Binder Containing Patents (Class 430/905)
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Patent number: 7601480Abstract: The present application relates to a compound of formula where X is selected from the group CF3SO3, C4F9SO3, N(SO2C2F5)2, N(SO2CF3SO2C4F9), N(SO2C3F7)2, N(SO2C4F9)2, CF3CHFO(CF2)2SO3, and CH3CH2CH2O(CF2)4SO3. A photoresist composition comprising a polymer containing an acid labile group, the above compounds, and one or more additional photoacid generators is also provided for.Type: GrantFiled: December 20, 2006Date of Patent: October 13, 2009Assignee: AZ Electronic Materials USA Corp.Inventors: M. Dalil Rahman, Takanori Kudo
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Patent number: 7598017Abstract: A negative resist composition including: a fluorine-containing resin component (F) containing a structural unit (f1) represented by a general formula (f1-0) shown below, and a structural unit (f2) having an alkali-soluble group, an alkali-soluble resin component (A) excluding the fluorine-containing resin component (F), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C). [wherein, R7 represents a fluorinated alkyl group, and a represents either 0 or 1.Type: GrantFiled: October 24, 2008Date of Patent: October 6, 2009Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Jun Iwashita, Kazuhito Sasaki, Sho Abe
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Patent number: 7598014Abstract: A negative thick film photoresist composition with improved alkali developability is provided. The composition comprises: (A) a resin component containing (a) from 61 to 90% by weight of a structural unit derived from a cyclic alkyl (meth)acrylate ester, and (b) a structural unit derived from a radical polymerizable compound containing a hydroxyl group, (B) a polymerizable compound containing at least one ethylenic unsaturated double bond, (C) a photopolymerization initiator, and (D) an organic solvent.Type: GrantFiled: November 18, 2004Date of Patent: October 6, 2009Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Yasushi Washio, Koji Saito
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Patent number: 7595143Abstract: A photoresist composition includes about 10 to about 70% by weight of a binder resin including a phenol-based polymer, about 0.5 to about 10% by weight of a photo-acid generator, about 1 to about 20% by weight of a cross-linker, about 0.1 to about 5% by weight of a dye and about 10 to about 80% by weight of a solvent. The photoresist composition may be applied to, for example, a method of manufacturing a TFT substrate.Type: GrantFiled: August 22, 2006Date of Patent: September 29, 2009Assignee: Samsung Electronics Co., Ltd.Inventors: Jeong-Min Park, Hi-Kuk Lee, Hyoc-Min Youn, Ki-Hyuk Koo, Byung-Uk Kim
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Patent number: 7592128Abstract: The present invention relates to negative-working imageable elements that can be used for the manufacture of printing plates. These imageable elements can be developed on on-press by the action of a lithographic printing ink used in combination with either water or a fountain solution. The imageable elements comprise an imageable layer that is not removable in water or fountain solution alone. The imageable layer includes a free radically polymerizable compound, a free radical initiator composition, an infrared radiation absorbing compound, and a polymeric binder comprising poly(alkylene oxide) pendant groups, and preferably additionally pendant cyano groups.Type: GrantFiled: August 7, 2006Date of Patent: September 22, 2009Assignee: Eastman Kodak CompanyInventors: Jianbing Huang, Kevin B. Ray, Scott A. Beckley
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Patent number: 7592118Abstract: A positive resist composition, includes: (B) a resin containing a repeating unit represented by formula (Ia) or (Ib) as defined in the specification, which decomposes under an action of an acid to increase a solubility of the resin (B) in an aqueous alkali solution; and (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and a pattern forming method uses the composition.Type: GrantFiled: March 24, 2008Date of Patent: September 22, 2009Assignee: FUJIFILM CorporationInventors: Kazuyoshi Mizutani, Shuji Hirano, Shinichi Sugiyama
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Patent number: 7592125Abstract: New positive photoresist compositions are provided that contain a photoactive component and blend of at least two distinct resins: i) a first resin that comprises carbocyclic aryl units with hetero substitution (particularly hydroxy or thio) and ii) a second cross-linked resin. Preferred photoresists of the invention can be imaged at short wavelengths, such as sub-200 nm, particularly 193 nm.Type: GrantFiled: January 19, 2006Date of Patent: September 22, 2009Assignee: Rohm and Haas Electric Materials LLCInventors: Yasuhiro Suzuki, Cheng-Bai Xu
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Patent number: 7592126Abstract: A positive resist composition comprising: (A) a resin insoluble or sparingly soluble in an alkali but capable of decomposing under an action of an acid to increase a solubility in an alkali developer, the resin having a ?-(meth)acroyloxy-?-butyrolactone repeating unit represented by the following formula (1) containing a lactone ring which may have a substituent; and (B) a compound capable of generating an organic acid represented by the formula (2), (3), (3?), (4) or (5) as defined herein upon irradiation of actinic rays or radiation.Type: GrantFiled: March 17, 2006Date of Patent: September 22, 2009Assignee: FUJIFILM CorporationInventor: Fumiyuki Nishiyama
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Patent number: 7592121Abstract: An antireflection film that has sufficient antireflection capability and antifouling property and is improved in scratch resistance, and a process for producing an antireflection film with considerably high productivity are provided, which is an antireflection film comprising a transparent support, a hard coat layer and a low refractive index layer, in this order, wherein the hard coat layer includes a polymerized product of (A) an ethylene oxide or propylene oxide adduct of a polyfunctional acrylate monomer and (B) a polyfunctional acrylate monomer having no oxide adduct.Type: GrantFiled: January 22, 2004Date of Patent: September 22, 2009Assignee: Fujifilm CorporationInventor: Yuuzou Muramatsu
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Patent number: 7588878Abstract: An image forming medium includes a substrate and an imaging layer coated on or impregnated into the substrate, where the imaging layer includes a photoacid generator and an acid-base indicator. In the image forming medium, irradiation of the imaging layer causes the photoacid generator to generate an acid that reacts with the acid-base indicator to produce an image.Type: GrantFiled: June 13, 2007Date of Patent: September 15, 2009Assignee: Xerox CorporationInventors: Gabriel Iftime, Tyler B. Norsten, Peter M. Kazmaier
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Patent number: 7588876Abstract: A resist material includes a base polymer containing a compound having a unit represented by a general formula of the following Chemical Formula 1: wherein R1, R2 and R3 are the same or different and are a hydrogen atom, a fluorine atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; R5 is a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid; and R6 is a group having a cyclic ester compound, a group having an alicyclic compound including a hydroxyl group or a group having a compound including hexafluoroisopropyl alcohol.Type: GrantFiled: May 13, 2005Date of Patent: September 15, 2009Assignee: Panasonic CorporationInventors: Shinji Kishimura, Masayuki Endo, Masaru Sasago, Mitsuru Ueda, Hirokazu Imori, Toshiaki Fukuhara
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Patent number: 7585610Abstract: The present invention provides a resist pattern thickening material, which can utilize ArF excimer laser light; which, when applied over a resist pattern to be thickened e.g., in form of lines and spaces pattern, can thicken the resist pattern to be thickened regardless of the size of the resist pattern to be thickened; and which is suited for forming a fine space pattern or the like, exceeding exposure limits. The present invention also provides a process for forming a resist pattern and a process for manufacturing a semiconductor device, wherein the resist pattern thickening material of the present invention is suitably utilized.Type: GrantFiled: January 20, 2006Date of Patent: September 8, 2009Assignee: Fujitsu LimitedInventors: Koji Nozaki, Miwa Kozawa, Takahisa Namiki
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Photocurable and thermosetting resin composition, dry film using the same, and cured product thereof
Patent number: 7585611Abstract: A photocurable and thermosetting resin composition comprising (A) a carboxylic acid-containing photosensitive resin having at least one carboxyl group and at least two ethylenically unsaturated bonds in its molecule, (B) a filler, (C) a photopolymerization initiator, (D) a diluent, and (E) a compound having at least two cyclic ether groups and/or cyclic thioether groups in its molecule, wherein the difference between the refractive index of the carboxylic acid-containing photosensitive resin (A) and that of the filler (B) is 0.20 or less, and the average grain diameter of the filler (B) is 0.5 to 0.05 ?m, and wherein the photo-curing and thermosetting resin composition can be developed by a diluted alkali solution, and can be pattern-formed by a laser oscillation light source of 350 to 420 nm in wavelength.Type: GrantFiled: January 5, 2007Date of Patent: September 8, 2009Assignee: Taiyo Ink Mfg. Co., Ltd.Inventors: Kenji Kato, Gen Itokawa -
Patent number: 7582412Abstract: Multilayer photoresist systems are provided. In particular aspects, the invention relates to underlayer composition for an overcoated photoresist, particularly an overcoated silicon-containing photoresist. Preferred underlayer compositions comprise one or more resins or other components that impart etch-resistant and antireflective properties, such as one or more resins that contain phenyl or other etch-resistant groups and anthracene or other moieties that are effective anti-reflective chromophores for photoresist exposure radiation.Type: GrantFiled: November 20, 2003Date of Patent: September 1, 2009Assignee: Rohm and Haas Electronic Materials LLCInventors: James F. Cameron, Dana A. Gronbeck, George G. Barclay
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Patent number: 7582398Abstract: An image forming medium includes a substrate and an imaging layer coated on or impregnated into the substrate, where the imaging layer includes a photobase generator and a coupling agent. In the image forming medium, irradiation of the imaging layer cause the photobase generator to generate a base that reacts with the coupling agent to produce an image.Type: GrantFiled: June 13, 2007Date of Patent: September 1, 2009Assignee: Xerox CorporationInventors: Gabriel Iftime, Peter M. Kazmaier, Tyler B. Norsten
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Patent number: 7582407Abstract: Single- and multi-layer positive-working imageable elements include an ink receptive outer layer includes a primary polymeric binder that is a poly(vinyl phenol) or a phenolic polymer having certain acidic groups. The use of this type of polymeric binder makes the imaged elements developable in low pH (11 or less) alkaline developers.Type: GrantFiled: July 9, 2007Date of Patent: September 1, 2009Assignee: Eastman Kodak CompanyInventors: Celin Savariar-Hauck, Alan S. Monk, Gerhard Hauck
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Patent number: 7579132Abstract: The present invention provides a salt represented by the formula (I): wherein X represents an n-valent connecting group, Y1 and Y2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 2 or 3, and A+ represents an organic counter ion. The present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).Type: GrantFiled: June 4, 2007Date of Patent: August 25, 2009Assignee: Sumitomo Chemical Company, LimitedInventors: Yukako Harada, Isao Yoshida, Satoshi Yamaguchi
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Patent number: 7572560Abstract: An image forming medium includes a substrate, and an imaging layer coated on or impregnated into said substrate, wherein the imaging layer includes an imaging composition including a photochromic or photochromic-thermochromic material dissolved or dispersed in a solvent or polymeric binder, wherein the imaging composition is imageable by light of a first wavelength and erasable in a short time period by a combination of heat and light of a second wavelength such that simultaneous erase with heat and light of the second wavelength is faster than erase by heat alone and exhibits a reversible transition between a colorless and a colored state.Type: GrantFiled: June 13, 2007Date of Patent: August 11, 2009Assignee: Xerox CorporationInventors: Peter M. Kazmaier, Gabriel Iftime, Tyler B. Norsten, Barkev Keoshkerian, Naveen Chopra
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Patent number: 7569325Abstract: A photoresist monomer having a sulfonyl group, a polymer thereof and a photoresist composition containing the same are disclosed. The photoresist monomer is represented by following Formula. wherein, R* is a hydrogen atom or a methyl group, R1 and R2 are independently a C1˜C20 alkyl group, a C4˜C20 cycloalkyl group, a C6˜C20 aryl group or a C7˜C20 arylalkyl group, one of R1 and R2 may not exist, and R1 and R2 can be connected to form a ring.Type: GrantFiled: October 24, 2007Date of Patent: August 4, 2009Assignee: Dongjin Semichem Co., Ltd.Inventors: Jung-Youl Lee, Geun-Jong Yu, Sang-Jung Kim, Jae-Woo Lee, Deog-Bae Kim, Jae-Hyun Kim
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Patent number: 7569328Abstract: The present invention provides a resin composition that includes (A) a polymer compound that has, on a side chain of a main chain polymer, through a linkage group containing a hydrogen-bonding group and a ring structure, a terminal ethylenic unsaturated bond, and is soluble or swelling in water or an alkali aqueous solution, and (B) a compound that generates radicals when exposed to light or heat. The invention further provides a thermo/photosensitive composition that includes (A?) a polymer compound that has a non-acidic hydrogen-bonding group on a side chain and is soluble or swelling in water or an alkali aqueous solution, and (B?) a compound that generates radicals when exposed to light or heat.Type: GrantFiled: August 12, 2003Date of Patent: August 4, 2009Assignee: FUJIFILM CorporationInventor: Kazuhiro Fujimaki
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Patent number: 7569323Abstract: A resist protective coating material is provided comprising an ?-trifluoromethylacrylic acid/norbornene copolymer having cyclic perfluoroalkyl groups as pendant. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of immersion lithography.Type: GrantFiled: July 26, 2006Date of Patent: August 4, 2009Assignees: Shin-Etsu Chemical Co., Ltd., Panasonic Corporation, Central Glass Co., Ltd.Inventors: Jun Hatakeyama, Yuji Harada, Yoshio Kawai, Masayuki Endo, Masaru Sasago, Haruhiko Komoriya, Michitaka Ootani, Satoru Miyazawa, Kazuhiko Maeda
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Patent number: 7563556Abstract: A positive-working imageable element comprises inner and outer layers and an infrared radiation absorbing compound such as an IR absorbing dye. The ink receptive outer layer includes a phenolic polymeric binder that is soluble in a developer having a pH of from about 7 to about 11. The use of this type of polymeric binder reduces residue in the developer as elements are processed.Type: GrantFiled: November 17, 2006Date of Patent: July 21, 2009Assignee: Kodak Graphic Communications GmbHInventors: Celin Savariar-Hauck, Gerhard Hauck
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Patent number: 7556910Abstract: The present invention relates to a photosensitive composition comprising a triazine-based photoactive compound containing oxime ester. The photosensitive composition according to the present invention has good sensitivity, retention rate, mechanical strength, heat resistance, chemical resistance and developing durability since it contains, as photopolymerization initiator, a compound having an oxime ester group and a triazine group in one molecule and thus effectively absorbs UV radiation. Therefore, the photosensitive composition according to the present invention is advantageous not only in curing of materials for color filters, resin black matrixes, column spacers, overcoats and passivation films of liquid crystal displays, but also in high temperature process characteristics.Type: GrantFiled: November 29, 2006Date of Patent: July 7, 2009Assignee: LF Chem, Ltd.Inventors: Sung Hyun Kim, Kyung Jun Kim, Dong Chang Choi, Jeong Ae Yoon, Hee Kwan Park, Geun Young Cha, Keon Woo Lee, Il Eok Kwon, Dong Kung Oh, Jong Hyun Park, Xiang Li Li, Han Soo Kim, Min Young Lim, Chang Ho Cho
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Patent number: 7553603Abstract: An image forming medium includes a substrate and an imaging layer coated on or impregnated into the substrate, where the imaging layer includes a photobase generator and an acid-base indicator. In the image forming medium, irradiation of the imaging layer causes the photobase generator to generate a base that reacts with the acid-base indicator to produce an image.Type: GrantFiled: June 13, 2007Date of Patent: June 30, 2009Assignee: Xerox CorporationInventors: Gabriel Iftime, Tyler B. Norsten, Peter M. Kazmaier
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Patent number: 7550248Abstract: The object of the present invention is to provide a resist pattern thickening material, etc. which, when coated over a resist pattern formed of ArF resist material, etc., can efficiently thicken the resist pattern such as lines and spaces pattern, etc. regardless of the composition of ArF resist material, and the like; which can easily control the thickening amount of resist pattern by process condition; and which can easily and efficiently form a fine space pattern beyond the exposure (resolution) limits of light sources of the exposure devices at low cost. The resist pattern thickening material of the present invention comprises a solubilizer which melts the resist pattern at the temperature near its melting point and- a water-soluble element. The process for forming a resist pattern of the present invention comprises forming a resist pattern and coating a resist pattern thickening material of the present invention over the surface of the resist pattern.Type: GrantFiled: December 28, 2005Date of Patent: June 23, 2009Assignee: Fujitsu LimitedInventors: Takahisa Namiki, Koji Nozaki, Miwa Kozawa
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Patent number: 7550249Abstract: Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at ?-position and/or ?-position and/or ?-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected are described.Type: GrantFiled: March 10, 2006Date of Patent: June 23, 2009Assignee: AZ Electronic Materials USA Corp.Inventors: David Abdallah, Francis Houlihan
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Patent number: 7550250Abstract: A positive resist composition, which comprises: (A) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure, of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having a repeating unit represented by formula (C) as defined in the specification; and (D) a solvent, wherein a content of the resin as the component (C) is from 0.1 to 20 mass % based on a solid content of the positive resist composition, and a pattern forming method using the same.Type: GrantFiled: December 27, 2006Date of Patent: June 23, 2009Assignee: FUJIFILM CorporationInventor: Hiromi Kanda
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Patent number: 7544461Abstract: A near infrared ray activation type positive resist composition comprising (A) a vinyl-based polymer having a monomer unit having an alkali-soluble group blocked by an ether having an alkenyl group next to an ether oxygen, (B) a photothermal converting substance generating heat by a light in the near infrared region, (C) a thermal acid generator generating an acid by heat, can provide a near infrared ray activation type positive resist composition which can be subjected to an exposure treatment in a complete bright room such as under a white light and the like, gives desired sensitivity and resolution, and of which baking treatment conditions can be relaxed or a baking treatment can be omitted, and a pattern formation method using the same.Type: GrantFiled: July 22, 2005Date of Patent: June 9, 2009Assignee: Kansai Paint Co., Ltd.Inventors: Genji Imai, Toshikazu Murayama, Katsuhiro Ito, Haruhumi Hagino
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Patent number: 7544460Abstract: A resist composition is disclosed that enables formation of a favorable resist pattern using a shrink process in which, following formation of the resist pattern, a treatment such as heating is used to narrow the resist pattern, and also disclosed are a laminate and a method for forming a resist pattern that use such a resist composition. This resist composition includes a resin component (A) that displays changed alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure. The component (A) contains structural units derived from a (meth)acrylate ester, and exhibits a glass transition temperature that falls within a range from 120 to 170° C.Type: GrantFiled: July 7, 2004Date of Patent: June 9, 2009Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Hideo Hada, Kazuhito Sasaki, Satoshi Fujimura, Takeshi Iwai
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Patent number: 7541131Abstract: The invention provides a resist composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, a compound for use in the resist composition and a pattern forming method using the resist composition, which are a resist composition comprising (A) a sulfonium salt represented by the following formula (I); and a pattern forming method using the resist composition: wherein R1 represents an alkyl group or an aryl group, R2 to R9 each independently represents a hydrogen atom or a substituent and may combine with each other to form a ring, Z represents an electron-withdrawing divalent linking group, Xn? represents an n-valent anion, n represents an integer of 1 to 3, and m represents the number of anions necessary for neutralizing the electric charge.Type: GrantFiled: February 17, 2006Date of Patent: June 2, 2009Assignee: FUJIFILM CorporationInventor: Yasutomo Kawanishi
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Patent number: 7541138Abstract: A resist composition which is stable relative to solvents used in immersion lithography processes and displays excellent sensitivity and resist pattern profile, and a method of forming a resist pattern that uses such a resist composition are provided. The resist composition is in accordance with predetermined parameters, or is a positive resist composition comprising a resin component (A) which contains an acid dissociable, dissolution inhibiting group and displays increased alkali solubility under the action of acid, an acid generator component (B), and an organic solvent (C), wherein the component (A) contains a structural unit (a1) derived from a (meth)acrylate ester containing an acid dissociable, dissolution inhibiting group, but contains no structural units (a0), including structural units (a0-1) containing an anhydride of a dicarboxylic acid and structural units (a0-2) containing a phenolic hydroxyl group.Type: GrantFiled: January 10, 2007Date of Patent: June 2, 2009Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Taku Hirayama, Hideo Hada, Satoshi Fujimura, Takeshi Iwai, Mitsuru Sato, Ryoichi Takasu, Toshikazu Tachikawa, Jun Iwashita, Keita Ishiduka, Tomotaka Yamada, Toshikazu Takayama, Masaaki Yoshida
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Patent number: 7541119Abstract: An image forming medium includes a substrate and an imaging layer coated on or impregnated into said substrate, where the imaging layer includes a photochromic material dispersed in an ionomer, optionally with an additional polymeric binder, and where the photochromic material exhibits a reversible transition between a colorless state and a colored state in response to heat and optional light.Type: GrantFiled: June 13, 2007Date of Patent: June 2, 2009Assignee: Xerox CorporationInventors: Tyler B. Norsten, Gabriel Iftime, Peter M. Kazmaier
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Patent number: 7541133Abstract: A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid, and (B) an acid generator. The resin (A) is a polymer comprising tertiary alkyl protective group units having a hydrophobic tetracyclo[4.4.0.12,5.17,10]-dodecane structure, hydroxyadamantane units, monocyclic lactone units, and carboxylic acid units. The acid generator (B) is a specific sulfonium salt compound.Type: GrantFiled: November 20, 2007Date of Patent: June 2, 2009Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Tsunehiro Nishi, Seiichiro Tachibana, Katsuhiro Kobayashi
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Patent number: 7537879Abstract: The present invention relates to a novel chemically amplified photoresist, which is sensitive to wavelengths between 300 nm and 100 nm, and comprises a) a novel polymer comprising a sulfone group pendant from a polymer backbone that is insoluble in an aqueous alkaline solution and comprises at least one acidic moiety protected with acid labile group, and b) a compound capable of producing an acid upon irradiation. The invention also relates to a process of imaging the novel positive photoresist composition.Type: GrantFiled: November 22, 2004Date of Patent: May 26, 2009Assignee: AZ Electronic Materials USA Corp.Inventors: Francis M. Houlihan, Ralph R. Dammel, Andrew R. Romano, Munirathna Padmanaban, M. Dalil Rahman
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Patent number: 7537880Abstract: To a resist composition, an alkali-soluble polymer having fluorinated ester-containing lactone units incorporated therein is included as an additive. The resist composition forms a resist film having a reduced contact angle after development. The resist film prevents water penetration during immersion lithography.Type: GrantFiled: October 3, 2007Date of Patent: May 26, 2009Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Yuji Harada, Jun Hatakeyama, Takao Yoshihara, Wataru Kusaki, Tomohiro Kobayashi, Koji Hasegawa
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Patent number: 7534548Abstract: A polymer for immersion lithography comprising a repeating unit represented by Formula 1 and a photoresist composition containing the same. A photoresist film formed by the photoresist composition of the invention is highly resistant to dissolution, a photoacid generator in an aqueous solution for immersion lithography, thereby preventing contamination of an exposure lens and deformation of the photoresist pattern by exposure.Type: GrantFiled: December 15, 2005Date of Patent: May 19, 2009Assignee: Hynix Semiconductor Inc.Inventors: Jae Chang Jung, Cheol Kyu Bok, Chang Moon Lim, Seung Chan Moon
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Patent number: 7531288Abstract: A photosensitive lithographic printing plate comprising: a hydrophilic support; and a photosensitive layer containing a polymerization initiator, a chain transfer agent, a compound having an ethylenically unsaturated double bond and a polymer binder having a crosslinkable group in a side chain, wherein the chain transfer agent is a thiol compound represented by the following formula (I): in which R represents an alkyl group which may have a substituent or an aryl group which may have a substituent; and A represents an atomic group necessary for forming a 5-membered or 6-membered hetero ring containing a carbon atom together with the N?C—N linkage, and A may have a substituent.Type: GrantFiled: September 26, 2005Date of Patent: May 12, 2009Assignee: FUJIFILM CorporationInventors: Keisuke Arimura, Takahiro Goto
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Patent number: 7531290Abstract: Sulfonate salts have the formula: R1SO3—CH(Rf)—CF2SO3?M+ wherein R1 is alkyl or aryl, Rf is H or trifluoromethyl, and M+ is a Li, Na, K, ammonium or tetramethylammonium ion. Onium salts, oximesulfonates and sulfonyloxyimides and other compounds derived from these sulfonate salts are effective photoacid generators in chemically amplified resist compositions.Type: GrantFiled: October 27, 2006Date of Patent: May 12, 2009Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Katsuhiro Kobayashi, Youichi Ohsawa, Takeshi Kinsho, Takeru Watanabe
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Patent number: 7527915Abstract: The present invention is directed to phosphorus containing (or “halogen free”) multi-layer flame retardant photoimagable compositions useful as a coverlay material in a flexible electronic circuitry package. These compositions generally contain a top layer and bottom layer adjacent to one another both being photosensitive and comprising phosphorus containing acrylates and phosphorus-containing photo-initiators mixed with a polymer binder. These compositions typically have phosphorus in the top layer in an amount between, and including, any two of the following numbers 2.0, 2.2, 2.4, 2.6, 2.8, 3.0, 3.2, 3.4, 3.6, 3.8, 4.0, 4.2, 4.4, 4.6, 4.8, 5.0, 5.2, 5.4, 5.6, 5.8, 6.0, 6.2, 6.4, 6.6, 6.8, 7.0, 7.2, 7.4, 7.6, 7.8, 8.0, 8.2, 8.4, 8.6, 8.8, 9.0, 9.2, 9.4, 9.6, 9.8, and 10.0 weight percent, and have phosphorus in the bottom layer in an amount between, and including, any two of the following numbers, 0.0, 0.2, 0.4, 0.6, 0.8, 1.0, 1.2, 1.4, 1.6, 1.8, 2.0, 2.2, 2.4, 2.6, 2.8, 3.0, 3.2, 3.4, 3.6, 3.8, and 4.Type: GrantFiled: July 19, 2006Date of Patent: May 5, 2009Assignee: E. I. du Pont de Nemours and CompanyInventor: Tsutomu Mutoh
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Patent number: 7527912Abstract: Photoacid generators generate sulfonic acids of formula (1a) upon exposure to high-energy radiation. RC(?O)R1—COOCH(CF3)CF2SO3?H+??(1a) R is hydroxyl, alkyl, aryl, hetero-aryl, alkoxy, aryloxy or hetero-aryloxy, R1 is a divalent organic group which may have a heteroatom (O, N or S) containing substituent, or R1 may form a cyclic structure with R. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.Type: GrantFiled: September 27, 2007Date of Patent: May 5, 2009Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Youichi Ohsawa, Takeru Watanabe, Koji Hasegawa, Masaki Ohashi
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Patent number: 7524594Abstract: Some embodiments in accordance with the present invention relate to norbornene-type polymers and to photosensitive dielectric resin compositions formed therefrom. Other embodiments relate to films formed from such compositions and to devices, such as electrical, electronic and optoelectronic devices, that encompass such films.Type: GrantFiled: July 1, 2005Date of Patent: April 28, 2009Assignee: Promerus LLCInventors: Dino Amoroso, Brian Bedwell, Andrew Bell, Edmund Elce, Rajesh Raja Puthenkovilakom, Ramakrishna Ravikiran, Robert Shick, Xiaoming Wu, Hiroaki Makabe, Yasunori Takahashi, Etsu Takeuchi, Daoji Gan, Seok Ho Kang
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Patent number: 7524606Abstract: The present invention relates to a photoresist composition suitable for image-wise exposure and development as a positive photoresist comprising a positive photoresist composition and an inorganic particle material having an average particle size equal or greater than 10 nanometers, wherein the thickness of the photoresist coating film is greater than 5 microns. The positive photoresist composition can be selected from (1) a composition comprising (i) a film-forming resin having acid labile groups, and (ii) a photoacid generator, or (2) a composition comprising (i) a film-forming novolak resin, and (ii) a photoactive compound, or (3) a composition comprising (i) a film-forming resin, (ii) a photoacid generator, and (iii) a dissolution inhibitor.Type: GrantFiled: April 11, 2005Date of Patent: April 28, 2009Assignee: AZ Electronic Materials USA Corp.Inventors: Chunwei Chen, Ping-Hung Lu, Hong Zhuang, Mark Neisser
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Patent number: 7521168Abstract: A resist composition for an electron beam, EUV or X-ray comprising (A1) a compound that has a reduction potential higher than that of diphenyl iodonium salt and generates an acid upon irradiation of an actinic ray or radiation.Type: GrantFiled: February 11, 2003Date of Patent: April 21, 2009Assignee: Fujifilm CorporationInventors: Kazuyoshi Mizutani, Hyou Takahashi
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Patent number: 7517633Abstract: A composition for forming a gap-filling material for lithography which, as a gap-filling material for lithography superior in planarization ability on a substrate having irregularities such as holes or trenches, causing no intermixing with a resist layer, and having a high dry etching rate as compared with the resist, is used in producing semiconductor devices by a method using the gap-filling material to cover the resist on the substrate having holes having an aspect ratio, defined as height/diameter, of 1 or more to transfer images onto the substrate by utilization of lithographic process, the composition being used to coat the substrate prior to the coating of the resist so as to planarize the substrate surface, and the composition being characterized by containing a polymer solution consisting of a polymer and a solvent.Type: GrantFiled: July 12, 2001Date of Patent: April 14, 2009Assignee: Nissan Chemical Industries, Ltd.Inventors: Satoshi Takei, Ken-ichi Mizusawa, Yasuhisa Sone
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Patent number: 7514201Abstract: A positive photosensitive composition comprising (A) an acid generator that generates an acid upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution, and (C) a specific basic compound.Type: GrantFiled: January 26, 2007Date of Patent: April 7, 2009Assignee: FUJIFILM CorporationInventor: Toru Fujimori
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Patent number: 7514204Abstract: A resist composition comprises a polymer which increases its alkali solubility under the action of an acid as a base resin, and a copolymer comprising recurring units containing a sulfonic acid amine salt and recurring units containing at least one fluorine atom as an additive. The composition is suited for immersion lithography.Type: GrantFiled: October 23, 2007Date of Patent: April 7, 2009Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Jun Hatakeyama, Wataru Kusaki, Yuji Harada, Takao Yoshihara
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Patent number: 7514203Abstract: Disclosed is a positive photoresist composition used for a liquid crystal display. The positive photoresist composition of the present invention includes 3 to 50% by weight of binder resin having a certain structure, 2 to 40% by weight of a photoactive compound and 10 to 94% by weight of an organic solvent. The positive photoresist composition according to the present invention may be useful to form a pattern for an organic insulator of a liquid crystal display, metal patterning, a bump, hole drilling and UV overcoat since it has good basic physical properties such as UV transmittance, film retention, pattern stability, chemical resistance and so on, as well as an excellent heat resistance.Type: GrantFiled: December 21, 2005Date of Patent: April 7, 2009Assignee: Samyangems Co., Ltd.Inventors: Bong-Seok Moon, Hyo-Jeong Kim, Jin-Gon Kim, Yang-Hyun Yoo, Min-Ji Kim, Mi-Kyeong Jeong, Kwon-Yil Yoo, Nak-Chil Jung, Seon-Ho Kim
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Patent number: 7514199Abstract: Provided herein are hardmask compositions for resist underlayer films, wherein in some embodiments, the hardmask compositions include (a) a first polymer prepared by the reaction of a compound of Formula 1 ?wherein n is a number of 3 to 20, with a compound of Formula 2 (R)m—Si—(OCH3)4-m??(2) ?wherein R is a monovalent organic group and m is 0, 1 or 2; (b) a second polymer that includes at least one of the structures represented by Formulae 3-6; (c) an acid or base catalyst; and (d) an organic solvent. Further provided herein are methods for producing a semiconductor integrated circuit device using a hardmask composition according to an embodiment of the present invention. In addition, provided herein are semiconductor integrated circuit devices produced by a method embodiment of the invention.Type: GrantFiled: August 22, 2006Date of Patent: April 7, 2009Assignee: Cheil Industries, Inc.Inventors: Dong Seon Uh, Chang Il Oh, Do Hyeon Kim, Hui Chan Yun, Jin Kuk Lee, Irina Nam, Jong Seob Kim
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Patent number: 7514198Abstract: A radiation image-able coating includes a first phase including a radiation curable polymer matrix and an activator disposed in the radiation curable polymer matrix, a second phase insolubly distributed in the first phase, the second phase including a color-former, and a hybrid antenna dye package distributed in at least one of the first and second phase, wherein the hybrid antenna dye package includes at least a first antenna dye having a high extinction coefficient and a second antenna dye having a low extinction coefficient.Type: GrantFiled: August 15, 2005Date of Patent: April 7, 2009Assignee: Hewlett-Packard Development Company, L.P.Inventors: Vladek Kasperchik, Cari L. Dorsh, Makarand P. Gore
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Patent number: 7510822Abstract: A stimulation sensitive composition comprising: (A) a compound represented by the specific formula which is capable of generating an acid or a radical by stimulation from the external.Type: GrantFiled: April 9, 2003Date of Patent: March 31, 2009Assignee: FUJIFILM CorporationInventor: Kunihiko Kodama