Abstract: A method includes etching a first portion and a second portion of a dummy gate stack to form a first opening and a second opening, respectively, and depositing a silicon nitride layer to fill the first opening and the second opening. The deposition of the silicon nitride layer comprises a first process selected from treating the silicon nitride layer using hydrogen radicals, implanting the silicon nitride layer, and combinations thereof. The method further includes etching a third portion of the dummy gate stack to form a trench, etching a semiconductor fin underlying the third portion to extend the trench down into a bulk portion of a semiconductor substrate underlying the dummy gate stack, and depositing a second silicon nitride layer into the trench.

Abstract: A method for manufacturing a light-emitting layer, an electroluminescent device and a display device are provided, and the method includes: providing a base substrate formed with a pixel definition layer, so that a plurality of barrier wall structures of the pixel definition layer define a plurality of pixel regions that include pixel regions arranged along a first direction and pixel regions arranged along a second direction; forming a solution layer on the base substrate formed with the pixel definition layer, so that the solution layer includes a solution formed in the plurality of pixel regions and a solution formed on first barrier wall structures and the solution in the pixel regions does not blend with the solution on the first barrier wall structures; performing a drying process on the solution layer so that the solution in each pixel region forms a light-emitting structure to obtain a light-emitting layer.

Abstract: A pixel definition layer, a manufacturing method thereof, a display substrate and a display device are provided. The pixel definition layer includes: a lyophilic material layer on a base substrate, and a lyophobic material layer on the side, away from the base substrate, of the lyophilic material layer. The pixel definition layer defines a plurality of pixel regions, in an arrangement of array, on the base substrate, each pixel region comprises at least two sub-pixel regions, and the lyophilic material layers that define the different sub-pixel regions in the same pixel region have different thicknesses. With the pixel definition layer, the climbing quantities of the different solutions in the corresponding pixel definition layers are the same as much as possible. The film-forming uniformity of the solutions in the pixel region is effectively improved.

Abstract: A decrease of an etching rate of a substrate can be suppressed, and energy of ions irradiated to an inner wall of a chamber main body can be reduced. A plasma processing apparatus includes a DC power supply configured to generate a negative DC voltage to be applied to a lower electrode of a stage. In a plasma processing performed by using the plasma processing apparatus, a radio frequency power is supplied to generate plasma by exciting a gas within a chamber. Further, the negative DC voltage from the DC power supply is periodically applied to the lower electrode to attract ions in the plasma onto the substrate placed on the stage. A ratio occupied, within each of cycles, by a period during which the DC voltage is applied to the lower electrode is set to be equal to or less than 40%.

Abstract: Device for the selective detection of benzene gas, which comprises, on a base substrate, a combination of at least one functionalized multi- or single-wall carbon nanotube sensor decorated with rhodium clusters, and at least one functionalized multi- or single-wall carbon nanotube sensor decorated with metal clusters selected from gold, palladium, nickel and titanium, and/or undecorated, where said substrate additionally comprises means for measuring the variation in the resistance of said sensors. The device is useful at ambient temperature in the presence or absence of oxygen and easy to handle. It also relates to a method for the manufacturing thereof and for detecting the gas in the chemical industry, the petrochemical industry, petrol stations, or household, aeronautical or research applications.

Abstract: Disclosed herein is a method of forming low-resistance metal pattern, which can be used to obtain a metal pattern having stable and excellent characteristics by performing sensitization treatment using a copper compound before an activation treatment for forming uniform and dense metal cores, a patterned metal structure, and display devices using the same.

Abstract: According to one embodiment, a magnetic recording medium is formed by performing gas ion irradiation by using a magnetism deactivating gas on a stack including a perpendicular magnetic recording layer, an Ru nonmagnetic underlayer containing a magnetism deactivating element selected from chromium, titanium, and silicon, and a nonmagnetic substrate. Before gas ion irradiation, the perpendicular magnetic recording layer contains platinum and at least one of iron and cobalt. Gas ion irradiation is performed using nitrogen gas alone or a gas mixture of nitrogen gas and at least one gas selected from the group consisting of helium, hydrogen, and B2H6.

Abstract: Provided is a new catalyst capable of removing carbon monoxide economically without adding particular reaction gas externally. Also provided are a process for producing and an apparatus using such a catalyst. Impregnation of a Ni—Al composite oxide precursor of a nonstoichiometric composition prepared by the solution-spray plasma technique with a ruthenium salt to be supported and performing reduction treatment allows CO methanation reaction to selectively proceed even in the high-temperature range in which CO2 methanation reaction and reverse water-gas-shift reaction proceed preferentially with conventional catalysts. Selective CO methanation reaction occurs reproducibly with another Ni—Al composite oxide precursor or an additive metallic species.

Abstract: A process for the simultaneous deposition of films onto both sides of a substrate (2), which comprises in particular introducing a substrate (2) into a reaction chamber (106, 206) or making said substrate run therethrough, in which chamber at least two electrodes (110, 210) are placed. At least one dielectric barrier (14, 114) is placed between these at least two electrodes (110, 210). An adjustable inductor (L) is placed in the secondary circuit of the transformer in parallel with the circuit comprising the at least two electrodes. A high-frequency electrical voltage is generated, said voltage being such that it generates a filamentary plasma (112, 212) on each side of the substrate between the at least two electrodes (110, 210).

Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.

Abstract: A laminate having excellent abrasion resistance to physical stimuli such as dust. The laminate comprises a base layer, a hard coat layer and a top coat layer containing flaky metal oxide fine particles all of which are formed in the mentioned order. The flaky metal oxide fine particles are hardened by at least one method selected from the group consisting of ionizing material exposure, ionizing radiation exposure, infrared exposure, microwave exposure and high-temperature vapor exposure.

Abstract: A durable wear-resistant coating consists of an atomically mixed layer on the surface of the head or media which is developed by bombardment of the surface with energetic C ions with optimized parameters. This mixed layer is covered with a hard DLC overcoat. This mixed interlayer is able to strongly bond the overcoat to the head or media substrate and improve the tribological properties of the overcoat. In this method a very thin layer of a carbide former material can be used as an interlayer before bombarding the surface with C ions which provides a composite interlayer containing C and species from interlayer and substrate. This composite interlayer bonds the DLC overact to the ceramic substrate of the head or the metallic substrate of the media. This interlayer by itself is protective enough to protect the head media of the hard drives against wear and corrosion.

Abstract: In one aspect, the present invention provides nanosized systems for generating electrical energy based on the use of a chemically reactive composition to generate a thermoelectric wave. For example, the system can include at least one nanostructure (e.g., a carbon nanotube) extending along an axial direction between a proximal end and a distal end. A chemically reactive composition is dispersed along at least a portion of the nanostructure, e.g., along its axial direction, so as to provide thermal coupling with the nanostructure. The chemical composition can undergo an exothermic chemical reaction to generate heat. The system can further include an ignition mechanism adapted to activate the chemical composition so as to generate a thermal wave that propagates along the axial direction of the nanostructure, where the thermal wave is accompanied by an electrical energy wave propagating along the axial direction.

Abstract: A hybrid deposition process of CVD and ALD, called NanoLayer Deposition (NLD) is provided. The NLD process is a cyclic sequential deposition process, including introducing a first plurality of precursors to deposit a thin film and introducing a second plurality of precursors to modify the deposited thin film. The deposition using the first set of precursors is not self limiting and is a function of substrate temperature and process time. The second set of precursors modifies the already deposited film characteristics. The second set of precursors can treat the deposited film, including treatments such as modification of film composition and doping or removal of impurities from the deposited film. The second set of precursors can also deposit another layer on the deposited film. The additional layer can react with the existing layer to form a compound layer, or can have minimum reaction to form a nanolaminate film.

Abstract: The invention relates to a method for producing an optical article having antireflection or reflective properties and comprising a substrate having at least one main surface, comprising the step of depositing an sub-layer onto a substrate's main surface, the step of treating the sub-layer by ionic bombardment and the step of depositing onto said sub-layer a multilayered stack comprising at least one high refractive index layer and at least one low refractive index layer. According to a preferred embodiment, the deposition of the sub-layer is conducted in a vacuum chamber in which a gas is supplied during the deposition step.

Abstract: A manufacturing method for a liquid-discharge head substrate including a base material provided with an energy generating element that generates energy utilized for discharging liquid, a noble metal layer including noble metal provided on a surface of the base material on energy generating element side, and a material layer provided to come into contact with the noble metal layer. The manufacturing method includes preparing the base material on which the material layer is provided, oxidizing a part of a surface of the material layer by discharging electricity in oxygen-containing gas, and providing the noble metal layer on the base material.

Abstract: A method for grafting a porous element for leucodepletion by adsorption and/or filtration of a biological fluid, such as blood or a blood component, which method comprises the steps of impregnating the porous element with a solution containing a poly(ethylene oxide) having identical or different functional end groups; and applying an ionizing treatment to the impregnated porous element so as to ensure covalent cross-linking between the poly(ethylene oxide) and the porous element.

Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.

Abstract: The metal part is one where a carboxyl group or an amino group, or a hydroxyl group is imparted onto the surface. On the other hand, the resin part is one into which an adhesiveness modifier containing an epoxy group is blended. A process for producing a composite of metal and resin, wherein the metal part and the resin part are bonded by interaction of the carboxyl group or the amino group, or the hydroxyl group with the epoxy group.

Abstract: A method is disclosed herein for treating a polymeric surface to resist non-specific binding of biomolecules and attachment of cells. The method includes the steps of: imparting a charge to the polymeric surface to produce a charged surface; exposing the charged surface to a nitrogen-rich polymer to form a polymerized surface; exposing the polymerized surface to an oxidized polysaccharide to form an aldehyde surface; and exposing the aldehyde surface to a reducing agent. Advantageously, a method is provided which produces surfaces that resist non-specific protein binding and cell attachment and that avoids the use of photochemical reactions or prior art specially designed compounds.

Abstract: A method of making a heat treated (HT) or heat treatable coated article. A method of making a coated article includes a step of heat treating a glass substrate coated with at least layer of or including carbon (e.g., diamond-like carbon (DLC)) and an overlying protective film thereon. In certain example embodiments, the protective film may be of or include both (a) an oxygen blocking or barrier layer, and (b) a release layer of or including zinc oxide. Treating the zinc oxide inclusive release layer with plasma including oxygen (e.g., via ion beam treatment) improves thermal stability and/or quality of the product. Following and/or during heat treatment (e.g., thermal tempering, or the like) the protective film may be entirely or partially removed.

Abstract: An article may include a substrate that comprises a nickel alloy. The substrate may include a modified subsurface region and a bulk region. The modified subsurface region may include a first composition and the bulk region may include a second composition different than the first composition. The modified subsurface region may include at least one of a reactive element or a noble metal, and the modified subsurface region comprises a thickness of less than about 0.3 ?m measured in a direction substantially normal to a surface of the substrate. The modified subsurface region may be formed by depositing a layer including at least one of the reactive element or the noble metal in a layer on a surface of the substrate and introducing the at least one of the reactive element or the noble metal into the modified subsurface region using ion bombardment.

Abstract: Disclosed is nanocoupling of a polymer onto a surface of a metal substrate for improving coating adhesion of the polymer on the metal substrate, and in vivo stability and durability of the polymer. In accordance with the present invention, the polymers can be grafted via a chemical bonding on the surface of the metal substrate by the nanocoupling, by which adhesion, biocompatibility and durability of a polymer-coated layer which is to be formed later on the metal substrate were remarkably improved; therefore, the nanocoupling according to the present invention can be applied to surface modification of a metal implant, such as stents, mechanical valves, and an articular, a spinal, a dental and an orthopedic implants.

Abstract: The invention provides a method for patterning a polymer surface. A polymer layer is formed on a substrate. A conductive grid with a mesh pattern is placed on the polymer layer. The mesh pattern is transferred to the polymer layer by a plasma treatment. The conductive grid is then removed.

Abstract: A cross section processing method to be performed on a sample by irradiating the sample having a layer or a structure of an organic substance on a surface at a cross section processing position thereof with a focused ion beam using a focused ion beam apparatus includes: a protective film forming step for forming a protective film on the surface of the layer or the structure of the organic substance by irradiating the surface of the sample including the cross section processing position with the focused ion beam under the existence of source gas as the protective film; and a cross section processing step for performing cross section processing by irradiating the cross section processing position formed with the protective film with the focused ion beam at a voltage higher than an accelerating voltage in the protective film forming step.

Abstract: A method for forming a protective coating on a substrate comprising, applying a bond coating to the substrate, the bond coating having a first surface roughness, ionizing an inert gas which flows into the surface of the bond coating so as to impart a second surface roughness to the bond coating greater than the first surface roughness, wherein the inert gas is ionized and caused to flow into the surface of the bond coating by a reverse polarity current supplied to an electrode which removes at least one electron from the inert gas, and applying a top coating to the bond coating. Additionally, a method for preparing a surface to receive and adhere to a coating comprising roughening the surface to create a micro-roughening network on the surface. In addition, a method of improving strain tolerance and cyclic spallation life of a protective coating.

Abstract: The present invention relates to tubular elements, such as fuel assembly tubes, which are designed to be used in high pressure and high temperature water in nuclear reactors, such as pressurized water nuclear reactors. In particular, the present invention relates to a method of improving wear resistance and corrosion resistance by depositing a protective coating having a depth of from about 5 to about 25 ?m on the surface of the tubular elements. The coating is provided by nitriding the tubular element at a temperature of from about 400° C. to about 440° C. The nitridation of the tubular element can be carried out for a duration of from about 12 hours to about 40 hours.

Abstract: A method of fabricating backlight unit is disclosed. The backlight unit method of fabricating backlight unit includes, preparing a base member having a predetermined thickness, applying ultraviolet curing resin on a surface of the base member, transferring prism patterns to the ultraviolet curing resin using a flexible mold having engraved patterns corresponding to the prism patterns, and curing the prism patterns before the prism patterns are separated from the engraved patterns of the flexible mold.

Abstract: A hybrid deposition process of CVD and ALD, called NanoLayer Deposition (NLD) is provided. The nanolayer deposition process is a cyclic sequential deposition process, comprising the first step of introducing a first plurality of precursors to deposit a thin film with the deposition process not self-limiting, then a second step of purging the first set of precursors and a third step of introducing a second plurality of precursors to modify the deposited thin film. The deposition step in the NLD process using the first set of precursors is not self limiting and is a function of substrate temperature and process time. The second set of precursors modifies the already deposited film characteristics. The second set of precursors can treat the deposited film such as a modification of film composition, a doping or a removal of impurities from the deposited film. The second set of precursors can also deposit another layer on the deposited film.

Abstract: A laminate prepared by pretreating at least one side of a substrate of a plastic film by plasma treatment and then directly laminating a thermoplastic resin on a surface treated by pretreatment.

Abstract: Methods of fabricating a metal hard mask and a metal hard mask fabricated by such methods are described. The method includes flowing at least one metal reactant gas into a reaction chamber configured to perform chemical vapor deposition (CVD), wherein the at least one metal reactant gas includes a metal-halogen gas or a metal-organic gas. The method further includes depositing a hard mask metal layer by CVD using the at least one metal reactant gas.

Abstract: A plasma treatment system for treating a workpiece with a downstream-type plasma. The processing chamber of the plasma treatment system includes a chamber lid having a plasma cavity disposed generally between a powered electrode and a grounded plate, a processing space separated from the plasma cavity by the grounded plate, and a substrate support in the processing space for holding the workpiece. A direct plasma is generated in the plasma cavity. The grounded plate is adapted with openings that remove electrons and ions from the plasma admitted from the plasma cavity into the processing space to provide a downstream-type plasma of free radicals. The openings may also eliminate line-of-sight paths for light between the plasma cavity and processing space. In another aspect, the volume of the processing chamber may be adjusted by removing or inserting at least one removable sidewall section from the chamber lid.

Abstract: The present invention provides a multi-component composite film comprising a) polymer support layer, and b) porous gellable polymer layer which is formed on one side or both sides of the support layer of a), wherein the support film of a) and the gellable polymer layer of b) are unified without the interface, a method for preparing the same, and a polymer electrolyte system applied the same.

Abstract: A method and apparatus for treatment of a substrate surface using an atmospheric pressure plasma is disclosed. The method comprises providing an atmospheric pressure plasma in a treatment space between a first electrode and a second electrode, providing a substrate in contact with the first electrode in the treatment space, and applying a plasma generating power to the first and second electrodes. The first electrode has a predefined structure of insulating areas and conductive areas for plasma treatment of surface areas of the substrate corresponding to the areas in contact with the conductive areas of the first electrode.

Abstract: A method for treating a surface of a glass substrate according to the invention has the steps of placing the glass substrate into a vacuum treatment chamber, introducing a gas into the vacuum treatment chamber, providing electric power to generate an ion source and using the ion source to treat the surface of the glass substrate. By this way, the invention can achieve an effect of surface cleaning and further render the conductive film to be coated on the glass substrate in the subsequent stage to have a reduced surface resistance, thereby improving the conductivity of the glass substrate. The film coated on the glass substrate in the subsequent stage will have higher crystalline level as well.

Abstract: A process for forming a coating on a surface of a substrate, so that heating of the coating material is selective and sufficient to cause at least partial melting of the coating material and permit bonding to the substrate without excessively heating the substrate so as not to significantly degrade its properties. The process generally entails forming a brazing paste containing powder particles dispersed in a binder. The particles are formed of a composition that is susceptible to microwave radiation. The brazing paste is then applied to the surface of the substrate and subjected to microwave radiation so that the particles couple with the microwave radiation and are sufficiently heated to burn off the binder and then at least partially melt to form an at least partially molten layer on the substrate. The microwave radiation is then interrupted to allow the at least partially molten layer to cool, solidify, and form the coating.

Abstract: Methods are provided for obtaining hollow nano-structures which include the steps of providing a suspended film starting layer on a support substrate, depositing on the starting layer a sacrificial layer, performing, in progressive sequence, a complete erosion phase of said support substrate and starting layer and performing an at least partial erosion phase of the sacrificial layer previously deposited on the starting layer so as to obtain holes passing through the starting layer and passing or non passing through the sacrificial layer, depositing, on the side of the support substrate opposite to that where the starting layer is put, at least one covering layer arranged to internally cover the holes created by the progressive erosion. Hollow nano-structures formed by such methods are also provided.

Abstract: When a film containing constituent elements of a target is formed on a substrate through a vapor deposition process using plasma with placing the substrate and the target to face to each other, the film is formed with surrounding the substrate with a wall surface having the constituent elements of the target adhering thereto, and applying a physical treatment to the wall surface to cause the components adhering to the wall surface to be released into the film formation atmosphere.

Abstract: A method for reducing a dielectric constant of a film includes (i) forming a dielectric film on a substrate; (ii) treating a surface of the film without film formation, and (III) curing the film. Step (i) includes providing a dielectric film containing a porous matrix and a porogen on a substrate, step (ii) includes, prior to or subsequent to step (iii), treating the dielectric film with charged species of hydrogen generated by capacitively-coupled plasma without film deposition to reduce a dielectric constant of the dielectric film, and step (iii) includes UV-curing the dielectric film to remove at least partially the porogen from the film.

Abstract: Disclosed is a polymeric electret film as well as the method of manufacturing the same. The polymeric electret film comprises a polytetrafluoroethylene film and an electrode layer. The polytetrafluoroethylene film includes a porous layer, which has a porous structure. The porous structure has a pore diameter ranging between 0.01 ?m and 5.0 ?m and has a porosity ranging between 20% and 95%. The polytetrafluoroethylene film has a thickness ranging between 1 ?m and 50 ?m, and is preferably made of expanded porous polytetrafluoroethylene. The polymeric electret film has a surface potential ranging between 0.1 V and 1000 V.

Abstract: A coated article is provided that may be heat treated in certain example embodiments. A graded layer (e.g., contact layer or other suitable layer) is formed by initially sputter-depositing a layer, and thereafter ion beam treating the sputter-deposited layer with at least reactive gas ions in order to form a graded layer. In certain example embodiments, the result is a coated article that has improved visible transmission and/or durability, without sacrificing optional heat treatability.

Abstract: A material based on polymer(s), the material being surface treated by ion bombardment in order to improve the surface appearance of the material. The invention also relates to a process for obtaining this part and the use thereof, in particular for the manufacture of lighting and/or signaling devices.

Abstract: A motor vehicle part comprising a material based on polymer(s), the material being surface treated by ion bombardment in order to improve the surface appearance of the material. The invention also relates to a process for obtaining this part and the use thereof, in particular for the manufacture of lighting and/or signaling devices.

Abstract: Provided is the preparation of a coil-comb block copolymer and a method for producing nanostructures formed by the copolymer. Particularly, provided is a method for producing nanostructured polymer thin films, including: preparing a coil-comb block copolymer via a controlled polymer polymerization process; forming a thin film of the block copolymer on a substrate and carrying out heat treatment to form nanostructures including vertically aligned cylindrical microstructures; and irradiating ultraviolet rays to the thin film and carrying out oxygen plasma treatment to form nanostructured polymer thin films including cylindrical pores.

Abstract: A method is provided for forming a coating layer on a surface, wherein the coating composition includes at least two reactive components. At least one of the components is encapsulated in a plurality of microspheres, which are then mixed with the second component in a single chamber of a container. The mixture is sprayed from the chamber through a single spray nozzle onto the surface. Then, the microspheres degrade to release the first component and allow the first and second components to react with one another, thereby forming the coating layer on the surface.

Abstract: Disclosed is a method for manufacturing an electrode pattern of a disposable electrochemical sensor strip. The method comprises steps of preparing a nonconductive substrate; forming a mask film with an inverse pattern on at least one side of the nonconductive substrate, said mask film is made of water soluble material or solvent soluble material; forming a metal film both on the mask film and the nonconductive substrate; and washing out, by water, solvent, or water solution, the mask film and the metal film which is on the mask film, so as to form a metal electrode with the electrode pattern on at least one side of the substrate of the disposable electrochemical sensor strip.

Abstract: A process for surface preparation of a substrate (2), which comprises introducing or running a substrate (2) into a reaction chamber (6, 106). A dielectric barrier (14, 114) is placed between electrodes (1, 10, 110). A high-frequency electrical voltage is generated, to generate filamentary plasma (12, 112). Molecules (8, 108) are introduced into the reaction chamber (6, 106). Upon contact with the plasma, they generate active species typical of reacting with the surface of the substrate. An adjustable inductor (L) placed in parallel with the inductor of the installation is employed to reduce the phase shift between the voltage and the current generated and to increase the time during which the current flows in the plasma (12, 112).

Abstract: Showerhead electrodes for a semiconductor material processing apparatus are disclosed. An embodiment of the showerhead electrodes includes top and bottom electrodes bonded to each other. The top electrode includes one or more plenums. The bottom electrode includes a plasma-exposed bottom surface and a plurality of gas holes in fluid communication with the plenum. Showerhead electrode assemblies including a showerhead electrode flexibly suspended from a top plate are also disclosed. The showerhead electrode assemblies can be in fluid communication with temperature-control elements spatially separated from the showerhead electrode to control the showerhead electrode temperature. Methods of processing substrates in plasma processing chambers including the showerhead electrode assemblies are also disclosed.

Abstract: Methods for fabricating arrays of nanoscaled alternating lamellar or cylinders in a polymer matrix having improved long range order utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.

Abstract: A method for forming a diamond-like carbon (DLC) layer on air bearing surface (ABS) of a slider, comprises steps of: providing sliders arranged in arrays, each slider having an ABS; forming a mixing layer in the ABS of the slider by depositing a first DLC layer on the ABS, the mixing layer consisting of the slider material and the first DLC layer material; removing the first DLC layer to make the mixing layer exposed; forming a second DLC layer on the mixing layer.