Abstract: An arrangement for cooling a spindle bearing or bearings of an abrading apparatus with rotating abrading members is disclosed. This is premised on arranging in a housing of the abrading apparatus conduits which extend from a spindle bearing chamber wall of the housing to an inner suction chamber wall of the housing. Via such conduits, hot air may be expelled from a spindle bearing chamber of the housing as an overpressure in front of a protruding balancer element of a rotating shaft balancer is discharged from the spindle bearing chamber via a conduit into a suction chamber. Cool air may be conveyed from a suction chamber into the spindle bearing chamber as an underpressure behind the protruding balancer element draws in air from the suction chamber via the conduit to the spindle bearing chamber.

Abstract: A retaining ring used in the polishing of semiconductor substrates is described herein. A retaining ring includes a bottom surface configured to contact a polishing pad and a top surface configured to attach to a carrier head. The top surface includes a plurality of screw holes and a plurality of alignment slots. The top surface also includes a first insert disposed in a first alignment slot of the plurality of alignment slots, the first insert flush with or below the top surface, and where the first insert configured to prevent insertion of an alignment pin into the first alignment slot.

Abstract: A method of manufacturing an abrasive member, in particular having the general shape of a disc such as a cutting or grinding disc, comprises arranging a reinforcing insert or reinforcing member into a mold between a layer of curable abrasive resin compound, in particular a layer of curable abrasive granulate, a backing member such that at least a section of the reinforcing insert or reinforcing member is in direct physical contact with the curable abrasive resin compound, the reinforcing insert or reinforcing member is at least partially covered by the backing member and at least a section of the backing member is in direct physical contact with the curable abrasive resin compound; bonding the reinforcing insert or reinforcing member and the backing member by curing the curable abrasive resin compound, wherein the cured abrasive resin compound forms an abrasive layer of the abrasive member.

Abstract: A retaining ring comprises a generally annular body. The body comprises a top surface, a bottom surface, an outer surface connected to the top surface at an outer top perimeter and the bottom surface at an outer bottom perimeter, and an inner surface connected to the top surface at an inner top perimeter and the bottom surface at an inner bottom perimeter. The inner surface comprises seven or more planar facets. Adjacent planar facets are connected at corners. The inner bottom perimeter comprises straight edges of the planar facets connected at the corners.

Abstract: A device (1) for automatically changing sanding discs (12) includes a stacking device (10) for a plurality of grinding discs (12) and a guide element (16) for orienting the suction openings (32) in the grinding discs (12) along a common central axis (18), wherein the guide element (16) is arranged eccentrically with regard to the central axis (18). A positioning element (17) is provided for positioning a tool head of a grinding device, wherein the positioning element (17) and the guide element (16) are mounted in a floating manner. A device (1) for automatically changing grinding discs (12) includes a detachment device (50), wherein the detachment device (50) has a bearing surface (51) for a grinding-disc receptacle. The bearing surface (51) has an opening (52), the diameter of which is greater than the diameter of the grinding disc (12). A separating element (53) is arranged above the opening (52).

Abstract: A method is provided for repairing a component of an item of rotational equipment, where the component includes a coating and a component body, and where the coating is on the component body and includes a defect. The method includes steps of: (a) removing a portion of the coating from the component body thereby forming a coating aperture, the removed portion of the coating including the defect, and the portion of the coating is removed such that the coating aperture has a coating aperture configuration which substantially matches a first patch configuration of a first coating patch; (b) preparing the component at the coating aperture to receive the first coating patch, (c) disposing the first coating patch within the coating aperture; and (d) attaching the first coating patch to the component body.

Abstract: A stability belt is fabricated of a spring-loaded safety belt buckle and a sufficiently long strap to reach around an operator and a passenger of an open vehicle or a domesticated animal. The stability belt may have a belt buckle that has a top quick belt release portion that comprises an aperture for receiving a tether. The tether is adapted to be tied to the buckle and the buckle released by pulling on the tether in the event of an emergency. The stability belt may have a padded portion at the rear and sides serving as a cushion for the passenger in the event of a quick stop. The stability belt may permit passengers to ride that otherwise would not be able to ride such as a small child or a handicapped person.

Abstract: An arrangement (1) including a tool (7) and a feeler device (11) is movably guided along the edge of a workpiece (5) so that the workpiece is machined, for example, trimmed, along the edges (3) of the workpiece by the tool. The arrangement (1) can be adjusted perpendicularly to the plane of the workpiece, whereas the feeler device, which is designed for example as a Bernoulli disk (13), has a constant distance from the workpiece, so that the tool also is always guided at the correct position relative to the edge of the workpiece. Thus even for workpieces deviating from the target position, for example workpieces that are not level, the tool is always guided in such a way that the tool is correctly oriented relative to the center plane of the workpiece and, for example, the trimming of the borders at the edges of the workpiece is performed reliably.

Abstract: The invention relates to a method for the multi-stage grinding of workpieces (20) made of hard mineral materials using a robot (10). To this end, the workpiece (20) is moved into a processing region (21) and measured and/or oriented there by the robot (10). The robot (10) comprises a grinding head (11) by way of which it then takes up a first abrasive (14) preferably from a storage container (30) and starts a first grinding process. After the first grinding process is complete, the robot (10) releases the first abrasive (14) again and then takes up a second abrasive (14), preferably from the same or some other storage container (30). Then the robot (10) starts a second grinding process, and after the latter is complete, releases the second abrasive (14) again. One or more further grinding processes may be provided, but the grinding method can also be finished after the second grinding process.

Abstract: A jet receiving receptacle is provided which is coupleable to a high pressure fluid jet system opposite a nozzle thereof to receive a fluid jet discharged from the nozzle after it acts on a workpiece. The jet receiving receptacle may include an inlet feed component having a tapered inlet that defines a jet receiving surface about a central axis to receive the fluid jet and direct the fluid jet downstream and toward the central axis. The jet receiving receptacle may further include a drive mechanism adapted to rotate the inlet feed component about the central axis such that impact of the fluid jet with the inlet feed component is distributed around the jet receiving surface. The drive mechanism may rotate the inlet feed component continuously or intermittently. Fluid jet cutting systems incorporating a jet receiving receptacle and related methods are also provided.

Abstract: A handheld power tool and a removable accessory, which is changeable without requiring extra tools, include various elements. For example, the handheld power tool includes a platen having an aperture therein and a locking mechanism coupled with the platen. The locking mechanism includes a cam member. The removable accessory includes a tab that fits into the aperture and that is engagable by the cam member to bias the removable accessory into abutting contact with the platen to securely couple the removable accessory with the tool.

Abstract: An apparatus for processing a substrate is disclosed. The apparatus includes a polishing section configured to polish a substrate, a transfer mechanism configured to transfer the substrate, and a cleaning section configured to clean and dry the polished substrate. The cleaning section has plural cleaning lines for cleaning plural substrates. The plural cleaning lines have plural cleaning modules and plural transfer robots for transferring the substrates.

Abstract: The purpose of this invention is to retain an abhor nut to a power tool while the nut is not in use. More specifically it is intended to keep the abhor nut of an angle grinder attached to the grinder. Grinding abrasives for an angle grinder can be purchased with or without a center hub. The abrasives that do not have a center hub make use of the abhor nut to secure them to the grinder. When an abrasive with a center hub is used on the grinder the abhor nut is not needed. The nut is removed from the abhor and frequently becomes misplaced. This invention keeps the grinder and nut together while the nut is not being used. This is designed for angle grinders, but could be used for other power tools and machinery.

Abstract: Embodiments described herein generally relate to connecting Electronic Lapping Guides (ELG) to a lapping controller such that the number of wire bonds from the controller to a row of read heads is minimized. When lapping the air bearing surface of the read heads, the electrical resistances of the ELGs are monitored to adjust the lapping process and set the stripe height for read sensors in the read heads. Once the resistance corresponds to the desired stripe height, the lapping process is stopped. To measure the resistance, each ELG may be electrically coupled to the same substrate—i.e., share the same common ground. The lapping controller applies a voltage potential across the ELGs using a wire bonded to a pad in the respective read head and one or more connections to the grounded substrate. This configuration avoids having to bond two wires onto each read head.

Abstract: A grinding apparatus includes a table, a grinding disk assembled on the table, three support plates for supporting workpieces, three weights, and a mechanism to suspend and lower any of the weights over the grinding disk. The three support plates are assembled on the table and located upon the grinding disk. The lifting mechanism includes a drive cylinder, a board member, a connecting member connecting the drive cylinder and the board member, and three fastening members rotatably attached to the board member, for hooking the weight blocks. The drive cylinder drives the board member bringing with the weight blocks to move towards the support plates until the weight blocks loaded on the support plates, to increase a grinding force.

Abstract: An assembly for carrying a measuring gauge to be maintained in contact with a portion of a workpiece mounted in a machine tool arranged to rotate the workpiece about a machine reference axis. The assembly is for mounting on a carriage shared with a material removing tool and comprises a slide which is slidable in the direction of infeed of said material removing tool. A mount coupling is pivotally coupled to the slide by a pivot and is arranged to accommodate variation of the spacing between the mount and the pivot due to the rotary motion of said workpiece portion. A slide driver is arranged to reciprocate the slide relative to the slide support in synchronism with the rotation of said workpiece portion. An associated method is also provided.

Abstract: An example component polishing method includes polishing a component, and protecting at least a portion of a component during the polishing using a sacrificial mask. Some of the sacrificial mask is removed during the polishing.

Abstract: A device or tool setter has the purpose of setting the position of a support bar, adjustably connected to a grinding machine, in relation to a rotatable grindstone of the machine for obtaining a desired edge angle of a tool supported for grinding by the support bar. The device is provided with discs for defining two contact points with the grindstone and a hole for connection to the support bar.

Abstract: A masking stencil to protect the surface surrounding a high spot to be abraded which, due to its minimal thickness and resistance to abrasive action, allows the abrasive to work over the stencil resulting in the requirement of a sufficiently fine abrasive to finish the process after stencil removal, that damage to the surrounding surface is reduced.

Abstract: The present invention relates to an interface pad for use between an abrasive article and a support tool. In one particular embodiment, an interface pad for use between a perforated abrasive article and a support tool is provided. In general, the interface pads described herein contain apertures and at least one channel configured such that an interface pad can be used between an abrasive article having a particular configuration of apertures and a support tool having different configuration of dust collection apertures. In one embodiment, the interface pads described herein contain apertures and at least one channel configured such that the interface pad can be used between any perforated abrasive article and any support tool with dust extraction capabilities. Abrasive tools which include an interface pad and methods for using the interface pads are also described.

Abstract: A contrast device for the grinding of products, particularly but not exclusively cylinders, held between centres, wherein a grinding machines (21) comprise a holding structure (20) equipped with a grinding wheel (24) to which a cylinder to be processed (22) is opposed, and the contrast device (23) is situated on the opposite side of the cylinder (22) with respect to the grinding wheel (24), the contrast device (23) comprising a slide (25) assembled on a short pipe (26) sliding inside a body (27) of the contrast device (23) by an interposed actuator (28, 35), there also being a blocking element (29) of the relative position of the short pipe (26) with respect to the body (27) and an irreversible blocking device (31, 32, 33) of the position of the pipe (26) with respect to the cylinder (22).

Abstract: A semiconductor manufacturing apparatus includes at least one inner retaining ring, and an outer retaining ring. The at least one inner retaining ring applies a first pressure to the polishing pad, and retains a substrate on the polishing pad. The outer retaining ring applies a second pressure to the polishing pad, and retains the at least one inner retaining ring on the polishing pad. Control of the first pressure is independent with respect to control of the second pressure.

Abstract: A device and a method for processing an optical lens as well as a corresponding shipping container for multiple optical lenses are proposed, whereby the presence of necessary or specific operating means is acquired preferably automatically, in particular by means of corresponding detection devices, and/or is indicated for the respective processing of necessary lenses and/or other operating means, such as tools. In particular, a user guidance is provided, which as an alternative or in addition indicates a necessary clamping or reclamping of the lens or assigned block pieces and/or necessary tool-changing, or the like.

Abstract: The edge effect or variation in polishing edge profile on a substrate undergoing CMP is reduced by structuring a retaining ring, housed in a carrier head for retaining the substrate, such that the polishing edge profile shifts back and forth with respect to the center of the substrate. Embodiments include structuring the retaining ring such that the width between inner and outer surfaces varies by an amount sufficient to compensate for polishing edge profile variation. Embodiments also include structuring the retaining ring such that the distance from the outer surface to the geometric inner surface varies. Embodiments further include structuring the retaining ring such that the distance between the outer surface to the perimeter of the substrate retained by the inner surface of the retaining ring varies.

Abstract: An angle grinder is provided including a radial fan assembly. The radial fan assembly is configured to direct exhaust radially outwardly and axially away from a user of the angle grinder. Brush card assemblies for an angle grinder are also provided. The brush card assemblies provide for the securing of brush cards to a field case of the angle grinder by the interface between the field case and brush cards. Additionally, a spindle lock mechanism and a safety mechanism for an angle grinder are provided.

Abstract: A carrier head for chemical mechanical polishing that has a base, a mounting assembly connected to the base having a surface for contacting a substrate, and a retaining ring secured to the base. The retaining ring can include perfluoroalkoxy, polyetherketoneketone, polybenzimidazole, a semi-crystalline thermoplastic polyester, or a long molecular chain molecule produced from poly-paraphenylene terephthalamide.

Abstract: Disclosed is a linear conveyor (21) for transporting glass panels (3) in the vicinity of grinding stations (9, 13) or a washing station (15) of a system for producing glass panel blanks including a linear conveyor (23), for example, a driven toothed belt, and opposite the driven toothed belt a beam (25), from which a fluid, in particular water, is discharged. The glass panel (3) is pressed against the linear conveyor (23) in a non-positive manner and reliably conveyed by water discharged from the beam (25). Such linear conveyors (21) can be arranged at the upper or lower edge of a glass panel (3) in order to trim the glass panel using at least one grinding disk (27), for example.

Abstract: A polishing apparatus polishes a surface of a substrate by pressing the substrate against a polishing pad on a polishing table. The polishing apparatus is configured to control a temperature of the polishing surface of the polishing pad by blowing a gas on the polishing pad during polishing. The polishing apparatus includes a pad temperature control mechanism having at least one gas ejection nozzle for ejecting a gas toward the polishing pad and configured to blow the gas onto the polishing pad to control a temperature of the polishing pad, and an atomizer having at least one nozzle for ejecting a liquid or a mixed fluid of a gas and a liquid and configured to blow the liquid or the mixed fluid onto the polishing pad to remove foreign matters on the polishing pad. The pad temperature control mechanism and the atomizer are formed into an integral unit.

Abstract: A golf ball kit having an abrasive material adapted for imparting enhanced micro surface roughness to an exterior surface of a golf ball. The enhanced micro surface roughening affects the aerodynamic properties of the ball as compared to golf balls having the same set of construction specifications but without enhanced micro surface roughness. The kit includes an instruction device having a plurality of correlations between at least one performance parameter and micro surface roughness for at least a first golf ball.

Abstract: The present disclosure discloses a device for measuring physical parameters of a slurry used in a chemical mechanical polishing apparatus and measuring method using the same. The chemical mechanical polishing apparatus comprises a polishing head, a rotary table, a polishing platen and a polishing pad having a through-hole. The device for measuring physical parameters of slurry comprises: a sensor disposed in the polishing platen and adapted to contacted the slurry via the through-hole of the polishing pad for measuring the physical parameters of the slurry; a converter disposed in the rotary table and coupled to the sensor for converting a measuring signal of the sensor into a standard electrical signal; and a processing unit coupled to the converter for acquiring the standard electrical signal to calculate physical parameters of the slurry.

Abstract: An apparatus for, and methods of use for, measuring film thickness on an underlying body are provided. The apparatus may include at least one Impedance Resonance (IR) sensor, which may include at least one sensing head. The at least one sensing head may include an inductor having at least one excitation coil and at least one sensing coil. The excitation coil may propagate energy to the sensing coil so that the sensing coil may generate a probing electromagnetic field. The apparatus may also include at least one power supply, at least one RF sweep generator electrically connected to the excitation coil; at least one data acquisition block electrically connected to the sensing coil; at least one calculation block; and at least one communication block. Methods of monitoring conductive, semiconductive or non-conductive film thickness, and various tools for Chemical Mechanical Polishing/Planarization (CMP), etching, deposition and stand-alone metrology are also provided.

Abstract: An arrangement (1) including a tool (7) and a feeler device (11) is movably guided along the edge of a workpiece (5) so that the workpiece is machined, for example, trimmed, along the edges (3) of the workpiece by the tool. The arrangement (1) can be adjusted perpendicularly to the plane of the workpiece, whereas the feeler device, which is designed for example as a Bernoulli disk (13), has a constant distance from the workpiece, so that the tool also is always guided at the correct position relative to the edge of the workpiece. Thus even for workpieces deviating from the target position, for example workpieces that are not level, the tool is always guided in such a way that the tool is correctly oriented relative to the center plane of the workpiece and, for example, the trimming of the borders at the edges of the workpiece is performed reliably.

Abstract: A mask for performing high speed media finishing on airfoils includes a thicker portion and a thinner portion. The thicker portion is spaced further from an edge that will become a leading edge in the final airfoil than the thinner portion. The media is redirected by the thicker portion toward the edge where the finishing is to occur.

Abstract: A head for an orbital abrading machine comprising a housing, a shroud including inner and outer portions, defining a chamber between the inner and outer portions, a drive means for driving an abrading pad, the drive means at least partially enclosed by the housing and the shroud, wherein the drive means produces an exhaust which is directly vented into the chamber without leaving the head, and wherein the chamber includes at least one opening for directing the exhaust toward the abrading pad for cooling the pad with the exhaust.

Abstract: A retainer is used with an apparatus for polishing a substrate. The substrate has upper and lower surfaces and a lateral, substantially circular, perimeter. The apparatus has a polishing pad with an upper polishing surface for contacting and polishing the lower face of the substrate. The retainer has an inward facing retaining face for engaging and retaining the substrate against lateral movement during polishing of the substrate. The retaining face engages a substrate perimeter at more than substantially a single discrete circumferential location along the perimeter.

Abstract: A membrane is suitable to be mounted on a polishing head of a chemical mechanical polishing apparatus and includes a main portion and an edge portion. The edge portion is located at an edge of the main portion, wherein a first included angle between the main portion and the edge portion is an obtuse angle.

Abstract: Plastic restoration kits and methods for restoring the light transmission and optical clarity properties of plastic surfaces, such as plastic aircraft windows, automobile plastic headlight covers, plastic sunglass lenses, and plastic corrective optical lenses. The kits and methods restore plastic surfaces that have been damaged by hazing, scratching and/or UV-induced oxidation. The kits and methods employ at least one polishing composition configured to improve clarity by removing scratches. A UV protective material is incorporated into at least one of the polishing compositions so that the UV protective material becomes worked into the plastic surface during polishing, and a protective coating that forms a hard protective coating over the plastic surface impregnated with the UV protective material is finally applied. The plastic surface may be heated after polishing and prior to application of the protective coating material.

Abstract: A swing arm for managing a power cord to an electric vehicle has a proximate arm member with a pivotable connection about a vertical axis for connection to the vehicle in proximity to a longitudinal center line of the vehicle. A distal arm member is pivotably connected about a pivot vertical axis to the proximate arm member and resiliently biased to extend straight out with respect to the proximate arm member. The swing arm is dimensioned to extend the distal arm member beyond a side of the vehicle when the swing arm extends laterally with respect to the vehicle. A spring member is connected to the distal arm member for resiliently biasing the distal arm member to extend straight out with respect to the proximate arm member against a side force below a predetermined amount and yieldable to bending of the distal arm member upon exertion of a side force above the predetermined amount.

Abstract: A ventilating insert for the substantially coaxial fixing of abrasive tools, such as deburring wheels, cutting wheels, fiber discs, Scotch-Brite® having an abrasive disk-like element, to the free end of a rotating shaft of a grinder, comprising at least one threaded ring for coupling to the free end of the rotating shaft, an annular portion of which is jointly associated with the disk-shaped element, the threaded ring comprising a central threaded hole and being designed to be arranged substantially coaxially with the disk-shaped element and able to be associated with corresponding threaded elements provided on the free end of the rotating shaft. The ventilating insert comprises deflectors for at least one fluid for cooling the disk-like element which are associated with the threaded ring for propelling radially the cooling fluid from the central to the peripheral region of the disk-like element during the rotation thereof.

Abstract: A polishing method includes: mounting a wafer on a fixed abrasive polishing pad located on a polishing platen; delivering a polishing slurry to the fixed abrasive polishing pad to polish the wafer; and adsorbing abrasive particles generated during the polishing process with an electrode. The electrode has a polarity opposite to a polarity of charges of the abrasive particles. A polishing device includes a polishing platen, a fixed abrasive polishing pad, a slurry pipeline and a polarity changer having an electrode. Therefore, the abrasive particles generated during the polishing process are removed, which prevents the wafer from being scratched, thereby increasing wafer yield and improving efficiency.

Abstract: A polishing apparatus is configured to simultaneously polish both surfaces of a work, and includes a carrier having a hole configured to house the work, and a fixing member that contacts and fixes the work located in the hole.

Abstract: A tool holder for a grinding machine, where the tool holder is mounted to a grinding platform of the grinding machine. The tool holder includes a plate member having a tapered slot where opposing stop elements are provided within the slot at a central location. The tool includes a pair of circular elements that are positioned on either side of the stop elements in the slot and are forced into the tapered shape of the slot so that the tool is held to the tool holder.

Abstract: A hand-held device is used in finishing an elongated workpiece, such as molding, which has a profiled front surface, the profiled front surface including a specific contour in transverse cross-section. The device has a finishing portion and a gripping portion. The finishing portion is formed from an open-cell foam material and has a working surface that is transversely profiled to be complementary to at least the profiled front surface of the workpiece. The finishing portion is adapted to apply a liquid material, such as a paint, stain or protective coating, to the workpiece.

Abstract: A plurality of grind-stone-mounts 12 each having a grind stone 15 on its outer side are attached to a holder 11 of a honing head 10 expandably along a radial direction. Each of the grind-stone-mounts 12 is provided with a support part 13 disposed inside along the radial direction, and a grind part 14 including the grind stone 15 and disposed outside along the radial direction. The grind part 14 is swingably attached to the support part 13 through one or more spring members 16 disposed at intervals along an axial direction of the holder 11.

Abstract: A counter-rotating polisher includes: an enclosure, an electric motor, a polishing arrangement and a counter-rotating arrangement. The electric motor is fixed to the enclosure and includes a driving axle. The polishing arrangement includes two polishing device. The polishing devices respectively include a fixed tray and a polishing material that are fixedly connected to an outside of the fixed tray. The fixed tray is perpendicular to the driving axle. The counter-rotating arrangement includes a first driving wheel, a second driving wheel and a change-direction wheel. The first driving wheel is connected to the driving axle and driven by the driving axle. The second driving wheel is fixedly connected to the second fixed tray. The change-direction wheel is connected to the first driving wheel and the second driving wheel. The driving axle rotates the first polishing material positively. The change-direction wheel reversely transmits the rotation to the second driving wheel.

Abstract: The present disclosure is directed to method, apparatus, and system for uniformly supporting flexible surface modifying articles during surface modification as well as enabling replacing and repositioning thereof for improving their useful service life as well as improving dust and debris control management.

Abstract: A mask for performing high speed media finishing on airfoils includes a thicker portion and a thinner portion. The thicker portion is spaced further from an edge that will become a leading edge in the final airfoil than the thinner portion. The media is redirected by the thicker portion toward the edge where the finishing is to occur.

Abstract: A cylindrical grinding and polishing device includes a main body defining a cavity, a polishing device, a cylindrical grinding device, a support device. The polishing device is received in the cavity, and includes a number of polishing wheels positioned along a first direction. The cylindrical grinding device is received in the cavity, and includes a grinding wheel positioned at an end of the cavity along a second direction substantially perpendicular to the first direction. The support device is received in the cavity, and includes a support plate for supporting a work-piece. The support device carries the work-piece to contact the polishing wheels or the grinding wheel.

Abstract: The present disclosure provides a method of fabricating a semiconductor device, a semiconductor device fabricated by such a method, and a chemical mechanical polishing (CMP) tool for performing such a method. In one embodiment, a method of fabricating a semiconductor device includes providing an integrated circuit (IC) wafer including a metal conductor in a trench of a dielectric layer over a substrate, and performing a chemical mechanical polishing (CMP) process to planarize the metal conductor and the dielectric layer. The method further includes cleaning the planarized metal conductor and dielectric layer to remove residue from the CMP process, rinsing the cleaned metal conductor and dielectric layer with an alcohol, and drying the rinsed metal conductor and dielectric layer in an inert gas environment.

Abstract: A polishing device includes an outer barrel, an inner barrel, polishing members, and an actuator. The outer barrel defines a chamber and includes inner surfaces substantially parallel to a central axis of the outer barrel. Each of the inner surfaces defines a holding groove for holding a workpiece. The inner barrel is received in the chamber and includes a side surface substantially parallel to the central axis. The side surface defines installation grooves. Each polishing member includes an elastic piece, a polishing motor connected to a bottom of a corresponding installation groove by the elastic piece and received in the corresponding installation groove, and a polishing plate connected to the polishing motor and capable of being driven to rotate by the polishing motor. The actuator is configured for driving the outer barrel to spin and move back and forth along the central axis.