Including Additional Layer Patents (Class 430/166)
  • Patent number: 6497996
    Abstract: As shown in FIG. 1A, a first resist film 2 comprising organic high molecules and a second resist film 3 comprising a photosensitive material are sequentially applied to a substrate 1 by the spin coat method or the spray method for forming a two-layer resist. Then, a mask 4 with which a metallic fine opening pattern 6 is formed on a mask substrate 5 comprising a dielectric, such as glass, is tightly contacted with the two-layer resist. Then, light is projected onto the back of the mask substrate to carry out exposure with near field light 7 which is effused from the opening portions of the mask 4 where no metal is formed. Then, a pattern is formed by processing the second resist layer 3 for development with a developing solution.
    Type: Grant
    Filed: May 1, 2000
    Date of Patent: December 24, 2002
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masayuki Naya, Shinji Sakaguchi
  • Publication number: 20020146630
    Abstract: Compositions and methods are disclosed for use in the analysis and quantitation of conjugated and unconjugated bilirubin in patient or other samples.
    Type: Application
    Filed: February 13, 2001
    Publication date: October 10, 2002
    Inventors: Alex Michael Seizew, Sean Michael Teel
  • Publication number: 20020146634
    Abstract: The present invention includes an imageable element, which includes a sheet substrate, an imaging layer and a silicone layer, which comprises a crosslinked silicone polymer. The crosslinked silicone polymer is the curing product of a vinyl functional polysiloxane copolymer and a hydrosiloxane compound. The curing is catalyzed by a platinum carbonyl complex. Upon imagewise exposure and development, an imaged element is obtained, which is mounted on a dry printing press containing lithographic ink and used to produce printed stock.
    Type: Application
    Filed: April 4, 2001
    Publication date: October 10, 2002
    Applicant: Kodak Polychrome Graphics, L.L.C
    Inventors: Suck-Ju Hong, S. Peter Pappas
  • Patent number: 6461784
    Abstract: The photosensitive printing plate of the present invention comprises a substrate, a photosensitive layer formed on the substrate, and mat particles formed on the photosensitive layer, wherein the mat particles contain a copolymer which contains at least one (meth)acrylamides as a unit. The method of producing the photosensitive printing plate of the present invention is a method which comprises the steps of forming a photosensitive layer on a substrate, and coating the photosensitive layer with a solution prepared by dissolving a copolymer containing at least one (meth)acrylamides as a unit in a solvent to form mat particles. The photosensitive printing plate of the present invention has excellent vacuum contact properties and resistance to friction and pressure and is free from tack on the surface when used, avoids problems in developing properties during long storage times, and is superior in terms of solubility in an exhausted developer.
    Type: Grant
    Filed: November 8, 2000
    Date of Patent: October 8, 2002
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Hirotaka Komine, Eiji Hayakawa
  • Publication number: 20020127489
    Abstract: The invention relates to a recording material for the production of offset printing plates, having a web- or plate-form support, a radiation-sensitive layer on the front of the support and a continuous, pigment particle-free layer on the back of the support. The back layer essentially consists of an organic polymeric material having a glass transition temperature Tg of at least 45° C., and its surface has a Bekk smoothness of from 5 to 800 s. It also relates to a process for the production of this recording material.
    Type: Application
    Filed: December 13, 2001
    Publication date: September 12, 2002
    Inventors: Steffen Denzinger, Michael Dorr, Gunther Hultzsch, Engelbert Pliefke
  • Patent number: 6444390
    Abstract: Under the conditions in that a germanium film 103 is formed on an amorphous silicon film 102, a first heat treatment (crystallization step) at from 450 to 600° C. is conducted. A second heat treatment is conducted for the resulting polysilicon film 104 at a temperature (from 800 to 1,050° C.) higher than the crystallization temperature. Through these steps, the boundary between the underlayer and silicon is fixed, to obtain a polysilicon film 105 containing substantially no defect in its crystal grain.
    Type: Grant
    Filed: February 17, 1999
    Date of Patent: September 3, 2002
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Hisashi Ohtani
  • Publication number: 20020106583
    Abstract: A base material for a lithographic printing plate comprising a support, a hydrophilic organic polymer compound that is chemically bonded to a surface of the support, and an ionic compound that is ionically bonded to the hydrophilic organic polymer compound; and a lithographic printing plate comprising the base material and an image forming layer provided thereon.
    Type: Application
    Filed: December 3, 2001
    Publication date: August 8, 2002
    Inventors: Koichi Kawamura, Miki Takahashi, Sumiaki Yamasaki, Tadahiro Sorori
  • Publication number: 20020068235
    Abstract: The present invention relates to a photosensitive compound comprising a vinyl polymer compound which is insoluble in water and soluble in an aqueous alkaline solution and o-naphthoquinonediazide compound, wherein said vinyl polymer compound is a copolymer comprising at least one monomer unit derived from monomer compound (A): a compound having an alkaline-soluble group represented by general formula (I), (II) or (III) as defined in the specification, and at least one monomer unit derived from monomer compound (B): (meth)acrylate having poly(oxyalkylene) chain. A lithographic printing plate prepared from a presensitized plate having a photosensitive layer of said photosensitive compound of the present invention shows improvement of abrasion resistance, printing durability, chemical resistance, development latitude, and contamination property.
    Type: Application
    Filed: October 5, 2001
    Publication date: June 6, 2002
    Inventors: Kazuo Fujita, Shiro Tan
  • Publication number: 20020022191
    Abstract: A material for making an electroconductive pattern, the material comprising a support and a light-exposure differentiable element, characterized in that the light-exposure differentiable element comprises an outermost layer containing a polyanion and a polymer or copolymer of a substituted or unsubstituted thiophene, and optionally a second layer contiguous with the outermost layer; and wherein the outermost layer and/or the optional second layer contains a light-sensitive component capable upon exposure of changing the removability of the exposed parts of the outermost layer relative to the unexposed parts of the outermost layer; and a method of making an electroconductive pattern on a support using the material for making an electroconductive pattern.
    Type: Application
    Filed: June 26, 2001
    Publication date: February 21, 2002
    Inventors: Johan Lamotte, Frank Louwet, Marc Van Damme, Joan Vermeersch
  • Publication number: 20020022192
    Abstract: A method of manufacturing an optical disc master from a glass substrate includes coating the substrate with a layer of photoresist, and applying an alkali-gel layer atop the photoresist. The coated substrate is then placed in an environment with a higher than normal humidity. The surface of the coated glass is selectively exposed to a beam of a writing laser, the exposure being controlled by digital information to be recorded on the disc. Exposed portions of the coated substrate experience a chemical reaction between the photoresist and the alkali material in the humid environment. Exposed portions are then developed and ablated thereby creating the pits and lands.
    Type: Application
    Filed: April 6, 2001
    Publication date: February 21, 2002
    Inventor: Edward W. Morton
  • Patent number: 6348294
    Abstract: A method of manufacturing an optical disc master from a glass substrate includes coating the substrate with a layer of photoresist, and applying an alkali-gel layer atop the photoresist. The coated substrate is then placed in an environment with a higher than normal humidity. The surface of the coated glass is selectively exposed to a beam of a writing laser, the exposure being controlled by digital information to be recorded on the disc. Exposed portions of the coated substrate experience a chemical reaction between the photoresist and the alkali material in the humid environment. Exposed portions are then developed and ablated thereby creating the pits and lands.
    Type: Grant
    Filed: April 6, 2001
    Date of Patent: February 19, 2002
    Assignees: Sony Corporation, Sony Electronics, Inc.
    Inventor: Edward W. Morton
  • Patent number: 6344884
    Abstract: A liquid crystal display according to the present invention uses an organic layer treated with H2 plasma before fabricating an inorganic layer on the top of the organic layer. When forming thin film transistors (TFT) used in the LCD, an Indium Tin Oxide layer is fabricated above the TFTs and acts as a pixel electrode. When the organic layer, such as a passivation layer, is treated with the H2 plasma, an intermediate layer having an O—H bonding structure is formed to enhance bonding or attachment of an inorganic layer, such as an ITO layer, to the organic layer.
    Type: Grant
    Filed: November 25, 1998
    Date of Patent: February 5, 2002
    Assignee: LG.Philips LCD Co., Ltd.
    Inventors: Woong-Kwon Kim, Jae-Beom Choi, Sung-Sik Bae, Kwang-Jo Hwang
  • Publication number: 20010044065
    Abstract: Multilayer photoimageable elements, useful for forming lithographic printing members, are disclosed. The elements comprise a support, a top layer, and a chemical resistant underlayer. The underlayer is resistant to aggressive washes, such as a UV wash. In one embodiment, the underlayer comprises a copolymer of N-substituted maleimide, methacrylamide, and methacrylic acid. A process for preparing a lithographic printing member is also disclosed.
    Type: Application
    Filed: December 5, 2000
    Publication date: November 22, 2001
    Inventors: Celin-Savariar Hauck, Gerhard Hauck
  • Publication number: 20010041299
    Abstract: The present invention relates to a positiive-working presensitized plate useful for preparing a lithographic printing plate comprising a positive-working photosensitive composition comprising at least one ester of 1,2-naphthoquinone-2-diazide-5-sulfonic acid, at least one ester of 1,2-naphthoquinone-2-diazide-4-sulfonic acid, and at least one polymer which is insoluble in water and soluble in an aqueous alkaline solution and which comprises at least one group or bond selected from sulfonamide group, urea bond or urethane bond. A lithographic printing plate prepared from the presensitized plate of the present invention shows improvement of chemical-resistance and printing durability, and good sensitivity, coupling property, adaptability to ball-point pen, shelf stability, and stability of sensitivity with time after exposure.
    Type: Application
    Filed: March 20, 2001
    Publication date: November 15, 2001
    Inventors: Kazuo Fujita, Shiro Tan, Akira Nagashima
  • Patent number: 6303260
    Abstract: Compositions useful for a lift-off resist in a bilayer metal lift-off process, which comprise a mixture of at least one solvent, at least one polyglutarimide resin and an effective amount of at least one actinic-absorbing dissolution rate modifier having the formulae of (IA) or (IB): in which each R1 and R2 is selected from the group consisting of hydrogen, unsubstituted or substituted alkyl, alkoxy, nitro, halo, amide or hydroxy or a combination thereof, X is an aromatic group and R3 and R4 are selected from the group consisting of hydrogen, an unsubstituted or substituted alkyl or arylsulfonyl; each m is an integer from 1 to 5 and each n is an integer from 1 to 4.
    Type: Grant
    Filed: March 31, 2000
    Date of Patent: October 16, 2001
    Assignee: MicroChem Corp.
    Inventors: Rodney J. Hurditch, Donald W. Johnson, Neela Joshi
  • Patent number: 6294311
    Abstract: Imageable elements useful as lithographic printing members are disclosed. The elements contain a substrate, an underlayer, and a top layer. The underlayer contains a combination of polymeric materials that provides resistance both to fountain solution and to aggressive washes, such as a UV wash. The underlayer can be used in either thermally imageable or photochemically imageable elements.
    Type: Grant
    Filed: December 22, 1999
    Date of Patent: September 25, 2001
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Ken-ichi Shimazu, Jayanti Patel, Jianbing Huang, Nishith Merchant, Mathias Jarek
  • Patent number: 6238839
    Abstract: A lithographic printing plate precursor which comprises a metal support having provided thereon a heat-insulating layer, a metal layer having a hydrophilic surface, and a lipophilic layer which is abraded by heating or whose solubility to alkali is transformed by heating, in this order from the support.
    Type: Grant
    Filed: August 22, 2000
    Date of Patent: May 29, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tadabumi Tomita, Hisashi Hotta, Akio Uesugi
  • Patent number: 6187500
    Abstract: In a positive photoresist composition including (A) an alkali-soluble novolak resin and (B) a naphthoquinonediazide ester, the alkali-soluble novolak resin is obtained synthetically by condensation of phenol compounds and an aldehyde or ketone, and the phenol compounds include, for example, 1% to 20% by mole of hydroquinone, 30% to 95% by mole of m-cresol and 2% to 50% by mole of 2,5-xylenol. Thus, a high-definition positive photoresist composition can be obtained, which inhibits the formation of scum, and is satisfactory in sensitivity, sectional shape, focal depth range and other properties even in a process for the formation of an ultrafine resist pattern of 0.30 &mgr;m or below by lithography using i-ray.
    Type: Grant
    Filed: November 2, 1999
    Date of Patent: February 13, 2001
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Ken Miyagi, Kousuke Doi, Atsuko Hirata, Hidekatsu Kohara, Toshimasa Nakayama
  • Patent number: 6087068
    Abstract: Proposed is a novel undercoating composition to form an undercoating layer interposed between the surface of a substrate and a photoresist layer with an object to decrease the adverse influences by the reflection of light on the substrate surface in the pattern-wise exposure of the photo-resist layer to ultraviolet light without the undesirable phenomena of intermixing between layers and notching along with a large selectivity ratio in the etching rates between the patterned resist layer and the undercoating layer in a dry-etching treatment. The undercoating composition comprises (A) an ultraviolet absorber which is a benzophenone compound or an aromatic azomethine compound each having at least one unsubstituted or alkyl-substituted amino group on the aryl groups and (B) a crosslinking agent which is preferably a melamine compound having at least two methylol groups or alkoxymethyl groups bonded to the nitrogen atoms in a molecule in a weight proportion (A):(B) in the range from 1:1 to 1:10.
    Type: Grant
    Filed: March 18, 1999
    Date of Patent: July 11, 2000
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Mitsuru Sato, Katsumi Oomori, Etsuko Iguchi, Kiyoshi Ishikawa, Fumitake Kaneko
  • Patent number: 6087073
    Abstract: There is described a method of preparing a water-less lithographic plate by coating a positive working photosensitive composition onto an oleophilic base imagewise exposing the plate and developing it to remove the areas of the photosensitive composition which have been light exposed, coating overall the surface of the plate with a layer of a composition which is ink-releasing or when cured becomes ink releasing, then either as a separate step or as a combined step curing the ink-releasing composition or drying the ink-releasing composition and light exposing overall the plate, then redeveloping the plate to remove the photosensitive composition remaining after the first development and any ink-releasing composition overlying the photosensitive composition.
    Type: Grant
    Filed: September 18, 1997
    Date of Patent: July 11, 2000
    Assignee: Kodak Polychrome Graphics L.L.C.
    Inventors: Peter Andrew Reath Bennett, Carole-Anne Smith
  • Patent number: 6074797
    Abstract: The present invention relates to a precursor of waterless planographic printing plates, in which at least a photosensitive layer and a silicone rubber layer are laminated on a substrate in this order, characterized in that said photosensitive layer contains a quinonediazide group-containing polyurethane resin and furthermore, preferably, contains a light-heat converting material.The present invention can provide a precursor of waterless planographic printing plates, which is improved in both image reproducibility and printing durability, and which can be applied to both the method of obtaining a waterless planographic printing plate by ordinary image exposure and the method of obtaining a waterless planographic printing plate by laser irradiation.
    Type: Grant
    Filed: February 23, 1999
    Date of Patent: June 13, 2000
    Assignee: Toray Industries, Inc.
    Inventors: Mitsuru Suezawa, Akihiro Iihara, Norimasa Ikeda
  • Patent number: 6045963
    Abstract: A negative waterless plate contains a sheet substrate; a radiation sensitive imaging layer composed of a diazido naphthaquinone ester or amide compound, such as diazido naphthaquinone sulfonate of a phenolic resin, and a polyurethane prepared by reacting a di-isocyanate and a diol; and a silicone layer. The planographic printing plate is imagewise exposed to actinic radiation through a negative original to form exposed areas of the imaged layer which are soluble or dispersible in a developer liquid. After imaging exposure, the developer liquid is applied which penetrates the silicone layer and dissolves the areas exposed to the radiation. The coating areas not exposed by the radiation remain intact. During this development procedure, areas of the silicone layer overlying the exposed areas are removed along with the underlying soluble areas to produce an imaged planographic printing plate having uncovered ink receptive areas and complimentary ink repellent areas of the silicone layer.
    Type: Grant
    Filed: March 17, 1998
    Date of Patent: April 4, 2000
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Jianbing Huang, Richard Goodman, Thi Do
  • Patent number: 6004705
    Abstract: A ceramics green sheet which is suitably used for producing sintered ceramics substrates and the like is disclosed. The ceramics green sheet according to the present invention includes a ceramics powder, a photoinitiator, a UV absorber such as photoinitiation inhibitor organic dyes and inorganic powders, and a photosensitive resin composition. The ceramics green sheet according to the present invention has an advantage that via holes and through holes may be very easily formed with high precision, and fine holes may be formed reliably and inexpensively.
    Type: Grant
    Filed: July 22, 1996
    Date of Patent: December 21, 1999
    Assignee: Toray Industries, Inc.
    Inventors: Takaki Masaki, Takao Kitagawa, Akiko Yoshimura, Keiji Iwanaga
  • Patent number: 5985524
    Abstract: The invention relates to a process for forming bilayer resist images with a chemically-amplified, radiation-sensitive bilayer resist. The bilayer resist is disposed on a substrate and comprises (i) a top imaging layer comprising a radiation-sensitive acid generator and a vinyl polymer having an acid-cleavable silylethoxy group and (ii) an organic underlayer. The bilayer resist is used in the manufacture of integrated circuits.
    Type: Grant
    Filed: March 28, 1997
    Date of Patent: November 16, 1999
    Assignee: International Business Machines Incorporated
    Inventors: Robert David Allen, Donald Clifford Hofer, Ratnam Sooriyakumaran, Gregory Michael Wallraff
  • Patent number: 5955238
    Abstract: A waterless planographic printing plate, wherein the waterless planographic printing plate comprises a laser-light-sensitive layer which constitute a first layer provided on a support, containing a compound (A) generating an acid by irradiating an actinic light thereto, a compound (B) converting a laser light to heat and a polymer compound (C) which is decomposed by heat under an acidic condition; and a layer which constitutes a second layer having an ink repellent surface thereon. The entire surface of the waterless planographic printing plate is exposed with ultraviolet light. The printing plate is irradiated imagewisely with an infrared laser light to heat the portion irradiated with the laser light, and at least a layer having an ink repellent surface at the portion irradiated with the laser light is removed.
    Type: Grant
    Filed: March 6, 1997
    Date of Patent: September 21, 1999
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hiroaki Yokoya, Toshiaki Aoai, Kazuya Uenishi
  • Patent number: 5928833
    Abstract: A radiation sensitive material comprises particles including a water-insoluble heat-softenable core surrounded by a shell which is soluble or swellable in aqueous medium. The material also includes a radiation sensitive component which, on exposure to radiation, causes the solubility characteristics of the material to change. The material may be positive- or negative-working and may be coated onto a substrate from aqueous media to form a radiation sensitive plate which, after image-wise exposure, can be developed in aqueous media and then heated to cause the particles to coalesce and form a durable printing image.
    Type: Grant
    Filed: November 1, 1996
    Date of Patent: July 27, 1999
    Assignee: DuPont (U.K.) Ltd.
    Inventors: Andrew E. Matthews, David E. Murray, Allen P. Gates, John R. Wade, Michael J. Pratt, William A. King
  • Patent number: 5922508
    Abstract: The invention describes a photopolymerizable recording material which comprises a photopolymerizable layer and a cover layer. The cover layer comprises a polymer which possesses low permeability to atmospheric oxygen and is soluble in water, and a water-soluble dye which absorbs light in the region from 300 to 700 nm and within this range has a non-absorbent region corresponding to the emission range of the copying light source.The material can be sensitized for various spectral regions, for example, for UV light, visible light or laser light and has a higher resolving power than a corresponding material which does not contain a dye in the cover layer, while its photosensitivity remains unchanged or is only slightly reduced.
    Type: Grant
    Filed: November 25, 1997
    Date of Patent: July 13, 1999
    Assignee: Agfa-Gevaert AG
    Inventors: Rudolf Zertani, Dieter Mohr, Werner Frass
  • Patent number: 5914211
    Abstract: A laminated substrate including a substrate and a hydrophilic resin layer formed on the substrate, wherein the hydrophilic layer is one made from a resin composition including a hydrophobic polymer linked to a hydrophilic polymer having acidic groups, salts of acidic groups, basic groups, or salts of basic groups; a photosensitive lithographic printing plate including a substrate and a dampening water receiving layer and a photosensitive layer formed on the substrate successively, wherein the above hydrophilic resin layer is used as the dampening water receiving layer; and an image-adding lithographic printing plate including a substrate and an image-receiving layer formed on the substrate, wherein the above hydrophilic resin layer is used as the image-receiving layer.
    Type: Grant
    Filed: August 1, 1997
    Date of Patent: June 22, 1999
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Tadashi Hashino, Satoshi Imahashi
  • Patent number: 5908738
    Abstract: Proposed is a novel undercoating composition used in the photolithographic patterning of a photoresist layer by intervening between the substrate surface and the photoresist layer to decrease the adverse influences of the reflecting light from the substrate surface. The undercoating composition of the invention comprises (a) a melamine compound substituted by methylol groups and/or alkoxymethyl groups and (b) a polyhydroxy benzophenone compound, diphenyl sulfone compound or diphenyl sulfoxide compound, optionally, with admixture of (c) an alkali-insoluble resin of a (meth)acrylic acid ester.
    Type: Grant
    Filed: February 5, 1998
    Date of Patent: June 1, 1999
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Mitsuru Sato, Katsumi Oomori, Kiyoshi Ishikawa, Etsuko Iguchi, Toshimasa Nakayama
  • Patent number: 5900345
    Abstract: Improved aluminum substrates suitable for use in the production of lithographic printing plates. A surfactant surface treatment for such aluminum substrates improves the quality of radiation sensitive coatings subsequently applied to the substrate. The surfactant may be in a layer comprising a mixture of a hydrophilizing composition and a surfactant on the aluminum alloy surface; or a hydrophilizing layer comprising a hydrophilizing composition may be on the aluminum alloy surface and a surfactant layer comprising a surfactant on the hydrophilizing layer.
    Type: Grant
    Filed: October 6, 1997
    Date of Patent: May 4, 1999
    Assignee: Kodak Polychrome Graphics, LLC
    Inventors: Stephan J. W. Platzer, Joe E. South, Melinda A. Alden
  • Patent number: 5879853
    Abstract: This invention relates to a top antireflective layer (TAR) which is preferably transparent to some extent and has high-etch resistance and low reflectivity at the photoresist/TAR interface. The TAR also significantly reduces CD variation in exposed photoresist film. The TAR of the present invention comprises an indanone or glutarimide copolymer, a solvent, and an additive sensitizer having an orthodiazonaphthoquinone structure. The present invention is also related to a process of forming a semiconductor by applying a photoresist layer to the surface of a substrate, forming a top antireflection layer on the photoresist layer, and selectively exposing the substrate to ultraviolet light, wherein the TAR comprises an indanone or glutarimide copolymer, a solvent, and an additive sensitizer with an orthodiazonaphthoquinone structure.
    Type: Grant
    Filed: January 18, 1996
    Date of Patent: March 9, 1999
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Tsukasa Azuma
  • Patent number: 5866294
    Abstract: The present invention is a water-less lithographic printing plate, in which a photosensitive layer and a silicone rubber layer are laminated in this order on a substrate, characterized in that the photosensitive layer contains the reaction product between a compound with at least one each of phenolic hydroxyl groups and non-phenolic hydroxyl groups and a quinonediazide compound, or contains both the reaction product between a compound with at least one of phenolic hydroxyl groups and a quinonediazide compound, and the reaction product between a compound with at least one of non-phenolic hydroxyl groups and a quinonediazide compound.The water-less lithographic raw plate of the present invention is excellent in image reproducibility and printing durability, and so can be favorably and economically advantageously used also in the commercial web offset printing and the newspaper web offset printing where high printing durability is required.
    Type: Grant
    Filed: April 28, 1997
    Date of Patent: February 2, 1999
    Assignee: Toray Industries, Inc.
    Inventors: Masahiro Oguni, Kazuki Goto, Mitsuru Suezawa, Shun-ichi Yanagida, Norimasa Ikeda
  • Patent number: 5858604
    Abstract: Object: A method for preparing a lithographic printing plate directly from digital image signals with the use of a presensitized lithographic printing plate comprising a support having thereon a photosensitive layer and a light-shielding layer which can be removed imagewise with laser light is provided, wherein the light-shielding layer, which can be industrially produced readily at a moderate price can be removed sufficiently during a process of development without the need of removing a masking layer at an unexposed portion and adverse effect on a photosensitive layer.
    Type: Grant
    Filed: January 16, 1996
    Date of Patent: January 12, 1999
    Assignee: Konica Corporation
    Inventors: Katsuyuki Takeda, Sota Kawakami, Katsumi Maejima, Koichi Nakatani, Shinji Matsumoto
  • Patent number: 5853948
    Abstract: A positive photoresist composition comprising (A) an alkali-soluble resin; (B) a quinonediazido group containing compound; and (C) at least one sulfonyl halide represented by the following general formula (I):R.sup.1 --SO.sub.2 --X (I)where R.sup.1 is an alkyl group, a substituted alkyl group, an alkenyl group, an aryl group or a substituted aryl group; X is a halogen atom, as well as a multilayer resist material using this composition. Very fine (<0.4 .mu.m) resist patterns can be formed that have high feature or edge integrity, that provide good contrast between exposed and unexposed areas after development and that assure a wider margin of exposure, better depth-of-focus characteristics and sharper cross-sectional profiles.
    Type: Grant
    Filed: October 29, 1997
    Date of Patent: December 29, 1998
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Atsushi Sawano, Junichi Mizuta, Kousuke Doi, Hidekatsu Kohara, Toshimasa Nakayama
  • Patent number: 5817520
    Abstract: According to the invention, the total mercaptans in an aqueous sample are assayed by means of the formation of a chromophoric substitution product between all the mercaptans present in the sample and a reagent corresponding to the general formula I: ##STR1## Reduced glutathione (GSH) is assayed in the form of a chromophoric thione formed specifically by alkalization from the substitution product formed above between GSH and the reagent.The concentration of mercaptans distinct from GSH is obtained by subtraction of the concentrations obtained in the preceding assays.Application to the assay of mercaptans and GSH, especially in the presence of other mercaptans, in particular in biological media.
    Type: Grant
    Filed: August 12, 1996
    Date of Patent: October 6, 1998
    Assignee: Oxis International S.A.
    Inventors: Jean-Claude Yomtob Yadan, Marc Gabriel Antoine, Jean Raymond Chaudiere
  • Patent number: 5811210
    Abstract: The present invention relates to a water-less lithographic raw plate, in which a photosensitive layer and a silicone rubber layer are laminated in this order on a substrate, comprising: the peel bonding strength between the photosensitive layer and the silicone rubber layer being 5 to 100 g/cm, and the initial elastic modulus of the photosensitive layer after completion of exposure being 5 to 75 kgf/mm2. In the present invention, attention is paid to the peel bonding strength between the photosensitive layer and the silicone rubber layer before exposure, and it is intensified, while the photosensitive layer after completion of exposure is kept lower in elastic modulus, to provide a water-less lithographic printing plate excellent in printing durability and image reproducibility. Therefore, the water-less lithographic printing plate obtained is suitable for commercial web offset printing and newspaper web offset printing.
    Type: Grant
    Filed: September 11, 1995
    Date of Patent: September 22, 1998
    Assignee: Toray Industries, Inc.
    Inventors: Ken Kawamura, Mikio Tsuda, Norimasa Ikeda
  • Patent number: 5759742
    Abstract: A masking element is prepared with a photosensitive layer on a suitable support, overcoated with a masking layer containing an infrared absorbing compound and a thermally bleachable dye. The dye is bleached by imagewise laser irradiation, followed by floodwise exposure to produce an image in the photosensitive layer corresponding to the laser produced image. The outermost layers are removed and development provides a suitable negative-working printing plate.
    Type: Grant
    Filed: September 25, 1996
    Date of Patent: June 2, 1998
    Assignee: Eastman Kodak Company
    Inventors: Paul Richard West, Jeffery Allen Gurney
  • Patent number: 5747216
    Abstract: A presensitized plate which comprises a roughened and anodized aluminum plate having provided thereon a positive working light-sensitive composition layer which comprises a dye and can be made soluble in a developer upon exposure to light, wherein the dye concentration in the portion of the light-sensitive layer adjacent to or near the substrate is lower than that in the other portions of the light-sensitive layer.The presensitized plate according to the present invention has less color staining than PS plates of the prior art do and thus has excellent examining properties for plate-quality. The presensitized plate also has remarkable advantages of less stains around image-deleted areas during printing and high printing durability.
    Type: Grant
    Filed: June 13, 1991
    Date of Patent: May 5, 1998
    Assignee: Fuji Photo Film Co, Ltd.
    Inventors: Takuo Watanabe, Yasuhito Naruse, Kotaro Yamasue
  • Patent number: 5744286
    Abstract: Disclosed is a method of making a polyimide pattern on a substrate. A solution is prepared in an organic solvent of a polyamic acid and about 1 to about 10 wt. % of a photosensitizer that becomes more water soluble when exposed to actinic light. A coating is formed of the solution on a substrate and solvent is evaporated from the coating. A positive photoresist is applied over the coating and is exposed to a pattern of actinic light. The exposed portions of the photoresist are removed as well as the exposed portions of the polyamic acid coating thereunder. The remaining photoresist is removed and the polyamic acid coating is imidized.
    Type: Grant
    Filed: February 12, 1996
    Date of Patent: April 28, 1998
    Inventor: Jin-o Choi
  • Patent number: 5738943
    Abstract: The water-loving properties of an anodized aluminum lithographic surface are enhanced or restored by treatment with a solution containing a monomeric, organo-phosphonic acid chelating compound or salt thereof. Such treatment can take place following, during or in lieu of the treatment of anodized aluminum in web form with an alkali metal silicate in the process of manufacturing printing plates. Alternatively, the treatment can be carried out as a plate is developed and/or prepared for the press. In a third approach, an organo-phosphonic acid chelating compound can be incorporated into a fountain solution, ink or correction fluid.
    Type: Grant
    Filed: January 8, 1997
    Date of Patent: April 14, 1998
    Assignee: Howard A. Fromson
    Inventors: Howard A. Fromson, Robert F. Gracia, Sean P. Evans, William J. Rozell
  • Patent number: 5738944
    Abstract: The water-loving properties of an anodized aluminum lithographic surface are enhanced or restored by treatment with a solution containing a monomeric, organo-phosphonic acid chelating compound or salt thereof. Such treatment can take place following, during or in lieu of the treatment of anodized aluminum in web form with an alkali metal silicate in the process of manufacturing printing plates. Alternatively, the treatment can be carried out as a plate is developed and/or prepared for the press. In a third approach, an organo-phosphonic acid chelating compound can be incorporated into a fountain solution, ink or correction fluid.
    Type: Grant
    Filed: January 8, 1997
    Date of Patent: April 14, 1998
    Assignee: Howard A. Fromson
    Inventors: Howard A. Fromson, Robert F. Gracia, Sean P. Evans, William J. Rozell
  • Patent number: 5736256
    Abstract: The water-loving properties of an anodized aluminum lithographic surface are enhanced or restored by treatment with a solution containing a monomeric, organo-phosphonic acid chelating compound or salt thereof. Such treatment can take place following, during or in lieu of the treatment of anodized aluminum in web form with an alkali metal silicate in the process of manufacturing printing plates. Alternatively, the treatment can be carried out as a plate is developed and/or prepared for the press. In a third approach, an organo-phosphonic acid chelating compound can be incorporated into a fountain solution, ink or correction fluid.
    Type: Grant
    Filed: May 23, 1996
    Date of Patent: April 7, 1998
    Assignee: Howard A. Fromson
    Inventors: Howard A. Fromson, Robert F. Gracia, Sean P. Evans, William J. Rozell
  • Patent number: 5725988
    Abstract: This invention provides an improved negative-working or positive-working, single sheet color proofing method which can accurately reproduce images by using colored, photosensitive layers on substrates which are then overcoated with partially developable adhesive layers. The final construction is useful in predicting the image quality from a lithographic printing process. The partial removal of the adhesive layers cleans out any background stain which may remain from the incomplete removal of the photosensitive layer.
    Type: Grant
    Filed: December 7, 1993
    Date of Patent: March 10, 1998
    Assignee: Bayer Corporation
    Inventor: Stephan J. W. Platzer
  • Patent number: 5723253
    Abstract: Disclosed is a light-sensitive composition containing an o-quinonediazide compound, a novolak resin and a polymer,characterized in that the polymer contains a constitutional unit selected from the group consisting of constitutional units represented by the formulae (I), (II) and (III): ##STR1## wherein R.sup.1 to R.sup.12 each represent a hydrogen atom, an alkyl group or a phenyl group,and a lithographic printing plate using the same.
    Type: Grant
    Filed: December 4, 1995
    Date of Patent: March 3, 1998
    Assignees: Konica Corporation, Mitsubishi Chemical Corporation
    Inventors: Katuhiko Higashino, Tomohisa Ohta, Shinichi Matsubara
  • Patent number: 5721078
    Abstract: A resist pattern formed on a substrate has a T-shaped cross section including a stem portion extending from the substrate surface and a cap portion connected to the stem portion and spaced from the substrate surface. Provided that .alpha. is a minimum of the angle which is defined between a tangent at the lower edge of the cap portion and the substrate surface, and h is the spacing between the lower edge of the cap portion and the substrate surface at an intermediate position, .alpha. and h fall within a range defined and encompassed by tetragon ABCD wherein A: .alpha.=0.degree., h=0.01 .mu.m, B: .alpha.=20.degree., h=0.01 .mu.m, C: .alpha.=20.degree., h=0.2 .mu.m, and D: .alpha.=0.degree., h=0.3 .mu.m.
    Type: Grant
    Filed: December 2, 1996
    Date of Patent: February 24, 1998
    Assignee: TDK Corporation
    Inventor: Akifumi Kamijima
  • Patent number: 5677101
    Abstract: Disclosed is a light-sensitive lithographic printing plate which comprises an aluminum plate having a surface subjected to roughening treatment and then anodization treatment and colored by a solution containing a UV absorber so that at an absorption local maximum wavelength between 340 and 450 nm, reflection optical density DS is higher by 0.02 to 0.5 than that obtained when the surface is not colored, and a positive light-sensitive composition layer containing an o-quinonediazide compound and a clathrate compound provided by coating on the aluminum plate after coloration.
    Type: Grant
    Filed: June 19, 1995
    Date of Patent: October 14, 1997
    Assignee: Konica Corporation
    Inventors: Kazuo Noguchi, Kaori Fukumuro, Shinichi Matsubara, Yoshihiro Koya, Hiroshi Tomiyasu, Shigeru Kajiwara
  • Patent number: 5650257
    Abstract: A radiation sensitive device comprising a substrate carrying a radiation sensitive layer is coated with a discontinuous covering layer which is more light sensitive than the radiation sensitive layer. The covering layer is formed by spraying and assists in improving vacuum drawdown during image-wise exposure of the device without having a deleterious affect on the exposure and development characteristics of the device.
    Type: Grant
    Filed: October 21, 1988
    Date of Patent: July 22, 1997
    Assignee: Vickers PLC
    Inventor: Graham Philip Cooper
  • Patent number: 5648199
    Abstract: A method of forming a resist pattern is provided that has high resolution, wide focus margin, and favorable configuration, and high sensitivity. A resist film of a type that is developed with an alkali developer and that is subject to chemical change upon receiving light is formed on a semiconductor substrate. On the resist film, an acid film is formed of an acid water-soluble material, and that has transmittance of at least 70% before and during exposure of the light when the film thickness thereof is 1 .mu.m. The light is selectively directed towards the resist film, whereby an image is formed in the resist film. The resist film is developed with an alkali developer to form a resist pattern.
    Type: Grant
    Filed: November 21, 1995
    Date of Patent: July 15, 1997
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventor: Shinji Kishimura
  • Patent number: 5641607
    Abstract: A method of determining an optimum condition of an anti-reflective layer upon forming a resist pattern by exposure with a monochromatic light, forms the anti-reflective layer with these conditions and forms a resist pattern using a novel anti-reflective layer.
    Type: Grant
    Filed: September 28, 1995
    Date of Patent: June 24, 1997
    Assignee: Sony Corporation
    Inventors: Tohru Ogawa, Tetsuo Gocho
  • Patent number: 5637441
    Abstract: A mechanically and/or electrochemically grained and optionally anodized base material composed of aluminum or its alloys, to which a hydrophilic layer of at least one polymer containing basic and acidic groups is applied. This layer is followed by a further hydrophilic layer which contains at least one compound containing at least one phosphono group. In addition, the invention relates to a method of producing said carrier material and to photosensitive recording material for offset printing plates produced therewith.
    Type: Grant
    Filed: June 19, 1995
    Date of Patent: June 10, 1997
    Assignee: AGFA-Gevaert AG
    Inventors: Michael Brenk, Mathias Eichhorn, Andreas Elsaesser