Abstract: Compositions useful for a lift-off resist in a bilayer metal lift-off process which comprise a mixture of at least one solvent, at least one polyglutarimide resin and an effective amount of at least one dissolution rate modifier selected from a group consisting of 2,3,4,2′,3′,4′-hexahydroxybenzophenone; hexahydroxyspirobiindane; 2,4,2′,4′-tetrahydroxybenzophenone; 1,1,1-tris-hydroxyphenylethane; 1,7-bis-(hydroxy-3-methoxyphenyl)-1,6-heptadiene-3,5-dione and at least one arylsulfonate ester of these poly-hydroxy aromatic compounds.

Abstract: A thermal lithographic printing plate, which can be imaged by thermal energy typically by imagewise exposure with an infrared emitting laser, a thermal printing head, etc., is made up of a hydrophilic substrate, and a composite layer structure composed of two layer coatings. Preferably, the first layer of the composite is composed of an aqueous developable polymer mixture containing a photothermal conversion material which is contiguous to the hydrophilic substrate. The second layer of the composite is composed of one or more non-aqueous soluble polymers which are soluble or dispersible in a solvent which does not dissolve the first layer. The plate is exposed with an infrared laser or a thermal print head, and upon aqueous development of the imaged plate, the exposed portions are removed exposing hydrophilic substrate surfaces receptive to conventional aqueous fountain solutions. The unexposed portions contain the ink-receptive image areas.

Abstract: A positive type photosensitive image-forming material for use with an infrared laser is provided. The material includes a substrate, a layer (A) containing not less than 50% by weight of a copolymer which contains, as a copolymerization component, not less than 10% by mol of at least one of the following monomers (a-1) to (a-3), wherein (a-1) is a monomer having in the molecule a sulfonamide group wherein at least one hydrogen atom is linked to a nitrogen atom, (a-2) is a monomer having in the molecule an active imino group represented by the following general formula (I): and (a-3) is a monomer selected from acrylamide, methacrylamide, acrylate, methacrylate and hydroxystyrene, which respectively have a phenolic hydroxyl group; and a layer (B) containing not less than 50% by weight of an aqueous alkali solution-soluble resin having a phenolic hydroxyl group. The layer (A) and the layer (B) are laminated on the substrate in that order.

Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition, particularly for deep UV applications. The antireflective compositions of the invention comprise a photoacid generator that is activated during exposure of an overcoated photoresist. Antireflective compositions of the invention can significantly reduce undesired footing of an overcoated resist relief image.

Abstract: An imaging medium comprises a substrate carrying a color-change layer. This color-change layer comprises two layers or phases comprising two color-forming reagents which react upon heating to cause a change in the color of the layer. The color-change layer is deactivated by exposure to actinic radiation such that after deactivation it no longer undergoes its thermal color-change. The color-change layer is detachable from the substrate by heating to a temperature lower than required to cause the color change, so that upon contact of the imaging medium with a receiving sheet each individual pixel of the color-change layer may be left attached to the substrate, transferred to the receiving sheet but left uncolored, or transferred to the receiving sheet and colored to a color level determined by the energy used in the associated thermal print head element.

Abstract: A resist material having a resist and particles mixed into the resist, a major component of the particles being a cluster of carbon atoms, is provided. A method for fabricating a resist material is also provided, the method repeatedly performing: a first step of coating a substrate with a resist film; and a second step of depositing particles whose major component is a cluster of carbon atoms on the resist film. Accordingly, a resist film with high etching resistance can be obtained, and it is possible to realize a reduction in the thickness of the resist film, improvements of contrast of resist patterns; resist sensitivity; heat resistance of resist films; mechanical strength of resist patterns; and further, stabilization of resist sensitivity. Therefore, highly precise fine pattern fabrication can be realized.

Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.

Abstract: According to the present invention there is provided a heat mode imaging element for making a lithographic printing plate having on a lithographic base with a hydrophilic surface a first layer including a polymer, soluble in an aqueous alkaline solution and a top layer on the same side of the lithographic base as the first layer which top layer is unpenetrable for or insoluble in an alkaline developer containing SiO.sub.2 in the form of silicates; characterized in that said first layer and said top layer comprise a compound capable of converting IR-light into heat.

Abstract: Lithographic printing plates for wet or waterless offset printing are disclosed which can be imagewise exposed using a digitally controlled IR laser. The invention comprises a laser imagable lithographic printing plate comprising a substrate, a photosensitive coating on the substrate, and a water soluble laser ablatable top coating containing dyes or polymers that absorb infra-red, ultraviolet and visible light. Laminated transparent polymer films and/or peelable polymeric coatings films can be interposed between the coated substrate and a water soluble and/or organic solvent soluble laser ablatable top layer to augment plate production or image inscription on the plate.

Abstract: An integral membrane can be formed in sheet-like photosensitive laminate structures. The process for forming the structure involves coating a first relatively thin photosensitive layer on a substrate or carrier film, then forming a second relatively thicker photosensitive layer (when compared to the first layer) on the first layer. The structure is exposed by directing appropriate actinic radiation against the substrate, film or carrier layer under controlled conditions such that only the first layer is substantially exposed to radiation resulting in polymerization or crosslinking and a substantial reduction in the solubility of the first layer. The relatively thinner less soluble layer then acts as a peelable integral release layer in the photosensitive structure. The thicker second layer can then be imagewise exposed to actinic radiation, and then used conventionally in imaging processes such as sandblasting.

Abstract: According to the present invention there is provided an imaging element for making a lithographic printing plate comprising on a support having a hydrophilic surface a photosensitive layer and a thermosensitive layer, said thermosensitive layer being opaque to light for which said photosensitive layer has spectral sensitivity and said thermosensitive layer being capable of rendered transparent upon exposure to laser light characterised in that said thermosensitive layer is soluble or swellable in an aqueous medium.

Abstract: A method for fabricating a chip carrier, e.g., a printed circuit board, which includes at least one photo-via is disclosed. This method inlcudes the steps of forming a first dielectric layer on a substrate. A second dielectric layer, having a greater photosensitivity than the first dielectric layer, is formed on the first dielectric layer. Preferably, this second dielectric layer has a relatively low optical absorptivity at the wavelengths to be used during exposure. Then, at least the second dielectric layer is selectively exposed to actinic radiation. The second and first dielectric layers are then developed, to form one or more desired photo-vias.

Abstract: There is described a method of preparing a water-less lithographic plate by coating a positive working photosensitive composition onto an oleophilic base imagewise exposing the plate and developing it to remove the areas of the photosensitive composition which have been light exposed, coating overall the surface of the plate with a layer of a composition which is ink-releasing or when cured becomes ink releasing, then either as a separate step or as a combined step curing the ink-releasing composition or drying the ink-releasing composition and light exposing overall the plate, then redeveloping the plate to remove the photosensitive composition remaining after the first development and any ink-releasing composition overlying the photosensitive composition.

Abstract: A heat-sensitive recording material having formed on a support a heat-sensitive recording layer containing a diazonium salt and a coupling component, wherein the diazonium salt is a compound represented by the following formula (1): ##STR1## wherein R.sup.1 represents an alkyl group or an aryl group; R.sup.2, R.sup.3, R.sup.4 and R.sup.5 each independently represents a hydrogen atom or an alkyl group, at least one of R.sup.2, R.sup.3, R.sup.4, and R.sup.5 represents an alkyl group, and R.sup.2 and R.sup.3, or R.sup.4 and R.sup.5, or R.sup.1 and R.sup.3, or R.sup.1 and R.sup.4, may combine with each other to form a ring; and X.sup.- represents an anion.

Abstract: A ceramics green sheet which is suitably used for producing sintered ceramics substrates and the like is disclosed. The ceramics green sheet according to the present invention includes a ceramics powder, a photoinitiator, a UV absorber such as photoinitiation inhibitor organic dyes and inorganic powders, and a photosensitive resin composition. The ceramics green sheet according to the present invention has an advantage that via holes and through holes may be very easily formed with high precision, and fine holes may be formed reliably and inexpensively.

Abstract: A printing sheet that is adapted for printing in an inkjet printer or the like. The sheet has a plurality of pits in the top surface. The pits accept the ink and hold the ink in place. The bottom surface of the sheet has a permanent electrostatic charge. The sheet may be constructed by etching an electreet compatible plastic sheet and then polling the sheet. Alternatively, the sheet may be constructed by bonding a porous sheet to an electreet sheet.

Abstract: The invention relates to a process for forming bilayer resist images with a chemically-amplified, radiation-sensitive bilayer resist. The bilayer resist is disposed on a substrate and comprises (i) a top imaging layer comprising a radiation-sensitive acid generator and a vinyl polymer having an acid-cleavable silylethoxy group and (ii) an organic underlayer. The bilayer resist is used in the manufacture of integrated circuits.

Abstract: A heat-sensitive recording material having a support and a heat-sensitive recording layer provided thereon. The heat-sensitive recording layer contains a diazonium salt compound and a coupler which reacts with the diazonium salt compound upon heating to form a color. The heat-sensitive recording layer contains a compound of the following formula (I): ##STR1## wherein R represents a member selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group, and an aryl group; X represents a member selected from the group consisting of --COOR.sup.1, --OCOR.sup.--1, --CONR.sup.1 R.sup.2, and --NR.sup.2 COR.sup.1 ; R.sup.1 represents an alkyl group or an aryl group, R.sup.2 represents a member selected from the group consisting of a hydrogen atom, an alkyl group, and an aryl group; n represents an integer from 1 to 5.

Abstract: In a multilayer recording element which is suitable for producing flexographic printing plates by digital information transfer and has, arranged one on top of the other on a dimensionally stable substrate, a layer (A) which is crosslinkable by actinic radiation, a layer (B) sensitive to actinic radiation and, if required, a peelable cover sheet, the layer (A) crosslinkable by actinic radiation is crosslinked by imagewise exposure to actinic radiation of from 0.5 to 5 J/cm.sup.2 and can then be washed out by a developer and essentially comprises a mixture of at least one elastomeric binder, ethylenically unsaturated copolymerizable organic compounds, photoinitiator, and, if required, further assistants, and the layer (B) sensitive to actinic radiation is a layer which is soluble or dispersible in developers and has an optical density of >2.

Abstract: Proposed is a novel undercoating composition used in the photolithographic patterning of a photoresist layer by intervening between the substrate surface and the photoresist layer to decrease the adverse influences of the reflecting light from the substrate surface. The undercoating composition of the invention comprises (a) a melamine compound substituted by methylol groups and/or alkoxymethyl groups and (b) a polyhydroxy benzophenone compound, diphenyl sulfone compound or diphenyl sulfoxide compound, optionally, with admixture of (c) an alkali-insoluble resin of a (meth)acrylic acid ester.

Abstract: Improved aluminum substrates suitable for use in the production of lithographic printing plates. A surfactant surface treatment for such aluminum substrates improves the quality of radiation sensitive coatings subsequently applied to the substrate. The surfactant may be in a layer comprising a mixture of a hydrophilizing composition and a surfactant on the aluminum alloy surface; or a hydrophilizing layer comprising a hydrophilizing composition may be on the aluminum alloy surface and a surfactant layer comprising a surfactant on the hydrophilizing layer.

Abstract: A heat-sensitive recording material having excellent light-fastness and raw stock storability is disclosed. The material includes a support and a heat-sensitive recording layer provided on the support, and the heat-sensitive recording layer contains a diazo compound and a coupler. The coupler contains at least one species of pyrazolone compounds represented by the following formula (1): ##STR1## wherein Ar represents a phenyl group, a naphthyl group, or an aromatic heterocyclic group, any one of which may have a substituent bonded to the nucleus, said substituent may be a halogen atom, a cyano group, a trifluoromethyl group, an alkyl group, an aryl group, an alkoxycarbonyl group, a carbamoyl group, or a sulfamoyl group; R.sup.1 and R.sup.2 independently represent an alkyl group, an alkenyl group, or an aryl group, or R.sup.1 and R.sup.2 may be linked to each other so as to form a heterocycle.

Abstract: Object: A method for preparing a lithographic printing plate directly from digital image signals with the use of a presensitized lithographic printing plate comprising a support having thereon a photosensitive layer and a light-shielding layer which can be removed imagewise with laser light is provided, wherein the light-shielding layer, which can be industrially produced readily at a moderate price can be removed sufficiently during a process of development without the need of removing a masking layer at an unexposed portion and adverse effect on a photosensitive layer.

Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.

Abstract: A radiation sensitive composition containing an adduct of a diazonium resin having pendant diazonium groups, with a sulfonated acrylic copolymer having pendant sulfonate groups. The sulfonated acrylic copolymer contains an acrylic moiety and a sulfonated styryl or acrylic moiety. The copolymer may optionally contain styryl moieties. The composition is useful as a radiation sensitive layer in imaging elements for graphic arts applications and is particularly useful in preparing durable, long-wear, printing plates.

Abstract: Microlithographic methods for the use of improved underlayers for chemically amplified deep UV photoresist compositions and structures produced thereby are disclosed. The compositions comprise, in admixture, a polymeric binder, and an azide which is thermolyzed during microlithographic processing to form an amine. Films formed from the underlayer compositions of the present invention, when applied immediately under and proximate to a chemically amplified photoresist film reduce the resist structure sidewall foot or undercut caused by an adverse contact reaction.

Abstract: Microlithographic methods for the use of improved underlayers for chemically amplified deep UV photoresist compositions and structures produced thereby are disclosed. The compositions comprise, in admixture, a polymeric binder, and an azide which is thermolyzed during microlithographic processing to form an amine. Films formed from the underlayer compositions of the present invention, when applied immediately under and proximate to a chemically amplified photoresist film reduce the resist structure sidewall foot or undercut caused by an adverse contact reaction.

Abstract: A planarizing technique comprising: coating a topography overlying a substrate with a planarizing resist layer; softbaking the planarizing resist layer in the presence of a silicon-containing vapor or liquid; coating the planarizing resist layer with an imaging resist layer; softbaking the imaging resist; selectively exposing the imaging resist layer to light; developing the imaging resist layer; and etching the planarizing layer. The planarizing layer may comprise novolacs and other organic polymers used conventionally in lithographic processes. The planarizing layer may further comprise any organic acid moiety that is compatible with the solvent used to dissolve the resin. In particular, the acid moiety is indole-3-carboxylic acid. In another aspect, the invention comprises a silylated planarizing resist.

Abstract: A presensitized plate which comprises a roughened and anodized aluminum plate having provided thereon a positive working light-sensitive composition layer which comprises a dye and can be made soluble in a developer upon exposure to light, wherein the dye concentration in the portion of the light-sensitive layer adjacent to or near the substrate is lower than that in the other portions of the light-sensitive layer.The presensitized plate according to the present invention has less color staining than PS plates of the prior art do and thus has excellent examining properties for plate-quality. The presensitized plate also has remarkable advantages of less stains around image-deleted areas during printing and high printing durability.

Abstract: Disclosed is a method of making a polyimide pattern on a substrate. A solution is prepared in an organic solvent of a polyamic acid and about 1 to about 10 wt. % of a photosensitizer that becomes more water soluble when exposed to actinic light. A coating is formed of the solution on a substrate and solvent is evaporated from the coating. A positive photoresist is applied over the coating and is exposed to a pattern of actinic light. The exposed portions of the photoresist are removed as well as the exposed portions of the polyamic acid coating thereunder. The remaining photoresist is removed and the polyamic acid coating is imidized.

Abstract: A diazo heat-sensitive recording material having excellent raw stock storability and image storage characteristics, which comprises a support having thereon a recording layer comprising a diazo compound, a coupling component and an organic base. The diazo compound is a 4-disubstituted amino-2-alkoxybenzenediazonium salt and the coupling component is a compound represented by the following general formula: ##STR1## wherein R.sub.4, R.sub.5, R.sub.6 and R.sub.7 each represents a hydrogen atom, an alkyl group, an aryl group, an aralkyl group, an alkyloxy group, an aryloxy group, an alkylthio group, an arylthio group, an acyl group, an alkoxycarbonyl group, an acyloxy group, a carbamoyl group, a sulfamoyl group, a halogen atom, a cyano group or a nitro group.

Abstract: A heat-sensitive recording material comprising a support having thereon a heat-sensitive recording layer and a protective layer in this sequence, said heat-sensitive recording material containing a compound represented by formula (1), (2), (3), or (4): ##STR1##

Abstract: A radiation-sensitive mixture for use in the production of semiconductor elements, which has high sensitivity and high resolution, which can be developed by an aqueous alkaline solution, and which is based on a novel concept in that a stable acid latent image is controlled by using a radiation-decomposable base.The mixture is characterized by comprising as essential components a) a binder which is insoluble in water but soluble in an aqueous alkaline solution; b.sup.1) a compound having at least one bond which can be cleaved by an acid, or b.sup.2) a compound having at least one bond which is crosslinked with the compound a) by an acid; c) a compound which generates an acid when irradiated; and d) a basic iodonium compound.

Abstract: Microlithographic methods for the use of improved underlayers for chemically amplified deep UV photoresist compositions and structures produced thereby are disclosed. The compositions comprise, in admixture, a polymeric binder, and an azide which is thermolyzed during microlithographic processing to form an amine. Films formed from the underlayer compositions of the present invention, when applied immediately under and proximate to a chemically amplified photoresist film reduce the resist structure sidewall foot or undercut caused by an adverse contact reaction.

Abstract: A radiation sensitive device comprising a substrate carrying a radiation sensitive layer is coated with a discontinuous covering layer which is more light sensitive than the radiation sensitive layer. The covering layer is formed by spraying and assists in improving vacuum drawdown during image-wise exposure of the device without having a deleterious affect on the exposure and development characteristics of the device.

Abstract: A negative-type photosensitive lithographic printing plate having a photosensitive layer comprising upper and lower layers, each layer containing a photosensitive diazo resin, on a support having a hydrophilic surface. The concentration of the diazo resin in the upper layer is not more than 1/3 of the concentration of the diazo resin in the lower layer, the thickness of the upper layer is not less than three times the thickness of the lower layer, and the upper layer contains an oleophilic non-photosensitive resin with a weight average molecular weight ranging from 10,000 to 150,000. The lithographic printing plate has a very short exposure time, may be used with projection exposure systems and allows for the use of known developers and automated developer systems.

Abstract: A recording material comprising a plastic film provided with a layer of ionizing radiation cured resin having a hardness equal to or harder than a pencil hardness of H and an image-forming layer having pressure sensitivity or thermal sensitivity or photosensitivity and thermal sensitivity, wherein rippling during storage in high humidity or caused by heat is markedly reduced.

Abstract: A photoimageable element comprising: a substrate; a layer of a photosensitive composition comprising a photosensitive material coated on the substrate; and a protective overcoating comprising an oxygen barrier component and a moisture resistant component; wherein the oxygen barrier component has an oxygen permeability of no greater than about 10.sup.-14 cc(cm)/cm.sup.2 (sec)(Pa).

Abstract: A forming method of a fine resist pattern improve so as to form a fine pattern of high accuracy can be obtained. A positive-type photoresist 1 including naphthoquinone diazide and novolak resin is applied on a substrate. An anti-reflection film adjusted to alkalinity is applied on positive-type photoresist 1. Positive-type photoresist 1 on which anti-reflection film 9 is applied is selectively irradiated. Positive-type photoresist 1 is developed.

Abstract: This invention is an acetal polymer having the following repeating units: ##STR1## where R is an alkyl group of 1 to 10 carbon atoms;Ar.sub.1 is an aromatic group substituted with an aliphatic group containing 3 to 20 carbon atoms or an alkoxy group having 3 to 20 carbon atoms;Ar.sub.2 is a non-substituted aromatic group;A.sub.1 is an acid group;n.sub.1, n.sub.2, n.sub.3, n.sub.4, n.sub.5 represent the molar percents of the respective repeating units and n.sub.1 is 0-20 mole %, preferably 2-10 mole %; n.sub.2 is 2-20 mole %, preferably 5 to 15 mole %; n.sub.3 is 15-85 mole %, preferably 20 to 65 mole %; n.sub.4 is 0 to 40 mole %, preferably 0 to 20 mole %; and n.sub.5 is 5-40 mole %, preferably 20 to 35 mole %. These polymers may be used in photosensitive compositions and lithographic printing plates.

Abstract: A photolithographically viahole-forming photosensitive element is formed of a light-transmitting base material and a photosensitive resin composition laminated as a layer on the light-transmitting base material. The photosensitive resin composition comprises:(a) 100 parts by weight of a mixture comprising:(a-1) 10 to 90 parts by weight of a rubber,(a-2) 5 to 40 parts by weight of a phenol resin, and(a-3) 10 to 80 parts by weight of an epoxy resin;(b) 1 to 10 parts by weight of an epoxy resin photoinitiator; and(c) 1 to 10 parts by weight of an aromatic polyazide compound.

Abstract: A presensitized color proofing sheet and method of obtaining an image on a paper substrate is disclosed herein. The color proofing sheet is comprised of a color layer, an optional barrier layer, both being light sensitive, and non-light sensitive solvent resistant adhesive layer with the barrier layer being present to provide a means of eliminating residual toning between adjacent layers in the structure.

Abstract: A camera speed lithographic plate precursor composition is used for the preparation of waterless, imaged printing plates. The plates comprise a solid substrate with a first layer of a photopolymerizable, oleophilic coating; a second layer of silicone rubber; a third protective film layer; and a top or fourth layer comprising a silver halide emulsion containing polymeric binders or keying agents.

Abstract: A multi-color heat-sensitive recording material is disclosed which comprises a support having laminated thereon in the following order a first heat-sensitive color forming layer comprising mainly an electron donating dye precursor and an electron accepting compound, a second heat-sensitive color forming layer containing a diazonium salt compound having a maximum absorption wavelength of 360.+-.20 nm and a coupler capable of reacting with the diazonium salt compound by heating to form color and a third heat-sensitive color forming layer containing a diazonium salt compound represented by formula (I) having a maximum absorption wavelength of 400.+-.20 nm and a coupler represented by formula (II) capable of reacting with the diazonium salt compound by heating to form color: ##STR1## wherein R.sub.1 and R.sub.2 each represents an alkyl group, an aralkyl group or an aryl group; Y represents a halogen atom, an acyl group, an alkoxycarbonyl group or a sulfamoyl group; and X.sub.1.sup.

Abstract: A photosensitive mask laminate having a photoimageable, pressure sensitive adhesive layer and a photoimageable masking layer is disclosed. The laminate also includes a support layer, and it can include a removable carrier layer and a release layer. The laminate can be imaged by selective exposure to light or other radiation, and developing the laminate produces a mask having void and mask areas. The mask can then be used to protect selected portions of a target surface during a sandblast decorative process.

Abstract: A 2-diazo-1,2-quinone compound having a substituent group containing an alkyl group which is substituted by at least one fluorine atom is described. This compound has a capacity to change its polarity when exposed to light. The invention also provides an image forming material in which the invention compound is added to at least one of laminated layers. When these laminated layers are exposed to light, the adhesiveness of the compound-containing layer to its adjoining layer is reduced effectively due to the polarity-changing ability of the compound, thus making the easy delamination of the layers possible. This compound is applicable to many instances in which image receiving sheets are used, such as the formation of a multi-color image by a transfer method (a color proof, for example) and the preparation of a printing plate of the delamination development type.

Abstract: In accordance with a proposed resist pattern forming method, contact angles between the surface of a resist and a rinse is adjusted within a predetermined range, a volatil surfactant which does not remain by drying is mixed in the rinse so as to reduce a surface tension, the rinse is dried under a critical condition of the rinse in order not to cause the surface tension to exert. The occurrence of an attractive force between the resist patterns may be thereby weakened or nullified, so that falling of the patterns can be effectively prevented which very often happened at forming fine resist patterns or resist patterns of high aspect. On the other hand, depending upon structure of said resist pattern, it is possible to effectively prevent outermost main patterns of gathering resist patterns from falling down. By providing such effects, yieldings of products are increased. Further, the present invention may be also applied to a lithography illumination sources of which are light, electron, X-ray, ion beam, etc.

Abstract: Improved lithographic printing plates are comprised of an aluminum support, a hydrophilic barrier layer comprised of a copolymer of about 40 to about 90 mole percent vinylphosphonic acid and about 10 to about 60 mole percent acrylamide overlying said support, and an image-forming layer capable of providing a lithographic printing surface overlying said barrier layer.

Abstract: A lithographic patterning process which produces a lift-off structure uses two separate layers, the bottom being deep ultraviolet patternable and the top being patternable at an appropriate wavelength other than deep ultraviolet and having low optical transmission properties at the wavelength used in a deep ultraviolet exposure step and characterized by decreased solubility and/or increased crosslink density after such deep ultraviolet exposure.

Abstract: A lithographic printing plate precursor and process for its utilization have been discovered through which negative and positive original images can be printably reproduced on the plate precursor in substantially fewer development steps. The precursor plate is exposed sequentially to either the negative or positive original with the resultant image subsequently developable in a single process or step. The process is achieved by using a precursor plate having two coatings of significantly different photographic sensitivity to light, i.e., speed as characterized by "camera speed" or "contact speed" and imagewise exposing the originals in sequence to alternative speeds. The contact speed coating may be negative-working or positive working while the camera speed coating is negative-working. The camera speed coating is developed followed by exposure of the contact speed coating. Images produced at camera speed are removed and non-image bearing portions of the contact speed coating are removed.