Abstract: A printing plate material is disclosed which comprises a substrate, and provided thereon, an under layer and a porous hydrophilic layer in that order, wherein the under layer has a thickness of from 0.1 to 5.0 ?m, contains metal oxide particles A with a particle size of from 1 to 20 nm in an amount of not less than 30% by weight, and has cracks with a groove width of less than 1 ?m.

Abstract: A lithographic printing plate precursor comprises a support and a hydrophilic layer capable of hydrophobicizing by heat, wherein the hydrophilic layer comprises: a particulate hydrophobicizing precursor; a photo-heat converting agent; a hydrophilic polymer having a silane coupling group, and a metal complex catalyst.

Abstract: The invention includes polymers that contain a polymers of the invention contain one or more 1) carbonate units and/or 2) a lactone provided by a monomer having a ring oxygen adjacent to the monomer vinyl group. The invention also provides photoresists that contain such polymers, particularly for imaging at short wavelengths such as sub-200 nm.

Abstract: An object of the present invention is to provide a method for manufacturing such a dry lithographic printing master plate that has eliminated uneven plate performance and more specifically that provides a stable adhesiveness between a heat-sensitive layer and a silicone rubber layer as well as a high aging stability of a coating solution. Provided is a method for preparing a master plate useful for making a dry lithographic printing plate comprising at least a heat-sensitive layer and a silicone rubber layer which are stacked in this order on a substrate, said method comprising the steps of: (1) dissolving a diorgano-polysiloxane and a curing catalyst in a solvent; (2) dissolving a cross-linking agent in a solvent; (3) mixing the solution obtained in the step (1) with the solution obtained in the step (2); and (4) applying the mixture obtained in the step (3) over the heat-sensitive layer to thereby form the silicone rubber layer.

Abstract: Photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The photoresists in some embodiments comprise (a) a fluorine-containing copolymer derived from at least one polycyclic ethylenically unsaturated compound and at least one compound having at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one photoactive component. In other embodiments, the photoresists comprise a fluorine-containing copolymer derived from at least one polycyclic ethylenically unsaturated compound having at least one atom or group covalently attached to a carbon atom contained within a ring structure and separated from each ethylenically unsaturated carbon atom of the ethylenically unsaturated compound by at least one covalently attached carbon atom, wherein the atom or group is selected from the group consisting of fluorine perfluoroalkyl and perfluoroalkoxy.

Abstract: A positive-working printing plate precursor for wet lithographic printing is disclosed which comprises a support having a hydrophilic surface and a coating comprising a first layer closest to the support, said first layer containing an oleophilic phenolic resin soluble in an aqueous alkaline developer, and a second layer containing an amphyphilic polymer, wherein (a) the second layer is capable of preventing the aqueous alkaline developer from penetrating into the first layer to an extent that substantially no dissolution of unexposed coating occurs upon immersion in the aqueous alkaline developer during a time period t2; (b) and wherein said capability of the second layer of preventing the aqueous alkaline developer from penetrating into the first layer is reduced upon exposure to heat or light to an extent that substantially complete dissolution of exposed coating occurs upon immersion in the aqueous alkaline developer during a time period t1; wherein t2>t1 and t2?t1 is at least 10 seconds; and wherein t

Abstract: A process for producing a lithographic printing plate by on-press developing a heat-sensitive lithographic printing plate precursor having on a metallic base in this order (1) an ink-receptive layer, (2) a hydrophilic layer containing colloidal particles of an oxide or hydroxide of at least one element, e.g., silicon or aluminum, and (3) a hydrophilic overcoat layer capable of being removed on a printing machine, which includes: rotating a plate cylinder having attached thereto the heat-sensitive lithographic printing plate precursor which has been exposed; subsequently supplying an ink and a dampening water to the plate surface by simultaneously bringing a dampening roll and an inking roll into contact with the plate surface or by bringing a water-metering roll into contact with an inking roll and then bringing the inking roll, which functions also to dampen, into contact with the plate surface; and thereby removing the overcoat layer and the exposed parts of the hydrophilic layer.

Abstract: A process for producing polymer fine particles comprising: dispersing a solution obtained by dissolving a hydrophobic polymer in a solvent immiscible with water in an aqueous phase comprising fine particles of an oxide or hydroxide of at least one element selected from the group consisting of elements belonging to 2 to 15 groups in the periodic table using a surfactant; or dispersing a solution obtained by dissolving a hydrophobic polymer in a solvent immiscible with water in an aqueous phase comprising a water-soluble resin; and then removing the solvent from the oil droplets to form polymer fine particles dispersed in water.

Abstract: Making a high absorption donor substrate for providing one or more OLED materials to an OLED device by: providing an absorber anti-reflection layer over a transparent support element, the anti-reflection layer having the real portion of its index of refraction greater than 3.0, and a thickness near the first reflectivity minimum at the wavelength of interest; providing a metallic heat-absorbing layer over the anti-reflection layer for absorbing laser light which passes through the transparent support element and the anti-reflection layer; and selecting the transparent support element, the anti-reflection layer, and the metallic heat-absorbing layer to have an average reflectivity of less than 10%, and the micro reflectivity variation due to variations in the thickness of the transparent support element of less than 10% at the wavelength of interest; and providing one or more organic material layers in the absence of a binder material, over the metallic heat-absorbing layer.

Abstract: A positive resist composition includes (A) an alkali-soluble polysiloxane resin, (B) an acid generator composed of a compound which generates an acid upon irradiation of active light or radiant ray, and (C) a compound in which at least one hydrogen atom of phenolic hydroxyl group or carboxyl group is substituted with an acid-decomposable group. This positive resist composition is useful for processes using F2 excimer laser (157 nm), extreme-ultraviolet rays (EUV, vacuum ultraviolet rays; 13 nm) and other light sources having wavelengths equal to or shorter than that of KrF excimer laser, and has high definition and can form resist patterns with good sectional shapes. A base material carrying a layer of the positive resist composition is also useful.

Abstract: A directly imageable planographic printing plate that is high in image productivity and easy to check is produced by using a directly imageable planographic printing plate that comprises at least a substrate, a thermo-sensitive layer and a ink-repelling layer in this order, wherein the thermo-sensitive layer in the printing area contains a dye that has an absorption maximum in the range of 400 nm to 700 nm, and the difference between the reflected absorption of the non-printing area and the reflected absorption of the printing area, observed at the absorption maximum wavelength of the dye, is not less than 0.3 and not more than 2.0.

Abstract: A lithographic sheet product having a substrate with a roll textured surface covered by a pretreatment layer. The pretreatment layer enhances adhesion of a printing composition to the sheet product and is composed of a polymer selected from the group consisting of polymers of acrylic acid, polymers of methacrylic acid, an organophosphorous polymer and copolymers of an organophosphorous compound and acrylic acid or methacrylic acid. Dopant particles of alumina, silica, titanium dioxide or a black dye or pigment may be added to the pretreatment layer to reduce the gloss and reflectance of the pretreatment layer in a printing process. Etching of the substrate also reduces gloss and reflectance.

Abstract: The present invention provides a polymer that can be used as an anti-reflective coating (ARC) polymer, an ARC composition comprising the same, methods for producing the same, and methods for using the same. The polymer of the present invention is particularly useful in a submicrolithographic process, for example, using KrF (248 nm) or ArF (193 nm) lasers as a light source. The polymer of the present invention comprises a chromophore that is capable of absorbing light at the wavelengths used in a submicrolithographic process. Thus, the ARC of the present invention significantly reduces or prevents back reflection of light and the problem of the CD alteration caused by the diffracted and/or reflected light. The ARC of the present invention also significantly reduces or eliminates the standing wave effect and reflective notching.

Abstract: A method for making a relief printing plate from an imageable lithographic printing plate precursor. The relief printing plate has ink-receptive cured areas, and ink-repellent non-image areas. The method comprises the steps of: a) imaging the lithographic printing plate precursor to produce ink-receptive image areas and ink-repellent non-image areas; b) applying a curable composition to form a coating on ink-receptive image areas; and c) curing the coating to produce ink-receptive cured areas. The method of another embodiment further comprises the steps of: d) applying a curable composition to form a coating on ink-receptive cured areas; e) curing the coating on the cured areas; and f) repeating steps d) and e) to attain a desired relief depth for the ink-receptive cured areas. In the practice of an embodiment of the invention, a modified rotary printing press may be employed to make a relief printing plate from a lithographic printing plate.

Abstract: A directly imageable planographic printing plate precursor, which may be of the positive or negative type, has at least a heat sensitive layer on a substrate. The heat sensitive layer contains a light-to-heat conversion material and a metal-containing organic compound.

Abstract: A positive working printing plate precursor is disclosed which comprises a hydrophilic support and a coating provided thereon which comprises in the order given a first layer containing an oleophilic resin soluble in an aqueous alkaline developer and a second layer comprising a water repellent-compound. Furthermore, the coating comprises an infrared absorbing dye containing a polysiloxane group providing a printing plate precursor with high sensitivity.

Abstract: The present invention provides polymers which are substantially or completely free of inorganic contaminants and the use of such polymers as a resin component for photoresist compositions, particularly chemically-amplified positive-acting resists. Polymers of the invention also are suitable for use as a resin component for antireflective coating compositions (ARCs). More particularly, the invention provides methods for reducing such contaminants in polymerization initiators, particularly free radical initiators.

Abstract: New photoresist compositions are provided that contain a halogenated salt, particularly a halogenated counter ion of an ammonium or alkyl ammonium salt. Preferred photoresists of the invention are chemically-amplified positive resists and contain an ammonium or alkyl ammonium salt that has a halogenated anion component such as a halogenated alkyl sulfonate or carboxylate anion component. Inclusion of the halogenated organic salt in a photoresist composition can provide enhanced lithographic performance.

Abstract: The present invention provides image-forming compositions and photosensitive lithographic plates which are excellent in sensitivity to infrared radiation, latitude of development, treatable area in m2, and printing durability. Specifically, the present invention provides an image-forming composition comprising (A) a polymeric compound obtainable by the addition reaction of a resinous polymer having one or more phenolic hydroxyl groups with a silane coupling agent of the following general formula (1) or (2), (B) an acid generator, (C) an infrared absorber, and (D) an alkali-soluble resin, and a photosensitive lithographic plate having this image-forming composition applied onto a substrate.

Abstract: The present invention pertains to photoimaging and the use of photoresists (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The present invention also pertains to novel hydroxy ester-containing polymer compositions that are useful as base resins in resists and potentially in many other applications.

Abstract: Disclosed is a planographic printing plate precursor comprising a support, and provided thereon, an image forming layer, a first outermost layer on the image forming layer side and a second outermost layer on the side of the support opposite the first outermost layer, the first and second outermost layers containing a lubricant component, which is manufactured either by a method comprising the steps of preparing a planographic printing plate precursor comprising a support and provided thereon, an image forming layer so that only the first outermost layer contains a lubricant component and winding the resulting precursor in the roll form, or by a method comprising the steps of preparing a planographic printing plate precursor comprising a support and provided thereon, an image forming layer so that only the second outermost layer contains a lubricant component and winding the resulting precursor in the roll form.

Abstract: A printing plate for computer-to plate lithography having a laser-ablatable member supported by a substrate. At least one portion of the laser-ablatable member is formed form an acrylic polymer containing laser-sensitive particles. The laser-sensitive particles absorb imaging radiation and cause the portion of the laser-ablatable member containing the laser sensitive particles and any overlying layers to be ablated.

Abstract: The present invention provides novel polymers and chemically-amplified positive-acting photoresist compositions that contain such polymers as a resin binder component. Preferred polymers of the invention include one or more structural groups that are capable of reducing the temperature required for effective deprotection of acid-labile moieties of the polymer.

Abstract: The invention relates to a lithographic method for producing microcomponents with component structures in the submillimeter range. According to the inventive method, a structured adhesive layer is applied to a metal layer and then a photostructured epoxy resin layer is applied to said adhesive layer. Said epoxide resin is structured by means of selective exposition and removing the unexposed zones and filling in the gaps between the resin structures with metal by electroplating. The aim of the invention is to provide an adhesive layer that is suitable for photostructured epoxy resins, especially for SU-8 resist material and that prevents the resist material from being detached. To this end, the adhesive layer consists of polyimide or a polyimide mixture.

Abstract: A planographic printing plate precursor includes a support having disposed thereon a recording layer containing a water-insoluble and alkali-soluble resin, a development inhibitor and an infrared absorber and exhibiting enhanced solubility in an aqueous alkali solution through light exposure. The recording layer may have either a mono-layer construction or a multi-layer construction containing a lower layer and an upper layer. In the case of the multi-layer construction, a layer containing the water-insoluble and alkali-soluble resin is used as the lower layer, and a layer containing the water-insoluble and alkali-soluble resin and the development inhibitor and exhibiting enhanced solubility in an aqueous alkali solution through light exposure is used as the upper layer, and at least one of the lower layer and the upper layer contains the infrared absorber.

Abstract: Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In a preferred embodiment, the polymers of the composition include recurring units having the formula where X is a light-attenuating moiety, M is a metal, and each R is individually selected from the group consisting of hydrogen, alkyls, aryls, alkoxys, and phenoxys. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature), are wet developable, and have superior optical properties.

Abstract: Disclosed is a printing plate precursor comprising a substrate and provided thereon, a layer containing a light heat conversion material, wherein the light heat conversion material does not substantially change in nature when allowed to stand in a temperature atmosphere of 400 to 500° C. for 10 minutes or a printing plate precursor comprising a substrate and provided thereon, a hydrophilic layer which is porous, wherein the hydrophilic layer contains a carbon atom-free material in an amount of not less than 91% by weight.

Abstract: Thermally imageable elements and methods for their preparation and use are disclosed. The elements contain, in order, a substrate; an underlayer; and an ink-repellent layer. The underlayer contains a crosslinked allyl functional polyurethane. A photothermal conversion material is present in either in the underlayer or in an absorber layer between the underlayer and the ink-repellent layer. Thermal imaging and development removes the ink-repellent layer and reveals the underlayer in the exposed regions to form an imaged element useful as a waterless lithographic printing plate.

Abstract: In one embodiment, the present invention is directed to a method for preparing a printing member by coating a printing cylinder with a layer comprising ultraviolet-curable silicones and curing the layer using ultraviolet radiation.

Abstract: An improved light attenuating compound for use in the production of microdevices is provided. Broadly, the light attenuating compound is non-aromatic and can be directly incorporated (either physically or chemically) into photolithographic compositions such as bottom anti-reflective coatings (BARC) and contact or via hole fill materials. The preferred non-aromatic compounds of the invention are conjugated aliphatic and alicyclic compounds which greatly enhance the plasma etch rate of the composition. Furthermore, the light attenuating compounds are useful for absorbing light at shorter wavelengths. In one embodiment, the inventive compounds can be polymerized so as to serve as both the polymer binder of the composition as well as the light absorbing constituent.

Abstract: A photoimageable composition suitable for use as a negative photoresist comprising about 75% to about 95% by weight of at least one epoxidized polyfunctional bisphenol A formaldehyde novolak resin; about 5% to about 25% by weight of at least one polyol reactive diluent; and at least one photoacid generator in an amount from about 2.5 to about 12.5 parts per hundred parts of resin and reactive diluent, which initiates polymerization upon exposure to near-ultraviolet radiation; dissolved in a sufficient amount of coating solvent.

Abstract: The present invention is directed to a photo-sensitive laminate film for use in making an image mask for etching an image on a substrate. In a first preferred embodiment, the photo-sensitive laminate film comprises a support sheet having a first surface and a second surface, a layer of polymer resin composition having photocrosslinkability, the layer of polymer resin composition having a first surface and a second surface, and a fractionally-releasable bonding layer located between the first surface of the support sheet and the second surface of the layer of polymer resin composition. Upon the creation of an image mask from the layer of polymer resin composition, the image mask is capable of being separated from the first surface of the support sheet such that at least a portion of the bonding layer located between the image mask and the first surface of the support sheet is released from the support sheet with the image mask, and the remaining portion of the bonding layer remains with the support sheet.

Abstract: Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system.

Abstract: A method for the production of a support for a lithographic printing plate precursor that comprises providing on a grained aluminum support having an anodic oxide film formed thereon a layer of inorganic compound particles having a major axis larger than a pore diameter of the anodic oxide film and treating the layer of inorganic compound particles with a treating solution capable of dissolving the inorganic compound particles, thereby fusing together the inorganic compound particles to form a layer of the inorganic compound.

Abstract: A method for making a lithographic printing plate comprises the steps of imagewise exposing, to a laser beam, a PS plate comprising a substrate, a heat-sensitive layer containing at least one light-heat conversion agent and a binder polymer formed on the substrate and a hydrophilic or lipophobic layer applied onto the heat-sensitive layer; and then removing the hydrophilic or lipophobic layer on the laser-exposed area by developing the imagewise exposed printing plate within 120 seconds from the completion of the laser-exposure to thus give a lithographic printing plate, wherein the developing treatment comprises the step of rubbing the exposed printing plate surface with an abrasion means in the absence of any liquid. This method permits the production of a lithographic printing plate without causing any deterioration of the developing properties of the PS plate even when the imagewise exposed PS plate is developed within a short period of time after the completion of the laser-exposure.

Abstract: A method for fabricating circuitized substrates which reduces shorts, and does not require baking and resulting film. The method employs a photoimageable dielectric film, having a solvent content less than about 5%, and a glass transition temperature, when cured, which is greater than about 110° C. A photoimageable dielectric film, is provided having from about 95% to about 100% solids, and comprising: from 0% to about 30% of the solids, of a particulate rheology modifier, from about 70% to about 100% of the solids of an epoxy resin system (liquid at 20° C. comprising: from about 85% to about 99.9% epoxy resins; and from about 0.1 to 15 parts of the total resin weight, a cationic photoinitiator; from 0 to about 5% solvent, applying the photoimageable dielectric film to a circuitized substrate; and exposing the film to actinic radiation.

Abstract: The invention relates to a process for the production of a laser-engravable flexographic printing element comprising a thermally crosslinked, elastomeric, laser-engravable relief-forming layer E, having the following steps:

Abstract: A photoresist element comprising a substrate; an etch resistant layer; and at least one photoresist layer prepared from a photoresist composition comprising a polymer selected from the group consisting of: (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure: —C(Rf)(Rf′)OH, wherein Rf and Rf′ are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is 2 to 10; (d) amorphous vinyl homopolymers of perfluoro(2,2-dimethyl-1,3-dioxole) or CX2═CY2 where X═F or CF3 and Y═—H or amorphous vinyl copolymers of perfluoro(2,2-dimethyl

Abstract: Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the body. The body may be of a material that is substantially transparent to activating light. At least a portion of the plurality of recesses may define features having a feature size less than about 250 nm. A template may be formed by obtaining a material that is substantially transparent to activating light and forming a plurality or recesses on a surface of the template. In some embodiments, a template may further include at least one alignment mark. In some embodiments, a template may further include a gap sensing area. An imprint lithography template may be used to form an imprinted layer in a light curable liquid disposed on a substrate. During use, the template may be disposed within a template holder.

Abstract: Disclosed is a photolithographic pattern-forming material capable of giving a fine patterned resist layer rapidly and being used repeatedly. The pattern-forming material is a multilayered body comprising a substrate and a photoresist layer thereon which is overlaid with a three-layered composite film for near-field light generation consisting of an intermediate layer of a non-linear optical material such as antimony sandwiched between two dielectric layers. When irradiated with active rays focused on the optically nonlinear layer, a fine optical window or light scattering point is formed therein where a near-field light is generated to pattern-wise expose the photoresist layer.

Abstract: New photoresist systems are provided that comprise an underlying processing (or barrier) layer composition and an overcoated photoresist layer. Systems of the invention can exhibit significant adhesion to SiON and other inorganic surface layers.

Abstract: The invention relates to a photoresist composition having a protecting group and a protected material incorporated in a cyclic chemical structure. In this invention a protected material has a cyclic ether group or cyclic ester group as a protecting group. A specific example of a cyclic ether group is an alkylene oxide, such as an oxetane group, substituted with one or more fluorinated alkyl groups. A specific example of a cyclic ester is a lactone which may be substituted with methyl groups. The photoresist composition further includes a photoactive component. The photoresist composition of this invention has a high transparency to ultraviolet radiation, particularly at short wavelengths such as (193) nm and (157) nm.

Abstract: Disclosed is a positive-working chemical-amplification photoresist composition used in the patterning works in the manufacture of semiconductor devices, with which quite satisfactory patterning of a photoresist layer can be accomplished even on a substrate surface provided with an undercoating film of silicon nitride, phosphosilicate glass, borosilicate glass and the like in contrast to the prior art using a conventional photoresist composition with which satisfactory patterning can hardly be accomplished on such an undercoating film. The photoresist composition comprises, besides a film-forming resin capable of being imparted with increased solubility in an alkaline solution by interacting with an acid and a radiation-sensitive acid-generating compound, a phosphorus-containing oxo acid such as phosphoric acid and phosphonic acid or an ester thereof.

Abstract: Provided is a plate-making method for producing a waterless lithographic printing plate, wherein the method comprises: (I) an exposing step of imagewise exposure of the precursor with a laser with a controlled condition that a portion of a laser-exposed area in a photo-thermal conversion layer in the precursor remains in the photo-thermal conversion layer of the finished printing plate, and (II) a developing step of removing a silicone rubber layer in the laser-exposed area to form an image on the printing plate. The precursor to be processed comprises (A) a support, (B) an undercoat layer formed by applying onto the support a coating liquid that contains a water-soluble or water-dispersible polymer and water as a solvent, and then drying the coating liquid, (C) a photo-thermal conversion layer which comprises polyurethane and a photo-thermal converting agent; and (D) a silicone rubber layer, laminated in that order.

Abstract: The invention includes polymers that contain a heterocyclic ring, preferably an oxygen-or sulfur-containing ring. The heterocyclic ring is preferably fused to the polymer backbone. The invention also provides photoresists that contain such polymers, particularly for imaging at short wavelengths such as sub-200 nm.

Abstract: Thermally imageable elements and methods for their preparation and use are disclosed. The elements contain, in order, a substrate; an underlayer; and an ink-repellent layer. The underlayer contains a crosslinked allyl functional polyurethane. A photothermal conversion material is present in either in the underlayer or in an absorber layer between the underlayer and the ink-repellent layer. Thermal imaging and development removes the ink-repellent layer and reveals the underlayer in the exposed regions to form an imaged element useful as a waterless lithographic printing plate.

Abstract: The invention relates to a radiation-sensitive recording material for the production of offset printing plates having a dimensionally stable support, a radiation-sensitive layer located on the front of the support, and a layer which comprises an organic polymeric material having a glass transition temperature of 35° C. or above and in which pigment particles are embedded and which is resistant to processing chemicals and is located on the back of the support. The pigment particles are preferably silica gel particles having a mean diameter of from 0.1 to 50 &mgr;m or organic particles having a mean diameter of from 3 to 10 &mgr;m. The image layer on the front may be matted or pigmented. The back coating enables the recording material to be stacked without separating paper. The image layer located on the front is not scratched by the pigmented back coating during storage and transport and during removal from the stack.

Abstract: Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system.

Abstract: A directly imageable planographic printing plate precursor which may be of the positive or negative type, has at least a heat sensitive layer on a substrate. The heat sensitive layer contains a light-to-heat conversion material and a metal-containing organic compound.

Abstract: A waterless planographic printing plate precursor which has a support member, a light-to-heat conversion layer for converting laser light to heat, and a silicone rubber layer. The light-to-heat conversion layer is contains at least one kind of polyurethane having at least one carboxyl group, and at least one light-to-heat conversion substance.