Abstract: The invention is directed to a photoresist-free method for depositing films composed of metals, such as copper, or its oxides from metal complexes. More specifically, the method involves applying an amorphous film of a metal complex to a substrate. The metal complexes have the formula MfLgXh, wherein M is selected from the group consisting of Ti, V, Cr, Au, Mn, Fe, Co, Ni, Cu, Zn, Si, Sn, Li, Na, K, Ba, Sr, Mo, Ru, Pd, Pt, Re, Ir, and Os, L is a ligand of the formula (R2NCR2′CO) wherein R and R′ are independently selected from H, CnHm and CnHmAxBy wherein A and B are independently selected from main group elements and f, g, h, n, m, x and y represent integers and wherein X is an anion independently selected from N3, NCO, NO3, NO2, Cl, Br, I, CN, OH, H and CH3. These films, upon, for example, thermal, photochemical or electron beam irradiation may be converted to the metal or its oxides.

Abstract: The invention is to enable easy formation of a fine electroconductive film pattern with a composition utilizing aqueous solvent of easy handling and little environmental burden.

Abstract: This invention is directed to a method for forming an inked image on game balls, golf balls, and the like, through the use of novel curable inks that are low energy curable and require minimal curing through multiple source radiation curing processes, such as UV radiation, visible radiation, and electron beam radiation. Production inks, logo inks, and methods for forming production prints and logos on golf balls, game balls, and the like are disclosed.

Abstract: There is provided a method of patterning a substrate with an atomic mask having a mask substrate and first atoms adsorbed on the mask substrate, the first atoms forming a mask pattern having a one-atomic thickness, including the steps, in sequence, of (a) depositing adatoms over a surface of a substrate to be patterned, the adatoms having low reactivity with second atoms of which the substrate is composed, and (b) putting the atomic mask close to the substrate in such a distance that the first atoms make a chemical bond with the adatoms, so that adatoms located nearest to the first atoms are desorbed out of the substrate to form a pattern on the substrate, the pattern being defined as an area where none of the adatoms exists. In accordance with the above mentioned method, it is possible to form a pattern on the sub-nanometer or nanometer order with high accuracy and in a short period of time, and it is also possible to repeatedly form the same pattern by using the atomic mask.

Abstract: A method for mask-free molecular or atomic patterning of surfaces of reactive solids is disclosed. A molecular-scale pattern of adsorbate molecules is used in place of the conventional macroscopic “mask”. Molecules adsorb at surfaces in patterns, governed by the structure of the surface, the chemical nature of the adsorbate, and the adsorbate coverage at the surface. The surface is patterned and then marked or imprinted with the pattern by inducing localised chemical reaction between adsorbate molecules and the surface of the solid, resulting in an imprint being formed in the vicinity of the adsorbate molecules. In one aspect of the invention, photoinduced or electron-induced reaction of the patterned adsorbate leads to patterned reaction with the surface.

Abstract: Disclosed is a method of manufacturing a thin film magnetic head, which enables a magnetic pole portion to be formed with high precision in a short time. After forming a mask precursor pattern by patterning an alumina layer, the mask precursor pattern is subjected to an etching process of ion milling, thereby forming a first mask. The width of a portion in the first mask is narrower than the width of the minimum pattern which can be formed by a photolithography process. Consequently, by performing the etching process, the width of the portion of the first mask can be narrowed.

Abstract: A method of preferentially depositing material on a substrate is disclosed. Material can be preferentially deposited by directing an electromagnetic interference pattern on to a substrate to selectively heat areas of the substrate coincident with the interference pattern maxima. The substrate can then be exposed to gas phase material that is capable of preferentially accumulating on surfaces based on surface temperature.

Abstract: The invention relates to methods of localizing a deviant region in a turbid medium. The invention also relates to devices for carrying out such methods. Said methods can possibly be used in optical mammography where a breast of a female body is examined by means of light. Said methods produce images in which any deviations, for example tumors, can be clearly recognized. This is achieved inter alia by providing markers (10) in an image (9) of the turbid medium.

Abstract: A magnetic recording disk having on its surface a texture structure of fine surface irregularities with reduced variations, which is suitable for high-density magnetic recording, and a method of manufacturing such a magnetic recording disk are provided.

Abstract: A fullerene containing structure comprises an amorphous carbon base having a first amorphous carbon layer and a second amorphous carbon layer laminated together, and a giant fullerene formed in the neighborhood of layer interface of the amorphous carbon base straddling on both the amorphous carbon layers. A plurality of giant fullerenes generated in the neighborhood of the layer interface are connected together to form a continuum body such as a film structure (a film of giant fullerene) or the like. According to such the fullerene containing structure, a shape and a position to be formed of the giant fullerene, further a state of formation such as a connecting structure or the like can be controlled. In addition, the stable carbon base can protect the generated giant fullerene itself.

Abstract: In a method for forming the electrode pattern of a piezoelectric element for an ultrasonic motor, metal pattern masks made of a metal material of a low expansion coefficient are disposed on the surfaces of piezoelectric elements for the ultrasonic motor, and the electrode patterns are formed on the surfaces of the piezoelectric elements through the metal pattern masks by means of a vacuum evaporation device which is equipped with a physical assistance device for rendering physical assistance with ion beams or ion plating.

Abstract: In the heating of a substrate in a lithographic process, temperature conditions for heating a substrate on which a resist is formed exert a large influence upon the pattern dimensions, and the pattern dimensions vary greatly in the heating from only one of the surfaces of the substrate. There is provided a substrate heating apparatus for heating a substrate before or after irradiation of light for performing a pattern by using a photosensitive material formed on a substrate or by using a material which is photosensitive to charged particles formed on the substrate. The substrate heating apparatus includes an upper heater which serves as a heat source for heating the substrate from the top surface thereof, a lower heater which serves as a heat source for heating the substrate from the bottom surface thereof, and a heat-conducting heater block provided on the lower heater, on which heater block the substrate is placed, making it possible to individually set the temperatures of the upper and lower heaters.

Abstract: An electron-emitting device comprises an electroconductive film including an electron-emitting region and a pair of electrodes for applying a voltage to the electroconductive film. The electron-emitting region is formed by applying a film of organic substance to the electroconductive film, carbonizing the organic substance by electrically energizing the electroconductive film, and forming a fissure or fissures in the electroconductive film prior to the carbonization. The electron-emitting device constitutes an electron source having a plurality of electron-emitting devices, and further an image-forming device comprising an electron source and an image-forming member arranged in an envelope.

Abstract: The invention concerns the use of hydride-containing aluminium oxide for producing optically detectable markings and inscriptions.

Abstract: This invention relates to an economical coating composition for porous substrates that provides extremely glossy surfaces, is capable of supporting holographic images, provides good oxygen barrier properties as well as good oil, grease, solvent and water resistance. Said coatings on paper substrates are printable, biodegradable, recyclable, and repulpable. They are also suitable for use in conjunction with food products. This invention also relates to a process for applying said coatings onto porous substrates as well as a process for the economical production of inexpensive holographic images on substrates such as paper and cardboard containers.

Abstract: A new method for making patterned magnetic storage media with magnetic and substantially non-magnetic zones utilizes a selective oxidation processes. Selective oxidation is achieved by subjecting a magnetic layer to an oxygen plasma through voids in a patterned mask. A high resolution patterned mask is made by embossing and reactive ion etch processes. The method is used to fabricate patterned magnetic disks media with alternating magnetic and non-magnetic zones ranging from 10 to 1000 Nanometers in width. Magnetic storage disks produced by this method have high-bit densities, minimal topography and reduced signal noise.

Abstract: A method for mask-free molecular or atomic patterning of surfaces of reactive solids is disclosed. A molecular-scale pattern of adsorbate molecules is used in place of the conventional macroscopic "mask". Molecules adsorb at surfaces in patterns, governed by the structure of the surface, the chemical nature of the adsorbate, and the adsorbate coverage at the surface. The surface is patterned and then marked or imprinted with the pattern by inducing localized chemical reaction between adsorbate molecules and the surface of the solid, resulting in an imprint being formed in the vicinity of the adsorbate molecules. In one aspect of the invention, photoinduced reaction of the patterned adsorbate leads to patterned photoreaction with the surface.

Abstract: A process for additive manufacture by energetic wire deposition is described. A source wire is fed into a energy beam generated melt-pool on a growth surface as the melt-pool moves over the growth surface. This process enables the rapid prototyping and manufacture of fully dense, near-net shape components, as well as cladding and welding processes. Alloys, graded materials, and other inhomogeneous materials can be grown using this process.

Abstract: Apparatus and method for immobilizing molecules, particularly biomolecules such as DNA, RNA, proteins, lipids, carbohydrates, or hormones onto a substrate such as glass or silica; patterns of immobilization can be made resulting in addressable, discrete arrays of molecules on a substrate, having applications in bioelectronics, DNA hybridization assays, drug assays, etc.

Abstract: The present invention provides a surface modification method that provides beneficial changes in surface properties, can modify a surface to a greater depth than previous methods, and that is suitable for industrial application. The present method comprises applying a thin-film coating to a surface of a substrate, then subjecting the coated surface to an ion beam. The ion beam power pulse heats the coated surface, leading to alloying between the material in the coating and the material of the substrate. Rapid cooling of the alloyed layer after an ion beam pulse can lead to formation of metastable alloys and microstructures not accessible by conventional alloying methods or intense ion beam treatment of the substrate alone.

Abstract: A process for the preparation of substrates used in the manufacture of integrated circuits wherein spin-on low dielectric constant (low-k) polymer films are applied on semiconductor substrates. A non-etchback processing of spin-on low-k polymer films, without losing the low dielectric constant feature of the film, especially in between metal lines, is achieved utilizing electron beam radiation. A polymeric dielectric film is applied and dried onto a substrate and exposed to electron beam radiation under conditions sufficient to partially cure the dielectric layer. The exposing forms a relatively more hardened topmost portion of the dielectric layer and a relatively less hardened underlying portion of the dielectric layer.

Abstract: A method and apparatus for repairing black dot defects connected to a circuit pattern in photomasks such as a photomask having a patterned chromium film on a glass substrate comprises using an energy source in the form of an energy beam to first sever the connected black dot defect from the chrome pattern forming a space between the defect and the chrome pattern. The remaining severed black dot defect is then removed using the same or different energy beam to remove the remainder of the chrome defect. An apparatus for removing black dot defects and photomasks produced by the method and apparatus of the invention are also provided.

Abstract: Structured materials for photonic devices, at wavelengths of X-ray, ultraviolet, visible, infrared and microwave radiation, can be made using layer growth techniques. Such a structure can be made layer by layer, by homogeneous deposition followed by localized modification for refractive index differentiation. Alternatively, the structure can be made by simultaneous growth of regions whose refractive index differs. The structures can be used as selective bandpass filters, and in photovoltaic solar cells, for example.

Abstract: Several techniques for forming a colored interference filter coating on a substrate such as polyester film. The interference filter has two metal reflective films, at least one of which is semi-transparent. A layer of transparent acrylate polymer dielectric between the metal layers completes the interference filter, which may be sandwiched between protective layers. The dielectric is formed by evaporating an acrylate monomer having a molecular weight in the range of from 150 to 600. Preferably the acrylate monomer has a molecular weight to acrylate group ratio in the range of from 150 to 400. The acrylate condenses on the substrate and is polymerized in situ for forming a monolithic film with a sufficient thickness to produce an interference color. In several embodiments different areas of the film have different thicknesses for producing different interference colors.

Abstract: An ultra-fine microfabrication method using an energy beam is based on the use of shielding provided by nanometer or micrometer sized micro-particles to produce a variety of three-dimensional fine structures which have not been possible by the traditional photolithographic technique which is basically designed to produce two-dimensional structures. When the basis technique of radiation of an energy beam and shielding is combined with a shield positioning technique using a magnetic, electrical field or laser beam, with or without the additional chemical effects provided by reactive gas particle beams or solutions, fine structures of very high aspect ratios can be produced with precision. Applications of devices having the fine structures produced by the method include wavelength shifting in optical communications, quantum effect devices and intensive laser devices.

Abstract: The present invention relates to a process for manufacturing a thermobonding interlining in which dots of thermofusible polymer of mean thickness E are deposited on the front face of an interlining support, chosen from textile and non-woven supports, and one of the faces of the support is subjected to electron bombardment, wherein, as the dots of thermofusible polymer contain a radical activator and are bereft of photoinhibitor, the depth of penetration of the electrons in the dots of thermofusible polymer is adjusted in order to obtain a modification of the physico-chemical properties of the thermofusible polymer, chosen from the melting temperature and viscosity, over a limited thickness e with respect to the mean thickness E.

Abstract: Compounds which possess a complementary structure to a desired molecule, such as a biomolecule, in particular polymeric or oligomeric compounds, which are useful as in vivo or in vitro diagnostic and therapeutic agents are provided. Also, various methods for producing such compounds are provided. These polymeric or oligomeric compounds are useful in particular as antimicrobial agents, receptor, hormone or enzyme agonists and antagonists.

Abstract: A recording medium is composed of a substrate and an ink receiving layer provided on at least one side of the substrate, wherein the ink receiving layer is composed of a composition or a cured product thereof containing at least (A) a polyvinyl acetal resin having acetal groups, acetyl groups and hydroxyl groups, (B) a monomer having an active energy ray curable ethylenic unsaturated group, and (C) a cationic resin, at a ratio (B)/(A) within the range of 1/100 to 5/1, and a ratio (C)/((A)+(B)) of 0.5/100 to 30/100.

Abstract: A laser marking apparatus and method for marking the surface of a semiconductor chip are described herein. A laser beam is directed to a location on the surface of the chip where a laser reactive material, such as a pigment containing epoxy, is present. The heat associated with the laser beam causes the laser reactive material to fuse to the surface of the chip, creating a visibly distinct mark in contrast to the rest of the surface of the chip. Only reactive material contacted by the laser fuses to the chip surface, and the remaining residue on the non-irradiated portion can be readily removed.

Abstract: An apparatus and method enables screen printing various articles such as glassware with a radiation curable composition using, for example, UV radiation and the like in pre-existing screen printing decorating equipment having a plurality of screen printing workstations. Particularly suitable compositions are those which are environmentally safe by virtue of being free of toxic heavy metals and volatile organic compounds. The applied inked image is at least partially cured at each screen printing workstation to form a skin on the surface of the transferred image of sufficient strength to support the next layer to be applied. The UV radiation may emanate opposing and underlying each of the screen printing workstations were brought thereto from a remotely positioned laser via a fiber optic bundle or light pipe.

Abstract: An insulated metallic strip suitable for use in the coils of power transformers and method of producing the same. Following the extrusion of a flat metallic strip of conductive material for winding into a magnet coil, the flat strip having a predetermined thickness and first and second sides bounded by a pair of fully rounded edges, the method of insulating the strip of conductive material by supporting the flat strip in a level state at a predetermined temperature in a vacuum chamber and while in the vacuum chamber applying a liquid coating of resin to the entire first side of the strip and the pair of rounded edges and extending onto the second side of the strip from each of the edges a distance at least as great as about 0.25" to prevent turn to turn discharge.

Abstract: A plasma CVD method for forming a film of a metal such as Ti on a substrate using a mixed gas including a metal-halogen compound and hydrogen with which the surface morphology of the metal film obtained is good, there is no corrosion of a conducting material layer or the like below the metal film and residual halogen in the film is low, and a semiconductor device having a metal film formed by this method. The plasma CVD method comprises employing prescribed plasma CVD conditions such that there are more activated hydrogen species present in the plasma than are consumed in the reduction of the metal-halogen compound and surplus activated hydrogen species uniformly terminate the substrate surface so that precursors produced by dissociation of the metal-halogen compound can freely migrate over the substrate and the metal film formed has a uniform thickness and good surface morphology.

Abstract: A method for fabricating soft tissue implants using a mold. The cavity surface of an initially untextured mold, made of an organic material such as epoxy, is given a thin film coating of material that has pinholes and is resistant to atomic particle bombardment. The mold cavity surface is then subjected to atomic particle bombardment, such as when placed in an isotropic atomic oxygen environment. Microscopic depressions in the mold cavity surface are created at the pinhole sites on the thin film coating. The thin film coating is removed and the mold is then used to cast the soft tissue implant.

Abstract: A method of fabricating nanometric structures on a substrate by dry etching includes setting the substrate at a temperature at which condensation of etching gas products of etching gas decomposed, recombined and reacted, or products of reactions between the etching gas and substrate material starts to occur, forming condensates at specific locations on the substrate. The condensates form an etching mask for the dry etching process.

Abstract: A method for forming a supported thin layer of non-evaporable getter (NEG) material and a getter device formed thereby are provided. A suspension comprised of non-evaporable getter (NEG) material particles in a dispersing medium is prepared. The NEG material particles in the suspension have a particle size not greater than about 150 .mu.m. The dispersing medium has an aqueous, alcoholic, or hydroalcoholic base and contains not more than about 1 wt % of organic compounds having a boiling temperature of at least about 250.degree. C. The ratio of the weight of the NEG material particles to the weight of the dispersing medium is between about 4:1 and about 1:1. A layer of the suspension is deposited on a carrier by a serigraphic technique. Next, the deposited layer is dried to evaporate volatile components of the dispersing medium and thereby form a dried deposit. Finally, the dried deposit is sintered under vacuum at a temperature between about 800.degree. C. and 1000.degree. C.

Abstract: A pattern forming method comprises subjecting a surface of a semiconductor substrate to a surface treatment for imparting hydrogen atoms, irradiating a desired region of said surface with an energy ray, selectively forming a metal film on a non-irradiated region other than the desired region, and etching said semiconductor substrate using said metal film as a mask.

Abstract: A liquid crystal display device which includes a pair of substrates; a liquid crystal layer sandwiched between the pair of substrates; and an electrode for applying a voltage to the liquid crystal layer is disclosed. The liquid crystal layers includes liquid crystal molecules, and is divided into a plurality of regions having different twist angles from one another.

Abstract: Methods for coating substrates are described. The methods comprise coating at least a portion of a substrate with particular coating materials. The coating materials can be crosslinked and coated onto a substrate. Alternatively, the coating materials may be covalently bonded to the substrates. The coating materials might themselves functionalize the substrate, or provide a biocompatible coating on the substrate. The coating materials might also include electrophilic or nucleophilic groups that allow for the subsequent reaction of the coating materials with additional reagents. The present invention also provides coated workpieces, particularly medical workpieces having a surface for contacting tissue or blood. These workpieces comprise a first layer and a second layer. The first layer comprises a molecular tether covalently bonded to the surface.

Abstract: The invention concerns a process for manufacturing a fusible interlining (1) comprising a base fabric (2), a thermofusible first layer (5) applied on one of its faces (3) referred to as the front face, and a thermofusible second layer (7) applied on the rear face (4) of the base fabric (2), characterised in that the first layer (5) is deposited on the front face (3) of the base fabric (2) by means of a first screen printer (9); the second layer (7) is deposited on a transfer roller (11) by means of a second screen printer (10); the points (8) thus obtained are transferred onto the rear face (4) of the base fabric (2), the depositing of the first layer (5) and the transfer of the second layer (7) being performed simultaneously so that the points (6, 8) of the layers (5, 7) lie opposite to one another on the cross-sectional plane.

Abstract: The invention encompasses the pattern coating of a thick layer of adhesive on a single substrate. The adhesive strips may be continuous or discontinuous on the single substrate. In one preferred embodiment of the invention, the substrate is a release liner and the adhesive is a hot melt, thereby not requiring the use of an extruder in the application of the adhesive onto the substrate. When it is desired to produce a non-foamed product, the web is chilled on a chilled drum. Elimination of this chilling step, results in the formation of a foamed tape product, due to the evaporation of the moisture which is typically contained within the silicone-coated paper web. The product is a thick (10-100 mils), free (no carrier) film of adhesive made to the desired width (3/8" to approximately 6") of a high cohesive strength adhesive, with good temperature resistance (>196.degree. F.), with low bubble content (appears clear), wound into rolls containing from 100-800 feet or greater in length.

Abstract: Disclosed is a novel composition of matter comprising a polyacid and a polymer containing repeating units which contain one or more basic atoms. The complex is water-soluble and electrically conductive. The complex is useful in providing organic discharge layers for use in electronic applications and fabrications.

Abstract: A method of manufacturing phosphor screens is disclosed. The method uses "sol-gel" for disposing a thin film of phosphor on a transparent substrate. The thin film of phosphor is applied in continuous form or in the form of an accurate dot pattern. The rastering of said dot pattern is performed either by screen printing before annealing the sol-gel, or by selective laser curing of a continuous thin film and washing off the non-cured portions. The phosphor screens are useful as monochrome or as full-color faceplates of field emission displays or cathode ray tubes.

Abstract: The present invention relates to a process of depositing metals onto various substrates. Applications for which the present invention may be useful include the formation of catalysts such as those used in electrochemical applications, including fuel cells and the like, refining applications such as oil refining, automotive applications such as automotive catalytic converters, and other similar applications.

Abstract: Coated polymeric sheet comprising polymer substrate a cross-linked polymer, wherein the coating is characterized by:A. being smooth, having a surface roughness not greater than 0.05 nanometers R.sub.a, except that;B. in the otherwise smooth surface, a multiplicity of depressions having depth ranging from 1 to 90% of the thickness of the coating.Backside coatings (containing carbon black in the cross-linked polymer) for magnetic recording tapes benefit from this invention by improved winding characteristics. The concept described is a replacement for rough random surface texture, formerly used in backside coatings, with a controlled surface texture. The process disclosed can also be used to make alphanumeric symbols on the pigment binder coating.

Abstract: A processing method and apparatus using a focused energy beam for conducting local energy beam processing in a focused energy beam irradiating area by irradiating a sample with a focused energy beam such as an ion beam or an electron beam in an etching gas atmosphere. As the etching gas, a mixed gas different in composition from any conventional one is employed and the gas is uniformly supplied to an etching area and at least one of the components of such a mixed gas is a spontaneous reactive gas for use in etching the sample spontaneously and isotropically. With this arrangement, it is possible to subject to local etching a material for which the local etching has been impossible to provide since a single etching gas causes a reaction too fierce or causes almost nearly no reaction.

Abstract: A low temperature method of forming silica-containing ceramic coatings on substrates in which a coating containing hydrogen silsesquioxane resin is applied on a substrate and exposed to an electron beam for a time sufficient to convert the hydrogen silsesquioxane resin to the silica-containing ceramic coating. This method is especially valuable for forming protective and dielectric coatings on electronic devices.

Abstract: A pattern of a non-volatile high-performance ferroelectric thin film memory is formed by applying a composition containing hydrolytic metal compounds, and a photosensitizer which generates water when irradiated with active rays onto a substrate. The resultant film is exposed to active rays in compliance with a prescribed pattern to form an image and developed with a solvent to remove non-exposed portions, and then the remaining exposed portions are subjected to a heat treatment to convert the exposed portions into a dielectric substance comprising a metal oxide as expressed by the following formula (I):(Bi.sub.2 O.sub.2).sup.2+ (A.sub.m-1 B.sub.m O.sub.3m+1).sup.2-(I)where A is one or more elements selected from the group consisting of Ba, Sr, Pb and Bi; B is one or more elements selected from the group consisting of Ti, Nb and Ta; and m is an integer of from 2 to 5.

Abstract: A method of forming a conductive film on an insulating region of a substrate wherein a surface of the insulating region formed on the substrate is activated by irradiating the surface with electrons, ions or light. Next, a metal film pattern constituting, for example, an electrical interconnection, is deposited on the surface by applying a selective chemical vapor deposition process using a metal halide gas.

Abstract: Polymeric ledges on a metal stencil screen are made using a polymeric layer which is partially removed by a developer solution.

Abstract: A photoresist-free method for making patterned films of metal oxides, metals, or other metal containing compounds is described. The method involves applying an amorphous film of a metal complex to a substrate. The film may be conveniently applied by spin coating using standard industry techniques. The metal complex used is photoreactive and undergoes a low temperature chemical reaction in the presence of light of a suitable wavelength. The end product of the reactions depends upon the atmosphere in which the reactions take place. Metal oxide films may be made in air. Patterned films may be made by exposing only selected portions of the film to light. Patterns of two or more materials may be laid down from the same film by exposing different parts of the film to light in different atmospheres. The resulting patterned film is generally planar. Separate planarization steps are not generally required.