Abstract: In accordance with a proposed resist pattern forming method, contact angles between the surface of a resist and a rinse is adjusted within a predetermined range, a volatil surfactant which does not remain by drying is mixed in the rinse so as to reduce a surface tension, the rinse is dried under a critical condition of the rinse in order not to cause the surface tension to exert. The occurrence of an attractive force between the resist patterns may be thereby weakened or nullified, so that falling of the patterns can be effectively prevented which very often happened at forming fine resist patterns or resist patterns of high aspect. On the other hand, depending upon structure of said resist pattern, it is possible to effectively prevent outermost main patterns of gathering resist patterns from falling down. By providing such effects, yielding of products are increased. Further, the present invention may be also applied to a lithography illumination sources of which are light, electron, X-ray, ion beam, etc.

Abstract: The present invention relates to a method of forming a pattern using a photosensitive film having bleaching properties for use as a contrast enhancing layer. The photosensitive film comprises an aromatic diazonium salt having extremely high purity content. In addition, no harmful metals are incorporated during preparation. Fine patterns of various semiconductor devices can thus be formed with high accuracy. The diazonium salt is selected from the group consisting of trifluromethanesulfonic acid salt, methanesulfonic acid salts, and trifluromethaneacetic salts of aromatic diazonium compounds.

Abstract: Disclosed is a pattern forming contrast enhanced material comprising (a) a water soluble photosensitive compound selected from the group consisting of a water soluble aliphatic photosensitive compound (excluding ring compounds) having one or more of the group expressed by the formula (I), an aliphatic photosensitive quaternary ammonium salt having one or more of the group expressed by the formula (I), an aromatic photosensitive quaternary ammonium salt having one or more of the group expressed by the formula (I), and a photosensitive pyridinium salt having one or more of the group expressed by the formula (I), (b) a water soluble resin and (c) water and a pattern forming method using the same. ##STR1## According to the present invention, this material is used as a contrast enhanced layer in the exposure effected by deep ultraviolet ray such as an excimer laser beam to form a good fine pattern of a submicron order.

Abstract: Photosensitive compositions, useful in lithographic printing plates which can be developed with aqueous developing solutions, comprise a diazo resin and a binary acetal polymer which functions as a polymeric binder. The binary acetal polymers are comprised of recurring units which include two six-membered cyclic acetal groups, one of which is unsubstituted or substituted with an alkyl or hydroxyalkyl group and the other of which is substituted with an aromatic or heterocyclic moiety.

Abstract: Metallic appearing images may be produced with a color proofing sheet which comprises a temporary carrier layer, a metallic appearance pigment-filled layer, a color pigment filled layer, a photoresist layer, and an optional adhesive layer. There may be a barrier layer between the optional adhesive and the resist layer and a release layer coating may be on the temporary carrier layer.

Abstract: A dry PS plate comprises a substrate having provided thereon in order a primer layer, a light-sensitive layer and a silicone rubber layer wherein the primer layer comprises a film forming polyurethane resin and a diazonium salt polycondensate. The dry PS plate is excellent in the adhesion strength between the substrate and the light-sensitive layer. The adhesion is surely maintained even after imagewise exposure to light and the subsequent development. The dry PS plate shows excellent image reproduction and the resulting dry lithographic plate is excellent in printing durability as well as resistance to scratch.

Abstract: A PMGI bilayer resist for integrated circuit fabrication having increased sensitivity to light and formed by the addition of cyclic anhydrides to the resist and the formation of an accompanying bilayer resist structure of a portable conforming mask having a desirable undercut profile for lift-off of patterned metallic circuitry.

Abstract: Disclosed is a light-sensitive litho printing plate comprising:a support, a light-sensitive layer and a silicone rubber layer provided thereon,wherein said light-sensitive layer contains a substance,whereby said substance forms a color during developing or after developing.

Abstract: Photosensitive compositions, useful in lithographic printing plates which can be developed with aqueous developing solutions, comprise a diazo resin and an acid-substituted ternary acetal polymer which functions as a polymeric binder. The acid-substituted ternary acetal polymers are comprised of recurring units which include three six-membered cyclic acetal groups, one of which is unsubstituted or substituted with an alkyl or hydroxyalkyl group, another of which is substituted with an aromatic or heterocyclic moiety, and a third of which is substituted with an acid group, an acid-substituted alkyl group or an acid-substituted aryl group.

Abstract: Spin castable mixtures are provided which are useful for applying onto photoresist surfaces to produce a contrast enhancement layer employing .alpha.-alkyl-N-alkyl nitrones in combination with an inert organic binder and solvent. The .alpha.-alkyl-N-alkyl nitrones can be used with 200-300 nanometers UV light.

Abstract: The disclosed photoresist process employs an i-line peak containing light source, such as that of the mercury spectrum, in conjunction with a dye capable of both absorbing i-line light and withstanding subsequent those baking procedures employed in producing portable-conforming-mask (PCM) photoetchings. Applicant has found that a series of butadiene or bromine substituted butadiene dyes in general, and N,N'-Dibutyl-N,N'-Di (1-(4,4-dicyano-1,3-butadiene))-1,6-hexanediamine, in particular, are particularly well suited to these purposes. Such dyes are most preferably used in conjunction with a second dye capable of absorbing of a non-i-line light source used to expose a bottom photoresist layer of a PCM system.

Abstract: Disclosed is a light-sensitive lithographic printing plate which comprises an aluminum or aluminum alloy support having been pretreated and a light-sensitive layer provided thereon, wherein the surface of the support adjacent to the light-sensitive layer is treated by use of an aqueous solution containing at least one selected from the group consisting of nitric acid, nitrate, nitrous acid and nitrite. According to this invention, lithographic printing plates which are free from stain due to residual light-sensitive layer, excellent in developability, good in water retention at image area and excellent in press life, can be obtained.

Abstract: The image of an object with opaque and transparent regions having a contrast less than the contrast threshold of a layer of photoresist when light of a predetermined wavelength to which the photoresist is sensitive is passed through the object and onto the layer of photoresist is enhanced in contrast by the provision of a contrast enhancing layer contiguous to the surface of the photoresist to a value above the contrast threshold of the photoresist. The contrast enhancing layer is constituted of an aryl nitrone compound mixed with a suitable binder.

Abstract: Contrast enhancement compositions are provided which can be used to make contrast enhancement layer photoresist composites. The composites can be used to make patterned photoresists under mid-UV light and utilize photobleachable alkylnitrones.

Abstract: The invention relates to a photosensitive composition for direct dry negative color printing composition. The photosensitive composition comprises a binder containing a plurality of grains of a semiconductor material, each grain having adsorbed on its surface one of three different complexes of spiropyran with a metal salt, each complex being sensitive to a different wavelength of light, a cross-linkable polymer and free radical initiator. The composition and process enables photofinishing or printing from a negative.

Abstract: An optical recording material comprising (I) a substrate, (II) a recording layer provided on said substrate, the recording layer consisting of light transmissive portions and light screening portions, and (III) a reflective metallic thin film layer provided on the recording layer; as well as a process therefor. The invention also includes an optical card comprising the optical recording material provided on a card substrate. In the cases of the optical recording material and the optical card, it is possible to readily carry out high density recording, the alternation of written informaton is difficult, and the written information can be read out on a basis of the difference in light reflectivity.

Abstract: In the disclosed process for forming a fine pattern in a semiconductor device, an upperlayer polymeric film so photosensitive to ultraviolet light as to be opague to deep ultraviolet light upon exposure to ultraviolet light is formed on an underlayer resist photosensitive to deep ultraviolet light, provided on an underlaying layer, optionally with an interlayer formed as a barrier or isolation layer therebetween. After the upperlayer polymeric film is exposed through a mask to ultraviolet light to form therein areas opague to deep ultraviolet light with the other areas remaining transparent to deep ultraviolet light, the upperlayer polymeric film serves as a mask for the underlayer resist in subsequent blanket exposure to deep ultraviolet light. After removal of the upperlayer polymeric film and the interlayer if any, the underlayer resist is developed to form a pattern.

Abstract: A presensitized printing plate for waterless lithographic printing is described which is composed of a substrate, a printing ink-repellent crosslinked silicone elastomer coating situated thereon, an intermediate coating of amorphous silicic acid or of an exposed coating of a photosensitive organic halogen compound and a radiation-sensitive coating. The intermediate coating effects a better adhesion of the photosensitive coating to the silicone coating and, consequently, a better resistance to developer and better print run of the plate.

Abstract: A radiation sensitive plate is provided with a discontinuous covering layer to improve vacuum drawdown. The covering layer is produced by dissolving the material which is to form the covering layer in a solvent so as to form a solution having a conductivity of from 10.sup.3 to 10.sup.9 pSm.sup.-1. The solution is then directed towards the plate while providing a potential of at least 5 kV between the solution and the plate. The potential is the sole disruptive force in the liquid and draws the liquid into ligaments and disrupts the ligaments to form drops of substantially equal size which are then deposited on the plate.

Abstract: A light-sensitive transfer material is disclosed, comprising a substantially transparent support having provided on one side thereof, in order from the support, a stripping layer, and a lamination of a colorant layer containing a dye or a pigment and a photoresist layer or a photoresist layer containing a dye or a pigment, and having provided on the other side thereof a physical development nuclei-containing layer adapted for diffusion transfer processing using a silver halide emulsion.

Abstract: A multicolor image-forming method which comprises image-exposing a light-sensitive heat-sensitive recording material having a diazo compound and a coupling component on a support using a positive image followed by developing to form a color image, image-exposing a light-solubilizing color image-forming material having a coloring material on a substantially transparent support using a positive image followed by developing to form a color image, and superposing the light-solubilizing color image-forming material having the color image on the light-sensitive heat-sensitive recording material having the color image or, further, heat-pressing the light-solubilizing color image-forming material having the color image superposed on the light-sensitive heat-sensitive recording material having the color image.

Abstract: A multicolor recording material having on one side of a support at least two layers capable of producing colors different from each other in hue through respective color-producing reactions, which further has an interlayer constituted by a water-soluble polyanionic polymer having gelled through the interaction with a polycation between every adjacent two of said color-producing layers to prevent migration of ingredients from one color-producing layer to another.

Abstract: The present invention is concerned with a printing plate of which image formation is done by photoirradiation, having a front side covered waith a peelable or removable protective layer which contains a photofading material. The printing plate is safe against fogging to light and can be used under ordinary illumination.

Abstract: A photosensitive recording material with a layer base and a photosensitive layer, which essentially contains a diazonium salt polycondensation product, a polymeric binder which is insoluble in water and soluble in organic solvents and soluble or at least swellable in aqueous alkaline solutions, a polymerization initiator which forms free radicals when exposed to actinic radiation and a polymerizable ethylenically unsaturated compound containing at least one unsaturated group and having a boiling point at normal pressure of over 100.degree. C., wherein the recording material contains, between the photosensitive layer and the layer base, a photosensitive intermediate layer which essentially contains a diazonium salt polycondensation product and a polymeric binder which is insoluble in water and soluble in organic solvents and soluble or at least swellable in aqueous alkaline solutions.

Abstract: A multicolor heat-sensitive recording material which comprises a transparent support having two or more of color-producing unit layers differing in hue of the produced color in such a situation that at least one unit layer is provided on each side of the support, wherein at least one color-producing unit layer is essentially transparent, namely, Haze % of said transparent layer is less than 40% and a multicolor heat-sensitive recording material further provided a transparent protective layer on the outermost color producing unit layer are disclosed.

Abstract: Coated material containing in successive order(a) a substrate,(b) a photostructurable negative-working thermostable adhesive and(c) a self-supporting photocrosslinkable polyimide film.This arrangement can be used for producing relief images by means of photolithhographic processes.

Abstract: The present invention relates to increasing the autodecomposition temperature of particular resists. The resists are comprised of structures having recurrent acid labile groups which are typically pendant to the polymeric backbone. The autodecomposition temperature of a resist is increased by selecting substituent sidechains on the acid labile group which exhibit increased stability. Sidechain structures which provide increased autodecomposition stability include secondary structures capable of forming secondary carbonium ion intermediates and having an available proton adjacent to the carbonium ion formed during cleavage. Moieties which can be used as the secondary sidechain structures include secondary alkyl, including both cyclic and alicyclic alkyl, substituted deactivated secondary benzyl, and 1-(deactivated heterocyclic) secondary alkyl.

Abstract: Well-defined metal lines of 0.5 micrometers and less in width are produced on a substrate by photolithography, using a two layer photoresist process. The first resist layer, adjacent the substrate, is poly(methylmethacrylate) from about 0.5 to about 1 micrometer thick, having a sufficient amount of an ultraviolet absorbing dye to prevent positive interference of light reflected from the surface of the substrate during exposure. The second resist layer is a polymer of naphthoquinone diazide, in a thickness of about 0.5 to about 1.1 micrometers. To achieve 0.5 micrometer resolution of the metal line, the total thickness of the two resist layers is about 1.5 micrometers; to achieve less than 0.5 micrometer resolution, the total thickness of the two resist layers is about 1.0 micrometer.

Abstract: An image is provided by depositing a first layer of a photoresist containing a phenolic-formaldehyde novolak type polymer and an imidazole, benzimidazole, triazole, or indazoles to increase the solubility of the layer in aqueous alkaline developer after exposure to imaging radiation; depositing on the first layer a second layer of a photoresist containing a phenolic-formaldehyde novolak type polymer; the second layer having a lower degree of solubility in aqueous alkaline developer after exposure to imaging radiation; exposing the layers to imaging radiation; and developing the layers.

Abstract: A method for preparing a lithographic printing plate and a light-sensitive material for a lithographic printing plate are disclosed. The method comprises providing a light-sensitive material comprising an electroconductive support having a hydrophilic surface. Provided on the surface is a light-sensitive layer which contains an electroconductive agent as well as a photoconductive insulating layer. The material is imagewise exposed and then electrophotographically processed to form an electrostatic latent image on the photoconductive insulating layer. The exposed material is developed with developer particles which are opaque to the light which the light-sensitive layer is sensitive. The light-sensitive layer of the developed material is exposed through the image. The exposed or unexposed areas of the light-sensitive layer are then removed together with the photoconductive insulating layer. The lithographic printing plate produced has excellent resolving power and does not cause printing stains.

Abstract: A process for forming a photoresist pattern comprises the steps of forming a photoresist layer on an underlying layer, forming a contrast enhancement layer for enhancing the contrast of light entering the photoresist layer on the photoresist layer, selectively exposing the photoresist layer through the contrast enhancement layer to light, and developing the photoresist layer to form a photoresist pattern. The contrast enhancement layer is formed as a layer containing a photobleachable agent and a material soluble in both of a nonpolar organic solvent and an aqueous alkali solution. The material is selected from the group of abietic acid, a derivative thereof, a rosin containing abietic acid as the main component, and a derivative thereof. The contrast enhancement layer is treated and removed simultaneously with development for the photoresist. The stability of a coating solution for the contrast enhancement layer is remarkably high.

Abstract: Photopolymeric printing plates wherein an electrochemically etched, anodized and silicated aluminum plate has a plurality of coatings applied thereon and wherein at least one of the coatings include a solvent soluble diazo therein.

Abstract: A laminate, adapted for manufacturing frames of metal beam leads that are bonded to integrated circuit chips, comprises(a) a flexible metal strip,(b) a layer of a first resist adhered to one surface of the metal strip, and(c) a layer of a second resist adhered to the opposite surface of the metal strip, wherein said second resist is a positive-working resist having a polysulfonamide binder whereby improved mechanical properties including flexibility and adhesion to the metal are obtained.

Abstract: The present application describes a photoresist material which contains organo-silicon groups and the photoresist material is suitable for forming a micropattern applied in the fabrication of semiconductor integrated circuit and magnetic bubble memory elements. The photoresist material possesses high resistance to plasma etching using oxygen gas.

Abstract: A process for forming a multi-level positive working photosensitive element. One forms a composition containing an alkali soluble resin, an o-quinonediazide compound and an in-situ generated acid catalyzed crosslinker in a solvent mixture. After coating on a substrate, drying and partially cross-linking the first layer, a second positive working light sensitive layer is applied. Each light sensitive layer is activated by u.v. radiation in different parts of the spectrum. The top layer is imagewise exposed and developed to form a mask. The second layer is flood exposed through this mask and developed. Each development is conducted with an aqueous alkaline solution.

Abstract: A method of manufacturing an optical master disk, matrix derived from the master disk and synthetic resin information disk derived from the matrix.A method of manufacturing an optical master disk in which a supporting plate is provided on one side with at least two layers of a photosensitive material in which, taken from the supporting plate, the photosensitivity of the material of the layers increases and/or in which a light-absorbing separation layer is used between the layers, as well as a metal matrix derived from the master disk and an optically readable information disk of synthetic resin derived from the matrix.

Abstract: A printing plate formed of a substrate and laminated thereon in the following order a primer layer and a photosensitive layer containing a quinonediazide compound and a silicone rubber layer, wherein the primer layer contains 0.1 to 25% by weight of a quinonediazide group. The printing plate of the present invention is excellent in dot reproduction, hardly causes cracking in the photosensitive layer, and has a wide latitutde in production.

Abstract: Disclosed is a radiation-sensitive recording material comprising a support, a radiation-sensitive recording layer and a rough covering layer which is applied by spraying and drying a solution which has substantially the same composition as the recording layer. Due to its rough surface, the material provides for accelerated vacuum contact in the copying process. Also disclosed is a process for producing the radiation-sensitive recording material described above.

Abstract: A radiation-sensitive recording material comprising a support and first and second radiation-sensitive layers is disclosed. The first radiation-sensitive layer comprises a 1,2-quinone diazide as the radiation-sensitive compound and the second radiation-sensitive layer comprises (a) a compound which forms a strong acid under the action of actinic radiation, (b) a compound which has at least one acid-cleavable C-O-C bond and (c) a polymeric binder. The recording material has an improved storage stability as compared with materials which comprise only radiation-sensitive layers based on acid-cleavable compounds.

Abstract: A photosensitive article which comprises a substrate, a first light sensitive layer on the substrate, a polysulfone layer and a second light sensitive layer. The first light sensitive layer preferably comprises a depolymerizable polymethyl methacrylate polymer and the second light sensitive layer preferably comprises on o-quinone diazide in admixture with a water insoluble, aqueous alkaline soluble binder resin.

Abstract: The subject invention involves reduction of light reflection into a photoresist coating over a reflective substrate by the use of a photoactive compound in a photoresist formulation that is the reaction product of a diazooxide and curcumin.

Abstract: An optical recording material comprising (I) a substrate, (II) a recording layer provided on said substrate, the recording layer consisting of light transmissive portions and light screening portions, and (III) a reflective metallic thin film layer provided on the recording layer; as well as a process therefor. The invention also includes an optical card comprising the optical recording material provided on a card substrate. In the cases of the optical recording material and the optical card, it is possible to readily carry out high density recording, the alternation of written information is difficult, and the written information can be read out on a basis of the difference in light reflectivity.

Abstract: An effective bi-layer photoresist structure comprising a bottom planarization layer or PMGI and a top photoresist imaging layer which eliminates an intermixing layer between the top photoresist imaging layer and the bottom planarization layer, and provides a desired undercut profile between the two layers to insure efficient lift-off for gate fabrication, said undercut profile formed due to the solubility effect of a solvent soak on the two layers.

Abstract: The disclosed light-sensitive recording material is composed of an electrically conductive support, suitable for the production of printing forms or printed circuits, an a photoconductive layer system containing a photoconductor, a binder, a sensitizing dye and conventional additives. The photoconductive system comprises (A) a single photoconductive layer, or multiple layers, applied to the support and (B) a light-sensitive covering layer which contains at least one photochemically reactive compound. The use of the recording material in a process for the production of printing forms and printed circuits is also disclosed.

Abstract: The invention is for a developer for a bilayer photoresist film comprising a first relatively thick layer of a polyglutarimide and a second relatively thin layer of a diazo sensitized novolak resin. The developer is an aqueous solution of a tetra alkyl ammonium hydroxide where at least two of the alkyl groups have two or more carbon atoms. The developer of the invention permits development of the bottom resist layer without erosion of the top resist layer.

Abstract: Coated material containing in successive order(a) a substrate,(b) a photostructurable negative-working thermostable adhesive and(c) a self-supporting photocrosslinkable polyimide film. This arrangement can be used for producing relief images by means of photolithographic processes.

Abstract: A multi-color image forming material which is in the form of multiple layers on a support, and having, at least two photosensitive layers, the farthest layer from the support being the uppermost photosensitive layer, the photosensitive layers being formed from a water-soluble resin having photocrosslinking ability with diazo resin, a photosensitive water-soluble, organic solvent insoluble diazo resin, and a water dispersible coloring agent which can produce a color tone, each photosensitive layer having a coloring agent which can produce a different color tone; and at least one intermediate layer, each intermediate layer being positioned between each photosensitive layer and the next adjacent photosensitive layer, the intermediate layer being formed from a hydrophobic, water-resistant, organic solvent softenable resin.

Abstract: This invention relates to a composition and method for enhancing the contrast of images of an underlying photolithographic layer. A photographic element, including a photoresist layer, is applied to a substrate. The photoresist layer contains a contrast-enhancing layer including at least one light-sensitive compound capable of producing acidic photoproducts upon exposure to actinic radiation, at least one indicator dye that changes color on exposure to acidic conditions and at least one polymeric binder soluble in water or weakly alkaline aqueous solutions. The photographic element is exposed to active radiation sufficient to cause photobleaching of the contrast enhancement layer and exposure of the photoresist layer. The photographic element is exposed to actinic radiation sufficient to cause photobleaching of the contrast enhancement layer and exposure of the photoresist layer.

Abstract: A dry transfer film and a method for preparing transfer characters therefrom in which the transfer film includes a carrier layer, a photosensitized color carrying layer disposed adjacent to the carrier layer and a photosensitized adhesive layer disposed adjacent to the color carrying layer. Both the color carrying and adhesive layers are photosensitive to certain respective wavelengths of the electromagnetic spectrum so that when exposed to such wavelengths, they become soluble in a respective solvent or solvents. The unexposed portions of these layers remain insoluble in such solvents.

Abstract: This invention relates to a composition of a water-soluble photopolymer which is synthesized from a water-soluble organic matter, which matter is a base polymer produced and refined particularly by bacterial culture biotechnically and contains at least one of polysaccharides, protein, gelatin, casein, polyvinyl pyrrolidone and polyvinyl alcohol, in particular pullulan which is a natural polysaccharide, and chemicals to add functions to aqueous solution of the base polymer, for example, water-soluble radiation sensitive chemical, crosslinking agent, catalyst, epoxy compound, and a compound possessing bleaching or fading action with respect to radiation.The water-soluble photopolymer can be developed in water, and is high in safety and small in aging, and is expected to be used as the material of single-layer resist or multi-layer resist of high resolution and high resistance, or as the material for contrast enhanced litography.