Abstract: A lithographic printing plate precursor has an image-recording layer on a hydrophilic support, wherein the image-recording layer includes a polymer particle including an addition polymerization resin having a hydrophilic structure and a crosslinking structure. A method for producing a lithographic printing plate uses the lithographic printing plate precursor. A polymer particle includes an addition polymerization resin having a hydrophilic structure and a crosslinking structure. A composition includes the polymer particle.

Abstract: [Object] To provide a positive type photosensitive composition capable of forming a cured film having high transparency [Means] The present invention provides a positive type photosensitive siloxane composition comprising: a polysiloxane, a diazonaphthoquinone derivative, an additive having a quaternary ammonium structure and the capability of interacting with the polysiloxane, and a solvent. The polysiloxane and the additive interact with each other before exposure, but they lose the interaction after exposure.

Abstract: The present invention relates to resist compostions, in particular to photoresists that can be used in photolithography, especially in the fabrication of integrated circuits and derivative products. The resist compositions of the invention include an anti-scattering component which has a significant amount of empty space, and thus fewer scattering centers, such that radiation-scattering events are more limited during exposure. Such anti-scattering effects can lead to improved resolutions by reducing the usual proximity effects associated with lithographic techniques, allowing the production of smaller, higher resolution microchips. Furthermore, certain embodiments involve anti-scattering components which are directly linked to the resist components, which can improve the overall lithographic chemistry to provide benefits both in terms of resolution and resist sensitivity.

Abstract: The present invention relates to a method for forming a pattern by negative tone development (NTD) which is prepared by forming an anti-reflective coating composition layer comprising a photoacid generator between the substrate and the photoresist composition layer, and thus exhibits improved line width (CD) in the pattern and prevents pattern collapse owing to thorough activation of de-blocking of the photoresist composition layer during the exposure process.

Abstract: A laminate having an adhesive layer, which exhibits excellent adhesion to base films made from polyimide resins and the like or copper foils, as well as superior electrical properties, and also providing a laminate having an adhesive layer, which is low in warpage when the adhesive layer is in B stage, and which is excellent in storage stability of the laminate. The laminate having an adhesive layer includes a base film and an adhesive layer formed on at least one of the surfaces of the base film, in which the adhesive layer is formed of an adhesive composition comprising a carboxyl group-containing styrene based elastomer and an epoxy resin, wherein the content of the carboxyl group-containing styrene based elastomer is 50 parts by mass or more relative to 100 parts by mass of the solid content of the adhesive composition; the content of the epoxy resin is from 1 to 20 parts by mass relative to 100 parts by mass of the carboxyl group-containing styrene based elastomer; and the adhesive layer is in B-stage.

Abstract: A method of manufacturing a transistor comprising providing a substrate, a region of semiconductive material on the substrate, and a region of electrically conductive material on the region of semiconductive material; forming a covering of resist material over said regions; forming a depression in a surface of the covering of resist material that extends over a first portion of said region of conductive material, said first portion separating second and third portions of the conductive region; removing resist material located under said depression to form a window through said covering, exposing said first portion; removing said first portion to expose a connecting portion of the region of semiconductive material that connects the second and third portions; forming a layer of dielectric material over the exposed connecting portion; and forming a layer of electrically conductive material over said layer of dielectric material.

Abstract: A photoresist, a patterning method of a quantum dot layer, a QLED, a quantum dot color filter and a display device are disclosed, which can solve the problem that current patterning methods destroy quantum dots. The patterning method of a quantum dot layer includes the steps of: forming a hydrophilic photoresist pattern which comprises forming a photoresist material layer on a substrate by using a photoresist, patterning the photoresist material layer to form a photoresist pattern, and subjecting the photoresist to hydrophilic treatment; applying quantum dots; removing the quantum dots retained on the photoresist pattern; and stripping the photoresist pattern. The patterning method of a quantum dot layer in the present disclosure can improve the hydrophilic performance of the photoresist and reduce the adhesion of the lipophilic quantum dots on the photoresist.

Abstract: A fixable, UV curable ink includes an aqueous ink vehicle including water and a co-solvent, a pigment, and a dispersant. A polyurethane polymer dispersion is suspended as droplets within the aqueous ink vehicle. The polyurethane polymer dispersion includes a polyurethane polymer selected from the group consisting of a polyether-based polyurethane, a polyester-based polyurethane, a polycarbonate-based polyurethane, and mixtures thereof. The polyurethane polymer has i) an acid number ranging from 0 mg/g to less than 20 mg/g and ii) a glass transition temperature of less than 0° C. A water soluble or water dispersible photoinitiator is present in the fixable, UV curable ink. A base may be included in an amount sufficient to adjust a pH of the UV curable ink so that it ranges from 7.5 to 9.5. An additive may be included and selected from the group consisting of a biocide, a non-ionic surfactant, an anti-kogation agent, a buffer, and combinations thereof.

Abstract: A method of forming a patterned metal unit on an article. The method includes the steps of: providing an article that has an insulating surface; transferring a catalyst layer onto the insulating surface of the article, the catalyst layer including a catalytic material; removing a part of the catalyst layer to form a patterned catalyst layer; and forming a patterned metal layer on the patterned catalyst layer by an electroless plating technique to obtain a patterned metal unit that is constituted by the patterned catalyst layer and the patterned metal layer.

Abstract: Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same. In Chemical Formula 1, A, A?, L and n are the same as in the detailed description.

Abstract: The present invention relates to a novel diblock copolymer comprising a repeat unit (1) and a repeat unit (2), where R1 is hydrogen or C1-C4 alkyl, R2 is selected from a group chosen from hydrogen, C1-C4 alkyl, C1-C4 alkoxy and halide, R3 is selected from a group chosen from hydrogen, C1-C4 alkyl and C1-C4 fluoroalkyl, and R4, R5, R6, R7, R8, R9, R10, R11, and R12 are independently chosen from a C1-C4 alkyl and n=1-6. The invention also relates to a novel composition comprising the novel polymer and a solvent. The invention further relates to a process utilizing the novel composition for affecting directed self-assembly of the block copolymer.

Abstract: A method of programmable photolithography includes positioning (910) a programmable photomask in proximity to a photoresist layer on a sample. The programmable photomask is illuminated (920) with a plurality of different wavelengths of light simultaneously to expose the photoresist layer in a predetermined pattern. The programmable photomask is separated (930) from the photoresist layer and the photoresist layer is developed (940) to create the predetermined pattern in the photoresist layer.

Abstract: A method for fabricating a semiconductor device includes etching a substrate to form a body separated by a trench, forming liner layers that cover sidewalls of the body, forming a sacrificial layer that fills the trench and exposes an upper sidewall of each liner layer, forming a hard mask pattern that covers a first one of the liner layers having the exposed upper sidewalls, forming a barrier layer to be selectively grown over the exposed upper sidewalls of a second one of the liner layers, removing the hard mask pattern, removing a part of the sacrificial layer to expose a lower sidewall of a first one of the liner layers, and removing the lower sidewall of the first one of the liner layers to form a side contact.

Abstract: To provide a method for easily forming microscopic patterns exceeding the limit of exposure in the patterning technique utilizing the photolithography method in the vacuum deep ultraviolet ray region, a resist pattern swelling material is comprised by mixing a water-soluble or alkali-soluble composition comprising a resin and a cross linking agent and any one of a non-ionic interfacial active agent and an organic solvent selected from a group of the alcohol based, chain or cyclic ester based, ketone based, chain or cyclic ether based organic solvents.

Abstract: After forming a resist film made from a chemically amplified resist material pattern exposure is carried out by selectively irradiating the resist film with exposing light while supplying, onto the resist film, water that includes triphenylsulfonium nonaflate, that is, an acid generator, and is circulated and temporarily stored in a solution storage. After the pattern exposure, the resist film is subjected to post-exposure bake and is then developed with an alkaline developer. Thus, a resist pattern made of an unexposed portion of the resist film can be formed in a good shape.

Abstract: The present invention provides methods for forming images in positive- or negative-tone chemically amplified photoresists. The methods of the present invention rely on the vertical up-diffusion of photoacid generated by patternwise imaging of an underlayer disposed on a substrate and overcoated with a polymer containing acid labile functionality. In accordance with the present invention, the vertical up-diffusion can be the sole mechanism for imaging formation or the methods of the present invention can be used in conjunction with conventional imaging processes.

Abstract: A material comprising a specific bisphenol compound with a group of many carbon atoms is useful in forming a photoresist undercoat. The undercoat-forming material, optionally combined with an intermediate layer having an antireflective effect, has an absorptivity coefficient sufficient to provide an antireflective effect at a thickness of at least 200 nm and a high etching resistance as demonstrated by slow etching rates with CF4/CHF3 and Cl2/BCl3 gases for substrate processing.

Abstract: A positive planographic printing plate precursor includes a support having disposed thereon a lower thermosensitive layer containing a water-insoluble but alkali-soluble polymer compound and an upper thermosensitive layer containing a water-insoluble but alkali-soluble polymer compound, with alkali-solubility increasing under heat, wherein (i) both the upper thermosensitive layer and the lower thermosensitive layer contain an IR absorbing dye, with the ratio of the IR absorbing dye concentration in the upper thermosensitive layer to the IR absorbing dye concentration in the lower thermosensitive layer is 1.6 to 10.0, and/or (ii) the upper thermosensitive layer and the lower thermosensitive layer contain different IR absorbing dyes, and/or (iii) at least one of the upper thermosensitive layer and the lower thermosensitive layer contains an IR absorbent having, in one molecule, at least two chromophoric groups that absorb IR light, with the chromophoric groups bonding to each other via a covalent bond.

Abstract: A planographic printing plate precursor comprises a support and two or more positive recording layers which are formed on the support, contain a resin and an infrared absorbing agent and exhibit an increase in solubility in an aqueous alkali solution by exposure to infrared laser light, wherein the positive recording layer closest to the support among these two or more positive recording layers contains at least two types of resins among which at least one type forms a dispersion phase. It is preferable that the dispersion phase be formed of (1) a high-polymer compound incompatible with a high-polymer matrix or (2) a granular polymer selected from a microcapsule and a latex, and contains an infrared absorbing agent and an acid generator.

Abstract: A positive planographic printing plate precursor includes a support having disposed thereon a lower thermosensitive layer containing a water-insoluble but alkali-soluble polymer compound and an upper thermosensitive layer containing a water-insoluble but alkali-soluble polymer compound, with alkali-solubility increasing under heat, wherein (i) both the upper thermosensitive layer and the lower thermosensitive layer contain an IR absorbing dye, with the ratio of the IR absorbing dye concentration in the upper thermosensitive layer to the IR absorbing dye concentration in the lower thermosensitive layer is 1.6 to 10.0, and/or (ii) the upper thermosensitive layer and the lower thermosensitive layer contain different IR absorbing dyes, and/or (iii) at least one of the upper thermosensitive layer and the lower thermosensitive layer contains an IR absorbent having, in one molecule, at least two chromophoric groups that absorb IR light, with the chromophoric groups bonding to each other via a covalent bond.

Abstract: A light-sensitive sheet comprises a support, a first light-sensitive layer, a barrier layer and a second light-sensitive layer in this order. Each of the first and second light sensitive layers independently contains a binder, a polymerizable compound and a photo-polymerization initiator. The second light-sensitive layer is more sensitive to light than the first light-sensitive layer. A light-sensitive laminate comprises a substrate, the second light-sensitive layer, the barrier layer and the first light-sensitive layer in this order.

Abstract: A lithographic printing plate precursor comprising a hydrophilic support, an alkali-soluble layer and provided on the alkali-soluble layer a recording layer which contains an infrared ray absorbent, an alkali-soluble resin and an inhibitor of inhibiting the alkali-soluble resin from dissolving in an alkali aqueous developer and increases in the solubility in an alkaline aqueous solution upon irradiation of infrared light, and a developing method of the lithographic printing plate precursor with a non-silicate developer.

Abstract: Contrast enhanced photolithography methods and devices formed by the same are described. In accordance with these methods, a photoresist layer is formed on a substrate. A contrast enhancing system including a solution or dispersion of a photobleachable dye is formed on the photoresist layer. The photoresist layer is exposed through an imaging pattern and through the contrast enhancing system to radiation having a wavelength between about 230 nm and about 300 nm. The contrast enhancing layer is removed, and the photoresist layer is developed to form a photoresist pattern on the substrate. The contrast enhancing system may be removed and the photoresist layer may be developed in a single process step or in different process steps.

Abstract: The present invention discloses a method of producing a liquid flow path shape capable of refilling ink at a high speed by optimizing a three-dimensional shape of the liquid flow path and suppressing the vibration of a meniscus and a head thereof. According to the invention, a pattern to form the liquid flow path to be formed on a substrate with a heater is formed by a positive photosensitive material in a two-layered structure of upper and lower layers, and the lower layer is used for forming the liquid flow path after being thermally crosslinked.

Abstract: A positive working lithographic printing plate precursor comprising a lower layer containing a water-insoluble and alkali-soluble resin, and an upper heat-sensitive layer containing a water-insoluble and alkali-soluble resin and an infrared absorbing dye and increasing the solubility in an alkaline aqueous solution by heating, provided in this order on a hydrophilic support, and (a) the upper heat-sensitive layer containing at least two kinds of surface active agents, or (b) the lower layer and upper heat-sensitive layer each containing a surface active agent different from each other.

Abstract: A positive planographic printing plate precursor comprising a recording layer containing a water-insoluble and alkali-soluble resin, an infrared absorbent and an organic quaternary ammonium salt. A positive planographic printing plate precursor comprising at least two recording layers containing the resin and the infrared absorbent with a coating amount of an upper positive recording layer being in the range of 0.05 to 0.45 g/m2.

Abstract: A positive working, multi-layer thermally imageable element is disclosed. The element comprises a substrate, an underlayer, and a top layer. The top layer comprises a crosslinked polymeric material. The element may be thermally imaged and developed to form a lithographic printing plate.

Abstract: A composition useful as a lift-off resist comprising at least one solvent, at least one polydimethylglutarimide (PMGI) resin and at least one selected deep-UV absorbing molecule of Formula I, where X is an aromatic or aliphatic bridging group, and Ar and Ar′ are aryl groups wherein at least one Ar or Ar′ contains one or more hydroxyl or carboxylic acid groups

Abstract: A resist pattern can be formed on a microelectronic substrate, the resist pattern comprising a resist material. A coating layer, including a water-soluble resin, is formed on the resist pattern, wherein the water-soluble resin and the resist material are miscible with one another and intermix to provide an intermixed layer comprising the resist material and the water-soluble resin between the resist pattern and a non-intermixed coating layer. The intermixed layer can be hardened and the non-intermixed coating layer can be removed from the hardened intermixed layer.

Abstract: Vesicular images are formed by thermal imaging of imageable layers containing thermally imageable vesicular imaging compositions. The vesicular images can be used as masks for imaging printing plate precursors. In one aspect, a printing plate precursor made up of a flexible substrate; a photosensitive layer that contains a negative working photosensitive composition; an optional barrier layer; and the imageable layer is thermally imaged to produce an integral mask. Blanket exposure through the mask with ultraviolet and/or visible radiation followed by development produces a printing plate. The method is especially suited for the production of flexographic printing plates.

Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.

Abstract: The present invention relates to a microcapsule produced by using at least an isocyanate compound, a heat-sensitive recording material including the microcapsules and a multicolor heat-sensitive recording material including the microcapsules, wherein the isocyanate compound is a reaction product of an isocyanate compound with a polyether derivative.

Abstract: A resist pattern can be formed on a microelectronic substrate, the resist pattern comprising a resist material. A coating layer, including a water-soluble resin, is formed on the resist pattern, wherein the water-soluble resin and the resist material are miscible with one another and intermix to provide an intermixed layer comprising the resist material and the water-soluble resin between the resist pattern and a non-intermixed coating layer. The intermixed layer can be hardened and the non-intermixed coating layer can be removed from the hardened intermixed layer.

Abstract: Vesicular images are formed by thermal imaging of imageable layers containing thermally imageable vesicular imaging compositions. The vesicular images can be used as masks for imaging printing plate precursors. In one aspect, a printing plate precursor made up of a flexible substrate; a photosensitive layer that contains a negative working photosensitive composition; an optional barrier layer; and the imageable layer is thermally imaged to produce an integral mask. Blanket exposure through the mask with ultraviolet and/or visible radiation followed by development produces a printing plate. The method is especially suited for the production of flexographic printing plates.

Abstract: An improved light attenuating compound for use in the production of microdevices is provided. Broadly, the light attenuating compound is non-aromatic and can be directly incorporated (either physically or chemically) into photolithographic compositions such as bottom anti-reflective coatings (BARC) and contact or via hole fill materials. The preferred non-aromatic compounds of the invention are conjugated aliphatic and alicyclic compounds which greatly enhance the plasma etch rate of the composition. Furthermore, the light attenuating compounds are useful for absorbing light at shorter wavelengths. In one embodiment, the inventive compounds can be polymerized so as to serve as both the polymer binder of the composition as well as the light absorbing constituent.

Abstract: A solution having a photosensitive radical is applied onto a resist film, a developing solution is applied thereonto, and the entire surface of the solution having the photosensitive radical is exposed all at once. Developing of the resist film progresses all at once after a coating film of the solution having the photosensitive radical dissolves in the developing solution, and hence time difference in the start time of developing does not occur in the surface of a substrate, thereby enabling uniform developing and an improvement in line width uniformity (CD value uniformity) in the surface of the substrate.

Abstract: A image forming material has a support having thereon a recording layer which is formed of a composition whose solubility in water or in an alkali aqueous solution is altered by the effects of light or heat, and an intermediate layer which is disposed between the support and the recording layer and which has the same function as that of the recording layer and whose sensitivity to light or heat is higher than that of the recording layer.

Abstract: The invention provides a planographic printing plate precursor, utilizing a support member having a hydrophilic surface excellent in hydrophilicity and durability, providing effects of improving scumming in the printing operation and capable of forming large numbers of prints of high image quality even under severe printing conditions.

Abstract: A composition for an anti-reflective layer capable of simultaneously being developed together with a photoresist layer after exposure of the photoresist layer in a photolithography process and a method for forming patterns in a semiconductor device using the composition, wherein the anti-reflective light absorbing layer composition includes a polymer having a (meth)acrylate repeating unit, a light-absorbing group of diazoquinones chemically bound to the (meth)acrylate repeating unit, a photoacid generator, a cross-linker which thermally cross-links the polymer and is decomposed from the polymer by an acid, and a catalyst for the cross-linking reaction of the polymer. The method for forming patterns in a semiconductor device involves forming an anti-reflective layer on a semiconductor substrate using the composition and simultaneously exposing the anti-reflective layer and a photoresist layer, thereby chemically transforming the anti-reflective layer so it is able to be developed.

Abstract: A positive planographic printing plate precursor includes a support having disposed thereon a lower thermosensitive layer containing a water-insoluble but alkali-soluble polymer compound and an upper thermosensitive layer containing a water-insoluble but alkali-soluble polymer compound, with alkali-solubility increasing under heat, wherein (i) both the upper thermosensitive layer and the lower thermosensitive layer contain an IR absorbing dye, with the ratio of the IR absorbing dye concentration in the upper thermosensitive layer to the IR absorbing dye concentration in the lower thermosensitive layer is 1.6 to 10.0, and/or (ii) the upper thermosensitive layer and the lower thermosensitive layer contain different IR absorbing dyes, and/or (iii) at least one of the upper thermosensitive layer and the lower thermosensitive layer contains an IR absorbent having, in one molecule, at least two chromophoric groups that absorb IR light, with the chromophoric groups bonding to each other via a covalent bond.

Abstract: The invention pertains to the field of fabrication of devices of various purposes, which use anisotropic films: polarizers, retarders, etc., as well as technology of obtaining coatings with anisotropy of electric conductivity, magnetic properties, thermal conduction and other physical properties.

Abstract: The present invention provides a negative-working presensitized plate useful for preparing a lithographic printing plate having a negative-working photosensitive layer on an aluminum substrate, which comprises an intermediate layer comprising a compound having at least one diazonium group and molecular weight of 1000 or less formed between said photosensitive layer and said aluminum substrate. The lithographic printing plate prepared from the negative-working presensitized plate of the present invention shows excellent adhesiveness between a substrate and a photosensitive layer and does not cause contamination in non-imaging areas during printing operation, while maintaining high sensitivity, sensitive range and performance of the photosensitive layer.

Abstract: A resist pattern, containing a material capable of generating an acid by exposure to light, is covered with a resist containing a material capable of crosslinkage in the presence of an acid. The acid is generated in the resist pattern by application of heat or by exposure to light, and a crosslinked layer is formed at the interface as a cover layer for the resist pattern, thereby causing the resist pattern to be thickened. Thus, the hole diameter of the resist pattern can be reduced, or the isolation width of a resist pattern can be reduced.

Abstract: Multi-layer thermally imageable elements, useful as a lithographic printing plate precursors, are disclosed. The elements contain a top layer, an absorber layer that contains a photothermal conversion material and a hydrophilic substrate. An optional underlayer may also be present between the absorber layer and the hydrophilic substrate. The elements can be thermally imaged and processed with an aqueous alkaline developer.

Abstract: Disclosed is a heat-sensitive recording material containing an ultraviolet light absorber precursor which forms an ultraviolet light absorber by being irradiated with light, and a hydrogen donor.

Abstract: A positive planographic printing plate precursor comprising a recording layer containing a water-insoluble and alkali-soluble resin, an infrared absorbent and an organic quaternary ammonium salt. A positive planographic printing plate precursor comprising at least two recording layers containing the resin and the infrared absorbent with a coating amount of an upper positive recording layer being in the range of 0.05 to 0.45 g/m2.

Abstract: An image forming material having a support having disposed in an order thereon an acid-crosslinkable layer, which contains a compound that generates an acid by light or heat and a compound crosslinkable by the acid generated and whose alkali solubility is lowered by the crosslinking, and a radical-polymerizable layer, which contains a compound that generates a radical by light or heat and a compound capable of undergoing a radical polymerization and whose alkali solubility is lowered by the polymerization.

Abstract: The present invention provides a negative-working presensitized plate useful for preparing a lithographic printing plate having a negative-working photosensitive layer on an aluminum substrate, which comprises an intermediate layer comprising a compound having at least one diazonium group and molecular weight of 1000 or less formed between said photosensitive layer and said aluminum substrate. The lithographic printing plate prepared from the negative-working presensitized plate of the present invention shows excellent adhesiveness between a substrate and a photosensitive layer and does not cause contamination in non-imaging areas during printing operation, while maintaining high sensitivity, sensitive range and performance of the photosensitive layer.

Abstract: The invention relates to a process for forming bilayer resist images with a chemically-amplified, radiation-sensitive bilayer resist. The bilayer resist is disposed on a substrate and comprises (i) a top imaging layer comprising a radiation-sensitive acid generator and a vinyl polymer having an acid-cleavable silylethoxy group and (ii) an organic underlayer. The bilayer resist is used in the manufacture of integrated circuits.

Abstract: A positive type photosensitive image-forming material for use with an infrared laser is provided. The material includes a substrate, a layer (A) containing not less than 50% by weight of a copolymer which contains, as a copolymerization component, not less than 10% by mol of at least one of the following monomers (a-1) to (a-3), wherein (a-1) is a monomer having in the molecule a sulfonamide group wherein at least one hydrogen atom is linked to a nitrogen atom, (a-2) is a monomer having in the molecule an active imino group represented by the following general formula (I): and (a-3) is a monomer selected from acrylamide, methacrylamide, acrylate, methacrylate and hydroxystyrene, which respectively have a phenolic hydroxyl group; and a layer (B) containing not less than 50% by weight of an aqueous alkali solution-soluble resin having a phenolic hydroxyl group. The layer (A) and the layer (B) are laminated on the substrate in that order.