Abstract: A method for producing a fiber having a pattern on a surface thereof. The fiber is produced by a method including forming a photosensitive composition layer on a template layer having a pattern, bonding a film including an adhesive layer on a principal plane onto the photosensitive composition layer, linearly exposing the photosensitive composition layer to light, separating an exposed laminate comprising the photosensitive composition layer, the adhesive layer, and the film from the template layer, and developing the photosensitive composition layer in the separated laminate.

Abstract: Embodiments of the present invention disclose a method for producing a masterboard alignment film, and a transfer printing plate and an alignment solution. The method comprises coating the alignment solution on a masterboard having two or more substrates using the transfer printing plate which has a transfer region simultaneously covering the two or more substrates, so that the alignment solution forms an alignment film on the masterboard; and removing the alignment film on the masterboard which is located in regions that are out of the display regions of the substrates and where there is no need to retain the alignment film. This method can solve the existing display defect issues that are caused by too thick peripheral regions of the alignment film, and the overlapping of the too thick peripheral regions of the alignment film with the sealant region.

Abstract: The present invention relates to an adhesive composition for a wafer processing film, a wafer processing film, and a semiconductor wafer processing method. In the semiconductor wafer processing process such as a dicing process or a back grinding process, a delaminating force with respect to a wafer to be attached may be effectively reduced to improve process efficiency and prevent the wafer from being warped or cracked.

Abstract: An exposure apparatus includes a stage 10 for holding a substrate 8 to be exposed; a direct writing mask 6 arranged above the substrate 8 to be exposed held by the stage 10; a repeated opening pattern in which a plurality of openings each having approximately the same size are arranged in a line at approximately the same interval, provided to the mask; an irradiation mechanism for irradiating with a linear laser beam 1c along the repeated opening pattern; and a movement mechanism for moving a relative position of a laser beam which is formed in such a way that the linear laser beam formed by the laser processing mechanism passes through the plurality of openings of the opening pattern and the substrate held by the stage.

Abstract: A positive-type photosensitive resin composition includes (A) a polyamide resin that includes a structural unit shown by the following formula (1) and a structural unit shown by the following formula (2), and (B) a photosensitive compound, the polyamide resin (A) having a weight average molecular weight (Mw) of 5000 to 80,000, and a cured film obtained by curing the positive-type photosensitive resin composition at 250° C. having a tensile modulus of elasticity of 2.0 to 4.0 GPa and a tensile elongation of 10 to 100%. According to the present invention, a positive-type photosensitive resin composition that can be cured at a low temperature and a highly reliable semiconductor device including a cured film of the positive-type photosensitive resin composition can be provided.

Abstract: A photocrosslinkable composition has polyorganosiloxane P having a viscosity of at least 10 000 mPa·s at 25° C., wherein the polyorganosiloxane P has an acrylated silicone oil as a crosslinking agent, and a photoinitiator, the chemical structure of which comprises a diaryl ketone group.

Abstract: Methods of forming an integrated circuit device may include forming a resist pattern on a layer of an integrated circuit device with portions of the layer being exposed through openings of the resist pattern. An organic-inorganic hybrid siloxane network film may be formed on the resist pattern. Portions of the layer exposed through the resist pattern and the organic-inorganic hybrid siloxane network film may then be removed. Related structures are also discussed.

Abstract: A positive type photoresist resin film includes a support film and a thermosetting positive type photoresist resin layer laminated over the support film. The positive type photoresist resin layer contains alkali soluble resin, a diazide based photosensitive compound and a sensitivity enhancer. The support film has a surface roughness that inhibits the formation of defect structures such as fish eye. The invention overcomes process inefficiencies and defects cause by spin coating photoresist technologies.

Abstract: A positive type photoresist resin film contains a support film and a positive photoresist resin layer laminated over the support film. The peak height (Rp) of the support film is less than about 300 nm to eliminate fish eye defects. The positive photoresist resin layer may contain alkali soluble resin, a diazide based photosensitive compound, a plasticizer and, optionally, a sensitivity enhancer and a releasing agent.

Abstract: Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibiting high resolution, residue free lithography and methods of preparing these materials.

Abstract: Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibiting high resolution, residue free lithography and methods of preparing these materials.

Abstract: Disclosed are multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibiting high resolution, residue free lithography and methods of preparing these materials.

Abstract: A heat-sensitive lithographic printing plate precursor is disclosed which comprises a hydrophilic support and an oleophilic coating thereon which comprises an infrared light-to-heat converter, an alkali-soluble binder and a polymeric developer accelerator. The polymeric developer accelerator is preferably a phenolic formaldehyde resin comprising at least 70 mol % of meta-cresol as recurring unit or at least 40 mol % of monohydroxy benzene cresol as recurring unit. The PDA may also be a phenolic resin which comprises at least 5 mol % of a recurring monomeric unit having at least one phenolic hydroxyl group and at least one alkali solubilising group. The polymeric developer accelerator improves the sensitivity while maintaining a good under-exposure latitude and a good developer resistance of the printing plate.

Abstract: A method of forming a pattern, which comprises forming a masking material layer on a surface of a working film by coating the surface with a solution of a mixture comprising an inorganic compound having a bond between an inorganic element and oxygen atom, and a volatile unit, volatilizing the volatile unit to thereby make the masking material layer porous, forming a resist layer on a surface of the masking material layer, patterning the resist film to form a resist pattern, dry-etching the masking material layer to thereby transfer the resist pattern to the masking material layer, thereby forming a masking material pattern, and dry etching the working film to thereby transfer the masking material pattern to the working film to thereby form a working film pattern.

Abstract: A heat-sensitive lithographic printing plate precursor is disclosed which comprises a hydrophilic support and an oleophilic coating comprising an infrared absorbing agent and a polymer, which comprises a phenolic monomeric unit wherein the phenyl group of the phenolic monomeric unit is substituted by a group having the structure —N?N-Q wherein the —N?N— group is covalently bound to a carbon atom of the phenyl group and wherein Q is an aromatic group and wherein the substitution increases the chemical resistance of the coating.

Abstract: The present invention relates to a composition useful for the treatment of leishmaniasis said composition comprising pharmaceutically effective amount of methyl-beta-cyclodextrin, optionally along with other anti-leishmanial agent(s) and/or pharmaceutically acceptable additives, and a method thereof, wherein the said method reduces the cholesterol levels of the plasma membrane of the infected host cells by about 50%.

Abstract: A method for forming a pattern of carbon nanotubes includes forming a pattern on a surface-treated substrate using a photolithographic process, and laminating carbon nanotubes thereon using a chemical self-assembly process so as to form the carbon nanotubes in a monolayer or multilayer structure. A monolayer or multilayer carbon nanotube pattern may be easily formed on the substrate, e.g., glass, a silicon wafer and a plastic. Accordingly, the method can be applied to form patterned carbon nanotube layers having a high conductivity, and thus will be usefully utilized in the manufacturing processes of energy storages, for example, solar cells and batteries, flat panel displays, transistors, chemical and biological sensors, semiconductor devices and the like.

Abstract: The invention relates to a recording material for the production of offset printing plates, having a web- or plate-form support, a radiation-sensitive layer on the front of the support and a continuous, pigment particle-free layer on the back of the support. The back layer essentially consists of an organic polymeric material having a glass transition temperature Tg of at least 45° C., and its surface has a Bekk smoothness of from 5 to 800 s. It also relates to a process for the production of this recording material.

Abstract: A positive photoresist transfer material, wherein an alkali-soluble thermoplastic resin layer, an intermediate layer and a positive photoresist layer are successively applied on an adhesive surface of a temporary support, and adhesion between the positive photoresist layer and the intermediate layer is less than adhesion between other layers or surfaces.

Abstract: Multi-layer, positive working, thermally sensitive imageable elements, useful as lithographic printing plate precursors, are disclosed. The elements comprises a substrate, an underlayer over the substrate, and a top layer over the underlayer. The top layer comprises polymeric material, which is a solvent soluble novolac resin or a derivative thereof. The polymeric material is a (a) novolac that has a weight average molecular weight of at least 10,000, a derivative thereof functionalized with polar groups, or a derivative thereof functionalized with quadruple hydrogen bonding entities; (b) a solvent soluble m-cresol/p-cresol novolac resins that comprises at least 10 mol % p-cresol and has a weight average molecular weight of at least 8,000, a derivative thereof functionalized with polar groups, or a derivative thereof functionalized with quadruple hydrogen bonding entities; or (c) a mixture thereof. The imageable elements have increased scuff resistance and are thus less susceptible to damage during handling.

Abstract: Methods of manufacturing multi-layer thermally imageable elements useful as lithographic printing plate precursors are disclosed. The elements comprise a substrate, an underlayer, and an imageable layer. The imageable layer comprises a first polymeric material and o-diazonaphthoquinone containing material. After the underlayer has been coated over the substrate and the imageable layer has been coated over the underlayer, the element is heated to between about 130° C. and about 200° C. for a time sufficient to decrease the sensitivity of the imageable element to the white light.

Abstract: There is provided a positive photoresist for near-field exposure excellent in light utilization efficiency even with small layer thickness of the photoresist layer for image formation, and allowing for reduced pattern edge roughness, and a photolithography method including a step of exposing by the near-field exposure the photoresist layer for image formation made thereof. In a positive photoresist containing an alkali-soluble novolak resin and a quinone diazide compound, the film thickness of the photoresist at the time of exposure is not larger than 100 nm, and the absorption coefficient of the photoresist ? (?m?1) for the exposure light is such that 0.5???7.

Abstract: The present invention provides methods of forming and using thermally imageable composite elements which may be developed into lithographic printing plates. More specifically, the present invention provides a method of forming thermally imageable composite elements which provide substantial developer resistance in desired regions, while maintaining white light desensitivity and durability.

Abstract: A positive planographic printing plate precursor comprising a recording layer containing a water-insoluble and alkali-soluble resin, an infrared absorbent and an organic quaternary ammonium salt. A positive planographic printing plate precursor comprising at least two recording layers containing the resin and the infrared absorbent with a coating amount of an upper positive recording layer being in the range of 0.05 to 0.45 g/m2.

Abstract: A positive working, multi-layer thermally imageable element is disclosed. The element comprises a substrate, an underlayer, and a top layer. The top layer comprises a crosslinked polymeric material. The element may be thermally imaged and developed to form a lithographic printing plate.

Abstract: Processes for imaging and developing imageable elements useful as lithographic printing plate precursors either thermally or with ultraviolet radiation that use the same developer are disclosed. The imageable elements comprise a top layer and an underlayer. The top layer contains a phenolic polymer and a material that has either the o-benzoquinonediazide functionality or the o-diazonaphthoquinone functionality. The developer is a 20:80 to 80:20 mixture of (1) an aqueous alkaline developer that has a pH greater than 11 and contains about 2 wt % to about 8 wt % of an alkali metal silicate, and (2) a solvent based developer that contains about 0.5 wt % to about 15 wt % of an organic solvent or mixture of organic solvents.

Abstract: A process for forming a negative image useful as a printing plate is disclosed. A photosensitive assembly that comprises (a) a hydrophilic support, (b) a first layer that comprises a polymer that is soluble or dispersible in an aqueous alkaline solution, (c) a second layer that comprises at least one o-quinonediazide compound, and (d) an infrared absorbing compound is: (1) flood exposed with ultraviolet radiation; (2) imagewise exposed with infrared laser radiation; and (3) developed to produce the negative image.

Abstract: According to the present invention, there are provided an insulating film for an organic EL element, which has sufficiently low water permeability and a good sectional form and whose reactivity with a basic material and an electrode made from a metal having a low work function is suppressed, an insulating film for an organic EL element, which enables the formation of a through hole or U-shaped cavity therein and has excellent flattening performance, high transparency and high resistance to a resist stripper, and a radiation sensitive resin composition for forming the insulating film. An organic EL display element having this insulating film is free from an emission failure and has sufficiently long luminance half-life period and excellent reliability. The above composition comprises an alkali-soluble resin which may have an epoxy group and a 1,2-quinonediazide compound.

Abstract: Processes for imaging and developing imageable elements useful as lithographic printing plate precursors either thermally or with ultraviolet radiation that use the same developer are disclosed. The imageable elements comprise a top layer and an underlayer. The top layer contains a phenolic polymer and a material that has either the o-benzoquinonediazide functionality or the o-diazonaphthoquinone functionality. The developer is a 20:80 to 80:20 mixture of (1) an aqueous alkaline developer that has a pH greater than 11 and contains about 2 wt % to about 8 wt % of an alkali metal silicate, and (2) a solvent based developer that contains about 0.5 wt % to about 15 wt % of an organic solvent or mixture of organic solvents.

Abstract: A planographic printing plate precursor includes a support having disposed thereon a recording layer containing a water-insoluble and alkali-soluble resin, a development inhibitor and an infrared absorber and exhibiting enhanced solubility in an aqueous alkali solution through light exposure. The recording layer may have either a mono-layer construction or a multi-layer construction containing a lower layer and an upper layer. In the case of the multi-layer construction, a layer containing the water-insoluble and alkali-soluble resin is used as the lower layer, and a layer containing the water-insoluble and alkali-soluble resin and the development inhibitor and exhibiting enhanced solubility in an aqueous alkali solution through light exposure is used as the upper layer, and at least one of the lower layer and the upper layer contains the infrared absorber.

Abstract: Imageable elements useful in lithographic printing, and processes for their use, are disclosed. The elements comprise a hydrophilic substrate, an imageable layer over the substrate, and a thermally activated crosslinking agent. The imageable layer comprises a polymeric material that comprises one or more functional groups selected from the group consisting of carboxyl, carboxylic acid anhydride, phenolic hydroxyl, and sulphonamide. A preferred crosslinking group is the oxazoline group. The element is heated after exposure and development to crosslink a polymeric material.

Abstract: The present invention provides methods of forming and using thermally imageable composite elements which may be developed into lithographic printing plates. More specifically, the present invention provides a method of forming thermally imageable composite elements which provide substantial developer resistance in desired regions, while maintaining white light desensitivity and durability.

Abstract: The present invention relates to a photosensitive compound comprising a vinyl polymer compound which is insoluble in water and soluble in an aqueous alkaline solution and o-naphthoquinonediazide compound, wherein said vinyl polymer compound is a copolymer comprising at least one monomer unit derived from monomer compound (A): a compound having an alkaline-soluble group represented by general formula (I), (II) or (III) as defined in the specification, and at least one monomer unit derived from monomer compound (B): (meth)acrylate having poly(oxyalkylene) chain. A lithographic printing plate prepared from a presensitized plate having a photosensitive layer of said photosensitive compound of the present invention shows improvement of abrasion resistance, printing durability, chemical resistance, development latitude, and contamination property.

Abstract: The present invention includes an imageable element, which includes a sheet substrate, an imaging layer and a silicone layer, which comprises a crosslinked silicone polymer. The crosslinked silicone polymer is the curing product of a vinyl functional polysiloxane copolymer and a hydrosiloxane compound. The curing is catalyzed by a platinum carbonyl complex. Upon imagewise exposure and development, an imaged element is obtained, which is mounted on a dry printing press containing lithographic ink and used to produce printed stock.

Abstract: A method of processing imageable elements useful as alkaline-developable lithographic printing plate precursors that does not require either a rinsing step or a further gumming step is disclosed. The method comprises simultaneously developing and gumming the imaged element with an aqueous alkaline developing-gumming solution comprising one or more water-soluble polyhydroxy compounds of the following structure: R1(CHOH)nR2 in which n is 4 to 7; and either (i) R1 is hydrogen, aryl, or CH2OH; and R2 is hydrogen, alkyl group having 1 to 4 carbon atoms, CH2OR3 in which R3 is hydrogen or an alkyl group having 1 to 4 carbon atoms, CH2N(R4R5) in which R4 and R5 are each independently hydrogen or an alkyl group having 1 to 4 carbon atoms, or CO2H, or (ii) R1 and R2 together form a carbon—carbon single bond.

Abstract: A material for making an electroconductive pattern, the material comprising a support and a light-exposure differentiable element, characterized in that the light-exposure differentiable element comprises an outermost layer containing a polyanion and a polymer or copolymer of a substituted or unsubstituted thiophene, and optionally a second layer contiguous with the outermost layer; and wherein the outermost layer and/or the optional second layer contains a light-sensitive component capable upon exposure of changing the removability of the exposed parts of the outermost layer relative to the unexposed parts of the outermost layer; and a method of making an electroconductive pattern on a support using the material for making an electroconductive pattern.

Abstract: The invention provides a planographic printing plate precursor, utilizing a support member having a hydrophilic surface excellent in hydrophilicity and durability, providing effects of improving scumming in the printing operation and capable of forming large numbers of prints of high image quality even under severe printing conditions.

Abstract: Methods of manufacturing multi-layer thermally imageable elements useful as lithographic printing plate precursors are disclosed. The elements comprise a substrate, an underlayer, and an imageable layer. The imageable layer comprises a first polymeric material and o-diazonaphthoquinone containing material. After the underlayer has been coated over the substrate and the imageable layer has been coated over the underlayer, the element is heated to between about 130° C. and about 200° C. for a time sufficient to decrease the sensitivity of the imageable element to the white light.

Abstract: Multi-layer thermally imageable elements, useful as a lithographic printing plate precursors, are disclosed. The elements contain a top layer, an absorber layer that contains a photothermal conversion material and a hydrophilic substrate. An optional underlayer may also be present between the absorber layer and the hydrophilic substrate. The elements can be thermally imaged and processed with an aqueous alkaline developer.

Abstract: Imageable elements useful in lithographic printing, and processes for their use, are disclosed. The elements comprise a hydrophilic substrate, an imageable layer over the substrate, and a thermally activated crosslinking agent. The imageable layer comprises a polymeric material that comprises one or more functional groups selected from the group consisting of carboxyl, carboxylic acid anhydride, phenolic hydroxyl, and sulphonamide. A preferred crosslinking group is the oxazoline group. The element is heated after exposure and development to crosslink a polymeric material.

Abstract: Multi-layer thermally imageable elements, useful as a lithographic printing plate precursors, are disclosed. The elements contain a top layer, an absorber layer that contains a photothermal conversion material and a hydrophilic substrate. An optional underlayer may also be present between the absorber layer and the hydrophilic substrate. The elements can be thermally imaged and processed with an aqueous alkaline developer.

Abstract: Copolymers containing the units A, B, C, D and optionally E are used to prepare radiation sensitive compositions and lithographic printing plates.

Abstract: A positive photoresist transfer material, wherein an alkali-soluble thermoplastic resin layer, an intermediate layer and a positive photoresist layer are successively applied on an adhesive surface of a temporary support, and adhesion between the positive photoresist layer and the intermediate layer is less than adhesion between other layers or surfaces.

Abstract: Imagable precursors for masks and for electronic parts comprise a polymeric layer applied to a substrate. The layer comprises at least one polymer having infra-red absorbing groups carried as pendent groups on the polymer backbone. Certain infra-red absorbing groups may also act to insolubilize the polymer in a developer, until it is imagewise exposed to infra-red radiation. Imagewise application of heat, resulting from imagewise exposure of the precursor to infra-red radiation, renders the polymer layer more soluble in the developer than prior to exposure to the infra-red radiation.

Abstract: This invention relates to an imageable element that can be imaged and developed to produce a printing plate. The imageable element comprises a substrate and a radiation-sensitive imageable composition applied to the substrate. The imageable composition comprises (a) a first layer having (i) a photosensitive composition which undergoes a decrease in solubility in developer upon absorption of actinic radiation and (ii) an inhibitor, and (b) a second layer comprising an ink-repellent polymeric material. In one embodiment, the inhibitor is activated by heat or radiation of longer wavelength than actinic radiation. Upon activation, the inhibitor retards the solubility decrease of the photosensitive composition upon absorption of actinic radiation. In another embodiment, the inhibitor initially retards the solubility decrease of the photosensitive composition upon absorption of actinic radiation.

Abstract: A package of photosensitive planographic printing plates which comprises a stack of the photosensitive planographic printing plates between each of which a protection paper is interposed, wherein the coefficient of static friction between the surface of the photosensitive layer of the photosensitive planographic printing plate and the surface of the protection paper is 0.3 or more. In the package, slippage between the photosensitive planographic printing plate and the protection paper and abrasion of the photosensitive layer rarely occur through transport.

Abstract: Multilayer photoimageable elements, useful for forming lithographic printing members, are disclosed. The elements comprise a support, a top layer, and a chemical resistant underlayer. The underlayer is resistant to aggressive washes, such as a UV wash. In one embodiment, the underlayer comprises a copolymer of N-substituted maleimide, methacrylamide, and methacrylic acid. A process for preparing a lithographic printing member is also disclosed.

Abstract: A method of processing imageable elements useful as alkaline-developable lithographic printing plate precursors that does not require either a rinsing step or a further gumming step is disclosed.

Abstract: The present invention relates to a positiive-working presensitized plate useful for preparing a lithographic printing plate comprising a positive-working photosensitive composition comprising at least one ester of 1,2-naphthoquinone-2-diazide-5-sulfonic acid, at least one ester of 1,2-naphthoquinone-2-diazide-4-sulfonic acid, and at least one polymer which is insoluble in water and soluble in an aqueous alkaline solution and which comprises at least one group or bond selected from sulfonamide group, urea bond or urethane bond. A lithographic printing plate prepared from the presensitized plate of the present invention shows improvement of chemical-resistance and printing durability, and good sensitivity, coupling property, adaptability to ball-point pen, shelf stability, and stability of sensitivity with time after exposure.

Abstract: The invention relates to a process for forming bilayer resist images with a chemically-amplified, radiation-sensitive bilayer resist. The bilayer resist is disposed on a substrate and comprises (i) a top imaging layer comprising a radiation-sensitive acid generator and a vinyl polymer having an acid-cleavable silylethoxy group and (ii) an organic underlayer. The bilayer resist is used in the manufacture of integrated circuits.