Abstract: Provided is a plate-making method for producing a waterless lithographic printing plate, wherein the method comprises: (I) an exposing step of imagewise exposure of the precursor with a laser with a controlled condition that a portion of a laser-exposed area in a photo-thermal conversion layer in the precursor remains in the photo-thermal conversion layer of the finished printing plate, and (II) a developing step of removing a silicone rubber layer in the laser-exposed area to form an image on the printing plate. The precursor to be processed comprises (A) a support, (B) an undercoat layer formed by applying onto the support a coating liquid that contains a water-soluble or water-dispersible polymer and water as a solvent, and then drying the coating liquid, (C) a photo-thermal conversion layer which comprises polyurethane and a photo-thermal converting agent; and (D) a silicone rubber layer, laminated in that order.

Abstract: The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention contain a polymer that has fluorinated phenolic units and photoacid-labile groups. Resists of the invention can be effectively imaged at short wavelengths such as sub-200 nm, particularly 157 nm.

Abstract: The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 157 nm. Particular polymers and photoresists of the invention include at least one electronegative group that reduces 157 nm absorbance of a wide spectrum of organic groups including aromatic groups such as phenolic moieties.

Abstract: A heat-mode exposable imaging material is disclosed which is suitable for making a driographic printing master capable of accepting ink at exposed areas, said material comprising (i) a first layer containing more than 50% by weight of carbon or of an organic light absorbing compound, and (ii) an ink-abhesive second layer underlying said first layer, characterised in that said first layer is removable at non-exposed areas by starting a pressrun without substantially removing said second layer. In a preferred embodiment, the material comprises a support, a silicone coating and a surface coating which consists essentially of carbon, soot or graphite. After heat-mode exposure, the material is ink accepting at exposed areas and the surface coating is removed at non-exposed areas during the start of a pressrun, thereby revealing the silicone coating.

Abstract: The present invention includes new polymers and use of such polymers as a resin component for photoresist compositions, particularly chemically-amplified positive-acting photoresist compositions. Polymers and resists of the invention are particularly useful for imaging with short wavelength radiation, such as sub-200 nm and preferably about 157 nm. Polymers of the invention contain one or more groups alpha to an acidic site that are substituted by one or more electron-withdrawing groups.

Abstract: This invention relates to resins and photoresist compositions that comprise such resins. Preferred polymers of the invention comprise adjacent saturated carbon atoms, either integral or pendant to the polymer backbone, that have a substantially gauche conformation. Polymers of the invention are particularly useful as a resin binder component of chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm and preferably about 157 nm. In such short-wavelength imaging applications, polymers of the invention that have a population of dihedral angles of adjacent saturated carbon atoms that are enriched in substantially gauche conformations can provide reduced undesired absorbance of the high energy exposure radiation.

Abstract: A graded anti-reflective coating (ARC) with one or more layers has a bottom layer that is highly absorbing at the lithographic wavelength, and one or more layers between the substrate and the resist layer having inhomogeneous optical constants. The refractive indices are matched across layer interfaces, and the optical constants vary smoothly through the layer thicknesses. In each layer the extinction coefficient and the refractive index have independently selectable values and gradients. This ARC structure provides almost total absorption in the bottom layer and near-zero reflection at the resist interface and all other intermediate interfaces. Layers are preferably of inorganic materials, typically SiOxNy. Because of its highly absorbing bottom layer, an ARC according to an embodiment of the present invention works effectively over diverse substrate materials for a variety of lithographic wavelengths. It provides great latitude of manufacturing tolerances for thicknesses and optical constants.

Abstract: There is disclosed a method of constructing photosensitive waveguides on silicon wafers through the utilization of a Plasma Enhanced Vapor Deposition (PECVD) system. The deposition is utilized to vary the refractive index of resulting structures when they have been subject to Ultra Violet (UV) post processing.

Abstract: A directly imageable planographic printing plates that is high in image productivity and easy to check is produced by using a directly imageable planographic printing plate that comprises at least a substrate, a thermo-sensitive layer and a ink-repelling layer in this order, wherein the thermo-sensitive layer in the printing area contains a dye that has an absorption maximum in the range of 400 nm to 700 nm, and the difference between the reflected absorption of the non-printing area and the reflected absorption of the printing area, observed at the absorption maximum wavelength of the dye, is not less than 0.3 and not more than 2.0.

Abstract: Disclosed are new antireflective compositions including organo polysilica materials including one or more chromophores. Also disclosed are methods of forming relief images using these antireflective compositions.

Abstract: An absorbing ether-like compound including a siliconethoxy, silicondiethoxy, or silicontriethoxy species attached to a naphthalene or anthracene chromophore via an oxygen linkage is used as an organic light-absorbing compound. The absorbing ether-like compound is incorporated into spin-on glass materials to provide anti-reflective coating materials for deep ultraviolet photolithography. A method of synthesizing the light-absorbing ether compounds is based on the reaction of an alcohol-substituted chromophore with an acetoxysilicon compound in the presence of alcohol. A method of making absorbing spin-on-glass materials including the absorbing ether-like compounds is also provided.

Abstract: The present invention discloses photoresist polymers and photoresist compositions containing the same. The photoresist polymer comprises repeating units derived from (a) a compound of Chemical Formula 1; (b) a compound of Chemical Formula 2; (c) a compound of Chemical Formula 3; and optionally (d) maleic anhydride. Photoresist compositions containing the polymers of the present invention have superior etching resistance, heat resistance and adhesiveness, are easily developed in the 2.38% aqueous TMAH solution, and are therefore suitable for lithography processes using ultraviolet light sources when fabricating a minute circuit of a high integration semiconductor device: wherein R, R*, R3, R4, R′, R″, R′″, X, Y, V, W, i and j are as described herein.

Abstract: A self-contained photohardenable imaging assembly comprising in order: a first transparent support; an imaging layer comprising a developer material and a plurality of photohardenable microcapsules encapsulating a color precursor, and a second opaque support, wherein the opaque support comprises a barrier layer that exhibits a low water vapor transmission rate, which barrier layer comprises a metallic material. The imaging assembly has been found to provide better image quality and more consistence sensitometric response to pressure development.

Abstract: The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-300 nm, particularly 157 nm. Preferred polymers and photoresists include acid labile acetal or ketal groups that help degrade the polymer by hydrolysis. More preferred polymers include at least one electronegative group that reduces or avoids 157 nm absorbance of a wide spectrum of organic groups including aromatic groups such as phenolic moieties.

Abstract: A positive resist laminate which comprises a substrate, a first resist layer and a second resist layer,

Abstract: This invention provides a directly imageable planographic printing plate precursor with excellent image reproducibility without requiring any complicated process after irradiation with a laser beam. To solve the above problem, this invention is constituted as describe below. A directly imageable waterless planographic printing plate precursor, in which at least an ink acceptable layer and a silcone rubber layer are laminated in this order on a substrate, wherein when the printing plate precursor is measured by TG-GC/MS in a hellium current at a heating rate of 10° C./min, a decomposition product is generated in a temperature range of 100° C. to 200° C. by 0.001 g/m2 to 1 g/m2 per plate area.

Abstract: A hydrophilic layer and an overcoat layer are provided in this order on a heat-sensitive layer having an ink receiving surface, so as to form an original (plate) for a lithographic printing plate. The overcoat layer can be removed during printing. A system capable of forming an inorganic hydrophilic matrix by sol-gel conversion is provided in the hydrophilic layer. Adhesion between the heat-sensitive layer and the hydrophilic layer decreases in a heated region through image processing. Emulsion ink is supplied to the plate surface during printing, whereby the overcoat layer and the hydrophilic layer at an image portion are removed with a hydrophilic component of the emulsion ink. Thus, with a heat-sensitive original that can be subjected to heat-mode prepress using laser exposure, good printed matter can be stably obtained, irrespective of balance between image and non-image portions, without using wetting water.

Abstract: The invention relates to a radiation-sensitive recording material for the production of offset printing plates having a dimensionally stable support, a radiation-sensitive layer located on the front of the support, and a layer which comprises an organic polymeric material having a glass transition temperature of 35° C. or above and in which pigment particles are embedded and which is resistant to processing chemicals and is located on the back of the support. The pigment particles are preferably silica gel particles having a mean diameter of from 0.1 to 50 &mgr;m or organic particles having a mean diameter of from 3 to 10 &mgr;m. The image layer on the front may be matted or pigmented. The back coating enables the recording material to be stacked without separating paper. The image layer located on the front is not scratched by the pigmented back coating during storage and transport and during removal from the stack.

Abstract: A hydrogenated product of a ring-opening metathesis polymer comprising structural units as shown below has improved heat resistance, pyrolysis resistance and light transmission and is suited as a photoresist for semiconductor microfabrication using UV or deep-UV. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.

Abstract: The invention relates to a process for forming an integrated circuit device comprising (i) a substrate; (ii) metallic circuit lines positioned on the substrate and (iii) a dielectric material positioned on the circuit lines. The dielectric material comprises porous organic polysilica.

Abstract: A method and apparatus for improving the accuracy of a contact to an underlying layer comprises the steps of forming a first photoresist layer over the underlying layer, forming a mask layer over the first photoresist layer, then forming a patterned second photoresist layer over the mask layer. The mask layer is patterned using the second photoresist layer as a pattern then the first photoresist layer is patterned using the mask layer as a pattern. A tapered hole is formed in the first photoresist layer, for example using an anisotropic etch. The tapered hole has a bottom proximate the underlying layer and a top distal the underlying layer with the top of the hole being wider than the bottom of the hole.

Abstract: A lithographic structure and method of fabrication and use thereof having a plurality of layers at least one of which is a an RCHX layer which comprises a material having structural formula R:C:H:X, wherein R is selected from the group consisting of Si, Ge, B, Sn, Fe, Ti and combinations thereof and wherein X is not present or is selected from the group consisting of one or more of O, N, S, and F and a layer of an energy active material. The RCHX layers are useful as hardmask layers, anti-reflection layers and hardmask anti-reflection layers. The RCHX layer can be vapor-deposited and patterned by patterning the energy active material and transferring the pattern to the RCHX layer.

Abstract: A waterless planographic printing plate precursor which has a support member, a light-to-heat conversion layer for converting laser light to heat, and a silicone rubber layer. The light-to-heat conversion layer is contains at least one kind of polyurethane having at least one carboxyl group, and at least one light-to-heat conversion substance.

Abstract: A heat-sensitive lithographic printing plate precursor is disclosed, which comprises an aluminum support having provided thereon an ink-receptive layer and a hydrophilic layer containing a colloidal particle oxide or hydroxide of at least one element selected from the group consisting of beryllium, magnesium, aluminum, silicon, titanium, boron, germanium, tin, zirconium, iron, vanadium, antimony and transition metals, wherein at least one layer of the ink-receptive layer and the hydrophilic layer contains a compound capable of converting light into heat, the aluminum support has an anodic oxide film in an amount of 2 g/m2 or more, and the anodic oxide film has been subjected to sealing treatment at a sealing rate of 50% or more.

Abstract: A directly imageable waterless planographic printing plate, which has at least the heat sensitive layer and an ink repellent layer in this order on a substrate, having a high sensitivity and good image reproducibility and allowing a heat sensitive layer to remain even after development is produced by imagewisely irradiating a precursor of the printing plate with a laser beam, pre-treating the precursor by a pre-treatment liquid containing an amine compound by 0.1 to 30 wt % based on the weight of the entire pre-treatment liquid, and removing the ink repellent layer at the laser beam irradiated area, in this order, such that the heat sensitive layer is at least partially left on the printing plate after completion of the above steps.

Abstract: A solvent of a resist solution is dropped from a solvent supply nozzle onto the surface of a semiconductor wafer held by a spin chuck. The semiconductor wafer is rotated by the spin chuck to spread the resist solution over the entire surface of the semiconductor wafer W. Simultaneously, the resist solution is dropped from a resist solution supply nozzle onto the semiconductor wafer and spread following the solvent. During the processing, the processing space is isolated from the outer atmosphere by closing a lid of a processing vessel and a sprayed solvent is supplied into the processing space. The processing space is thus filled with the mist of solvent. In the processing space supplied with the solvent, evaporation of the solvent from the resist solution is suppressed. A film of the resist solution is formed with a uniform film thickness to the edge of the semiconductor wafer W.

Abstract: The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), particularly for deep UV applications. The antireflective compositions of the invention in general comprise a resin binder component that contains a high molecular weight polymer, e.g. a polymer having an Mw of at least about 40,000 daltons. ARCs of the invention exhibit exceptional conformality upon application to a substrate surface. For example, ARCs of the invention can coat substantial topography such as vertical and sloping steps with high conformality.

Abstract: A printing plate element is disclosed, comprising a substrate and a component layer containing a first material which is water-insoluble or capable of varying from being water-soluble to being water-insoluble at a prescribed temperature of not less than 60° C. and a second material which is water-soluble and has a melting point of 60 to 300° C. A method of preparing a printing plate is also disclosed, comprising imagewise exposure of the printing plate element and removing an unexposed area of the printing plate element with aqueous solution.

Abstract: A lithographic printing surface is prepared using a thermal lithographic printing plate which requires no chemical development to remove areas of the imaged plate. The processless thermal lithographic printing plate has a sheet substrate; a hydrophilic layer on the sheet substrate; and a thermally sensitive imaging layer on the hydrophilic layer. The hydrophilic layer contains about 30 weight % of an aluminosilicate or clay, and preferably has an exterior surface which is micro-porous. The imaging layer preferably is micro-porous. The imaging layer is exposed imagewise using infrared laser radiation to produce an imaged layer. The imaged layer is treated with a conditioner liquid to produce a lithographic printing surface.

Abstract: According to the present invention there is provided a heat ode imaging element for providing a lithographic printing plate consisting of a lithographic base with a hydrophilic surface and a top layer that is sensitive to IR-radiation, comprises a polymer soluble in an aqueous alkaline solution, and is unpenetrable for an aqueous alkaline developer, characterized in that said top layer comprises a polysiloxane surfactant.

Abstract: A negative working waterless lithographic printing plate precursor excellent in image reproducibility and scratch resistance and writable by laser beams, which comprises a support having thereon a light-sensitive layer and a silicone rubber layer provided on the light-sensitive layer, the light-sensitive layer being reduced in adhesion to the silicone rubber layer by exposure, wherein the light-sensitive layer comprises a polymer having at least one group selected from the group consisting of a siloxane group and an alkyl fluoride group and at least one group selected from the group consisting of an unsaturated double bond group and a hydroxyl group.

Abstract: The present invention provides an anti-reflection films for lithographic application on polysilicon containing substrate. A structure for improving lithography patterning in an integrated circuit comprises a polysilicon layer, a diaphanous layer located above the polysilicon layer, an anti-reflection layer located above the diaphanous layer, and then a photoresist layer located above the anti-reflection layer for patterning the integrated circuit pattern. The anti-reflection layer is preferably oxynitride.

Abstract: According to the present invention there is provided a heat-sensitive imaging element for providing a lithographic printing late, comprising a lithographic base with a hydrophobic oleophilic surface and a top layer comprising a compound capable of converting light into heat and a hydrophilic polymer, characterized in that said hydrophilic polymer is crosslinked.

Abstract: According to the present invention there is provided a method for making driographic printing plates comprising the image-wise exposure of a heat-sensitive recording material comprising on an ink-accepting support an image-forming layer containing hydrophobic thermoplastic polymer particles and a compound capable of converting light into heat, said compound being present in said image-forming layer or a layer adjacent thereto and a cured ink-repellant surface layer. After the exposure the printing plate is developed by wiping it with water or an aqueous solution before or after mounting it on the print cylinder of a printing press.

Abstract: A directly imageable waterless planographic printing plate precursor is a laminate of, in turn, at least a heat sensitive layer and a silicon rubber layer on a substrate. The heat sensitive layer includes (A) a light-to-heat converting material and (B) a compound which contains N—N bonds.

Abstract: The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), particularly for deep UV applications. The antireflective compositions of the invention in general comprise a resin binder component that contains a high molecular weight polymer, e.g. a polymer having an Mw of at least about 40,000 daltons. ARCs of the invention exhibit exceptional conformality upon application to a substrate surface. For example, ARCs of the invention can coat substantial topography such as vertical and sloping steps with high conformality.

Abstract: An anti-reflective coating and method of forming the anti-reflective coating are described wherein the anti-reflective coating is part of a silicon nitride layer formed on a semiconductor integrated circuit substrate. The anti-reflective coating is formed under the photoresist layer for greater effectiveness but does not disrupt the process flow since the anti-reflective coating is part of the silicon nitride layer. A first silicon nitride layer is formed having an index of refraction of about 2.1. A second silicon nitride layer having an index of refraction of about 1.9 and a second thickness is formed on the first silicon nitride layer. A layer of photoresist is then formed on the second silicon nitride layer. The second thickness is chosen to be equal to the wavelength of the light used to expose the layer of photoresist divided by the quantity of 4 multiplied by 1.9. The second silicon nitride layer acts as an effective anti-reflective layer.

Abstract: A positive acting, photoimageable composition having, a photoacid generator capable of generating an acid upon exposure to actinic radiation, an organic acid anhydride polymer, an epoxy, a nitrogen-containing curing catalyst, and an optional phenol-containing monomer or polymer. A photographic element has this composition coated and dried on a substrate. A positive acting image is produced by imagewise exposing the element to actinic radiation, optionally postbaking and development with a liquid developer.

Abstract: Imaging of lithographic printing plates with reduced fluence requirements is accomplished using printing members that have a solid substrate, gas-producing and radiation-absorptive layers over the substrate, and a topmost layer that contrasts with the substrate in terms of lithographic affinity. Exposure of the radiation-absorptive layer to laser light causes this layer to become intensely hot. This, in turn, activates the gas-producing layer, causing rapid evolution and expansion of gaseous decomposition products. The gases stretch the overlying topmost layer to create a bubble over the exposure region, where the imaging layers have been destroyed. If this process is sufficiently explosive, the neck of the bubble expands beyond the diameter of the incident laser beam, tearing the topmost layer and the underlying imaging layers away from the substrate outside the exposed region.