oxide film, with at least a portion of the oxide film forming a surface deposit on the TBC surface.Type: GrantFiled: November 30, 2005Date of Patent: October 5, 2010Assignee: General Electric CompanyInventors: Mark Daniel Gorman, Bangalore Aswatha Nagaraj, Robert Edward Schafrik
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Patent number: 7807232Abstract: In a continuous in-vacuum process for the manufacture of a film metallized with aluminum, the aluminum layer is exposed to a passivating agent, inline, immediately after deposition and prior to rewinding of the film onto a take-up roller. Passivation is carried out by plasma treatment in an oxidizing atmosphere (oxygen, nitrogen or others). The resulting product exhibits no peel-off problems during unwinding of the take-up roller and greatly improved corrosion resistance.Type: GrantFiled: October 25, 2006Date of Patent: October 5, 2010Assignee: Sigma Laboratories of Arizona, LLCInventors: Angelo Yializis, Michael Mikhael
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Publication number: 20100247798Abstract: The present invention relates to a variety of conductive ink compositions comprising a metal complex compound having a special structure and an additive and a method for preparing the same, more particularly to conductive ink compositions comprising a metal complex compound obtained by reacting a metal or metal compound with an ammonium carbamate- or ammonium carbonate-based compound and an additive and a method for preparing the same.Type: ApplicationFiled: March 12, 2010Publication date: September 30, 2010Applicant: INKTEC CO., LTD.Inventors: Kwang-Choon Chung, Hyun-Nam Cho, Myoung-Seon Gong, Yi-Sup Han, Jeong-Bin Park, Dong-Hun Nam, Seong-Yong Uhm, Young-Kwan Seo, Nam-Boo Cho
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Publication number: 20100239870Abstract: A coating and associated method for coating is disclosed. The coating provides a hard, transparent, UV blocking coating for a substrate. A UV blocking layer is first deposited upon the substrate, and a hard coating is deposited above the UV blocking layer. A soft coating layer may be deposited between the UV blocking layer and the hard coating. The soft and hard coating layers may both have the general composition SiOxCy. the soft and hard coating layers may be deposited by a plasma vapor deposition process.Type: ApplicationFiled: March 23, 2009Publication date: September 23, 2010Applicant: THE BOEING COMPANYInventors: David A. BOWEN, Kjersta L. LARSON-SMITH, Vasan S. SUNDARAM
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Publication number: 20100240215Abstract: MEMS devices and methods for utilizing sacrificial layers are provided. An embodiment comprises forming a first sacrificial layer and a second sacrificial layer over a substrate, wherein the second sacrificial layer acts as an adhesion layer. Once formed, the first sacrificial layer and the second sacrificial layer are patterned such that the second sacrificial layer is undercut to form a step between the first sacrificial layer and the second sacrificial layer. A top capacitor electrode is formed over the second sacrificial layer, and the first sacrificial layer and the second sacrificial layer are removed in order to free the top capacitor electrode.Type: ApplicationFiled: January 13, 2010Publication date: September 23, 2010Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Yao-Te Huang, Chia-Hua Chu, Yu-Nu Hsu, Chun-Wen Cheng, Li-Chung Peng
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Patent number: 7799389Abstract: The invention concerns a method for depositing a thin polymer film on a substrate for functionalizing the surface of said substrate, comprising a step which consists in electrohydrodynamic spraying of a polymerizable precursor towards the substrate so as to produce an electrostatic deposition of electrically charged droplets of said precursor and form the thin film on the surface by polymerizing the droplets. The method is characterized in that it further comprises a step for causing the excited species to interact with the droplets of the sprayed precursor, thereby promoting the polymerization reactions of said precursor. The invention also concerns a device for implementing the method, in particular for depositing a thin polymer film on a moving substrate-film.Type: GrantFiled: June 28, 2005Date of Patent: September 21, 2010Assignees: Centre National de la Recherche Scientifique, Universite Pierre et Marie Curie (Paris VI)Inventors: Jean-Pascal Borra, Michaël Tatoulian, Farzaneh Arefi-Khonsari
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Publication number: 20100233383Abstract: Disclosed are methods of fabricating an organic electronic device, which includes dip coating layers, and the devices made therefrom.Type: ApplicationFiled: December 29, 2005Publication date: September 16, 2010Applicant: E.I. du Pont de Nemours and CompanyInventors: Gordana Srdanov, Gang Yu
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Publication number: 20100232052Abstract: Provided is a process for making a magnetic recording medium having a magnetically partitioned magnetic recording patterns, which comprises the following three steps (1), (2) and (3), conducted in this order: (1) a step of forming a magnetic layer on a non-magnetic substrate; (2) a step of removing surface layer portions of regions for magnetically partitioning the magnetic layer; and (3) a step of exposing the thus-exposed regions of the magnetic layer, from which the surface layer portions have been removed, to a reactive plasma or a reactive ion, to modify the magnetic characteristics of the regions of magnetic layer, whereby a magnetic recording pattern is formed which are magnetically partitioned by the regions of magnetic layer having the modified characteristics. Thus, a magnetic recording medium having an enhanced recording density and minimizing letter bleeding at writing can be made with a high efficiency.Type: ApplicationFiled: July 24, 2008Publication date: September 16, 2010Applicant: SHOWA DENKO K.K.Inventors: Masato Fukushima, Akira Sakawaki, Akira Yamane
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Publication number: 20100232056Abstract: Provided is a process for manufacturing a magnetic recording medium having a magnetically partitioned magnetic recording patterns, which comprises the following steps, conducted in the order: (1) step of forming a magnetic layer on a non-magnetic substrate, (2) step of exposing the surface of regions of the magnetic layer to a reactive plasma or a reactive ion, which regions are to magnetically partition the magnetic layer for forming a magnetically partitioned magnetic recording pattern, and (3) step of exposing the magnetically partitioned magnetic layer to an inert gas irradiation. Preferably, a step of removing surface layer portions of said regions of the magnetic layer is carried out after the step (1) but before the step (2). The surface of the magnetic layer of produced magnetic recording medium exhibits good resistance to corrosion caused by oxidation or halogenation.Type: ApplicationFiled: September 22, 2008Publication date: September 16, 2010Applicant: Showa Denko K.K.Inventors: Masato Fukushima, Akira Sakawaki, Akira Yamane
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Publication number: 20100232065Abstract: A magnetic disc is provided with a magnetic layer, a protection layer and a lubrication layer in this order on a substrate. After successively forming the magnetic layer and the protection layer on the substrate, the protection layer is exposed to plasma under normal pressure, then, the lubrication layer is formed on the protection layer. The plasma is generated in at least one kind of gas selected from among nitrogen gas, argon gas, oxygen gas, and fluorine hydrocarbon gas. The protection layer is a hydrogenated carbon protection layer.Type: ApplicationFiled: March 29, 2007Publication date: September 16, 2010Applicant: HOYA CORPORATIONInventors: Kota Suzuki, Koichi Shimokawa
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Publication number: 20100233633Abstract: Methods for processing a substrate with a boron rich film are provided. A patterned layer of boron rich material is deposited on a substrate and can be used as an etch stop. By varying the chemical composition, the selectivity and etch rate of the boron rich material can be optimized for different etch chemistries. The boron rich materials can be deposited over a layer stack substrate in multiple layers and etched in a pattern. The exposed layer stack can then be etched with multiple etch chemistries. Each of the boron rich layers can have a different chemical composition that is optimized for the multiple etch chemistries.Type: ApplicationFiled: May 24, 2010Publication date: September 16, 2010Applicant: Applied Materials, Inc.Inventors: Victor Nguyen, Yi Chen, Mihaela Balseanu, Isabelita Roflox, Li-Qun Xia, Derek R. Witty
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Publication number: 20100233384Abstract: A solution containing polymer-bound metal nanoparticles is deposited onto a substrate, at least the surface of which is insulating, to form a pattern, the substrate is dried, and then the pattern is subjected to plasma exposure.Type: ApplicationFiled: March 20, 2007Publication date: September 16, 2010Applicants: JAPAN SCIENCE AND TECHONOLOGY AGENCY, OSAKA UNIVERSITYInventors: Kaoru Ojima, Akihiko Takagi, Fumihiko Yamada, Takuya Matsumoto, Tomoji Kawai
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Publication number: 20100227079Abstract: The invention provides a method for patterning a polymer surface. A polymer layer is formed on a substrate. A conductive grid with a mesh pattern is placed on the polymer layer. The mesh pattern is transferred to the polymer layer by a plasma treatment. The conductive grid is then removed.Type: ApplicationFiled: October 9, 2009Publication date: September 9, 2010Inventor: Shu-Chen Hsieh
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Publication number: 20100227147Abstract: A transparent porous SiO2-coating for a transparent substrate material has improved optical properties. These properties can be obtained, in particular, by plasma treatment.Type: ApplicationFiled: August 12, 2008Publication date: September 9, 2010Applicant: Siemens AktiengesellschaftInventor: Florian Eder
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Publication number: 20100227078Abstract: A method for forming a metallic pattern, which is provided with a printing process to print a pattern portion on a substrate by means of an inkjet method utilizing ink containing a precursor of a nonelectric plating catalyst and a plating process to form a metallic pattern by nonelectric plating on said pattern portion, wherein the surface of said substrate is constituted of ink non-absorptive resin and has been subjected to a plasma treatment, and said ink has a pH value at 25° C. of not less than 9.0.Type: ApplicationFiled: November 25, 2009Publication date: September 9, 2010Applicant: KONICA MINOLTA IJ TECHNOLOGIES, INC.Inventors: Satoshi MORI, Shinichi SUZUKI
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Publication number: 20100227134Abstract: A method includes: (a) conformally depositing a barrier coating, provided in liquid form, on at least one surface of a substrate; (b) embedding a plurality of nanoparticles in the barrier coating to a selected depth; and (c) fully curing the barrier coating after embedding the plurality of nanoparticles; the embedded plurality of nanoparticles are in continuous contact with the cured barrier coating. The order in which the barrier coating and nanoparticles are deposited on the substrate can be switched or they can be deposited simultaneously. An article includes a substrate having a cured barrier coating conformally disposed on at least one surface of the substrate and a plurality of nanoparticles embedded to a selected depth in the barrier coating creating an embedded portion of each of the plurality of nanoparticles. The embedded portion of each of the plurality of nanoparticles in continuous contact with the cured barrier coating.Type: ApplicationFiled: February 25, 2010Publication date: September 9, 2010Applicant: Lockheed Martin CorporationInventors: Tushar K. SHAH, Brandon K. Malet, Jordan T. Ledford, Harry C. Malecki
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Publication number: 20100221909Abstract: This method for making an electric interconnection between two conducting layers separated by at least one insulation or semi-conducting layer, comprises forming a stud extending at least between the lower conducting layer and the upper conducting layer, wherein the nature and/or the shape of said stud impart non-wettability properties relative to the material used for the separating layer.Type: ApplicationFiled: May 7, 2010Publication date: September 2, 2010Applicant: Commissariat A L'Energie Atomique et Aux Energies AlternativesInventors: Jean-Marie VERILHAC, Jacqueline Bablet, Cécile Bory
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Patent number: 7785649Abstract: Disclosed herein are a protein chip substrate and a method for manufacturing the protein chip substrate. The method includes deposition of plasma polymerized ethylenediamine (PPEDA) having an amine group on plasma polymerized cyclohexnane (PPCHex) by inductively coupled plasma-chemical vapor deposition (ICP-CVD), thereby preventing non-specific adsorption of proteins on a slide surface.Type: GrantFiled: December 27, 2006Date of Patent: August 31, 2010Assignee: Sungkyunkwan University Foundation for Corporate CollaborationInventors: Dong-geun Jung, Sang-hak Yeo, Chang-rok Choi
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Patent number: 7785662Abstract: There is provided a method for manufacturing a magnetoresistive element having a magnetization pinned layer, a magnetization free layer, and a spacer layer including an insulating layer arranged between the magnetization pinned layer and the magnetization free layer and current paths passing through the insulating layer. The method includes, in producing the spacer layer, depositing a first non-magnetic metal layer forming the current paths, depositing a second metal layer to be converted into the insulating layer on the first non-magnetic metal layer, and performing two stages of oxidation treatments in which a partial pressure of an oxidizing gas in a first oxidation treatment is set to 1/10 or less of a partial pressure of an oxidizing gas in a second oxidation treatment, and the second metal layer being irradiated with an ion beam or a RF plasma of a rare gas in the first oxidation treatment.Type: GrantFiled: October 20, 2006Date of Patent: August 31, 2010Assignee: Kabushiki Kaisha ToshibaInventors: Yoshihiko Fuji, Hideaki Fukuzawa, Hiromi Yuasa, Hitoshi Iwasaki
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Publication number: 20100215910Abstract: The invention relates to a plastic profile which can be decorated, comprising a profiled substrate as the main body of the plastic profile, and a method for the production thereof. In order to ensure reliable subsequent decorative coating of the plastic profile over a run even in the event of a longer time interval between substrate manufacturing and decorative coating, according to the invention, a functional layer which at least sectionally covers the substrate is provided, which may subsequently have a decorative coating applied thereto.Type: ApplicationFiled: January 23, 2008Publication date: August 26, 2010Inventors: Sven Kühnberger, Oliver Hagen
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Publication number: 20100215867Abstract: A method of making a golf ball including the steps of providing a preform including an uncured polybutadiene composition; coating the preform with a cure-altering material including a hydroquinone compound, a benzoquinone compound, a resorcinol compound, or a quinhydrone compound; curing the coated preform at a predetermined temperature to form a crosslinked golf ball core having an outer surface having a first hardness and a geometric center having a second hardness greater than the first to define a negative hardness gradient; and forming a cover layer about the core to form the golf ball.Type: ApplicationFiled: January 27, 2010Publication date: August 26, 2010Inventors: Michael J. Sullivan, Brian Comeau, Douglas S. Goguen
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Publication number: 20100215979Abstract: A method of forming a metal film and a metal wiring pattern is described a step of forming an organic film by applying and polymerizing an undercoat composition for forming a metal film containing an addition-polymerizable monomer having an acidic group and a polymerization initiator on a substrate or film, a step of converting the acidic group into a metal (M1) salt by treating the organic film with an aqueous solution containing a metal (M1) ion, a step of converting the metal (M1) salt into a metal (M2) salt by treating the organic film with an aqueous solution containing a metal (M2) ion having an ionization tendency lower than the metal (M1) ion, and a step of forming a metal film on the organic film surface by reducing the metal (M2) ion.Type: ApplicationFiled: June 6, 2006Publication date: August 26, 2010Applicants: OMRON CorporationInventors: Seiji Nakajima, Tetsuya Mori, Hidemi Nawafune
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Patent number: 7780865Abstract: Methods of controlling the step coverage and pattern loading of a layer on a substrate are provided. The dielectric layer may be a silicon nitride, silicon oxide, or silicon oxynitride layer. The method comprises depositing a dielectric layer on a substrate having at least one formed feature across a surface of the substrate and etching the dielectric layer with a plasma from oxygen or a halogen-containing gas to provide a desired profile of the dielectric layer on the at least one formed feature. The deposition of the dielectric layer and the etching of the dielectric layer may be repeated for multiple cycles to provide the desired profile of the dielectric layer.Type: GrantFiled: March 29, 2007Date of Patent: August 24, 2010Assignee: Applied Materials, Inc.Inventors: Mihaela Balseanu, Li-Qun Xia, Mei-Yee Shek, Hichem M'Saad
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Publication number: 20100209618Abstract: A method for plasma treatment and painting of a surface, the surface including a plurality of different materials includes blasting the surface with a carbon dioxide snow so as to activate the surface to improve an adhesive strength; and treating the surface with a plasma treatment using at least one plasma nozzle following the blasting step, the treating including guiding the at least one plasma nozzle at a distance of not more than 15 mm from the surface at a feed rate of not more than 50 m/min.Type: ApplicationFiled: February 12, 2010Publication date: August 19, 2010Applicant: Airbus Operations GmbHInventors: Birgit Kuhlenschmidt, Daniel Lahidjanian, Dirk Bausen, Karl Hausmann, Bettina Kroeger-Kallies
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Publication number: 20100209704Abstract: In the growth of carbon nanotubes, the aggregation of catalytic fine particles therefor is a problem. In order to realize the growth of carbon nanotubes into a high density, the carbon nanotube growing process includes a first plasma treatment step of treating a surface having catalytic fine particles with a plasma species generated from a gas which contains at least hydrogen or a rare gas without carbon element, a second plasma treatment step of forming a carbon layer on the surface of the catalytic fine particles by a plasma generated from a gas which contains at least a hydrocarbon after the first plasma treatment step, and a carbon nanotube growing step of growing carbon nanotubes by use of a plasma generated from a gas which contains at least a hydrocarbon after the second plasma treatment step.Type: ApplicationFiled: January 19, 2010Publication date: August 19, 2010Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Yuichi Yamazaki, Tadashi Sakai, Naoshi Sakuma, Masayuki Katagiri, Mariko Suzuki, Shintaro Sato
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Publication number: 20100209617Abstract: A method of forming a metal pattern comprises: (a) providing a substrate; (b) depositing at least one patterned metal layer which includes a metal selected from an inert metal, an inert metal alloy, and combinations thereof; (c) disposing the substrate and the patterned metal layer in a vacuum chamber, vacuuming the vacuum chamber, and introducing a gas into the vacuum chamber; and (d) applying microwave energy to the gas to produce a microwave plasma of the gas within the vacuum chamber so that the patterned metal layer is acted by the microwave plasma and formed into a plurality of spaced apart metal nanoparticles on the substrate.Type: ApplicationFiled: May 22, 2009Publication date: August 19, 2010Inventors: Kuan-Jiuh Lin, Chuen-Yuan Hsu
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Patent number: 7776196Abstract: A method for arranging particles according to one aspect of the present invention comprises the steps of: forming a thin film on a surface of a substrate, the thin film being obtained by dispersing first particles made of metal in a material, a surface of the material is to be charged to a first polarity in a predetermined solution; dispersing second particles in the solution, the second particles being charged to a second polarity opposite to the first polarity; immersing the thin film in the solution; and irradiating the thin film with light having a wavelength which causes plasmon resonance with surface plasmons of the metal particles.Type: GrantFiled: March 19, 2007Date of Patent: August 17, 2010Assignee: Kabushiki Kaisha ToshibaInventors: Akira Fujimoto, Tsutomu Nakanishi
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Publication number: 20100203339Abstract: A method of plasma modification of a film includes applying about ?400 V to about ?600 V to a gas in a chamber to generate a gas-discharge plasma; and subjecting the film to the gas-discharge plasma to form a plasma-modified film, where the gas comprises H2, H2S, NH3, deuterium, methane, or a mixture of any two or more. Films may be prepared. Devices coated with the films may be prepared.Type: ApplicationFiled: January 8, 2010Publication date: August 12, 2010Inventors: Osman Eryilmaz, Ali Erdemir
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Publication number: 20100203260Abstract: A process for the coating of substrates comprising insertion of a substrate into a process oven, plasma cleaning of the substrate, rehydration of the substrate, dehydration of the substrate, withdrawal of a metered amount of one or more chemicals from one or more chemical reservoirs, vaporizing the withdrawn chemicals in one or more vapor chambers, and transfer of the vaporized chemicals into a process oven, thereby reacting with the substrate. An apparatus for the coating of substrates comprising a process oven, a gas plasma generator, a metered chemical withdrawal subsystem, and a vaporization subsystem.Type: ApplicationFiled: August 20, 2008Publication date: August 12, 2010Inventors: William A. Moffat, Kenneth M. Sautter
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Publication number: 20100200842Abstract: Disclosed is a surface modifying agent including a compound having an ethynyl group at one terminal end, a laminated structure manufactured using the surface modifying agent, a method of manufacturing the laminated structure, and a transistor including the same.Type: ApplicationFiled: February 12, 2010Publication date: August 12, 2010Inventors: Jeong-il Park, Byung-Wook Yoo, Do-hwan Kim, Sang-Yoon Lee, Bang-lin Lee, Eun-jeong Jeong
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Patent number: 7771796Abstract: A plasma processing method of carrying out curing processing on a low dielectric constant film produced on a to-be-processed substrate by applying plasma thereto in a processing chamber of a plasma processing apparatus, includes the steps of: a) introducing, in the plasma processing chamber, a first gas having a function of stabilizing plasma and a second gas generating active hydrogen, and, after that; b) generating plasma, and carrying out curing processing on the low dielectric constant film.Type: GrantFiled: November 4, 2005Date of Patent: August 10, 2010Assignee: Tokyo Electron LimitedInventors: Masayuki Kohno, Masaru Sasaki
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Publication number: 20100196781Abstract: A reinforced electrolyte membrane for a fuel cell which is reinforced by a porous membrane, characterized by containing void portions in a joining portion between the surface of the porous membrane and/or pore surface and the electrolyte for buffering swelling when water is contained. This reinforced electrolyte membrane for a fuel cell has improved dimensional stability even if the electrolyte swells.Type: ApplicationFiled: August 9, 2007Publication date: August 5, 2010Inventors: Hiroshi Suzuki, Yasunori Nouji, Kyojiro Inoue
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Publication number: 20100196620Abstract: The present invention relates to a method of coating a technical textile belt or fabric for a machine to produce a fibrous web of material, for example paper, cardboard, or tissue, which includes the step of i) providing a belt, whereby a coating is applied onto one side of belt; ii) providing of an applicator device, with which a liquid medium can be applied onto one side of belt without actually coming in contact with the belt; iii) applying the liquid medium onto one side of the belt; and iv) causing the liquid medium to bond and develop in order to allow the formation of a solid coating covering on the side of the belt and/or the inner structure covering at least a portion of the side of the belt. The method according to the present further provides that in invention step iii), the applicator device, follows a previously established raster in applying pre-determined quantities of the coating medium onto a plurality of locations, located within at least one region on the side of the belt.Type: ApplicationFiled: February 5, 2010Publication date: August 5, 2010Inventors: Robert Eberhardt, Jacqueline Marz, Matthias Schmitt
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Patent number: 7767270Abstract: Method and system for functionalizing a collection of carbon nanotubes (CNTs). A selected precursor gas (e.g., H2 or NH3 or NF3 or F2 or CF4 or CnHm) is irradiated to provide a cold plasma of selected target particles, such as atomic H or F, in a first chamber. The target particles are directed toward an array of CNTs located in a second chamber while suppressing transport of ultraviolet radiation to the second chamber. A CNT array is functionalized with the target particles, at or below room temperature, to a point of saturation, in an exposure time interval no longer than about 30 sec. The predominant species that are deposited on the CNT array vary with the distance d measured along a path from the precursor gas to the CNT array; two or three different predominant species can be deposited on a CNT array for distances d=d1 and d=d2>d1 and d=d3>d2.Type: GrantFiled: March 22, 2006Date of Patent: August 3, 2010Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space AdministrationInventors: Bishun N. Khare, Meyya Meyyappan