Abstract: A GaN device suppressing the instantaneous current reduction after the shut-off of a high frequency signal is disclosed. The GaN device provides, on a SiC substrate, an AlN layer, a GaN layer, and an AlGaN layer, The SiC substrate has an energy difference greater than 0.67 eV but less than 1.43 eV; the AlN layer has a thickness less than 50 nm; and the GaN layer has a thickness less than 1.5 ?m.

Abstract: A hard laminar coating having a first 61 m and a second film having respective different compositions and alternately laminated on a surface of a base structure, wherein the first film is a carbide, a nitride, a carboxide, a nitroxide, a carbonitride or a carbo-oxynitride of (AlaCrbBc), while the second film is TiB2, the hard laminar coating configured to include atomic ratios a, b and c in the first film satisfying a=1?b?c, 0.2?b?0.7, and 0<c?0.2, and a thickness of the first film being no less than 0.1 ?m and no more than 5.0 ?m, while a thickness of the second film being no less than 0.1 ?m and no more than 5.0 ?m, and to have a total thickness of no less than 0.2 ?m and no more than 10.0 ?m, and the hard laminar.

Abstract: The method for producing a group III nitride semiconductor crystal comprises preparing a seed crystal having a non-polar plane followed by growing a group III nitride semiconductor from the non-polar plane in a vapor phase, wherein the growing includes growing the group III nitride semiconductor so as to extend in the +C-axis direction of the seed crystal. A group III-V nitride semiconductor crystal having high quality and a large-area non-polar plane can be obtained by the method.

Abstract: A coated cutting tool includes a coating and a substrate. The substrate is at least partly coated with a 4-10 ?m thick coating comprising two adjacent Ti(C,N)-layers where the difference (?) between the residual stress state of the inner layer and the residual stress state of the outer layer is 1000 MPa???2500 MPa, on at least a part of the cutting edge and/or on at least a part of the rake face. A method to produce such a difference between the residual stress states is also disclosed.

Abstract: A sliding element, in particular a piston ring, preferably made of cast iron or steel, has a coating which has a plurality of layers of CrN (14) and a-C:H:Me coatings (16) alternately. In a method for coating the sliding element, in particular a piston ring, preferably made of cast iron or steel, a plurality of layers of CrN and a-C:H:Me coatings are applied alternately.

Abstract: A method for fabricating a photovoltaic device includes forming an adhesion layer on a substrate, forming a material layer on the adhesion layer and applying release tape to the material layer. The substrate is removed at a weakest interface between the adhesion layer and the substrate by mechanically pulling the release tape to form a transfer substrate including the adhesion layer, the material layer and the release tape. The transfer substrate is transferred to a target substrate to contact the adhesion layer to the target substrate. The transfer substrate includes a material sensitive to formation processes of the transfer substrate such that exposure to the formation processes of the transfer substrate is avoided by the target substrate.

Abstract: There is provided a slide part used in an environment where there is a lubricant containing a molybdenum compound including a hard protective layer formed on an outermost surface of a substrate of the slide part; in which: the hard protective layer includes mainly carbon, nitrogen, and a metal element; the hard protective layer is composed of a complex of an amorphous carbon body containing nitrogen and a compound crystal of the metal element; the compound crystal is composed of at least one of a metal carbide, a metal nitride, and a metal carbonitride; and a surface hardness of the hard protective layer is 1800 or larger in Vickers hardness.

Abstract: There are disclosed herein various implementations of composite semiconductor devices. In one implementation, such a composite semiconductor device includes a transition body formed over a diode, the transition body including more than one semiconductor layer. The composite semiconductor device also includes a transistor formed over the transition body. The diode may be connected across the transistor using through-semiconductor vias, external electrical connectors, or a combination of the two.

Abstract: It is provided a hard laminar coating consisting of a plurality of films including two kinds of films in the form of a first film and a second film having respective different compositions and alternately laminated on a surface of a base structure, wherein the first film is an oxide or an oxynitride of (Ti1aBa), while the second film is TiB2.

Abstract: The invention provides semiconductor materials including a gallium nitride material layer formed on a silicon substrate and methods to form the semiconductor materials. The semiconductor materials include a transition layer formed between the silicon substrate and the gallium nitride material layer. The transition layer is compositionally-graded to lower stresses in the gallium nitride material layer which can result from differences in thermal expansion rates between the gallium nitride material and the substrate. The lowering of stresses in the gallium nitride material layer reduces the tendency of cracks to form. Thus, the invention enables the production of semiconductor materials including gallium nitride material layers having few or no cracks. The semiconductor materials may be used in a number of microelectronic and optical applications.

Abstract: The present invention relates generally to jewelry articles comprising a substrate and a metallic, external coating.

Abstract: The present invention relates to an information recording medium that has good enough recording characteristics even without containing Pd. The information recording medium has a recording layer including an oxide of Mn in which Mn atoms are partially or fully present as Mn with a valence of +4.

Abstract: A multiple glazing comprising at least two substrates, one substrate being coated on an inner face in contact with a gas-filled cavity with a thin-film multilayer coating having reflection properties in the infrared and/or in solar radiation, said coating comprising a single metallic functional layer and two dielectric films, said films each comprising at least one dielectric layer, said functional layer being placed between the two dielectric films, characterized in that at least one dielectric film, or both dielectric films, includes an absorbent layer which is placed in the dielectric film between two dielectric layers, the absorbent material of the absorbent layer(s) being predominantly in the dielectric film subjacent to the metallic functional layer or predominantly in the dielectric film superjacent to the metallic functional layer.

Abstract: CVD coated cutting tools are provided. A coated cutting tool described herein, in some embodiments, comprises a PcBN substrate and a polished coating adhered to the substrate including one or more layers of Al2O3 deposited by chemical vapor deposition, wherein the coating has a surface roughness (Ra) less than about 600 nm in an area of the cutting tool for contacting a workpiece.

Abstract: The invention relates to a cutting tool comprising a main part and a multilayer coating applied thereon. A first layer A made of a hard material is applied on the main part, said hard material being selected from titanium aluminum nitride (TiAlN), titanium aluminum silicon nitride (TiAlSiN), chromium nitride (CrN), aluminum chromium nitride (AlCrN), aluminum chromium silicon nitride (AlCrSiN), and zirconium nitride (ZrN), and a second layer B made of silicon nitride (Si3N4) is applied directly over the first layer A.

Abstract: A wear resistant coating suitable to be deposited on cutting tool inserts for chip forming metal machining, includes at least two layers with different grain size, but with essentially the same composition. The coating is deposited by Physical Vapor Deposition (PVD).

Abstract: A method and apparatus for growing truly bulk In2O3 single crystals from the melt, as well as melt-grown bulk In2O3 single crystals are disclosed. The growth method comprises a controlled decomposition of initially non-conducting In2O3 starting material (23) during heating-up of a noble metal crucible (4) containing the In2O3 starting material (23) and thus increasing electrical conductivity of the In2O3 starting material with rising temperature, which is sufficient to couple with an electromagnetic field of an induction coil (6) through the crucible wall (24) around melting point of In2O3. Such coupling leads to an electromagnetic levitation of at least a portion (23.1) of the liquid In2O3 starting material with a neck (26) formation acting as crystallization seed. During cooling down of the noble metal crucible (4) with the liquid In2O3 starting material at least one bulk In2O3 single crystal (28.1, 28.2) is formed.

Abstract: A cutting tool insert for machining by chip removal comprising a body of a hard alloy of cemented carbide, cermet, ceramics or cubic boron nitride based material onto which a hard and wear resistant coating is deposited by CVD, and the methods of making and using the same. The coating includes at least one ?-Al2O3 layer with a thickness between 0.5 ?m and 40 ?m having a {01-15} and/or {10-15} texture exhibiting excellent wear and metal cutting performance.

Abstract: Provided is a surface-coated cemented carbide insert obtained by containing at least WC powder and Co powder as raw materials, including a WC-based cemented carbide obtained by forming and sintering mixed raw materials containing at least any of (a) Zr compound powder, Nb compound powder, and Ta compound powder, (b) complex compound powder of Nb and Ta, and Zr compound powder, (c) complex compound powder of Nb, Ta, and Zr, (d) complex compound powder of Nb, Zr, and Ta compound powder, and (e) complex compound powder of Ta and Zr, and Nb compound powder, as essential powder components, as a substrate, and forming a hard coating layer on the substrate by vapor deposition, in which a Co enrichment surface region is formed in a substrate surface, Co content in the Co enrichment surface region satisfies to be between 1.30 and 2.10 (mass ratio) of Co content in cemented carbide.

Abstract: A MAX-phase material is provided for a cutting tool and other applications.

Abstract: The invention describes two methods for manufacturing metal dichalcogenide materials. The invention also includes a coated dichalcogenide substrate.

Abstract: In one aspect, cutting tools are described having coatings adhered thereto. A coated cutting tool, in some embodiments, comprises a substrate and a coating adhered to the substrate, the coating comprising at least one composite layer deposited by chemical vapor deposition comprising an aluminum oxynitride phase and a metal oxide phase, the metal oxide phase including at least one oxide of a metallic element selected from Group IVB of the Periodic Table.

Abstract: The present invention provides a shearing die having longer life and a method for manufacturing the same. The shearing die includes a pair of substrates, at least one of which has a hard film formed by an arc ion plating method and located at least on a region of a curved surface and on an adjacent region from the end part of the curved surface on the side facing to the surface of the sheet or plate material to 300 ?m along the surface of the substrate. The hard film comprises Al and one or more of Ti and Cr, and has a thickness of 1 to 5 ?m, such that a number of metal particles having a diameter of 20 ?m or more, which are present on a line segment having a length of 10 mm on a surface of the hard film, is 2 or less.

Abstract: This invention relates generally to an article that includes a base substrate, an intermediate layer including at least one element or compound selected from titanium, chromium, indium, zirconium, tungsten, and titanium nitride on the base substrate, and a hydrophobic coating on the base substrate, wherein the hydrophobic coating includes a rare earth element material (e.g., a rare earth oxide, a rare earth carbide, a rare earth nitride, a rare earth fluoride, and/or a rare earth boride). An exposed surface of the hydrophobic coating has a dynamic contact angle with water of at least about 90 degrees. A method of manufacturing the article includes providing the base substrate and forming an intermediate layer coating on the base substrate (e.g., through sintering or sputtering) and then forming a hydrophobic coating on the intermediate layer (e.g., through sintering or sputtering).

Abstract: A medical implant device or component thereof comprising a metal substrate and a coating layer structure provided on the substrate. The coating layer structure comprises an outermost layer of a ceramic material. A bonding structure is deposited between the metal substrate and the coating layer structure. The bonding structure comprises a chromium rich layer, which is deposited onto the metal substrate surface and has a higher concentration of chromium than the metal substrate, as well as a gradient layer having a composition gradient from the chromium rich layer towards the surface of the device providing increasing proportions of a gradient material which has structural correspondence with the layer of the coating layer structure that is most adjacent to the bonding structure.

Abstract: Germanium antimony telluride materials are described, e.g., material of the formula GexSbyTezCmNn, wherein x is about 0.1-0.6, y is about 0-0.7, z is about 0.2-0.9, m is about 0.02-0.20, and n is about 0.2-0.20. One specific composition includes from 0 to 50% Sb, from 50 to 80% Te, from 20 to 50% Ge, from 3 to 20% N and from 2 to 15% carbon, wherein all atomic percentages of all components of the film total to 100 atomic %. Another specific composition includes from 10 to 50% Sb, from 50 to 80% Te, from 10 to 50% Ge, from 3 to 20% N and from 3 to 20% carbon, and wherein all atomic percentages of all components of the film total to 100 atomic %. Material of such composition is useful to form phase change films, e.g., as conformally coated on a phase change memory device substrate to fabricate a phase change random access memory cell.

Abstract: A helical compression spring, preferably of steel, in particular CrSi steel or CrNi steel, comprises a coating which has at least one a-C: H: Me coating or a plurality of layers of CrN (16) and a-C: H: Me coatings (14) alternately. In a method for coating a helical compression spring, preferably of steel, a plurality of layers of CrN and a-C: H: Me coatings are applied alternately.

Abstract: A transparent or translucent glass-ceramic plate, capable of covering or receiving at least one underlying heating element. The plate has a coating which at least partly masks the underlying heating element(s), while still allowing the heating element(s) and optional displays to be detected. At least 90% of the coating is on the face of the plate to be turned toward the heating element(s) and optional displays in the use position. The coating has a region or a group of regions known as a background region(s), wherein the background region(s) occupy most of the surface of the coating. The coating also has a region or a group of regions known as indicating region(s), wherein the indicating region(s) making it possible to display, relative to the background region(s), a pattern, a sign and/or the location of functional elements while also making it possible to detect if the elements are in operation.

Abstract: Substrates for joints for orthopaedic implants are described, wherein at least one of the sliding surfaces of non-ferrous metal alloys, in particular of cobalt, chromium, molybdenum alloys, has a coating consisting of niobium nitride nanolayers alternating with chromium nitride nanolayers, the lot being protected by a chromium nitride microlayer.

Abstract: A process for producing a hard material layer on a substrate includes depositing a TiCNB hard material layer by chemical vapor deposition (CVD) from a gas system including a titanium source, a boron source, at least one nitrogen source and at least one carbon source, in which the carbon source includes an alkane having at least two carbon atoms, an alkene or an alkyne. A cutting tool includes a substrate to which a TiCNB hard material layer has been applied, in which a ratio of carbon atoms (C) to nitrogen atoms (N) in the TiCxNyB1-x-y system deposited on the substrate is 0.70?X?1.0, preferably 0.75?X?0.85, and a polished section through the substrate and the hard material layer is substantially free of an eta phase following Murakami etching.

Abstract: A coated cBN sintered body has excellent wear resistance, fracture resistance, adhesiveness between a substrate and a coating, and a tool life of which is elongated as compared with conventional cBN sintered bodies. The coated cBN sintered body has a cBN sintered body substrate and a coating coated on the surface thereof. The cBN sintered body includes 76 to 90% by volume of cBN, and 10 to 24% by volume of a binder phase and inevitable impurities. An average grain size of cBN is 0.5 to 5.0 ?m, an average value of the thickness of the binder phase is 0.05 to 0.8 ?m, and the standard deviation of the thickness of the binder phase is 0.8 ?m or less.

Abstract: A cBN sintered body tool has the following feature. In at least one cross sectional surface of the cBN sintered body tool taken along a plane perpendicular to a joining surface having the largest area in joining surfaces between the cBN sintered body and the joining layer, a point C and a point D are assumed to represent points away by ¼ of the length of a line segment connecting a point A and a point B shown in a figure. A value obtained when an area of a region surrounded by a line segment connecting the point C and the point D, the first cBN particle, the second cBN particle, and the binder phase is divided by the length of the line segment connecting the point A and point B to each other is 0.14-0.6 ?m.

Abstract: Provided is a coating layer for cutting tools, as a hard coating layer stacked and formed in the sequence of a TiN layer, a TiCN layer, a bonding layer, an alumina (Al2O3) layer, and a cover layer from the bottom by using a chemical vapor deposition (CVD) method on a parent material, able to improve cutting performance, because surface residual stress of the coating layer may be maintained in a compressive stress state by adjusting a composition of the cover layer without using a separate additional process, such as a blasting operation, or a mixed process of CVD and physical vapor deposition (PVD), and simultaneously the cover layer may also be used as a wear-resistant layer.

Abstract: Embodiments of a layered-substrate comprising a substrate and a layer disposed thereon, wherein the layered-substrate is able to withstand fracture when assembled with a device that is dropped from a height of at least 100 cm onto a drop surface, are disclosed. The layered-substrate may exhibit a hardness of at least about 10 GPa or at least about 20 GPa. The substrate may include an amorphous substrate or a crystalline substrate. Examples of amorphous substrates include glass, which is optionally chemically strengthened. Examples of crystalline substrates include single crystal substrates (e.g. sapphire) and glass ceramics. Articles and/or devices including such layered-substrate and methods for making such devices are also disclosed.

Abstract: A semiconductor crystal and associated growth method are disclosed. The crystal includes a seed portion and a growth portion on the seed portion. The seed portion and the growth portion form a substantially right cylindrical single crystal of silicon carbide. A seed face defines an interface between the growth portion and the seed portion, with the seed face being substantially parallel to the bases of the right cylindrical crystal and being off-axis with respect to a basal plane of the single crystal. The growth portion replicates the polytype of the seed portion and the growth portion has a diameter of at least about 100 mm.

Abstract: The method comprises the steps of: forming a porous fiber-reinforcing structure; introducing into the pores of the fiber structure powders containing elements for constituting the composite material matrix; and forming at least a main fraction of the matrix from said powders by causing a reaction to take place between said powders or between at least a portion of said powders and at least one delivered additional element; the powders introduced into the fiber structure and the delivered additional element(s) comprising elements that form at least one healing discontinuous matrix phase including a boron compound and at least one discontinuous matrix phase including a crack-deflecting compound of lamellar structure. At least a main fraction of the matrix is formed by chemical reaction between the powders introduced into the fiber structure and at least one delivered additional element, or by sintering the powders.

Abstract: Certain example embodiments of this invention relate to articles including anticondenzation coatings that are exposed to an external environment, and/or methods of making the same. In certain example embodiments, the anticondenzation coatings may be survivable in an outside environment. The coatings also may have a sufficiently low sheet resistance and hemispherical emissivity such that the glass surface is more likely to retain heat from the interior area, thereby reducing (and sometimes completely eliminating) the presence condensation thereon. The articles of certain example embodiments may be, for example, skylights, vehicle windows or windshields, IG units, VIG units, refrigerator/freezer doors, and/or the like.

Abstract: A component which dissipates heat produced during operation thereof has a ceramic base the surface of which is covered in at least one area by a metalized coating, the ceramic base being spatially structured.

Abstract: The present invention concerns a method for depositing mixed crystal layers with at least two different metals on a substrate by means of PVD methods. To provide a method of depositing mixed crystal layers with at least two different metals on a substrate by means of PVD methods, which gives mixed crystal layers which are as free as possible of macroparticles (droplets) and which have a proportion as high as possible of a desired crystalline phase and which are highly crystalline, it is proposed according to the invention that deposition of the mixed crystal layer is effected with simultaneous application of i) the cathode sputtering method of dual magnetron sputtering or high power impulse magnetron sputtering and ii) arc vapour deposition.

Abstract: A multi-layer structure including an interlayer to relieve stress in the structure, a device including the structure, and a method of forming the device and structure are disclosed. The structure includes a substrate having a first coefficient of thermal expansion, an interlayer, and a coating having a second coefficient of thermal expansion. The interlayer reduces stress in the structure that would otherwise exist in the structure as a result of the difference in coefficients of thermal expansion of the substrate and the coating.

Abstract: A cutting tool hard film disposed as coating on a surface of a cutting tool, includes: a hard phase that is a nitride phase, an oxide phase, a carbide phase, a carbonitride phase, or a boride phase containing at least one element out of group IVa elements, group Va elements, group VIa elements, Al, and Si; and a binding phase that is a phase containing at least one element out of Au, Ag, and Cu, the cutting tool hard film having composite structure with the hard phase and the binding phase three-dimensionally arranged.

Abstract: Disclosed is a coating material for aluminum die casting and a method for coating the same, the coating material including: a CrN adhesion layer formed on a surface of a base material; a TrAlN/CrN support layer formed on a surface of the CrN adhesion layer; and a TiAl(CrSi)VCN functional layer formed on a surface of the TiAlN/CrN support layer. The present coating material solves the hot stamping and sticking problem of a conventional aluminum die casting mold and the like, enhances thermal resistance, and further has enhanced thermal resistance, high-temperature wear resistance, sticking resistance and thermal impact resistance compared to that of a conventional coating material.

Abstract: An article is coated with a coating having a dark color. In a preferred embodiment, the coating comprises a nickel or polymer basecoat layer, a first metal oxycarbide color layer comprised of 15 atomic percent carbon, 25 to 30 atomic percent oxygen, and 55 to 60 percent atomic percent refractory metal, a second metal oxycarbide color layer comprised of 10 atomic percent carbon, 50 to 60 atomic percent oxygen, and 30 to 40 atomic percent refractory metal, and a top layer of refractory metal oxides.

Abstract: A metal dichalcogenide layer is produced on a transfer substrate by seeding F16CuPc molecules on a surface of a growth substrate, growing a layer (e.g., a monolayer) of a metal dichalcogenide via chemical vapor deposition on the growth substrate surface seeded with F16CuPc molecules, and contacting the F16CuPc-molecule and metal-dichalcogenide coated growth substrate with a composition that releases the metal dichalcogenide from the growth substrate.

Abstract: A surface-coated cutting tool of the present invention includes a base material and a coating formed on the base material, the coating includes one or two or more layers, a layer among these layers that abuts on the base material is a TiN layer, the TiN layer contains at least one element together with TiN, the element has a concentration distribution in a thickness direction of the TiN layer, and the concentration distribution includes a region where the concentration of the element decreases in a direction from the base material toward a surface of the coating.

Abstract: A surface-coated cutting tool excellent in wear resistance is provided. The surface-coated cutting tool of the present invention includes a base material and a coating formed on the base material. The coating includes an inner layer and an outer layer. The inner layer is a single layer or a multilayer stack constituted of two or more layers made of at least one element selected from the group consisting of group IVa elements, group Va elements, group VIa elements in the periodic table, Al, and Si, or a compound of at least one element selected from this group and at least one element selected from the group consisting of carbon, nitrogen, oxygen, and boron. The outer layer includes ?-aluminum oxide as a main component and exhibits an equivalent peak intensity PR(024) of a (024) plane of x-ray diffraction of larger than 1.3.

Abstract: Some embodiments include a method of forming a capacitor. An opening is formed through a silicon-containing mass to a base, and sidewalls of the opening are lined with protective material. A first capacitor electrode is formed within the opening and has sidewalls along the protective material. At least some of the silicon-containing mass is removed with an etch. The protective material protects the first capacitor electrode from being removed by the etch. A second capacitor electrode is formed along the sidewalls of the first capacitor electrode, and is spaced from the first capacitor electrode by capacitor dielectric. Some embodiments include multi-material structures having one or more of aluminum nitride, molybdenum nitride, niobium nitride, niobium oxide, silicon dioxide, tantalum nitride and tantalum oxide. Some embodiments include semiconductor constructions.

Abstract: A surface-coated cutting tool, which has a hard-coating layer with excellent chipping and fracturing resistances in a high speed intermittent cutting work, is provided. The surface-coated cutting tool includes a cutting tool body, which is made of WC cemented carbide or TiCN-based cermet, and a hard-coating layer, which is vapor deposited on the cutting tool body and has a lower layer and an upper layer. The lower layer is a Ti compound layer, and the upper layer is an aluminum oxide layer. There is a micropore-rich layer in the lower layer in the vicinity of the interface between the lower and upper layers. There are micropores with diameters of 2 to 70 nm in the micropore-rich layer. The diameters of the micropores in the micropore-rich layer shows a bimodal distribution pattern.

Abstract: The invention thus relates to a layer system (1) for the formation of a surface layer on a surface of a substrate, in particular on the surface of a tool, in particular on the surface of a shaping tool, wherein the layer system includes at least a first surface layer of the composition (VaMebMcXd)?(NuCvOw)?, where (a+b+c+d)=?, ?=100%, with respect to the atoms Va,Meb,Mc,Xd present in the layer, (u+v+w)=?. ?=100 with respect to the atoms N, C, O present in the layer, with the sum of all the atoms in the layer (?+?)=100 at %, where 40???80 at % applies, and where Meb is at least one element from the group of chemical elements including Zr, Hf, Nb, Ta, Mo, W, Ni, Cu, Sc, Y, La, Ce, Pr, Nd, Pm, Sm of the periodic system of chemical elements and Mc is at least one element of the group of chemical elements including Ti, Cr, and Xd is at least one element from the group of chemical elements including S, Se, Si, B of the periodic system of elements, where 0?u?100, 0?v?100 and 0?w?80.

Abstract: A surface treatment method for metal substrate includes: a metal substrate is provided; a first color layer is deposited on the metal substrate, the first color layer being a TiC layer or a TiN layer; a second color layer is deposited on the first color layer, the first color layer being a CrC layer or a CrN layer, the color of the first color layer being different from the color of the second color layer; forming a shielding layer on partially of the second color layer; electrochemical etching the metal substrate, the second color layer not covered with the shielding layer being removed to form a recessed portion, the recessed portion being extend through the second color layer. A coated article for manufactured by the surface treatment method is also provided.