Abstract: The present invention generally provides a method for depositing a low dielectric constant film using an e-beam treatment. In one aspect, the method includes delivering a gas mixture comprising one or more organosilicon compounds and one or more hydrocarbon compounds having at least one cyclic group to a substrate surface at deposition conditions sufficient to deposit a non-cured film comprising the at least one cyclic group on the substrate surface. The method further includes substantially removing the at least one cyclic group from the non-cured film using an electron beam at curing conditions sufficient to provide a dielectric constant less than 2.5 and a hardness greater than 0.5 GPa.

Abstract: A circuit board with identifiable information and a method for fabricating the same are proposed. At least one insulating layer within the circuit board has a non-circuit area free of a circuit layout. A plurality of openings are formed in the non-circuit area of the insulating layer. A patterned circuit layer is formed on the insulating layer. Metal identifiable information is disposed in the openings of the non-circuit area. By this arrangement, a product status of the circuit board can be traced and identified via the metal patterned information.

Abstract: A nanostructure is fabricated using charged particle deposition to deposit a catalyst on a substrate. A charged particle beam is directed to location on the substrate where the catalyst is to be deposited, with a beam-activated precursor gas also being directed to the location. For example, a nickel dot can be selectively deposited onto a substrate by using a charged particle beam to decompose a nickel-containing precursor gas, and then a carbon nanotube can be grown on the nickel dot, with the diameter of the nanotube conforming to the size of the nickel dot.

Abstract: A biosensor includes a substrate with a layer of receptive material disposed thereon. The receptive material is specific for an analyte of interest. A pattern of active and deactivated areas of the receptive material are defined in the receptive material layer by a masking process.

Abstract: A glue film (11) on a cellular structure (10) in order to form a regular glue strip on the edges of the partitions of the cells of the cellular structure (10), and the glue film (11) is exposed to a source (24) that emits radiation adapted to reactivity of the glue to only heat the glue selectively. The glue thus creeps without significantly triggering polymerisation. The glue strip is formed on the ends of the partitions without supplying an air flow through the openings of the cellular structure. The portion of the part located below the source is preferably kept approximately horizontal so that the glue strip is formed under the best possible conditions.

Abstract: A method of manufacturing a low temperature polysilicon film is provided. A first metal layer is formed on a substrate; and openings have been formed in the first metal layer. A second metal layer is formed on the first metal layer: and a hole corresponding to each of the openings is formed in the second metal layer. A silicon layer is formed on the second metal layer; a silicon seed is formed on the substrate inside each of the holes. After removing the first and the second metal layers, an amorphous silicon layer is formed on the substrate by using the silicon seed. Then a laser crystallization step is performed to form a polysilicon layer from the amorphous layer. Since the position of the silicon seed can be controlled, the size and distribution of the silicon grain and the number of the silicon crystal interface can also be controlled.

Abstract: Method of synthesizing carbon nano tubes (CNTs) on a catalyst layer formed on a support member, by catalytic deposition of carbon from a gaseous phase, whereby an ion beam is used prior to, during, and/or after formation of the carbon nano tubes for modifying the physical, chemical, and/or conductive properties of the carbon nanotubes.

Abstract: Although it is known that exchange bias can be utilized in abutted junctions for longitudinal stabilization, a relatively large moment is needed to pin down the sensor edges effectively. Due to the inverse dependence of the exchange bias on the magnetic layer thickness, a large exchange bias has been difficult to achieve by the prior art. This problem has been solved by introducing a structure in which the magnetic moment of the bias layer has been approximately doubled by pinning it from both above and below through exchange with antiferromagnetic layers. Additionally, since the antiferromagnetic layer is in direct abutted contact with the free layer, it acts directly to help stabilize the sensor edge, which is an advantage over the traditional magnetostatic pinning that had been used.

Abstract: A method for manipulating a nanoscale object deposited on a substrate. The surface of the substrate is passive. A target position is formed on the passive surface by the action of the tip of a scanning probe microscope. The nanoscale object is picked from its initial position by the tip of the scanning probe microscope, then placed and released at the target position.

Abstract: A method for structuring a surface includes, by an assigned modification device, creating a latent structure of at least a first layer of the surface, which has a polymer therein, so as to form hydrophilic and hydrophobic regions for producing a printing form for offset printing, by selectively applying a gaseous, readily volatile solvent as a modifying agent to at least one locally limited region of the surface over at least one exposure time interval. A device for performing the method, a printing form exposer, a printing unit and a printing machine including the surface-structuring device according to the invention, are also provided.

Abstract: In a method for patterning a polymer film forming a coating on a material surface, a thin film of polymer is deposited on the surface and the patterning takes place by applying to the material surface a stamp made of an elastomeric material in conformal contact with the surface of the thin film, such that portions thereof contacting one or more protruding elements of the elastomeric stamp formed by one or more indentations thereof, are attached to the protruding element or elements and removed from the material surface with the stamp. In a method for transferring a patterned polymer film onto a material surface, a thin film polymer is deposited on a stamp surface and the stamp is applied in conformal contact with the material surface, such that thin film of polymer is transferred thereto from one or more protruding elements of the elastomeric stamp formed by at least one indentation thereof, thus leaving a patterned thin film of polymer on the material surface when removing the stamp therefrom.

Abstract: A method for mask-free molecular or atomic patterning of surfaces of reactive solids is disclosed. Molecules adsorb at surfaces in patterns, governed by the structure of the surface, the chemical nature of the adsorbate, and the adsorbate coverage at the surface. The surface is patterned and then imprinted with the pattern by inducing localized chemical reaction between adsorbate molecules and the surface of the solid, resulting in an imprint being formed in the vicinity of the adsorbate molecules. When the imprinted molecular patterns are conjugated chains containing ? bonds along which electrical charge can flow the molecular patterns constitute molecular wires or the imprinted molecules constitute a molecular-scale device. The surface of the substrate can be doped by including n- or p-type dopants in the adsorbate molecules. These molecular wires are anchored to the substrate by using conjugated chains which can be chemically bound at intervals along the chains to the substrates.

Abstract: Provided is a method of forming a silicon thin-film which comprises a step of arranging in one or more parts of a liquid arranging surface liquid which contains a silicide comprising ring silane and/or a derivative thereof, such ring silane comprising silicon and hydrogen, and a step of forming a silicon thin-film by vaporizing silicide from liquid and supplying the silicide to a thin-film-forming surface.

Abstract: A method of forming metallization patterns on a block of dielectric material wherein the entire surface area of the dielectric block is encased with a conductive material and unwanted conductive metal is ablatively etched from a designated surface area of the dielectric block to form desired metallized circuit patterns.

Abstract: A substrate containing a natural polymeric material is modified by: A) treating the substrate containing the natural polymeric material with a modifying agent selected from the group consisting of organo-functional coupling agents and multi-functional amine containing organic compounds; and B) optionally exposing the substrate containing natural polymeric material with one or more treatments selected from the consisting of: i) subjecting the substrate to extraction with a solvent to reduce the content of extractable materials associated with the natural polymeric material prior to or during treatment with the modifying agent; ii) treatment with a physical field selected from static physical fields, high-frequency alternating physical fields and combinations of two or more thereof either prior to, during or after treatment with the modifying agent; and iii) oxidation of at least part of the natural polymeric material prior to or during treatment with the modifying agent.

Abstract: The present invention involves the hydrothermal treatment of nanostructured films to form high k PMOD™ films for use in applications that are temperature sensitive, such as applications using a polymer based substrate. After a PMOD™ precursor is deposited and converted on a substrate, and possibly after other process steps, the amorphous, nanoporous directly patterned film is subjected to low temperature hydrothermal treatment to densify and possibly crystallize the resulting high dielectric PMOD™ film. A post hydrothermal treatment bake is then performed to remove adsorped water.

Abstract: A photoresist-free method for making patterned films of metal oxides, metals, or other metal containing compounds is described. The method involves applying a thin film coating of a metal complex, resulting in the formation of a liquid crystal film. This film can be photolyzed resulting in a chemical reaction which deposits a metal or metal oxide film. The metal complex used is photoreactive and undergoes a chemical reaction in the presence of light of a suitable wavelength. The end product of the reactions depends upon the atmosphere in which the reactions take place. Metal oxide films may be made in air. Patterned films may be made by exposing only selected portions of the film to light. Patterns of two or more materials may be laid down from the same film by exposing different parts of the film to light in different atmospheres.

Abstract: The foregoing differential gloss covering comprises a backing substrate, an ink layer, and a cured top layer having a first surface portion with a first gloss and a second surface portion, made by the process comprising providing the backing substrate; depositing an ink formulation comprising a curing agent over at least a first area of a top side of the backing substrate to form said ink layer; coating the top side of the backing substrate with a radiation curable formulation to form a top curable layer; diffusing at least a portion of the curing agent into the top curable layer; curing the top curable layer to form the cured top layer and thereby forming a differential gloss covering having said first surface portion above the first area of said top of said backing substrate having the first gloss and the second surface portion having the second gloss that is different from said first gloss.

Abstract: Systems and methods for creating a combinatorial coating library including a coating system operatively coupled to at least one of a plurality of materials suitable for forming at least one coating layer on a surface of one or more substrates. The systems and methods also including a curing system operative to apply at least one of a plurality of curing environments to each of a plurality of regions associated with the at least one coating layer, the curing system comprising a plurality of waveguides each having a first end corresponding to at least one of the plurality of regions and a second end associated with at least one curing source. The combinatorial coating library comprising a predetermined combination of at least one of the plurality of materials and at least one of the plurality of curing environments associated with each of the plurality of regions.

Abstract: High areal storage density, patterned magnetic media comprising a patterned plurality of at least partially crystalline, ferromagnetic particles or grains are provided by means of a simple, economical process wherein a non-magnetic substrate is provided with a layer of an amorphous, paramagnetic or anti-paramagnetic material comprising at least one component, e.g., a metal element, which is ferromagnetic when in at least partially crystalline form, and at least partially crystallizing the at least one component at selected areas of the amorphous layer to form a spaced-apart pattern of at least partially crystallized, ferromagnetic particles or grains of the at least one component, the particles or grains being spaced apart and surrounded by a matrix of the amorphous material. Embodiments include utilizing a focussed or scanned laser source and an amorphous Ni—P layer for forming ferromagnetic Ni particles or grains.

Abstract: A method and apparatus for locally raising the temperature of a material in order to facilitate chemical reactions or processes related to growth or removal of the material utilizes an electrode to apply, in the presence of a growth or removal medium, a controlled succession of thermal spikes or shockwaves of varying energy. The scale of the thermal spikes or shockwaves, and the area of the material affected by the resulting energy transfer, is on the order of a few nanometers to several hundred micrometers, and the duration of the thermal spikes or shockwaves ranges from a few picoseconds to several hundred nanoseconds. The growth or removal medium may be a cryogenic liquid, although other growth media, including liquids, solids, gases in critical or non-critical state, and mixtures of liquids and solids, solids and gases, and liquids and gases, may also be employed.

Abstract: This invention comprises methods for making nanostructured and nanoporous thin film structures of various compositions. These films can be directly patterned. In these methods, precursor films are deposited on a surface and different components of the precursor film are reacted under selected conditions, forming a nanostructured or nanoporous film. Such films can be used in a variety of applications, for example, low k dielectrics, sensors, catalysts, conductors or magnetic films. Nanostructured films can be created: (1) using one precursor component and two reactions, (2) using two or more components based on differential rates of photochemical conversion, (3) using two precursors based on the thermal sensitivity of one precursor and the photochemical sensitivity of the other, and (4) by photochemical reaction of a precursor film and selected removal of a largely unreacted component from the film.

Abstract: A method of producing a magnetic recording medium comprising the steps of providing a substrate having a layer of a non-magnetic material that can be converted into a magnetic state by annealing, and then converting selected portions of the non-magnetic layer to a magnetic state by subjecting them to annealing by directing a focussed beam of radiation onto the substrate to form a patterned magnetic layer comprising an ordered array of magnetic regions separated by non-magnetic regions.

Abstract: Described are conductor track structures on a nonconductive support material, especially fine conductor track structures, which are comprised of a base containing a heavy metal and a metallized coating applied to this, and a method for their production. The invention is characterized in that the heavy metal base in the area of the conductor track structures contains heavy metal nuclei, which have been created by the breakup of an organic nonconductive heavy metal complex, and that the support material contains microporous or microrough support particles to which the heavy metal nuclei are bound. An outstanding strength of adhesion of the deposited metal conductor tracks is achieved. The method is especially suitable also for the production of three-dimensional circuit supports.

Abstract: An exemplary method of constructing an alternating phase-shifting mask is described. This method can include providing a vapor in a vapor chamber containing a mask blank, and applying a laser to selected areas of the mask blank to deposit material on the integrated circuit substrate. The material is configured to cause a 180° phase shift at the wavelengths the mask is designed for such as 248 nm, 193 nm or 157 nm.

Abstract: Provided are a method of manufacturing a magnetoresistive device and a method of manufacturing a thin film magnetic head capable of efficiently forming a magnetoresistive device having an extremely small magnetoresistive film pattern, and capable of reducing variations in dimensions of the magnetoresistive film pattern. Further, provided is a method of forming a thin film pattern capable of efficiently forming a plurality of thin film patterns with different sizes on a same base with accuracy according to the thin film patterns. Electron beam lithography or photolithography is selectively used according to the sizes of patterns to be formed, so while the dimensional accuracy of a portion specifically requiring higher accuracy can be secured, the patterns can be efficiently formed.

Abstract: A charged particle beam uniformly removes material, particularly crystalline material, from an area of a target by compensating for or altering the crystal orientation or structure of the material to be removed. The invention is particularly suited for FIB micromachining of copper-based crystalline structures. Uniformity of material removal can be improved, for example, by passing incoming ions through a sacrificial layer formed on the surface of the material to be removed. The sacrificial layer is removed along with the material being milled. Uniformity of removal can also be improved by changing the morphology of the material to be removed, for example, by disrupting its crystal structure or by altering its topography.

Abstract: An exemplary method of selectively patterning a hard mask or reticle using a laser to cause deposition of hard mask material in locations forming the hard mask pattern. This method can include providing a vapor in a vapor chamber containing an integrated circuit substrate, and applying a laser to selected areas of the integrated circuit substrate to cause a reaction with the vapor and create a structure on the integrated circuit substrate.

Abstract: Microoptical systems with clear aperture of about one millimeter or less are fabricated from a layer of photoresist using a lithographic process to define the optical elements. A deep X-ray source is typically used to expose the photoresist. Exposure and development of the photoresist layer can produce planar, cylindrical, and radially symmetric micro-scale optical elements, comprising lenses, mirrors, apertures, diffractive elements, and prisms, monolithically formed on a common substrate with the mutual optical alignment required to provide the desired system functionality. Optical alignment can be controlled to better than one micron accuracy. Appropriate combinations of structure and materials enable optical designs that include corrections for chromatic and other optical aberrations. The developed photoresist can be used as the basis for a molding operation to produce microoptical systems made of a range of optical materials.

Abstract: A process for forming low dielectric constant dielectric films for the production of microelectronic devices. A dielectric layer is formed on a substrate by chemical vapor depositing a monomeric or oligomeric dielectric precursor in a chemical vapor deposit apparatus, or a reaction product formed from the precursor in the apparatus, onto a substrate, to form a layer on a surface of a substrate. After optionally heating the layer at a sufficient time and temperature to dry the layer, the layer is then exposed to electron beam radiation, for a sufficient time, temperature, electron beam energy and electron beam dose to modify the layer. The electron beam exposing step is conducted by overall exposing the dielectric layer with a wide, large beam of electron beam radiation from a large-area electron beam source.

Abstract: A method for producing a contact structure having a contactor for achieving an electrical connection with a contact target. The method include the steps of providing a substrate, forming a polymer layer on a surface of the dielectric substrate, positioning a micromachining tool over the first abrasive layer and irradiating a beam of electro-thermal energy on a surface of the polymer layer to form a deposition pattern thereon, depositing conductive material in the deposition pattern on the polymer layer thereby forming a horizontal portion of the contactor, and repeating the above steps, thereby forming a contact portion of the contactor in a vertical direction on one end of the horizontal portion.

Abstract: The method of manufacturing the magnetic medium for data storage comprising magnetic segments (5) for data storage which alternate regularly with nonmagnetic segments, which method comprises deposition on a substrate (1) from a nonmagnetic material a material having low or zero initial magnetization and capable of varying its magnetic characteristics under the effect of irradiation. The mentioned material is laid on the substrate (1) as a layer (2) in a thickness corresponding to one of the overall size values of any one of the magnetic segment (5) being formed. Then the applied layer (2) is selectively irradiated so as to vary the magnetic characteristics of the material of the layer (2) on the irradiated segments before forming the magnetic segments (5) each having a maximum overall size the ratio between which and any other overall size of this magnetic segment is from 3.5:1 to 15:1.

Abstract: Methods and apparatus are provided in which a metal precursor is formed in a process that includes the following steps: depositing a metal precursor on a substrate; adding an energy to reduce the metal precursor and to precipitate metal on the substrate as a continuous metal layer; and selecting the metal precursor and the energy such that the purity of the continuous metal layer is greater than 85%, and/or the deposited layer has an electrical conductivity substantially that of a pure metal. Methods and apparatus are also provided in which a metal is deposited onto a substrate by a process which includes the following steps: depositing the metal precursor onto the substrate in a desired pattern; and applying sufficient energy to decompose the precursor to precipitate metal in a continuous metal layer in the desired pattern.

Abstract: To provide a lower layer resist composition for a silicon-containing two-layer resist, which is excellent in the dry etching resistance and film thickness uniformity.

Abstract: A process for the preparation of a multi-layer coating wherein a colour- and/or special effect-imparting base lacquer coating compound is applied to a substrate optionally precoated with a primer and/or primer surfacer coating compound and/or further coating compounds and a clear lacquer layer is then applied to the colour- and/or special effect-imparting base lacquer layer, wherein the colour- and/or special effect-imparting base lacquer coating compound used is one which contains binders which can be cured by free-radical and/or cationic polymerisation under the action of high-energy radiation.

Abstract: Process for producing a multi-layer lacquer finish, in which a surfacer coating compound is applied to a substrate optionally pre-coated with a priming layer and/or further coating layers, and a top coating comprising a color-imparting and/or special-effect-imparting base lacquer layer and a transparent clear lacquer layer, or a top coating comprising a pigmented one-layer top lacquer, is then applied, in which the surfacer coating compound which is used is one which either contains binders which are curable exclusively by free radical and/or cationic polymerization, wherein the said binders are cured by means of high-energy radiation, or is one which contains binders which are curable by free radical and/or cationic polymerization, wherein the said binders are cured by means of high-energy radiation, and additionally contains chemically cross-linking binders.

Abstract: There is provided a process for forming a silicon oxide film which is useful as an electrical insulating film, dielectric film or protective film as used in LSI, thin-film transistor, photoelectric converter, photosensitive body and the like. The process comprises forming a coating film from a polysilane compound represented by the formula SinRm (wherein n is an integer of 3 or more, m is an integer of n to 2n+2, and a plurality of R's are independently a hydrogen atom or an alkyl group) and oxidizing the coating film to form the silicon oxide film.

Abstract: A method of producing a patterned magnetic nanostructure is disclosed. The method includes providing a substrate having a non-magnetic single layer or multi layer film that can be converted into a magnetic state by annealing and/or mixing. The method further includes positioning a mask having a desired pattern and resolution associated with the patterned magnetic nanostructure on or over the film. The method additionally includes subjecting the mask-covered substrate to a beam of radiation (focussed or unfocussed) having sufficient energy to locally anneal and/or mix the non-magnetic or weak-magnetic single-layer or multi layer film. Because of the mask effect, only the desired portions of the non-magnetic film are exposed to the beam of radiation. As such, the desired portions of the non-magnetic film are changed from a non-magnetic to a magnetic state to produce an array of magnetic elements in a non-magnetic matrix. The size of each magnetic element is dependent on the resolution of mask.

Abstract: A photoresist-free method for making patterned films of metal oxides, metals, or other metal containing compounds is described. The method involves applying a thin film coating of a metal complex, resulting in the formation of a liquid crystal film. This film can be photolyzed resulting in a chemical reaction which deposits a metal or metal oxide film.. The metal complex used is photoreactive and undergoes a chemical reaction in the presence of light of a suitable wavelength. The end product of the reactions depends upon the atmosphere in which the reactions take place. Metal oxide films may be made in air. Patterned films may be made by exposing only selected portions of the film to light. Patterns of two or more materials may be laid down from the same film by exposing different parts of the film to light in different atmospheres.

Abstract: In a strip-shaped mould for producing surface materials, in particular surfaces of melamine resin in the production of laminate panels, with a structured surface, a flexible strip (10) of paper or foil is provided with a layer (12) having a separating action in relation to the surface material, with the formation of slightly cross-linked regions, and a three dimensional shaped structure consisting of UV-hardening printing inks is applied thereto.

Abstract: Process for producing a multi-layer lacquer finish, in which a surfacer coating compound is applied to a substrate optionally pre-coated with a priming layer and/or further coating layers, and a top coating comprising a colour-imparting and/or special-effect-imparting base lacquer layer and a transparent clear lacquer layer, or a top coating comprising a pigmented one-layer top lacquer, is then applied, in which coating compounds which contain binders which are curable by free radical and/or cationic polymerisation are employed as the surfacer, the base lacquer and the clear lacquer as well as the one-layer top lacquer, and wherein the said binders are cured by means of high-energy radiation.

Abstract: It is an object of the present invention to provide a method of making a magnetic disk having a uniform textured structure with micro-waviness of fabrication depth of less than 20 nm, preferably less than 10 nm, and a local depth deviation of less than 5%, in which texture patterns are characterized by the fact that lateral surfaces of the structure are sloped or curved. The object has been achieved in a method for making a magnetic disk, having micro-waviness on a fabrication surface of a substrate for reducing dynamic friction and controlling head float, by rotating and irradiating the fabrication surface with a high energy beam from a beam surface at an inclined angle to the substrate surface. The surface is irradiated through a shielding mask having a specific pattern, so as to produce a transcription pattern on the substrate surface to produce a textured structure with micro-waviness having sloped or curved side surfaces.

Abstract: A process of forming a material such as a waveguide with at least two regions of differing refractive indices comprising the steps of: (a) providing an amount of a gelable composition comprising at least one gelable component in a desired form; (b) exposing the gelable composition to conditions which partially gel the gelable composition so that an amount of ungelled material remains; (c) exposing at least one discrete region of the partially gelled product of step (b) to conditions which induce more complete gelation of the partially gelled gelable composition so that more of the ungelled material is incorporated into the gel structure in the exposed regions than in non-exposed regions; and (d) removing material not incorporated in the gel structure at least from the non-exposed region. A second component may additionally be provided, the second component being selected to impart a higher or lower refractive index to that part of the material in which it is incorporated.

Abstract: The present invention relates to a method of and a device for optimizing at least one coating material at at least one point of a substrate surface to which the coating material is applied. The method, which is carried out with the corresponding device, comprises at least the following steps: a) applying said at least one coating material to said at least one point of the substrate surface, b) curing said at least one coating material at said at least one point of the substrate surface, and c) determining the state, especially the curing and/or yellowing and/or gloss, of said coating material at said at least one point of the substrate surface, possessed by said coating material as a consequence of steps a) and b).

Abstract: Functionalized polymer surfaces having reactive moieties thereon are contacted with stamps having ligands adsorbed thereto, the ligands also comprising reactive moieties. The reactive moieties of the functionalized surfaces and the ligands form covalent bonds, thus providing a method of microstamping polymer surfaces directly with ligands such as biological ligands. Using this method, devices such as tissue culture plates with polymer surfaces that are microstamped directly with ligands can be made.

Abstract: In the heating of a substrate in a lithographic process, temperature conditions for heating a substrate on which a resist is formed exert a large influence upon the pattern dimensions, and the pattern dimensions vary greatly in the heating from only one of the surfaces of the substrate. There is provided a substrate heating apparatus for heating a substrate before or after irradiation of light for performing a pattern by using a photosensitive material formed on a substrate or by using a material which is photosensitive to charged particles formed on the substrate. The substrate heating apparatus includes an upper heater which serves as a heat source for heating the substrate from the top surface thereof, a lower heater which serves as a heat source for heating the substrate from the bottom surface thereof, and a heat-conducting heater block provided on the lower heater, on which heater block the substrate is placed, making it possible to individually set the temperatures of the upper and lower heaters.

Abstract: A method for applying a protective coating to a surface. The method is achieved by applying a radiation curable reactive coating material to the surface and exposing the applied coating to a source of light for a predetermined time and at a predetermined intensity to effect polymerization of the coating.

Abstract: A test tube comprises a tube body of unitary construction including an enclosed sidewall and an integral bottom that together define a tubular container having an open top. The bottom has a concave interior surface and a planar exterior surface upon which machine readable data is encoded within a multi-layered opaque coating that is deposited onto the planar exterior surface to uniquely identify the test tube. The machine readable data is preferably an open (i.e., non-proprietary) data matrix code. This code is applied to the test tube by depositing a multi-layer coating onto the planar exterior of the tube bottom. The multi-layer coating may include a first layer of opaque material that is deposited onto the planar exterior surface, and a second layer of opaque material that is deposited onto the first layer. The machine readable code is formed in the multi-layered coating by removing portions of the second layer.

Abstract: An anti-corrosive coating for structural steel components contains 3 to 80 wt. % of a binder including polymeric material, and 20 to 97 wt. % of a filler including semiconductive elements or compounds. A process for welding a steel component coated with such an anti-corrosive coating involves temporarily energizing the semiconductive material of the coating into its conductive state and then carrying out the welding process, e.g. electric spot welding, while the semiconductive material is in the conductive state. Thereby, the coating does not hamper the electric welding operation. The step of energizing the semiconductive material is achieved by temporarily applying an external energy such as localized heating or incident light radiation having a photon energy corresponding to an energy band gap of the semiconductive material.

Abstract: The invention provides a system and a method for densifying a surface of a porous film. By reducing the porosity of a film, the method yields a densified film that is more impenetrable to subsequent liquid processes. The method comprises the steps of providing a film having an exposed surface. The film can be supported by a semiconductor substrate. When the film is moved to a processing position, a focused source of radiation is created by a beam source. The exposed surface of the film is then irradiated by the beam source at the processing position until a predetermined dielectric constant is achieved. The film or beam source may be rotated, inclined, and/or moved between a variety of positions to ensure that the exposed surface of the film is irradiated evenly.