At Least Two Radiation-sensitive Layers Patents (Class 430/156)
  • Patent number: 11143961
    Abstract: The present invention relates to resist compostions, in particular to photoresists that can be used in photolithography, especially in the fabrication of integrated circuits and derivative products. The resist compositions of the invention include an anti-scattering component which has a significant amount of empty space, and thus fewer scattering centers, such that radiation-scattering events are more limited during exposure. Such anti-scattering effects can lead to improved resolutions by reducing the usual proximity effects associated with lithographic techniques, allowing the production of smaller, higher resolution microchips. Furthermore, certain embodiments involve anti-scattering components which are directly linked to the resist components, which can improve the overall lithographic chemistry to provide benefits both in terms of resolution and resist sensitivity.
    Type: Grant
    Filed: September 29, 2016
    Date of Patent: October 12, 2021
    Assignee: The University of Manchester
    Inventors: Scott Lewis, Richard Winpenny, Stephen Yeates, Antonio Fernandez
  • Patent number: 11092894
    Abstract: The present invention relates to a method for forming a pattern by negative tone development (NTD) which is prepared by forming an anti-reflective coating composition layer comprising a photoacid generator between the substrate and the photoresist composition layer, and thus exhibits improved line width (CD) in the pattern and prevents pattern collapse owing to thorough activation of de-blocking of the photoresist composition layer during the exposure process.
    Type: Grant
    Filed: December 31, 2014
    Date of Patent: August 17, 2021
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Jihoon Kang, Hye-Won Lee, Seung Uk Lee, Sook Lee, Jae-Bong Lim
  • Patent number: 10875283
    Abstract: A laminate having an adhesive layer, which exhibits excellent adhesion to base films made from polyimide resins and the like or copper foils, as well as superior electrical properties, and also providing a laminate having an adhesive layer, which is low in warpage when the adhesive layer is in B stage, and which is excellent in storage stability of the laminate. The laminate having an adhesive layer includes a base film and an adhesive layer formed on at least one of the surfaces of the base film, in which the adhesive layer is formed of an adhesive composition comprising a carboxyl group-containing styrene based elastomer and an epoxy resin, wherein the content of the carboxyl group-containing styrene based elastomer is 50 parts by mass or more relative to 100 parts by mass of the solid content of the adhesive composition; the content of the epoxy resin is from 1 to 20 parts by mass relative to 100 parts by mass of the carboxyl group-containing styrene based elastomer; and the adhesive layer is in B-stage.
    Type: Grant
    Filed: July 21, 2015
    Date of Patent: December 29, 2020
    Assignee: TOAGOSEI CO., LTD.
    Inventors: Yuya Okimura, Masashi Yamada
  • Patent number: 10672765
    Abstract: A method of manufacturing a transistor comprising providing a substrate, a region of semiconductive material on the substrate, and a region of electrically conductive material on the region of semiconductive material; forming a covering of resist material over said regions; forming a depression in a surface of the covering of resist material that extends over a first portion of said region of conductive material, said first portion separating second and third portions of the conductive region; removing resist material located under said depression to form a window through said covering, exposing said first portion; removing said first portion to expose a connecting portion of the region of semiconductive material that connects the second and third portions; forming a layer of dielectric material over the exposed connecting portion; and forming a layer of electrically conductive material over said layer of dielectric material.
    Type: Grant
    Filed: August 12, 2016
    Date of Patent: June 2, 2020
    Assignee: National Centre For Printable Electronics
    Inventors: Richard Price, Scott White
  • Patent number: 10386724
    Abstract: A photoresist, a patterning method of a quantum dot layer, a QLED, a quantum dot color filter and a display device are disclosed, which can solve the problem that current patterning methods destroy quantum dots. The patterning method of a quantum dot layer includes the steps of: forming a hydrophilic photoresist pattern which comprises forming a photoresist material layer on a substrate by using a photoresist, patterning the photoresist material layer to form a photoresist pattern, and subjecting the photoresist to hydrophilic treatment; applying quantum dots; removing the quantum dots retained on the photoresist pattern; and stripping the photoresist pattern. The patterning method of a quantum dot layer in the present disclosure can improve the hydrophilic performance of the photoresist and reduce the adhesion of the lipophilic quantum dots on the photoresist.
    Type: Grant
    Filed: September 29, 2015
    Date of Patent: August 20, 2019
    Assignee: BOE Technology Group Co., Ltd.
    Inventors: Bin Zhang, Tingting Zhou, Feng Zhang, Wei Zhang, Jincheng Gao
  • Patent number: 10167404
    Abstract: A fixable, UV curable ink includes an aqueous ink vehicle including water and a co-solvent, a pigment, and a dispersant. A polyurethane polymer dispersion is suspended as droplets within the aqueous ink vehicle. The polyurethane polymer dispersion includes a polyurethane polymer selected from the group consisting of a polyether-based polyurethane, a polyester-based polyurethane, a polycarbonate-based polyurethane, and mixtures thereof. The polyurethane polymer has i) an acid number ranging from 0 mg/g to less than 20 mg/g and ii) a glass transition temperature of less than 0° C. A water soluble or water dispersible photoinitiator is present in the fixable, UV curable ink. A base may be included in an amount sufficient to adjust a pH of the UV curable ink so that it ranges from 7.5 to 9.5. An additive may be included and selected from the group consisting of a biocide, a non-ionic surfactant, an anti-kogation agent, a buffer, and combinations thereof.
    Type: Grant
    Filed: August 29, 2017
    Date of Patent: January 1, 2019
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Yi Feng, Yubai Bi, Daniel Vincent Keane, Ali Emamjomeh
  • Patent number: 9982348
    Abstract: A method of forming a patterned metal unit on an article. The method includes the steps of: providing an article that has an insulating surface; transferring a catalyst layer onto the insulating surface of the article, the catalyst layer including a catalytic material; removing a part of the catalyst layer to form a patterned catalyst layer; and forming a patterned metal layer on the patterned catalyst layer by an electroless plating technique to obtain a patterned metal unit that is constituted by the patterned catalyst layer and the patterned metal layer.
    Type: Grant
    Filed: October 16, 2015
    Date of Patent: May 29, 2018
    Assignee: Taiwan Green Point Enterprises Co., Ltd
    Inventors: Pen-Yi Liao, Hui-Ching Chuang, Chih-Hao Chen, Jing-Yi Yang, Wen-Chia Tsai, Yao-Tsung Ho
  • Patent number: 9725389
    Abstract: Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same. In Chemical Formula 1, A, A?, L and n are the same as in the detailed description.
    Type: Grant
    Filed: November 29, 2012
    Date of Patent: August 8, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Yun-Jun Kim, Hwan-Sung Cheon, Youn-Jin Cho, Yong-Woon Yoon, Chung-Heon Lee, Hyo-Young Kwon, Yoo-Jeong Choi
  • Patent number: 9505945
    Abstract: The present invention relates to a novel diblock copolymer comprising a repeat unit (1) and a repeat unit (2), where R1 is hydrogen or C1-C4 alkyl, R2 is selected from a group chosen from hydrogen, C1-C4 alkyl, C1-C4 alkoxy and halide, R3 is selected from a group chosen from hydrogen, C1-C4 alkyl and C1-C4 fluoroalkyl, and R4, R5, R6, R7, R8, R9, R10, R11, and R12 are independently chosen from a C1-C4 alkyl and n=1-6. The invention also relates to a novel composition comprising the novel polymer and a solvent. The invention further relates to a process utilizing the novel composition for affecting directed self-assembly of the block copolymer.
    Type: Grant
    Filed: October 30, 2014
    Date of Patent: November 29, 2016
    Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Hengpeng Wu, Jian Yin, Guanyang Lin, JiHoon Kim, Margareta Paunescu
  • Patent number: 9454086
    Abstract: A method of programmable photolithography includes positioning (910) a programmable photomask in proximity to a photoresist layer on a sample. The programmable photomask is illuminated (920) with a plurality of different wavelengths of light simultaneously to expose the photoresist layer in a predetermined pattern. The programmable photomask is separated (930) from the photoresist layer and the photoresist layer is developed (940) to create the predetermined pattern in the photoresist layer.
    Type: Grant
    Filed: October 15, 2012
    Date of Patent: September 27, 2016
    Assignee: University of Utah Research Foundation
    Inventor: Rajesh Menon
  • Patent number: 8372751
    Abstract: A method for fabricating a semiconductor device includes etching a substrate to form a body separated by a trench, forming liner layers that cover sidewalls of the body, forming a sacrificial layer that fills the trench and exposes an upper sidewall of each liner layer, forming a hard mask pattern that covers a first one of the liner layers having the exposed upper sidewalls, forming a barrier layer to be selectively grown over the exposed upper sidewalls of a second one of the liner layers, removing the hard mask pattern, removing a part of the sacrificial layer to expose a lower sidewall of a first one of the liner layers, and removing the lower sidewall of the first one of the liner layers to form a side contact.
    Type: Grant
    Filed: September 20, 2011
    Date of Patent: February 12, 2013
    Assignee: Hynix Semiconductor Inc.
    Inventor: Sung-Eun Park
  • Patent number: 8334091
    Abstract: To provide a method for easily forming microscopic patterns exceeding the limit of exposure in the patterning technique utilizing the photolithography method in the vacuum deep ultraviolet ray region, a resist pattern swelling material is comprised by mixing a water-soluble or alkali-soluble composition comprising a resin and a cross linking agent and any one of a non-ionic interfacial active agent and an organic solvent selected from a group of the alcohol based, chain or cyclic ester based, ketone based, chain or cyclic ether based organic solvents.
    Type: Grant
    Filed: June 25, 2008
    Date of Patent: December 18, 2012
    Assignee: Fujitsu Limited
    Inventors: Koji Nozaki, Miwa Kozawa, Takahisa Namiki, Junichi Kon, Ei Yano
  • Patent number: 8080364
    Abstract: After forming a resist film made from a chemically amplified resist material pattern exposure is carried out by selectively irradiating the resist film with exposing light while supplying, onto the resist film, water that includes triphenylsulfonium nonaflate, that is, an acid generator, and is circulated and temporarily stored in a solution storage. After the pattern exposure, the resist film is subjected to post-exposure bake and is then developed with an alkaline developer. Thus, a resist pattern made of an unexposed portion of the resist film can be formed in a good shape.
    Type: Grant
    Filed: March 27, 2009
    Date of Patent: December 20, 2011
    Assignee: Panasonic Corporation
    Inventors: Masayuki Endo, Masaru Sasago
  • Patent number: 7585609
    Abstract: The present invention provides methods for forming images in positive- or negative-tone chemically amplified photoresists. The methods of the present invention rely on the vertical up-diffusion of photoacid generated by patternwise imaging of an underlayer disposed on a substrate and overcoated with a polymer containing acid labile functionality. In accordance with the present invention, the vertical up-diffusion can be the sole mechanism for imaging formation or the methods of the present invention can be used in conjunction with conventional imaging processes.
    Type: Grant
    Filed: July 25, 2006
    Date of Patent: September 8, 2009
    Assignee: International Business Machines Corporation
    Inventors: Carl Eric Larson, Gregory Michael Wallraff
  • Patent number: 7358025
    Abstract: A material comprising a specific bisphenol compound with a group of many carbon atoms is useful in forming a photoresist undercoat. The undercoat-forming material, optionally combined with an intermediate layer having an antireflective effect, has an absorptivity coefficient sufficient to provide an antireflective effect at a thickness of at least 200 nm and a high etching resistance as demonstrated by slow etching rates with CF4/CHF3 and Cl2/BCl3 gases for substrate processing.
    Type: Grant
    Filed: March 10, 2006
    Date of Patent: April 15, 2008
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama
  • Patent number: 7341815
    Abstract: A positive planographic printing plate precursor includes a support having disposed thereon a lower thermosensitive layer containing a water-insoluble but alkali-soluble polymer compound and an upper thermosensitive layer containing a water-insoluble but alkali-soluble polymer compound, with alkali-solubility increasing under heat, wherein (i) both the upper thermosensitive layer and the lower thermosensitive layer contain an IR absorbing dye, with the ratio of the IR absorbing dye concentration in the upper thermosensitive layer to the IR absorbing dye concentration in the lower thermosensitive layer is 1.6 to 10.0, and/or (ii) the upper thermosensitive layer and the lower thermosensitive layer contain different IR absorbing dyes, and/or (iii) at least one of the upper thermosensitive layer and the lower thermosensitive layer contains an IR absorbent having, in one molecule, at least two chromophoric groups that absorb IR light, with the chromophoric groups bonding to each other via a covalent bond.
    Type: Grant
    Filed: June 26, 2002
    Date of Patent: March 11, 2008
    Assignee: FUJIFILM Corporation
    Inventors: Akio Oda, Hideo Miyake, Tomoyoshi Mitsumoto, Takeshi Serikawa, Ikuo Kawauchi, Ippei Nakamura
  • Patent number: 7303849
    Abstract: A planographic printing plate precursor comprises a support and two or more positive recording layers which are formed on the support, contain a resin and an infrared absorbing agent and exhibit an increase in solubility in an aqueous alkali solution by exposure to infrared laser light, wherein the positive recording layer closest to the support among these two or more positive recording layers contains at least two types of resins among which at least one type forms a dispersion phase. It is preferable that the dispersion phase be formed of (1) a high-polymer compound incompatible with a high-polymer matrix or (2) a granular polymer selected from a microcapsule and a latex, and contains an infrared absorbing agent and an acid generator.
    Type: Grant
    Filed: February 28, 2005
    Date of Patent: December 4, 2007
    Assignee: FUJIFILM Corporation
    Inventor: Hiroshi Tashiro
  • Patent number: 7258961
    Abstract: A positive planographic printing plate precursor includes a support having disposed thereon a lower thermosensitive layer containing a water-insoluble but alkali-soluble polymer compound and an upper thermosensitive layer containing a water-insoluble but alkali-soluble polymer compound, with alkali-solubility increasing under heat, wherein (i) both the upper thermosensitive layer and the lower thermosensitive layer contain an IR absorbing dye, with the ratio of the IR absorbing dye concentration in the upper thermosensitive layer to the IR absorbing dye concentration in the lower thermosensitive layer is 1.6 to 10.0, and/or (ii) the upper thermosensitive layer and the lower thermosensitive layer contain different IR absorbing dyes, and/or (iii) at least one of the upper thermosensitive layer and the lower thermosensitive layer contains an IR absorbent having, in one molecule, at least two chromophoric groups that absorb IR light, with the chromophoric groups bonding to each other via a covalent bond.
    Type: Grant
    Filed: December 21, 2006
    Date of Patent: August 21, 2007
    Assignee: Fujifilm Corporation
    Inventors: Akio Oda, Hideo Miyake, Tomoyoshi Mitsumoto, Takeshi Serikawa, Ikuo Kawauchi, Ippei Nakamura
  • Patent number: 7150955
    Abstract: A light-sensitive sheet comprises a support, a first light-sensitive layer, a barrier layer and a second light-sensitive layer in this order. Each of the first and second light sensitive layers independently contains a binder, a polymerizable compound and a photo-polymerization initiator. The second light-sensitive layer is more sensitive to light than the first light-sensitive layer. A light-sensitive laminate comprises a substrate, the second light-sensitive layer, the barrier layer and the first light-sensitive layer in this order.
    Type: Grant
    Filed: August 12, 2004
    Date of Patent: December 19, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Morimasa Sato, Yuichi Wakata, Masanobu Takashima, Tomoko Tashiro
  • Patent number: 7045270
    Abstract: A lithographic printing plate precursor comprising a hydrophilic support, an alkali-soluble layer and provided on the alkali-soluble layer a recording layer which contains an infrared ray absorbent, an alkali-soluble resin and an inhibitor of inhibiting the alkali-soluble resin from dissolving in an alkali aqueous developer and increases in the solubility in an alkaline aqueous solution upon irradiation of infrared light, and a developing method of the lithographic printing plate precursor with a non-silicate developer.
    Type: Grant
    Filed: June 19, 2002
    Date of Patent: May 16, 2006
    Assignee: Fuji Photo Film Co. Ltd.
    Inventors: Hideo Miyake, Akio Oda, Tomoyoshi Mitsumoto
  • Patent number: 7022452
    Abstract: Contrast enhanced photolithography methods and devices formed by the same are described. In accordance with these methods, a photoresist layer is formed on a substrate. A contrast enhancing system including a solution or dispersion of a photobleachable dye is formed on the photoresist layer. The photoresist layer is exposed through an imaging pattern and through the contrast enhancing system to radiation having a wavelength between about 230 nm and about 300 nm. The contrast enhancing layer is removed, and the photoresist layer is developed to form a photoresist pattern on the substrate. The contrast enhancing system may be removed and the photoresist layer may be developed in a single process step or in different process steps.
    Type: Grant
    Filed: September 4, 2002
    Date of Patent: April 4, 2006
    Assignee: Agilent Technologies, Inc.
    Inventor: Jennifer Lu
  • Patent number: 6986980
    Abstract: The present invention discloses a method of producing a liquid flow path shape capable of refilling ink at a high speed by optimizing a three-dimensional shape of the liquid flow path and suppressing the vibration of a meniscus and a head thereof. According to the invention, a pattern to form the liquid flow path to be formed on a substrate with a heater is formed by a positive photosensitive material in a two-layered structure of upper and lower layers, and the lower layer is used for forming the liquid flow path after being thermally crosslinked.
    Type: Grant
    Filed: July 9, 2003
    Date of Patent: January 17, 2006
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masahiko Kubota, Wataru Hiyama, Shoji Shiba, Hiroe Ishikura, Akihiko Okano
  • Patent number: 6893795
    Abstract: A positive working lithographic printing plate precursor comprising a lower layer containing a water-insoluble and alkali-soluble resin, and an upper heat-sensitive layer containing a water-insoluble and alkali-soluble resin and an infrared absorbing dye and increasing the solubility in an alkaline aqueous solution by heating, provided in this order on a hydrophilic support, and (a) the upper heat-sensitive layer containing at least two kinds of surface active agents, or (b) the lower layer and upper heat-sensitive layer each containing a surface active agent different from each other.
    Type: Grant
    Filed: July 9, 2002
    Date of Patent: May 17, 2005
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Ikuo Kawauchi, Akio Oda, Hideo Miyake
  • Patent number: 6841330
    Abstract: A positive planographic printing plate precursor comprising a recording layer containing a water-insoluble and alkali-soluble resin, an infrared absorbent and an organic quaternary ammonium salt. A positive planographic printing plate precursor comprising at least two recording layers containing the resin and the infrared absorbent with a coating amount of an upper positive recording layer being in the range of 0.05 to 0.45 g/m2.
    Type: Grant
    Filed: November 30, 2001
    Date of Patent: January 11, 2005
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hideo Miyake, Akio Oda, Tomoyoshi Mitsumoto, Kaoru Iwato
  • Patent number: 6830862
    Abstract: A positive working, multi-layer thermally imageable element is disclosed. The element comprises a substrate, an underlayer, and a top layer. The top layer comprises a crosslinked polymeric material. The element may be thermally imaged and developed to form a lithographic printing plate.
    Type: Grant
    Filed: February 28, 2002
    Date of Patent: December 14, 2004
    Assignee: Kodak Polychrome Graphics, LLC
    Inventors: Paul Kitson, Jayanti Patel, Jianbing Huang, Paul West, Ken-ichi Shimazu
  • Patent number: 6824952
    Abstract: A composition useful as a lift-off resist comprising at least one solvent, at least one polydimethylglutarimide (PMGI) resin and at least one selected deep-UV absorbing molecule of Formula I, where X is an aromatic or aliphatic bridging group, and Ar and Ar′ are aryl groups wherein at least one Ar or Ar′ contains one or more hydroxyl or carboxylic acid groups
    Type: Grant
    Filed: September 13, 2001
    Date of Patent: November 30, 2004
    Assignee: MicroChem Corp.
    Inventors: David W. Minsek, Daniel J. Nawrocki
  • Patent number: 6818384
    Abstract: A resist pattern can be formed on a microelectronic substrate, the resist pattern comprising a resist material. A coating layer, including a water-soluble resin, is formed on the resist pattern, wherein the water-soluble resin and the resist material are miscible with one another and intermix to provide an intermixed layer comprising the resist material and the water-soluble resin between the resist pattern and a non-intermixed coating layer. The intermixed layer can be hardened and the non-intermixed coating layer can be removed from the hardened intermixed layer.
    Type: Grant
    Filed: October 8, 2002
    Date of Patent: November 16, 2004
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sangjun Choi, Sihyeung Lee, Hyoungdo Kim, Woosung Han
  • Patent number: 6794107
    Abstract: Vesicular images are formed by thermal imaging of imageable layers containing thermally imageable vesicular imaging compositions. The vesicular images can be used as masks for imaging printing plate precursors. In one aspect, a printing plate precursor made up of a flexible substrate; a photosensitive layer that contains a negative working photosensitive composition; an optional barrier layer; and the imageable layer is thermally imaged to produce an integral mask. Blanket exposure through the mask with ultraviolet and/or visible radiation followed by development produces a printing plate. The method is especially suited for the production of flexographic printing plates.
    Type: Grant
    Filed: January 23, 2003
    Date of Patent: September 21, 2004
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Ken-Ichi Shimazu, Kevin B. Ray, John Kalamen
  • Patent number: 6773864
    Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.
    Type: Grant
    Filed: December 31, 2002
    Date of Patent: August 10, 2004
    Assignee: Shipley Company, L.L.C.
    Inventors: James W. Thackeray, George W. Orsula
  • Publication number: 20040091810
    Abstract: The present invention relates to a microcapsule produced by using at least an isocyanate compound, a heat-sensitive recording material including the microcapsules and a multicolor heat-sensitive recording material including the microcapsules, wherein the isocyanate compound is a reaction product of an isocyanate compound with a polyether derivative.
    Type: Application
    Filed: October 28, 2003
    Publication date: May 13, 2004
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Masatoshi Yumoto, Takashi Tamura, Koreshige Ito
  • Publication number: 20040086804
    Abstract: A resist pattern can be formed on a microelectronic substrate, the resist pattern comprising a resist material. A coating layer, including a water-soluble resin, is formed on the resist pattern, wherein the water-soluble resin and the resist material are miscible with one another and intermix to provide an intermixed layer comprising the resist material and the water-soluble resin between the resist pattern and a non-intermixed coating layer. The intermixed layer can be hardened and the non-intermixed coating layer can be removed from the hardened intermixed layer.
    Type: Application
    Filed: October 8, 2002
    Publication date: May 6, 2004
    Inventors: Sangjun-Choi, Sihyeung-Lee, Hyoungdo Kim, Woosung-Han
  • Publication number: 20040081908
    Abstract: Vesicular images are formed by thermal imaging of imageable layers containing thermally imageable vesicular imaging compositions. The vesicular images can be used as masks for imaging printing plate precursors. In one aspect, a printing plate precursor made up of a flexible substrate; a photosensitive layer that contains a negative working photosensitive composition; an optional barrier layer; and the imageable layer is thermally imaged to produce an integral mask. Blanket exposure through the mask with ultraviolet and/or visible radiation followed by development produces a printing plate. The method is especially suited for the production of flexographic printing plates.
    Type: Application
    Filed: January 23, 2003
    Publication date: April 29, 2004
    Inventors: Ken-Ichi Shimazu, Kevin B. Ray, John Kalamen
  • Publication number: 20040067441
    Abstract: An improved light attenuating compound for use in the production of microdevices is provided. Broadly, the light attenuating compound is non-aromatic and can be directly incorporated (either physically or chemically) into photolithographic compositions such as bottom anti-reflective coatings (BARC) and contact or via hole fill materials. The preferred non-aromatic compounds of the invention are conjugated aliphatic and alicyclic compounds which greatly enhance the plasma etch rate of the composition. Furthermore, the light attenuating compounds are useful for absorbing light at shorter wavelengths. In one embodiment, the inventive compounds can be polymerized so as to serve as both the polymer binder of the composition as well as the light absorbing constituent.
    Type: Application
    Filed: October 20, 2003
    Publication date: April 8, 2004
    Inventors: Xie Shao, Robert Cox, Shreeram V. Deshpande, Tony D. Flaim, Rama Puligadda
  • Patent number: 6713239
    Abstract: A solution having a photosensitive radical is applied onto a resist film, a developing solution is applied thereonto, and the entire surface of the solution having the photosensitive radical is exposed all at once. Developing of the resist film progresses all at once after a coating film of the solution having the photosensitive radical dissolves in the developing solution, and hence time difference in the start time of developing does not occur in the surface of a substrate, thereby enabling uniform developing and an improvement in line width uniformity (CD value uniformity) in the surface of the substrate.
    Type: Grant
    Filed: March 29, 2002
    Date of Patent: March 30, 2004
    Assignee: Tokyo Electron Limited
    Inventors: Takayuki Toshima, Tsutae Omori, Yoshio Kimura
  • Patent number: 6670098
    Abstract: A image forming material has a support having thereon a recording layer which is formed of a composition whose solubility in water or in an alkali aqueous solution is altered by the effects of light or heat, and an intermediate layer which is disposed between the support and the recording layer and which has the same function as that of the recording layer and whose sensitivity to light or heat is higher than that of the recording layer.
    Type: Grant
    Filed: July 11, 2000
    Date of Patent: December 30, 2003
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Kazuto Kunita
  • Publication number: 20030170566
    Abstract: The invention provides a planographic printing plate precursor, utilizing a support member having a hydrophilic surface excellent in hydrophilicity and durability, providing effects of improving scumming in the printing operation and capable of forming large numbers of prints of high image quality even under severe printing conditions.
    Type: Application
    Filed: December 6, 2002
    Publication date: September 11, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Sumiaki Yamasaki, Koichi Kawamura, Hisashi Hotta
  • Publication number: 20030162120
    Abstract: A composition for an anti-reflective layer capable of simultaneously being developed together with a photoresist layer after exposure of the photoresist layer in a photolithography process and a method for forming patterns in a semiconductor device using the composition, wherein the anti-reflective light absorbing layer composition includes a polymer having a (meth)acrylate repeating unit, a light-absorbing group of diazoquinones chemically bound to the (meth)acrylate repeating unit, a photoacid generator, a cross-linker which thermally cross-links the polymer and is decomposed from the polymer by an acid, and a catalyst for the cross-linking reaction of the polymer. The method for forming patterns in a semiconductor device involves forming an anti-reflective layer on a semiconductor substrate using the composition and simultaneously exposing the anti-reflective layer and a photoresist layer, thereby chemically transforming the anti-reflective layer so it is able to be developed.
    Type: Application
    Filed: February 12, 2003
    Publication date: August 28, 2003
    Inventors: Sang-Woong Yoon, Hoe-Sik Chung, Jin-A Ryu, Young-Ho Kim
  • Publication number: 20030157434
    Abstract: A positive planographic printing plate precursor includes a support having disposed thereon a lower thermosensitive layer containing a water-insoluble but alkali-soluble polymer compound and an upper thermosensitive layer containing a water-insoluble but alkali-soluble polymer compound, with alkali-solubility increasing under heat, wherein (i) both the upper thermosensitive layer and the lower thermosensitive layer contain an IR absorbing dye, with the ratio of the IR absorbing dye concentration in the upper thermosensitive layer to the IR absorbing dye concentration in the lower thermosensitive layer is 1.6 to 10.0, and/or (ii) the upper thermosensitive layer and the lower thermosensitive layer contain different IR absorbing dyes, and/or (iii) at least one of the upper thermosensitive layer and the lower thermosensitive layer contains an IR absorbent having, in one molecule, at least two chromophoric groups that absorb IR light, with the chromophoric groups bonding to each other via a covalent bond.
    Type: Application
    Filed: June 26, 2002
    Publication date: August 21, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Akio Oda, Hideo Miyake, Tomoyoshi Mitsumoto, Takeshi Serikawa, Ikuo Kawauchi, Ippei Nakamura
  • Publication number: 20030148196
    Abstract: The invention pertains to the field of fabrication of devices of various purposes, which use anisotropic films: polarizers, retarders, etc., as well as technology of obtaining coatings with anisotropy of electric conductivity, magnetic properties, thermal conduction and other physical properties.
    Type: Application
    Filed: February 4, 2003
    Publication date: August 7, 2003
    Inventors: Pavel I. Lazarev, Natalya A. Ovchinnikova
  • Patent number: 6593054
    Abstract: The present invention provides a negative-working presensitized plate useful for preparing a lithographic printing plate having a negative-working photosensitive layer on an aluminum substrate, which comprises an intermediate layer comprising a compound having at least one diazonium group and molecular weight of 1000 or less formed between said photosensitive layer and said aluminum substrate. The lithographic printing plate prepared from the negative-working presensitized plate of the present invention shows excellent adhesiveness between a substrate and a photosensitive layer and does not cause contamination in non-imaging areas during printing operation, while maintaining high sensitivity, sensitive range and performance of the photosensitive layer.
    Type: Grant
    Filed: February 26, 2001
    Date of Patent: July 15, 2003
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Tomoyoshi Mitsumoto
  • Patent number: 6579657
    Abstract: A resist pattern, containing a material capable of generating an acid by exposure to light, is covered with a resist containing a material capable of crosslinkage in the presence of an acid. The acid is generated in the resist pattern by application of heat or by exposure to light, and a crosslinked layer is formed at the interface as a cover layer for the resist pattern, thereby causing the resist pattern to be thickened. Thus, the hole diameter of the resist pattern can be reduced, or the isolation width of a resist pattern can be reduced.
    Type: Grant
    Filed: March 27, 1998
    Date of Patent: June 17, 2003
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Takeo Ishibashi, Toshiyuki Toyoshima, Keiichi Katayama, Ayumi Minamide
  • Publication number: 20030104307
    Abstract: Multi-layer thermally imageable elements, useful as a lithographic printing plate precursors, are disclosed. The elements contain a top layer, an absorber layer that contains a photothermal conversion material and a hydrophilic substrate. An optional underlayer may also be present between the absorber layer and the hydrophilic substrate. The elements can be thermally imaged and processed with an aqueous alkaline developer.
    Type: Application
    Filed: September 5, 2001
    Publication date: June 5, 2003
    Inventors: Ken-Ichi Shimazu, Jayanti Patel
  • Publication number: 20020187417
    Abstract: Disclosed is a heat-sensitive recording material containing an ultraviolet light absorber precursor which forms an ultraviolet light absorber by being irradiated with light, and a hydrogen donor.
    Type: Application
    Filed: March 13, 2002
    Publication date: December 12, 2002
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Kazumori Minami, Masanobu Takashima
  • Publication number: 20020136979
    Abstract: A positive planographic printing plate precursor comprising a recording layer containing a water-insoluble and alkali-soluble resin, an infrared absorbent and an organic quaternary ammonium salt. A positive planographic printing plate precursor comprising at least two recording layers containing the resin and the infrared absorbent with a coating amount of an upper positive recording layer being in the range of 0.05 to 0.45 g/m2.
    Type: Application
    Filed: November 30, 2001
    Publication date: September 26, 2002
    Inventors: Hideo Miyake, Akio Oda, Tomoyoshi Mitsumoto, Kaoru Iwato
  • Patent number: 6423462
    Abstract: An image forming material having a support having disposed in an order thereon an acid-crosslinkable layer, which contains a compound that generates an acid by light or heat and a compound crosslinkable by the acid generated and whose alkali solubility is lowered by the crosslinking, and a radical-polymerizable layer, which contains a compound that generates a radical by light or heat and a compound capable of undergoing a radical polymerization and whose alkali solubility is lowered by the polymerization.
    Type: Grant
    Filed: July 27, 2000
    Date of Patent: July 23, 2002
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Kazuto Kunita
  • Publication number: 20020064726
    Abstract: The present invention provides a negative-working presensitized plate useful for preparing a lithographic printing plate having a negative-working photosensitive layer on an aluminum substrate, which comprises an intermediate layer comprising a compound having at least one diazonium group and molecular weight of 1000 or less formed between said photosensitive layer and said aluminum substrate. The lithographic printing plate prepared from the negative-working presensitized plate of the present invention shows excellent adhesiveness between a substrate and a photosensitive layer and does not cause contamination in non-imaging areas during printing operation, while maintaining high sensitivity, sensitive range and performance of the photosensitive layer.
    Type: Application
    Filed: February 26, 2001
    Publication date: May 30, 2002
    Inventor: Tomoyoshi Mitsumoto
  • Patent number: 6395449
    Abstract: Compositions useful for a lift-off resist in a bilayer metal lift-off process which comprise a mixture of at least one solvent, at least one polyglutarimide resin and an effective amount of at least one dissolution rate modifier selected from a group consisting of 2,3,4,2′,3′,4′-hexahydroxybenzophenone; hexahydroxyspirobiindane; 2,4,2′,4′-tetrahydroxybenzophenone; 1,1,1-tris-hydroxyphenylethane; 1,7-bis-(hydroxy-3-methoxyphenyl)-1,6-heptadiene-3,5-dione and at least one arylsulfonate ester of these poly-hydroxy aromatic compounds.
    Type: Grant
    Filed: March 31, 2000
    Date of Patent: May 28, 2002
    Assignee: MicroChem Corp.
    Inventors: Rodney J. Hurditch, Daniel J. Nawrocki, Mark J. Shaw
  • Patent number: 6352812
    Abstract: A thermal lithographic printing plate, which can be imaged by thermal energy typically by imagewise exposure with an infrared emitting laser, a thermal printing head, etc., is made up of a hydrophilic substrate, and a composite layer structure composed of two layer coatings. Preferably, the first layer of the composite is composed of an aqueous developable polymer mixture containing a photothermal conversion material which is contiguous to the hydrophilic substrate. The second layer of the composite is composed of one or more non-aqueous soluble polymers which are soluble or dispersible in a solvent which does not dissolve the first layer. The plate is exposed with an infrared laser or a thermal print head, and upon aqueous development of the imaged plate, the exposed portions are removed exposing hydrophilic substrate surfaces receptive to conventional aqueous fountain solutions. The unexposed portions contain the ink-receptive image areas.
    Type: Grant
    Filed: April 29, 1999
    Date of Patent: March 5, 2002
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Ken-Ichi Shimazu, Jayanti Patel, Shashikant Saraiya, Nishith Merchant, Celin Savariar-Hauck, Hans-Joachim Timpe, Christopher D. McCullough
  • Patent number: RE38282
    Abstract: The invention relates to a process for forming bilayer resist images with a chemically-amplified, radiation-sensitive bilayer resist. The bilayer resist is disposed on a substrate and comprises (i) a top imaging layer comprising a radiation-sensitive acid generator and a vinyl polymer having an acid-cleavable silylethoxy group and (ii) an organic underlayer. The bilayer resist is used in the manufacture of integrated circuits.
    Type: Grant
    Filed: June 28, 2001
    Date of Patent: October 21, 2003
    Assignee: International Business Machines Corporation
    Inventors: Robert David Allen, Donald Clifford Hofer, Ratnam Sooriyakumaran, Gregory Michael Wallraff
  • Patent number: RE41579
    Abstract: A positive type photosensitive image-forming material for use with an infrared laser is provided. The material includes a substrate, a layer (A) containing not less than 50% by weight of a copolymer which contains, as a copolymerization component, not less than 10% by mol of at least one of the following monomers (a-1) to (a-3), wherein (a-1) is a monomer having in the molecule a sulfonamide group wherein at least one hydrogen atom is linked to a nitrogen atom, (a-2) is a monomer having in the molecule an active imino group represented by the following general formula (I): and (a-3) is a monomer selected from acrylamide, methacrylamide, acrylate, methacrylate and hydroxystyrene, which respectively have a phenolic hydroxyl group; and a layer (B) containing not less than 50% by weight of an aqueous alkali solution-soluble resin having a phenolic hydroxyl group. The layer (A) and the layer (B) are laminated on the substrate in that order.
    Type: Grant
    Filed: January 21, 2004
    Date of Patent: August 24, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Hideo Miyake, Ikuo Kawauchi