Abstract: The present invention includes an imageable element, which includes a sheet substrate, an imaging layer and a silicone layer, which comprises a crosslinked silicone polymer. The crosslinked silicone polymer is the curing product of a vinyl functional polysiloxane copolymer and a hydrosiloxane compound. The curing is catalyzed by a platinum carbonyl complex. Upon imagewise exposure and development, an imaged element is obtained, which is mounted on a dry printing press containing lithographic ink and used to produce printed stock.

Abstract: The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), particularly for deep UV applications. The antireflective compositions of the invention in general comprise a resin binder component that contains a high molecular weight polymer, e.g. a polymer having an Mw of at least about 40,000 daltons. ARCs of the invention exhibit exceptional conformality upon application to a substrate surface. For example, ARCs of the invention can coat substantial topography such as vertical and sloping steps with high conformality.

Abstract: A thinner for rinsing photoresist including 50 to 80 wt. % of n-butyl acetate, propylene glycol alkyl ether, and propylene glycol alkyl ether acetate, is provided. The thinner is neither toxic to humans nor ecologically undesirable and has no unpleasant odor. The waste solutions thereof and associated waste water are easily handed so as to render this thinner environmental friendly. Additionally, the photoresist thinner of the present invention has excellent rinsing ability.

Abstract: A method of fabricating a semiconductor multilevel interconnect structure employs a dual hardmask technique in a dual damascene process. The method includes using amorphous carbon as a first hardmask layer capable of being etched by a second etch process, and a second hardmask layer capable of being etched by a first etch process, as a dual hardmask. By virtue of the selective etch chemistry employed with the dual hardmask, the method affords flexibility unattainable with conventional processes. The via is never in contact with the photoresist, thus eliminating residual photoresist at the trench/via edge and the potential “poisoning” of the intermetal dielectric layer. Since trench/via imaging is completed before further etching, any patterning misalignments can be easily reworked. Because the amorphous carbon layer and the second hardmask layer are used as the dual hardmask, the photoresist can be made thinner and thus optimized for the best imaging performance.

Abstract: An intermediate layer composition for a three-layer resist process comprising (A) an octakis(silsesquioxane) skeleton-containing polymer obtained by hydrosilylation polymerization of a compound represented by formula (I) defined in the specification with bis(substituted ethynyl) compound in the presence of a platinum-containing catalyst.

Abstract: A composite photoresist structure includes an first organic layer located on a substrate, a sacrificial layer located on the first organic layer, and a second organic layer located on the sacrificial layer. The first organic layer is made of materials that can be easily removed by plasma. Therefore, the surface of the substrate will not be damaged while transferring a predetermined pattern onto the substrate.

Abstract: A hydrophilic layer and an overcoat layer are provided in this order on a heat-sensitive layer having an ink receiving surface, so as to form an original (plate) for a lithographic printing plate. The overcoat layer can be removed during printing. A system capable of forming an inorganic hydrophilic matrix by sol-gel conversion is provided in the hydrophilic layer. Adhesion between the heat-sensitive layer and the hydrophilic layer decreases in a heated region through image processing. Emulsion ink is supplied to the plate surface during printing, whereby the overcoat layer and the hydrophilic layer at an image portion are removed with a hydrophilic component of the emulsion ink. Thus, with a heat-sensitive original that can be subjected to heat-mode prepress using laser exposure, good printed matter can be stably obtained, irrespective of balance between image and non-image portions, without using wetting water.

Abstract: The present invention provides a resist composition comprising (A) polyhydroxystyrene in which at least a portion of hydrogen atoms of hydroxyl groups are substituted with an acid-dissociable dissolution inhibiting group, and the solubility in an alkali solution of the polyhydroxystyrene increasing when the acid-dissociable dissolution inhibiting group is eliminated by an action of an acid, and (B) a component capable of generating an acid by irradiation with radiation, wherein a retention rate of the acid-dissociable dissolution inhibiting group of the component (A) after a dissociation test using hydrochloric acid is 40% or less, and also provides a chemical amplification type positive resist composition which contains polyhydroxystyrene in which at least a portion of hydrogen atoms of hydroxyl groups are substituted with a lower alkoxy-alkyl group having a straight-chain or branched alkoxy group, and the solubility in an alkali solution of the polyhydroxystyrene increasing when the lower alkoxy-alkyl group

Abstract: A negative-working heat-sensitive material for making a lithographic printing plate by direct-to-plate recording is disclosed which comprises in the order given a lithographic base having a hydrophilic surface, an oleophilic imaging layer and a cross-linked hydrophilic upper layer, characterize in that the oleophilic imaging layer comprises at least one transition metal complex of an organic acid. Materials according to the invention are characterized by an increased run length and can be used as a printing plate immediately after exposure.

Abstract: The invention provides a planographic printing plate precursor, utilizing a support member having a hydrophilic surface excellent in hydrophilicity and durability, providing effects of improving scumming in the printing operation and capable of forming large numbers of prints of high image quality even under severe printing conditions.

Abstract: A process and system are provide for determining the acceptability of a fluid dispense such as a discrete volume of fluid used to coat a substrate. The fluid dispense is exposed to an energy source and the energy transmitted by the fluid dispense is detected to determine the shape of the fluid dispense. The fluid dispense shape and the timing of the beginning and end of the dispense are compared to previously generated standard dispense profiles and used to determine the acceptability of the shape and/or timing of the fluid dispense. The output from the sensor is used to control further processing of the substrate.

Abstract: A method for forming a dampening-waterless lithographic plate comprising an irradiation step of irradiating a dampening-waterless lithographic blank plate imagewise with a laser beam, the blank plate comprising a support, a photothermal conversion layer provided on the support for converting laser beam energy to heat, and an ink-repellent layer provided on the photothermal conversion layer a first rubbing step of rubbing the surface of the ink-repellent layer without use of a liquid so as to remove at least a portion of the ink-repellent layer in areas irradiated with a laser beam and a second rubbing step of rubbing the surface of the partially removed ink-repellent layer through use of a liquid.

Abstract: Positive-working imageable elements and methods for their preparation are disclosed. The elements comprise a hydrophilic substrate; a bottom layer, which contains a positive-working photosensitive composition; and a protective overlayer, which has an overlayer material that reduces the solubility of the photosensitive composition in an aqueous alkaline developer. The overlayer may be conveniently applied by a dip and rinse procedure.

Abstract: Disclosed is a planographic printing plate precursor comprising a support, and provided thereon, an image forming layer, a first outermost layer on the image forming layer side and a second outermost layer on the side of the support opposite the first outermost layer, the first and second outermost layers containing a lubricant component, which is manufactured either by a method comprising the steps of preparing a planographic printing plate precursor comprising a support and provided thereon, an image forming layer so that only the first outermost layer contains a lubricant component and winding the resulting precursor in the roll form, or by a method comprising the steps of preparing a planographic printing plate precursor comprising a support and provided thereon, an image forming layer so that only the second outermost layer contains a lubricant component and winding the resulting precursor in the roll form.

Abstract: An absorbing ether-like compound including a siliconethoxy, silicondiethoxy, or silicontriethoxy species attached to a naphthalene or anthracene chromophore via an oxygen linkage is used as an organic light-absorbing compound. The absorbing ether-like compound is incorporated into spin-on glass materials to provide anti-reflective coating materials for deep ultraviolet photolithography. A method of synthesizing the light-absorbing ether compounds is based on the reaction of an alcohol-substituted chromophore with an acetoxysilicon compound in the presence of alcohol. A method of making absorbing spin-on-glass materials including the absorbing ether-like compounds is also provided.

Abstract: A printing plate for computer-to plate lithography having a laser-ablatable member supported by a substrate. At least one portion of the laser-ablatable member is formed form an acrylic polymer containing laser-sensitive particles. The laser-sensitive particles absorb imaging radiation and cause the portion of the laser-ablatable member containing the laser sensitive particles and any overlying layers to be ablated.

Abstract: A printing plate for computer-to plate lithography having a laser-ablatable member supported by a substrate. At least one portion of the laser-ablatable member is formed form an acrylic polymer containing laser-sensitive particles. The laser-sensitive particles absorb imaging radiation and cause the portion of the laser-ablatable member containing the laser sensitive particles and any overlying layers to be ablated.

Abstract: A printing plate element is disclosed, comprising a substrate and a component layer containing a first material which is water-insoluble or capable of varying from being water-soluble to being water-insoluble at a prescribed temperature of not less than 60° C. and a second material which is water-soluble and has a melting point of 60 to 300° C. A method of preparing a printing plate is also disclosed, comprising imagewise exposure of the printing plate element and removing an unexposed area of the printing plate element with aqueous solution.

Abstract: A heat-sensitive lithographic printing plate precursor is disclosed, comprising a metal substrate having thereon 1) an ink-receptive layer, 2) a water-receptive layer comprising a colloidal particulate oxide or hydroxide of at least one element selected from the group consisting of beryllium, magnesium, aluminum, silicon, titanium, boron, germanium, tin, zirconium, iron, vanadium, antimony and transition metals, or additionally 3) a water-soluble overcoat layer, at least one layer of the ink-receptive layer, the water-receptive layer and the overcoat layer containing a compound capable of converting light into heat and the ink-receptive layer containing an epoxy resin having a softening point of 120° C. or more.

Abstract: Disclosed are a composition for a resist underlayer film excellent in reproducibility of a resist pattern, excellent in adhesion to a resist, excellent in resistance to a developing solution used after exposure of the resist and decreased in film loss in oxygen ashing of the resist; and a method for producing the same, the composition comprising: both or either of a hydrolysate and a condensate of (A) at least one compound selected from the group consisting of (A-1) a compound represented by the following general formula (1): R1aSi(OR2)4−a  (1) wherein R1 represents a hydrogen atom, a fluorine atom or a univalent organic group, R2 represents a univalent organic group, and a represents an integer of 0 to 2, and (A-2) a compound represented by the following general formula (2): R3b(R4O)3−bSi—(R7)d—Si(OR5)3−cR6c  (2) wherein R3, R4, R5 and R6, which may be the same or different, each represent univalent organic groups, b and c, which may be the same or diffe

Abstract: The invention relates to a recording material sensitive to IR radiation and having a substrate, a primer layer, an IR-absorbing layer and a silicone layer. The primer layer includes a mixture of an unmodified epoxy resin, an organic polymer having functional groups and a crosslinking agent which reacts with the epoxy resin and the functional groups of the organic polymer. The primer layer preferably contains at least one pigment, in particular inorganic pigments. For the production of a printing plate for waterless offset printing, the recording material is exposed imagewise to IR radiation and is then freed from the ablated layer components by washing with water or an aqueous solution. Preferably the radiation is IR laser radiation. The primer layer according to the invention results in particularly good adhesion of the IR-absorbing layer to the substrate without hindering the removal of the exposed parts of the IR-absorbing layer during development.

Abstract: According to the present invention there is provided a heat-sensitive material for making lithographic plates comprising in the order given on a support an IR-sensitive oleophilic layer and an ablatable cross-linked hydrophilic layer comprising an inorganic pigment and a hardener, characterized in that the ratio of said inorganic pigment over the hardener is comprised between 95/5 and 75/25 by weight.

Abstract: According to the present invention there is provided a heat mode imaging element for providing a lithographic printing plate consisting of a lithographic base with a hydrophilic surface and a top layer that is sensitive to IR-radiation, comprises a polymer soluble in an aqueous alkaline solution, and is unpenetrable for an aqueous alkaline developer, characterized in that said top layer comprises a polysiloxane surfactant.

Abstract: A phenolic resin/silicone resin hybrid compound is obtained by effecting hydrolytic condensation of an organooxysilane in the co-presence of a phenolic resin. The hybrid compound is used as the base polymer in a resist for endowing a resist film with excellent adhesion to a metal substrate.

Abstract: A heat-sensitive lithographic printing plate precursor is disclosed comprising a polymer which is soluble in an aqueous alkaline solution and which comprises at least one chromophoric moiety having a light absorption maximum in the wavelength range between 400 and 780 nm. Such materials show no dye stain after processing in areas where the coating has been removed by an alkaline developer.

Abstract: A system and method is disclosed for coating a conventional wafer or a spherical shaped semiconductor substrate with liquid material such as photoresist by utilizing a “drop on demand” piezo driven dispense nozzle, a bubble-jet dispense nozzle, or a continuous piezo jet with charging electrodes. The proposed system and method will greatly reduce, and in some cases virtually eliminate, the waste of photoresist in the process.

Abstract: Imagable precursors for masks and for electronic parts comprise a polymeric layer applied to a substrate. The layer comprises at least one polymer having infra-red absorbing groups carried as pendent groups on the polymer backbone. Certain infra-red absorbing groups may also act to insolubilize the polymer in a developer, until it is imagewise exposed to infra-red radiation. Imagewise application of heat, resulting from imagewise exposure of the precursor to infra-red radiation, renders the polymer layer more soluble in the developer than prior to exposure to the infra-red radiation.

Abstract: This invention relates to an imageable element that can be imaged and developed to produce a printing plate. The imageable element comprises a substrate and a radiation-sensitive imageable composition applied to the substrate. The imageable composition comprises (a) a first layer having (i) a photosensitive composition which undergoes a decrease in solubility in developer upon absorption of actinic radiation and (ii) an inhibitor, and (b) a second layer comprising an ink-repellent polymeric material. In one embodiment, the inhibitor is activated by heat or radiation of longer wavelength than actinic radiation. Upon activation, the inhibitor retards the solubility decrease of the photosensitive composition upon absorption of actinic radiation. In another embodiment, the inhibitor initially retards the solubility decrease of the photosensitive composition upon absorption of actinic radiation.

Abstract: According to the present invention there is provided a heat-sensitive material for making lithographic plates comprising in the order given on a support an IR-sensitive oleophilic layer and a cross-linked hydrophilic layer comprising an inorganic pigment and a hardener, characterized in that the ratio of said inorganic pigment over the hardener is comprised between 75/25 and 25/75 by weight.

Abstract: Analysis of samples is done using an optical bio-disc that has a transmissive layer on its operational features. The layer is semi-reflective, allowing a laser to go through operational features to provide better characterization of samples as more refracted and scattered light is detected by a detector on the disc drive. Optically, the transmitted beam can be detected without taking into account the effect of polarization. Also the transmissive property allows a disc drive to have a larger detector to better detect light scattered by investigation features on the disc. When the topmost layer of the disc is refractive, the disc drive has a detector above the disc to capture images or signals from target zones on the disc, and a detector below to capture the reflected laser for operational functions. When the topmost layer of the disc is reflective, the disc drive has both detectors mentioned supra below the disc.

Abstract: A coating apparatus for forming a film on a surface of a substrate to be coated, comprises a holding table for holding the substrate to be coated, a discharge head, containing a coating solution and formed with a plurality of discharge holes at a portion thereof opposing the substrate to be coated, for discharging the coating solution, a fine-vibration plate for applying fine vibrations to discharge the coating solution and driving motor for driving the holding table and the discharge head relative to each other.

Abstract: A lithographic printing plate precursor is disclosed which comprises (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer and (ii) a coating provided thereon, the coating comprising an oleophilic layer which, upon image-wise exposure to heat or infrared light and subsequent immersion in an aqueous alkaline developer, dissolves in the developer at a higher dissolution rate in exposed areas than in unexposed areas, wherein the oleophilic layer comprises a polymer that is soluble in the developer and an organic dye in a amount sufficient to provide a visible color to the coating, characterized in that said organic dye does not reduce the dissolution rate of the unexposed areas in the developer.

Abstract: A primary object of the present invention is to provide a process for the production of a pattern-forming body, the process enabling the formation of a highly precise pattern, requiring no post-exposure treatment and being free from a fear as to the deterioration of the pattern-forming body itself because no photocatalyst is contained in the produced pattern-forming body.

Abstract: A printing plate for computer-to plate lithography having a laser-ablatable member supported by a substrate. At least one portion of the laser-ablatable member is formed form an acrylic polymer containing laser-sensitive particles. The laser-sensitive particles absorb imaging radiation and cause the portion of the laser-ablatable member containing the laser sensitive particles and any overlying layers to be ablated.

Abstract: The invention includes polymers that contain a polymers of the invention contain one or more 1) carbonate units and/or 2) a lactone provided by a monomer having a ring oxygen adjacent to the monomer vinyl group. The invention also provides photoresists that contain such polymers, particularly for imaging at short wavelengths such as sub-200 nm.

Abstract: A lithographic structure and method of fabrication and use thereof having a plurality of layers at least one of which is a an RCHX layer which comprises a material having structural formula R:C:H:X, wherein R is selected from the group consisting of Si, Ge, B, Sn, Fe, Ti and combinations thereof and wherein X is not present or is selected from the group consisting of one or more of O, N, S, and F and a layer of an energy active material. The RCHX layers are useful as hardmask layers, anti-reflection layers and hardmask anti-reflection layers. The RCHX layer can be vapor-deposited and patterned by patterning the energy active material and transferring the pattern to the RCHX layer.

Abstract: A process of drying a cast film polymeric disposed upon a workpiece. In this process a cast polymeric film, which includes a volatile organic compound therein, disposed on a workpiece, is contacted with an extraction agent which may be liquid carbon dioxide or supercritical carbon dioxide.

Abstract: A process of drying a cast film polymeric disposed upon a workpiece. In this process a cast polymeric film, which includes a volatile organic compound therein, disposed on a workpiece, is contacted with an extraction agent which may be liquid carbon dioxide or supercritical carbon dioxide.

Abstract: There are provided steps of forming a lower resist layer on a patterning objective layer, forming an organic intermediate layer made of organic material, that contains no Si—O bond in its structure, on the lower resist layer, forming an upper resist layer made of alicyclic resin on the organic intermediate layer, forming a pattern by exposing/developing the upper resist layer, transferring the pattern of the upper resist layer onto the organic intermediate layer by etching the organic intermediate layer while using the upper resist layer as a mask, transferring a pattern of the organic intermediate layer onto the lower resist layer by etching the lower resist layer while using the organic intermediate layer as a mask, and etching the patterning objective layer while using the lower resist layer as a mask.

Abstract: Antireflective compositions characterized by the presence of an SiO-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions are especially useful in lithographic processes used to configure underlying material layers on a substrate, especially metal or semiconductor layers.

Abstract: Positive-working imageable elements and methods for their preparation are disclosed. The elements comprise a hydrophilic substrate; a bottom layer, which contains a positive-working photosensitive composition; and a protective overlayer, which has an overlayer material that reduces the solubility of the photosensitive composition in an aqueous alkaline developer. The overlayer may be conveniently applied by a dip and rinse procedure.

Abstract: An imaging member is composed of a hydrophilic imaging layer having a hydrophilic heat-sensitive polymer containing heat-activatable thiosulfate groups, and optionally a photothermal conversion material. Upon application of energy that generates heat, such as from IR irradiation, the polymer is crosslinked and rendered more hydrophobic. The imaging layer is disposed on an interlayer on a support, which interlayer comprises a Group IVB element (such as titanium, hafnium or zirconium) compound for improved mechanical and imaging properties. The exposed imaging member can be contacted with a lithographic printing ink and used for printing with or without post-imaging wet processing. This imaging member is particularly useful for direct write imaging using IR lasers or thermal printing heads.

Abstract: The present invention includes an imageable element, which includes a sheet substrate, an imaging layer and a silicone layer, which comprises a crosslinked silicone polymer. The crosslinked silicone polymer is the curing product of a vinyl functional polysiloxane copolymer and a hydrosiloxane compound. The curing is catalyzed by a platinum carbonyl complex. Upon imagewise exposure and development, an imaged element is obtained, which is mounted on a dry printing press containing lithographic ink and used to produce printed stock.

Abstract: Lithographic imaging techniques begin with a donor member having substrate substantially transparent to imaging radiation and a transferable material thereover; the substrate and the transferable material differ in affinity for ink and/or a liquid to which ink will not adhere. The donor member is exposed to imaging radiation in an imagewise pattern so as to cause displacement of the transfer material from the donor member in accordance with that pattern. Following the imagewise displacement, the donor member can be used as a lithographic printing member.

Abstract: A thermally sensitive imaging member can be imaged using thermal energy such as from an IR-emitting laser and then used for lithographic printing. The imaging member includes a support having an ink-repellant subbing layer and a thermally sensitive, ink-repellant surface imaging layer. Imaging causes a “switching” in the exposed surface regions to a more oleophilic or ink-accepting nature. Post-imaging processing is unnecessary in this imaging system. The surface imaging layer includes a thermally sensitive copolymer of silicone “soft” segments and thermally sensitive “hard” segments as well as a photothermal conversion material that is IR radiation sensitive.

Abstract: A semiconductor processing method of promoting adhesion of photoresist to an outer substrate layer predominately comprising silicon nitride includes, a) providing a substrate; b) providing an outer layer of Si3N4 outwardly of the substrate, the outer Si3N4 layer having an outer surface; c) covering the outer Si3N4 surface with a discrete photoresist adhesion layer; and d) depositing a layer of photoresist over the outer Si3N4 surface having the intermediate discrete adhesion layer thereover, the photoresist adhering to the Si3N4 layer with a greater degree of adhesion than would otherwise occur if the intermediate discrete adhesion layer were not present.

Abstract: Provided is a photosensitive copper paste permitting the formation of a fine and thick copper pattern having high adhesion to a substrate, and having excellent preservation stability without causing gelation, and a method of forming a copper pattern, a circuit board and a ceramic multilayer substrate using the photosensitive copper paste. The photosensitive copper paste includes a mixture of an organic binder having an acid functional group, a copper powder and a photosensitive organic component. The copper powder has a surface layer having a thickness of at least 0.1 &mgr;m from the surface composed CuO as a main component. The copper powder also has an oxygen content of about 0.8% to 5% by weight.

Abstract: A method is disclosed for preparing a patterned continuous polymeric brush on a substrate surface. The method generally involves functionalization of the substrate surface followed by surface-initiated polymerization at the initiation sites so provided, e.g., using a living free radical polymerization technique or the like, whereby a covalently bound continuous polymeric brush results, with acid-labile groups present throughout. An acid is then applied to the continuous polymer brush in a predetermined pattern, under conditions that result in removal of the acid-labile groups in at least one first region of the continuous polymer brush but not in at least one second region of the continuous polymer brush. In a preferred embodiment, the acid is a photogenerated acid resulting from imagewise irradiation of a photoacid generator applied as a film or coating to the surface-bound polymer brush.

Abstract: Antireflective compositions characterized by the presence of an SiO-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions are especially useful in lithographic processes used to configure underlying material layers on a substrate, especially metal or semiconductor layers.

Abstract: A positive working lithographic plate precursor comprising a support having a hydrophilic surface and a coating thereon comprising a positive working, photosensitive composition and an aryl alkyl polysiloxane. A method of preparing a positive working lithographic plate precursor comprising coating on a support having a hydrophilic surface a coating comprising, in admixture, a positive working photosensitive composition and an aryl alkyl polysiloxane.